CN206209683U - A kind of nesa coating and capacitance touching control sensor and touch control display apparatus - Google Patents
A kind of nesa coating and capacitance touching control sensor and touch control display apparatus Download PDFInfo
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- CN206209683U CN206209683U CN201621134332.XU CN201621134332U CN206209683U CN 206209683 U CN206209683 U CN 206209683U CN 201621134332 U CN201621134332 U CN 201621134332U CN 206209683 U CN206209683 U CN 206209683U
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- nesa coating
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- capacitance touching
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Abstract
The utility model discloses a kind of nesa coating and capacitance touching control sensor and touch control display apparatus, the nesa coating includes network, the network includes multiple chase units, chi structure is formed between adjacent chase unit, conductive material is filled in and conductive grid is formed in groove, characterized in that, the chi structure is in T shape.Transparent conductive film structure of the present utility model is simple, and by the T-shaped structure design of this species, the groove depth-to-width ratio at grid intersection is improved, so that conductive material can be included fully in grid groove.Yield, stability and the antistatic property of processing procedure, reduces cost can significantly be lifted.
Description
Technical field
The utility model is related to a kind of nesa coating, more particularly to a kind of nesa coating and capacitance touching control sensor and
Touch control display apparatus.
Background technology
At present, the circuit design of existing touch-screen is generally all the criss-cross construction formed according to certain angle, is handed over
Crunode is corresponding touch point, and application of this structure design in the gold-tinted etch process such as ITO is very extensive.ITO lines
Road is very uniform, and the width of its cabling, thickness is all very consistent.Because metal mesh are set according to similar
What meter was designed, inside instead of the circuit being made up of ITO in ITO by the grid of many intersections, so as to form metal
Mesh circuit loops, realize conductive and touch-control.
But due to Box junction structure, each grid intersection has node, and node is intersected to form by wire casing, its groove
Body width is wider, cause filling when node conductive materials be easier to be taken out of by the excavation effect of scraper, while cleaning when
Time also easily takes conductive material out of, therefore causes that the electrical yield of product is low, and stability is poor, and antistatic effect is poor.
Touch-screen aborning, due to the base materials such as PET are easy to static electrification, causes often to occur in production process
Conducting film circuit is by electrostatic breakdown.Found by analysis and observation, be all the thinner place of circuit by the place of electrostatic breakdown.It is quiet
During electric current current through line by these thinner places due to point discharge, transient voltage is very big, produces larger
Heat, so as to circuit be burnt out.
This latticed filling modes of Metal mesh, result in node, to fill out conductive material less, so if filling
It is bad, be easier to by electrostatic breakdown, cause whole production procedure all to there is breakdown situation.
Utility model content
The mesh design that the purpose of this utility model is directed in background technology causes node depth on integral forming process
Width than too small, in filling conductive material, do not fill or lack of fill by conductive material, so as to cause Product Process yield low,
Stability is poor, the problem of antistatic effect difference, and a kind of new mesh design structure for proposing.
The utility model discloses a kind of nesa coating, the nesa coating includes network, the grid knot
Structure includes multiple chase units, and chi structure is formed between adjacent chase unit, and conductive material is filled in be formed in groove and leads
Power grid, the chi structure is in T shape.
Preferably, the network be rule ranks chi structure, the network in rectangular coordinate system, its
Row/column is with the angle of X-axis/Y-axisIt is describedFor：The nesa coating is placed in liquid crystal module, liquid crystal module is lighted
Angle rotation is carried out to the nesa coating afterwards, moire fringes are checked, anglec of rotation when being produced without moire fringes is
Preferably, the grid groove of the emission layer and receiving layer is in rectangular coordinate system, its row/column and X-axis/Y-axis
Angle isIt is describedFor：Emission layer or receiving layer are placed in required liquid crystal module, are lighted after liquid crystal module to transmitting
Layer or receiving layer carry out angle rotation, check moire fringes；Anglec of rotation when being produced without moire fringes is
Preferably, the line width of same row network is S, and network is L, L=S with the adjacent column width of a line.
Preferably, the line width of network is w, and network is L, network adjacent lines with the adjacent column width of a line
Respective column offset one from another length for d, meet 2w<d<L.
Specifically,
The invention also discloses a kind of capacitance touching control sensor, the touch sensing includes emission layer and reception
Layer, at least one the emission layer and the receiving layer include nesa coating disclosed in the utility model.
Preferably, the emission layer and the receiving layer are located on the base material of two-layer independence respectively, or positioned at same base
The both sides of material.
Preferably, the nesa coating includes multiple conductive channels and multiple non-conductive passages, the multiple conductive logical
Road is staggered with the multiple non-conductive passage.
The invention also discloses a kind of touch control display apparatus, including nesa coating disclosed in the utility model.
The beneficial effects of the utility model
Transparent conductive film structure of the present utility model is simple, can lift electrical yield, stability, the antistatic energy of processing procedure
Power, it is bad that reduction is produced due to electrostatic.Therefore, not only can be with reduces cost, while quality can also be lifted.
Brief description of the drawings
Fig. 1 is the macrostructure schematic diagram of the T fonts design of the utility model receiving layer.
Fig. 2 is the microstructure schematic diagram of the T fonts design of the utility model receiving layer, and wherein d1 is second non-conductive logical
The width in road；
Fig. 3 is the microstructure schematic diagram of the T fonts design of the utility model emission layer, and wherein d2 is first non-conductive logical
The width in road；
Fig. 4 is the vertical section figure after the utility model T font structures filling conductive material, and wherein w is at not a node
The line width of groove structure.
Fig. 5 is the microstructure schematic diagram of the utility model T fonts design, and wherein d is T font network adjacent lines
Respective column offsets one from another length, and L is adjacent column width of the T fonts network with a line.
Fig. 6 is the cellular construction of T font structures, and wherein L is adjacent column width of the T fonts network with a line, and S is T
The line width of font network.
Fig. 7 is the microcosmic schematic diagram of T-shaped network rotation, and the anglec of rotation is
Fig. 8 is the product structure schematic diagram after the filling of T fonts.
Specific embodiment
With reference to embodiment, the utility model is described in further detail, but protection domain of the present utility model is not limited to
This：
With reference to Fig. 1-Fig. 8, embodiment 1：A kind of nesa coating, the nesa coating includes network 6, the net
Lattice structure 6 includes multiple chase units 8, formation chi structure 5 between adjacent chase unit 8, conductive material 7 (it is preferred, by
The materials such as fine silver, silver-bearing copper composition, fine copper or nickel are made) formation conductive grid in groove is filled in, the chi structure 5 is in T
Font.
With reference to Fig. 6, embodiment 2：A kind of nesa coating as described in Example 1, the line width of same row network 6
It is S, network 6 is L, L=S with the adjacent column width of a line.
With reference to Fig. 7, embodiment 3：A kind of nesa coating as described in Example 1, the network 6 is the row of rule
Row chi structure, in rectangular coordinate system, its row/column is the network 6 with the angle of X-axis/Y-axisIt is describedFor：By institute
State nesa coating to be placed in liquid crystal module, angle rotation is carried out to the nesa coating after lighting liquid crystal module, check
Moire fringes, anglec of rotation when being produced without moire fringes isPreferably, 1 ° is often rotated, a moire fringes effect is checked.
With reference to Fig. 1, Fig. 4 and Fig. 5, embodiment 4：A kind of nesa coating as described in Example 3, the network 6
The line width of (conductive material 7 is filled with it) is w, and network 6 is L, the adjacent lines of network 6 with the adjacent column width of a line
Respective column offset one from another length for d, meet 2w<d<L.Wherein：The ranks are carried out for convenience of describing to be defined to conductive layer
Other structures obtained by rotation also fall into the protection domain of the application.
Embodiment 5：A kind of nesa coating as described in Example 4,
With reference to Fig. 1-Fig. 3, embodiment 6：A kind of capacitance touching control sensor, the touch sensing includes emission layer 2 and connects
Layer 1 is received, at least one the emission layer 2 and the receiving layer 1 include nesa coating described in the utility model.
Embodiment 7：A kind of capacitance touching control sensor according to embodiment 6, the emission layer 2 and the receiving layer 1
Respectively on the base material of two-layer independence, or positioned at the both sides of same base material.
With reference to Fig. 2 and Fig. 3, embodiment 8：A kind of capacitance touching control sensor according to embodiment 6, emission layer 2 is included
Multiple first conductive channels and multiple first non-conductive passages 4, the first conductive channel are staggered with the first non-conductive passage 4；
Receiving layer 1 includes multiple second conductive channels and multiple second non-conductive passages 3, the second conductive channel and the second non-conductive passage
3 are staggered.Wherein：It is filled with conductive material in the network 6 of the first conductive channel and the second conductive channel, first non-leads
There is no conductive material in the network 6 of the non-conductive passage 3 of electric channel 4 and second.
Embodiment 9：A kind of capacitance touching control sensor as described in Example 8, the width d2 of the first non-conductive passage 4 is equal to
The width d1 of the second non-conductive passage 3.
Embodiment 10：A kind of touch control display apparatus, including nesa coating described in the utility model.
Transparent conductive film structure of the present utility model is simple, by the T-shaped structure design of this species, at grid intersection
Groove depth-to-width ratio is improved, so that conductive material can be included fully in grid groove.Yield, the stabilization of processing procedure can significantly be lifted
Property and antistatic property, reduces cost.
The utility model is not directed to partly same as the prior art or can be realized using prior art.
Specific embodiment described herein is only that the utility model spirit is illustrated.The utility model institute
Category those skilled in the art can make various modifications or supplement or using similar to described specific embodiment
Mode substitute, but without departing from spirit of the present utility model or surmount scope defined in appended claims.
Claims (9)
1. a kind of nesa coating, the nesa coating includes network, and the network includes multiple chase units,
Chi structure is formed between adjacent chase unit, conductive material is filled in and conductive grid is formed in groove, it is characterised in that institute
State chi structure in T shape.
2. nesa coating according to claim 1, it is characterised in that the network is the ranks cross knot of rule
Structure, in rectangular coordinate system, its row/column is the network with the angle of X-axis/Y-axisIt is describedFor：Transparent led described
Electrolemma is placed in liquid crystal module, and angle rotation is carried out to the nesa coating after lighting liquid crystal module, checks moire fringes, nothing
Anglec of rotation when moire fringes are produced is
3. nesa coating according to claim 2, it is characterised in that the line width of same row network is S, grid
Structure is L, L=S with the adjacent column width of a line.
4. nesa coating according to claim 2, it is characterised in that the line width of network is w, network is same
Capable adjacent column width is L, and the respective column of network adjacent lines offsets one from another length for d, meets 2w<d<L.
5. nesa coating according to claim 4, it is characterised in that
6. a kind of capacitance touching control sensor, the touch sensing includes emission layer and receiving layer, it is characterised in that the transmitting
At least one layer and the receiving layer are including the nesa coating any one of claim 1-5.
7. capacitance touching control sensor according to claim 6, it is characterised in that the emission layer and the receiving layer are distinguished
On the base material of two-layer independence, or positioned at the both sides of same base material.
8. capacitance touching control sensor according to claim 6, it is characterised in that the nesa coating is comprising multiple conductive
Passage and multiple non-conductive passages, the multiple conductive channel are staggered with the multiple non-conductive passage.
9. a kind of touch control display apparatus, it is characterised in that including the nesa coating any one of claim 1-5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621134332.XU CN206209683U (en) | 2016-10-19 | 2016-10-19 | A kind of nesa coating and capacitance touching control sensor and touch control display apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621134332.XU CN206209683U (en) | 2016-10-19 | 2016-10-19 | A kind of nesa coating and capacitance touching control sensor and touch control display apparatus |
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| Publication Number | Publication Date |
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| CN206209683U true CN206209683U (en) | 2017-05-31 |
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| CN201621134332.XU Active CN206209683U (en) | 2016-10-19 | 2016-10-19 | A kind of nesa coating and capacitance touching control sensor and touch control display apparatus |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106371687A (en) * | 2016-10-19 | 2017-02-01 | 苏州维业达触控科技有限公司 | Transparent conducting film, capacitive touch control sensor and touch control display device |
| CN114063357A (en) * | 2020-08-03 | 2022-02-18 | 深超光电（深圳）有限公司 | Thin film transistor substrate and liquid crystal display panel |
-
2016
- 2016-10-19 CN CN201621134332.XU patent/CN206209683U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106371687A (en) * | 2016-10-19 | 2017-02-01 | 苏州维业达触控科技有限公司 | Transparent conducting film, capacitive touch control sensor and touch control display device |
| WO2018072579A1 (en) * | 2016-10-19 | 2018-04-26 | 苏州维业达触控科技有限公司 | Transparent conductive film, capacitive touch control sensor and touch control display device |
| CN114063357A (en) * | 2020-08-03 | 2022-02-18 | 深超光电（深圳）有限公司 | Thin film transistor substrate and liquid crystal display panel |
| CN114063357B (en) * | 2020-08-03 | 2023-09-12 | 深超光电（深圳）有限公司 | Thin film transistor substrate and liquid crystal display panel |
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Address after: 215125 No. 68, Xinchang Road, Suzhou Industrial Park, Jiangsu Province Patentee after: Suzhou Weiyeda Technology Co.,Ltd. Patentee after: SOOCHOW University Address before: 215125 No. 68, Xinchang Road, Suzhou Industrial Park, Jiangsu Province Patentee before: IVTOUCH Co.,Ltd. Patentee before: SOOCHOW University |