CN206584063U - A kind of light spectrum image-forming micro optical filter based on surface phasmon - Google Patents
A kind of light spectrum image-forming micro optical filter based on surface phasmon Download PDFInfo
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Abstract
A kind of light spectrum image-forming micro optical filter based on surface phasmon.The micro optical filter is the manufacturing cycle micro-nano structure on quartz, silicon chip, flexible media substrate.Interacted the surface plasmon resonance effect produced using light and periodicity micro-nano structure, realizes that energy is changed between light and surface phasmon, is completed manipulation and modulation to light, is reached the purpose of narrow-band filtering.Surface phasmon filter unit is matched one by one with ccd detector imaging unit, it is possible to achieve the direct light spectrum image-forming of multichannel.The micro optical filter has integrated level height, light weight, high reliability, in fields such as wearable device, nano-integrated optical circuit, the spectrum of use of unmanned plane large area scanning, with very high practical value.
Description
Technical field
The utility model is related to surface phasmon technology, the preparation of optics micro element, nanophotonics and remote sensing neck
Domain, more particularly to a kind of multi-channel spectral imaging technique based on surface phasmon specifically, is related to a kind of using different
The surface phasmon of operation wavelength carries out the light spectrum image-forming of multichannel narrow-band filtering.
Background technology
It is imaged different from traditional black and white or the colors of RGB tri-, it is any that light spectrum image-forming can obtain several from spectral Dimensions
Passage.Light spectrum image-forming optical filter and ccd detector are combined, not the only information of image, and can obtain each picture on image
The spectroscopic data of vegetarian refreshments, enriches testing result.At present, common spectral imaging technology includes, grating beam splitting, acousto-optic tunable
Filter light splitting, prismatic decomposition and chip plated film etc..But, the side of grating beam splitting, acousto-optic tunable filtering light splitting and prismatic decomposition
Case, manufactures considerably complicated, and physical dimension is larger, is not easy to opto-electronic device large-scale integrated.
Chip plated film spectral imaging technology has microsize, and integrated level height using semiconductor technology, it is necessary to be prepared.
European microelectronics research center（IMEC）Using highly sensitive CCD chip and SCMOS chips, a kind of high light spectrum image-forming skill is developed
Art.Specifically, they plate the filtering film of different operating wavelength respectively on the pixel of ccd detector, then different pictures
Member can receive the spectral information of different wave length, realize light spectrum image-forming.This light spectrum image-forming mode does not need extra annex, drop
The low volume and cost of spectrum imaging device.At present, IMEC provides three kinds of spectral detectors：The line scanning probe of 100 wavestrips
Device, the ceramic tile type plated film detector of 32 wavestrips, 16 wavestrips are with 4 × 4 mosaic plated film detectors for a wave band.Chip is plated
The advantage of film spectral imaging technology is can to obtain spectral resolution and spatial resolution simultaneously, can fast and efficiently be obtained
Spectral information and spatial information, integrated level are high, and cost is low.Have the disadvantage, its spectral sensitivity is relatively low, generally higher than 10 nm；And
And, filtering channel is more, and technique is more complicated, and the edge of narrow-band filtering unit corresponding with CCD pixels is easily by the shadow of process
Ring, it is impossible to realize and match completely with pixel, performance is difficult to ensure.
1998, Ebbesen et al. reported the making sub-wavelength nanohole array on metallic film on Nature, can
With the selective transmission for the light wave for realizing specific wavelength, this is to make use of surface phasmon phenomenon.Surface phasmon
（surface plasmon polaritons）Abbreviation SPPs, it is a kind of surface wave propagated in metal and medium interface,
It is exponential damping on the direction at interface.When light wave incides metal with dielectric interface, the freedom of metal surface
Electronics collective oscillation, light wave couples to form a kind of near field electromagnetic ripple propagated along metal surface with metal surface free electron,
When the frequency of oscillation of surface electronic is consistent with incident light wave frequency, resonate, now the energy of electromagnetic field is effectively turned
It is changed into the collective vibration energy of metal surface free electron.SPPs has the characteristics such as near field enhancing, surface limited, short wavelength.It is based on
SPPs photonic device overcomes optical diffraction limit, substantially reduces the bulk of device and the interaction of electromagnetic field
Distance, its near field strengthens the characteristic compensation loss of Light Energy, and the optics that can be carried out in the range of sub-wavelength is integrated.
Early in the 1970s, people find that coarse gold, silver, copper surface can produce high intensity Raman dissipate
Penetrate, gain reaches 104~105Times, this phenomenon is referred to as SERS, is the optical phenomena relevant with SPPs.SPPs is also
Scientist can be helped to realize manipulation photon near field range.1998, Ebbesen et al. had found that light passes through on metallic film
During two-dimensional array of apertures, due to surface plasmon resonance enhancement effect, light may be larger than by the throughput in each hole
1, and throughput modulated by parameters such as array period, apertures.Then, they have found micro- knot of some special surface patterns
Structure, can make irradiating light beam halfwidth in several microns of internal controls and maintain half-wavelength or so, show beaming effect.It is this to photon
The control of motion, research boom of the scientific circles to SPPs is caused in the beginning of this century, and corresponding theoretical and experimental study layer goes out not
Thoroughly, obtain constantly perfect.
SPPs sub-wavelength structure, using traditional cmos process, can make miniaturized device, with compact dimensioning,
It is advantageously integrated, and can makes on flexible substrates, is widely used in sufacing and the integrated aspect of optics.Accordingly, I
Propose a kind of light spectrum image-forming filters solutions based on SPPs.Utilize ripe micronano optical simulation software（Such as FDTD
Solutions）, design the periodic micro structure to different wave length with narrow-band filtering characteristic, then using photoetching, plated film and
Lithographic technique obtains multi-channel spectral imaging micro optical filter.The technical principle is clear, makes simple, convenient use is expected to significantly
The cost of light spectrum image-forming is reduced, with very high practical value.
The content of the invention
Utility model purpose：Overcome the shortcomings of in existing spectral imaging technology there is provided a kind of based on surface phasmon
Light spectrum image-forming micro optical filter, the micro optical filter is supported the use with ccd detector, and the spectral information of observed objects can be obtained simultaneously
And spatial information.The micro optical filter easy processing, low cost, light weight, integrated level are high, reliability is high, convenient use, with very high
Practical value.
A kind of light spectrum image-forming micro optical filter based on surface phasmon, including surface phasmon and substrate, surface etc.
Prepared from excimer on substrate.
In above-mentioned technical proposal, the surface phasmon matches with ccd detector imaging unit, or surface etc. from
Excimer is directly processed in CCD imaging unit pixels.
In above-mentioned technical proposal, the surface phasmon includes multiple surface phasmon functional units, surface etc. from
Isolated between excimer functional unit and surface phasmon functional unit by metal louver (-vre), metal louver (-vre) is prepared in lining
On bottom.
In above-mentioned technical proposal, described substrate uses quartz substrate or silicon chip substrate, flexible material substrate.
In above-mentioned technical proposal, prepared by the surface phasmon uses electron beam exposure, electron beam evaporation plating on substrate
Film and stripping technology process unit.
In above-mentioned technical proposal, prepared by described metal louver (-vre) uses ultraviolet photolithographic, electron beam evaporation on substrate
It is prepared by plated film and stripping technology processing.
The preparation method of this light spectrum image-forming micro optical filter based on surface phasmon：Comprise the steps：
（1）Ultraviolet photolithographic, electron beam evaporation deposition and stripping are used in quartz substrate or silicon chip substrate, flexible material substrate
Separating process, makes the metal louver (-vre) between overlay mark and surface phasmon functional unit；
（2）Electron beam exposure, electron beam evaporation deposition and stripping technology are used on substrate between metal louver (-vre),
Finished surface phasmon functional unit；Or using electron beam exposure and the method for etching, finished surface phasmon function
Unit；
（3）The above-mentioned light spectrum image-forming micro optical filter based on surface phasmon being made is assembled with ccd detector, made
Surface phasmon functional unit is obtained to correspond with ccd detector imaging unit.
In above-mentioned technical proposal, the surface phasmon can use electron beam exposure, electron beam evaporation deposition and stripping
From technique prepare on substrate, it is different according to the material of surface phasmon, if silicon materials, can be exposed using electron beam
Prepared by the method for light and reactive ion etching, if metal material, can use electron beam exposure and focused-ion-beam lithography
Method prepare.
Realize of the present utility model comprise the concrete steps that：First, the surface phasmon micro-structural of different operating wavelength is designed,
Reach certain filtering bandwidth, supression and transmitance；Then, using ultraviolet photolithographic, electron beam exposure, electron beam evaporation deposition,
Peel off the preparation that micro optical filter is completed with lithographic technique；Finally, assembly surface phasmon micro optical filter and ccd detector, will
Filter unit is matched one by one with imaging unit, it is possible to achieve the light spectrum image-forming of multichannel.
Micro optical filter of the present utility model includes the periodic micro structure and substrate for producing surface phasmon, periodically micro-
Structure produces surface phasmon, and then reaches the functional structure of optical filtering purpose, and substrate is used to support the functional structure, substrate pair
Filter long with high permeability.
, can be by the processing of surface phasmon micro-structural in flexible liner for the imaging detector with special surface structure
On bottom.
According to the Pixel size and pixel of ccd detector how much, design prepare the micro optical filter, determine according to the actual requirements
Light-filtering channels number, with reference to appropriate data processing algorithm, obtains Multi-band spectral imagery；
By the cycle, shape, size and the material that change surface phasmon, it is possible to achieve to any tune of light-filtering channels
Section.
In above-mentioned technical proposal, the electron beam exposure that is used, ultraviolet photolithographic, electron beam evaporation deposition, stripping, reaction from
Sub- etching, ion beam etching etc. are mature technology well known in the art.It is commercially available using the equipment needed for the above method：Electricity
Beamlet exposure system can use Germany Raith eLINE Plus electron beam exposure apparatus；Ultraviolet lithographic system can use moral
The SUSS MA/BA6 litho machines of SUSS MicroTec companies of state；Electron beam evaporation deposition system can use U.S. Kurt J.
The evaporation coating systems of PVD 75 of Lesker companies；Reactive ion etching machine can use the SI 500 of Sentech companies of Germany
C system；Focused-ion-beam lithography system can use Vecco NEXUS IBE-420i ion beam etching systems.
Remarkable result of the present utility model and advantage：
（1）Flexible design, realizes that Multichannel narrow band filtering spectrum is imaged；
（2）Simple in construction, easy to make, cost is low；
（3）Compact conformation, integrated level is high, is easy to use；
（4）Reliability is high, is easy to safeguard.
Brief description of the drawings
Fig. 1 is process chart prepared by micro optical filter；In Fig. 1,1 is substrate, and 2 be metal louver (-vre), and 3 be surface etc.
From excimer functional unit, (a) is to prepare substrate, and (b) is the preparation shading line on substrate, and (c) is that to prepare surface phasmon micro-
Structure；
Fig. 2 is the enlarged drawing of one pixel cell of micro optical filter；In Fig. 2,31 ~ 34 be corresponding 4 characteristic wavelengths respectively
Phasmon microstructure graph；
Fig. 3 is the assembling schematic diagram of micro optical filter and ccd detector；In Fig. 3,4 be micro optical filter, and 5 be ccd detector, 6
It is the pixel of ccd detector.
Embodiment
A kind of light spectrum image-forming micro optical filter based on surface phasmon of the present utility model, including surface phasmon and
Substrate, surface phasmon is prepared on substrate, and the surface phasmon matches with ccd detector imaging unit, described
Surface phasmon includes multiple surface phasmon functional units, surface phasmon functional unit and surface phasmon work(
It can be isolated between unit by metal louver (-vre), metal louver (-vre) is prepared on substrate, and described substrate uses quartz substrate
Or silicon chip substrate, flexible material substrate, prepared by the surface phasmon uses electron beam exposure and etching technics to add on substrate
Frock is standby, and described metal louver (-vre) preparation is added on substrate using ultraviolet photolithographic, electron beam evaporation deposition and stripping technology
It is prepared by work.
The preparation method of this light spectrum image-forming micro optical filter based on surface phasmon, comprises the steps：
（1）Ultraviolet photolithographic, electron beam evaporation deposition and stripping are used in quartz substrate or silicon chip substrate, flexible material substrate
Separating process, makes the metal louver (-vre) between overlay mark and surface phasmon functional unit；
（2）Electron beam exposure and etching technics are used on substrate between metal louver (-vre), making processes surface
Phasmon functional unit；
（3）The above-mentioned light spectrum image-forming micro optical filter based on surface phasmon being made is assembled with ccd detector, made
Surface phasmon functional unit is obtained to correspond with ccd detector imaging unit.
Realize of the present utility model comprise the concrete steps that：First, using FDTD Solutions softwares, different operating ripple is designed
Long surface phasmon micro-structural, reaches certain filtering bandwidth, supression and transmitance；Then, ultraviolet photolithographic, electronics are utilized
Beam exposure, ion beam etching technology complete the preparation of micro optical filter；Finally, assembly surface phasmon micro optical filter is visited with CCD
Device is surveyed, filter unit is matched one by one with imaging unit, it is possible to achieve the light spectrum image-forming of multichannel.
Multi-channel spectral imaging narrow band filter slice of the present utility model based on surface phasmon, is according to light and cycle
Property micro-structural interaction produce surface phasmon effect, realize narrow-band filtering.
In above-mentioned technical proposal, shape, size, cycle and the material of the surface phasmon, according to filter wavelength, filter
Light belt is wide, restrain and transmitance is designed, it is possible to achieve multichannel is filtered simultaneously.
In above-mentioned technical proposal, the filter unit of the surface phasmon and the imaging unit of ccd detector necessary one
One correspondence, to realize that multi-channel spectral is imaged.
In order to realize that multi-channel spectral is imaged, following steps can be used：
（1）Simulation calculation, periodic micro structure reasonable in design；
（2）Micro optical filter is prepared using conventional semiconductor processing processing；
（3）Assemble micro optical filter and ccd detector.
Fdtd Method（FDTD）Method is a kind of common method for studying photonic crystal properties, and this method is from Maxwell
Equation is set out, and the discrete way of alternate sampling is taken electromagnetic field on room and time, makes the Maxwell containing time variable
Vorticity equation is converted into one group of difference equation, and iterative method ground solution room electromagnetic field on a timeline.Utilize software
Matlab programming simulations, or software FDTD Solutions are used, it can be passed through with the incident light wave of numerical simulation certain angle
The process of surface phasmon micro optical filter, obtains transmission spectrum and electric field, Distribution of Magnetic Field.Design surface phasmon micro-filtration accordingly
Ripple device, by changing structural parameters, can study the shadow of micro-structural cycle, shape, size and each parameter of material to filter effect
Ring, obtain optimization design scheme.
Complete microstructure design after, using photoetching, plated film, peel off and etch these conventional semiconductor processings carry out micro-filtration light
The processing and fabricating of piece.Below by way of specific embodiment of the utility model, the utility model is made further with reference to accompanying drawing
Explanation.
Embodiment 1：
（1）In quartz substrate, using ultraviolet photolithographic, electron beam evaporation deposition and lift-off technology, made as shown in Fig. 1 (a)
Make the shading line between overlay mark and filter unit, obtain effect shown in Fig. 1 (b).
（2）Successively using ultraviolet photolithographic, electron beam evaporation deposition, electron beam exposure and ion beam etching technology, in substrate
On process metal micro-nanostructure.Different filter units is because filter wavelength is different and has different geomeries.
（3）Micro optical filter and ccd detector are assembled so that micro-filtration light unit and CCD imaging units are corresponded（Figure
3）.
Embodiment 2：
（1）In silicon chip substrate, using ultraviolet photolithographic, electron beam evaporation deposition and lift-off technology, made as shown in Fig. 1 (a)
Make the shading line between overlay mark and filter unit, obtain effect shown in Fig. 1 (b).
（2）Electron beam exposure and reactive ion etching technology are successively used, the micro-nano structure of silicon is processed on a silicon substrate.
Different filter units is because filter wavelength is different and has different geomeries.
（3）Micro optical filter and ccd detector are assembled so that micro-filtration light unit and CCD imaging units are corresponded（Figure
3）.
Embodiment 3：
（1）As shown in Fig. 1 (a) on flexible material substrate, using ultraviolet photolithographic, electron beam evaporation deposition and skill is peeled off
Art, makes the shading line between overlay mark and filter unit, obtains effect shown in Fig. 1 (b).
（2）Successively using ultraviolet photolithographic, electron beam evaporation deposition, electron beam exposure and ion beam etching technology, in flexibility
Metal micro-nanostructure is processed in material substrate.Different filter units is because filter wavelength is different and has different shape chis
It is very little.
（3）Micro optical filter and ccd detector are assembled so that micro-filtration light unit and CCD imaging units are corresponded（Figure
3）.
Above-described embodiment is only explanation technical concepts and features of the present utility model, and its object is to allow be familiar with technique
Personage can understand content of the present utility model and implement according to this, protection domain of the present utility model can not be limited with this.
It is all that other various corresponding changes, improvements and modifications are made according to technical solutions of the utility model and technical concept, it should all contain
Cover within protection domain of the present utility model.
Claims (6)
1. a kind of light spectrum image-forming micro optical filter based on surface phasmon, it is characterised in that：Including surface phasmon and lining
Bottom, surface phasmon is prepared on substrate.
2. light spectrum image-forming micro optical filter according to claim 1, it is characterised in that：The surface phasmon is visited with CCD
Device imaging unit is surveyed to match, or surface phasmon is directly processed in CCD imaging unit pixels.
3. light spectrum image-forming micro optical filter according to claim 1, it is characterised in that：The surface phasmon includes multiple
Surface phasmon functional unit, by metal shading between surface phasmon functional unit and surface phasmon functional unit
Grid is isolated, and metal louver (-vre) is prepared on substrate.
4. light spectrum image-forming micro optical filter according to claim 1, it is characterised in that：Described substrate using quartz substrate or
Silicon chip substrate, flexible material substrate.
5. light spectrum image-forming micro optical filter according to claim 1, it is characterised in that：The surface phasmon prepares substrate
Upper use electron beam exposure, electron beam evaporation deposition and stripping technology process unit.
6. light spectrum image-forming micro optical filter according to claim 3, it is characterised in that：It is prepared by described metal louver (-vre)
Prepared on substrate using ultraviolet photolithographic, electron beam evaporation deposition and stripping technology processing.
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| CN108878466B (en) * | 2018-06-15 | 2021-09-07 | 中国科学院上海光学精密机械研究所 | Full Stokes polarization imaging element and preparation method thereof |
| CN108878466A (en) * | 2018-06-15 | 2018-11-23 | 中国科学院上海光学精密机械研究所 | Full Stokes polarization imaging element and preparation method thereof |
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| CN114295207A (en) * | 2021-12-29 | 2022-04-08 | 烟台睿创微纳技术股份有限公司 | Uncooled hyperspectral imaging chip and hyperspectral imager |
| CN114323276A (en) * | 2021-12-29 | 2022-04-12 | 烟台睿创微纳技术股份有限公司 | Uncooled hyperspectral imaging chip and hyperspectral imager |
| CN114323276B (en) * | 2021-12-29 | 2024-03-26 | 烟台睿创微纳技术股份有限公司 | Uncooled hyperspectral imaging chip and hyperspectral imager |
| CN114740687A (en) * | 2022-06-09 | 2022-07-12 | 上海传芯半导体有限公司 | Exposure light frequency enhancing device, photomask and preparation method thereof |
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