CN207051632U - A kind of wafer polisher - Google Patents
A kind of wafer polisher Download PDFInfo
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- CN207051632U CN207051632U CN201720893145.8U CN201720893145U CN207051632U CN 207051632 U CN207051632 U CN 207051632U CN 201720893145 U CN201720893145 U CN 201720893145U CN 207051632 U CN207051632 U CN 207051632U
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- light source
- wafer
- camera
- source group
- mounting seat
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Abstract
The utility model discloses a kind of wafer polisher, relate to polishing apparatus field, including bracket component, light source assembly, camera, support mounting seat, material folding platform and camera mounting bracket；Support mounting seat, material folding platform, camera mounting bracket are from top to bottom combined and installed together successively, light source assembly is fixed on bracket component, treat that the wafer of polishing is placed on material folding platform, and below light source assembly, camera combination is installed on a mobile platform, light source assembly includes visual light source group, not visible light source group and shell, and visual light source group, not visible light source group are equipped with two rows, and the visual light source group of two rows and the not visible light source group of two rows are disposed in parallel in the inside of shell.Polishing can be carried out to wafer by the combination of various light sources in light source assembly in the present embodiment, improve the image quality of camera, improve the yield and efficiency of wafer processing, and the wafer polisher described in the present embodiment adapts to the polishing of a variety of wafers.
Description
Technical field
Polishing apparatus field is the utility model is related to, more particularly to a kind of wafer polisher.
Background technology
With the popularization of LED (Light Emitting Diode) product, such as the big displays of LED, LED, LED wafer
Deng existing LED product has the characteristics that energy-conservation, long-life, environmental protection, brightness are big.
In traditional LED wafer processing, using to light source include not visible infrared light supply and visual light source, can not
The characteristics of regarding infrared light supply is can penetrate coating polishing, and visual light source includes the light sources such as blue light, white light, and its feature is to penetrate
Coating polishing.
What the polishing equipment of traditional LED wafer used is all single light source, such as visual light source or not visible infrared light
Source, the process equipment exist portioned product can not be processed, efficiency is low, yield is poor, into aberration the problems such as.
Utility model content
The purpose of this utility model is to be directed to technical problem existing for prior art, there is provided a kind of wafer polisher,
The polishing equipment for mainly solving traditional LED wafer has that portioned product can not be processed, efficiency is low, yield is poor, asking into aberration
Topic.
In order to solve posed problems above, the technical solution adopted in the utility model is：
The utility model provides a kind of wafer polisher, including bracket component, light source assembly, camera, support peace
Fill seat, material folding platform and camera mounting bracket；
The support mounting seat, the material folding platform, the camera mounting bracket are from top to bottom combined and installed together successively,
The bracket component combination is arranged in the support mounting seat；
The light source assembly is fixed on the bracket component, treats that the wafer of polishing is placed on the material folding platform, and
Below the light source assembly；
Slide rail is provided with the camera mounting bracket, the slide rail slidably connects a mobile platform, the camera combination
On the mobile platform, the camera moves left and right with the mobile platform on the slide rail；
The light source assembly includes visual light source group, not visible light source group and shell；The enclosure is hollow, described
Visual light source group, the not visible light source group are equipped with two rows, and the visual light source group of two row and the not visible light of two rows
Source group is disposed in parallel in the inside of the shell.
As further improvement of the utility model, the visual light source group is by one or more blue-light source lamp bead groups
Into the not visible light source group is made up of one or more infrared light supply lamp beads.
As further improvement of the utility model, the visual light source group is by one or more blue-light source lamp bead groups
Into the not visible light source group is made up of one or more infrared light supply lamp beads.
As further improvement of the utility model, the shape of the shell includes rectangle, circle, square.
As further improvement of the utility model, the material folding platform is led including supporting plate, bottom plate, clamping element, two
Rail, four sliding blocks and rotation material platform；
The camera mounting bracket is fixedly mounted on the supporting plate bottom surface, and described two guide rails are symmetrically fixed on the support
On plate, four sliding blocks are divided into two groups, and the bottom surface of two groups of sliding blocks is slidably connected on described two guide rails respectively, institute
The top surface for stating four sliding blocks is fixedly connected with the bottom plate respectively, and the rotation material platform is fixed on the intermediate region of the bottom plate,
The clamping element sets and is fixed on the bottom plate around the bottom plate.
