CN207440514U - A kind of hard X ray framing camera - Google Patents
A kind of hard X ray framing camera Download PDFInfo
- Publication number
- CN207440514U CN207440514U CN201721623062.3U CN201721623062U CN207440514U CN 207440514 U CN207440514 U CN 207440514U CN 201721623062 U CN201721623062 U CN 201721623062U CN 207440514 U CN207440514 U CN 207440514U
- Authority
- CN
- China
- Prior art keywords
- cathode
- hard
- ray
- micro
- microchannel plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The utility model discloses a kind of hard X ray framing camera, solve the problems, such as the prior art can not to can segment limit carry out the two-dimensional imaging with time resolution for the hard X ray of the keV of tens keV~hundreds of.The utility model includes multichannel hard X ray detection cathode, microchannel plate, fluorescent screen, CCD, pinhole array plate, electric control system, cathode Au micro-strips, electrically conductive layer, microchannel plate Au micro-strips, multichannel hard X ray detection cathode, microchannel plate, fluorescent screen and CCD are built in the light seal cavity with tapered front end, electric control system be respectively the input face and microchannel plate of multichannel hard X ray detection cathode output face between and microchannel plate output face and fluorescent screen between load operating voltage.The utility model is simple in structure, design is scientific and reasonable, easy to use, can effectively to can segment limit carry out the two-dimensional imaging with time resolution for the hard X ray of the keV of tens keV~hundreds of.
Description
Technical field
The utility model is related to a kind of hard X ray framing cameras.
Background technology
X-ray framing camera is a kind of two dimensional image measuring device for possessing time resolution, is widely used in almost
All ultrafast phenomenon diagnosis for being related to X-ray, such as：Synchrotron radiation, inertial confinement fusion, Z pinch plasmas, straight line add
Optical measurement of fast device etc., scope cover biomedicine, nuclear physics, plasma physics, Strong-field physics etc..
However X-ray framing camera uses Au or CsI to be less than as cathode material to the response range of X-ray at present
25keV.Can not to can segment limit responded for the hard X ray of the keV of tens keV~hundreds of, it is however in some cases, such as used
Property constraint fusion physical study in, it is very that X-ray that this can be in segment limit, which has the two-dimensional imaging of time resolution,
It is necessary.For such case, we devise a kind of hard X ray framing camera, can be directed to the hard X of tens~hundreds of keV
Ray carries out two dimensional image measurement.
Utility model content
The technical problems to be solved in the utility model is：A kind of hard X ray framing camera is provided, solving the prior art can not
To can segment limit carry out that there is the problem of two-dimensional imaging of time resolution for the hard X ray of the keV of tens keV~hundreds of.
To achieve the above object, the technical solution adopted in the utility model is as follows：
A kind of hard X ray framing camera, including multichannel hard X ray detection cathode, microchannel plate, fluorescent screen, CCD, pin
Hole array plate and electric control system, the input face vapor deposition of the multichannel hard X ray detection cathode have cathode Au micro-strips,
The output face of the multichannel hard X ray detection cathode and the input face of the microchannel plate fit, and described mostly logical
Vapor deposition has one layer of electrically conductive layer between the output face of road hard X ray detection cathode and the input face of the microchannel plate, described to lead
Electric thin layer ground connection, the output face vapor deposition of the microchannel plate have with the corresponding microchannel plate Au micro-strips of the cathode Au micro-strips,
The fluorescent screen is located at the microchannel plate rear and output face 0.3~1mm apart from the microchannel plate, the CCD are close to
Behind the fluorescent screen, the multichannel hard X ray detection cathode, microchannel plate, fluorescent screen and CCD are built in cone
In the light seal cavity of shape front end, the pinhole array plate be located at the tapered front end of the smooth seal cavity and with described the moon
The image space of pole Au micro-strips is corresponding, the electric control system respectively with the cathode Au micro-strips, the microchannel plate Au
Micro-strip and the fluorescent screen electrical connection, for the multichannel hard X ray detect cathode input face and the microchannel plate it is defeated
Operating voltage is loaded between appearing and between the output face of the microchannel plate and the fluorescent screen.
