CN207342403U - Polycrystalline silicon production system - Google Patents
Polycrystalline silicon production system Download PDFInfo
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- CN207342403U CN207342403U CN201721094368.4U CN201721094368U CN207342403U CN 207342403 U CN207342403 U CN 207342403U CN 201721094368 U CN201721094368 U CN 201721094368U CN 207342403 U CN207342403 U CN 207342403U
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Abstract
The utility model discloses a kind of polycrystalline silicon production system, including：Recovery module, for the tail gas recycle module recycled to the tail gas that recovery module is discharged, removes the removal module of the unformed silica flour in tail gas；Wherein, removing module includes deduster, and deduster has：For the gas feed entered for tail gas, for the gas vent for tail gas discharge, enter for the chlorosilane liquid produced for tail gas recycle module to rinse the liquid-inlet of tail gas, for discharging the liquid outlet of siliceous powder liquid.Polycrystalline silicon production system disclosed in the utility model, unformed silica flour in tail gas is rinsed out using chlorosilane liquid produced, the unformed silica flour in tail gas is removed using wet method, compared compared with the prior art using filter, surge tank with cyclone separator, effectively increase the removal effect of unformed silica flour, moreover, without setting and replacing filter core, effectively reduce and remove cost and maintenance cost.
Description
Technical field
Technical field of polysilicon production is the utility model is related to, more specifically to a kind of polycrystalline silicon production system.
Background technology
At present, mostly using improvement Siemens process production polysilicon, the manufacture core of polysilicon is high-purity three for factory
Chemical vapor deposition reaction occurs in reduction furnace for chlorine hydrogen silicon (and a small amount of dichlorosilane) and hydrogen, and silicon crystal is deposited on silicon core
On, the silicon rod of dismounting high-purity after stove is torn in blowing out after silicon core is gradually grown up to 140~180mm of diameter by 8~15mm of diameter, displacement open
Product.
When with hydrogen chemical vapor deposition reaction occurs in reduction furnace for trichlorosilane, a small amount of unformed silicon can be produced
Powder, the unformed silicon powder deposit of fraction is on chassis of reducing furnace, manual cleaning chassis of reducing furnace after blowing out, and most of unformed
Silica flour then enters the tail gas recycle process in downstream by gas phase pipeline, carries out the condensation recycling and chlorosilane, chlorination of tail gas
The separation of hydrogen and hydrogen, unformed silica flour enter the storage tank in downstream, rectifying with the chlorosilane liquid form product of tail gas recycle process
Tower, it could even be possible into polysilicon hydrogenation process, can cause storage tank, rectifying column etc. to block, cause after equipment long-play
Production disruption, equipment damage and maintenance are more frequent.
At present, in order to remove unformed silica flour, mainly carry out in the following ways：
1) on the total delivery pipe of tail gas of recovery module, position A2 as shown in Figure 1, sets surge tank with by unformed silica flour
Settle down, still, because the particle diameter of unformed silica flour, close to PM2.5 dust, the mode of surge tank sedimentation is in actual production
Almost without effect in practice；
2) on the delivery pipe of each reduction furnace of recovery module, position A1 as shown in Figure 1, sets cyclone separator to incite somebody to action
Unformed silica flour is separated, and still, because the particle diameter of unformed silica flour is too small, cyclone separator can remove grain in unformed silica flour
The more relatively large silica flour in footpath, but still the silica flour for having a large amount of nominal particle sizes can not remove；
3) on the delivery pipe of each reduction furnace of recovery module, position A1 as shown in Figure 1, sets filter, using spy
Different filter core filters unformed silica flour, has certain effect, still, for large-scale polysilicon factory, its reduction furnace quantity
Very much, by taking 1 10,000 tons polysilicon factory as an example, if all needing 30 or so, every reduction furnace using 36 pairs of rod reduction furnaces
The filter removing silicon powder of a special filter core is added afterwards, filter core cost is higher, and due to the intermittent operation of reduction furnace, filter core
Corrosion-vulnerable, maintenance cost is higher, causes the above method can not grand designs and use；
4) on the total delivery pipe of tail gas of recovery module, position A2 as shown in Figure 1, adds micro filters, use is special
Filter core filter out silica flour, still, exhaust gas volumes flow is huge, by taking 1 10,000 tons polycrystalline silicon device as an example, its exhaust flow surpasses
8000m3/hr is crossed, the latus rectum of the total delivery pipe of tail gas is larger, and cost is larger by way of gas phase filtration dedusting, and maintenance expense
With higher；
5) in also tail gas recycle module, in the chlorosilane condensate that will be reduced in furnace exhaust gas into after liquid, in liquid-phase tube
Lu Shang, position A3 or position A4 as shown in Figure 1, increase filter, remove silica flour using special filter core, this method is the above
Best results in several method, a degree of unformed silicon in part filtered out in liquid phase of energy, but to fixed gas after condensation
Unformed silicon in (a large amount of hydrogen, a small amount of chlorosilane) is still without solution；And which cost is higher, trivial operations, it is necessary to
Having a rest property deslagging is starched, and device is safeguarded and improper is easier to block.
In conclusion how to remove unformed silica flour, to improve the removal effect of unformed silica flour, while reduce removal into
Sheet and maintenance cost, are a problem to be solved by those skilled in the art.
Utility model content
In view of this, the purpose of this utility model is to provide a kind of polycrystalline silicon production system, to improve unformed silica flour
Removal effect, while reduce and remove cost and maintenance cost.
In order to achieve the above object, the utility model provides following technical solution：
A kind of polycrystalline silicon production system, including：Recovery module, the tail gas for being discharged to the recovery module recycle
Tail gas recycle module, remove the removal module of the unformed silica flour in the tail gas；Wherein,
The removal module includes deduster, and the deduster has：For the gas feed entered for the tail gas, use
In the gas vent for tail gas discharge, enter for the chlorosilane liquid produced for the tail gas recycle module to rinse the tail
The liquid-inlet of gas, for discharging the liquid outlet of siliceous powder liquid.
Preferably, the deduster also has spray thrower, and the spray thrower is connected with the liquid-inlet.
Preferably, the gas feed and the liquid outlet are respectively positioned on the lower housing portion of the deduster, and during operation
The gas feed and the liquid outlet are respectively positioned under the liquid level in the deduster；The gas vent and the liquid
Import is respectively positioned on the top of the housing, and the gas vent and the liquid-inlet are respectively positioned in the deduster during operation
Liquid level on.
Preferably, the first-stage condenser of the tail gas recycle module is connected with the total delivery pipe of the tail gas of the recovery module,
The secondary condenser of the tail gas recycle module is connected by conveyance conduit with the first-stage condenser；
Wherein, the deduster is serially connected with the total delivery pipe of the tail gas by the gas feed and the gas vent
On.
Preferably, the removal module further includes the first cooler being serially connected with the total delivery pipe of the tail gas, and described the
One cooler is used to cooling down the tail gas discharged by the recovery module, the offgas outlet of first cooler and the gas into
Mouth connection.
Preferably, first cooler is used to the tail gas being cooled to preset temperature, the preset temperature for 32~
100℃。
Preferably, the total delivery pipe of the tail gas and the dedusting module are one；
Or, the total delivery pipe at least two of tail gas, the dedusting module are corresponded with the total delivery pipe of the tail gas；
Or, the total delivery pipe at least two of tail gas, the dedusting module are one.
Preferably, the first-stage condenser of the tail gas recycle module is connected with the total delivery pipe of the tail gas of the recovery module,
The secondary condenser of the tail gas recycle module is connected by conveyance conduit with the first-stage condenser；
Wherein, the deduster is serially connected with the conveyance conduit by the gas feed and the gas vent.
Preferably, the removal module further includes the second cooler being serially connected with the conveyance conduit, and described second is cold
But device is used to cool down by the tail gas of the removal module discharge, offgas outlet and the secondary condenser of second cooler
Inlet exhaust gas connection.
Preferably, the first-stage condenser is used to tail gas being cooled to preset temperature, and the preset temperature is 32~100
℃。
Preferably, the liquid-inlet is connected with the chlorosilane liquid produced delivery pipe of the tail gas recycle module；
The polycrystalline silicon production system further includes the evaporator for recycling chlorosilane, the liquid outlet and the evaporation
Device connects.
Polycrystalline silicon production system provided by the utility model, by setting deduster, utilizes the chlorine silicon of tail gas recycle module
Alkane liquid is flushed into the tail gas of deduster, i.e., removes the unformed silica flour in tail gas using wet method, so as to fulfill by tail gas
In unformed silica flour wash out, the unformed silica flour being washed out with chlorosilane liquid produced from liquid outlet discharge, i.e., siliceous powder liquid oneself
Liquid outlet is discharged, and the tail gas for being removed unformed silica flour is discharged through gas vent, it is achieved thereby that removing unformed silica flour.
Polycrystalline silicon production system provided by the utility model, the unformed silicon in tail gas is rinsed out using chlorosilane liquid produced
Powder, i.e., removed the unformed silica flour in tail gas using wet method, filter, surge tank and cyclone separator phase used compared with the prior art
Than effectively increasing the removal effect of unformed silica flour, moreover, filter core need not be set and replace filter core, effectively reducing removal
Cost and maintenance cost.
Brief description of the drawings
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, drawings in the following description are only
It is the embodiment of the utility model, for those of ordinary skill in the art, without creative efforts, also
Other attached drawings can be obtained according to the attached drawing of offer.
Fig. 1 is the structure diagram for the polycrystalline silicon production system that the prior art provides；
Fig. 2 is the structure diagram of deduster in the polycrystalline silicon production system that the utility model embodiment provides；
Fig. 3 is a kind of structure diagram for the polycrystalline silicon production system that the utility model embodiment provides；
Fig. 4 is another structure diagram for the polycrystalline silicon production system that the utility model embodiment provides.
Embodiment
The following is a combination of the drawings in the embodiments of the present utility model, and the technical scheme in the embodiment of the utility model is carried out
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are without making creative work
All other embodiments obtained, shall fall within the protection scope of the present invention.
As in Figure 2-4, the polycrystalline silicon production system that the utility model embodiment provides, including：Recovery module, for pair
The tail gas recycle module that the tail gas of recovery module discharge is recycled；Remove the removal module of the unformed silica flour in tail gas.
It should be noted that the effective object of the removal module is tail gas, which is the tail gas of recovery module discharge, should
Tail gas can be the tail gas being expelled directly out by recovery module or is expelled directly out by recovery module and pass through recovery module postorder
The tail gas of component.
Above-mentioned removal module includes deduster, as shown in Fig. 2, the deduster has：For for tail gas enter gas into
Mouth 12, for the gas vent 13 for tail gas discharge, enters to rinse tail gas for the chlorosilane liquid produced for tail gas recycle module
Liquid-inlet 14, for discharging the liquid outlet 15 of siliceous powder liquid.
The polycrystalline silicon production system that the utility model embodiment provides, by setting deduster, utilizes tail gas recycle module
Chlorosilane liquid produced be flushed into the tail gas of deduster, i.e., remove the unformed silica flour in tail gas using wet method, so as to fulfill
Unformed silica flour in tail gas is washed out, the unformed silica flour being washed out is discharged with chlorosilane liquid produced from liquid outlet 15, i.e., siliceous
Powder liquid is discharged from liquid outlet, and the tail gas for being removed unformed silica flour is discharged through gas vent 13, it is achieved thereby that removing
Unformed silica flour.
The polycrystalline silicon production system that the utility model embodiment provides, the nothing in tail gas is rinsed out using chlorosilane liquid produced
Sizing silica flour, i.e., remove the unformed silica flour in tail gas, compared with the prior art using filter, surge tank and whirlwind point using wet method
Compared from device, the polycrystalline silicon production system that the utility model embodiment provides, effectively increase the removal effect of unformed silica flour,
Moreover, without setting and replacing filter core, effectively reduce and remove cost and maintenance cost.
Meanwhile the polycrystalline silicon production system that the utility model embodiment provides, investment is relatively low, without frequently tieing up after use
Shield, stability and reliability outclass the filtering technique of existing polysilicon factory main attack.
Above-mentioned polycrystalline silicon production system, the unformed silica flour in tail gas is rinsed out using chlorosilane liquid produced, that is, utilizes system
Material balance of uniting and heat balance, using a kind of special wet dedusting mode, the nothing that reduction furnace in polycrystalline silicon production is produced
Silica flour of shaping removes, and can reach 100% efficiency of dust collection.
Above-mentioned deduster has housing 11, above-mentioned gas import 12, gas vent 13, liquid-inlet 14 and liquid outlet 15
It is arranged on housing 11.In order to improve removal effect, above-mentioned deduster also has a spray thrower 16, the spray thrower 16 and liquid into
Mouth 14 connects, as shown in Figure 2.In this way, chlorosilane liquid produced can come into full contact with, so as to fill after the injection of spray thrower 16 with tail gas
Divide and remove unformed silica flour.
For the type and structure of spray thrower 16, can be made choice according to actual needs, the utility model embodiment is to this
Do not limit.
In order to ensure that gas and liquid are come into full contact with to improve removal effect, above-mentioned gas import 12 and liquid outlet 15 are equal
Positioned at 11 lower part of housing of deduster, and when running gas feed 12 and liquid outlet 15 be respectively positioned on liquid level in deduster it
Under；Gas vent 13 and liquid-inlet 14 are respectively positioned on the top of housing 11, and gas vent 13 and liquid-inlet 14 are equal during operation
On the liquid level of deduster as shown in Figure 2.
It should be noted that described "up" and "down" herein, refer respectively to after deduster installs, along deduster
The "up" and "down" of short transverse.
Can store part chlorosilane liquid produced inside above-mentioned deduster, since gas feed 12 is higher than liquid outlet 15, then into
Entering the tail gas of deduster can enter in the chlorosilane liquid produced in deduster, improve dust removing effects.
In above-mentioned deduster, unformed silica soot with chlorosilane liquid produced, by liquid outlet 15, accomplished continuously or intermittently discharge by property,
The liquid level equilibrium of deduster is realized by adjusting the chlorosilane liquid produced amount for entering deduster.
Certainly, also above-mentioned gas import 12, gas vent 13, liquid-inlet 14 and liquid discharge can be adjusted according to being actually needed
The relative position of mouth 15, as long as ensureing to remove the unformed silica flour in tail gas.
In above-mentioned polycrystalline silicon production system, liquid-inlet 14 is connected with the chlorosilane liquid produced delivery pipe of tail gas recycle module,
In this way, the chlorosilane liquid produced for facilitating tail gas recycle module enters the liquid-inlet 14 of deduster.
In above-mentioned deduster, unformed silica soot is discharged with chlorosilane liquid produced by liquid outlet 15, in order to avoid wasting,
Can be to the recycling of the chlorosilane liquid produced, for example, chlorosilane is recycled again by the means such as evaporating, after silica flour and evaporation
High concentration slurry processing is hydrolyzed.Specifically, above-mentioned polycrystalline silicon production system further includes the evaporation for recycling chlorosilane
Device, liquid outlet 14 are connected with evaporator.
In above-mentioned polycrystalline silicon production system, it is designed for the type of deduster according to actual needs, such as deduster
It is hollow structure to be internally provided with inside tower tray or filler, or deduster.Above-mentioned deduster for gas wash tower, dedusting tank or other remove
Dirt equipment, the utility model embodiment do not limit this.
In above-mentioned polycrystalline silicon production system, the position that deduster is set is come with two embodiments below there are at least two
Illustrate.
Implement one
Above-mentioned polycrystalline silicon production system, has multiple reduction furnaces, the discharged tail of each reduction furnace in recovery module
Gas, and the tail gas of each delivery pipe flow to exhaust emissions manifold, exhaust emissions manifold is connected with the tail gas recycle module of postorder.
Above-mentioned deduster 28 may be provided on the delivery pipe of each reduction furnace, in this way, the number of required deduster 28 is more,
Cost is higher.In order to reduce cost, prioritizing selection deduster 28 is arranged on exhaust emissions manifold.