As further improvement of the utility model, the supporting plate, the bottom plate and the rotation material platform correspond to
The region for placing the wafer is machined with through hole, and the camera is located at the underface of the through hole.
As further improvement of the utility model, the bracket component includes mounting seat, the first light source bracket and the
Two light source brackets；
The mounting seat is fixed on the support mounting seat, and mounting hole, first light source are machined with the mounting seat
Support, the secondary light source support are symmetrically mounted on by screw in the mounting hole of the mounting seat.
As further improvement of the utility model, the first kidney slot is machined with first light source bracket, described
The second kidney slot is machined with two light source brackets；
The quantity of the light source assembly includes two, and described two light source assemblies are separately mounted to described first by screw
On kidney slot and the second kidney slot.
Compared with prior art, the beneficial effects of the utility model are：
Polishing can be carried out to the wafer by the combination of various light sources in the light source assembly in the present embodiment, improved
The image quality of the camera, improve the yield and efficiency of the wafer processing, and the wafer polishing dress described in the present embodiment
Put the polishing for adapting to a variety of wafers.
Brief description of the drawings
Fig. 1 is the structural representation of the wafer polisher described in the utility model embodiment；
Fig. 2 is the structural representation of bracket component described in the utility model embodiment；
Fig. 3 is the structural representation of light source assembly described in the utility model embodiment；
Fig. 4 is that not visible light source group described in the utility model embodiment is shown an effect for having coating DBR wafer polishings
It is intended to；
Fig. 5 is not visible light source group described in the utility model embodiment to another effect without coating DBR wafer polishings
Schematic diagram.
Reference：100- bracket components；110- mounting seats；The light source brackets of 120- first；The kidney slots of 121- first；130-
Secondary light source support；The kidney slots of 131- second；200- light source assemblies；The visual light source groups of 210-；The not visible light source groups of 220-；230-
Shell；300- wafers；400- cameras；500- support mounting seats；600- material folding platforms；610- supporting plates；620- bottom plates；630- is pressed from both sides
Tight part；640- guide rails；650- sliding blocks；660- rotation material platforms；700- camera mounting brackets；710- slide rails；720- mobile platforms.
Embodiment
For the ease of understanding the utility model, the utility model is more fully retouched below with reference to relevant drawings
State.Preferred embodiment of the present utility model is given in accompanying drawing.But the utility model can come in fact in many different forms
It is existing, however it is not limited to embodiment described herein.On the contrary, the purpose for providing these embodiments is made to public affairs of the present utility model
Open the understanding more thorough and comprehensive of content.
Unless otherwise defined, all of technologies and scientific terms used here by the article is led with belonging to technology of the present utility model
The implication that the technical staff in domain is generally understood that is identical.It is simply in term used in the description of the present utility model herein
The purpose of description specific embodiment, it is not intended that in limitation the utility model.
Shown in reference picture 1, for the structural representation of wafer polisher described in the utility model embodiment, including support group
Part 100, light source assembly 200, camera 400, support mounting seat 500, material folding platform 600 and camera mounting bracket 700；
From top to bottom combination is pacified successively for the support mounting seat 500, the material folding platform 600, the camera mounting bracket 700
It is fitted together, the combination of bracket component 100 is arranged in the support mounting seat 500.
The light source assembly 200 is fixed on the bracket component 100, the number of light source assembly 200 described in the present embodiment
Measure as two, and described two light source assemblies 200 are symmetrically fixed on the bracket component 100, are beaten to strengthen the wafer
The uniformity of electro-optical device polishing；The bracket component 100 is used to fix the light source assembly 200；The material folding platform 600 is used for
The wafer 300 for treating polishing is placed on, the wafer 300 is used for positioned at the lower section of light source assembly 200, the light source assembly 200
Polishing is carried out to the wafer 300；The material folding platform 600 clamps the wafer 300, ensures processed in the wafer 300
Cheng Zhong, the position specified can be moved to platform and is taken pictures, and by the camera 400 to having revolved the positive wafer
300 are taken pictures.