Further, the multichannel hard X ray detection photocathode is included under hard X ray photon irradiation and the irradiation
Hard X ray photon is had an effect two for generating primary photoelectronic cathode substrate and being equidistantly given in the cathode substrate
A Yi Shang cathode channel is each equipped with one layer of alkali metal coating on the cathode channel inner wall, and all cathode channels are equal
To run through the penetrability duct of the cathode substrate tow sides, reached when resulting from the primary photoelectron in the cathode substrate
The alkali metal coating on the cathode channel inner wall will be ionized during the cathode channel so as to generate low energy secondary electrons, and it is described
Secondary electrons detect photocathode input face and described after snowslide is amplified in the cathode channel in the multichannel hard X ray
The microchannel group is come under voltage effect between the output face of microchannel；The diameter of all cathode channels is identical, is 3 μ
M-30 μm, the spacing between all adjacent cathode channels is identical, is 5 μm -35 μm, and all cathode channels with
Angle between the normal of the cathode substrate is consistent, is 0.1 ° -15 °.
Further, the composition of the cathode substrate is Pb, Si and O element, and the mass percent of wherein lead element is not low
In 40%.
Further, the working gain of the multichannel hard X ray detection photocathode is 5-100, the cathode substrate
Thickness is 0.5mm-3mm, and the secondary electrons are less than the electronics of 50eV for energy, the alkali metal coating for metal Na coating or
Metal K coating.
Further, the fluorescent screen includes fibre faceplate and is attached to the fibre faceplate towards the microchannel
Phosphor powder layer on the side of plate, the thickness of the phosphor powder layer is 3 μm -8 μm, and fluorescent powder used by the phosphor powder layer
For P11 types fluorescent powder or P20 type fluorescent powders.
Further, the pinhole array plate is made of W or Ta, and thickness is 10~50 μm, pinhole diameter for 5~
10μm。
Further, the cathode Au micro-strips, which by an Au micro-strip bend to serpentine and are vaporized on the hard X of the multichannel, penetrates
Line detection cathode input face on, the microchannel plate Au micro-strips by an Au micro-strip bend to serpentine be vaporized on it is described micro-
In the output face of channel plate, and the width of the Au micro-strips is 6~8mm.
Further, the cathode Au micro-strips are equally spaced by two or more Au micro-strips and are visited in the multichannel hard X ray
It surveys on the input face of cathode, the microchannel plate Au micro-strips are equally spaced by two or more Au micro-strips in the defeated of the microchannel plate
On appearing, and the width of the Au micro-strips is 6~8mm.
Compared with prior art, the utility model has the advantages that：
(1) the utility model is simple in structure, design is scientific and reasonable, easy to use, can be tens keV effectively to energy segment limit
The hard X ray of~hundreds of keV carries out the two-dimensional imaging with time resolution.
(2) when the utility model at work, negative high voltage is -500~-1500V and burst pulse is the negative of 100ps~900ps
High-voltage pulse and positive high voltage are 500~1500V and the positive high voltage pulse of burst pulse (100ps~900ps) is respectively by coaxial
Cable is coupled in cathode Au micro-strips and microchannel plate Au micro-strips, and the hard X ray pulse of target transmitting is irradiated by pinhole array plate
Onto the corresponding position of cathode Au micro-strips.When high-voltage pulse, with row wave speed (about 0.5c) to be transmitted to hard X ray micro- in cathode Au
During the corresponding image space of band, the multichannel hard X ray of the position detects the work of cathode and microchannel plate in high-pressure pulse electric
Under, the electronics that x-ray photon converts is doubled, the electron beam group that the output terminal in microchannel doubles is by microchannel plate
High electric field (voltage difference about 3keV) between fluorescent screen hits on fluorescent screen after accelerating and is converted into visible light pulses, by position
CCD or optical film acquisition after fluorescent screen.Counted by CCD/pixel or film gray scale change with time, it can obtain
Several (at a time interval) two dimensional images that hard X ray intensity changes over time.
