CN206908092U - VCSEL array light source, laser projection device and 3D imaging devices - Google Patents

VCSEL array light source, laser projection device and 3D imaging devices Download PDF

Info

Publication number
CN206908092U
CN206908092U CN201720532344.6U CN201720532344U CN206908092U CN 206908092 U CN206908092 U CN 206908092U CN 201720532344 U CN201720532344 U CN 201720532344U CN 206908092 U CN206908092 U CN 206908092U
Authority
CN
China
Prior art keywords
light source
vcsel
subarray
array
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201720532344.6U
Other languages
Chinese (zh)
Inventor
王兆民
闫敏
许星
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orbbec Inc
Original Assignee
Shenzhen Orbbec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Orbbec Co Ltd filed Critical Shenzhen Orbbec Co Ltd
Priority to CN201720532344.6U priority Critical patent/CN206908092U/en
Application granted granted Critical
Publication of CN206908092U publication Critical patent/CN206908092U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Semiconductor Lasers (AREA)

Abstract

The utility model discloses a kind of VCSEL array light source, laser projection device and 3D imaging devices.Wherein, the VCSEL array light source, including:Semiconductor substrate;Multiple VCSEL light sources are arranged on the semiconductor substrate in the form of two-dimensional array;The one or more in translation, rotation, mirror image, scaling relation between each other at least be present in the subarray, being distributed in the VCSEL light source of semiconductor substrate surface has high irrelevance, solve the problems, such as that the irrelevance for the VCSEL light source for being used for 3D imagings in the prior art is low, VCSEL array of the present utility model is mainly used in depth camera.

