CN206892367U - A kind of UV hardens SRF films - Google Patents
A kind of UV hardens SRF films Download PDFInfo
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- CN206892367U CN206892367U CN201720465358.0U CN201720465358U CN206892367U CN 206892367 U CN206892367 U CN 206892367U CN 201720465358 U CN201720465358 U CN 201720465358U CN 206892367 U CN206892367 U CN 206892367U
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Abstract
The utility model discloses a kind of UV hardening SRF films, successively including substrate layer, anti-dazzle photosphere, high refraction antistatic backing, low refraction anti-fingerprint layer;The substrate layer onlaps flexion film SRF for what Japan was spun.The utility model provides a kind of UV hardening SRF films, in addition to the optical property for reaching TAC film, is also equipped with antireflection, anti-dazzle, anti-fingerprint, antistatic and more preferable vapour resistance and more preferable bendability, is more suitable for the effect of the Machining of Curved Surface of big radian;On the other hand, it is simplification technique, easy to implement due to as base material cost can be reduced using PET, there are wide market prospects.
Description
Technical field
The utility model belongs to film class technical field, more particularly to a kind of UV hardening SRF films.
Background technology
With the growth for including the terminal markets such as mobile phone, computer, LCD TV, and for example wearable production in new application market
The fast development of product, smart home etc., liquid crystal display is with light weight, ultra-thin, low driving voltage, super definition, using product body electricity
Road directly drives, and realizes full-color EL display effect;Polaroid as one of liquid crystal display important materials is as market will be after
Demand growth of the steady growth so as to promotion functions film is held in continuation of insurance;Using AG+AR+AF+AS (anti-dazzle+antireflection+anti-fingerprint+anti-
Electrostatic) TAC film be still the main flow diaphragm of polarizer at this stage.The effect of anti-dazzle mainly prevents external light pair
Injury caused by the reflection of human eye;Second, diffusing scattering in a kind of film is played, to solve the conditions of streaking of liquid crystal panel, to improve liquid
The definition of brilliant picture;The effect main function of antireflection is to have cut down the reflection of glass in itself, adds the transmitance of glass,
Make original color through glass more bright-coloured, more truly;The effect of antistatic is can effectively improve LCDs antistatic
Ability, and therefore liquid crystal display will not damage, no mess code normal by display after electrostatic impact, and no striped is intact aobvious;It is anti-
The effect of fingerprint is to reduce fingerprint and the attachment of various spots, improves the ability of wiped clean, while form transparent soil resistance skin
Film, the outward appearance of product is not influenceed.
Existing TAC film is because presence is poor to the insulating of aqueous vapor and because TAC film is more crisp, can only typically arrive Φ 8mm and cause
In terms of bending machining the defects of;It is more crisp additionally, due to TAC film, so requiring high to its manufacturing and processing equipment.Patent
CN205404859U discloses a kind of TAC anti-dazzles TAC film, and the method for employing more increase one coats is saturating to improve its steam
The problem of property crossed difference;But so operate, process is more, has a strong impact on yield and production cycle;Further, since more apply together
Layer, film surface can be more crisp, and bending machining performance can also become worse.The U of patent CN 205691800 disclose a kind of AG+AR+AF platings
The windows be protected panel of film, but not from solving the problems, such as steam breathability difference at all;It is also no in addition to pass through antistatic process,
Liquid crystal display can be made scarce aobvious by occurring mess code, striped etc. after electrostatic impact.
The content of the invention
In view of the defects of above-mentioned prior art is present, the purpose of this utility model is to propose a kind of UV hardening SRF films.
The purpose of this utility model will be achieved by the following technical programs:
A kind of UV hardens SRF films, successively including substrate layer, anti-dazzle photosphere, high refraction antistatic backing, low refraction anti-fingerprint
Layer;The substrate layer onlaps flexion film SRF for what Japan was spun.
Further, the thickness of the substrate layer is 30 μm -100 μm.
Further, the Anti Glare Coatings by addition inorganic silicon dioxide or organic PMMA particles PUA main body trees
Fat is formed.Anti-dazzle function is realized by adding inorganic silicon dioxide or organic PMMA particles.
Further, the thickness of the anti-dazzle photosphere is 1 μm -5 μm, preferably 2 μm -3 μm;The mist degree of the anti-dazzle photosphere is
5-30, preferably 20-25.Thickness is too thin, and pencil hardness does not reach target;The too thick mist degree of thickness does not reach requirement, and can make
Into cost it is higher the problem of.
Further, the high refraction antistatic backing is made up of the PUA matrix resins of addition zirconium dioxide and polythiophene.It is logical
The zirconium dioxide of the high refraction of addition is crossed, realizes high reflective functions;By adding polythiophene, anti-static function is realized.
Further, the refractive index of the high refraction antistatic backing is 1.55-1.70, preferably 1.65.
Further, 1 μm -5 μm of the thickness of the high refraction antistatic backing, preferably 2 μm -4 μm, sheet resistance 108-1012。
Thickness is too thin, and pencil hardness does not reach target;The too thick cost of thickness is higher, and can cause cracking.
Further, the low refraction anti-fingerprint layer is by adding plain six functionality monomers of hollow SiO2 fluorochemical monomers and fluorine
PUA matrix resins are formed.By adding hollow SiO2, low reflective functions are realized;By adding fluorochemical monomer, realize anti-fingerprint and
Leveling function;By adding the functionality monomer of flouridate six, play a part of anti-fingerprint and levelling.
Further, the refractive index of the low refraction anti-fingerprint layer is 1.30-1.40, preferably 1.37.
Further, the thickness of the low refraction anti-fingerprint layer is 0.08 μm -0.15 μm, preferably 0.1 μm of -0.1375 μ
m.If what is applied is too thin, reflected light just has yellow, tangerine and red three colors, and observable is yellow and orange, if apply
Correctly, reflected light just has blueness and red, and observable is blueness and purple, if what is applied is too thick, reflected light just has
Blue, green and yellow three colors, observable is green;And the human eye wavelength most sensitive to reflected light is 550nm.
Prominent effect of the present utility model is:The utility model provides a kind of UV hardening SRF films, except reaching TAC film
Optical property outside, be also equipped with antireflection, anti-dazzle, anti-fingerprint, antistatic and more preferable vapour resistance and preferably it is curved
Qu Xing, it is more suitable for the effect of the Machining of Curved Surface of big radian;On the other hand, due to cost can be reduced as base material using PET, letter
It is chemical industry skill, easy to implement, there are wide market prospects.
Just accompanying drawing in conjunction with the embodiments below, is described in further detail to specific embodiment of the present utility model, so that this
Utility model technical scheme is more readily understood, grasped.
Brief description of the drawings
Fig. 1 is the utility model embodiment 1-4 structural representation.
Embodiment
Embodiment 1
As shown in figure 1, a kind of UV hardening SRF films of the present embodiment, successively including substrate layer 1, anti-dazzle photosphere 2, height refraction
Antistatic backing 3 and low refraction anti-fingerprint layer 4;Substrate layer 1 onlaps flexion film SRF for what Japan was spun.
Wherein, the thickness of substrate layer 1 is 30 μm.
Anti-dazzle photosphere 2 is made up of the PUA matrix resins of addition inorganic silicon dioxide, mist degree 5, and thickness is 1 μm.
High index of refraction antistatic backing 3 is made up of the PUA matrix resins of addition zirconium dioxide and polythiophene, and refractive index is
1.55, thickness is 1 μm, sheet resistance 108。
Low-refraction anti-fingerprint layer 4 is by the hollow SiO2 fluorochemical monomers of addition and the PUA main body trees of plain six functionality monomers of fluorine
Fat is formed, refractive index 1.30, and thickness is 0.08 μm.
Embodiment 2
As shown in figure 1, a kind of UV hardening SRF films of the present embodiment, successively including substrate layer 1, anti-dazzle photosphere 2, height refraction
Antistatic backing 3 and low refraction anti-fingerprint layer 4;Substrate layer 1 onlaps flexion film SRF for what Japan was spun.
Wherein, the thickness of substrate layer 1 is 100 μm.
Anti-dazzle photosphere 2 is made up of the PUA matrix resins of addition inorganic silicon dioxide, mist degree 30, and thickness is 15 μm.
High index of refraction antistatic backing 3 is made up of the PUA matrix resins of addition zirconium dioxide and polythiophene, and refractive index is
1.70, thickness is 5 μm, sheet resistance 109。
Low-refraction anti-fingerprint layer 4 is by the hollow SiO2 fluorochemical monomers of addition and the PUA main body trees of plain six functionality monomers of fluorine
Fat is formed, refractive index 1.40, and thickness is 0.15 μm.
Embodiment 3
As shown in figure 1, a kind of UV hardening SRF films of the present embodiment, successively including substrate layer 1, anti-dazzle photosphere 2, height refraction
Antistatic backing 3 and low refraction anti-fingerprint layer 4;Substrate layer 1 onlaps flexion film SRF for what Japan was spun.
Wherein, the thickness of substrate layer 1 is 50 μm.
Anti-dazzle photosphere 2 is made up of the PUA matrix resins of addition inorganic silicon dioxide or organic PMMA particles, and mist degree is
20, thickness is 3 μm.
High index of refraction antistatic backing 3 is made up of the PUA matrix resins of addition zirconium dioxide and polythiophene, and refractive index is
1.65, thickness is 2 μm, sheet resistance 1010。
Low-refraction anti-fingerprint layer 4 is by the hollow SiO2 fluorochemical monomers of addition and the PUA main body trees of plain six functionality monomers of fluorine
Fat is formed, refractive index 1.37, and thickness is 0.1 μm.
Embodiment 4
As shown in figure 1, a kind of UV hardening SRF films of the present embodiment, successively including substrate layer 1, anti-dazzle photosphere 2, height refraction
Antistatic backing 3 and low refraction anti-fingerprint layer 4;Substrate layer 1 onlaps flexion film SRF for what Japan was spun.
Wherein, the thickness of substrate layer 1 is 80 μm.
Anti-dazzle photosphere 2 is made up of the PUA matrix resins of addition inorganic silicon dioxide or organic PMMA particles, and mist degree is
25, thickness is 2 μm.
High index of refraction antistatic backing 3 is made up of the PUA matrix resins of addition zirconium dioxide and polythiophene, and refractive index is
1.65, thickness is 4 μm, sheet resistance 1012。
Low-refraction anti-fingerprint layer 4 is by the hollow SiO2 fluorochemical monomers of addition and the PUA main body trees of plain six functionality monomers of fluorine
Fat is formed, refractive index 1.37, and thickness is 0.1375 μm.
After tested, the performance of the present embodiment 1-4 UV hardening SRF films is as follows:
Antistatic performance:Sheet resistance 108-1012;
Anti-fingerprint effect:Water droplet angle >=90.
Mist degree:5-30.
The utility model still has numerous embodiments, all technologies formed using equivalents or equivalent transformation
Scheme, all fall within the scope of protection of the utility model.
Claims (15)
1. a kind of UV hardens SRF films, it is characterised in that:Include substrate layer, anti-dazzle photosphere, high refraction antistatic backing, low folding successively
Penetrate anti-fingerprint layer;The substrate layer onlaps flexion film SRF for what Japan was spun.
A kind of 2. UV hardening SRF films according to claim 1, it is characterised in that:The thickness of the substrate layer be 30 μm-
100μm。
A kind of 3. UV hardening SRF films according to claim 1, it is characterised in that:The Anti Glare Coatings are inorganic by adding
The PUA matrix resins of silica or organic PMMA particles are formed.
A kind of 4. UV hardening SRF films according to claim 1, it is characterised in that:The thickness of the anti-dazzle photosphere is 1 μm -5
μm;The mist degree of the anti-dazzle photosphere is 5-30.
A kind of 5. UV hardening SRF films according to claim 4, it is characterised in that:The thickness of the anti-dazzle photosphere is 2 μm -3
μm;The mist degree of the anti-dazzle photosphere is 20-25.
A kind of 6. UV hardening SRF films according to claim 1, it is characterised in that:The high refraction antistatic backing is by adding
The PUA matrix resins of zirconium dioxide and polythiophene are formed.
A kind of 7. UV hardening SRF films according to claim 1, it is characterised in that:The refraction of the high refraction antistatic backing
Rate is 1.55-1.70.
A kind of 8. UV hardening SRF films according to claim 7, it is characterised in that:The refraction of the high refraction antistatic backing
Rate is 1.65.
A kind of 9. UV hardening SRF films according to claim 1, it is characterised in that:The thickness 1 of the high refraction antistatic backing
μm -5 μm, sheet resistance 108-1012。
A kind of 10. UV hardening SRF films according to claim 9, it is characterised in that:The thickness of the high refraction antistatic backing
2 μm -4 μm, sheet resistance 108-1012。
A kind of 11. UV hardening SRF films according to claim 1, it is characterised in that:The low refraction anti-fingerprint layer is by adding
The PUA matrix resins of plain six functionality monomers of hollow SiO2 and fluorine are formed.
A kind of 12. UV hardening SRF films according to claim 1, it is characterised in that:The refraction of the low refraction anti-fingerprint layer
Rate is 1.30-1.40.
A kind of 13. UV hardening SRF films according to claim 12, it is characterised in that:The folding of the low refraction anti-fingerprint layer
Rate is penetrated as 1.37.
A kind of 14. UV hardening SRF films according to claim 1, it is characterised in that:The thickness of the low refraction anti-fingerprint layer
For 0.08 μm -0.15 μm.
A kind of 15. UV hardening SRF films according to claim 14, it is characterised in that:The thickness of the low refraction anti-fingerprint layer
Spend for 0.1 μm -0.1375 μm.
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108943979A (en) * | 2018-09-13 | 2018-12-07 | 东莞市赛越新材料科技有限公司 | Unlocked by fingerprint mobile phone protects photocuring film production method |
CN110172307A (en) * | 2019-05-28 | 2019-08-27 | 深圳华硕新材料应用科技有限公司 | The production method of the SRF film of unlocked by fingerprint under a kind of screen for light sensation |
CN110491291A (en) * | 2019-08-14 | 2019-11-22 | 新纶科技(常州)有限公司 | A kind of flexible display screen cover board |
-
2017
- 2017-04-28 CN CN201720465358.0U patent/CN206892367U/en active Active
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108943979A (en) * | 2018-09-13 | 2018-12-07 | 东莞市赛越新材料科技有限公司 | Unlocked by fingerprint mobile phone protects photocuring film production method |
CN108943979B (en) * | 2018-09-13 | 2023-10-17 | 东莞市赛越新材料科技有限公司 | Manufacturing method of fingerprint unlocking mobile phone protection photo-curing film |
CN110172307A (en) * | 2019-05-28 | 2019-08-27 | 深圳华硕新材料应用科技有限公司 | The production method of the SRF film of unlocked by fingerprint under a kind of screen for light sensation |
CN110491291A (en) * | 2019-08-14 | 2019-11-22 | 新纶科技(常州)有限公司 | A kind of flexible display screen cover board |
CN110491291B (en) * | 2019-08-14 | 2022-01-11 | 新纶电子材料(常州)有限公司 | Flexible display screen cover plate |
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