(3) the utility model multichannel hard X ray detection cathode is used opens up equidistant array distribution in cathode substrate
Several cathode channels, and plating sets alkali metal coating on the inner wall of cathode channel, which can be metal Na platings
Layer or metal K coating when the hard X ray that energy segment limit is 10-300keV exposes to cathode substrate, can generate high energy primary light
Electronics, which enters after cathode channel the alkali metal coating that can ionize on cathode channel inner wall, and (metal Na is plated
Layer or metal K coating) to generate the secondary electrons that energy is less than 50eV, generated secondary electrons are in cathode channel by snow
The equipment for propagating to the cathode channel other end after collapsing amplification and being located behind receives detection.
(4) cathode substrate thickness of the utility model multichannel hard X ray detection cathode is 0.3-30mm, and shape can basis
Actual conditions are formulated, a diameter of 3 μm -30 μm of cathode channel, and the spacing of neighbouring cathode passage is 5 μm -35 μm, and cathode leads to
It is in one 0.1 ° -15 ° of angle between road and the normal of cathode substrate；The spacing of neighbouring cathode passage forms high energy primary photoelectricity
Son passes through " wall thickness " between the neighbouring cathode passage, and hindering equidistant array because of cathode substrate has multiple cathode channels, therefore
High energy primary photoelectron only needs to pass through " wall thickness " between cathode channel with regard to that can reach in cathode channel, therefore cathode substrate
It can do thick to detect hard X ray of the energy segment limit as 10-300keV；Meanwhile the utility model is 10- carrying out energy segment limit
During the detection of the hard X ray of 300keV, the process of generated primary photoelectron and secondary electrons is ionization, and ionization process
Transient physical process is then can be regarded as, time scale is about 1 × 10-21The de excitation relaxation time of s, far smaller than scintillator,
Effectively realize sunset glow time short purpose；Temporal resolution can at least so be improved to a magnitude compared with the prior art,
Also spatial resolution can be optimized to 0.06mm simultaneously.
Description of the drawings
Fig. 1 is the utility model structure diagram.
Fig. 2 is the utility model micro-strip using schematic diagram after two ways vapor deposition.
Fig. 3 is utility model works schematic diagram.
Fig. 4 detects cathode construction schematic diagram for the utility model multichannel hard X ray.
Fig. 5 is the Section A-A figure in Fig. 4.
Fig. 6 connects block diagram for each component of the utility model.
Wherein, reference numeral is corresponding entitled：
1- multichannels hard X ray detection cathode, 2- microchannel plates, 3- fluorescent screens, 4-CCD, 5- pinhole array plate, 6- are electrical
Control system, 7- cathode Au micro-strips, 8- electrically conductive layers, 9- microchannel plate Au micro-strips, 11- cathode substrates, 12- cathode channels, 13-
Alkali metal coating.
Specific embodiment
The utility model is described in further detail with embodiment for explanation below in conjunction with the accompanying drawings, and the mode of the utility model includes
But it is not limited only to following embodiment.
As shown in figures 1 to 6, a kind of hard X ray framing camera provided by the utility model, simple in structure, design science are closed
Reason, it is easy to use, can effectively to can segment limit carry out that there is time resolution for the hard X ray of the keV of tens keV~hundreds of
Two-dimensional imaging.The utility model includes multichannel hard X ray detection cathode 1, microchannel plate 2, fluorescent screen 3, CCD4, pinhole array
Plate 5 and electric control system 6, the input face vapor deposition of the multichannel hard X ray detection cathode 1 have cathode Au micro-strips 7, institute
The output face and the input face of the microchannel plate 2 for stating multichannel hard X ray detection cathode 1 fit, and described mostly logical
Vapor deposition has one layer of electrically conductive layer 8 between the output face of road hard X ray detection cathode 1 and the input face of the microchannel plate 2, described
Electrically conductive layer 8 is grounded, and the output face vapor deposition of the microchannel plate 2 has and the 7 corresponding microchannel plate Au of cathode Au micro-strips
Micro-strip 9, the fluorescent screen 3 are located at 2 rear of microchannel plate and apart from 0.3~1mm of output face of the microchannel plate 2, institutes
It states CCD4 to be close to behind the fluorescent screen 3, the multichannel hard X ray detection cathode 1, microchannel plate 2,3 and of fluorescent screen
CCD4 is built in the light seal cavity with tapered front end, and the pinhole array plate 5 is located at the taper of the smooth seal cavity
It is at front end and corresponding with the image space of the cathode Au micro-strips 7, the electric control system 6 respectively with the cathode Au
Micro-strip 7, the microchannel plate Au micro-strips 9 and the fluorescent screen (3) electrical connection, cathode 1 is detected for the multichannel hard X ray
Between the output face of input face and the microchannel plate 2 and between the output face of the microchannel plate 2 and the fluorescent screen 3
Load operating voltage.
Multichannel hard X ray detection photocathode 1 described in the utility model is included under hard X ray photon irradiation and the irradiation
Hard X ray photon have an effect and the primary photoelectronic cathode substrate 11 of generation and be equidistantly given in the cathode substrate 11
On more than two cathode channels 12, be equipped with one layer of alkali metal coating 13, Suo Yousuo on each 12 inner wall of cathode channel
It is through the penetrability duct of 11 tow sides of cathode substrate, when resulting from the cathode substrate 11 to state cathode channel 12
On primary photoelectron reach the cathode channel 12 when by the alkali metal coating 13 ionized on 12 inner wall of cathode channel so as to
Low energy secondary electrons are generated, and the secondary electrons are hard in the multichannel after snowslide is amplified in the cathode channel 12
The microchannel group is come under voltage effect between 1 input face of X-ray detection photocathode and the microchannel output face；It is all
The diameter of the cathode channel 12 is identical, is 3 μm -30 μm, and the spacing between all adjacent cathode channels 12 is identical, is
5 μm -35 μm, and the angle between all cathode channels 12 and the normal of the cathode substrate 11 is consistent are 0.1 ° -
15°。
The composition of cathode substrate 11 described in the utility model is Pb, Si and O element, and wherein the mass percent of lead element is not
Less than 40%, the working gain of the multichannel hard X ray detection photocathode 1 is 5-100, and the thickness of the cathode substrate 11 is
0.5mm-3mm, the secondary electrons are less than the electronics of 50eV for energy, and the alkali metal coating 13 is metal Na coating or metal
K coating.
The utility model multichannel hard X ray detection cathode is used opens up the several of equidistant array distribution in cathode substrate
A cathode channel, and on the inner wall of cathode channel plating set alkali metal coating, the alkali metal coating can be metal Na coating or
Metal K coating when the hard X ray that energy segment limit is 10-300keV exposes to cathode substrate, can generate high energy primary photoelectricity
Son, the high energy primary photoelectron enter after cathode channel alkali metal coating (the metal Na coating that can be ionized on cathode channel inner wall
Or metal K coating) to generate the secondary electrons that energy is less than 50eV, generated secondary electrons pass through snowslide in cathode channel
The equipment that the cathode channel other end is propagated to after amplification and is located behind receives detection.
The cathode substrate thickness of the utility model multichannel hard X ray detection cathode is 0.3-30mm, and shape can be according to reality
Border situation is formulated, a diameter of 3 μm -30 μm of cathode channel, and the spacing of neighbouring cathode passage is 5 μm -35 μm, and cathode channel
It is in one 0.1 ° -15 ° of angle between the normal of cathode substrate；The spacing of neighbouring cathode passage forms high energy primary photoelectron
" wall thickness " between the neighbouring cathode passage is passed through, hindering equidistant array because of cathode substrate there are multiple cathode channels, therefore high
Can primary photoelectron only need to pass through " wall thickness " between cathode channel with regard to that can reach in cathode channel, therefore cathode substrate can
It is thick to detect hard X ray of the energy segment limit as 10-300keV to do；Meanwhile the utility model is 10- carrying out energy segment limit
During the detection of the hard X ray of 300keV, the process of generated primary photoelectron and secondary electrons is ionization, and ionization process
Transient physical process is then can be regarded as, time scale is about 1 × 10-21The de excitation relaxation time of s, far smaller than scintillator,
Effectively realize sunset glow time short purpose；Temporal resolution can at least so be improved to a magnitude compared with the prior art,
Also spatial resolution can be optimized to 0.06mm simultaneously.
