CN206743633U - Low temperature plasma generating device and reactor - Google Patents
Low temperature plasma generating device and reactor Download PDFInfo
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- CN206743633U CN206743633U CN201720458939.1U CN201720458939U CN206743633U CN 206743633 U CN206743633 U CN 206743633U CN 201720458939 U CN201720458939 U CN 201720458939U CN 206743633 U CN206743633 U CN 206743633U
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- low temperature
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Abstract
The utility model, which provides a kind of low temperature plasma generating device and reactor, low temperature plasma generating device, including generating unit, generating unit, includes first electrode, second electrode and dielectric-slab.First electrode and second electrode are fixedly connected with the same face of dielectric-slab, first electrode and second electrode and external high pressure power electric connection, to produce high voltage between the first electrode and the second electrode, make dielectric-slab produces low-temperature plasma back to the side of first electrode and second electrode.Gap between first electrode and second electrode be present, insulating element is provided with gap, first electrode and second electrode to be insulated.The utility model has the advantages of discharge effect is stable, and energy conversion efficiency is high, service life is long.
Description
Technical field
The utility model belongs to plasma discharge technical field, and in particular to a kind of low temperature plasma generating device and reaction
Device.
Background technology
Dielectric barrier discharge (Dielectric barrier discharge, DBD) apparatus structure is simple, can be in atmospheric pressure
Under the conditions of with a wide range of power work, be under atmospheric pressure obtain low temperature plasma Main Means, can extensive work
Industryization is applied to ozone and manufactured to purify air sterillization and exhaust-gas treatment, contamination control, material surface processing, high efficiency ultraviolet
Lamp etc., in addition with potentially large number of application value.
Surface dielectric barrier discharge (surface dielectric barrier discharge, SDBD) hinders as medium
Gear electric discharge (DBD) plasma-generating technologies a kind of novel medium barrier discharge type, can medium plate surface produce compared with
The hook plasmasphere of large area, because discharge space is restricted smaller, simple in construction, dynamic response is fast, in air force
The fields such as, biomedical and environmental protection have broad application prospects, and are study hotspots in recent years.
Coplanar type creeping discharge (Dielectric surface in coplanar dielectricv barrier
Discharge, CSDBD) structure be creeping discharge a kind of fundamental type, once form flat plasma display PDP core
Technology, due to low-temperature plasma can be produced, therefore industrial circle is attract always and explores its possibility for realizing industrially scalable application.
At present, research of the academia to coplanar type creeping discharge is only rested on organic material or incited somebody to action by organic binder bond
Metal electrode is bonded in the mode on dielectric-slab, and this simple coplanar discharge device has been able to verify that the effect of coplanar discharge,
But the shortcomings that discharge effect is unstable, efficiency is low, service life is short be present.
Utility model content
The utility model provides a kind of low temperature plasma generating device and reactor, has discharge effect stable, electric energy turns
Change efficiency high, the advantages of service life is long.
A kind of low temperature plasma generating device, including generating unit；
The generating unit includes first electrode, second electrode and dielectric-slab；
The first electrode and the second electrode are fixedly connected with the same face of the dielectric-slab, first electricity
Pole and the second electrode and external high pressure power electric connection, to be produced between the first electrode and the second electrode
High voltage, make the dielectric-slab produces low-temperature plasma back to the side of the first electrode and the second electrode；
Gap be present between the first electrode and the second electrode, insulating element is provided with the gap, use
So that the first electrode and the second electrode to be insulated.
More preferably, the first electrode includes at least two the first broach be arrangeding in parallel, the bag of the second electrode
At least two the second broach be arrangeding in parallel are included, at least two first broach and at least two second broach are mutually handed over
Mistake is set.
More preferably, the gap width between adjacent first broach and second broach is equal everywhere.
More preferably, first broach and second broach be shaped as rectangle and width be 1 to 5mm and
The distance between adjacent first broach and second broach are 0.5 to 3mm.
More preferably, the quantity of the generating unit is two, and mirror image is set two generating units each other, makes two institutes
State the first electrode on generating unit and the second electrode is relative respectively.
More preferably, composite insulation layer is provided between two generating units, to by a generating unit
On the first electrode and the second electrode respectively with the second electrode on another described described generating unit and
Insulated between the first electrode, and two generating units are fixed together.
A kind of reactor, include the low temperature plasma generating device of any of the above technical characteristic.
More preferably, in addition to frame；
The quantity of the low temperature plasma generating device is at least two, and is fixedly connected with the frame.
Low temperature plasma generating device provided by the utility model is by using the first electrode and the second electrode
Between gap be present, be provided with insulating element in the gap, to by the first electrode and the second electrode insulation
Technical scheme, can prevent from occurring between the first electrode and the second electrode phenomenon that high point also punctures and occur, protect
The stability of discharge effect is demonstrate,proved, energy conversion efficiency is high, extends service life.
Brief description of the drawings
Fig. 1 is the low temperature plasma generating device schematic diagram in embodiment one；
Fig. 2 is first electrode and second electrode position relationship schematic diagram in Fig. 1.
Fig. 3 is the structure of reactor schematic diagram in embodiment two；
Reference is expressed as in figure：
1-generating unit, 11-first electrode, the 111-the first broach, 12-second electrode, the 121-the second broach,
13-dielectric-slab；14-insulating element, 2-composite insulation layer, 3-low temperature plasma generating device, 4-frame.
Embodiment
It is specific below in conjunction with the utility model to make the purpose of this utility model, technical scheme and advantage clearer
Technical solutions of the utility model are clearly and completely described for embodiment and corresponding accompanying drawing.Obviously, described embodiment
Only it is the utility model part of the embodiment, rather than whole embodiments.Based on the embodiment in the utility model, this area
The every other embodiment that those of ordinary skill is obtained under the premise of creative work is not made, belongs to the utility model
The scope of protection.
Embodiment one
As shown in Figure 1, 2, a kind of low temperature plasma generating device, including generating unit 1, generating unit 1 include the first electricity
Pole 11, second electrode 12 and dielectric-slab 13.First electrode 11 and second electrode 12 are fixedly connected with the same face in dielectric-slab 13
On, first electrode 11 and second electrode 12 and external high pressure power electric connection, to first electrode 11 and second electrode 12 it
Between produce high voltage, make dielectric-slab 13 back to the side of first electrode 11 and second electrode 12 produce low-temperature plasma.Wherein
Produce high voltage between first electrode 11 and second electrode 12, make dielectric-slab 13 back to first electrode 11 and second electrode
It is typical coplanar type creeping discharge form that 12 side, which produces low-temperature plasma, and its principle is no longer described in detail herein.First electrode
11 and the specific thickness of second electrode 12 can be designed to 5 to 50 microns according to national standard.First electrode 11 and second electrode 12 it
Between gap 15 be present, insulating element 14 is provided with gap 15, first electrode 11 and second electrode 12 to be insulated.Wherein
Insulating element 14 can use the less material of dielectric coefficient to make to ensure insulating properties, preferably polyimides, but simultaneously not only
It is limited to this.
By setting insulating element between first electrode 11 and second electrode 12, first electrode 11 and can be ensured
Insulated between two electrodes 12, prevent first electrode 11 and second electrode 12 from puncturing in the presence of high voltage, generation list can be made
The discharge effect of member 1 is stable, and extends service life.
As a kind of embodiment, as shown in Figure 2, be arranged in parallel including at least two the first of first electrode 11
Broach 111, second electrode 12 include at least two the second broach 121 be arrangeding in parallel, at least two first broach 111 and extremely
Few two 121 interlaced settings of the second broach.Wherein, the gap location between adjacent the first broach 111 and the second broach 121
Locate equal.More preferably, the shape of the first broach 111 and the second broach 121 is rectangle, and width is identical.And the first comb
The width a1 of tooth and the width a1 of the second broach are both designed as in the range of 1 to 5mm, and the first adjacent broach and the second comb
Gap width b between tooth for 0.5 to 3mm, tests prove that, using such electric discharge for being designed to improve generating unit 1
Efficiency.It should be noted that in actual fabrication, the side of the first broach 111 can be made waviness or other shapes,
And the side of the second broach 121 adjacent thereto is fabricated to corresponding shape, it can so increase the first broach 111 and
The corresponding area of two broach 121, improve discharge effect.
Specifically, the quantity of generating unit 1 is two, and mirror image is set the electrode shape of two generating units 1 each other, makes two
First electrode 11 and second electrode 12 on individual generating unit is relative respectively.Two such generating unit 1 can respectively back to
Low-temperature plasma is produced on the face of first electrode 11 and second electrode 12, and then makes the both sides of the low temperature plasma generating device equal
Low-temperature plasma can be produced, not only increases discharging efficiency, while also enhances the adaptability of work.
Further, composite insulation layer 2 is provided between two generating units 1, to by a generating unit 1
First electrode 11 and second electrode 12 are exhausted between the second electrode 12 and first electrode 11 on another generating unit 1 respectively
Edge, and two generating units 1 are fixed together.Wherein composite insulation layer 2 can make high insulation hot melt film, so can
Avoid air gap occur between two generating units 1, cause first electrode 11 and second electrode 12 to puncture, while can also
Being connected firmly, reliably between two generating units 1 of guarantee.It should be noted that in two generating units 1 in actual fabrication
Between set before composite insulation layer 2, it is necessary to first binding post is connected in first electrode 11 and second electrode 12, specifically may be used
Connected in a manner of using welding, but be not limited only to this, can also connected by the way of other can realize goal of the invention.When need
Will (i.e. binding post be from dielectric-slab 13 back to the He of first electrode 11 when setting the through hole passed through for binding post on dielectric-slab 13
The side of second electrode 12 passes through through hole, is connected with first electrode 11 and second electrode 12), can be after through hole be processed again
First electrode 11 and second electrode 12 are set on dielectric-slab 13.
Embodiment two
As shown in figure 3, a kind of reactor, including low temperature plasma generating device 3, low temperature plasma generating device 3 and reality
Apply example described in low temperature plasma generating device there is technical characteristic, therefore here is omitted in the same manner.Further
Ground, in addition to frame 4, the quantity of low temperature plasma generating device 3 is at least two, and is fixedly connected with frame 4.Wherein
At least two low temperature plasma generating devices 3 can be arranged in parallel, and the reactor turns into grid-like, but is not limited to this.
For those skilled in the art it is easily understood that on the premise of not conflicting, above-mentioned each advantageous manner can be free
Ground combination, superposition.
Preferred embodiment of the present utility model is the foregoing is only, it is all at this not to limit the utility model
All any modification, equivalent and improvement made within the spirit and principle of utility model etc., should be included in the utility model
Protection domain within.Described above is only preferred embodiment of the present utility model, it is noted that for the art
For those of ordinary skill, on the premise of the utility model technical principle is not departed from, some improvement and modification can also be made,
These improvement and modification also should be regarded as the scope of protection of the utility model.
Claims (8)
- A kind of 1. low temperature plasma generating device, it is characterised in that：Including generating unit；The generating unit includes first electrode, second electrode and dielectric-slab；The first electrode and the second electrode are fixedly connected with the same face of the dielectric-slab, the first electrode and The second electrode and external high pressure power electric connection, to produce high electricity between the first electrode and the second electrode Pressure, make the dielectric-slab produces low-temperature plasma back to the side of the first electrode and the second electrode；Gap be present between the first electrode and the second electrode, insulating element is provided with the gap, to incite somebody to action The first electrode and second electrode insulation.
- 2. low temperature plasma generating device according to claim 1, it is characterised in that：The first electrode includes at least two the first broach be arrangeding in parallel, the second electrode to include at least two flat The second broach that row is set, at least two first broach and at least two interlaced settings of second broach.
- 3. low temperature plasma generating device according to claim 2, it is characterised in that：Gap width between adjacent first broach and second broach is equal everywhere.
- 4. low temperature plasma generating device according to claim 3, it is characterised in that：The be shaped as rectangle and width of first broach and second broach are 1 to 5mm, adjacent first comb The distance between tooth and second broach are 0.5 to 3mm.
- 5. according to the low temperature plasma generating device described in Claims 1-4 any one, it is characterised in that：The quantity of the generating unit is two, and mirror image is set the electrode shape of two generating units each other, makes two institutes State the first electrode on generating unit and the second electrode is relative respectively.
- 6. low temperature plasma generating device according to claim 5, it is characterised in that：Composite insulation layer is provided between two generating units, to by described first on a generating unit Electrode and the second electrode respectively with the second electrode on another described described generating unit and the first electrode Between insulate, and two generating units are fixed together.
- A kind of 7. reactor, it is characterised in that：Including the low temperature plasma generating device as described in claim 1 to 6 any one.
- 8. reactor according to claim 7, it is characterised in that：Also include frame；The quantity of the low temperature plasma generating device is at least two, and is fixedly connected with the frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720458939.1U CN206743633U (en) | 2017-04-27 | 2017-04-27 | Low temperature plasma generating device and reactor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720458939.1U CN206743633U (en) | 2017-04-27 | 2017-04-27 | Low temperature plasma generating device and reactor |
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| Publication Number | Publication Date |
|---|---|
| CN206743633U true CN206743633U (en) | 2017-12-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720458939.1U Active CN206743633U (en) | 2017-04-27 | 2017-04-27 | Low temperature plasma generating device and reactor |
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| CN (1) | CN206743633U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106961778A (en) * | 2017-04-27 | 2017-07-18 | 罗璐 | Low temperature plasma generating device and preparation method thereof and reactor |
| CN112043972A (en) * | 2020-10-10 | 2020-12-08 | 罗璐 | Double-layered tubulose excimer lamp of wall and beauty instrument |
-
2017
- 2017-04-27 CN CN201720458939.1U patent/CN206743633U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106961778A (en) * | 2017-04-27 | 2017-07-18 | 罗璐 | Low temperature plasma generating device and preparation method thereof and reactor |
| CN112043972A (en) * | 2020-10-10 | 2020-12-08 | 罗璐 | Double-layered tubulose excimer lamp of wall and beauty instrument |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180815 Address after: 100036 room 316, 1 building, 13 Cui Hunan Road, Haidian District, Beijing. Patentee after: Beijing Qingyuan in the Department of environmental protection science and technology limited company Address before: 102218 room 2, unit 33, two district, Tian Tong Bei yuan, Changping District, Beijing, 403. Patentee before: Luo Lu |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200708 Address after: No.00088, Bohai 1st Road, Binhai District, Weifang City, Shandong Province Patentee after: Shandong PRISMA environmental protection equipment Co., Ltd Address before: 100036 room 316, 1 building, 13 Cui Hunan Road, Haidian District, Beijing. Patentee before: BEIJING QINGYUAN ZHONGKE ENVIRONMENTAL PROTECTION TECHNOLOGY Co.,Ltd. |