CN207082507U - Reaction chamber - Google Patents
Reaction chamber Download PDFInfo
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- CN207082507U CN207082507U CN201720245284.XU CN201720245284U CN207082507U CN 207082507 U CN207082507 U CN 207082507U CN 201720245284 U CN201720245284 U CN 201720245284U CN 207082507 U CN207082507 U CN 207082507U
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- faraday shield
- lock ring
- reaction chamber
- ring component
- earthing member
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Abstract
The utility model provides a kind of reaction chamber, it includes nonmetal cavity body, the Faraday shield being looped around on the periphery wall of the nonmetal cavity body and the lock ring component being looped around on the periphery wall of the Faraday shield, and the lock ring component is used for the thermal deformation for limiting Faraday shield.Reaction chamber provided by the utility model, it can avoid Faraday shield from being in contact with the radio-frequency coil in outside and cause short circuit, and the problem of the causing resin parts to melt that be in contact with resin parts.
Description
Technical field
Technical field of manufacturing semiconductors is the utility model is related to, in particular it relates to a kind of reaction chamber.
Background technology
Using inductively coupled plasma (Inductive Coupled Plasma Emission
Spectrometer, hereinafter referred to as ICP) during device enters the manufacturing process of line integrated circuit and MEMS, it is caused
Contain substantial amounts of electronics, ion, the atom of excitation state, molecule and free radical isoreactivity particle, these active grains in plasma
Son and substrate interaction make material surface that various physical and chemical reactions occur, so that material surface performance is changed.
In the manufacture based on ICP devices, multilayer material can alternately be deposited to substrate surface, and etch the multilayer material.
Fig. 1 is a kind of existing sectional view of the reaction chamber of ICP devices.As shown in figure 1, the reaction chamber includes metal
Cavity 101, nonmetal cavity body 102, metal cover board 103, Faraday shield 104 and radio-frequency coil 105.Wherein, in wire chamber
Electrostatic chuck 107 is provided with body 101, to fixed substrate.Nonmetal cavity body 102 is arranged on the top of metallic cavity 101, and
It is connected with metallic cavity 101.Metal cover board 103 is arranged on the top of nonmetal cavity body 102, to close nonmetal cavity body
102.Radio-frequency coil 105 is looped around the periphery of nonmetal cavity body 102, to be penetrated by nonmetal cavity body 102 to its inside feed-in
Frequency energy, to excite process gas to form plasma.Faraday shield 104 is looped around the periphery wall of nonmetal cavity body 102
On, during preventing that process gas from alternately entering 102 inside of nonmetal cavity body, such as " go out brightness " etc. occur can not normal build-up of luminance
The problem of.
The top and bottom of above-mentioned Faraday shield 104 pass through trip bolt 106 and metal cover board 103 and metal respectively
Cavity 101 is fixedly connected, and is grounded respectively by metal cover board 103 and metallic cavity 101, i.e. trip bolt 106 serves solid
Double action that is fixed and conducting.But because the cylinder of above-mentioned Faraday shield 104 belongs to flake structure, and its material
Linear heat of the linear expansion coefficient of (such as copper) far above the material (such as aluminium oxide ceramics or quartz) of nonmetal cavity body 101
The coefficient of expansion, when carrying out technique, the inside of nonmetal cavity body 102 is in the condition of high temperature for a long time, Faraday shield 104 by
Its temperature influences to have the risk of thermal deformation, as shown in Fig. 2 the cylinder 104a of the Faraday shield 104 after deformation is from centre
Heave, in " lantern " shape, cause to contact with the radio-frequency coil 105 in outside, short circuit occurs.
In addition, resin parts may be provided with the outside of Faraday shield 104, the Faraday shield of thermal deformation occurs
Part 104 once contacts with the resin parts, (can be higher than general resin material because the own temperature of Faraday shield 104 is too high
Allowable temperature), melt resin parts.
Utility model content
The utility model is intended at least solve one of technical problem present in prior art, it is proposed that a kind of reaction chamber
Room, it can be avoided because thermal deformation occurs for Faraday shield, and caused by be in contact with the radio-frequency coil in outside and cause short circuit
And the problem of the causing resin parts to melt that be in contact with resin parts.
To realize that the purpose of this utility model provides a kind of reaction chamber, including nonmetal cavity body and it is looped around described non-
Faraday shield on the periphery wall of metallic cavity, in addition to the lock ring being looped around on the periphery wall of the Faraday shield
Component, the lock ring component are used for the thermal deformation for limiting the Faraday shield.
Preferably, the lock ring component includes annular sheet metal and fixture, wherein,
The annular sheet metal has the opening that is axially penetrated through along it, and the annular sheet metal is along the Faraday shield
Length in the circumference of part is less than the girth of the periphery wall of the Faraday shield;
Two ends that the opening is corresponded in the annular sheet metal are relatively set with a pair towards the endless metal
The installation portion of the outside extension of piece, two mounting holes, the fixture peace are correspondingly arranged on a pair of installation portions respectively
In described two mounting holes, for by the annular sheet metal banding the Faraday shield periphery wall.
Preferably, the annular sheet metal is identical with the material of the Faraday shield.
Preferably, the opening is one or more, and multiple openings are along between the circumference of the Faraday shield
Every distribution;
The logarithm of the installation portion is equal with the quantity of the opening, and each to the installation portion and each opening one
Set corresponding to one.
Preferably, the lock ring component includes one or more, and multiple lock ring components are along the Faraday shield
The axially spaced-apart distribution of part.
Preferably, the axial direction between the adjacent two lock ring components is smaller than or equal to 90mm.
Preferably, it is one for the lock ring component, the lock ring component upper end with the Faraday shield respectively
Axial direction between lower end is smaller than or equal to 90mm;
It is multiple for the lock ring component, between the lock ring component of the superiors and the upper end of the Faraday shield
Axially it is smaller than or equal to 90mm, between the axial direction between undermost lock ring component and the lower end of the Faraday shield
Away from less than or equal to 90mm.
Preferably, the reaction chamber also includes radio-frequency coil, and the radio-frequency coil is looped around the Faraday shield
Outside;
The height of the lock ring component be arranged to make the lock ring component with each circle coil in the radio-frequency coil not
In sustained height.
Preferably, in addition to metal cover board, metallic cavity, upper earthing member and lower earthing member, wherein,
The metal cover board is arranged on the top of the nonmetal cavity body, and is grounded;
The metallic cavity is arranged on the bottom of the nonmetal cavity body, and is grounded;
The upper earthing member conducts the Faraday shield and the metal cover board;
The lower earthing member conducts the Faraday shield and the metallic cavity.
Preferably, the upper earthing member and lower earthing member are respectively conductive becket;
The upper earthing member is looped around on the periphery wall of the metal cover board, and the lower end of the upper earthing member and the method
Shielding part is drawn to connect;
The lower earthing member is looped around on the periphery wall of the Faraday shield, and the lower end of the lower earthing member and institute
State metallic cavity connection.
The utility model has the advantages that:
Reaction chamber provided by the utility model, it sets lock ring group by being surround on the periphery wall of Faraday shield
Part, for limiting the thermal deformation of Faraday shield, Faraday shield can be avoided to be in contact with the radio-frequency coil in outside and made
Into short circuit, and the problem of the causing resin parts to melt that be in contact with resin parts.
Brief description of the drawings
Fig. 1 is a kind of existing sectional view of the reaction chamber of ICP devices;
Fig. 2 is the front and rear local structural graph of Faraday shield deformation;
Fig. 3 is the sectional view for the reaction chamber that the utility model embodiment provides;
Fig. 4 is the longitudinal section view for the lock ring component that the utility model embodiment uses.
Embodiment
To make those skilled in the art more fully understand the technical solution of the utility model, come below in conjunction with the accompanying drawings to this
The reaction chamber that utility model provides is described in detail.
