CN207439919U - A kind of optical biosensor and its Equipment for Heating Processing - Google Patents

A kind of optical biosensor and its Equipment for Heating Processing Download PDF

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Publication number
CN207439919U
CN207439919U CN201721207519.2U CN201721207519U CN207439919U CN 207439919 U CN207439919 U CN 207439919U CN 201721207519 U CN201721207519 U CN 201721207519U CN 207439919 U CN207439919 U CN 207439919U
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particle
substrate
meshbeltfurnace
guipure
optical biosensor
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洪礼清
李建霖
刘仁源
程四兴
郑兰花
庾琼
蒋奎胜
焦政
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Dongguan Dongyang Guangke Research and Development Co Ltd
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Dongguan Dongyang Guangke Research and Development Co Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • G01N21/553Attenuated total reflection and using surface plasmons
    • G01N21/554Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates
    • C23C14/205Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5806Thermal treatment

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Abstract

The utility model provides a kind of optical biosensor and its Equipment for Heating Processing.The biosensor, including:The base board unit includes substrate, and the substrate has light transmission, and the light transmission is light transmittance more than 75%;The nano-particle unit includes metal nanoparticle, and the metal nanoparticle is formed at the substrate surface;The detection unit includes detection particle, and the detection particle is connected on the substrate, between the gap of the metal nanoparticle.On the other hand, a kind of Equipment for Heating Processing is provided, the Equipment for Heating Processing is meshbeltfurnace, including:Including heating zone, cooling zone, feeding area, discharging area and guipure.The utility model has used guipure furnace apparatus, can realize while can obtain the nano-particle of function admirable and continuously produce, simplify production technology, greatly improve production efficiency.

Description

A kind of optical biosensor and its Equipment for Heating Processing
Technical field
The utility model is related to biochemistry detection field, specifically, the utility model is related to a kind of optical biosensor and Its Equipment for Heating Processing.
Background technology
Metal nanoparticle is mainly fixed on substrate by the detection operation principle of optical biosensor, is then modified Biomolecule according to the LSPR effects of metal nanoparticle, detects optics signal intensity to judge the combination of biomolecule.
The synthesis of metal nanoparticle is usually using liquid phase chemical reaction method, according to the special electrodes of metal target electricity Gesture selects corresponding metal salt or metallo-organic compound as presoma, in water or organic solvent, using reducing agent, Electrochemistry, photochemistry either biochemical method reducing metal salt ion or by ultrasound, thermally decomposable metal compound be Metal simple-substance, and choose respective surfaces activating agents, function key and polymer as needed as protective agent, control crystal into Core, the speed of growth and direction prepare the metal nanoparticle of set size and pattern.CN201210005733.5、 CN201310407111.X etc. describes the liquid phase method synthesis path of gold nano grain.
For prepared by the liquid-phase chemical reaction method of current nano material, also there is particle agglomeration, grains to some extent Footpath is uneven, purity is low, performance is unstable, synthesis path is compared with the problems such as long, influence factor is more, low yield.
The metal nanoparticle solution of chemical synthesis can be by trims such as bovine serum albumins to the affine of glass substrate Power is fixed on glass, is fixed however, depending merely on affinity, there are stability it is poor the problem of, be unfavorable for preserving for a long time.
Metal nanoparticle is fixed on glass with physical method there are also research, such as on the glass substrate after plated film, Then to glass substrate high-temperature calcination, beam bombardment, microwave plasma heat treatment etc., but due to high-temperature calcination heating and cooling Journey is longer, and gold grain is easily reunited, and efficiency is also low;Beam bombardment, electron beam active area is limited, and efficiency is also undesirable;Microwave For Plasma heat teratment when scale is handled, the uniformity controlling of microwave plasma heat treatment is difficult there are larger technology Topic, control cost are high.Physical prepares metal nanoparticle, and also in the prevalence of taking, longer, inefficient, equipment is expensive, step The deficiencies of rapid cumbersome.
Utility model content
The application is that the discovery of following facts and problem and understanding are made based on utility model people:
For biosensor, main function component is metal nanoparticle, and the quality of metal nanoparticle affects The test effect of biosensor.Current some biosensors or be that metal nanoparticle and substrate combination power are inadequate, Detection sensitivity or be that reference sample is needed in test process is influenced, detection is cumbersome.Meanwhile for biosensor Preparation, it is committed step to prepare metal nanoparticle that is stable, uniform, being combined with substrates into intimate early period.At present In the method for preparing biosensor, for the nano-particle stability for preparing the method for metal nanoparticle or being Deficiency or it is the conjugation of nano-particle and substrate not enough or is more demanding to Preparation equipment or is production efficiency It is too low or possess a variety of shortcomings.
For this purpose, the utility model the first aspect provides a kind of optical biosensor, optical biosensor tool Have the advantages that stability is high, detection sensitivity is high, easy to operate.
To achieve the above object, embodiment according to the present utility model proposes a kind of optical biosensor, the optics Biosensor includes:Base board unit, nano-particle unit, detection unit, it is characterised in that:Base board unit includes substrate, institute Substrate is stated with light transmission, the light transmission is light transmittance more than 75%;The nano-particle unit includes metal nano Particle, the metal nanoparticle are formed at the substrate surface;The detection unit includes detection particle, the detection particle It connects on the substrate, between the gap of the metal nanoparticle.Wherein, the metal nanoparticle is by heat It manages and is formed, specifically, being first to deposit at least one layer of metallic film in the substrate surface, then placed it in meshbeltfurnace, It is heat-treated under gas shield, so that metallic film melting contracting receives and forms metal nano of the combination in the substrate surface Particle.It can obtain as a result, and substrate surface is combined closely and equally distributed metal nanoparticle, ensure that biosensor Stability.
Some embodiments according to the present utility model, the substrate are glass, quartz, crystalline ceramics, polymer or cloud Master slice.
Some embodiments according to the present utility model, the metal nanoparticle is gold, silver, any or its group of chromium It closes.
Some embodiments according to the present utility model, the metal nanoparticle are chromium and golden alloy, chromium and silver The alloy of alloy, chromium and electrum.
Some embodiments according to the present utility model, the metal nanoparticle grain size are 2-40nm.
Some embodiments according to the present utility model, the detection unit include detection particle, and the detection particle is Polypeptide, protein, oligosaccharide or lipid.
The utility model second aspect proposes a kind of Equipment for Heating Processing for preparing the optical biosensor, the heat Processing equipment is meshbeltfurnace, including:Heating zone, cooling zone, feeding area, discharging area and guipure.
Some embodiments according to the present utility model, the meshbeltfurnace further include manipulator, can use manipulator will The substrate is placed in meshbeltfurnace, after heat treatment, is reused manipulator and is removed the substrate from meshbeltfurnace.
Some embodiments according to the present utility model, the meshbeltfurnace further include gas outlet, air inlet.
Some embodiments according to the present utility model, the air inlet are arranged on cooling zone, heating zone, the gas outlet It is arranged on heating zone.
Some embodiments according to the present utility model, the heat source of the heating zone is infrared heating.
Description of the drawings
Fig. 1 shows the biosensor structure schematic diagram according to the utility model embodiment.
Fig. 2 shows the preparation method flow chart of the biosensor according to the utility model embodiment.
Fig. 3 shows the structure diagram of the meshbeltfurnace according to the utility model embodiment.
Fig. 4 is shown according to spectrum change figure before and after the modification of the biosensor of the utility model embodiment.
Reference numeral:Base board unit 100, nano-particle unit 200, detection unit 300, determinand 400;Meshbeltfurnace 600, Feeding area 610, discharging area 620, heating zone 630, cooling zone 640, guipure 650, gas outlet 601, air inlet 602, manipulator 700。
Specific embodiment
The embodiment of the utility model is described below in detail, the example of the embodiment is shown in the drawings.Below by The embodiment being described with reference to the drawings is exemplary, it is intended to for explaining the utility model, and it is not intended that new to this practicality The limitation of type.
In the one side of the utility model, optical biosensor is prepared the utility model proposes a kind of.According to this The embodiment of utility model, the biosensor include base board unit 100, nano-particle unit 200 and detection unit 300.
Base board unit 100 includes substrate, is provided a supporting role to subsequently prepare nano-particle.This biosensor Detection means is based on optic test, therefore it is required that substrate must have light transmission, in order to detect the variation of absorption spectrum. Embodiment according to the present utility model, it is desirable that substrate light transmittance is more than 75%.
The substrate material is glass, quartz, crystalline ceramics, polymer or mica sheet.People can be as needed, selection Different materials make substrate, as long as light transmittance, which meets, is more than 75%.For example, in some embodiments, substrate is glass, is taken Material is convenient, cheap.In some embodiments, baseplate material is quartz glass, and light transmittance is high, and hardness is high.In some implementations In example, baseplate material is mica sheet or crystalline ceramics, and property is stablized, is unlikely to deform.
Nano-particle unit 200 is formed at the substrate surface, wherein, it is first to deposit at least one layer in the substrate surface Metallic film, then place it in meshbeltfurnace 600, is heat-treated under gas shield so that metallic film melting contracting receive and Form metal nanoparticle of the combination in the substrate surface.
After forming nano-particle on substrate, due to LSPR (resonance of local surfaces particle) effect of nano-particle, when having When light penetrates substrate, the variation of delustring intensity is had in specific position, and this variation can also be subject to the material, greatly of nano-particle The factors such as the dielectric constant of small, shape, interparticle distance and ambient enviroment influence.Therefore, nano-particle is combined with substrate The reappearance of stability, the uniformity of nano-particle and preparation method, by influence biosensor detection stability and Detection sensitivity.The obtained metal nanoparticle of the utility model has good stability and uniformity, because of heat treatment Under high temperature, substrate surface, metallic film can be heated and become molten condition, and metallic, which can be spread, at this time penetrates into substrate table Face, meanwhile, metallic film also can form spherical nano-particle because melting contracting is received during the effect with surface tension, be formed as a result, It combines closely with substrate surface and equally distributed metal nanoparticle.
Some embodiments according to the present utility model, the metallic film are gold, silver, chromium or its combination.To obtain more Stable metal nanoparticle.
Some embodiments according to the present utility model, the metallic film is at least one layer, the bottom contacted with substrate For chromium, layer deposition gold, silver or its combination.After Overheating Treatment, substrate surface metallic film into variation for separately Spherical metal nanoparticle.Bottom is chromium metallic film, can make to have more between the metal nanoparticle and substrate to be formed Good combination power.It is since chromium more easily reachs molten condition, part chromium ion is made to infiltrate through in substrate, forms stronger knot It closes.Based on this, the metal nanoparticle formed by the metallic film is chromium and the alloy of gold, the alloy of chromium and silver, chromium With the alloy of electrum.
Some embodiments according to the present utility model, the thickness of metal film are 1-20nm.The thickness of film determines The grain size of the nano-particle subsequently obtained, utility model people learns by largely testing, film thickness and metallic nanoparticle Son grain size it is proportional, but when film thickness it is excessively thin or it is blocked up all it is unfavorable be used in heat treatment when contracting receive obtain nano-particle.
Some embodiments according to the present utility model, the metal nanoparticle grain size are 2-40nm.Metallic nanoparticle It is mutually suitable with the particle size of determinand 400 that the grain size of son has, to obtain more accurately testing result.
Detection unit 300 is modified in the substrate surface, and between the interval of the metal nanoparticle.The inspection Surveying unit 300 includes most detection particles, when detecting capturing determinand 400.The detection grain of the detection unit 300 Son forms specificity with target determinand 400 and is combined.In other words, i.e., specifically detection particle can be to be measured with specific target Object 400 is combined, and the different of target determinand 400 can be selected suitable detection particle as needed, be enable detection unit 300 Achieve the effect that qualitative detection.
Specifically, detection unit 300 on being modified on the substrate for embedded nano-particle, you can be referred to as bio-sensing Device.Due to LSPR (resonance of local surfaces particle) effect of nano-particle, examined in the compartment modification of nano-particle unit 200 After surveying unit 300, the variation of delustring intensity is similarly had in specific position, after further capture determinand 400, biology The extinction wavelength and delustring intensity of sensor can change, and people can sentence according to the variation of extinction wavelength and delustring intensity It is disconnected whether to contain determinand 400.
The utility model second aspect proposes a kind of preparation method of optical biosensor, comprises the following steps:
S100:A substrate is provided, on the substrate deposited metal film layer;
Some embodiments according to the present utility model, in this step, the method in deposition are magnetron sputtering, heat Evaporation, electron beam evaporation or its combination.In some embodiments, metal layer is obtained by magnetically controlled sputter method, so as to More preferably being formed on substrate evenly, and predetermined metal layer thickness can be controlled.
Some embodiments according to the present utility model, in this step, the deposited metal film layer are first to deposit one Layer chromium, redeposited one layer of gold, silver or electrum.After Overheating Treatment, substrate surface metallic film into variation to be alternate Every spherical metal nanoparticle.Bottom is chromium metallic film, can make to have between the metal nanoparticle and substrate to be formed Have and preferably combine power.It is since chromium more easily reachs molten condition, part chromium ion is made to infiltrate through in substrate, is formed more secured Combination.
S200:The substrate is placed in meshbeltfurnace 600, protective gas, at a temperature of be heat-treated, make metallic film It melts as metal nanoparticle, becomes nano-particle unit 200;
The heat treatment refers to the heat that meshbeltfurnace 600 provides, metal layer is made to melt at high temperature, and forms spacer From metal nanoparticle equal and with predetermined particle diameter, and then expose substrate portion surface.The metal nanoparticle Grain size can increase with the increase of the thickness of metal layer, you can to adjust metal by controlling the thickness of the metal layer prepared The grain size of nano-particle obtains the metal nanoparticle of predetermined particle diameter, to obtain higher detection sensitivity.At overheat Reason, it is metal nanoparticle that can not only make metal layer variation, and nanoparticle fraction can also be made to be embedded in substrate, fixes nano-particle, Improve the stability of metal nanoparticle application.It in addition, also will be according to the length of the different adjustment heat treatment time of metal layer thickness Degree, when metal layer is thicker or area is bigger, it is necessary to which increase heat treatment time makes metal layer reach melting to provide enough heats State.
Some embodiments according to the present utility model, in this step, the meshbeltfurnace 600 include heating zone 630, cold But area 640, feeding area 610, discharging area 620 and guipure 650.The heating zone 630 has heat source to provide heat treatment institute calorific requirement, In some embodiments, heat source can be infrared heating mode, to provide more stable heat.
The meshbeltfurnace 600 further includes gas outlet 601, air inlet 602, and protective gas enters from air inlet 602, by adding Hot-zone 630, cooling zone 640 are flowed out from gas outlet 601.Heating zone 630 leads to protective gas to prevent metal layer or substrate in Re Chu It is aoxidized during reason, cooling zone 640 passes to gas to prevent quenching is completed in heat treatment from causing substrate and nano metal particles Stability.650 circulating rolling of guipure connects 4 areas, and heat treatment process is that the composite component is placed on feeding area On 610 guipure 650, with the guipure 650 of rolling, by heating zone 630 and cooling zone 640, discharging area 620 is reached, is removed. The metal film variation on the composite component surface through Overheating Treatment at this time is the metal nanoparticle of predetermined particle diameter.It can be as needed The rate of guipure 650 is adjusted, makes composite component enough in 630 residence time of heating zone, to ensure to reach thermal effectiveness.Make It is heat-treated with meshbeltfurnace 600, can realize the mass continuous production of substrate, and it is easy to operate, production cost is low, favorably In realization industrialized production.
