CN207415097U - Polishing pad - Google Patents
Polishing pad Download PDFInfo
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- CN207415097U CN207415097U CN201720968162.3U CN201720968162U CN207415097U CN 207415097 U CN207415097 U CN 207415097U CN 201720968162 U CN201720968162 U CN 201720968162U CN 207415097 U CN207415097 U CN 207415097U
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- light
- optical transmission
- grinding
- polishing pad
- transmission window
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Abstract
The utility model discloses a kind of polishing pads, including grinding layer and optical transmission window, at least two optical transmission windows are equipped in grinding layer, and using the center of grinding layer as the center of circle, the corresponding central angle in two neighboring optical transmission window position is equal, and the detector for the interference signal that can receive light correspondingly with it is equipped with below each optical transmission window.The utility model on grinding layer by setting the optical transmission window that multiple deciles are set, each optical transmission window corresponds to a detector, multiple detectors are realized in different position joint-detection, improve the optical detecting precision of grinding endpoint, so as to obtain grinding homogeneity more preferably polishing pad.
Description
Technical field
The utility model is related to CMP arts.More specifically, the utility model is related to one kind to have light transmission
The polishing pad of window.
Background technology
When manufacturing semiconductor device, form conductive film in wafer surface and formed by carrying out photoetching, etching etc.
The process of wiring layer, process etc. that interlayer dielectric is formed on wiring layer, using these processes wafer surface generate by
The bumps that the electric conductors such as metal or insulator are formed.In recent years, although for the purpose of the densification of semiconductor integrated circuit
Miniaturization or multilayer wiredization of wiring are carried out, but therewith together, the concave-convex technology planarized of wafer surface is become into weight
Get up.
As the method for the concave-convex planarization for making wafer surface, in general using CMP methods.CMP is by the quilt of chip
In a state that abradant surface is pressed against on the abradant surface of grinding pad, using the Slurries for having disperseed abrasive material grinding agent (hereinafter referred to as
Slurry) come the technology that is ground.
On such CMP is carried out, there is the problem of judgement of flatness of wafer surface.Need table desired by detection arrival
At the time of face characteristic or flat state.All the time, on the film thickness of oxide-film or grinding rate etc., test chip is periodically located
Reason, processing is ground after result is confirmed to the chip for becoming product.
But in this method, the time of processing test chip and cost become extra, in addition, being not carried out completely in advance
In the test chip and product chip of processing, because of the distinctive loading effects of CMP, grinding result is different, when in practice not to production
When product chip carries out examination processing, then the correct anticipation to processing result is difficult to.
As a result, in order to solve the problem above-mentioned, when carrying out CMP processes, it is desirable to have can detect obtain at the scene
Obtain method at the time of desired surface characteristic or thickness.For such detection, various methods have been used.Now, make
For the detection method proposed, including using the coefficient of friction between chip and pad as chip holding head or the turning moment of platform
Variation and detect moment inspecting method, detect residual on the wafer the electrostatic capacitance method of the thickness of insulating film, revolving
Turn to be packed into platform the optical method of the film thickness MA monitoring agency carried out using laser, parse vibration by being mounted on head or axis
Or the frequency spectrogram that obtains of acceleration sensor vibration analysis method, to the frictional heat or slurry of chip and grinding pad and be ground
The reaction heat of object is ground with the method for measuring of infrared emission thermometer, by measuring the propagation time of ultrasonic wave to measure
Grind method of thickness of object etc..Wherein optical de-tection means use is wider, and light beam specifically is passed through window (transparent area
Domain) grinding pad is crossed to wafer illumination, the interference signal generated is reflected by it by detection to detect the method for the terminal of grinding.
Now, in general using the He-Ne laser with the wavelength light near 600nm or used as light beam in 380~800nm
The white light of halogen lamp with wavelength light.In such method, surface is learnt in the variation of the thickness of the superficial layer by monitoring chip
Concave-convex approximate depth determines terminal.At the time of the variation of such thickness is with concave-convex deep equality, just terminate CMP journeys
Sequence.
However, the property in the end point determination for the grinding that such optical facilities carry out dependent on window in grinding layer, and by
The translucency of single window may be influenced in the limitation of the conditions such as manufacturing process so as to cause grinding endpoint measure to be not allowed, therefore urgently
It need to find that a kind of window structure is relatively reliable, grinding endpoint has the polishing pad of higher optical detecting precision.
Utility model content
One purpose of the utility model is to solve the above problems, and provides the advantages of will be described later.
The utility model is to provide a kind of polishing pad there are one purpose, by the way that multiple deciles is set to set on grinding layer
Optical transmission window and each optical transmission window correspond to a detector, realize multiple detectors in different position joint-detection, improve
The optical detecting precision of grinding endpoint, so as to obtain grinding homogeneity more preferably polishing pad.
In order to realize these purposes and further advantage according to the present utility model, a kind of polishing pad is provided, including grinding
Layer and optical transmission window are equipped at least two optical transmission windows in the grinding layer, and using the center of the grinding layer as the center of circle, it is adjacent
The corresponding central angle in two optical transmission window positions is equal, and is equipped with below each optical transmission window with it one by one
The detector of the corresponding interference signal for receiving light.
Two optical transmission windows arranged symmetrically specifically can be used, set by central angle for 120 ° in the form of three optical transmission windows etc.,
The big I of optical transmission window combines actual set according to its quantity etc., is generally less than conventional single window structure, during detection due to
The detector of different position detects that the interference signal of light has that the regular hour is poor, can be more with reference to the testing result of multiple detectors
Accurately definite grinding endpoint improves the optical detecting precision and reliability of grinding endpoint.
Preferably, the interference letter of the light of Same Wavelength or different wave length can be received at least two detectors respectively
Number.The light that Same Wavelength such as 600nm can be used in two or more detectors is irradiated, and can also be respectively adopted multi-wavelength's
Light such as 400nm and 600nm are detected by different detectors, so as to obtain the profile of more wafer surfaces, are set for not
The detector of the light of co-wavelength so that accuracy of detection is improved in the range of certain wavelength, so as to provide table in abrasive characteristic
The excellent grinding pad such as face homogeneity.
Preferably, set in the grinding layer there are two optical transmission window, received wave respectively in corresponding two detectors
A length of 200~400nm and wavelength are the interference signal of the light of 500~800nm.The setting of Dual-window and dual wavelength detector, into
This is not high convenient for detection, and improves accuracy of detection.
Preferably, further include：
Integrally formed photic zone, including；
Light transmission bed course is arranged on the bottom of the grinding layer；
At least two optical transmission windows are located at the top of the light transmission bed course and in the grinding layer；And
At least two light-transmitting openings are located at the lower section of the light transmission bed course, and the light-transmitting opening and the optical transmission window are one by one
Corresponding, each detector, which is arranged on the light entered below the light-transmitting opening and from the light-transmitting opening, can pass through the light inlet window
Mouthful；
Bottom surface layer is located at the bottom of the light transmission bed course, is equipped in the bottom surface layer and passes through and consolidate for the light-transmitting opening
The first fixed loophole.
Photic zone integrated molding refers to not press from both sides every other materials between light transmission bed course and optical transmission window or light-transmitting opening.
In process of lapping, there is spillage with euphotic border there may be stripping state is drawn in grinding layer, and such spillage can cause detection
The optical problems such as fuzzy in device, make the reduction of end point determination precision, and since the utility model includes light transmission bed course, light inlet window
Mouth and the photic zone of light-transmitting opening are an integral molding structure, and detector is arranged below light-transmitting opening, therefore even if using for a long time,
The situation of spillage near detector is not appeared in.Further, since light transmission bed course, optical transmission window and light-transmitting opening are by identical material
Material is formed, and has translucency, thus there will not be situation about being counteracted to optical end point detection.By using identical material one
Body is formed, and can also inhibit the scattering of the light as caused by the difference of refractive index, can carry out high-precision optical end point detection.
Preferably, the photic zone is non-foamed body.Non-foamed body can inhibit the scattering of light, therefore can detect just
True reflectivity can improve the accuracy of detection of the optical end point of grinding.
Preferably, stomata is equipped in the light transmission bed course, and the stomata is not hindered from the light-transmitting opening or optical transmission window
By light.Stomata is equipped in light transmission bed course makes light transmission bed course have certain elasticity, plays certain buffering effect, and in order to
Do not influence the detection of optical end point, the stomata do not hinder from the light-transmitting opening or optical transmission window by light, i.e., stomata is not
The underface of optical transmission window is arranged on, also does not ensure not interfering the detection of optical end point in the surface of light-transmitting opening.
Preferably, the optical transmission window and the light-transmitting opening size are identical and arranged symmetrically, and multiple stomatas are uniform
It is distributed in the light transmission bed course.Optical transmission window it is identical with light-transmitting opening size and it is arranged symmetrically facilitate processing, make integrally formed
Photic zone is made no distinction of rank, and optical transmission window can mutually overturn replacement with light-transmitting opening and use.
Preferably, the bottom surface layer is the buffer layer for buffering.Since photic zone is an integral molding structure, work as photic zone
Buffering effect it is not ideal enough when, material such as polyurethane foam plastics system with cushion performance and that recoverability is good can be used
Into bottom surface layer.
Preferably, the bottom surface layer is the second grinding layer for grinding.Bottom surface layer can be identical with grinding layer second
Grinding layer makes polishing pad is two-sided can all grind, and the polishing pad of traditional single side grinding generally requires to extend its service life
Deeper groove is set, and groove relatively deep also may require that uses more polishing fluids, by setting grinding layer two-sided up and down, when
After the grinding layer use on surface, polishing pad is overturn, using the second grinding layer of bottom surface, is not only filled polishing pad
Divide and utilize, improve polishing efficiency, and deeper groove need not be often set on every layer of grinding layer, thrown so as to also save
Light liquid.
Preferably, the optical transmission window and the light-transmitting opening size are identical and arranged symmetrically, the grinding layer and with it is described
Identical groove is equipped on the identical bottom surface layer of grinding layer, and the grinding plate for carrying polishing pad is equipped with and the ditch
The corresponding protrusion of slot.Grinding layer can mutually overturn replacement with bottom surface layer and use, and protrusion plays certain abradant surface that will be used
Bottom surface be fixed on effect on grinding plate.
The utility model includes at least following advantageous effect：
The polishing pad of the utility model, the corresponding central angle in two neighboring optical transmission window position is equal, i.e. grinding layer
Multiple optical transmission windows of upper setting etc. point are set, the different position being evenly distributed on grinding layer, and each optical transmission window corresponds to one
A detector.Multiple detectors work at the same time when detecting grinding endpoint, since multiple optical transmission windows are in different position, with grinding
The progress of mill, the detector of different position detect that the interference signal of light has that the regular hour is poor, and multiple detectors are at interval
In detect successively multiple reflection chips superficial layers thickness interference signal, regular shorten inspection so as to be equivalent to
The time interval that device receives signal is surveyed, the frequency of detection is improved, contributes to faster with reference to the testing result of each detector
Speed more accurately determines grinding endpoint, improves the optical detecting precision of grinding endpoint.Meanwhile multiple optical transmission windows and detector
The different position that is equivalent in the corresponding chip being ground of setting detect respectively, compared to traditional single windows detector,
Reliability higher, the detection to the multiple positions of chip when confirming grinding endpoint but also grind homogeneity more preferably.
Part is illustrated to embody by the further advantage, target and feature of the utility model by following, and part will also pass through
Research and practice to the utility model and be understood by the person skilled in the art.
Description of the drawings
Fig. 1 is the top view of the polishing pad of the embodiment one of the utility model；
Fig. 2 is the sectional view of the polishing pad of the embodiment one of the utility model；
Fig. 3 is the structure diagram of the grinding device when polishing pad of the embodiment one of the utility model uses；
Fig. 4 is the sectional view of the polishing pad of the embodiment two of the utility model.
Specific embodiment
The utility model is described in further detail with reference to the accompanying drawings and examples, to make those skilled in the art
It can implement according to this with reference to specification word.
It should be noted that in the description of the utility model, term " transverse direction ", " longitudinal direction ", " on ", " under ", " preceding ",
The orientation or position relationship of the instructions such as " rear ", "left", "right", " vertical ", " level ", " top ", " bottom ", " interior ", " outer " be based on
Orientation shown in the drawings or position relationship, are for only for ease of description the utility model and simplify and describe, and are not instruction or dark
Show that signified device or element there must be specific orientation, with specific azimuth configuration and operation, thus it is it is not intended that right
The limitation of the utility model.
Embodiment one
As shown in Fig. 1~2, the utility model provides a kind of polishing pad, the light transmission of grinding layer 110, lower section including surface
Layer 120 and bottom surface layer 130 is set in the grinding layer 110 there are two optical transmission window 121, and two neighboring optical transmission window 121 is on grinding
Grind the center symmetric setting of layer 110, the corresponding central angle in two neighboring 121 position of optical transmission window is 180 °, often
A 121 lower section of the optical transmission window is equipped with the detector for the interference signal that can receive light correspondingly with it, described in two
The interference signal of a length of 400nm of received wave and wavelength for the light of 600nm is distinguished in detector.
Photic zone 120 is an integral molding structure, including：Light transmission bed course 122 is arranged on the bottom of the grinding layer 110,
Multiple stomatas 124 are uniformly provided in the light transmission bed course 122；Two optical transmission windows 121 are located at the light transmission bed course 122
Top and in the grinding layer 110；And two light-transmitting openings 123, it is located at the lower section of the light transmission bed course 122, it is described
Light-transmitting opening 123 is corresponded with the optical transmission window 121, and the stomata 124 is not hindered from the light-transmitting opening 123 or light inlet window
Mouthfuls 121 by light, each detector is arranged on 123 lower section of light-transmitting opening and the light entered from the light-transmitting opening 123
Line can pass through the optical transmission window 121.The photic zone 120 is made of non-foamed body material.
Bottom surface layer 130 is located at the bottom of the light transmission bed course 122, is equipped in the bottom surface layer 130 and supplies the light-transmitting opening 123
It passes through and fixed first loophole.Bottom surface layer 130 is the buffer layer for buffering, can be used with cushion performance and replys
The good material of performance such as polyurethane foam plastics is made.
Using the grinding device of above-mentioned polishing pad as shown in figure 3, possessing the grinding plate 2 of support grinding pad 1, support is ground
Grind the supporting table 5 of object such as chip 4 and the feed mechanism for carrying out the lining material of the homogeneous pressurization of chip, grinding agent 3.
Grinding pad 1 is for example attached by using double faced adhesive tape, is installed on grinding plate 2.Grinding plate 2 and supporting table 5 are by according to making
Mode configures the grinding pad 1 of each self-supporting face to face with object 4 is ground, and possesses rotation axis 6,7 respectively.In addition, it is propping up
It supports on platform 5, equipped with for the pressing mechanism that object 4 is pushed to grinding pad 1 will to be ground.
Embodiment two
As shown in figure 4, the optical transmission window 121 of photic zone 120 and the light-transmitting opening 123 in the polishing pad of this embodiment
Size is identical and arranged symmetrically, and on the premise of the detection of optical end point is not interfered, stomata 124, institute are equipped in light transmission bed course 122
State stomata 124 do not hinder not only from the light-transmitting opening 123 or optical transmission window 121 by light, the setting of stomata 124 makes light transmission
Bed course 122 has certain elasticity, plays certain buffering effect, and multiple stomatas 124 are evenly distributed on the light transmission pad
In layer 122.
The bottom surface layer 130 be for grinding the second grinding layer, the grinding layer 110 and with 110 phase of grinding layer
With the bottom surface layer 130 be equipped with identical groove, in use, carry polishing pad grinding plate be equipped with and the ditch
The corresponding protrusion of slot, remaining structure of polishing pad are identical with embodiment one.Protrusion on grinding plate plays certain general
Bottom surface is fixed on the effect on grinding plate, simultaneously because the groove structure of two-sided grinding layer is identical, therefore is ground per one side
When another side on the other side can be fixed with grinding plate.
Although the embodiment of the utility model is disclosed as above, it is not restricted in specification and embodiment
Listed utilization, it can be applied to the field of various suitable the utility model completely, for those skilled in the art,
Other modification is easily achieved, therefore without departing from the general concept defined in the claims and the equivalent scope, this reality
Specific details is not limited to new and shown here as the legend with description.
Claims (10)
1. a kind of polishing pad, including grinding layer and optical transmission window, which is characterized in that at least two light transmissions are equipped in the grinding layer
Window, and using the center of the grinding layer as the center of circle, the corresponding central angle in the two neighboring optical transmission window position are homogeneous
Deng being equipped with the detection to work while the interference signal that can receive light correspondingly with it below each optical transmission window
Device.
2. polishing pad as described in claim 1, which is characterized in that same ripple can be received at least two detectors respectively
The interference signal of long or different wave length light.
3. polishing pad as claimed in claim 2, which is characterized in that it is set in the grinding layer there are two optical transmission window, it is corresponding
The interference signal of a length of 200~400nm of received wave and wavelength for the light of 500~800nm is distinguished in two detectors.
4. polishing pad as described in claim 1, which is characterized in that further include：
Integrally formed photic zone, including；
Light transmission bed course is arranged on the bottom of the grinding layer；
At least two optical transmission windows are located at the top of the light transmission bed course and in the grinding layer；And
At least two light-transmitting openings are located at the lower section of the light transmission bed course, and the light-transmitting opening is corresponded with the optical transmission window,
Each detector, which is arranged on the light entered below the light-transmitting opening and from the light-transmitting opening, can pass through the optical transmission window；
Bottom surface layer is located at the bottom of the light transmission bed course, is passed through in the bottom surface layer equipped with the confession light-transmitting opening and fixed
First loophole.
5. polishing pad as claimed in claim 4, which is characterized in that the photic zone is non-foamed body.
6. polishing pad as claimed in claim 5, which is characterized in that stomata is equipped in the light transmission bed course, and the stomata is not
Hinder from the light-transmitting opening or optical transmission window by light.
7. polishing pad as claimed in claim 6, which is characterized in that the optical transmission window and the light-transmitting opening size are identical and right
Claim to set, and multiple stomatas are evenly distributed in the light transmission bed course.
8. polishing pad as claimed in claim 4, which is characterized in that the bottom surface layer is the buffer layer for buffering.
9. polishing pad as claimed in claim 4, which is characterized in that the bottom surface layer is the second grinding layer for grinding.
10. polishing pad as claimed in claim 9, which is characterized in that the optical transmission window it is identical with the light-transmitting opening size and
It is symmetrical arranged, the grinding layer and the bottom surface layer identical with the grinding layer are equipped with identical groove, and carry polishing
The grinding plate of pad is equipped with protrusion corresponding with the groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720968162.3U CN207415097U (en) | 2017-08-03 | 2017-08-03 | Polishing pad |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720968162.3U CN207415097U (en) | 2017-08-03 | 2017-08-03 | Polishing pad |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207415097U true CN207415097U (en) | 2018-05-29 |
Family
ID=62314626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720968162.3U Active CN207415097U (en) | 2017-08-03 | 2017-08-03 | Polishing pad |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207415097U (en) |
-
2017
- 2017-08-03 CN CN201720968162.3U patent/CN207415097U/en active Active
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