Fluorescent screen 3 described in the utility model includes fibre faceplate and is attached to the fibre faceplate towards described micro- logical
Phosphor powder layer on the side of guidance tape 2, the thickness of the phosphor powder layer is 3 μm -8 μm, and glimmering used by the phosphor powder layer
Light powder is P11 types fluorescent powder or P20 type fluorescent powders.The pinhole array plate 5 is made of W or Ta, and thickness is 10~50 μm,
Its pinhole diameter is 5~10 μm, and the specific thickness of the pinhole array plate 5 and pinhole diameter are according to the energy of surveyed X-ray
Section selection, while can adjust the amplification factor of camera system by adjusting the longitudinal separation of pinhole array plate 5.
Cathode Au micro-strips 7 described in the utility model can be by an Au micro-strip bend to serpentine be vaporized on it is described more
It is equally spaced on the input face of passage hard X ray detection cathode 1 or by two or more Au micro-strips hard in the multichannel
On the input face of X-ray detection cathode 1, preferably four Au micro-strips；Likewise, the microchannel plate Au micro-strips 9 can be by
One Au micro-strip bends to serpentine and is vaporized in the output face of the microchannel plate 2 or by two or more Au micro-strips
It is equally spaced in the output face of the microchannel plate 2, preferably four Au micro-strips.The width of the Au micro-strips is 6~8mm.
The utility model can also use optical film that CCD is replaced to carry out two-dimensional imaging.
When the utility model at work, the negative high voltage that negative high voltage is -500~-1500V and burst pulse is 100ps~900ps
Pulse and positive high voltage pass through coaxial cable respectively for the positive high voltage pulse of 500~1500V and burst pulse (100ps~900ps)
It is coupled in cathode Au micro-strips and microchannel plate Au micro-strips, the hard X ray pulse of target transmitting is irradiated to the moon by pinhole array plate
On the corresponding position of Au micro-strips of pole.When high-voltage pulse is transmitted to hard X ray in cathode Au micro-strips with row wave speed (about 0.5c)
During corresponding image space, the multichannel hard X ray of the position detects cathode and microchannel plate under the action of high-pressure pulse electric,
The electronics that x-ray photon converts is doubled, the electron beam group that the output terminal in microchannel doubles is by microchannel plate and glimmering
High electric field (voltage difference about 3keV) between optical screen hits on fluorescent screen after accelerating and is converted into visible light pulses, glimmering by being located at
CCD or optical film acquisition after optical screen.Counted by CCD/pixel or film gray scale change with time, it can obtain hard X
Several (at a time interval) two dimensional images that transmitted intensity changes over time.
Above-described embodiment is only one of preferred embodiment of the utility model, should not be taken to limit the utility model
Protection domain, as long as the utility model body design thought and that mentally makes have no the change of essential meaning or profit
Color, the technical issues of solving, are still consistent with the utility model, should all be included in the scope of protection of the utility model
Within.
Claims (8)
1. a kind of hard X ray framing camera, it is characterised in that：Including multichannel hard X ray detection cathode (1), microchannel plate
(2), fluorescent screen (3), CCD (4), pinhole array plate (5) and electric control system (6), the multichannel hard X ray detection
The input face vapor deposition of cathode (1) has a cathode Au micro-strips (7), the output face of the multichannel hard X ray detection cathode (1) with it is described
The input face of microchannel plate (2) fits, and the multichannel hard X ray detection cathode (1) output face with it is described micro-
Vapor deposition has one layer of electrically conductive layer (8), electrically conductive layer (8) ground connection, the microchannel plate between the input face of channel plate (2)
(2) output face vapor deposition has and the corresponding microchannel plate Au micro-strips (9) of the cathode Au micro-strips (7), fluorescent screen (3) position
In the microchannel plate (2) rear and 0.3~1mm of output face apart from the microchannel plate (2), the CCD (4) is close to institute
It states behind fluorescent screen (3), the multichannel hard X ray detection cathode (1), microchannel plate (2), fluorescent screen (3) and CCD (4)
It is built in the light seal cavity with tapered front end, before the pinhole array plate (5) is located at the taper of the smooth seal cavity
It is at end and corresponding with the image space of the cathode Au micro-strips (7), the electric control system (6) respectively with the cathode
Au micro-strips (7), the microchannel plate Au micro-strips (9) and the fluorescent screen (3) electrical connection, detect for the multichannel hard X ray
Between the output face of the input face and the microchannel plate (2) of cathode (1) and output face and the institute of the microchannel plate (2)
It states and loads operating voltage between fluorescent screen (3).
2. a kind of hard X ray framing camera according to claim 1, it is characterised in that：The multichannel hard X ray detection
Photocathode (1) is included under hard X ray photon irradiation primary photoelectronic with the generation of having an effect of the hard X ray photon of the irradiation
Cathode substrate (11) and the more than two cathode channels (12) being equidistantly given in the cathode substrate (11), it is each described
One layer of alkali metal coating (13) is equipped on cathode channel (12) inner wall, all cathode channels (12) are through described the moon
The penetrability duct of pole substrate (11) tow sides, when result from the primary photoelectron in the cathode substrate (11) reach described in
The alkali metal coating (13) on cathode channel (12) inner wall will be ionized during cathode channel (12) so as to generate low energy secondary electrons,
And the secondary electrons detect photocathode after snowslide is amplified in the cathode channel (12) in the multichannel hard X ray
(1) the microchannel group is come under the voltage effect between input face and the microchannel output face；All cathode channels
(12) diameter is identical, is 3 μm -30 μm, and the spacing between all adjacent cathode channels (12) is identical, is 5 μm of -35 μ
M, and the angle between all cathode channels (12) and the normal of the cathode substrate (11) is consistent, is 0.1 ° -15 °.
3. a kind of hard X ray framing camera according to claim 2, it is characterised in that：The cathode substrate (11) into
Part is Pb, Si and O element, and the wherein mass percent of lead element is not less than 40%.
4. a kind of hard X ray framing camera according to claim 3, it is characterised in that：The multichannel hard X ray detection
The working gain of photocathode (1) is 5-100, and the thickness of the cathode substrate (11) is 0.5mm-3mm, and the secondary electrons are energy
Electronics of the amount less than 50eV, the alkali metal coating (13) are metal Na coating or metal K coating.
5. a kind of hard X ray framing camera according to claim 4, it is characterised in that：The fluorescent screen (3) includes optical fiber
Panel and the fibre faceplate is attached to towards the phosphor powder layer on the side of the microchannel plate (2), the phosphor powder layer
Thickness for 3 μm -8 μm, and fluorescent powder is P11 types fluorescent powder or P20 type fluorescent powders used by the phosphor powder layer.
6. a kind of hard X ray framing camera according to claim 5, it is characterised in that：The pinhole array plate (5) is by W
Or Ta is made, thickness is 10~50 μm, and pinhole diameter is 5~10 μm.
7. a kind of hard X ray framing camera according to claim 1-6 any one, it is characterised in that：The cathode Au
Micro-strip (7) bends to serpentine by an Au micro-strip and is vaporized on the input face of the multichannel hard X ray detection cathode (1),
The microchannel plate Au micro-strips (9) are bent to the output face that serpentine is vaporized on the microchannel plate (2) by an Au micro-strip
On, and the width of the Au micro-strips is 6~8mm.