Description

VCSEL array light source, laser projection device and 3D imaging devices
Technical field
Optics and electronic technology field are the utility model is related to, is formed more particularly to a kind of by multiple subarrays VCSEL array.
Background technology
The 3D imaging technique that is especially applicable in consumer field of 3D imagings will constantly impact in addition substitute traditional 2D into As technology, 3D imaging technique can also obtain the depth of target object in addition to possessing and carrying out 2D imaging capabilities to target object Information, the functions such as 3D scannings, scene modeling, gesture interaction can further be realized according to depth information.Depth camera is particularly Structure light depth camera or TOF (time flight) depth camera are the hardware devices for being generally used to 3D imagings at present.
Core component in depth camera is laser projection module, according to the difference of depth camera species, laser projection mould The structure of group is also had any different with function, for example the projection module disclosed in patent CN201610977172A is used for into space For projection speckle patterns to realize structure light depth survey, this spot structure light depth camera is also more ripe and extensive at present The scheme of use.With the continuous extension of depth camera application field, optical projection module by less and less volume and Constantly evolved in higher and higher performance.
Using VCSEL (vertical cavity surface emitting laser) array light source depth camera because with small volume, power it is big, The advantages that light beam is concentrated will substitute edge emitting generating laser light source, be in an extremely small base the characteristics of VCSEL array Laser projection, such as the cloth in 2mmx2mm Semiconductor substrate are carried out on bottom by way of arranging multiple VCSEL light sources Put 100 even more VCSEL light sources.For structure light depth camera, spot that its laser projection module outwards projects Pattern requirement has high irrelevance, and this requirement adds the design difficulty that light source arranges in VCSEL array.
The content of the invention
In order to solve the problems, such as that the irrelevance of the VCSEL light source for 3D imagings is low, the utility model proposes one kind VCSEL array light source.
Technical problem of the present utility model is solved by following technical scheme:Solution bag of the present utility model Include VCSEL array light source, laser projection device and 3D imaging devices.
The utility model proposes VCSEL array light source, including:Semiconductor substrate;Multiple VCSEL light sources are with two-dimensional array Form arrangement on the semiconductor substrate;The two-dimensional array includes multiple subarrays, and the subarray is mutual extremely Few one or more existed in translation, rotation, mirror image, scaling relation.Wherein, the subarray be distributed in regular domain and/ Or in irregular area, the regular domain includes polygonal region or border circular areas again.Form adjacent two of two-dimensional array Had between individual subarray:Part is overlapped, no VCSEL light source be present interval region, the one or more of coincident Situation.In a specific embodiment, the arrangement mode of VCSEL light source described in the subarray is irregular arrangement.In addition, institute State Semiconductor substrate to be made up of more sub- substrates, be arranged the submatrix of the VCSEL light source on the sub- substrate accordingly Row.
Similar, in addition to a kind of VCSEL array light source, including:Semiconductor substrate;Multiple VCSEL light sources are with two Tie up the form arrangement of array on the semiconductor substrate;The two-dimensional array includes multiple subarrays, the subarray it is big At least one aspect in small, distribution shape, quantity of light source is different.
Meanwhile the laser projection device that the utility model is proposed, including:
Any of the above-described described VCSEL array light source;
At least one lens, for receiving and converging the light beam launched by the laser array;
Speckle patterns maker, for expand transmitting speckle patterns light beam in backward space by the light beam;
The lens are single lens, one kind in microlens array or combination;
The speckle patterns maker is one or more combinations in microlens array, DOE, grating.
In addition, the 3D imaging devices that the utility model is proposed, including:
Above-mentioned laser projection device, for the emitting structural light pattern light beam into space;
Image collecting device, the structure formed on target object is radiated at by the structured light patterns light beam for gathering Light image;
Processor, receive the structure light image and the depth map of the target object is calculated according to trigonometry principle Picture.Wherein:
The trigonometry principle is referred to using inclined between the matching algorithm calculating structure light image and reference picture From value, the depth image is calculated according to the deviation value.
The beneficial effect that the utility model is compared with the prior art includes:Multiple VCSEL light sources are in the form of two-dimensional array Arrange on the semiconductor substrate, wherein, the two-dimensional array includes multiple subarrays, and the subarray is mutual at least In the presence of the one or more in translation, rotation, mirror image, scaling relation, the arrangement side for the two-dimensional array being made up of the subarray Formula in either direction on subregion be respectively provided with irrelevance, be the distribution situation of VCSEL light source corresponding to two-dimensional array, so as to Being distributed in the VCSEL light source of semiconductor substrate surface has high irrelevance.
Brief description of the drawings
Fig. 1 is the side view of the structure light depth camera system in the utility model embodiment.
Fig. 2 is the side view of the laser projection device in the utility model embodiment.
Fig. 3 is a kind of schematic diagram of the VCSEL array of embodiment of the present utility model.
Fig. 4 is a kind of schematic diagram of the VCSEL array of embodiment of the present utility model.
Fig. 5 is a kind of schematic diagram of the VCSEL array of embodiment of the present utility model.
Fig. 6 is a kind of schematic diagram of the VCSEL array of embodiment of the present utility model.
Fig. 7 is a kind of schematic diagram of the VCSEL array of embodiment of the present utility model.
Fig. 8 is a kind of schematic diagram of the VCSEL array of embodiment of the present utility model.
Fig. 9 is a kind of schematic diagram of the VCSEL array of embodiment of the present utility model.
Embodiment
