CN206716608U - Semiconductor precise part cleaned by ultrasonic vibration machine - Google Patents
Semiconductor precise part cleaned by ultrasonic vibration machine Download PDFInfo
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- CN206716608U CN206716608U CN201720494348.XU CN201720494348U CN206716608U CN 206716608 U CN206716608 U CN 206716608U CN 201720494348 U CN201720494348 U CN 201720494348U CN 206716608 U CN206716608 U CN 206716608U
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- water tank
- ultrasonic vibration
- main body
- precise part
- vibration machine
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Abstract
The utility model discloses a kind of semiconductor precise part cleaned by ultrasonic vibration machine, cleaning machine includes water tank main body and top margin, water tank main body is in the form of slot, top margin is fixedly mounted on water tank body top, and bottom of gullet is installed with ultrasonic oscillator, water inlet is provided with tank, water tank main body inside front is fixed with overflow plate, formed with overflow launder between overflow plate and water tank main body, isopipe root offers delivery port, is serrated at the top of overflow plate.The utility model uses water tank type structure, not only simplify structure, moreover it is possible to makes cleaning performance more preferable, its top can make the floating object of upper end float with current using overflow groove structure design, rather than use flowing water backwashing manner, so as to saving water resource.
Description
Technical field
The utility model discloses a kind of cleaning machine, particularly a kind of semiconductor precise part cleaned by ultrasonic vibration machine, category
In extraordinary cleaning machinery technical field.
Background technology
With the continuous development of semiconductor technology, application of the semiconductor in people live is more and more extensive, thereupon
The processing industry of semiconductor also obtained very big development, because semiconductor belongs to precise part, its process has
Strict requirements, therefore precision to its processing equipment etc. also to have high requirements, to the accurate portion in semiconductor processing equipment
Part needs periodically to be cleaned, to maintain its finish, so as to ensure crudy.Ultrasonic wave is cleaned in semiconductor precise part
Cleaning in occupy critically important status, conventional supersonic wave cleaning machine is complicated, operation inconvenience, and cleaning performance compared with
Difference, it is more to water resource waste.
The content of the invention
The ultrasound used when being cleaned for the precise part in semiconductor machining machinery of the prior art mentioned above
The shortcomings that ripple cleaning-machine structure complexity, the utility model provide a kind of semiconductor precise part cleaned by ultrasonic vibration machine, and it is adopted
With water tank type structure, structure not only simplify, moreover it is possible to make cleaning performance more preferable.
The utility model solves the technical scheme that its technical problem uses：A kind of semiconductor precise part supersonic oscillations
Cleaning machine, cleaning machine include water tank main body and top margin, and water tank main body is in the form of slot, and top margin is fixedly mounted on water tank body top, water
Trench bottom is installed with ultrasonic oscillator, and water inlet is provided with tank, and water tank main body inside front is fixed with overflow plate,
Formed with overflow launder between overflow plate and water tank main body, isopipe root offers delivery port, is serrated at the top of overflow plate.
The technical scheme that the utility model solves the use of its technical problem further comprises：
Described ultrasonic oscillator is provided with more than one, and more than one ultrasonic oscillator be arranged in parallel.
Described water inlet is L-shaped, and water inlet mouth down is set.
Support frame is provided with described tank, support frame is arranged on above ultrasonic oscillator.
Level switch is installed with inside described tank.
Two slide rails are installed, two slide rails are be arranged in parallel, and more than one is provided with every slide rail on described top margin
Sliding block, be installed with support bar on sliding block, for support bar across above tank, support bar both ends are separately mounted to two cunnings
On corresponding sliding block on rail, it is provided with support bar and blocks curtain.
Slide rail mounting seat is installed with the top of described top margin, slide rail is arranged in slide rail mounting seat.
Described water tank bottom part body is installed with support feet.
The beneficial effects of the utility model are：The utility model uses water tank type structure, not only simplify structure, moreover it is possible to make
Cleaning performance is more preferable, and its top can make the floating object of upper end float with current using overflow groove structure design, rather than using stream
Water backwashing manner, so as to saving water resource.