8. a kind of hard X ray framing camera according to claim 1-6 any one, it is characterised in that：The cathode Au
Micro-strip (7) is equally spaced by two or more Au micro-strips on the input face for detecting cathode (1) in the multichannel hard X ray, described
Microchannel plate Au micro-strips (9) are equally spaced by two or more Au micro-strips in the output face of the microchannel plate (2), and described
The width of Au micro-strips is 6~8mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721623062.3U CN207440514U (en) | 2017-11-29 | 2017-11-29 | A kind of hard X ray framing camera |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721623062.3U CN207440514U (en) | 2017-11-29 | 2017-11-29 | A kind of hard X ray framing camera |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207440514U true CN207440514U (en) | 2018-06-01 |
Family
ID=62284981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721623062.3U Expired - Fee Related CN207440514U (en) | 2017-11-29 | 2017-11-29 | A kind of hard X ray framing camera |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207440514U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109801821A (en) * | 2019-02-01 | 2019-05-24 | 中国工程物理研究院激光聚变研究中心 | A kind of framing camera photocathode and preparation method thereof based on inorganic perovskite |
| CN113589637A (en) * | 2021-06-18 | 2021-11-02 | 中国工程物理研究院激光聚变研究中心 | Hard X-ray sensitive framing camera |
-
2017
- 2017-11-29 CN CN201721623062.3U patent/CN207440514U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109801821A (en) * | 2019-02-01 | 2019-05-24 | 中国工程物理研究院激光聚变研究中心 | A kind of framing camera photocathode and preparation method thereof based on inorganic perovskite |
| CN113589637A (en) * | 2021-06-18 | 2021-11-02 | 中国工程物理研究院激光聚变研究中心 | Hard X-ray sensitive framing camera |
| CN113589637B (en) * | 2021-06-18 | 2023-12-01 | 中国工程物理研究院激光聚变研究中心 | Hard X-ray sensitive framing camera |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE112015001542B4 (en) | Right-angled time-of-flight detector with extended service life | |
| CN107402401B (en) | Multichannel hard X-ray imaging detector with time gating | |
| JP2014067730A (en) | Image intensifier device | |
| CN107765506B (en) | Hard X-ray framing camera and method for detecting hard X-rays by using same | |
| CN207440514U (en) | A kind of hard X ray framing camera | |
| Zhang et al. | A supersonic gas-jet based beam induced fluorescence prototype monitor for transverse profile determination | |
| EP0242024B1 (en) | Radiation image intensifier tubes | |
| CN208044078U (en) | A kind of multichannel hard X ray position sensitive detector | |
| CN110197782A (en) | A kind of dot matrix configuration electronics drift tube | |
| Lecomte et al. | Channel electron multipliers: Properties, development and applications | |
| CN107703712B (en) | Hard X-ray stripe camera and method for detecting hard X-ray energy section thereof | |
| Vallières et al. | Thomson parabola and time-of-flight detector cross-calibration methodology on the ALLS 100 TW laser-driven ion acceleration beamline | |
| CN209912836U (en) | Lattice configuration electron drift tube | |
| CN207396967U (en) | A kind of hard X ray streak camera | |
| CN110189969B (en) | Magnetic field constraint pulse broadening imaging system | |
| Huang et al. | Measurement of energy distribution of output electrons from a microchannel plate based on vacuum photodiode | |
| Kruglov et al. | A beam diagnostic system for low-intensity radioactive beams | |
| CN207216033U (en) | It is a kind of to carry time-gated multichannel hard x-ray imaging detector | |
| CN207165513U (en) | A kind of multichannel hard X ray detects photocathode | |
| CN210136836U (en) | Magnetic field constraint pulse broadening imaging system | |
| Wittenburg | Experience with the residual gas ionization beam profile monitors at the DESY proton accelerators | |
| US9105459B1 (en) | Microchannel plate assembly | |
| CN113589637A (en) | Hard X-ray sensitive framing camera | |
| CN107369599B (en) | Multi-purpose toy channel hard X radiation detection photocathode | |
| Jaanimagi et al. | Time‐resolving x‐ray diagnostics for ICF |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180601 Termination date: 20201129 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |