CN206356307U - A kind of heavy duty detergent silicon wafer cleaner - Google Patents
A kind of heavy duty detergent silicon wafer cleaner Download PDFInfo
- Publication number
- CN206356307U CN206356307U CN201621286576.XU CN201621286576U CN206356307U CN 206356307 U CN206356307 U CN 206356307U CN 201621286576 U CN201621286576 U CN 201621286576U CN 206356307 U CN206356307 U CN 206356307U
- Authority
- CN
- China
- Prior art keywords
- rinse bath
- dividing plate
- net
- silicon chip
- heavy duty
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model discloses a kind of heavy duty detergent silicon wafer cleaner, including objective table, rinse bath is provided with the objective table, it is provided with the rinse bath on support, the support and oscillating plate is installed, the oscillating plate is provided with and shelves net, the net section of shelving is in wavy, described shelve is additionally provided with dividing plate on the net, and the dividing plate is spliced dividing plate and dividing plate is engraved structure, and silicon chip is placed in dividing plate and shelving online；Supersonic generator is provided with the rinse bath, bottom of rinse bath, which is provided with the top of outlet pipe, rinse bath, is provided with water inlet pipe.The utility model uses section to shelve net to be corrugated, can reduce the contact area with silicon chip, and shelve net being connected with oscillating plate, silicon chip can be made comprehensively to be cleaned, and the setting of dividing plate can avoid the scuffing between silicon chip and silicon chip.The utility model is simple in construction, easy to use, and cleaning performance is good, cleaning efficiency is high.
Description
Technical field
The utility model is related to Wafer Cleaning field, and in particular to a kind of heavy duty detergent silicon wafer cleaner.
Background technology
Existing cleaning device is generally required in the silicon chip insertion carrying gaily decorated basket, and the position that silicon chip is contacted with the gaily decorated basket is difficult to clearly
Wash clean so that leave stain on the silicon chip surface washed, causes the silicon chip locally sordid phenomenon of cleaning, so as to influence silicon chip
Quality.Rinse bath is all alkaline environment, it is necessary to pH value be kept within the specific limits, and be all by artificial in the prior art
Experience is adjusted to pH value, complex operation and not accurate enough.So, the cleaning performance of general cleaning device is poor, and
And cleaning efficiency is low.
The content of the invention
The purpose of this utility model is to provide a kind of heavy duty detergent silicon wafer cleaner, and cleaning performance is good, cleaning efficiency is high, and
The scuffing phenomenon of silicon chip in cleaning process can be reduced.
In order to solve the above technical problems, what the purpose of this utility model was realized in：
It is provided with a kind of heavy duty detergent silicon wafer cleaner, including objective table, the objective table in rinse bath, the rinse bath
It is provided with support, the support and oscillating plate is installed, the oscillating plate is provided with net is shelved, and the net section of shelving is in wave
Shape, described shelve is additionally provided with dividing plate on the net, and the dividing plate is spliced dividing plate and dividing plate is engraved structure, and silicon chip is placed on
Shelving in dividing plate is online；Supersonic generator is provided with the rinse bath, bottom of rinse bath is provided with outlet pipe, rinse bath top
Portion is provided with water inlet pipe.
On the basis of such scheme and it is used as the preferred scheme of such scheme：Temperature sensor is provided with the rinse bath
And heating tube, the temperature sensor and heating tube are connected with the controller being arranged on the outside of rinse bath respectively.
On the basis of such scheme and it is used as the preferred scheme of such scheme：PH detection dresses are provided with the rinse bath
Put.
The beneficial effects of the utility model are：The utility model uses section to shelve net to be corrugated, can reduce with
The contact area of silicon chip, and shelve net and be connected with oscillating plate, when work silicon chip can depart from and shelve plate surface, silicon can be made
Piece is comprehensively cleaned, and the setting of dividing plate can avoid the scuffing between silicon chip and silicon chip, while dividing plate is using splicing
Formula dividing plate, can be spliced and combined, and can adapt to different size of silicon chip.The utility model is simple in construction, easy to use, cleaning
Effect is good, cleaning efficiency is high.
Brief description of the drawings
Fig. 1 is schematic diagram of the present utility model.
Fig. 2 is the structural representation of dividing plate.
Embodiment
The utility model is further illustrated with specific embodiment below in conjunction with the accompanying drawings.
As depicted in figs. 1 and 2, it is provided with a kind of heavy duty detergent silicon wafer cleaner, including objective table 1, the objective table 1 clear
It is provided with washing trough 2, the rinse bath on support 3, the support 3 and oscillating plate 4 is installed, the oscillating plate 4 is provided with and shelved
Net 5, the section of net 5 of shelving is in wavy, and section is that corrugated net 5 of shelving can reduce the contact area with silicon chip, and
And shelve net 5 and be connected with oscillating plate 4, when work silicon chip can depart from and shelve plate surface, can obtain silicon chip comprehensively clear
Wash, described shelve is additionally provided with dividing plate 6 on net 5, the dividing plate 6 is spliced dividing plate and dividing plate is engraved structure, hollow out knot
Structure will not stop to ultrasonic wave, ensure the effect of cleaning.Silicon chip is placed on shelving on net 5 in dividing plate 6, dividing plate 6
Setting can avoid the scuffing between silicon chip and silicon chip, while dividing plate uses spliced dividing plate, can be spliced and combined, Neng Goushi
Answer different size of silicon chip.Supersonic generator 7 is provided with the rinse bath, bottom of rinse bath is provided with outlet pipe 8, rinse bath
Top is provided with water inlet pipe 9.Temperature sensor 10 and heating tube 11, the temperature sensor 10 and heating are provided with the rinse bath
Pipe 11 is connected with the controller 12 being arranged on the outside of rinse bath respectively, and temperature sensor 10 can be to the cleaning fluid in rinse bath
Temperature is monitored and shown, when the temperature of cleaning fluid is less than setting value, the control of controller 12 heating tube 11 is heated, and is thus protected
Cleaning fluid is demonstrate,proved in suitable temperature, cleaning performance is further improved.PH detection means 13 is provided with the rinse bath, can
Workman is intuitive to see the PH of rinse bath cleaning liquid inside, be adjusted in time, further ensure the effect of cleaning.
Preferred embodiment of the present utility model described in detail above.It should be appreciated that the ordinary skill people of this area
Member just can make many modifications and variations without creative work according to design of the present utility model.Therefore, all this technology necks
Technical staff passes through logic analysis, reasoning or limited reality on the basis of existing technology according to design of the present utility model in domain
Available technical scheme is tested, all should be in the protection domain being defined in the patent claims.
Claims (3)
1. a kind of heavy duty detergent silicon wafer cleaner, it is characterised in that：Including objective table, rinse bath, institute are provided with the objective table
State and support is installed in rinse bath, oscillating plate is installed on the support, the oscillating plate is described to shelve net provided with net is shelved
Section is in wavy, and described shelve is additionally provided with dividing plate on the net, and the dividing plate is spliced dividing plate and dividing plate is engraved structure,
Silicon chip is placed in dividing plate and shelves online；Supersonic generator is provided with the rinse bath, bottom of rinse bath is provided with water outlet
Water inlet pipe is provided with the top of pipe, rinse bath.
2. heavy duty detergent silicon wafer cleaner according to claim 1, it is characterised in that：TEMP is provided with the rinse bath
Device and heating tube, the temperature sensor and heating tube are connected with the controller being arranged on the outside of rinse bath respectively.
3. heavy duty detergent silicon wafer cleaner according to claim 1, it is characterised in that：PH detections are provided with the rinse bath
Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621286576.XU CN206356307U (en) | 2016-11-28 | 2016-11-28 | A kind of heavy duty detergent silicon wafer cleaner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621286576.XU CN206356307U (en) | 2016-11-28 | 2016-11-28 | A kind of heavy duty detergent silicon wafer cleaner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206356307U true CN206356307U (en) | 2017-07-28 |
Family
ID=59372396
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621286576.XU Expired - Fee Related CN206356307U (en) | 2016-11-28 | 2016-11-28 | A kind of heavy duty detergent silicon wafer cleaner |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206356307U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108114960A (en) * | 2017-12-21 | 2018-06-05 | 安泰科技股份有限公司 | Circular product is surface-treated device for cleaning |
-
2016
- 2016-11-28 CN CN201621286576.XU patent/CN206356307U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108114960A (en) * | 2017-12-21 | 2018-06-05 | 安泰科技股份有限公司 | Circular product is surface-treated device for cleaning |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170728 Termination date: 20181128 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |