CN207042239U - Dry process HCl gas equipment - Google Patents
Dry process HCl gas equipment Download PDFInfo
- Publication number
- CN207042239U CN207042239U CN201720985950.3U CN201720985950U CN207042239U CN 207042239 U CN207042239 U CN 207042239U CN 201720985950 U CN201720985950 U CN 201720985950U CN 207042239 U CN207042239 U CN 207042239U
- Authority
- CN
- China
- Prior art keywords
- hcl gas
- cylinder
- chemical tank
- chemical
- dry process
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001035 drying Methods 0.000 title claims abstract description 21
- 239000000126 substance Substances 0.000 claims abstract description 39
- 239000013043 chemical agent Substances 0.000 claims abstract description 24
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 4
- 239000001110 calcium chloride Substances 0.000 claims description 4
- 229910001628 calcium chloride Inorganic materials 0.000 claims description 4
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 claims description 4
- 239000000920 calcium hydroxide Substances 0.000 claims description 4
- 229910001861 calcium hydroxide Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 65
- 239000002253 acid Substances 0.000 abstract description 14
- 239000003595 mist Substances 0.000 abstract description 9
- 238000010521 absorption reaction Methods 0.000 abstract description 4
- 230000002328 demineralizing effect Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 46
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 36
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 36
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002912 waste gas Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 238000005201 scrubbing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 235000019504 cigarettes Nutrition 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
Description
Claims (6)
- A kind of 1. dry process HCl gas equipment, it is characterised in that including:Cylinder, air exhauster and chemical tank, the chemical tank It is arranged in the cylinder, the chemical agent for being used for removing HCl gas is provided with the chemical tank, the chemical tank is provided with It is easy to the through hole of air-flow from bottom to top, the air exhauster is arranged at the top of the cylinder, and the cylinder body bottom is provided with air inlet.
- 2. dry process HCl gas equipment according to claim 1, it is characterised in that be provided with multiple edges in the cylinder Its chemical tank being axially distributed.
- 3. dry process HCl gas equipment according to claim 2, it is characterised in that the chemical agent includes composition For calcium chloride and the chemical agent of granular calcium hydroxide.
- 4. dry process HCl gas equipment according to claim 3, it is characterised in that the top of the cylinder is provided with Taper gas collection portion, the back taper gas collection portion top are provided with the escape pipe of cylinder, and the air exhauster is arranged on the escape pipe It is interior.
- 5. dry process HCl gas equipment according to claim 4, it is characterised in that the air inlet is arranged on described In the side wall of cylinder body bottom.
- 6. dry process HCl gas equipment according to claim 5, it is characterised in that flow is provided with the air inlet Control valve.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201720985950.3U CN207042239U (en) | 2017-08-08 | 2017-08-08 | Dry process HCl gas equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201720985950.3U CN207042239U (en) | 2017-08-08 | 2017-08-08 | Dry process HCl gas equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
CN207042239U true CN207042239U (en) | 2018-02-27 |
Family
ID=61499438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201720985950.3U Active CN207042239U (en) | 2017-08-08 | 2017-08-08 | Dry process HCl gas equipment |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN207042239U (en) |
-
2017
- 2017-08-08 CN CN201720985950.3U patent/CN207042239U/en active Active
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 201821 room 2, 2 floor, 2, 2229 Yongsheng Road, Jiading District industrial area, Shanghai. Patentee after: SHANGHAI SHENGJIAN ENVIRONMENTAL SYSTEM TECHNOLOGY Co.,Ltd. Address before: 201821 25F, Taihu Shijia International Building, 1198 De Fu Road, Jiading District, Shanghai Patentee before: SHANGHAI SHENGJIAN ENVIRONMENT SYSTEM SCIENCE & TECHNOLOGY CO.,LTD. |
|
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: No. 301 Huifa Road, Jiading District, Shanghai, 2018 Patentee after: Shanghai Shengjian Technology Co.,Ltd. Country or region after: China Address before: 201821 room 2, 2 floor, 2, 2229 Yongsheng Road, Jiading District industrial area, Shanghai. Patentee before: SHANGHAI SHENGJIAN ENVIRONMENTAL SYSTEM TECHNOLOGY Co.,Ltd. Country or region before: China |