CN206290977U - Process liquid induction system - Google Patents
Process liquid induction system Download PDFInfo
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- CN206290977U CN206290977U CN201621281040.9U CN201621281040U CN206290977U CN 206290977 U CN206290977 U CN 206290977U CN 201621281040 U CN201621281040 U CN 201621281040U CN 206290977 U CN206290977 U CN 206290977U
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- process liquid
- interface
- semiconductor equipment
- pump
- pneumatic operated
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Abstract
The utility model provides a kind of process liquid induction system for semiconductor equipment, comprising：One magnetic valve, is connected to import a working gas with a gas supply source；One pneumatic operated valve, is connected with the magnetic valve to receive the working gas, and is used to for the working gas to pass through at least interface discharge comprising an at least interface；One accumulator tank, for storing a process liquid；And a pump, it is connected between an at least interface of the pneumatic operated valve and the accumulator tank, for receiving the working gas to drive the pump to produce the power for extracting the process liquid out from the accumulator tank.
Description
Technical field
The utility model is related to a kind of process liquid induction system, more particularly to a kind of technique for semiconductor equipment
Liquid conveying system.
Background technology
Process liquid would generally be driven to circulate using pneumatic diaphragm pump in semiconductor equipment.Reference picture 1, its display one
Plant the schematic diagram of the process liquid induction system 10 for being currently used for semiconductor equipment.The process liquid induction system 10 includes electricity
Magnet valve 110, pneumatic diaphragm pump 120, accumulator tank 130 and it is connected between the magnetic valve 110 and the pneumatic diaphragm pump 120
Gas transfer pipeline 140 and the liquid transmission pipeline that is connected between the pneumatic diaphragm pump 120 and the accumulator tank 130
150.The magnetic valve 110 is generally arranged at the automatically controlled area 170 of semiconductor equipment, and the automatically controlled area 170 is provided with various automatically controlled dresses
Put the circuit trace of (such as power-supply controller of electric, computer etc.) and complexity.The magnetic valve 110 can be with a gas supply source
Be sent to for the working gas by the gas transfer pipeline 140 described pneumatic by 160 connections with importing a working gas
Membrane pump 120, produces reciprocating so that the energy of the pneumatic diaphragm pump 120 with the film for driving the pneumatic diaphragm pump 120
Process liquid is ordered about to be extracted out from the accumulator tank 130 by the liquid transmission pipeline 150.The process liquid of extraction can be by pipe
The original accumulator tank 130 is returned to after the circulation of road, or is conveyed between different cell bodies by pipeline.
Reference picture 2 and Fig. 3, Fig. 2 show the magnetic valve 110 of the process liquid induction system 10 of Fig. 1 in off-position
Under schematic diagram, and Fig. 3 shows the magnetic valve 110 of the process liquid induction system 10 of Fig. 1 in showing under "on" position
It is intended to.The magnetic valve 110 is installed in the trace 113 comprising coil group 111, pilot valve 112, trace 113, multiple
Piston 114, air inlet C1, first row gas port C2, second exhaust port C3, first interface C4 and second interface C5.As shown in Fig. 2
When the magnetic valve 110 is under off-position when, working gas G can be passed through the air inlet C1 by the gas supply source 160
Import in the magnetic valve 110 so that the working gas G is delivered to the gas transfer pipeline by the second interface C5
140 to enter the pneumatic diaphragm pump 120, and then drives the film of the pneumatic diaphragm pump 120 to move towards a direction.Also,
The working gas G in the pneumatic diaphragm pump 120 can be recycled to the magnetic valve by the gas transfer pipeline 140 again
The 110 first interface C4, and discharged by the first row gas port C2.Then, as shown in figure 3, working as the magnetic valve 110
When under "on" position, moved down by by the coil group 111 controllable pilot valve 112 that is powered, jointly will
The trace 113 and the multiple piston 114 are moved down in the lump, and then it is logical to change the gas inside the magnetic valve 110
Road.Therefore, after the gas supply source 160 imports in the magnetic valve 110 working gas G by the air inlet C1, institute
State working gas G and can change and be delivered to the gas transfer pipeline 140 to enter the pneumatic diaphragm by the first interface C4
Pump 120, and then drive the film of the pneumatic diaphragm pump 120 to be moved towards an opposite direction.Therefore, by controlling the magnetic valve
110 are continuously powered and power operation, and reciprocating is produced with the film for driving the pneumatic diaphragm pump 120, and then
Reach and order about effect that process liquid is extracted out by the liquid transmission pipeline 150 from the accumulator tank 130.
However, when the film breaks of the pneumatic diaphragm pump 120, process liquid can pour into the gas transfer pipeline
In 140, and flowed into the magnetic valve 110 in the automatically controlled area 170 along the gas transfer pipeline 140, caused
The magnetic valve 110 is damaged with the electric control gear of surrounding, and also the work that operating personnel shock by electricity can be produced to pacify because of electric leakage
It is unexpected.
In view of this, it is necessary to propose a kind of process liquid induction system for semiconductor equipment, it is used to solve existing
Problem present in technology.
Utility model content
To solve above-mentioned problem of the prior art, the purpose of this utility model is to provide a kind of for semiconductor equipment
Process liquid induction system, by setting up a pneumatic operated valve between magnetic valve and pump, to solve because the magnetic valve and pump are direct
Ground connection so that when the process liquid in pump is flowed into the magnetic valve along the transfer pipeline, cause the magnetic valve
The problem damaged with the electric control gear of surrounding, and also can prevent the work for producing operating personnel to shock by electricity because of electric leakage from pacifying meaning
Outward.
To reach above-mentioned purpose, the utility model provides a kind of process liquid induction system for semiconductor equipment, bag
Contain：One magnetic valve, is connected to import a working gas with a gas supply source；One pneumatic operated valve, is connected to connect with the magnetic valve
The working gas is received, and is used to for the working gas to pass through at least interface discharge comprising an at least interface；One
Accumulator tank, for storing a process liquid；And a pump, it is connected to an at least interface of the pneumatic operated valve and the storage
Between groove, for receiving the working gas to drive the pump to produce the process liquid from moving that the accumulator tank is extracted out
Power.
In the middle of one of the utility model preferred embodiment, the pneumatic operated valve, comprising：One first interface and one second
Interface；And operating bar and the multiple distance pieces for being assembled in the operating bar, wherein the movement by controlling the operating bar
With the position of the multiple distance piece of related change, and then change the gas delivery channels inside the pneumatic operated valve so that described
Working gas is discharged by one of the first interface or the second interface.
In the middle of one of the utility model preferred embodiment, the first interface of the pump and the pneumatic operated valve and
The second interface connects to receive the working gas.
In the middle of one of the utility model preferred embodiment, by controlling the operating bar of the pneumatic operated valve reciprocal
Ground is mobile so that the working gas is alternately and successively arranged by one of the first interface or the second interface
Go out.
In the middle of one of the utility model preferred embodiment, the pump includes a pneumatic diaphragm pump.
In the middle of one of the utility model preferred embodiment, the shifting of the operating bar by controlling the pneumatic operated valve
It is dynamic to be discharged with causing that the working gas alternately passes through one of the first interface or the second interface, and then drive
The film of the pneumatic diaphragm pump produces reciprocating, thus drive the pneumatic diaphragm pump produce by the process liquid from
The power that the accumulator tank is extracted out.
In the middle of one of the utility model preferred embodiment, an electricity of the magnetic valve position in the semiconductor equipment
Control area, and pneumatic operated valve position is in a pipeline area of the semiconductor equipment.
In the middle of one of the utility model preferred embodiment, the automatically controlled area and the pipeline area at a distance of a distance with
It is adequately isolated the automatically controlled area and the pipeline area.
In the middle of one of the utility model preferred embodiment, the automatically controlled position is in the upper of the semiconductor equipment
Side, and the pipeline position is in the lower section of the semiconductor equipment.
In the middle of one of the utility model preferred embodiment, the magnetic valve connects comprising one with the gas supply source
The input port for connecing and two interfaces, wherein one of described two interfaces are connected with by the working gas with the pneumatic operated valve
The pneumatic operated valve is delivered to, another interface is then closed mode.
The utility model also provides a kind of process liquid induction system for semiconductor equipment, comprising：One gas is supplied
Source；One magnetic valve, is connected with the gas supply source；One pneumatic operated valve, is connected with the magnetic valve；One accumulator tank, for storing
One process liquid；And a pump, it is connected between the pneumatic operated valve and the accumulator tank；Wherein, conveyed in the process liquid
During system start, the working gas in the gas supply source flow to the pneumatic operated valve, the pneumatic operated valve by the magnetic valve
Effect imports in the pump working gas to drive the pump to produce the process liquor iterating through different pipelines
The power that body is extracted out from the accumulator tank.
Compared to prior art, the utility model is described to avoid by setting up a pneumatic operated valve between magnetic valve and pump
Magnetic valve is directly connected with pump.And it is arranged on semiconductor equipment by by the pneumatic operated valve being directly connected with the pump
Pipeline area so that the pneumatic operated valve and position automatically controlled area the magnetic valve at a distance of a distance.Therefore, when film breaks in pump
When causing process liquid along the transfer pipeline adverse current, the process liquid does not flow into the electricity of institute's rheme in automatically controlled area
In magnet valve, therefore the problem of the magnetic valve and the electric control gear damage of surrounding can be avoided, and also can prevent from being produced because of electric leakage
The work peace that operating personnel shock by electricity is unexpected.
Brief description of the drawings
Fig. 1 shows a kind of schematic diagram of the existing process liquid induction system for semiconductor equipment；
Fig. 2 shows the magnetic valve of the process liquid induction system of Fig. 1 in the schematic diagram under off-position；
Fig. 3 shows the magnetic valve of the process liquid induction system of Fig. 1 in the schematic diagram under "on" position；
Fig. 4 shows a kind of process liquid induction system for semiconductor equipment according to the utility model preferred embodiment
Schematic diagram；
Fig. 5 shows the pneumatic operated valve of the process liquid induction system of Fig. 4 in the illustrative view of first state；And
Fig. 6 shows the pneumatic operated valve of the process liquid induction system of Fig. 4 in the illustrative view of the second state.
Specific embodiment
In order to above-mentioned and other purpose of the present utility model, feature, advantage can be become apparent, hereafter will be especially exemplified by this reality
New preferred embodiment is used, and coordinates institute's accompanying drawings, be described in detail below.
Fig. 4 is refer to, it shows a kind of process liquor for semiconductor equipment according to the utility model preferred embodiment
The schematic diagram of body conveying system 20.The process liquid induction system 20 includes magnetic valve 210, pneumatic operated valve 280, pump 220, storage
Groove 230 and the first gas transfer pipeline 242 being connected between the magnetic valve 110 and the pneumatic operated valve 280, it is connected to institute
State the second gas transfer pipeline 244 between pneumatic operated valve 280 and the pump 220 and be connected to the pump 220 and the storage
Liquid transmission pipeline 250 between groove 230.The magnetic valve 110 is arranged on the automatically controlled area 270 of semiconductor equipment, described automatically controlled
Area 270 is provided with the circuit trace of various electric control gears (such as power-supply controller of electric, computer etc.) and complexity.The pneumatic operated valve
The 280 pipeline areas 290 for being arranged on the semiconductor equipment, wherein the automatically controlled area 270 and the pipeline area 290 are at a distance of a distance
To be sufficiently separated the pneumatic operated valve 280 in pipeline area 290 and the magnetic valve 210 in automatically controlled area 270.Preferably, the electricity
Control 270 tops in the semiconductor equipment in area, and 290 lower sections in the semiconductor equipment in pipeline area.
As shown in figure 4, the magnetic valve 210 is connected to import a working gas, and by institute with a gas supply source 260
State first gas transfer pipeline 242 and the working gas is sent to the pneumatic operated valve 280, then through the second gas
The working gas is sent to the pump 220 by transfer pipeline 244.Driving the pump 220 to produce by the working gas will
The power that the process liquid is extracted out from the accumulator tank 230.Specifically, the pump 220 can be pneumatic diaphragm pump, and described
Second gas transfer pipeline 244 includes two independent pipelines, therefore can alternately and successively pass through by by the working gas
Described two independent pipeline transmission so that the film of the pump 220 produces reciprocating, and then causes the pneumatic diaphragm
Pump 220 can order about process liquid and be extracted out from the accumulator tank 230 by the liquid transmission pipeline 250.The process liquid of extraction
The original accumulator tank 130 can be returned to after the liquid transmission pipeline 250 is circulated, or be existed by different pipelines
Conveyed between different cell bodies.
Reference picture 5 and Fig. 6, Fig. 5 show the pneumatic operated valve 280 of the process liquid induction system of Fig. 4 in first state
Illustrative view, and Fig. 6 shows that the pneumatic operated valve 280 of the process liquid induction system of Fig. 4 shows in the start of the second state
It is intended to.The magnetic valve 210 includes the air inlet F1 and a first interface F2 and second being connected with the gas supply source 260
Interface F3.By controlling the energization and power-off of the magnetic valve 210, the gas conveying that can change inside the magnetic valve 210 is logical
Road, and then control working gas G to be exported by one of described first interface F2 or second interface F3.It should be appreciated that
The magnetic valve 210 described in the utility model will not be continuously powered and power operation, therefore the working gas G only can
Exported permanently by one of described first interface F2 or second interface F3.In the preferred embodiment with by described first
Interface F2 is illustrated as fixed exhaust outlet.When the working gas G is exported permanently by the first interface F2,
The second interface F3 is closed mode.
As shown in figure 5, the pneumatic operated valve 280 includes the input being connected with the first interface F2 of the magnetic valve 210
Mouth E1, a first row gas port E2, a second exhaust port E3, an a first interface E4 and second interface E5, wherein described first connects
The mouth E4 and second interface E5 is connected by the second gas transfer pipeline 244 with the pump 220.Specifically, it is described
Second gas transfer pipeline 244 includes two independent gas transfer pipelines, the first interface E4 and the second interface E5
It is connected with the pump 220 by two independent gas transfer pipelines respectively.The pneumatic operated valve 280 also includes an operating bar
281 distance pieces 282 that the operating bar 281 is assembled in multiple.As shown in figure 5, when the pneumatic operated valve 280 is in first state
When, the working gas G can be delivered to the pump 220 by the first interface E4, drive the film of the pump 220 a towards side
To movement.Also, the working gas G in the pump 220 can be recycled to institute by the second gas transfer pipeline 244 again
The second interface E5 of pneumatic operated valve 280 is stated, and is discharged by the second exhaust port E3.Then, as shown in fig. 6, when described
Pneumatic operated valve 280 is moved down when the second state by controlling the operating bar 281, with jointly by the multiple distance piece
282 move down in the lump, and then change the gas passage inside the pneumatic operated valve 280.Therefore, the working gas G can change logical
Cross the second interface E5 and be sent to the pump 220, and then drive the film of the pump 220 to be moved towards an opposite direction.Therefore, exist
Pneumatic operated valve 280 described in the utility model is in first state and the second state intention by controlling the operating bar 281
The mobile position with the multiple distance piece 282 of related change, and then it is logical to change the gas conveying inside the pneumatic operated valve 280
Road so that the working gas G is discharged by one of described first interface E4 or described second interfaces E5.That is,
Continuously moved up and down by controlling the operating bar 281 in the utility model, produced with the film for driving the pump 220
Raw reciprocating, and then reach and drive the pump 220 to produce the power of extracting the process liquid out from the accumulator tank
Effect.
In sum, the utility model is between magnetic valve and pump by setting up a pneumatic operated valve, to avoid the magnetic valve
It is directly connected with pump.And by the pipeline that the pneumatic operated valve being directly connected to the pump is arranged on semiconductor equipment
Area so that position pipeline area the pneumatic operated valve and position automatically controlled area the magnetic valve at a distance of a distance, to be sufficiently separated
The pneumatic operated valve in pipeline area and the magnetic valve in automatically controlled area.Preferably, the automatically controlled position is in the semiconductor equipment
Top, and the pipeline position is in the lower section of the semiconductor equipment.Therefore, when in pump film breaks cause process liquid edge
When the transfer pipeline adverse current, the process liquid does not flow into institute's rheme in the magnetic valve in automatically controlled area, therefore can keep away
Exempt from the problem that the magnetic valve is damaged with the electric control gear of surrounding, and also can prevent from producing operating personnel that electricity occurs because of electric leakage
The work peace hit is unexpected.
The above is only preferred embodiment of the present utility model, it is noted that for one of ordinary skill in the art, do not taking off
On the premise of the utility model principle, some improvements and modifications can also be made, these improvements and modifications also should be regarded as this reality
With new protection domain.
Claims (11)
1. a kind of process liquid induction system for semiconductor equipment, it is characterised in that include：
One magnetic valve, is connected to import a working gas with a gas supply source；
One pneumatic operated valve, is connected to receive the working gas, and be used for by described in comprising an at least interface with the magnetic valve
Working gas passes through an at least interface and discharges；
One accumulator tank, for storing a process liquid；And
One pump, is connected between an at least interface of the pneumatic operated valve and the accumulator tank, for receiving the work gas
Body produces the power for extracting the process liquid out from the accumulator tank to drive the pump.
2. the process liquid induction system for semiconductor equipment as described in claim the 1, it is characterised in that the gas
Dynamic valve, comprising：
One first interface and a second interface；And
One operating bar and multiple distance pieces for being assembled in the operating bar, wherein by controlling the movement of the operating bar with related
Change the position of the multiple distance piece, and then change the gas delivery channels inside the pneumatic operated valve so that the work gas
Body is discharged by one of the first interface or the second interface.
3. the process liquid induction system for semiconductor equipment as described in claim the 2, it is characterised in that the pump
It is connected to receive the working gas with the first interface and the second interface of the pneumatic operated valve.
4. the process liquid induction system for semiconductor equipment as described in claim the 2, it is characterised in that by control
The operating bar for making the pneumatic operated valve is reciprocally moved so that the working gas alternately and successively connects by described first
The discharge of one of mouth or the second interface.
5. the process liquid induction system for semiconductor equipment as described in claim the 2, it is characterised in that the pump
Comprising a pneumatic diaphragm pump.
6. the process liquid induction system for semiconductor equipment as described in claim the 5, it is characterised in that by control
The operating bar for making the pneumatic operated valve moves so that the working gas alternately passes through the first interface or described
One of second interface is discharged, and then drives the film of the pneumatic diaphragm pump to produce reciprocating, thus is driven described
Pneumatic diaphragm pump produces the power for extracting the process liquid out from the accumulator tank.
7. the process liquid induction system for semiconductor equipment as described in claim the 1, it is characterised in that the electricity
Magnet valve position is in an automatically controlled area of the semiconductor equipment, and pneumatic operated valve position is in a pipeline area of the semiconductor equipment.
8. the process liquid induction system for semiconductor equipment as described in claim the 7, it is characterised in that the electricity
Control area and the pipeline area is at a distance of a distance being adequately isolated the automatically controlled area and the pipeline area.
9. the process liquid induction system for semiconductor equipment as described in claim the 7, it is characterised in that the electricity
Control position is in the top of the semiconductor equipment, and the pipeline position is in the lower section of the semiconductor equipment.
10. the process liquid induction system for semiconductor equipment as described in claim the 1, it is characterised in that described
Magnetic valve include an input port being connected with the gas supply source and two interfaces, wherein one of described two interfaces with
The pneumatic operated valve connection is delivered to the pneumatic operated valve with by the working gas, and another interface is then closed mode.
11. a kind of process liquid induction systems for semiconductor equipment, it is characterised in that include：
One gas supply source；
One magnetic valve, is connected with the gas supply source；
One pneumatic operated valve, is connected with the magnetic valve；
One accumulator tank, for storing a process liquid；And
One pump, is connected between the pneumatic operated valve and the accumulator tank；
Wherein, in the process liquid induction system start, the working gas in the gas supply source passes through the electromagnetism
Valve flow to the pneumatic operated valve, the pneumatic valve action come iterate through different pipelines by the working gas import in the pump with
The pump is driven to produce the power for extracting the process liquid out from the accumulator tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621281040.9U CN206290977U (en) | 2016-11-28 | 2016-11-28 | Process liquid induction system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621281040.9U CN206290977U (en) | 2016-11-28 | 2016-11-28 | Process liquid induction system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206290977U true CN206290977U (en) | 2017-06-30 |
Family
ID=59099509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621281040.9U Active CN206290977U (en) | 2016-11-28 | 2016-11-28 | Process liquid induction system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206290977U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111565823A (en) * | 2018-01-12 | 2020-08-21 | 富默乐有限公司 | Tangential flow filtration TFF system and disposable TFF unit including integrated pump device |
-
2016
- 2016-11-28 CN CN201621281040.9U patent/CN206290977U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111565823A (en) * | 2018-01-12 | 2020-08-21 | 富默乐有限公司 | Tangential flow filtration TFF system and disposable TFF unit including integrated pump device |
| CN111565823B (en) * | 2018-01-12 | 2023-03-31 | 富默乐有限公司 | Tangential flow filtration TFF system and disposable TFF unit including integrated pump device |
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