The utility model is described further below in conjunction with the drawings and specific embodiments.
Brief description of the drawings
Fig. 1 is the utility model dimensional structure diagram.
Fig. 2 is the utility model overlooking the structure diagram.
Fig. 3 is the utility model section structural representation.
In figure, 1- water tank main bodys, 2- support feets, 3- tanks, 4- top margins, 5- slide rails, 6- slide rail mounting seats, 7- sliding blocks, 8-
Support bar, 9- overflow plates, 10- overflow launders, 11- water inlets, 12- level switch, 13- ultrasonic oscillators, 14- support frames.
Embodiment
The present embodiment is the utility model preferred embodiment, and other all its principle and basic structure are identical with the present embodiment
Or it is approximate, within scope of protection of the utility model.
Accompanying drawing 1, accompanying drawing 2 and accompanying drawing 3 are refer to, the utility model mainly includes water tank main body 1 and top margin 4, water tank main body 1
In the form of slot, inside is the tank 3 for being filled with water, and top margin 4 is fixedly mounted on the top of water tank main body 1, and the bottom of tank 3 is installed with
Ultrasonic oscillator 13, ultrasonic oscillator 13 are provided with more than one, and multiple ultrasonic oscillators 13 be arranged in parallel, in tank 3
Provided with water inlet 11, in the present embodiment, water inlet 11 is L-shaped, and it goes out mouth down, then the current that flow into from water inlet can be made straight
Connect and flow into downward, then overflow upwards from below, the current that top can be kept to overflow are relatively stable.In the present embodiment, in water
The inside front of box main body 1（That is the top of tank 3）Overflow plate 9 is fixed with, one is formed between overflow plate 9 and water tank main body 1 and is overflow
Chute 10, when the water in tank 3 is filled, the impurity that the water at top carries the floating washed flows into overflow launder from overflow plate 9
In 10, flowed away out of overflow launder 10, the bottom of overflow launder 10 offers delivery port（It is not drawn into figure）, for sewage discharge.This reality
Apply in example, the top of overflow plate 9 is serrated（Or referred to as triangular waveform）, during overflow, sewage flows at the gap of overflow plate 9
Walk.In the present embodiment, support frame 14 is provided with tank 3, support frame 14 is arranged on the top of ultrasonic oscillator 13, in use, can
Workpiece is placed on support frame 14, to prevent it from producing damage to ultrasonic oscillator 13 in cleaning.
In the present embodiment, level switch 12 is installed with inside tank 3, available for the water level in detection tank 3
Situation, when the water level in tank 3 is less than level switch 12, then illustrate that water is very few in tank 3, controller control ultrasonic wave
Oscillator 13 is stopped, and sends alarm and reminding staff, and in the present embodiment, the setting height(from bottom) of level switch 12 can root
According to being actually needed specific setting.
In the present embodiment, a slide rail 5 is installed with respectively on two parallel sides of top margin 4, i.e., on top margin 4
Two slide rails 5 are installed, two slide rails 5 be arranged in parallel, and the top of top margin 4 is installed with slide rail mounting seat 6, and slide rail 5 is arranged on
In slide rail mounting seat 6, i.e., slide rail 5 is fixedly mounted on top margin 4 by slide rail mounting seat 6, be provided with every slide rail 5 one with
On sliding block 7, sliding block 7 can be slidably reciprocated along slide rail 5, and in the present embodiment, support bar 8, support bar are installed with sliding block 7
8 across above tank 3, and the both ends of support bar 8 are corresponded on the corresponding sliding block 7 being arranged on two slide rails 5.Pacify on support bar 8
Equipped with curtain is blocked, for blocking at the top of tank 3, the fine grinding in anti-water stopping trough 3, which is spilt, to be come.
In the present embodiment, the bottom of water tank main body 1 is installed with support feet 2, for the utility model to be propped up, can prevent
Damaged caused by ground injustice and to the bottom of water tank main body 1.
The utility model when in use, pushes support bar 8 open, will block curtain opening, exposes tank 3, put the workpiece in tank 3
On interior support frame 14, support bar 8 is pulled, the top of tank 3 is sheltered from by blocking curtain, carries out cleaned by ultrasonic vibration, clearly
During washing, water inlet 11 is constantly toward clear water is passed through in tank 3, and when the water in tank 3 covers overflow plate 9, water can be carried secretly
In impurity inflow overflow launder 10 and flow away, complete cleaning.
The utility model uses water tank type structure, not only simplify structure, moreover it is possible to makes cleaning performance more preferable, its top uses
Overflow groove structure design can make the floating object of upper end float with current, rather than use flowing water backwashing manner, so as to save water money
Source.
Claims (8)
1. a kind of semiconductor precise part cleaned by ultrasonic vibration machine, it is characterized in that：Described cleaning machine include water tank main body and
Top margin, water tank main body is in the form of slot, and top margin is fixedly mounted on water tank body top, and bottom of gullet is installed with supersonic oscillations
Device, is provided with water inlet in tank, water tank main body inside front is fixed with overflow plate, between overflow plate and water tank main body formed with
Overflow launder, isopipe root offer delivery port, are serrated at the top of overflow plate.
2. semiconductor precise part cleaned by ultrasonic vibration machine according to claim 1, it is characterized in that：Described ultrasonic wave
Oscillator is provided with more than one, and more than one ultrasonic oscillator be arranged in parallel.
3. semiconductor precise part cleaned by ultrasonic vibration machine according to claim 1, it is characterized in that：Described water inlet
L-shaped, water inlet mouth down is set.
4. semiconductor precise part cleaned by ultrasonic vibration machine according to claim 1, it is characterized in that：In described tank
Provided with support frame, support frame is arranged on above ultrasonic oscillator.
5. semiconductor precise part cleaned by ultrasonic vibration machine according to claim 1, it is characterized in that：In described tank
Portion is installed with level switch.
6. semiconductor precise part cleaned by ultrasonic vibration machine according to claim 1, it is characterized in that：On described top margin
Two slide rails are installed, two slide rails are be arranged in parallel, and more than one sliding block is provided with every slide rail, is fixedly mounted on sliding block
There is support bar, across above tank, support bar both ends are separately mounted on the corresponding sliding block on two slide rails support bar, branch
It is provided with strut and blocks curtain.
7. semiconductor precise part cleaned by ultrasonic vibration machine according to claim 6, it is characterized in that：Described top margin top
Portion is installed with slide rail mounting seat, and slide rail is arranged in slide rail mounting seat.
8. semiconductor precise part cleaned by ultrasonic vibration machine according to claim 1, it is characterized in that：Described water tank master
Body bottom is installed with support feet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720494348.XU CN206716608U (en) | 2017-05-05 | 2017-05-05 | Semiconductor precise part cleaned by ultrasonic vibration machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720494348.XU CN206716608U (en) | 2017-05-05 | 2017-05-05 | Semiconductor precise part cleaned by ultrasonic vibration machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206716608U true CN206716608U (en) | 2017-12-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720494348.XU Active CN206716608U (en) | 2017-05-05 | 2017-05-05 | Semiconductor precise part cleaned by ultrasonic vibration machine |
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| Country | Link |
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| CN (1) | CN206716608U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110695002A (en) * | 2019-09-26 | 2020-01-17 | 上海峰梅光学科技有限公司 | Cleaning machine |
-
2017
- 2017-05-05 CN CN201720494348.XU patent/CN206716608U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110695002A (en) * | 2019-09-26 | 2020-01-17 | 上海峰梅光学科技有限公司 | Cleaning machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 518103 Floor 2 and 4 of Building B, Huixin Industrial Park, Xinhe Community, Fuhai Street, Bao'an District, Shenzhen, Guangdong Province, and Floor 1 of Building C Patentee after: Shenzhen Shishang Electronic Technology Co.,Ltd. Address before: Floor 1&6, Building B, Huixin Industrial Park, Heping Community, Fuyong Subdistrict, Bao'an District, Shenzhen, Guangdong 518000 Patentee before: SHENZHEN SHISHANG ELECTRONIC TECHNOLOGY CO.,LTD. |
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| CP03 | Change of name, title or address |