Below against accompanying drawing and with reference to preferred embodiment, the utility model is described in further detail.
The utility model proposes a kind of VCSEL array formed by multiple subarrays, the VCSEL array may be used as 3D into As the light source of the laser projection device in equipment, at the same based on this laser array propose corresponding to laser projection device and 3D imaging devices, 3D imaging devices here are called depth camera, each picture in the image of the object taken by depth camera What the value on element represented is depth value of the corresponding point between depth camera in space.Will be to swashing in explanation below Illustrated exemplified by optical arrays, laser projection device and depth camera, but be not meant to that this laser array is only capable of applying In depth camera, in any other device it is every directly or indirectly utilize the utility model in technical scheme all should by comprising In the scope of protection of the utility model.
The depth camera side schematic view based on structure light shown in Fig. 1.Depth camera (3D imaging devices) 101 is main Building block has laser projection module (equivalent to laser projection device) 104, collection module (equivalent to image collecting device) 105th, mainboard 103 and processor 102, further provided with RGB camera 107 in some depth cameras.Laser projection module 104, Collection module 105 and RGB camera 107 are generally mounted in same depth camera plane, and are in same baseline, often Individual module or camera all correspond to a light portal 108.Usually, processor 102 is integrated on mainboard 103, and laser is thrown Shadow module 104 is connected with collection model 105 by interface 106 with mainboard, and described interface connects for FPC in one embodiment Mouthful.Mainboard can be the circuit board or semiconductor substrate for including circuit, or can be for supporting and radiating Support etc..Wherein, laser projection module is used to project encoded structured light patterns into object space, collection module collection By the processing of processor so as to obtaining the depth image of object space after to the structure light image.In one embodiment, tie Structure light image is infrared laser speckle pattern, and pattern is relatively uniform with distribution of particles but with very high local irrelevance, Here local irrelevance refers to along in some direction dimension (referring generally to along laser projection module and collection in pattern Direction where module line) each sub-regions all have higher uniqueness.Corresponding collection module 105 is and optical projection Infrared camera corresponding to module 104.Depth image is obtained in particular to receiving what is collected by collection module using processor After speckle pattern, depth image is further obtained by calculating the deviation value between speckle pattern and reference speckle pattern.
Fig. 2 is a kind of embodiment of laser projection module 104 in Fig. 1.Laser projection module 104 includes substrate 201, light Source 202, lens 203 and speckle patterns maker 204.Substrate 201 is generally Semiconductor substrate, such as wafer, in cloth thereon Multiple light sources 302 are put, substrate 201 together constitutes laser array, such as VCSEL array chip with light source 202.Light source 202 wraps It is used to launch multiple beamlets containing multiple sub-light sources, light source can be that visible ray, black light be for example infrared, the laser light such as ultraviolet Source, the species of light source can be edge emitting laser can also vertical cavity surface laser, in order that overall projection arrangement volume compared with Small, optimal scheme is that selection vertical cavity surface arrangement of laser emitters (VCSEL array) is used as light source, and VCSEL array also has The advantages that light source angle of divergence is small.In addition, different types of VCSEL can be also arranged on same substrate, such as VCSEL shape, Size, brightness can have difference.Illustrate for convenience in figure, 3 sub-light sources are only listed on one-dimensional, in fact VCSEL battle arrays Row are to fix the two-dimension light source of two-dimensional pattern arrangement.VCSEL array chip can be that nude film can also be by the core after encapsulation Piece, both differences are that nude film possesses smaller volume and thickness, and encapsulating chip then has more preferable stability and more Convenient connection.
In order that obtaining the pattern that laser projection device is launched has the characteristic such as uniform, uncorrelated, it is desirable to VCSEL arrays The arrangement pattern of chip is irregular pattern, i.e. light source is arranged not with regular array with certain irregular pattern Row.In certain embodiments, VCSEL array chip entirety size arranges above only in millimeter magnitude, such as 2mmX2mm sizes Tens even the distance between individual light sources up to a hundred, each light source are in micron dimension, such as 30 μm.
Lens 203 are used to receive the light beam launched by VCSEL array light source 202, and light beam is converged, a kind of real Apply in example, by the VCSEL beam collimations of diverging into collimated light beam, to ensure that the spot energy launched more is concentrated.Except with Outside single lens, microlens array (MLA) can also be used in one embodiment, each in microlens array is micro- Mirror unit is corresponding with each light source 202, can also a lenticule unit it is corresponding with multiple light sources 202;In another embodiment It can also realize that light beam converges using lens group.
Speckle patterns maker 204 is used for receiving lens light beam and outwards launches the light beam that can form speckle patterns, one In kind embodiment, speckle patterns maker 204 is diffraction optical element (DOE), and DOE plays a part of beam splitting, for example works as light source When 202 quantity are 100, i.e., it is that 100, DOE can be by lens light beam with a certain quantity via the light beam on lens transmission to DOE The multiplying power of (such as 200) is expanded, and 20000 light beams are finally launched into space, ideally it will be appreciated that having 20000 Individual spot (having the overlapping situation of some spots in some cases, cause amount of speckle to reduce).In addition to DOE, also may be used To use other any optical elements that can form spot, such as MLA, grating or a variety of optical elements combination.
Lens 203 and DOE204 can be fabricated on same optical element in certain embodiments, reduced with reaching The effect of volume.
