CN206716586U - A kind of cleaning device of liquid crystal cleaning production equipment - Google Patents
A kind of cleaning device of liquid crystal cleaning production equipment Download PDFInfo
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- CN206716586U CN206716586U CN201720572636.2U CN201720572636U CN206716586U CN 206716586 U CN206716586 U CN 206716586U CN 201720572636 U CN201720572636 U CN 201720572636U CN 206716586 U CN206716586 U CN 206716586U
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- cleaning
- liquid crystal
- cleaning device
- washing section
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Abstract
A kind of cleaning device of liquid crystal cleaning production equipment, including base support, conveyer belt, the base support is to be emitted on several on a production line successively, cleaning device is installed on the top plan of the base support, the inside of the base support is provided with cleaning fluid circulatory system, the quantity of the cleaning fluid circulatory system is three and is assembled together with cleaning device that the conveyer belt is installed through in the inside of cleaning device.The utility model first removes the organic matter on liquid crystal top layer with electrochemical oxidation liquid and cleaning agent remains, not only increase the removal effect of organic pollution, it can more importantly avoid producing the largely waste water containing cleaning agent, it disclosure satisfy that environmental requirement, last self-circulation system is ejected into liquid crystal top layer by filtration of demineralized water and from cleaning sprayer, liquid crystal is cleaned up completely, top layer free from admixture and cleaning agent residual.
Description
Technical field
It the utility model is related to a kind of cleaning device of liquid crystal cleaning production equipment.
Background technology
Liquid crystal assembling install before need carry out cleaning early stage because liquid crystal top layer have cholesterol ester, cyanobiphenyl,
The organic compound of the class formations such as cyclohexylbenzene, it is even rotten when serious if not washing the performance that will influence liquid crystal display
Contact conductor is lost, causes complete machine to scrap.Cleaning to liquid crystal at present mainly in water add bleeding agent, surfactant and its
He is cleaned auxiliary agent, using wetting of the bleeding agent to greasy dirt, emulsification and peptizaiton, along with surfactant and other help
Agent booster action, suitable for the cleaning of various greasy dirts, but its shortcoming is more difficult to blind hole cleaning, and cleaning fluid is not recyclable and makes
Directly discharged into the waste water largely containing chemical active agent and dirt is unprocessed, serious ground contamination environment, so must increase
Add sewage treatment facility, also the production cost of liquid crystal is greatly improved.
The content of the invention
The utility model is in view of the shortcomings of the prior art, there is provided a kind of liquid crystal cleaning production equipment to solve the above problems
Cleaning device.
In order to solve the above-mentioned technical problem, the utility model is addressed by following technical proposals：
A kind of cleaning device of liquid crystal cleaning production equipment, including base support, conveyer belt, the base support is successively
Several on a production line are emitted on, cleaning device, the base branch are installed on the top plan of the base support
The inside of frame is provided with cleaning fluid circulatory system, and the quantity of the cleaning fluid circulatory system is assemblied in one for three with cleaning device
Rise, the conveyer belt is installed through in the inside of cleaning device.
The cleaning device includes washing section, decoction cleaning section, middle pressure washing section, pure washing section, the washing section, decoction
Cleaning section, middle pressure washing section, mounting arrangements have the cleaning sprayer of fixation side by side up and down respectively on pure washing section, and cleaning sprayer passes through
Pipeline links together with cleaning fluid circulatory system, and the cleaning sprayer of the pure washing section circulates for independent filtration of demineralized water.
In press the cleaning sprayer of washing section that there is the water column of 3 atmospheric pressure.
The cleaning fluid circulatory system includes liquid reserve tank, level sensor, waste liquid screen pipe, water influent pipeline, raw material supplement
Pipeline, the most sections of level sensor, which are fixedly mounted in liquid reserve tank and leave a part, to be exposed, the exposed division of level sensor
Divide and be connected to by pipeline in the bottom collecting tank of cleaning device, waste liquid screen pipe is installed together with level sensor, feed liquor
Pipeline is fixedly mounted on the bottom of liquid reserve tank, and water influent pipeline connects together with cleaning sprayer, and raw material supplement pipeline is arranged on storage
On the side of liquid case.
Beneficial effect：Compared with prior art, it has the advantages that the utility model：
The cleaning device of the utility model liquid crystal cleaning production equipment is reached liquid crystal surface cleaning by multiple cleaning
Technique initialization requirement, first electrochemical oxidation liquid remove the organic matter and cleaning agent residual on liquid crystal top layer, have not only increased
The removal effect of organic pollutants, it is often more important that can avoid producing the largely waste water containing cleaning agent, eliminate aqueous-base cleaning
Environmentally friendly hidden danger, disclosure satisfy that environmental requirement, then water-soluble decoction solvent further removes intrusion liquid crystal top layer void
Foreign matter, then cleaning sprayer the water column with pressure is ejected into liquid crystal top layer, the water-soluble decoction solvent on liquid crystal top layer is clear
Wash clean, last self-circulation system are ejected into liquid crystal top layer by filtration of demineralized water and from cleaning sprayer, and liquid crystal is dry by complete cleaning
Only, top layer free from admixture and cleaning agent residual.
Brief description of the drawings
Fig. 1 is the front view for the cleaning device that liquid crystal cleans production equipment.
Fig. 2 is the overall structure figure that liquid crystal cleans production equipment.
Fig. 3 is the amplification assumption diagram of the water tank of the supporting connection of cleaning device.
Fig. 4 is Fig. 3 left view.
Embodiment
Refering to Fig. 1~4, a kind of liquid crystal cleans production equipment, including base support 1, cleaning device 2, water tank 3, cleaning fluid
The circulatory system 4, feeding device 5, conveyer belt 6, base support 1 are to be emitted on several on a production line, first bottom successively
Feeding device 5 is installed on the top plan of seat support 1, cleaning then is installed on the top plan of next base support 1
Device 2, the inside of base support 1 are provided with cleaning fluid circulatory system 4, and cleaning fluid circulatory system 4 is assemblied in one with cleaning device 2
Rise, water tank 3 is installed, water tank 3 is connected with cleaning fluid circulatory system 4 by pipeline on the top plan of last base support 1
It is connected to together, conveyer belt 6 is installed through in the inside of feeding device 5, cleaning device 2, further, is installed in feeding device 5
There is air knife（It is not shown）,, can be on working face after compressed air enters air knife because the work face thickness of air knife is 0.05mm
Form air-flow thin slice and blow out at a high speed, now the gas flow rate of thin slice air curtain is up to 30~40 times of atmospheric air flow velocity, so
The very thin high intensity of one side, the impact air curtain of big air-flow are formed, when liquid crystal is flowed through under air knife working face, air knife can be fast
The impurity and dust on liquid crystal top layer are removed fastly, and so as to complete the preliminary preparation of liquid crystal, cleaning device 2 includes washing section
21st, decoction cleaning section 22, middle pressure washing section 23, pure washing section 24, washing section 21, decoction cleaning section 22, middle pressure washing section 23, pure
Mounting arrangements have the cleaning sprayer of fixation side by side up and down respectively on washing section 24（Figure is not marked）, cleaning sprayer pass through pipeline with cleaning
Fluid circulation 4 links together, and the cleaning sprayer of pure washing section 24 circulates for independent filtration of demineralized water, cleaning fluid circulatory system 4
The inside of base support 1 is fixed on for three and side by side successively, and cleaning fluid circulatory system 4 includes liquid reserve tank 41, level sensor
42nd, waste liquid screen pipe 43, water influent pipeline 44, raw material supplement pipeline 45, the most sections of level sensor 42 are fixedly mounted on liquid storage
In case 41 and leave a part and expose, the bottom that the exposed portion of level sensor 42 is connected to cleaning device 2 by pipeline is received
Collect in groove, waste liquid screen pipe 43 is installed together with level sensor 42, and water influent pipeline 44 is fixedly mounted on the bottom of liquid reserve tank 41
Portion, water influent pipeline 44 are connected together with cleaning sprayer, and raw material supplement pipeline 45 is arranged on the side of liquid reserve tank 41, feed tube
Road 44 can be transported to the different cleaning liquids in liquid reserve tank 41 in cleaning sprayer, and two rows cleaning sprayer is entered to liquid crystal simultaneously
The comprehensive cleaning of row, when the cleanliness factor on liquid crystal top layer is reached assembling in the claimed range of process stipulation, cleaning is molten
After liquid flow back into level sensor 42 from the bottom of cleaning device 2, waste liquid screen pipe 43 can purify impurity in cleaning solution simultaneously
Waste liquid with impurity is discharged, minimum scale can be reduced to after the cleaning solution in liquid reserve tank 41 circulates a period of time
Below line, this influences whether the supply in the cleaning solution unit interval, will also make cleaning sprayer hydro-peening at the appointed time
Amount is reduced, and liquid crystal, which can exist, not to be washed clean clearly, so the meeting of level sensor 42 automatic measurement goes out cleaning solution height of water level, when clear
When dilution height of water level is less than minimum graduation mark, it is molten that raw material supplement pipeline 45 opens valve additional clean into liquid reserve tank 41
Liquid, so as to adjust the concentration of cleaning solution in liquid reserve tank 41, allow cleaning device 2 spray cleaning solution remain at it is constant
Concentration, such cleaning solution can clean liquid crystal more clean, and liquid reserve tank 41 is connected to form interior circulation with water tank 3 by pipeline
System, water tank 3 include water pump 31, water influent pipeline 32, cooling line 33, pressure relief pipe 34, drain line 35, electrothermal resistance silk 36,
Water influent pipeline 32, drain line 35, electrothermal resistance silk 36 are respectively and fixedly installed on the sealing plate wall of water tank 3, water influent pipeline 32
One end be fixed together with water pump 31；The other end connects together with the initiating terminal of cooling line 33, cooling line 33
End end connected together with drain line 35, the center section of cooling line 33 is equidistant screw thread spiral structure, pressure release
Pipeline 34 is arranged on the bottom for the sealing plate for being fixedly mounted on water tank 3, one end of pressure relief pipe 34 and the spiral shell of cooling line 33
Line spirals section connection together；In the externally discharged air of the other end, it is attached that the head of electrothermal resistance silk 36 extends to cooling line 33
On near-end position, after cleaning solution flows through from cleaning device 2 and cleaned liquid crystal, the temperature of cleaning solution can reduce, cleaning fluid
Liquid crystal can not washed clean clearly into cleaning device 2 in following cycle, as the reason that this and laundry take is, when laundry takes
Can be washed with warm water it is more clean, so water tank 3 is to play to control and keep the temperature of cleaning fluid, specifically, water pump 31 is cold
But water is transferred in cooling line 33 from water influent pipeline 32, and cooling water slowly flows across out of cooling line 33 afterwards, cooling line
33 are designed to that helical buckling structure can extend cooling water residence time, can thus reduce the temperature of cleaning fluid faster
Degree, then cooling water is discharged from drain line 35, can when the hydraulic pressure of cooling water exceedes the tube wall endurance of cooling line 33
Open pressure relief pipe 34 to drain a part of cooling water, prevent the rupture of cooling line 33 from causing cooling water to be mixed with cleaning fluid, prevent
Cleaning fluid can not clean up liquid crystal, and after the temperature of cleaning fluid is reduced to below process set value, electrothermal resistance silk 36 is begun to warm up
Cleaning fluid, the temperature control for making cleaning fluid is not in a less cleaning after 45~60 DEG C, the cleaning liquid crystal of cleaning device 2
Position, liquid crystal cleaning is avoided not reach technological requirement and reshuffle.
Further, the cleaning solution of washing section 21 is electrochemical oxidation liquid, and electrochemical oxidation liquid is heated to 50~60 DEG C,
Electrochemical oxidation liquid is ejected on liquid crystal top layer by cleaning sprayer and continues 3~5 minutes, electrochemical oxidation liquid is diamond
The electrolyte of film anode electrolysis generation, oxidizing component include hydrogen peroxide, the dissolved ozone of saturation, so can effectively remove liquid crystal
Organic matter and the cleaning agent residual on top layer, not only increase the removal effect of organic pollution, it is often more important that can avoid
The largely waste water containing cleaning agent is produced, the environmentally friendly hidden danger of aqueous-base cleaning is eliminated, disclosure satisfy that environmental requirement, decoction cleaning section
22 water-soluble decoction solvent includes metasilicate, lower alcohol, AEO, the mixed solvent of deionized water,
Its preparation process is that the AEO for accounting for gross mass 10% is poured into deionized water to mix 40~45
Minute, and 5% metasilicate and 20% lower alcohol then are added sequentially to mix by the temperature control of mixed liquor at 45 DEG C or so
Close in liquid and be then ejected into water-soluble decoction solvent on liquid crystal top layer simultaneously as required water-soluble decoction solvent, cleaning sprayer
Continue 3~5 minutes, further remove the foreign matter of intrusion liquid crystal top layer void, after water-soluble decoction solvent cleans, in
Water column with 3 atmospheric pressure is ejected into liquid crystal top layer, washing time 30s, liquid crystal watch by the cleaning sprayer of pressure washing section 23
The water-soluble decoction solvent of layer is cleaned, and then the self-circulation system of pure washing section 24 is by filtration of demineralized water and from cleaning sprayer
Liquid crystal top layer is ejected into, liquid crystal is cleaned up completely, top layer free from admixture and cleaning agent residual, process stipulation when reaching assembling
Claimed range in.
Embodiment described above is only that preferred embodiment of the present utility model is described, not to this practicality
New spirit and scope are defined.On the premise of the utility model design conception is not departed from, ordinary people in the field couple
The all variations and modifications that the technical solution of the utility model is made, the scope of protection of the utility model, this reality all should be dropped into
With new claimed technology contents, all record in detail in the claims.
Claims (4)
1. a kind of cleaning device of liquid crystal cleaning production equipment, including base support（1）, conveyer belt（6）, the base support
（1）To be emitted on several on a production line successively, it is characterised in that the base support（1）Top plan on pacify
Equipped with cleaning device（2）, the base support（1）Inside cleaning fluid circulatory system is installed（4）, the cleaning fluid cyclic system
System（4）Quantity be three and cleaning device（2）It is assembled together, the conveyer belt（6）It is installed through cleaning device（2）'s
In inside.
2. the cleaning device of liquid crystal cleaning production equipment according to claim 1, it is characterised in that the cleaning device
（2）Including washing section（21）, decoction cleaning section（22）, middle pressure washing section（23）, pure washing section（24）, the washing section（21）、
Decoction cleaning section（22）, middle pressure washing section（23）, pure washing section（24）Upper mounting arrangements respectively have the cleaning of fixation side by side up and down
Shower nozzle, cleaning sprayer pass through pipeline and cleaning fluid circulatory system（4）Link together, the pure washing section（24）Cleaning sprayer
Circulated for independent filtration of demineralized water.
3. the cleaning device of liquid crystal cleaning production equipment according to claim 2, it is characterised in that press washing section in institute
（23）Cleaning sprayer there is the water columns of 3 atmospheric pressure.
4. the cleaning device of liquid crystal cleaning production equipment according to claim 1, it is characterised in that the cleaning fluid circulation
System（4）Including liquid reserve tank（41）, level sensor（42）, waste liquid screen pipe（43）, water influent pipeline（44）, raw material supplement pipeline
（45）, level sensor（42）Most sections be fixedly mounted on liquid reserve tank（41）It is interior and leave a part and expose, level sensor
（42）Exposed portion cleaning device is connected to by pipeline（2）Bottom collecting tank in, waste liquid screen pipe（43）With liquid level sense
Answer device（42）It is installed together, water influent pipeline（44）It is fixedly mounted on liquid reserve tank（41）Bottom, water influent pipeline（44）With cleaning
Shower nozzle connects together, raw material supplement pipeline（45）Installed in liquid reserve tank（41）Side on.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720572636.2U CN206716586U (en) | 2017-05-22 | 2017-05-22 | A kind of cleaning device of liquid crystal cleaning production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720572636.2U CN206716586U (en) | 2017-05-22 | 2017-05-22 | A kind of cleaning device of liquid crystal cleaning production equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206716586U true CN206716586U (en) | 2017-12-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720572636.2U Active CN206716586U (en) | 2017-05-22 | 2017-05-22 | A kind of cleaning device of liquid crystal cleaning production equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110052450A (en) * | 2019-04-09 | 2019-07-26 | 深圳市华星光电半导体显示技术有限公司 | Panel cleaning method and cleaning device |
-
2017
- 2017-05-22 CN CN201720572636.2U patent/CN206716586U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110052450A (en) * | 2019-04-09 | 2019-07-26 | 深圳市华星光电半导体显示技术有限公司 | Panel cleaning method and cleaning device |
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