The material folding platform 600 includes supporting plate 610, bottom plate 620,640, four, the guide rail sliding block of clamping element 630, two
650 and rotation material platform 660；Described two guide rails 640 are symmetrically fixed in the supporting plate 610, and four sliding blocks 650 divide
For two groups, and the bottom surface of two groups of sliding blocks is slidably connected on described two guide rails 640 respectively, four sliding blocks 650
Top surface is fixedly connected with the bottom plate 620 respectively, and the bottom plate 620 is acted on the guide rail 640 by the sliding block 650
Slide；The rotation material platform 660 is fixed on the intermediate region of the bottom plate 620, and the clamping element 630 is around the bottom plate 620
Set and be fixed on the bottom plate 620, the quantity of clamping element 630 described in the present embodiment includes four and is located at the rotation
Expect the surrounding of platform 660, the platform 660 of rotation material described in the present embodiment is used to place the wafer 300, when the pine of clamping element 630
The wafer 300 can expect that platform 660 rotates on the bottom plate 620 with the rotation when opening the wafer 300, treat the wafer
After 300 position fixes, the wafer 300 is clamped by four clamping elements 630；In the present embodiment, in institute
State clamping element 630 and include cylinder and clamping jaw, the clamping jaw is arranged on the output end of the cylinder, and the cylinder can drive described
Clamping jaw clamps or unclamps the wafer 300, in addition, the clamping element 630 also includes other structures, such as mounting structure,
Do not repeated in the application.
The camera mounting bracket 700 is fixedly mounted on the bottom surface of supporting plate 610, is set in the camera mounting bracket 700
There is slide rail 710, a mobile platform 720 is connected with the slide rail 710, the combination of camera 400 is arranged on the movement
On platform 720, the supporting plate 610, the bottom plate 620 and the rotation material platform 660, which correspond to, places the wafer 300
Region is machined with through hole, and the camera 400 is located at the underface of the through hole, and the camera 400 is used to shoot in it just
Image after the polishing of the wafer 300 of top, camera 400 described in the present embodiment can be as the mobile platform 720 be in institute
State and moved left and right on slide rail 710, so that the camera 400 carries out multiposition shooting to the wafer 300 after polishing.
Shown in reference picture 2, for the structural representation of bracket component 100 described in the utility model embodiment, the support group
Part 100 includes mounting seat 110, the first light source bracket 120 and secondary light source support 130；
The mounting seat 110 is fixed in the support mounting seat 500, and mounting hole (figure is machined with the mounting seat 110
Do not show), first light source bracket 120, the secondary light source support 130 are symmetrically mounted on the mounting seat 110 by screw
Mounting hole in, the first light source bracket 120 described in the present embodiment, the secondary light source support 130 can pass through set screw
Locked position adjust the position of first light source bracket 120, the secondary light source support 130；The first light source branch
The first kidney slot 121 is machined with frame 120, is machined with the second kidney slot 131 on the secondary light source support 130, it is described two
Light source assembly 200 is separately mounted on the kidney slot 131 of the first kidney slot 121 and second by screw, institute in the present embodiment
Height, front and rear and angle polishing position adjustments can be carried out by the locked position of set screw by stating two light source assemblies 200.
Shown in reference picture 3, for the structural representation of light source assembly 200 described in the utility model embodiment, the light source group
Part 200 includes visual light source group 210, not visible light source group 220 and shell 230, the inner hollow of shell 230, it is described can
The inside of the shell 230 is disposed in parallel in depending on light source group 210, the not visible light source group 220, can described in the present embodiment
Two rows are equipped with depending on light source group 210, the not visible light source group 220, and the visual light source group 210 of two row and two row are not
Visual light source group 220 is disposed in parallel in the inside of the shell 230；The visual light source group 210 is by one or more blue lights
Source lamp bead composition, the not visible light source group 220 are made up of one or more infrared light supply lamp beads；The visual light source group 210,
Each light source lamp bead in the not visible light source group 220 is electrically connected with light source controller (not shown), the light source control
Device processed can in visual 210 or described not visible light source group 220 of light source group described in independent control light source lamp bead luminosity power,
And in visual 210 or described not visible light source group 220 of light source group described in independent control light source lamp bead light on and off situation；In this reality
With in new other embodiment, the shell 230 can set its shape according to specific process requirements, such as：Rectangle, circle
Shape, square etc.；The light source assembly 200 is not limited to the combining form of both light sources of blue-light source and infrared light supply, can be
The combination of light sources form of other three kinds or more, such as：The light sources such as white, green can be added in the visual light source group 210
It is combined with infrared light supply；The visual light source group 210, the quantity of the light source lamp bead of the not visible light source group 220 can roots
Set according to the size of the inner space of shell 230, be defined in the present embodiment not to this.
In embodiment of the present utility model, the camera 400 is located at the underface of the wafer 300, the camera 400
The wafer 300 after polishing is shot by adjusting focus, so as to record the image of wafer 300 after polishing letter
Breath；The camera 400 is CCD (Charge-coupled Device) camera, and the CCD camera can be used for catching visual light source
And the wavelength of not visible light source, i.e., described CCD camera can be to the visual light source group 210 and the not visible light source groups
220 respectively to the image after the polishing of wafer 300；The wafer 300 is thin rounded flakes, wafer 300 described in the present embodiment
Being divided into according to polishing effect has coating DBR (distributed bragg reflector mirror) wafers and the wafer without coating DBR, and is applied to
Wafer polisher described in the present embodiment；In other embodiment of the present utility model, the wafer polisher is not limited to
The wafer 300 or the wafer with the near field of wafer 300, apply also for the similar sheet knot such as other glass, ceramics
The polishing of structure.
Optionally, wafer polisher described in the present embodiment can also carry out polishing, now, institute to some special wafers
Stating light source controller can control the visual light source group 210 and described 220 two kinds of light sources of not visible light source group to be combined polishing,
And the appropriate brightness of each light source lamp bead in the visual light source group 210 and the not visible light source group 220 can be set respectively, with
Obtain the optimum efficiency of combination polishing；In addition, when the wafer polisher carries out replacing parts, the light source controller
The light source lamp bead of the controllable visual light source group 210 is lighted, to illuminate replacing of the whole polisher so as to auxiliary spare part.
In embodiment of the present utility model, it can be divided into by polishing of the wafer polisher to the wafer 300
Following four kinds of situations：
When the light source controller lights the light source lamp bead of the not visible light source group 220 and extinguishes the visual light source
During the light source lamp bead of group 210, i.e., using the not visible light source group 220 to there is the polishing that coating DBR wafers carry out single light source
When, by the camera 400 to there are coating DBR wafers to shoot after polishing, as shown in figure 4, its polishing effect is preferable, do not have
Occur piebald and variegated interference；
When the light source controller extinguishes the light source lamp bead of the not visible light source group 220 and lights the visual light source
During the light source lamp bead of group 210, i.e., using polishing of the visual light source group 210 to carrying out single light source without coating DBR wafers when,
By the camera 400 to being shot after polishing without coating DBR wafers, its polishing effect and the not visible light source group
220 pairs of polishing effects for having coating DBR wafers are more or less the same, and its imaging effect is slightly better；
When the light source controller lights the light source lamp bead of the not visible light source group 220 and extinguishes the visual light source
During the light source lamp bead of group 210, i.e., using the not visible light source group 220 to the polishing without coating DBR wafers progress single light source
When, by the camera 400 to being shot after polishing without coating DBR wafers, as shown in figure 5, described in its polishing effect ratio
Visual light source group 210 is poor to the polishing effect without coating DBR wafers, and easily piebald and variegated interference occurs, as shown
The irregular line segment of middle appearance and small strip etc., the piebald and variegated interference that figure occurs as after polishing；
When the light source controller extinguishes the light source lamp bead of the not visible light source group 220 and lights the visual light source
During the light source lamp bead of group 210, that is, when using the visual light source group 210 to there is the polishing of coating DBR wafers progress single light source,
It is very dark in the visual field of the camera 400 by the camera 400 to after polishing when thering are the coating DBR wafers to shoot,
The image of i.e. described shooting cannot have any image information of coating DBR wafers.
Polishing can be carried out to the wafer 300 by the combination of various light sources in the light source assembly 200 in the present embodiment,
The image quality of the camera 400 is improved, improves yield and efficiency that the wafer 300 is processed, and described in the present embodiment
Wafer polisher adapt to the polishings of a variety of wafers.
In the present embodiment, those skilled in the art will be appreciated that term " comprising ", "comprising" or its it is any its
His variant is intended to including for nonexcludability, except comprising those listed key elements, but also can include and be not expressly set out
Other element.
In the present embodiment, the involved noun of locality such as forward and backward, upper and lower is located in figure and tied with structure in accompanying drawing
The mutual position of structure is intended merely to the clear of expression technology scheme and conveniently come what is defined.It should be appreciated that the noun of locality
Use should not limit the claimed scope of the application.
Embodiment of the present utility model is simultaneously not restricted to the described embodiments, other any without departing from the utility model
Spirit Essence with made under principle change, modification, replacement, combine, simplification, should be equivalent substitute mode, also all wrap
It is contained within the scope of protection of the utility model.
Claims (8)
- A kind of 1. wafer polisher, it is characterised in that；Including bracket component, light source assembly, camera, support mounting seat, material folding Platform and camera mounting bracket；The support mounting seat, the material folding platform, the camera mounting bracket are from top to bottom combined and installed together successively, described Bracket component combination is arranged in the support mounting seat；The light source assembly is fixed on the bracket component, treats that the wafer of polishing is placed on the material folding platform, and be located at Below the light source assembly；Slide rail is provided with the camera mounting bracket, the slide rail slidably connects a mobile platform, the camera combination installation On the mobile platform, the camera moves left and right with the mobile platform on the slide rail；The light source assembly includes visual light source group, not visible light source group and shell；The enclosure is hollow, described visual Light source group, the not visible light source group are equipped with two rows, and the visual light source group of two row and the not visible light source group of two row It is disposed in parallel in the inside of the shell.
- 2. wafer polisher according to claim 1, it is characterised in that：The visual light source group is by one or more blue Color light source lamp bead is formed, and the not visible light source group is made up of one or more infrared light supply lamp beads.
- 3. wafer polisher according to claim 1, it is characterised in that：The visual light source group, the not visible light Each light source lamp bead in the group of source is electrically connected with light source controller.
- 4. wafer polisher according to claim 1, it is characterised in that：The shape of the shell includes rectangle, circle Shape, square.
- 5. wafer polisher according to claim 1, it is characterised in that：The material folding platform include supporting plate, bottom plate, Clamping element, two guide rails, four sliding blocks and rotation material platform；The camera mounting bracket is fixedly mounted on the supporting plate bottom surface, and described two guide rails are symmetrically fixed on the supporting plate On, four sliding blocks are divided into two groups, and the bottom surface of two groups of sliding blocks is slidably connected on described two guide rails respectively, described The top surface of four sliding blocks is fixedly connected with the bottom plate respectively, and the rotation material platform is fixed on the intermediate region of the bottom plate, institute Clamping element is stated to set and be fixed on the bottom plate around the bottom plate.
- 6. wafer polisher according to claim 5, it is characterised in that：The supporting plate, the bottom plate and described The region that rotation material platform corresponds to the placement wafer is machined with through hole, and the camera is located at the underface of the through hole.
- 7. wafer polisher according to claim 1, it is characterised in that：The bracket component includes mounting seat, first Light source bracket and secondary light source support；The mounting seat is fixed on the support mounting seat, is machined with mounting hole in the mounting seat, first light source bracket, The secondary light source support is symmetrically mounted on by screw in the mounting hole of the mounting seat.
- 8. wafer polisher according to claim 7, it is characterised in that：First is machined with first light source bracket Kidney slot, the second kidney slot is machined with the secondary light source support；The quantity of the light source assembly includes two, and described two light source assemblies are separately mounted to first kidney-shaped by screw On groove and the second kidney slot.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720893145.8U CN207051632U (en) | 2017-07-21 | 2017-07-21 | A kind of wafer polisher |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720893145.8U CN207051632U (en) | 2017-07-21 | 2017-07-21 | A kind of wafer polisher |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207051632U true CN207051632U (en) | 2018-02-27 |
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ID=61496473
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720893145.8U Active CN207051632U (en) | 2017-07-21 | 2017-07-21 | A kind of wafer polisher |
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| Country | Link |
|---|---|
| CN (1) | CN207051632U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112362580A (en) * | 2020-10-26 | 2021-02-12 | 琉明光电(常州)有限公司 | Photographing detection system and method for probe mark |
-
2017
- 2017-07-21 CN CN201720893145.8U patent/CN207051632U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112362580A (en) * | 2020-10-26 | 2021-02-12 | 琉明光电(常州)有限公司 | Photographing detection system and method for probe mark |
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