CN2068235U - Ion stripping sputtering instrument - Google Patents
Ion stripping sputtering instrument Download PDFInfo
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- CN2068235U CN2068235U CN 90207607 CN90207607U CN2068235U CN 2068235 U CN2068235 U CN 2068235U CN 90207607 CN90207607 CN 90207607 CN 90207607 U CN90207607 U CN 90207607U CN 2068235 U CN2068235 U CN 2068235U
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Abstract
The utility model discloses an ion stripping sputtering instrument which prepares a scanning electron microscope observation sample and particularly the microstructure of biological samples and has the functions of ion stripping, sputtering plating film, ion etching and ion cleaning. The utility model belongs to the ionization technique and is characterized in that in a closed vacuum cover, a sample platform is made into a fixing type, a cooling source and a heat radiation sheet which is used for prevention are arranged near the sample platform, a target electrode is made into a movable type, the distance between a target and the sample platform can be regulated by a lifting mechanism, and the operating voltage can be continuously regulated within the range from 1400 to 8000V. The utility model lightens the damnification by the thermal radiation to the samples and enlarges the use range of the prior art.
Description
The utility model relates to a kind of ion of preparation scanning electronic microscope observation sample, particularly biological sample and peels off sputter, and is relevant with ionization technique.
Be used for the scanning electronic microscope observation sample, biological sample particularly, preparation as plant pollen, cell, microorganism gemma or other medical science observing samples, need plate one deck gold film to sample with a kind of ion sputtering device of special use, so that make the sample conduction, increase contrast, thereby obtain the image of high-resolution.Existing ion sputtering device, the IB--5 type ion sputtering device that for example Japanese EIKO company produces, it only has ion sputtering, ion cleans and the ion etching function, does not possess ion and peels off function, can not realize peeling off layer by layer the biological sample microstructure.The structure of this instrument is as shown in Figure 1: the high pressure connection 1 of its target electrode is to be exposed among the atmosphere, the working portion of target electrode 2 is that center target 3 and round target 4 are positioned at vacuum (-tight) housing 6, this target electrode is the top that is fixed on vacuum (-tight) housing, it is by the rising or the descending motion of the sample stage 7 of adjustment its underpart, to reach the adjusting target--the sample spacing, when this structure causes its work, because away from cooling source (comprising heat radiator), make the sample of preparation, particularly the biological sample of Huoing is among " aura reaction " prestige rib to the heat radiation damage of sample all the time, very easily cause the sample melanism to pollute, influence the quality of observing samples.Common this heat radiation damage aggravates with the rising of operating voltage, if the biological sample microstructure is opened with scattered ion(s) is thin layer by layer, expose the details on its interlayer heterosurface, its operating voltage must be increased to more than 5000 volts at least, therefore, existing ion sputtering device can not prevent the heat radiation damage effectively, does not possess scattered ion(s) again and peels off function, and there is tangible limitation in its scope of application.
In order to overcome the above-mentioned defective of prior art, to be that design is a kind of can prevent the particularly biological sample heat radiation damage of the sample for preparing to task of the present utility model effectively, have ion again and peel off the ion sputtering of function and peel off instrument, enlarge the scope of application of prior art.
The utility model is achieved in that a kind of for preparation scanning electronic microscope observation sample, peels off sputter equipment especially for the preparation biological sample with ion sputtering plated film, ion etching, ion cleaning and the ion of observing its microstructure.This device is made of casing 22, vacuum (-tight) housing 18, elevating mechanism, cooling system and electric control system.Vacuum (-tight) housing 18 is positioned on the chassis 38, the interior sealing gasket 26 of also using of groove that the periphery of its lower end embeds described chassis seals, one target electrode 41 is arranged at the top of vacuum (-tight) housing, this target electrode comprises a center target 25 and round target 24, around the outer rim of this round target one heat radiator 23 is arranged, and the sample stage 19 of a carrying sample is arranged on the bottom chassis in the vacuum (-tight) housing, its position is corresponding with target electrode, described sample stage is fixed, regulates target--the spacing of sample, is to realize by the lifting of regulating target electrode.An enclosed cooling chamber 33 is arranged under the chassis, below of this sample, circulation tap water cooling is arranged in it, and outer rim is provided with heat radiator 39 around around this sample stage, this structure has been avoided the heat radiation damage to sample, and especially under high pressure (5000
More than) when being used for ion and peeling off, this structure is effective especially to the protection biological sample.Described target electrode connects firmly by load plate on it and an elevating lever 42 that has elevating mechanism, and this elevating lever is regulated by gear in the elevating mechanism and tooth bar, to reach the adjusting target--and the purpose of between-sample distance.
A pair of high pressure connection 43 on the target electrode is to be contained in the vacuum (-tight) housing, and it is connected with electric control system in the machine by two leads.This electrical control division is arranged with a silicon-controlled voltage regulation circuit that is used to regulate this device operating voltage, and this circuit is connected in series with the input end of step-up transformer.In this electric control system, also have one and be used for realizing target electrode and sample stage reversal switch S
1, and the change-over switch S that realizes center target and round target
2The reversal switch S
1Input end be connected S with the output terminal of transformer booster circuit
1Output terminal be connected with target electrode 41 with sample stage 19.
Task of the present utility model can also realize by following measure:
In this device, the top of the elevating lever 42 of elevating mechanism connects firmly by the load plate of binding bolt and target electrode 41, and high pressure connection 43 seals with the fluorine moulding material with the coupling part of target electrode 41.
The operating voltage of this device can be 1400～8000
Regulate continuously in the scope, to be applicable to different purposes respectively.
Compared with the prior art, the utlity model has following positive effect:
1. sample stage is fixing, and next-door neighbour's cooling chamber and by heat radiator has heat absorption and cooling effect preferably, has alleviated greatly sample particularly to the fire damage of biological sample, has improved the quality of specimen preparation;
2. increased ion and peeled off function, a tractor serves several purposes has enlarged the usable range of prior art.
The drawing of accompanying drawing is described as follows:
Fig. 1: be existing ion sputtering device structural representation.
1 is target extra-high voltage joint among the figure; 2 is the target utmost point; 3 is the center target; 4 is round target; 5 is the target electrode heat radiator; 6 is vacuum (-tight) housing; 7 is sample stage; 8 is elevating lever; 9 is the sample stage heat radiator; 10 is cooling chamber; 11 is rising pipe; 12 is Pirani gauge; 13 is elevating mechanism; 14 is the vacuum pump interface; 15 is water inlet pipe; 16 is the chassis; 17 is casing.
Fig. 2: be surface structure synoptic diagram of the present utility model.
18 is vacuum (-tight) housings among the figure; The 19th, sample stage; The 20th, casing; The 21st, the elevating lever adjusting handle; The 22nd, the venting handle; The 44th, the electrical control guidance panel.
Fig. 3: be the utility model inner body structural representation.
18 is vacuum (-tight) housings among the figure; The 19th, sample stage; The 20th, casing; The 21st, the elevating lever adjusting handle; The 22nd, the venting handle; The 23rd, the target electrode heat radiator; The 24th, round target; The 25th, the center target; The 26th, sealing gasket; The 27th, the air release interface; The 28th, vacuum probe, the 29th, Pirani gauge; The 30th, the vacuum pump interface; The 31st, rising pipe; The 32nd, water inlet pipe; The 33rd, cooling chamber; The 34th, hi-line; The 35th, elevating mechanism; The 36th, metal sleeve; The 37th, O-ring seal; The 38th, the chassis; The 39th, the sample stage heat radiator; The 40th, sample stage; The 41st, target electrode; The 42nd, elevating lever; The 43rd, high pressure connection.
Fig. 4: the electrical schematic diagram that is the utility model electric control system
Below in conjunction with accompanying drawing and one of them most preferred embodiment the utility model is further described.
By Fig. 2 and shown in Figure 3: a bell vacuum (-tight) housing 18 is installed on the chassis 38 of a casing 20, an electrical control and guidance panel 44 are housed near it, vacuum indicating gauge, electric current indicating gauge and various functional switch are arranged on this panel.Be provided with elevating lever adjusting handle 21 and venting handle 22 in the side of casing.This vacuum (-tight) housing is contained in the groove on described chassis, and the lower end and the groove contact portion of periphery are lined with sealed rubber, makes this vacuum (-tight) housing keep certain vacuum tightness in working order down.Bottom at vacuum (-tight) housing, have a fixed in position on the chassis 38 and with the garden cylindricality sample stage 19 of chassis insulation, there is an enclosed cooling chamber 33 on the chassis below 38, next-door neighbour's sample stage, cooling chamber has a water inlet pipe 32 and a rising pipe 31, with the tap water cooling sample stage that flows.Outer rim along sample stage has the metal fin 39(of a ring-type or claims heat-conducting plate), it plays absorbing and cooling temperature with cooling chamber, prevents that sample is subjected to the prestige rib of heat radiation damage.Top in vacuum (-tight) housing, promptly corresponding position with sample stage, have one can the lifting activity target electrode 41, this target electrode is made up of load plate, center target 25 and round target 24, one insulation course is arranged between center target and round target, a heat radiator 39 is housed along the outer rim of round target.The upper end of the elevating lever in the load plate of this target electrode and the vacuum (-tight) housing connects firmly by bolt, and with the lifting campaign of elevating lever, in order to regulate suitable target--the sample distance, to be fit to the needs of preparation several samples.
This elevating lever is operated by an elevating mechanism, and its lifting action moves by gear and tooth bar and regulates.This elevating lever places in one section metal sleeve 36 on the chassis 38, and do the VTOL (vertical take off and landing) activity within it, the upper end of sleeve pipe enters in the vacuum (-tight) housing, and the two ends of this sleeve pipe have a pair of O-ring seal 37 respectively, makes vacuum (-tight) housing keep certain vacuum tightness when work.34 of hi-lines pass elevating lever and with two high pressure connections 43 operating voltage are delivered to target electrode.Seal with the fluorine moulding material in high pressure connection and target electrode contact portion.
By shown in Figure 4: the electric control system of this instrument comprises control operation panel and four electric (circuit) unit.By exchanging 220 volts of civil power inputs, supply with vacuum pump, solenoid valve and pilot lamp power, process silicon controlled rectifier voltage regulating circuit is the input transformer booster circuit again.In this circuit, one-way SCR (for example 3CT-103) is placed the output terminal of bridge rectifier, regulate the silicon controlled guide angle by single-node pipe (BT-33) trigger circuit triggers controllable silicon and by means of the potentiometer (W) of one 1 megaohm, thereby obtain needed voltage, the input end of this voltage input step-up transformer obtains 1400～8000 at its output terminal
High pressure, with high-voltage rectifying (full-wave rectification), just obtain target--the high direct voltage (operating voltage) between sample.
The utility model places fuel tank with step-up transformer, helps reducing high voltage fault.Simultaneously, two functional switch S in its high tension loop, have been increased
1And S
2, S wherein
1Be used for target electrode and sample stage polar switching, S
2Be used for center target and round target changing-over.When being used as ion and peeling off with the ion sputtering plated film, round target connects negative, and sample stage just connects; When being used as ion etching, the center target just connects, and sample stage connects negative.When being used for ion and peeling off, operating voltage should be remained on 5000 at least
More than, thereby different operating voltage is adjusted in the requirement that realization is peeled off the ion of biological sample microstructure, can satisfy the preparation of above-mentioned different samples respectively.
Operation of the present utility model and prior art are basic identical, should abide by the following step when being used to peel off: 1. vacuum in the vacuum (-tight) housing is extracted into 5 * 10
-3About TOOR; 2. with the high voltage adjusting button to 15mA, keep promptly to peel off in 2～3 seconds and finish; 3. for preventing that high temperature from burning to sample, cooling chamber must feed chilled water in advance during operation.When being used for sputter coating, voltage should be transferred to 7～8mA, kept 7～8 minutes.
Adopt the utility model that the pollen of kind of plant surplus 74 sections 140 such as the rose family, standing grain book on Chinese herbal medicine and Malvaceae is peeled off, it is 5～10% that the rate of peeling off reaches 5%～70%(prior art), more than 500 sample of sputter lily gilding film, the heat radiation damage reduces by 50% than prior art.
Claims (4)
1, a kind of preparation scanning electronic microscope observation sample, the particularly ion sputtering used of biological sample, ion etching and ion cleaning device, the vacuum (-tight) housing 18 that has a preparation sample to use on the chassis 38 of this device, the interior sealing gasket 26 of also using of groove that the periphery of its lower end embeds chassis 38 seals, a target electrode 41 is arranged on the top of vacuum (-tight) housing, it comprises a center target 25 and round target 24, outer rim around round target 24 has a heat radiator 23, the sample stage 19 of one carrying sample is arranged at the bottom in the vacuum (-tight) housing, its position is corresponding with target electrode 41, there is an elevating mechanism to regulate target--sample distance, one closed cooling chamber 33 is arranged under the chassis of the below of sample stage, the a pair of high pressure connection 43 that is connected with automatically controlled part by lead is arranged on the described target electrode 41, it is characterized in that:
A, sample stage 19 are to be fixed on the chassis 38 also directly to link to each other with described cooling chamber 33, and in the outer rim of sample stage 19 heat radiator 39 are housed;
B, target electrode 41 connect firmly by the load plate on it and an elevating lever 42 that has elevating mechanism, and elevating lever 42 is regulated target one the same distance by the gear in the elevating mechanism and the adjusting of tooth bar to reach;
C, automatically controlled part have a silicon-controlled voltage regulation circuit that is used to regulate this device operating voltage, and this circuit is connected in series with the input end of step-up transformer;
D, a reversal switch S that is used for realizing target electrode and sample stage is arranged
1, and the change-over switch S that realizes center target and round target
2, the reversal switch S
1Input end be connected S with the output terminal of transformer booster circuit
1Output terminal be connected with target electrode 41 with sample stage 19.
2, device as claimed in claim 1 is characterized in that, the top of the elevating lever 42 in the elevating mechanism connects firmly by the load plate of binding bolt and target electrode 41, and high pressure connection 43 seals with the fluorine moulding material with target electrode 41 contact portions.
3, device as claimed in claim 1 is characterized in that, elevating lever 42 places in one section metal sleeve 36 on the chassis 38 and makes VTOL (vertical take off and landing) within it, is provided with O-ring seal 37 at the two ends of this metal sleeve, described target electrode 41 and elevating lever 42 interlocks.
4, device as claimed in claim 1 is characterized in that, described this device operating voltage can be 1400～8000
Regulate continuously in the scope.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 90207607 CN2068235U (en) | 1990-05-24 | 1990-05-24 | Ion stripping sputtering instrument |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 90207607 CN2068235U (en) | 1990-05-24 | 1990-05-24 | Ion stripping sputtering instrument |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2068235U true CN2068235U (en) | 1990-12-26 |
Family
ID=4888012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 90207607 Withdrawn CN2068235U (en) | 1990-05-24 | 1990-05-24 | Ion stripping sputtering instrument |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2068235U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100365162C (en) * | 2004-06-25 | 2008-01-30 | 亚洲光学股份有限公司 | Improvement of coating film bearing structure |
| CN101644638B (en) * | 2009-09-10 | 2011-12-21 | 中国科学院等离子体物理研究所 | Method for preparing infrared solid membrane sample |
| CN101889101B (en) * | 2007-12-06 | 2014-09-24 | 因特瓦克公司 | System and method for dual-sided sputter etch of substrates |
| CN106124549A (en) * | 2016-07-06 | 2016-11-16 | 天津工业大学 | A kind of method characterizing fiber radially different depth chemical constitution |
| CN108872285A (en) * | 2018-09-13 | 2018-11-23 | 武汉钢铁有限公司 | A method of characterization galvanized sheet inhibition layer |
-
1990
- 1990-05-24 CN CN 90207607 patent/CN2068235U/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100365162C (en) * | 2004-06-25 | 2008-01-30 | 亚洲光学股份有限公司 | Improvement of coating film bearing structure |
| CN101889101B (en) * | 2007-12-06 | 2014-09-24 | 因特瓦克公司 | System and method for dual-sided sputter etch of substrates |
| CN101644638B (en) * | 2009-09-10 | 2011-12-21 | 中国科学院等离子体物理研究所 | Method for preparing infrared solid membrane sample |
| CN106124549A (en) * | 2016-07-06 | 2016-11-16 | 天津工业大学 | A kind of method characterizing fiber radially different depth chemical constitution |
| CN108872285A (en) * | 2018-09-13 | 2018-11-23 | 武汉钢铁有限公司 | A method of characterization galvanized sheet inhibition layer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |