CN206259325U - Process of surface treatment system, handling unit and its stage structure - Google Patents

Abstract

The utility model provides a kind of process of surface treatment system, handling unit and its stage structure, and the stage structure is included for carrying simultaneously the fixed panel level microscope carrier base being fanned out to and at least two block units for being covered on microscope carrier base upper surface；It is flexibly connected between adjacent block unit, by adjusting the position of block unit, and then changes blocking position and shielded area of the block unit to microscope carrier base upper surface, so that the area that microscope carrier base upper surface de-occlusion region is fanned out to panel level is adapted.Relative to prior art, process system, handling unit and its stage structure that surface treatment is fanned out to for panel level that the utility model is provided, realize blocking for microscope carrier, and can automatically adjust blocking position for shielded area, ensure that microscope carrier will not be contaminated, and save human cost.

Description

Process of surface treatment system, handling unit and its stage structure

Technical field

The present invention relates to the technical field that panel level is fanned out to process equipment, it is specifically related to a kind of panel level that is used for and is fanned out to table Process system, handling unit and its stage structure that face is processed.

Background technology

Current fan out techniques, and for the equipment of Panel fanout PVD, Carrier is as panel in PVD In carrier, play and carry and fixed effect.Due to the size of panel it is different, it is necessary to replacing it is various sizes of carrier.So need frequently to open vacuum cavity, then wait be evacuated down to can operation interval, such process may need Want several hours even longer.If the size not according to panel changes carrier, will be right in surface treatment process Carrier is polluted.

The content of the invention

The embodiment of the present invention provides a kind of process system, handling unit and its microscope carrier that surface treatment is fanned out to for panel level Structure, to solve in the prior art due to needing constantly to change various sizes of carrier and make according to the size difference of panel Into human cost is high and ineffective technical problem.

To solve the above problems, the embodiment of the invention provides it is a kind of for panel level be fanned out to surfacing process Stage structure, the stage structure is included for carrying the microscope carrier base and be covered on the microscope carrier that simultaneously fixed panel level is fanned out to At least two block units of base upper surface；It is flexibly connected between adjacent block unit, by adjusting the block unit Position, and then change blocking position and shielded area of the block unit to the microscope carrier base upper surface, so that the load The area that platform base upper surface de-occlusion region is fanned out to panel level is adapted.

According to the preferred embodiment of the utility model one, each block unit include a support bar and with the branch The shutter of strut connection, is flexibly connected between adjacent supports bar, by adjusting the position of the support bar, drive described in block Plate extends or shrinks, to realize the change of blocking position and/or shielded area to the microscope carrier base upper surface.

According to the preferred embodiment of the utility model one, the quantity of the block unit is two, the support of two block units Connected between bar and by sliding rail between support bar and adjacent fix bar on microscope carrier base.

According to the preferred embodiment of the utility model one, the quantity of the block unit is three, the branch of adjacent block unit Connected between strut and by sliding rail between support bar and adjacent fix bar on microscope carrier base.

According to the preferred embodiment of the utility model one, the quantity of the block unit is four, the branch of adjacent block unit Connected by sliding rail between strut.

According to the preferred embodiment of the utility model one, the shutter is made up of soft material, and in contraction state, volume sets On the support bar or volume be located in the rotating shaft of the microscope carrier chassis side.

According to the preferred embodiment of the utility model one, the stage structure also includes motor, and the motor is used Moved in the support bar is driven.

According to the preferred embodiment of the utility model one, the microscope carrier base upper surface is provided with multiple mounting holes, the installation Hole is used for by coordinating the fixed installation for realizing that counter plate level is fanned out to fixture.

In order to solve the above technical problems, the embodiment of the present invention also provides a kind of panel level that is used for is fanned out to process of surface treatment mistake Handling unit in journey, the handling unit includes the stage structure any one of transmission mechanism and above-described embodiment, The stage structure is used to carry and fixed panel level is fanned out to, and the transmission mechanism is used to shift the load between different station Platform structure.

In order to solve the above technical problems, the embodiment of the present invention further provide for it is a kind of for panel level be fanned out to surface treatment Process system, the process system includes the handling unit described in above-described embodiment, and the handling unit is used for counter plate level It is fanned out to and is carried, fixed and shifted.

Relative to prior art, process system, the handling unit of surface treatment are fanned out to provided by the present invention for panel level And its stage structure, blocking for microscope carrier is realized, and blocking position can be automatically adjusted for shielded area, it is ensured that microscope carrier will not be subject to Pollution, and save human cost.

Brief description of the drawings

Technical scheme in order to illustrate more clearly the embodiments of the present invention, below will be to that will make needed for embodiment description Accompanying drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the present invention, for For those of ordinary skill in the art, on the premise of not paying creative work, other can also be obtained according to these accompanying drawings Accompanying drawing.

Fig. 1 is the composition structured flowchart of the embodiment of process system one that the present invention is fanned out to surface treatment for panel level；

Fig. 2 is the structure top view of stage structure first embodiment in the embodiment of the present invention；

Fig. 3 is the structure top view of another working condition of stage structure in Fig. 2 embodiments；

Fig. 4 is the structure top view of stage structure second embodiment in the embodiment of the present invention；

Fig. 5 is the structure top view of another working condition of stage structure in Fig. 4 embodiments；

Fig. 6 is the chamber structure vertical view cutaway drawing of physical vapor deposition chamber first embodiment of the present invention；

Fig. 7 is the vertical view cutaway drawing of Fig. 6 embodiment another states of lumen cell structure；

Fig. 8 is the side view of Fig. 6 embodiment lumen cell structures；

Fig. 9 is the chamber structure vertical view cutaway drawing of physical vapor deposition chamber second embodiment of the present invention；

Figure 10 is the vertical view cutaway drawing of Fig. 9 embodiment another states of lumen cell structure；And

Figure 11 is the structure schematic diagram of Handling device in Fig. 1 embodiments.

Specific embodiment

With reference to the accompanying drawings and examples, the present invention is described in further detail.It is emphasized that following implement Example is merely to illustrate the present invention, but the scope of the present invention is not defined.Likewise, following examples are only portion of the invention Point embodiment and not all embodiments, the institute that those of ordinary skill in the art are obtained under the premise of creative work is not made There are other embodiments, belong to the scope of protection of the invention.

Fig. 1 is referred to, Fig. 1 is the composition knot of the embodiment of process system one that the present invention is fanned out to surface treatment for panel level Structure block diagram, the process system includes but is not limited to following construction unit：Degassing tower 100, handling carrier unit 200, microscope carrier 300, remove Shipping unit 400, radio frequency etching chamber 500 and physical vapor deposition chamber 600.

Specifically, microscope carrier 300 is used to carry and fixed panel level is fanned out to, and microscope carrier 300 is collectively formed with Handling device 400 Panel level is fanned out to the handling unit in surfacing process, and the Handling device 400 is used in handling carrier unit 200, radio frequency Microscope carrier 300 is carried between etching chamber 500 and physical vapor deposition chamber 600.It should be noted that the work in the embodiment of the present invention The panel level that process system is preferred for rectangular configuration is fanned out to.

It is the structure top view of stage structure first embodiment in the embodiment of the present invention also referring to Fig. 2 and Fig. 3, Fig. 2, Fig. 3 is the structure top view of another working condition of stage structure in Fig. 2 embodiments；Carrying out radio frequency etching and physical vapor In the process of surface treatment such as deposition, panel level is fanned out to and is fixed on microscope carrier 300, in order that not being fanned out to the load of covering by panel level Platform surface is not contaminated in surface treatment process, and the microscope carrier 300 in the embodiment of the present invention sets barrier structure, is used to block load The upper surface of platform 300, it is to avoid microscope carrier surface is sputtered metal material in the surface treatment process such as sputtering, causes microscope carrier surface dirty Dye, and then the back side that panel level is fanned out to is contaminated, further, since microscope carrier surface has sputtering layer, microscope carrier surface can be made not It is flat, there is difference in height in other words, and then the back side that cannot be fanned out to panel level is brought into close contact, installation that influence panel level is fanned out to and Surface treatment effect.

Microscope carrier 300 in the embodiment includes being set for carrying microscope carrier base 310 and lid that simultaneously fixed panel level is fanned out to In three block units 320 of the upper surface of microscope carrier base 310.Further, because the panel level that needs are surface-treated is fanned Go out size difference, and the position on microscope carrier 300 is likely to the block unit in difference, therefore the embodiment of the present invention every time 320 it can also be designed to blocking position and the adjustable structure of shielded area, so that the face of the upper surface de-occlusion region of microscope carrier base 310 The area that product is fanned out to panel level is adapted, the state for making the upper surface of microscope carrier base 310 completely capped, i.e.,：By panel Level is fanned out to covering, otherwise occluded cell 320 is covered, it is ensured that the upper surface of microscope carrier base 310 will not be by surface treatment process Pollution.

Each block unit 320 may each comprise a support bar 321 and the shutter 322 being connected with support bar 321, phase It is flexibly connected between adjacent support bar 321, by adjusting the position of support bar 321, drives shutter 322 to extend or shrink, with The change to the blocking position and shielded area of the upper surface of microscope carrier base 310 is realized, in other words in blocking position and shielded area One of change.

Wherein, the shutter 322 can be made up of soft material, for example plastics, nylon cloth etc., so that shutter 322 In contraction state, can roll up to be located on support bar 321 or roll up and be located on other pivot structures of the side of microscope carrier base 310. Such structure, can be with save space for the shutter of straight panel structure, and weight can be smaller.

In the present embodiment, the quantity of block unit 320 is three, because the microscope carrier 300 in the embodiment of the present invention is main For being fanned out to for rectangular configuration, therefore the microscope carrier upper surface that block unit 320 is reserved also is rectangle, reserves the unshielede region of rectangle There is a motionless side in domain, is also provided with a fix bar in the present embodiment at the edge placement of microscope carrier base 310 (330 are marked in figure), the fix bar 330 is slidably connected respectively with the support bar 321 of adjacent two block unit 320, to form one The region of quadrangle.Sliding connection structure can be the structures such as sliding rail (340 are marked in figure).

Further, the microscope carrier 300 can also include motor 350, and motor 350 is used to drive support bar 321 Mobile, the setting quantity of motor 350 can be identical with the quantity of support bar 321, i.e.,：The correspondence of each motor 350 is driven A support bar 321 (structure type shown in figure) is moved, or a motor 350 is only set, realized by transmission mechanism Three support bars 321 are driven, this part-structure feature is no longer described in detail herein in the range of the understanding of those skilled in the art.

By controlling the rotation of motor 350, with the shift position of precise control support bar 321, and then can accurately control Blocking position and shielded area of the shutter processed 322 to microscope carrier upper surface.For example, when needs expand or reduce reserved face During product (unshielding area), moved left and right by Right side support bar 321 in motor band cardon, now top supporting rod 321 move left and right with Right side support bar 321；Motor 350 can also drive top supporting rod 321 to moving up and down, now Left-side support bar 321 with top supporting rod 321 to moving up and down, while Left-side support bar 321 is flexibly connected with fix bar 330, Therefore, Left-side support bar 321 is moved up and down relative to fix bar 330, and above two type of drive can reach expansion Or reduce the purpose of the reserved area of microscope carrier.In addition, motor can also drive Left-side support bar 321 to move, the process with Aforementioned process is similar, no longer describes in detail herein.

Because the size of panel is different, in the prior art in order that microscope carrier size is adapted with panel, one is changed every time When the panel of specification is surface-treated, it is required for changing various sizes of microscope carrier, by design in the embodiment of the present application The stage structure of blocking position can be automatically adjusted, it is possible to reduce the artificial hard work for opening vacuum cavity replacing microscope carrier, and then Reduce human cost.

Because the effect of microscope carrier 300 is that counter plate level is fanned out to and is fixed and carries, and panel level is fanned out to than relatively thin, generally Also with warpage, thus need consider fix, while play leveling effect (solution on smooth problem, it is above-mentioned to block list Unit can prevent the upper surface of microscope carrier 300 to be sputtered pollution).Therefore, in the present embodiment the upper surface of microscope carrier base 310 be additionally provided with it is many Individual mounting hole 311, mounting hole 311 is used for by coordinating the fixed installation for realizing that counter plate level is fanned out to fixture, and specific Structure type can be after panel is put into, panel to be fixed on carrier using steady pin, be allowed to immovable, together When play a part of part warpage leveling.

It is the structure top view of the second embodiment of microscope carrier in the embodiment of the present invention also referring to Fig. 4 and Fig. 5, Fig. 4, figure 5 is the structure top view of another working condition of microscope carrier in Fig. 4 embodiments；From unlike a upper embodiment, in the embodiment Microscope carrier 300a include for carrying and the fixed panel microscope carrier base 310 that is fanned out to of level and be covered on the upper table of microscope carrier base 310 Four block units 320 in face, i.e. the four of rectangular configuration reserved area side are all adjustable.So that the upper table of microscope carrier base 310 The area and position that face de-occlusion region is fanned out to panel level can preferably be adapted, it is ensured that the upper surface of microscope carrier base 310 exists Will not be contaminated in surface treatment process.

Likewise, each block unit 320 in the embodiment also may each comprise a support bar 321 and and support bar The shutter 322 of 321 connections, is flexibly connected between adjacent supports bar 321, and by adjusting the position of support bar 321, drive is blocked Plate 322 extends or shrinks, to realize the change of blocking position and shielded area to the upper surface of microscope carrier base 310, in other words One of blocking position and shielded area change.

Wherein, the shutter 322 can equally be made up of soft material, for example plastics, nylon cloth etc., so as to block Plate 322 can roll up other rotating shaft knots for being located on support bar 321 or rolling up and be located at the side of microscope carrier base 310 in contraction state On structure.Such structure, can be with save space for the shutter of straight panel structure, and weight can be smaller.

In the present embodiment, the quantity of block unit 320 is four, is divided between four support bars of block unit 320 321 It is not slidably connected with adjacent supports bar.Sliding connection structure can be the structures such as sliding rail (340 are marked in figure).

Further, microscope carrier 300a can also include motor 350, and motor 350 is used to drive support bar 321 Mobile, the setting quantity of motor can be identical with the quantity of support bar 321, i.e.,：The correspondence of each motor 350 drives one Individual support bar 321 (structure type shown in figure), or a motor 350 is only set, realize driving by transmission mechanism Four support bars 321, this part-structure feature is also repeated no more herein in the range of the understanding of those skilled in the art.

By controlling the rotation of motor 350, with the shift position of precise control support bar 321, and then can accurately control Blocking position and shielded area of the shutter processed 322 to microscope carrier upper surface.For example, when needs expand or reduce reserved face During product (unshielding area), moved left and right by Right side support bar 321 in motor band cardon, now top supporting rod 321 and bottom support bar 321 moved left and right with Right side support bar 321；Motor 350 can also drive top supporting rod 321 to moving up and down, now Left-side support bar 321 with top supporting rod 321 to moving up and down, while Left-side support bar 321 with Bottom support bar 321 is flexibly connected, therefore, Left-side support bar 321 is moved up and down relative to bottom support bar 321, above-mentioned Two kinds of type of drive can reach the purpose for expanding or reducing the reserved area of microscope carrier.In addition, motor 350 can also drive Dynamic Left-side support bar or the movement of bottom support bar, both processes are similar to aforementioned process, also no longer describe in detail herein.

Likewise, because the effect of microscope carrier 300a is that counter plate level is fanned out to and is fixed and carries, and panel level is fanned out to (Panel) than relatively thin, generally also with warpage, so need to consider to fix, while playing the effect of leveling (on smooth problem Solution, above-mentioned block unit can prevent the upper surface of microscope carrier 300a to be sputtered pollution).Therefore, microscope carrier base in the present embodiment 310 upper surface is again provided with multiple mounting holes 311, and mounting hole 311 is used to realize counter plate level fan by with fixture cooperation The fixed installation for going out, and specific structure type can be after panel is put into, panel to be fixed on into microscope carrier using steady pin On 300a, it is allowed to immovable, while playing a part of part warpage leveling.

In addition, can also be the structure for setting one or two block units, i.e., in other embodiments：Rectangle knot One or two in four sides of structure reserved area are adjustable, although set the structure of one or two block units Form sets 3 or 4 structure types of block unit in not having previous embodiment on flexibility and change is blocked Effect is good, but for the structure change situation that cost and the panel to be processed level for combining stage structure are fanned out to, both (setting the structure type of one or two block units) stage structure is also desirable technical scheme.On set one or Two particular technique features of block unit form stage structure of person, it is similar to previous embodiment, no longer describe in detail herein.

The degassing tower 100 could be arranged to sandwich construction, places multi-disc panel level and is fanned out to material, so as to simultaneously to how unilateral Plate level is fanned out to and is de-gassed treatment.It is fanned out to while when being de-gassed (degas), piece can be taken with interval time and entered in multi-disc panel level The follow-up operation of row, increases the effect of degassing, while taking into account output.

The degassing method of the degassing tower 100 can be combined for heating with negative pressure method (pumping), and panel level is fanned out into material The steam and organic steam of organic material absorption are excluded in material, so that when next station (radio frequency etching chamber 500) is processed, The outgas (gas of discharge) for remaining in the cavity of radio frequency etching chamber 500 can be reduced.

The process system can also include conveyer 700, and the conveyer 700 is connected with degassing tower 100, for that will treat The panel level of processing is fanned out to and is sent to degassing tower 100, and the conveyer 700 can be conveyer belt or other transfer structures, In the range of the understanding of those skilled in the art, no longer enumerate herein.

Handling carrier unit 200 is loaded into microscope carrier 300 for the panel level after degassing tower 100 is processed to be fanned out to, also For the panel level after radio frequency etching chamber 500 and physical vapor deposition chamber 600 are processed to be fanned out to from microscope carrier 300 under unloading Come, or the panel level of some special processing requests is fanned out to only by radio frequency etching chamber 500 or physical vapor deposition chamber 600 One kind, after treatment terminates, it is also possible to carry out loading and unloading process using the handling carrier unit 200.

The handling carrier unit 200 can include loading and unloading work station 210 and manipulator 220, and the manipulator 220 is in handling Work station 210 is carried to complete that panel level is fanned out to the process for being loaded into microscope carrier 300 and panel level being fanned out to unloading from microscope carrier 300； Wherein, each production line of the process system is preferably provided only with a manipulator, microscope carrier 300 and degassing tower 100 respectively close to Manipulator 220 is set.With reference to the design feature that panel level is fanned out to, each equipment is set to horizontal linear mode, degassing tower 100 and load Platform 300 is distributed in the both sides of manipulator 220.Need not be fixed in degas, the flow after degassing is completed is required for Carried out on microscope carrier 300, so such design can turn uninstall process using what same manipulator completion panel level was fanned out to, entered And manipulator quantity is reduced, and then simplify the complexity of equipment, reduces cost.In addition, the loading and unloading work station 210 is also used Semi-finished product and finished product that process of surface treatment panel level is fanned out to are carried out in temporary.

The mode of the preferred using plasma of radio frequency etching chamber 500 bombardment removes oxide layer and the contamination of metal surface, And it is roughened the surface that panel level is fanned out to, and then increase the adhesion with follow-up sputtering layer.

Physical vapor deposition chamber 600 includes that chamber structure (i.e. shell) and the physical vapor inside chamber structure are heavy Product equipment (not shown), the Pvd equipment is by the way of vacuum sputtering successively by one or more metal levels Sputter at panel level to be fanned out to, one or more panels level can also be accommodated in physical vapor deposition chamber 600 be fanned out to is carried out simultaneously Sputtering.In addition, one or more physical vapour deposition (PVD) can be provided with each production line of process system in the present embodiment Room 600, i.e., can further increase the production capacity of equipment by way of many extension pvd chamber bodies simultaneously.

Because the size of the panel for needing to carry out surface physics vapour deposition may be different, in order to preferably remain preferable The physical characteristic such as vacuum, plasma uniformity and granularity, we are intended to the vacuum chamber of physical vapor deposition chamber With suitably sized, i.e.,：It is adapted with pending panel sizes, if the vacuum chamber of physical vapor deposition chamber is excessive Occur maintain larger volume vacuum of space, it is necessary to the energy of consumption is higher and plasma when being surface-treated with And the poor problem of the isoparametric uniformity of granularity, and in the process system of prior art when this problem is tackled, or It is, no matter the size of panel uses a kind of physical vapor deposition chamber of specification, to have the disadvantage：Maintain larger volume space true Reciprocal of duty cycle consumes huge energy；It is the dimensions according to different panel, changes different physical vapor deposition chambers, Have the disadvantage：The physical vapor deposition chamber of outfit plurality of specifications is needed, increases equipment cost.

The embodiment of the present invention provides a kind of chamber structure for physical gas-phase deposition of volume-tunable, please joins in the lump Fig. 6-Fig. 8 is read, Fig. 6 is the chamber structure vertical view cutaway drawing of physical vapor deposition chamber first embodiment of the present invention, and Fig. 7 is Fig. 6 realities A vertical view cutaway drawing for another state of lumen cell structure is applied, Fig. 8 is the side view of Fig. 6 embodiment lumen cell structures.

The chamber structure includes top cover 610, substrate 620 and four side walls 630.Specifically, top cover 610 and substrate 620 two ends for being respectively arranged on side wall 630, are between top cover 610, substrate 620 and side wall 630 and are tightly connected, close to be formed The chamber structure of envelope, is mutually flexibly connected between four side walls 630, by adjust four side walls 630 between position relationship come Realize changing the volume of chamber structure.

Wherein, two or three in 4 side walls 630 can be fixedly connected with top cover 610 or substrate 620, Gu The fixed quantity of side wall 630 for setting can be the flexibility comprehensive consideration adjusted in comprehensive chamber structure fastness and chamber volume After be designed, be not specifically limited herein, it is of course also possible to the structure type to be not provided with fixed side wall 630, these set Meter is all optional scheme.Preferably, can be connected by structures such as sliding rails (640 are marked in figure) between adjacent wall 630 Connect.

Further, the chamber structure can also include motor 650, and motor 650 is used to drive side wall 630 to move It is dynamic.Wherein, the setting quantity of motor can be identical with the quantity of side wall 630, i.e.,：The correspondence of each motor 650 drives One side wall 630, or a motor 650 is only set, realize driving four side walls 630 by transmission mechanism, certainly Can be that a or two side wall 630 (for only two side sets the structure of motor in figure) sets motor driving. This part-structure feature is same in the range of the understanding of those skilled in the art, and here is omitted.

By controlling the rotation of motor 650, can be with the shift position of precise control side wall 630, powered side wall The 630 side walls that one or two can also be driven adjacent thereto and connected are moved.And then precise control physical vapor is heavy The chamber structure volume of product room 600.For example, when needing to expand or reduce chamber structure volume, by motor Right sidewall 630 is moved left and right in 650 band cardons, and now top sidewall 630 is moved left and right with right sidewall 630；Drive electricity Machine 650 can also drive top sidewall 630 to moving up and down, now left side side wall 630 with top sidewall 630 to moving up and down, Left side side wall 630 is flexibly connected (be a side wall in the present embodiment as fixed sidewall) with fixed sidewall 630 simultaneously, therefore, Left side side wall 630 is moved up and down relative to fixed sidewall 630, and above two type of drive can reach expansion or contract The purpose of small chamber structural volume.In addition, motor 650 can also drive left side side wall 630 to move, the process and foregoing mistake Journey is similar, no longer describes in detail herein.This kind of design structure, can automatically adjust the position of side wall, and then reduce human cost, while Also no longer need to be fanned out to for various sizes of panel level and frequently change physical vapor deposition chamber, reduce the throwing of equipment cost Enter.

Overlooked also referring to the chamber structure that 9 and Figure 10, Fig. 9 are physical vapor deposition chamber second embodiments of the present invention and cutd open View, Figure 10 is the vertical view cutaway drawing of Fig. 9 embodiment another states of lumen cell structure.From unlike a upper embodiment, the reality The chamber structure applied in example includes three side walls 630, and three two of which side walls of side wall 630 can be structure as a whole, in addition One side wall 620 is connected with the two ends of integrative-structure two side by sliding rail 640 respectively.Three are not limited in the present embodiment Angular relationship between individual side wall 630, including angular relationship between the two side of integrative-structure is not limited, and can be sharp Angle, right angle or obtuse angle.In addition, in other embodiments, three side walls 630 can be the side wall of independently structure, It is slidably connected between any two.The present embodiment could be arranged to the shape that two of which side wall is structure as a whole from sealing property consideration Formula, but this should not cause limitation to three side wall construction chamber structures.

Likewise, the chamber structure also includes a motor 650, wherein, the two side of integrative-structure or in addition One side wall is fixedly connected with the top cover or substrate, and the side wall that motor 650 is used to drive on-fixed to connect is moved, And then reach the purpose for changing chamber structure volume.Preferably, motor 650 is driven company with the side wall of single structure Connect.

The chamber of three side wall constructions in the embodiment, its structure is simpler, can equally realize to chamber volume Regulation.In addition, on the basis of the embodiment of the present invention, people in the art can also design the chamber of five side walls or more side walls Cell structure, these all should be within protection scope of the present invention.

The structure schematic diagram that 11, Figure 11 is Handling device in Fig. 1 embodiments is referred to, the Handling device 400 is bilayer Horizontal transport structure, after panel level is fanned out to completion process of surface treatment, microscope carrier 300 drops to the understructure of Handling device 400 In, then carried by way of horizontal transport and be back to loading and unloading work station 210.By horizontal transport Handling device 400 Mode, can be particularly important especially for large-sized panel with save space.

Relative to prior art, the process system of surface treatment, its equipment knot are fanned out to provided by the present invention for panel level Structure is simple, only needs a manipulator to complete the loading and unloading that counter plate level is fanned out in a work station (loading and unloading work station) Journey, and the process system has highly versatile (the panel level for being applied to sizes specification is fanned out to) and production efficiency spy high Point.

Section Example of the invention is the foregoing is only, is not thereby limited the scope of the invention, every utilization Equivalent device or equivalent flow conversion that description of the invention and accompanying drawing content are made, or directly or indirectly it is used in other correlations Technical field, be included within the scope of the present invention.

Claims (10)

1. it is a kind of to be fanned out to the stage structure of surfacing process for panel level, it is characterised in that the stage structure bag Include for carrying and the fixed panel level microscope carrier base being fanned out to and at least two screenings for being covered on the microscope carrier base upper surface Gear unit；It is flexibly connected between adjacent block unit, by adjusting the position of the block unit, and then list is blocked described in change Unit to the blocking position and shielded area of the microscope carrier base upper surface so that the microscope carrier base upper surface de-occlusion region with The area that panel level is fanned out to is adapted.

2. stage structure according to claim 1, it is characterised in that each block unit include a support bar with And the shutter being connected with the support bar, it is flexibly connected between adjacent supports bar, by adjusting the position of the support bar, band The dynamic shutter extends or shrinks, to realize to the blocking position of the microscope carrier base upper surface and/or shielded area Change.

3. stage structure according to claim 2, it is characterised in that the quantity of the block unit is two, and two block Connected between the support bar of unit and by sliding rail between support bar and adjacent fix bar on microscope carrier base.

4. stage structure according to claim 2, it is characterised in that the quantity of the block unit is three, adjacent screening Keep off between the support bar of unit and connected by sliding rail between support bar and adjacent fix bar on microscope carrier base.

5. stage structure according to claim 2, it is characterised in that the quantity of the block unit is four, adjacent screening Connected by sliding rail between the support bar of gear unit.

6. the stage structure according to claim any one of 2-5, it is characterised in that the shutter is soft material system Into in contraction state, volume is located on the support bar or rolls up and is located in the rotating shaft of the microscope carrier chassis side.

7. the stage structure according to claim any one of 2-5, it is characterised in that the stage structure also includes driving electricity Machine, the motor is used to drive the support bar to move.

8. stage structure according to claim 1, it is characterised in that the microscope carrier base upper surface is provided with multiple installations Hole, the mounting hole is used for by coordinating the fixed installation for realizing that counter plate level is fanned out to fixture.

9. it is a kind of to be fanned out to handling unit in surfacing process for panel level, it is characterised in that the handling unit Including the stage structure described in transmission mechanism and claim any one of 1-8, the stage structure is used to carry and stationary plane Plate level is fanned out to, and the transmission mechanism is used to shift the stage structure between different station.

10. it is a kind of to be fanned out to the process system of surface treatment for panel level, it is characterised in that the process system will including right The handling unit described in 9, the handling unit is asked to be fanned out to for counter plate level and carried, fixed and shifted.