Fig. 3 to Fig. 9 is to arrange schematic diagram according to the light source of the VCSEL array of embodiment of the present utility model.In each figure Middle circle or plus sige represent the position where light source, are not used to represent the true form and size of light source, two-wire bar square frame generation Table be substrate profile.For the ease of the elaboration to the utility model concept, some dotted lines are also add in figure and are used as Separate or boost line, these dotted lines be merely to illustrate, might not necessary being in VCSEL array.
For the structure light of speckle patterns being based particularly on based on structure light depth camera, the key of triangulation depth Step is the pixel deviation value between spot image to be calculated and reference blob pattern, by advanced treating device the step of this calculating (or dedicated processes chip) come what is performed, a most important step is to find spot according to matching algorithm in the implementation procedure of calculating Identical subregion in image and reference blob image, subregion here refer to the pixel region of a fixed size in image Domain, such as 7x7,11x11 pixel.Matching algorithm requires equal along the pattern in each sub-regions on base direction in spot image Differ, that is, require that spot image has the local irrelevance of height, baseline here refer to laser projection module 104 with Gather the line of module 105.
In order to meet this requirement of local irrelevance, usually, in VCSEL array light source 202 arrangement requirement do not advise Then arrange, a kind of conventional scheme is to generate the positional information of light source 202 at random on the substrate 201 in design, this scheme Advantage is that mentality of designing is clear, and design execution is got up relatively simple;Shortcoming be light source 202 arrange pattern uncontrollability compared with By force, want one relatively good uncorrelated pattern of generation to generally require by substantial amounts of experiment and checking, on the other hand in chip The positioning precision of each spot is difficult to hold in manufacturing process, it is often regularly arranged or symmetry characteristic with some Precision, efficiency etc. can be more preferable when making for VCSEL chips.
The design that the utility model is taken can solve above-mentioned shortcoming or problem.In Fig. 3, multiple light sources 202 arrangements form a two-dimentional pattern array on the substrate 201, for the feature of pattern array, can be divided into 4 sons Array 301,302,303 and 304, separated in figure 3 with dotted line 305.Light source is irregularly arranged in substrate in subarray 301 On, there is the irrelevance of height, light source arrangement pattern is identical with subarray 301 in subarray 302,303,304.Therefore, may be used By regard as by subarray by translation in a manner of form other three subarrays, final 4 subarrays collectively constitute VCSEL light Source array.Specifically, subarray 302, which can be regarded as, transversely translates subarray 301 until the two overlapping margins is formed , subarray 303 can then regard form the longitudinal translation of subarray 301 as, and subarray 304 can then regard submatrix as Row 301 are formed along 45 degree clockwise oblique translations.Due to the irrelevance of subarray 301, so as to cause overall VCSEL array It is incoherent on each subarray, but adjacent subarray is height correlation, this two-dimensional pattern ultimately forms The irrelevances of structured light patterns will be relatively low, several more excellent VCSEL array arrangement sides will be provided in the embodiment below Case.
For the VCSEL array shown in Fig. 3, only need to generate the pattern of a subarray in design, by flat The mode can of shifting quickly generates whole VCSEL array pattern.In addition, Fig. 3 neutrons array 303,304 can also be regarded as What subarray 302 was formed by translating, but because subarray 302 is formed by subarray 301, thus substantially whole VCSEL Array is all as caused by a subarray by way of translation.
In another embodiment of VCSEL array shown in Fig. 4, VCSEL array by 4 subarrays 401,402,403 and 404 compositions.Wherein subarray 402 is to be formed by subarray 401 along its right side sideline (dotted line 405) by mirror image;Subarray 403 be to be formed by subarray 401 along its downside sideline (dotted line 406) by mirror image, and subarray 404 is passed through by subarray 401 The mirror image of dotted line 407 forms.
In another embodiment of VCSEL array shown in Fig. 5, VCSEL array is equally by 4 subarrays 501,502,503 And 504 composition.Wherein subarray 502 is to translate to be formed after being turn 90 degrees along its geometric center dextrorotation by subarray 501, Can also be turn 90 degrees and be formed along lower right side point dextrorotation by subarray 501, be with the addition of in Fig. 5 in each subarray dotted line with It is easy to clearly show that the relative direction between each subarray.Similarly, subarray 503 and 504 can be passed through by subarray 501 Mode rotationally and/or translationally is formed.
Fig. 6 is the another embodiment of VCSEL array, the difference is that subarray 602 is transversely and longitudinal by subarray 601 , in other examples can also be by that (for example can be in different directions by a quarter of volume-diminished to script Transversely x directions and/or longitudinal y directions) subarray is zoomed in or out and (zooms in or out and can be collectively referred to as scaling) different times Number is to obtain different subarrays, therefore the arranging density of light source is higher than subarray 601 in subarray 602, other subarrays It is then to be formed by subarray 601 by way of translating and/or scaling entirely.The arranging density of light source is not in this VCSEL array Together, it is advantageous in that, the VCSEL light source of different densities can be grouped control, so as to form the structure light figure of different densities Case is to tackle different application scenarios.
Fig. 7 is according to the schematic diagram of the another embodiment of the utility model, and VCSEL array is passed through by a subarray 301 What translation was formed.Unlike above several embodiments, have between the subarray after translation and the subarray before translation it is overlapping, Region overlapping in the present embodiment is the half of whole submatrix column region.For example, 7001 in figure represented by region be Formed from subarray 301 to left certain distance, the distance is the half of the bottom width of subarray 301.Region 7002 It is then to be formed from subarray 301 to the right translation distance.Call by name and talk about, regional 7001,7002,7003,7004 in figure And the two-dimensional array in the region that goes out of indicating is to be formed by the left half side array of subarray 301 with right half side array combination. The mode of this translation can increase the density of array pattern, and usually, the distance of translation is smaller, and density is bigger.
