CN207152014U - A kind of cap of full wafer shaping - Google Patents

A kind of cap of full wafer shaping Download PDF

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Publication number
CN207152014U
CN207152014U CN201721194493.2U CN201721194493U CN207152014U CN 207152014 U CN207152014 U CN 207152014U CN 201721194493 U CN201721194493 U CN 201721194493U CN 207152014 U CN207152014 U CN 207152014U
Authority
CN
China
Prior art keywords
cap
fabric
inner liner
cloth
full wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201721194493.2U
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Chinese (zh)
Inventor
徐厂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hefei New David Arts & Crafts Co Ltd
Original Assignee
Hefei New David Arts & Crafts Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hefei New David Arts & Crafts Co Ltd filed Critical Hefei New David Arts & Crafts Co Ltd
Priority to CN201721194493.2U priority Critical patent/CN207152014U/en
Application granted granted Critical
Publication of CN207152014U publication Critical patent/CN207152014U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

It the utility model is related to field of hat, especially a kind of cap of full wafer shaping, formed by superficial layer and the inner liner suture of spheric, the superficial layer is made up of a monoblock circle fabric, four fold seamed edges are sewed on the inside of the circular fabric, four fold seamed edges are uniformly distributed around the center of circular fabric, and the extended line of four fold seamed edges passes through the center of circular fabric, the fold seamed edge is formed by the sector region set on circular fabric is equivalent, the inner liner is formed by four inner-layer cloth being distributed in a ring sutures, the inner-layer cloth is a quarter circle fabric, the joining edge of the inner-layer cloth is placed on the outside of inner liner.The utility model does not use the mode that polylith fabric mutually sutures, and has saved the substantial amounts of time, greatly improves the efficiency of cap production, outward appearance is more attractive in appearance, and cap is very firm, effectively prevents fabric running.

Description

A kind of cap of full wafer shaping
Technical field
It the utility model is related to field of hat, more particularly to a kind of cap of full wafer shaping.
Background technology
The small rounded cap of Jew is " Ji Pa " in Hebrew, means " covering ", and its meaning is to represent to revere God.On head Have day, can not " shaven head " with right, so being separated by with cap.But, initial Jew does not wear small rounded cap, let alone uses roundlet Cap makees their mark.
Arbitrarily, neatly, it is necktie not like to Jew's clothing, and Qiu Xia likes wearing cool slippers.They wear the mode of small rounded cap, Top should be precisely cried, because it is too small too light, slightly larger than fist, is buckled in the crown simplely, with the card of the other hair of woman Son is not overhead.Bald man, have to deflection pin the hair at edge a bit.
Israel can buy small rounded cap everywhere, and in the grand place of religion atmosphere, such as wailing wall, synagogue etc. One case small cap is established a capital and has freely been worn for visitor in the porch one on ground.Rounded cap provided herein is mostly black, with glazed printing paper or ox Mulberry paper is cut into circular or square.It need to only be buckled in the crown by visitor, then be lived with hand pressure, even if nourishing piety to place of arrival Meaning.
Present people when small rounded cap is made, are assembled by the fan-shaped cloth of slices, then will by needlework Fan-shaped cloth after assembling is fixed together to form cap, and after this kind of mode causes cap to be molded, picture on surface is imperfect, this kind system It is cumbersome to make mode, production efficiency is very low.
Utility model content
The purpose of this utility model is and one kind proposed in order to solve the shortcomings that cap low production efficiency in the prior art The cap of full wafer shaping.
To achieve these goals, the utility model employs following technical scheme:
Design a kind of cap of full wafer shaping, formed by superficial layer and the inner liner suture of spheric, the superficial layer by One monoblock circle fabric is made, and four fold seamed edges is sewed on the inside of the circular fabric, four fold seamed edges are around circle The center of fabric is uniformly distributed, and the extended line of four fold seamed edges passes through the center of circular fabric.
Four fold seamed edges are uniformly rolled over into one circular inside side of fabric, swells circular fabric, forms spheric Superficial layer, the mode that polylith fabric mutually sutures is not used, has saved the substantial amounts of time, greatly improve cap production Efficiency, and make the pattern of the cap after shaping more complete, attractive in appearance.
Preferably, the fold seamed edge is formed by the sector region set on circular fabric is equivalent, the sector region 5-35 ° of angle, by two side doublings of sector region together, then sutured by needlework, make circular fabric swell to form ball Planar.
Preferably, the inner liner is formed by the suture of four inner-layer cloths being distributed in a ring, and the inner-layer cloth is four/ One circular fabric, the joining edge of the inner-layer cloth are placed on the outside of inner liner, and spheric is stitched into by four inner-layer cloths Inner liner, then inner liner and superficial layer are stitched together, make the people being branded as more comfortable.
Preferably, the superficial layer and inner liner edge are equipped with the crimping to folded inside, and the crimping is sewn to On inner liner, make outward appearance more attractive in appearance, effectively prevent fabric running.
Preferably, the inner liner edge is sewed with sealing cloth, and the sealing cloth is strip cloth side along its length The J-shaped cloth obtained twice to doubling, the openend of the J-shaped cloth symmetrical fold is shorter one end, and J-shaped cloth is shorter Side be in contact with crimping.
First by strip cloth doubling, then from the doubling again of one end with opening, strip cloth is set to be changed into J Shape, it is then attached on crimping, not only reinforces the edge of cap, prevent running, and make cap more attractive in appearance, firm.
Preferably, bayonet socket is offered on the inner liner, people are plugged in card when being branded as, by one end of clamp Intraoral, the other end is fixed on hair, and cap is fixed on head by clamp.
The utility model proposes a kind of shaping of full wafer cap, beneficial effect is:The utility model does not use more The mode that block fabric mutually sutures, the substantial amounts of time is saved, greatly improved the efficiency of cap production, outward appearance is more beautiful See, and cap is very firm, effectively prevents fabric running.
Brief description of the drawings
Fig. 1 is cap sequence schematic diagram of the present utility model;
Fig. 2 is A portions of the present utility model structural representation;
Fig. 3 is circular fabric structure schematic diagram (unfolded) of the present utility model;
Fig. 4 is superficial layer upward view of the present utility model (after folding);
Fig. 5 is superficial layer front view of the present utility model (after folding);
Fig. 6 is inner liner top view of the present utility model;
Fig. 7 is inner liner front view of the present utility model;
Fig. 8 is inner liner upward view of the present utility model.
In figure:Circular fabric 1, sector region 2, superficial layer 3, fold seamed edge 4, inner liner 5, inner-layer cloth 6, joining edge 7, card Mouth 8, crimping 9, sealing cloth 10.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the embodiment of the utility model is carried out Clearly and completely describing, it is clear that described embodiment is only the utility model part of the embodiment, rather than whole Embodiment.
Reference picture 1-8, a kind of cap of full wafer shaping, is sutured and is formed by the superficial layer 3 and inner liner 5 of spheric, surface Layer 3 is made up of a monoblock circle fabric 1, and the inner side of circular fabric 1 sews four fold seamed edges 4, and four fold seamed edges 4 are surround The center of circular fabric 1 is uniformly distributed, and the extended line of four fold seamed edges 4 passes through the center of circular fabric 1, fold rib Side 4 is formed by the sector region 2 set on circular fabric 1 is equivalent, 5-35 ° of the angle of sector region 2, by the two of sector region 2 Individual side doubling together, is then sutured by needlework, the circular protuberance of fabric 1 is formed dome shape.
Inner liner 5 is sutured by four inner-layer cloths being distributed in a ring 6 and formed, and inner-layer cloth 6 is a quarter circle fabric, interior The joining edge 7 of layer cloth 6 is placed in the outside of inner liner 5, and the inner liner 5 of a spheric is stitched into by four inner-layer cloths 6, then will Inner liner 5 is stitched together with superficial layer 3, makes the people being branded as more comfortable.
Superficial layer 3 is equipped with the crimping 9 to folded inside with the edge of inner liner 5, and crimping 9 is sewn on inner liner 5, made Outward appearance is more attractive in appearance, effectively prevents fabric running, and the edge of inner liner 5 is sewed with sealing cloth 10, and sealing cloth 10 is strip cloth The bar J-shaped cloth that doubling obtains twice along its length, the openend of J-shaped cloth symmetrical fold are shorter one end, and J-shaped The shorter side of cloth is in contact with crimping 9, first by strip cloth doubling, then right again from one end with opening Folding, makes strip cloth be changed into J-shaped, is then attached on crimping 9, not only reinforces the edge of cap, prevents running, and make cap Son is more attractive in appearance, firm, bayonet socket 8 is offered on inner liner 5, people are plugged in card when being branded as, by one end of clamp In mouth 8, the other end is fixed on hair, and cap is fixed on head by clamp.
One circular fabric 1 is uniformly rolled over into four fold seamed edges 4 to inner side, swells circular fabric 1, forms spheric Superficial layer 3, do not use the mode that polylith fabric mutually sutures, saved the substantial amounts of time, greatly improve cap life The efficiency of production, and make the pattern of the cap after shaping more complete, attractive in appearance.
It is described above, the only preferable embodiment of the utility model, but the scope of protection of the utility model is not This is confined to, any one skilled in the art is in the technical scope that the utility model discloses, according to this practicality New technical scheme and its utility model design are subject to equivalent substitution or change, should all cover in protection model of the present utility model Within enclosing.