Fig. 3 is the sectional view for the reaction chamber that the utility model embodiment provides.Referring to Fig. 3, reaction chamber includes gold
Belong to cavity 201, metal cover board 205, nonmetal cavity body 204, Faraday shield 206 and radio-frequency coil 208.Wherein, in metal
Pedestal 202 is provided with cavity 201, to fixed substrate 203.Nonmetal cavity body 204 is arranged on the top of metallic cavity 201,
And it is connected with metallic cavity 201.Metal cover board 205 is arranged on the top of nonmetal cavity body 204, to close nonmetal cavity body
204.Radio-frequency coil 208 is looped around the outside of nonmetal cavity body 204, to be penetrated by nonmetal cavity body 204 to its inside feed-in
Frequency energy, to excite process gas to form plasma.Faraday shield 206 is looped around the periphery wall of nonmetal cavity body 204
On, during preventing that process gas from alternately entering 204 inside of nonmetal cavity body, such as " go out brightness " etc. occur can not normal build-up of luminance
The problem of.Faraday shield 206 is mainly made using the metal material such as copper.
Moreover, reaction chamber also includes the lock ring component 207 being looped around on the periphery wall of above-mentioned Faraday shield 206,
The lock ring component 207 is used for the thermal deformation for limiting Faraday shield 206.
Specifically, in the present embodiment, lock ring component 207 is two, and two lock ring components 207 are along Faraday shield
206 axial direction (vertical direction) is spaced apart.Preferably, the axial space D 1 between two adjacent lock ring components 207 is less than
Or equal to 90mm, with limit Faraday shield 207 to should axial space D 1 part thermal deformation.It is similar therewith
, the axial space D 2 between the lock ring component 207 of the superiors and the upper end of Faraday shield 206 is less than or equal to
90mm, to limit the thermal deformation of the upper end of Faraday shield 206;Undermost lock ring component 207 and Faraday shield 206
Axial space D 3 between lower end is less than or equal to 90mm, to limit the thermal deformation of the lower end of Faraday shield 206.
In actual applications, according to the actual axial length for drawing shielding part 207, the quantity of lock ring component 207 can be with
It is set as one, it is preferred that for a fastening assembly 207, it is respectively between the top and bottom of Faraday shield 206
Axial direction be smaller than or equal to 90mm.Or the quantity of lock ring component 207 can also be set as more than three, and along method
The axially spaced-apart of shielding part 206 is drawn to be distributed.
Fig. 4 is the longitudinal section view for the lock ring component that the utility model embodiment uses.Referring to Fig. 4, in the present embodiment
In, each lock ring component 207 includes annular sheet metal 207a and fixture, wherein, annular sheet metal 207a has along its axial direction
The opening 207b run through, and the length in circumferences of the annular sheet metal 207a along Faraday shield 206 is slightly less than faraday
The girth of the periphery wall of shielding part 206.Also, correspond to its two end for being open 207b in annular sheet metal 207a to be oppositely arranged
There is the installation portion (207c, 207d) of a pair of outside (lower section in Fig. 4) extensions towards annular sheet metal 207a, it is right at this respectively
Two mounting hole (not shown)s are correspondingly arranged on installation portion (207c, 207d), fixture is arranged on the two mounting holes
In, for by shortening the spacing between two installation portions (207c, 207d), and by annular sheet metal 207a bandings in faraday
On the periphery wall of shielding part 206.
It is readily appreciated that, by making the length in circumferences of the annular sheet metal 207a along Faraday shield 206 be slightly less than method
The periphery wall of shielding part 206 is drawn, when the spacing between two installation portions (207c, 207d) is shortened in the presence of fixture
When, annular sheet metal 207a opening 207b is tightened, so as to reach the effect of banding Faraday shield 206.
Preferably, above-mentioned annular sheet metal 207a is identical with the material of Faraday shield 206, with Faraday shield
During 206 expanded by heating, ensure that annular sheet metal 207a remains able to banding Faraday shield 206.
Further, in the present embodiment, above-mentioned fixing piece includes self-clinching nut 211 and screw 212, wherein, press spiral shell
Mother 211 is fixed in the installation portion 207d in left side mounting hole;Screw 212 sequentially passes through two installation portions from right to left
The mounting hole of (207c, 207d), and coordinate with the screw thread of self-clinching nut 211.Pass through tightening screw 212, you can reduce two peaces
Spacing between dress portion (207c, 207d), so as to by annular sheet metal 207a bandings Faraday shield 206 periphery wall
On.By unscrewing screw 212, the spacing between two installation portions (207c, 207d) can be increased, so as to from faraday screen
Annular sheet metal 207a is disassembled on the periphery wall of shield 206.Above-mentioned self-clinching nut 211 and screw 212 are relatively adapted to thin
The fixation of chip architecture.But in actual applications, the fixture of other arbitrary structures, such as bolt can also be used.
It should be noted that in the present embodiment, opening 207b is one, but the utility model is not limited thereto,
In actual applications, opening 207b can also be two or more, and more than two circumferences being open along Faraday shield 206
It is spaced apart.Also, the logarithm of above-mentioned installation portion is equal with opening 207b quantity, and each pair of installation portion and each opening 207b
It is one-to-one to set.
Preferably, the height of lock ring component 207 be arranged to make lock ring component 207 with each circle coil in radio-frequency coil not
In sustained height, i.e. lock ring component 207 is located in the gap between the adjacent two circles coil at corresponding height, to increase lock ring
Spacing between component 207 and radio-frequency coil 208, reduce the risk that short circuit occurs.
Preferably, reaction chamber also includes upper earthing member 209 and lower earthing member 210, wherein, metal cover board 205 is arranged on
The top of nonmetal cavity body 204, and be grounded.Metallic cavity 201 is arranged on the bottom of nonmetal cavity body 204, and is grounded.Upper ground connection
Part 209 conducts Faraday shield 206 and metal cover board 205;Lower earthing member 210 is by Faraday shield 206 and metal
Cavity 201 conducts, so as to realize the ground connection of Faraday shield 206.
Further, above-mentioned upper earthing member 209 and lower earthing member 210 are respectively conductive becket.Wherein, upper earthing member
209 are looped around on the periphery wall of metal cover board 205, and the lower end of upper earthing member 209 is connected with Faraday shield 206.Under connect
Ground part 210 is looped around on the periphery wall of Faraday shield 206, and the lower end of lower earthing member 210 is connected with metallic cavity 210.
Certainly, in actual applications, Faraday shield 206 can also be grounded using other any-modes.
In summary, the reaction chamber that the utility model embodiment provides, it passes through the periphery wall in Faraday shield
It is upper around lock ring component is set, for limiting the thermal deformation of Faraday shield, Faraday shield and outside can be avoided
Radio-frequency coil, which is in contact, causes short circuit, and the problem of the causing resin parts to melt that be in contact with resin parts.
It is understood that embodiment of above is merely to illustrate that principle of the present utility model and used exemplary
Embodiment, but the utility model is not limited thereto.For those skilled in the art, this is not being departed from
In the case of the spirit and essence of utility model, various changes and modifications can be made therein, and these variations and modifications are also considered as this reality
With new protection domain.
Claims (10)
1. a kind of reaction chamber, including nonmetal cavity body and the Faraday shield that is looped around on the periphery wall of the nonmetal cavity body
Part, it is characterised in that also include the lock ring component being looped around on the periphery wall of the Faraday shield, the lock ring component is used
In the thermal deformation for limiting the Faraday shield.
2. reaction chamber according to claim 1, it is characterised in that the lock ring component includes annular sheet metal and fixation
Part, wherein,
The annular sheet metal has the opening that is axially penetrated through along it, and the annular sheet metal is along the Faraday shield
Length in circumference is less than the girth of the periphery wall of the Faraday shield;
Two ends that the opening is corresponded in the annular sheet metal are relatively set with a pair towards the annular sheet metal
The installation portion of outside extension, is correspondingly arranged on two mounting holes, the fixture is arranged on a pair of installation portions respectively
In described two mounting holes, for by the annular sheet metal banding the Faraday shield periphery wall.
3. reaction chamber according to claim 2, it is characterised in that the annular sheet metal and the Faraday shield
Material it is identical.
4. reaction chamber according to claim 2, it is characterised in that the opening is one or more, and multiple described
Circumferentially-spaced distribution of the opening along the Faraday shield;
The logarithm of the installation portion is equal with the quantity of the opening, and each to the installation portion and each opening one a pair
The setting answered.
5. according to the reaction chamber described in claim 1-4 any one, it is characterised in that the lock ring component include one or
It is multiple, and axially spaced-apart distribution of multiple lock ring components along the Faraday shield.
6. reaction chamber according to claim 5, it is characterised in that the axial direction between two adjacent lock ring components
It is smaller than or equal to 90mm.
7. reaction chamber according to claim 5, it is characterised in that it is one for the lock ring component, the lock ring group
Axial direction of the part respectively between the top and bottom of the Faraday shield is smaller than or equal to 90mm;
It is multiple, the axial direction between the lock ring component of the superiors and the upper end of the Faraday shield for the lock ring component
It is smaller than or equal to 90mm, the axial spacing between undermost lock ring component and the lower end of the Faraday shield is small
In or equal to 90mm.
8. reaction chamber according to claim 1, it is characterised in that the reaction chamber also includes radio-frequency coil, described
Radio-frequency coil is looped around the outside of the Faraday shield;
The height of the lock ring component is arranged to make the lock ring component with each circle coil in the radio-frequency coil not same
One height.
9. reaction chamber according to claim 1, it is characterised in that also including metal cover board, metallic cavity, upper earthing member
With lower earthing member, wherein,
The metal cover board is arranged on the top of the nonmetal cavity body, and is grounded;
The metallic cavity is arranged on the bottom of the nonmetal cavity body, and is grounded;
The upper earthing member conducts the Faraday shield and the metal cover board;
The lower earthing member conducts the Faraday shield and the metallic cavity.
10. reaction chamber according to claim 9, it is characterised in that the upper earthing member and lower earthing member are respectively led
The becket of electricity;
The upper earthing member is looped around on the periphery wall of the metal cover board, and the lower end of the upper earthing member and the faraday
Shielding part connects;
The lower earthing member is looped around on the periphery wall of the Faraday shield, and the lower end of the lower earthing member and the gold
Belong to cavity connection.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201720245284.XU CN207082507U (en) | 2017-03-14 | 2017-03-14 | Reaction chamber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201720245284.XU CN207082507U (en) | 2017-03-14 | 2017-03-14 | Reaction chamber |
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CN207082507U true CN207082507U (en) | 2018-03-09 |
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CN201720245284.XU Active CN207082507U (en) | 2017-03-14 | 2017-03-14 | Reaction chamber |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023040757A1 (en) * | 2021-09-17 | 2023-03-23 | 江苏鲁汶仪器有限公司 | Cleaning method for plasma etching chamber, and application thereof |
TWI813110B (en) * | 2021-01-19 | 2023-08-21 | 南韓商Psk有限公司 | Faraday shield and apparatus for treating substrate |
-
2017
- 2017-03-14 CN CN201720245284.XU patent/CN207082507U/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI813110B (en) * | 2021-01-19 | 2023-08-21 | 南韓商Psk有限公司 | Faraday shield and apparatus for treating substrate |
WO2023040757A1 (en) * | 2021-09-17 | 2023-03-23 | 江苏鲁汶仪器有限公司 | Cleaning method for plasma etching chamber, and application thereof |
TWI834289B (en) * | 2021-09-17 | 2024-03-01 | 大陸商江蘇魯汶儀器有限公司 | Method for cleaning plasma etching chamber and application thereof |
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