Compared with the preparation method of existing biosensor, the utility model has used 600 equipment of meshbeltfurnace, can obtain To function admirable nano-particle while can realize and continuously produce, simplify production technology, greatly improve Production efficiency.It is such as heat-treated, is generally required by temperature program, heat preservation program, cooling journey using conventional heating equipment Sequence completes entire heat treatment process.And the utility model has used 600 equipment of meshbeltfurnace, the guipure 650 of rolling can continue Substrate is constantly transported to heating zone 630, reduces temperature program and cooling process, production efficiency improves at least 1/2.
Some embodiments according to the present utility model, it is in this step, further comprising the steps of:Use manipulator 700 The substrate is placed in meshbeltfurnace 600, after heat treatment, reuses manipulator 700 by the substrate from meshbeltfurnace 600 In remove.Using 700 setting-out of manipulator and sampling, flow can realize automation, and production efficiency is high.
Some embodiments according to the present utility model, in this step, the protective gas is nitrogen, argon gas, dioxy Change at least one of carbon.In some embodiments, gas used in protective gas is nitrogen, to reach better heat Treatment effect.
Some embodiments according to the present utility model, in this step, the temperature are 200 DEG C~900 DEG C.To reach Better thermal effectiveness.
S300:Modifying detection particle in the substrate surface becomes detection unit 300.
Some embodiments according to the present utility model, in this step, the detection particle refers to can be with determinand 400 The probe molecule of specific binding, such as polypeptide, protein, oligosaccharide, lipid are more specifically adalimumab (TNF-a), Rabbit-anti HCP antibody, antibody of the goat-anti rabbit with HRP, human IgG, alpha-fetoprotein, biotin, Streptavidin etc..
Some embodiments according to the present utility model, in this step, the modification are to modify to detect in substrate surface Particle becomes optical bio sensor finished product to form detection unit 300, and then prepare.Specifically, it is pre- by the substrate It is soaked at a temperature of if in the solution containing the detection particle, after preset time, the detection particle is made to be incorporated into institute State substrate surface.
Some embodiments according to the present utility model, in this step, the modification of the detection particle, is according to target The type of determinand 400, selection can form the detection particle that specificity is combined with target determinand 400.In order to make detection particle It can preferably modify in the substrate surface, first can also modify coupling agent in substrate surface.For example, when target determinand 400 For avidin when, using the specificity that avidin is combined with biotin, using biotin as detection particle, due to biotin Can not stable bond directly be formed with substrate, therefore, can be combined first with being easier to be combined with substrate and can be formed with biotin The amine propyl trimethoxy silane (APTMS) of key forms APTMS molecular films in the substrate surface, biotin is added, with regard to energy Biotin is made to be modified at the state of substrate surface indirectly through APTMS, the combination of APTMS and biotin is made to become detection grain Son is combined by biotin with the specificity of avidin to test whether existed by avidin, therefore, using the optical bio Sensor base screens avidin.
In conclusion the utility model provides a kind of biosensor and preparation method thereof, biosensor includes base Plate unit 100, nano-particle unit 200 and detection unit 300, nano-particle unit 200 are to surface using meshbeltfurnace 600 The substrate for having metal layer is heat-treated and is formed, detection unit 300 be by be soaked in containing detection particle solution in and It obtains.On the whole, the utility model offer biosensor matrix and preparation method thereof possesses advantages below:
1st, simple, the quick qualitative detection determinand of this biosensor matrix energy, before and after matrix absorption determinand The variation of absorption peak strength can determine whether that containing determinand and detection sensitivity is high, testing result is reliably effective.
2nd, this biosensor matrix has a wide range of application, detection unit can be selected according to the difference of determinand it is different can The detection particle combined with determinand formation specificity.
3rd, the preparation method equipment of the utility model is simple, easy to operate, and manufacture efficiency is high, beneficial to industrialized production.
4th, the biosensor structure obtained by the preparation method of the utility model is stablized, and nano-particle is combined jail with substrate It is Gu not easily to fall off.
In order to which those skilled in the art is made to more fully understand the technical solution of the utility model, one is disclosed further below The utility model is described in further detail for a little non-limiting embodiments.
Reagent used in the utility model can be bought or can be by described by the utility model from the market Method be prepared.
In the utility model, mmol expressions mM, h represents hour, g expressions gram, and ml represents milliliter.
In the utility model, filming equipment is coating machine Q150T ES, Quorum Q150RS, and guipure furnace apparatus is The infrared fast burning meshbeltfurnace of HSH2503-0510Z types, metallic particles detection device are Dimension Icon AFM, and photometric detection is set Standby is 5000 ultraviolet-visibles of Cary-near infrared spectrometer.
Embodiment 1
Glass substrate is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer of 0.5nm Chromium film, then plate the golden film of last layer 1nm again.The glass substrate for having plated film is placed on meshbeltfurnace front end with manipulator, It is sent to using guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, heated with infrared quartz fluorescent tube, used Thermocouple temperature control, cavity temperature control are 200 DEG C.The transmission speed of guipure is 100mm/min, and the sample on guipure reaches guipure Sample with manipulator is taken out, it is packaged to be put into sample box by stove rear end.Guipure fore-stream sample color is pale blue, by infrared fast The rapid thermal treatment of meshbeltfurnace is burnt, the color sample of guipure rear end becomes rose pink, and the result is shown in experimental result forms.
Embodiment 2
Glass substrate is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer of 0.5nm Chromium film, then plate the golden film of last layer 2nm again.The glass substrate for having plated film is placed on meshbeltfurnace front end with manipulator, It is sent to using guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, heated with infrared quartz fluorescent tube, used Thermocouple temperature control, cavity temperature control are 400 DEG C.The transmission speed of guipure is 200mm/min, and the sample on guipure reaches guipure Sample with manipulator is taken out, it is packaged to be put into sample box by stove rear end.Guipure fore-stream sample color is pale blue, by infrared fast The rapid thermal treatment of meshbeltfurnace is burnt, the color sample of guipure rear end becomes rose pink, and the result is shown in experimental result forms.
Embodiment 3
Glass substrate is put into electron beam evaporation equipment, using film thickness monitoring or time control pattern, first plates one layer Then the chromium film of 0.5nm plates the golden film of last layer 4nm again.Before the glass substrate for having plated film is placed on meshbeltfurnace with manipulator On end, it is sent to using guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, added with infrared quartz fluorescent tube Heat, with thermocouple temperature control, cavity temperature control is 400 DEG C.The transmission speed of guipure is 300mm/min, and the sample on guipure arrives Up to meshbeltfurnace rear end, sample is taken out with manipulator, it is packaged to be put into sample box.Guipure fore-stream sample color is pale blue, is passed through The infrared fast rapid thermal treatment for burning meshbeltfurnace, the color sample of guipure rear end become rose pink, and the result is shown in experimental result forms.
Embodiment 4
Transparent ceramic base is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer Then the chromium film of 0.5nm plates the golden film of last layer 6nm again.The transparent ceramic base for having plated film is placed on guipure with manipulator On the end of stokehold, it is sent to using guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, with infrared quartz lamp Pipe heats, and with thermocouple temperature control, cavity temperature control is 400 DEG C.The transmission speed of guipure is 400mm/min, the sample on guipure Product reach meshbeltfurnace rear end, take out sample with manipulator, it is packaged to be put into sample box.Guipure fore-stream sample color is pale blue, By the infrared fast rapid thermal treatment for burning meshbeltfurnace, the color sample of guipure rear end becomes rose pink, and the result is shown in experimental results Form.
Embodiment 5
Glass substrate is put into thermal evaporation apparatus, using film thickness monitoring or time control pattern, first plates one layer of 0.5nm's Then chromium film plates the golden film of last layer 8nm again.The glass substrate for having plated film is placed on meshbeltfurnace front end with manipulator, profit It is sent to guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, heated with infrared quartz fluorescent tube, with heat Galvanic couple temperature control, cavity temperature control are 500 DEG C.The transmission speed of guipure is 400mm/min, and the sample on guipure reaches meshbeltfurnace Sample with manipulator is taken out, it is packaged to be put into sample box by rear end.Guipure fore-stream sample color is pale blue, by infrared fast burning The rapid thermal treatment of meshbeltfurnace, the color sample of guipure rear end become rose pink, and the result is shown in experimental result forms.
Embodiment 6
Glass substrate is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer of 1nm's Then chromium film plates the golden film of last layer 8nm again.The glass substrate for having plated film is placed on meshbeltfurnace front end with manipulator, profit It is sent to guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, heated with infrared quartz fluorescent tube, with heat Galvanic couple temperature control, cavity temperature control are 600 DEG C.The transmission speed of guipure is 600mm/min, and the sample on guipure reaches meshbeltfurnace Sample with manipulator is taken out, it is packaged to be put into sample box by rear end.Guipure fore-stream sample color is pale blue, by infrared fast burning The rapid thermal treatment of meshbeltfurnace, the color sample of guipure rear end become rose pink, and the result is shown in experimental result forms.
Embodiment 7
Mica plate base is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer of 1nm Chromium film, then plate the golden film of last layer 5nm again.The mica plate base for having plated film is placed on meshbeltfurnace front end with manipulator On, it is sent to using guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, added with infrared quartz fluorescent tube Heat, with thermocouple temperature control, cavity temperature control is 600 DEG C.The transmission speed of guipure is 800mm/min, and the sample on guipure arrives Up to meshbeltfurnace rear end, sample is taken out with manipulator, it is packaged to be put into sample box.Guipure fore-stream sample color is pale blue, is passed through The infrared fast rapid thermal treatment for burning meshbeltfurnace, the color sample of guipure rear end become rose pink, and the result is shown in experimental result forms.
Embodiment 8
Glass substrate is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer of 2nm's Then chromium film plates the electrum film of last layer 10nm again (silver is containing 10%).The glass substrate for having plated film is placed with manipulator On meshbeltfurnace front end, it is sent to using guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to nitrogen protective gas in furnace chamber, use is infrared Quartz burner heats, and with thermocouple temperature control, cavity temperature control is 800 DEG C.The transmission speed of guipure be 1000mm/min, guipure On sample reach meshbeltfurnace rear end, sample is taken out with manipulator, it is packaged to be put into sample box.Guipure fore-stream sample color is Pale blue, by the infrared fast rapid thermal treatment for burning meshbeltfurnace, the color sample of guipure rear end becomes rose pink, and the result is shown in experiments As a result form.
Embodiment 9
Sapphire substrate is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer of 2nm Chromium film, then plate the golden film of last layer 15nm again.The sapphire substrate for having plated film is placed on meshbeltfurnace front end with manipulator On, it is sent to using guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to argon gas protective gas in furnace chamber, added with infrared quartz fluorescent tube Heat, with thermocouple temperature control, cavity temperature control is 800 DEG C.The transmission speed of guipure is 2000mm/min, and the sample on guipure arrives Up to meshbeltfurnace rear end, sample is taken out with manipulator, it is packaged to be put into sample box.Guipure fore-stream sample color is pale blue, is passed through The infrared fast rapid thermal treatment for burning meshbeltfurnace, the color sample of guipure rear end become rose pink, and the result is shown in experimental result forms.
Embodiment 10
Glass substrate is put into magnetron sputtering apparatus, using film thickness monitoring or time control pattern, first plates one layer of 2nm's Then chromium film plates the golden film of last layer 15nm again.The glass substrate for having plated film is placed on meshbeltfurnace front end with manipulator, profit It is sent to guipure in infrared fast burning meshbeltfurnace furnace chamber.Lead to argon gas protective gas in furnace chamber, heated with infrared quartz fluorescent tube, with heat Galvanic couple temperature control, cavity temperature control are 900 DEG C.The transmission speed of guipure is 5000mm/min, and the sample on guipure reaches guipure Sample with manipulator is taken out, it is packaged to be put into sample box by stove rear end.Guipure fore-stream sample color is pale blue, by infrared fast The rapid thermal treatment of meshbeltfurnace is burnt, the color sample of guipure rear end becomes rose pink, and the result is shown in experimental result forms.
The experimental result of embodiment 1-10
Embodiment 11
5 gained substrate of embodiment is immersed in the APTMS solution of 10mM, is heated to 70 DEG C, 2h is maintained, then uses PBS Solution, deionized water are cleaned 3 times, nitrogen drying.It is immersed in again in 15w/w%GA solution, maintains 1h, Ran Houyong at room temperature PBS solution, deionized water are cleaned 3 times, nitrogen drying.The substrate handled well is placed in clean plastic box, adds in 1ml Adalimumab solution, covers lid, is placed on 1h in 4 DEG C of refrigerators, each with PBS solution and ultrapure water glass substrate after taking-up 3 times, nitrogen drying.Spectrum change is as shown in Figure 4 before and after thus obtained biosensor modification.
The method of the utility model is described by preferred embodiment, and related personnel substantially can be new in this practicality Method described herein and application are modified or suitably changed with combining in type content, spirit and scope, to realize and answer With the utility model technology.Those skilled in the art can use for reference present disclosure, be suitably modified technological parameter realization.Especially need , it is noted that all similar substitutions and modifications are apparent to those skilled in the art, they are considered as wrapping It includes in the utility model.

Claims (9)

1. a kind of optical biosensor, including:Base board unit (100), nano-particle unit (200), detection unit (300), It is characterized in that:The base board unit (100) includes substrate, and the substrate has light transmission, and the light transmission is light transmission Rate more than 75%;The nano-particle unit (200) includes metal nanoparticle, and the metal nanoparticle is formed at the base Plate surface;The detection unit (300) includes detection particle, and the detection particle is connected on the substrate, positioned at the gold Between the gap for belonging to nano-particle.
2. optical biosensor according to claim 1, which is characterized in that the metal nanoparticle is chromium and gold Alloy, chromium and the alloy of silver or the alloy of chromium and electrum;The grain size of the metal nanoparticle is 2nm-40nm.
3. optical biosensor according to claim 1, which is characterized in that the substrate is glass, quartz, transparent pottery Porcelain, polymer or mica sheet.
4. optical biosensor according to claim 1, which is characterized in that it is described detection particle for polypeptide, protein, Oligosaccharide or lipid.
5. a kind of Equipment for Heating Processing for preparing the optical biosensor as described in claim any one of 1-4, the heat treatment is set Standby is meshbeltfurnace, which is characterized in that the meshbeltfurnace includes heating zone (630), cooling zone (640), feeding area (610), blanking Area (620) and guipure (650);Guipure (650) circulating rolling, be sequentially connected the feeding area (610), heating zone (630), Cooling zone (640), discharging area (620).
6. the Equipment for Heating Processing according to claim 5 for preparing optical biosensor, which is characterized in that the meshbeltfurnace Further include manipulator (700).
7. the Equipment for Heating Processing according to claim 5 for preparing optical biosensor, which is characterized in that the meshbeltfurnace Further include gas outlet (601), air inlet (602).
8. the Equipment for Heating Processing according to claim 7 for preparing optical biosensor, which is characterized in that the air inlet (602) cooling zone (640), heating zone (630) are arranged on, the gas outlet (601) is arranged on the heating zone (630).
9. the Equipment for Heating Processing according to claim 5 for preparing optical biosensor, which is characterized in that the heating zone (630) heat source is infrared heating.
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