As shown in figure 3, the first-stage condenser 21 of tail gas recycle module is connected with the total delivery pipe of the tail gas of recovery module, tail gas
The secondary condenser 22 of recycling module is connected by conveyance conduit with first-stage condenser 21；Deduster 28 passes through 12 He of gas feed
Gas vent 13 is serially connected with the total delivery pipe of tail gas.
It is understood that gas feed 12 and gas vent 13 are connected with the total delivery pipe of tail gas.
In order to improve removal effect, and the chlorosilane liquid produced amount into deduster 28, above-mentioned removal mould are reduced as far as possible
Block further includes the first cooler 29 being serially connected with the total delivery pipe of tail gas, and the first cooler 29 is used to cool down is discharged by recovery module
Tail gas, the offgas outlet of the first cooler 29 connects with gas feed 12.
Above-mentioned first cooler 29 is used to tail gas being cooled to preset temperature, which is less than the bubble point temperature of tail gas
Degree, for the difference of the bubble point temperature of preset temperature and tail gas, the prioritizing selection preset temperature, can close to the bubble point temperature of tail gas
The chlorosilane liquid produced amount for needing to return in tail gas recycle module is effectively reduced, so that will be without fixed in the case where only consuming little energy
Type silica flour is thoroughly eradicated.
Certainly, also preset temperature can be set according to being actually needed, the utility model embodiment does not limit this.
Further, above-mentioned preset temperature is 32~100 DEG C.Certainly, also preset temperature can be selected according to the difference of environment
For other values, it is not limited to this.
For the structure and type of the first cooler 29, it is designed according to actual needs, such as above-mentioned first cooler
29 do not limit this for water-cooled cooler or air-cooled type cooler, the utility model embodiment.
In above-mentioned polycrystalline silicon production system, for reduction furnace to be multiple, the total delivery pipe of tail gas can be one, or two with
On.
When the total delivery pipe of tail gas is one, prioritizing selection dedusting module is one, and certainly, dedusting module, which also may be selected, is
Two or more, carries out the unformed silica flour of removal more than two-stage, simply cost is higher.
When the total delivery pipe at least two of tail gas, dedusting module also may be selected and corresponded with the total delivery pipe of tail gas, with
Ensure removal effect；Also it is one that dedusting module, which may be selected, can effectively reduce removal cost；The number of dedusting module also may be selected
More than one and less than the number of the total delivery pipe of tail gas.
In above-mentioned polycrystalline silicon production system, either one or the more total delivery pipes of tail gas, deduster 28 are one and go back
Be multiple, all need to meet that tail gas is passed under the liquid level of deduster 28, and by tail gas recycle module through under multi-stage condensing
Chlorosilane liquid produced sprayed from the top of deduster 28, by adjusting lower part accomplished continuously or intermittently property discharge amount of liquid and
The spray flux on top maintains the liquid level equilibrium of deduster 28.
In above-mentioned polycrystalline silicon production system, tail gas recycle module is by multi-stage condensing, the first-stage condenser as shown in 3 figures
21st, secondary condenser 22, three-level condenser 25, level Four condenser 26, the first condensate liquid surge tank 23, the second condensate liquid surge tank
27th, delivery pump 24 and associated pipe are formed.Wherein, chlorosilane liquid produced delivery pipe and the outlet of delivery pump 24.
A kind of more specifically embodiment is provided below：
In the improvement Siemens production system for producing 500 tons of polysilicons per month, reduction tail gas amount is about 30 ton hours, its tail gas
Molar content is substantially：Hydrogen about 80%, hydrogen chloride about 1%, remaining be silicon tetrachloride, trichlorosilane and dichlorosilane.
In the preferable factory of heat energy utilization, its exhaust temperature is about 120 DEG C.Dedusting is added between recovery module and tail gas recycle module
Device 28, the tail gas that recovery module produces is passed into the liquid phase of 28 lower part of deduster, and about 36 without unformed silicon~
The mixed gas of 38t/hr enters tail gas recycle process by the gas vent 13 on 28 top of deduster, and unformed silica flour is left on
Among liquid, siliceous powder liquid is formed, and other lower procedures are continuously discharged to the flow of 0.6t/hr and are evaporated recycling,
And unformed silica flour forms slurry after secondary concentration, processing is hydrolyzed, is thoroughly discharged outside production system circulation.Tail
Tail gas in gas recycling module by the first-stage condenser 21 of circulating water, secondary condenser 22, chilled brine cooling three
After the cooling of the level Four condenser 26 of level condenser 25 and freon evaporative condenser, chlorosilane liquid produced, which is condensed, to be collected to first
Condensate liquid surge tank 23, about -8~-15C of temperature, the chlorosilane of 6.5~8.5t/hr is returned, it can be achieved that dedusting by delivery pump 24
The material balance and heat balance of device 28, chlorosilane liquid produced of the lower part discharge containing unformed silica flour of deduster 28.
Embodiment two
Deduster 38 may also be arranged in tail gas recycle module, and in order to simplify pipeline, prioritizing selection deduster 38 is arranged on
Between the first-stage condenser 31 and secondary condenser 32 of tail gas recycle module.In above-mentioned polycrystalline silicon production system, tail gas recycle mould
Block passes through multi-stage condensing, first-stage condenser 31, secondary condenser 32 as shown in 4 figures, three-level condenser 35, level Four condenser
36th, the first condensate liquid surge tank 33, the second condensate liquid surge tank 37, delivery pump 34 and associated pipe are formed.Wherein, chlorosilane liquid
Body delivery pipe and the outlet of delivery pump 34.
Specifically, as shown in figure 4, the first-stage condenser 31 of above-mentioned tail gas recycle module and the tail gas of recovery module always discharge
Pipe connects, and the secondary condenser 32 of tail gas recycle module is connected by conveyance conduit with first-stage condenser 31；Deduster 38 passes through
Gas feed 12 and gas vent 13 are serially connected with conveyance conduit.At this time, first-stage condenser 31 act as first in embodiment one
The effect of cooler 29.
It is understood that gas feed 12 and gas vent 13 are connected with conveyance conduit.
In order to be easy to reach balancing the load, above-mentioned removal module further includes the second cooler being serially connected with conveyance conduit
39, the second cooler 39 is used to cool down the tail gas discharged by removal module, the offgas outlet and B-grade condensation of the second cooler 39
The inlet exhaust gas connection of device 32.It is understood that the second cooler 39 act as the work of first-stage condenser 21 in embodiment one
With.Certainly, the second cooler 39 can be also not provided with, at this time, three-level condenser 35 and level Four condenser 36 undertake more cooling
Load also can reach cooling purpose.
For the structure and type of the second cooler 39, it is designed according to actual needs, such as above-mentioned second cooler
39 do not limit this for water-cooled cooler or air-cooled type cooler, the utility model embodiment.
Above-mentioned first-stage condenser 31 act as the effect of the first cooler 29 in embodiment one, it is preferable that first-stage condenser
31 are used to tail gas being cooled to preset temperature, which is less than the bubble point temperature of tail gas, for preset temperature and tail gas
The difference of bubble point temperature, the prioritizing selection preset temperature can be reduced effectively in tail gas recycle module close to the bubble point temperature of tail gas
The chlorosilane liquid produced amount that need to be returned, so as to thoroughly eradicate unformed silica flour in the case where only consuming little energy.
Certainly, also preset temperature can be set according to being actually needed, the utility model embodiment does not limit this.
Further, above-mentioned preset temperature is 32~100 DEG C.Certainly, also preset temperature can be selected according to the difference of environment
For other values, it is not limited to this.
The foregoing description of the disclosed embodiments, enables those skilled in the art to realize or using the utility model.
A variety of modifications to these embodiments will be apparent for a person skilled in the art, as defined herein general former
Reason can be realized in other embodiments without departing from the spirit or scope of the present utility model.Therefore, this practicality is new
Type is not intended to be limited to the embodiments shown herein, and is to fit to and the principles and novel features disclosed herein phase
Consistent most wide scope.
Claims (11)
1. a kind of polycrystalline silicon production system, including：Recovery module, what the tail gas for being discharged to the recovery module was recycled
Tail gas recycle module；It is characterized in that, the polycrystalline silicon production system further includes the unformed silica flour in the removal tail gas
Remove module；Wherein,
The removal module includes deduster, and the deduster has：For the gas feed entered for the tail gas, for supplying
The gas vent of the tail gas discharge, enters to rinse the tail gas for the chlorosilane liquid produced for the tail gas recycle module
Liquid-inlet, for discharging the liquid outlet of siliceous powder liquid.
2. polycrystalline silicon production system according to claim 1, it is characterised in that the deduster also has spray thrower, institute
Spray thrower is stated to connect with the liquid-inlet.
3. polycrystalline silicon production system according to claim 1, it is characterised in that the gas feed and the liquid outlet
The gas feed and the liquid outlet are respectively positioned on the deduster when being respectively positioned on the lower housing portion of the deduster, and running
Under interior liquid level；The gas vent and the liquid-inlet are respectively positioned on the top of the housing, and gas during operation
Outlet and the liquid-inlet are respectively positioned on the liquid level in the deduster.
4. polycrystalline silicon production system according to claim 1, it is characterised in that the level-one condensation of the tail gas recycle module
Device is connected with the total delivery pipe of the tail gas of the recovery module, the secondary condenser of the tail gas recycle module by conveyance conduit with
The first-stage condenser connection；
Wherein, the deduster is serially connected with the total delivery pipe of the tail gas by the gas feed and the gas vent.
5. polycrystalline silicon production system according to claim 4, it is characterised in that the removal module, which further includes, is serially connected with institute
The first cooler on the total delivery pipe of tail gas is stated, first cooler is used to cool down the tail gas discharged by the recovery module,
The offgas outlet of first cooler is connected with the gas feed.
6. polycrystalline silicon production system according to claim 5, it is characterised in that first cooler is used for the tail
For air cooling to preset temperature, the preset temperature is 32~100 DEG C.
7. polycrystalline silicon production system according to claim 4, it is characterised in that
The total delivery pipe of tail gas and the dedusting module are one；
Or, the total delivery pipe at least two of tail gas, the dedusting module are corresponded with the total delivery pipe of the tail gas；
Or, the total delivery pipe at least two of tail gas, the dedusting module are one.
8. polycrystalline silicon production system according to claim 1, it is characterised in that the level-one condensation of the tail gas recycle module
Device is connected with the total delivery pipe of the tail gas of the recovery module, the secondary condenser of the tail gas recycle module by conveyance conduit with
The first-stage condenser connection；
Wherein, the deduster is serially connected with the conveyance conduit by the gas feed and the gas vent.
9. polycrystalline silicon production system according to claim 8, it is characterised in that the removal module, which further includes, is serially connected with institute
The second cooler on conveyance conduit is stated, second cooler is used to cool down by the tail gas of the removal module discharge, described
The offgas outlet of second cooler is connected with the inlet exhaust gas of the secondary condenser.
10. polycrystalline silicon production system according to claim 5, it is characterised in that the first-stage condenser is used for tail gas
Preset temperature is cooled to, the preset temperature is 32~100 DEG C.
11. according to the polycrystalline silicon production system described in any one in claim 1-10, it is characterised in that the liquid-inlet
Connected with the chlorosilane liquid produced delivery pipe of the tail gas recycle module；
The polycrystalline silicon production system further includes the evaporator for recycling chlorosilane, and the liquid outlet connects with the evaporator
It is logical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721094368.4U CN207342403U (en) | 2017-08-29 | 2017-08-29 | Polycrystalline silicon production system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201721094368.4U CN207342403U (en) | 2017-08-29 | 2017-08-29 | Polycrystalline silicon production system |
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| CN207342403U true CN207342403U (en) | 2018-05-11 |
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| CN201721094368.4U Expired - Fee Related CN207342403U (en) | 2017-08-29 | 2017-08-29 | Polycrystalline silicon production system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108607306A (en) * | 2018-05-25 | 2018-10-02 | 广州吉必盛科技实业有限公司 | Gas solid separation system in fumed nano power production and separation method |
-
2017
- 2017-08-29 CN CN201721094368.4U patent/CN207342403U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108607306A (en) * | 2018-05-25 | 2018-10-02 | 广州吉必盛科技实业有限公司 | Gas solid separation system in fumed nano power production and separation method |
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Granted publication date: 20180511 Termination date: 20190829 |