Fig. 8 is according to the schematic diagram of the another embodiment of the utility model, and VCSEL array is to pass through translation by subarray 801 (upper and lower translation, oblique translation) is formed, and subarray 801 here is shaped as regular hexagon, it should be noted that if whole VCSEL array for it is square when, the subarray of its fringe region is only a part for subarray 801, such as subarray 802.
Fig. 9 is that unlike preceding embodiment, submatrix here shows two according to the schematic diagram of this bright another embodiment It is individual, it is subarray 901 and subarray 903 respectively.For other subarrays in VCSEL array, subarray 902 is by son The translation of array 901 is formed, and subarray 904 is formed by the mirror image of subarray 903, and subarray 905 is by the dextrorotation of subarray 903 Translate and formed after turning 90 degrees, subarray 906 is formed by the translation after 90s of the rotate counterclockwise of subarray 903.
Above-mentioned several embodiments are used for the quantity using the subarray of mapping mode generation two-dimensional array as 1 or 2, but actual On be not limited to the above-mentioned embodiment enumerated, subarray can also be other quantity, when subarray quantity be not less than 2 When, at least one aspect in the size of this sub-arrays, distribution shape, quantity of light source is different, and this sub-arrays passes through conversion Mode produce the high two-dimensional array of irrelevance.
According further in another embodiment of the present utility model, directly can directly being combined by multiple different subarrays and Into difference mentioned here can have various ways, such as the global shape of subarray, distribution shape, size or light source point At least one aspect such as cloth, shape, quantity, the characteristics of luminescence such as wavelength is different., can be by different subarrays under this mode It is grouped or entirety controls to realize a variety of different application scenarios.
Above example is several representational examples illustrated out according to the utility model thought, can not complete generation All the elements of table the utility model thought.VCSEL array can pass through various mapping mode shapes by one or more subarrays Into more subarrays, VCSEL array then is collectively formed by this sub-arrays, mapping mode is except described in above example Translation, rotation, scaling, outside mirror image, can also be by other forms, such as unidirectional stretching, compression or other deformations Etc. form, these mapping modes can be with the same two-dimensional array of individualism, it is possibility to have a variety of mapping modes exist simultaneously In same two-dimensional array.In same VCSEL array, it is allowed to the presence of a variety of mapping modes, same VCSEL array Including multiple subarrays, at least there is translation, rotation, mirror image, one kind in scaling relation or more in the subarray between each other Kind.In addition, can be overlapped between subarray, but usually, overlapping region no more than half to be advisable, while submatrix Can also there are the interval region without VCSEL light source, coincident between row, therefore there may be described three kinds between subarray Any one or more of situation.It can be clearly appreciated that, the increase of mapping mode species will be helpful to lift VCSEL array Overall irrelevance.
The arrangement mode of the shape of subarray and internal VCSEL light source, quantity are to determine final VCSEL array quality Key factor.The shape of subarray is generally regular shape, such as the polygonal shape such as square, hexagon or circle Shape, or other irregular shapes etc..The quantity of subarray is not limited only to the quantity in embodiment provided by the utility model Situation, the quantity that can also have the subarray in the conversion of diversified forms, such as square two-dimensional array can be n2(n is big In the integer equal to 2) individual group of subarrays is into, or other submatrix number of columns, such as 8,12 etc..
It should be noted that shape mentioned here is the abstract that VCSEL light source arranges in sub-array, It is usually not see the existing of the shape in VCSEL array, i.e. dotted line will not be typically marked in VCSEL array.In every case it is The spread geometry of pattern meets thought of the present utility model in VCSEL array, should drop into the scope of protection of the utility model.
In addition, the substrate 201 described in the utility model is defaulted as single substrate, can also actually there are multiple linings Bottom, in one embodiment, the pattern of a subarray is individually formed on each substrate.The advantages of this mode, is, passes through One or more of subarrays are manufactured, rotationally and/or translationally waiting conversion physically to carry out splicing by sub-array progress can To produce the VCSEL array light source with higher non-correlation degree.
In the utility model, multiple subarrays are formed by conversion by one or more subarrays, it is more by what is formed Individual subarray collectively constitutes VCSEL array light source, that is, ensure that the arrangement of VCSEL array light source is easily implemented, while protect again Higher irrelevance is demonstrate,proved, simultaneously because the conversion of a few subarray, has been greatly reduced VCSEL array chip Manufacture difficulty, to improve manufacture efficiency and quality.
In the utility model, the arrangement pattern of light source should be understood that in VCSEL chips in the embodiment shown in Fig. 3~Fig. 9 To be that a kind of of similar pattern is described, while a kind of design method for generating the pattern is accordingly given, that is, firstly generate one Individual or multiple subarrays, then this sub-arrays are carried out with conversion and ultimately generates entire pattern (i.e. two-dimensional array pattern).Do not arrange Reach except there are other design methods with using the equal effect of submatrix rank transformation, that is, producing and figure of the conversion with same characteristic features Case, it is to be understood that other any design methods reach falls within this practicality newly with the VCSEL patterns of conversion equivalent effect In the protection domain of type.
Above content is to combine specific preferred embodiment further detailed description of the utility model, it is impossible to Assert that specific implementation of the present utility model is confined to these explanations.For the utility model person of ordinary skill in the field For, without departing from the concept of the premise utility, some equivalent substitutes or obvious modification, and performance can also be made Or purposes is identical, the scope of protection of the utility model should be all considered as belonging to.

Claims (9)

  1. A kind of 1. VCSEL array light source, it is characterised in that including:
    Semiconductor substrate;
    Multiple VCSEL light sources are arranged on the semiconductor substrate in the form of two-dimensional array;
    The two-dimensional array includes multiple subarrays,
    The one or more in translation, rotation, mirror image, scaling relation between each other at least be present in the subarray.
  2. 2. VCSEL array light source as claimed in claim 1, it is characterised in that the subarray be distributed in regular domain and/or In irregular area.
  3. 3. VCSEL array light source as claimed in claim 2, it is characterised in that the regular domain include polygonal region or Border circular areas.
  4. 4. VCSEL array light source as claimed in claim 1, it is characterised in that form adjacent two of the two-dimensional array Between the subarray:Part is overlapped, no VCSEL light source be present interval region, one or more feelings of coincident Condition.
  5. 5. VCSEL array light source as claimed in claim 1, it is characterised in that VCSEL light source described in the subarray with Irregular two-dimensional pattern arrangement is on the semiconductor substrate.
  6. 6. VCSEL array light source as claimed in claim 1, it is characterised in that the Semiconductor substrate is by more sub- substrate groups Into the subarray of the VCSEL light source is arranged on the sub- substrate accordingly.
  7. A kind of 7. VCSEL array light source, it is characterised in that including:
    Semiconductor substrate;
    Multiple VCSEL light sources are arranged on the semiconductor substrate in the form of two-dimensional array;
    The two-dimensional array includes multiple subarrays,
    At least one aspect in the size of the subarray, distribution shape, quantity of light source is different.
  8. A kind of 8. laser projection device, it is characterised in that including:
    Any described VCSEL array light source of claim 1~7;
    At least one lens, for receiving and converging the light beam launched by the laser array;
    Speckle patterns maker, for expand transmitting speckle patterns light beam in backward space by the light beam;
    The lens are single lens, one kind in microlens array or combination;
    The speckle patterns maker is one or more combinations in microlens array, DOE, grating.
  9. A kind of 9. 3D imaging devices, it is characterised in that including:
    The laser projection device that claim 8 is stated, for the emitting structural light pattern light beam into space;
    Image collecting device, the structure light figure formed on target object is radiated at by the structured light patterns light beam for gathering Picture;
    Processor, receive the structure light image and the depth image of the target object is calculated according to trigonometry principle.
CN201720532344.6U 2017-05-15 2017-05-15 VCSEL array light source, laser projection device and 3D imaging devices Active CN206908092U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720532344.6U CN206908092U (en) 2017-05-15 2017-05-15 VCSEL array light source, laser projection device and 3D imaging devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720532344.6U CN206908092U (en) 2017-05-15 2017-05-15 VCSEL array light source, laser projection device and 3D imaging devices

Publications (1)

Publication Number Publication Date
CN206908092U true CN206908092U (en) 2018-01-19

Family

ID=61288714

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201720532344.6U Active CN206908092U (en) 2017-05-15 2017-05-15 VCSEL array light source, laser projection device and 3D imaging devices

Country Status (1)

Country Link
CN (1) CN206908092U (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108490634A (en) * 2018-03-23 2018-09-04 深圳奥比中光科技有限公司 A kind of structured light projection module and depth camera
CN108594454A (en) * 2018-03-23 2018-09-28 深圳奥比中光科技有限公司 A kind of structured light projection module and depth camera
WO2018209987A1 (en) * 2017-05-15 2018-11-22 深圳奥比中光科技有限公司 Vcsel array light source
CN109471323A (en) * 2018-11-24 2019-03-15 深圳阜时科技有限公司 Projection arrangement and its light source and equipment
CN109643053A (en) * 2018-11-24 2019-04-16 深圳阜时科技有限公司 Projection arrangement and its light source and equipment
CN109643052A (en) * 2018-11-24 2019-04-16 深圳阜时科技有限公司 A kind of light-source structure, optical projection mould group, sensing device and equipment
TWI685678B (en) * 2018-03-12 2020-02-21 大陸商Oppo廣東移動通信有限公司 Laser projection module , depth camera and electronic device
WO2020103165A1 (en) * 2018-11-24 2020-05-28 深圳阜时科技有限公司 Light source structure, optical projection module, sensing apparatus, and device
CN112335143A (en) * 2018-06-26 2021-02-05 通快光电器件有限公司 VCSEL array with small pulse delay

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018209987A1 (en) * 2017-05-15 2018-11-22 深圳奥比中光科技有限公司 Vcsel array light source
US10958893B2 (en) 2017-05-15 2021-03-23 Orbbec Inc. VCSEL array light source
TWI685678B (en) * 2018-03-12 2020-02-21 大陸商Oppo廣東移動通信有限公司 Laser projection module , depth camera and electronic device
US11199398B2 (en) 2018-03-12 2021-12-14 Guangdong Oppo Mobile Telecommunications Corp., Ltd. Laser projection module, depth camera and electronic device
CN108594454A (en) * 2018-03-23 2018-09-28 深圳奥比中光科技有限公司 A kind of structured light projection module and depth camera
CN108490634B (en) * 2018-03-23 2019-12-13 深圳奥比中光科技有限公司 Structured light projection module and depth camera
CN108594454B (en) * 2018-03-23 2019-12-13 深圳奥比中光科技有限公司 Structured light projection module and depth camera
CN108490634A (en) * 2018-03-23 2018-09-04 深圳奥比中光科技有限公司 A kind of structured light projection module and depth camera
US11543671B2 (en) 2018-03-23 2023-01-03 Orbbec Inc. Structured light projection module and depth camera
CN112335143A (en) * 2018-06-26 2021-02-05 通快光电器件有限公司 VCSEL array with small pulse delay
CN109643052A (en) * 2018-11-24 2019-04-16 深圳阜时科技有限公司 A kind of light-source structure, optical projection mould group, sensing device and equipment
WO2020103165A1 (en) * 2018-11-24 2020-05-28 深圳阜时科技有限公司 Light source structure, optical projection module, sensing apparatus, and device
WO2020103167A1 (en) * 2018-11-24 2020-05-28 深圳阜时科技有限公司 Projection apparatus, and light source and device thereof
CN109471323A (en) * 2018-11-24 2019-03-15 深圳阜时科技有限公司 Projection arrangement and its light source and equipment
CN109643053B (en) * 2018-11-24 2021-06-29 深圳阜时科技有限公司 Projection device and light source and equipment thereof
CN109643053A (en) * 2018-11-24 2019-04-16 深圳阜时科技有限公司 Projection arrangement and its light source and equipment

Similar Documents

Publication Publication Date Title
CN206908092U (en) VCSEL array light source, laser projection device and 3D imaging devices
CN107026392A (en) Vcsel array light source
CN106972347B (en) Laser array for 3D imaging
CN107039885A (en) The laser array being imaged applied to 3D
CN107748475A (en) Structured light projection module, depth camera and the method for manufacturing structured light projection module
CN107424188B (en) Structured light projection module based on VCSEL array light source
CN106997603B (en) Depth camera based on VCSEL array light source
US11320666B2 (en) Integrated structured-light projector
CN107450190B (en) Diffraction optical element and preparation method
WO2019178970A1 (en) Structured light projection module and depth camera
WO2019086003A1 (en) Structured light projection module, depth camera, and method for manufacturing structured light projection module
CN106569330B (en) A kind of design method of optical design, area array projection device and a kind of depth camera
CN106990660A (en) Structured light projection module
CN207133564U (en) Multi-density pattern projector
WO2019178969A1 (en) Structured light projection module and depth camera
CN107589623A (en) Highdensity structured light projection instrument
CN108490635B (en) Structured light projection module and depth camera
CN107678225A (en) Structured light projection module based on high density VCSEL array light source
US20140376092A1 (en) Integrated structured-light projector
JP7228572B2 (en) structured light projection
CN207586618U (en) Combination pattern projection arrangement and depth camera
CN107703641A (en) A kind of structured light projection module and depth camera
CN108594453B (en) Structured light projection module and depth camera
CN206805630U (en) Structured light projection module based on VCSEL array light source
CN208110250U (en) Pattern projector and depth camera

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CP03 Change of name, title or address

Address after: No. 88, Gaoxin North 1st Road, Songpingshan Community, Xili Street, Nanshan District, Shenzhen City, Guangdong Province, China. 2001, Obi Technology Building

Patentee after: Obi Zhongguang Technology Group Co.,Ltd.

Country or region after: China

Address before: A808 Zhongdi Building China University of Geosciences Industry University Research Base No 8 Yuexing 3rd Road Nanshan District Shenzhen Guangdong Province

Patentee before: SHENZHEN ORBBEC Co.,Ltd.

Country or region before: China

CP03 Change of name, title or address