Claims (6)

1. a kind of cap of full wafer shaping, is formed, it is characterised in that institute by superficial layer (3) and inner liner (5) suture of spheric State superficial layer (3) to be made up of a monoblock circle fabric (1), four fold seamed edges are sewed on the inside of the circular fabric (1) (4), four fold seamed edges (4) are uniformly distributed around the center of circular fabric (1), and the extended line of four fold seamed edges (4) Pass through the center of circular fabric (1).
2. the cap of a kind of full wafer shaping according to claim 1, it is characterised in that the fold seamed edge (4) is by circle The sector region (2) set on fabric (1), which converts into, to be formed, 5-35 ° of the angle of the sector region (2).
3. the cap of a kind of full wafer shaping according to claim 1, it is characterised in that the inner liner (5) is in by four Inner-layer cloth (6) suture of annular spread forms, and the inner-layer cloth (6) is a quarter circle fabric, the seam of the inner-layer cloth (6) Side (7) are closed to be placed on the outside of inner liner (5).
4. the cap of a kind of full wafer shaping according to claim 1, it is characterised in that the superficial layer (3) and inner liner (5) edge is equipped with the crimping (9) to folded inside, and the crimping (9) is sewn on inner liner (5).
A kind of 5. cap of full wafer shaping according to claim 1 or 4, it is characterised in that inner liner (5) edge Sealing cloth (10) is sewed with, the sealing cloth (10) is the strip cloth J-shaped cloth that doubling obtains twice along its length, The openend of the J-shaped cloth symmetrical fold is shorter one end, and the shorter side of J-shaped cloth is in contact with crimping (9).
6. the cap of a kind of full wafer shaping according to claim 1, it is characterised in that offered on the inner liner (5) Bayonet socket (8).
CN201721194493.2U 2017-09-18 2017-09-18 A kind of cap of full wafer shaping Expired - Fee Related CN207152014U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201721194493.2U CN207152014U (en) 2017-09-18 2017-09-18 A kind of cap of full wafer shaping

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201721194493.2U CN207152014U (en) 2017-09-18 2017-09-18 A kind of cap of full wafer shaping

Publications (1)

Publication Number Publication Date
CN207152014U true CN207152014U (en) 2018-03-30

Family

ID=61722153

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201721194493.2U Expired - Fee Related CN207152014U (en) 2017-09-18 2017-09-18 A kind of cap of full wafer shaping

Country Status (1)

Country Link
CN (1) CN207152014U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021068276A1 (en) * 2019-10-12 2021-04-15 珠海市川富光学技术有限公司 Rapid-fold-up light-shielding device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021068276A1 (en) * 2019-10-12 2021-04-15 珠海市川富光学技术有限公司 Rapid-fold-up light-shielding device

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GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20180330

Termination date: 20210918