CN206181528U - Laminar flow plasma system's controlling means - Google Patents
Laminar flow plasma system's controlling means Download PDFInfo
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- CN206181528U CN206181528U CN201621090015.2U CN201621090015U CN206181528U CN 206181528 U CN206181528 U CN 206181528U CN 201621090015 U CN201621090015 U CN 201621090015U CN 206181528 U CN206181528 U CN 206181528U
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- laminar flow
- plasma
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- plasma system
- modulator
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Abstract
The utility model provides a laminar flow plasma system's controlling means which characterized in that: including plasma generator and the micro -control device of setting in plasma generator, the micro -control device includes collector, processing apparatus and modulator, plasma generator is connected with the collector, and the collector is connected with processing apparatus, and processing apparatus is connected with the modulator, processing apparatus includes analysis appearance and detector, and the analysis appearance is connected with the detector. In laminar flow plasma system, through the setting of micro -control device, the corruption condition, the anodal condition of discharging of negative pole in the real time monitoring laminar flow plasma system to suitably control cooling device and the regulating action of air feeder to laminar flow plasma system impel plasma generator to launch electric arc plasma shu wending, and then provide a balance, stable environment to process flow.
Description
Technical field
This utility model is related to laminar flow plasma system, specifically, is related to a kind of control device of laminar flow plasma system,
Belong to plasma technology field.
Background technology
Hot plasma has the excellent specific properties such as high temperature, high enthalpy, high-energy-density, is widely used in nano material conjunction
Into numerous areas such as the modified, hazardous waste disposals in, surface.This beam-plasma can produce stable, controllable thermal source, temperature
Can adjust between 15000 degrees Celsius to 200 degrees Celsius.But due to laminar flow characteristics of plasma so that plasma generator equipment
Have high demands, such as：Cathode construction is perishable；Anode construction easily leaks electricity；And the temperature in chiller plasma generator equipment
Degree regulation and control；Feeder Input gas medium, protects negative electrode, produces arc plasma, and these are all close with laminar flow plasma system
Cut is closed.
Utility model content
This utility model aims to solve the problem that prior art problem, and proposes a kind of control device of laminar flow plasma system.
By the setting of micro control unit, realize that laminar flow plasma system is integrated, controllable, and then one is provided to technological process
Balance, stable environment.
For achieving the above object, following technical scheme is proposed：
A kind of control device of laminar flow plasma system, including plasma generator and be arranged in plasma generator
Micro control unit, the micro control unit include harvester, processing meanss and modulator, the plasma generator with adopt
Storage connects, and harvester is connected with processing meanss, and processing meanss are connected with modulator；Modulator connects again with plasma generator
Connect；The processing meanss include analyser and detector, and analyser is connected with detector.
Preferably, the plasma generator include power supply, cathode construction, anode construction, arc channel, chiller and
Feeder, cathode construction is arranged on base, and base is provided with chiller and feeder；Anode construction and cathode construction it
Between be provided between insulating barrier, and anode construction and cathode construction and form arc channel, lead to base for arc channel one end, and electric arc leads to
The road other end leads to nozzle；The power supply, cathode construction, anode construction, arc channel, chiller and feeder respectively with
Harvester connects.
Preferably, the micro control unit is PLC control system.
Preferably, the modulator includes display screen, operating board and signal lighties.
This utility model design principle is：
In laminar flow plasma system, plasma state is the 4th state of material, almost 99% material in universe（Do not include
Still unacknowledged dark matter）All in plasma state.Plasma jet as general fluid, with two kinds of flow regimes：
Laminar flow and turbulent flow.To a certain given fluid, when its flow velocity is less than a particular value, fluid makees well-regulated stratiform or a fluid stream shape fortune
Dynamic, fluid particle does not have transverse movement, advances without interfering with each other between particle, and this liquid form is laminar flow；When rate of flow of fluid it is big
When the value, the well-regulated motion of fluid is destroyed, and particle also has additional transverse movement in addition to main lengthwise movement,
Fluid particle staggeredly confusedly advances, and this liquid form is turbulent flow.In laminar flow plasma generator, in argon, nitrogen, helium
Under the protection of one kind of gas, hydrogen or ammonia or arbitrarily two or more mixture gas mediums, laminar flow arc plasma jet
It is the high temperature and high speed line sprayed from plasma generator nozzle Jing after electric arc heated, laminar flow plasma torch is untransferable arc
Plasma torch.
In laminar flow plasma system, power supply, cathode construction, anode construction, arc channel, chiller and feeder
It is connected with harvester respectively；The information of harvester collection institute connecting element, and pass to processing meanss；Processing meanss receive signal
Afterwards, analyser analysis, while analysis result is fed back to into detector, testing result is passed to modulator by detector again, regulation and control
Device plasma generator makes corresponding debugging, i.e., respectively to power supply, cathode construction, anode construction, arc channel, cooling dress
Put and make appropriate adjustment with feeder, to adapt to the working condition of laminar flow plasma system.Micro control unit is PLC controls
System processed, energy intelligence, the DC source that completes of system match plasma discharge, improve stability；The temperature change of chiller；
Density, flow velocity of gas medium etc.；The distance of anode and cathode in electrode, the protection of negative electrode, anode puts a situation；Laminar flow plasma
The temperature and jet of body；The diffusion of electric arc；The corrosion condition of nozzle, the size of bore, and the compression situation to electric arc.
Using the technical program, that what is brought has the beneficial effect that：
It is cloudy in monitor in real time laminar flow plasma system by the setting of micro control unit in laminar flow plasma system
The corrosion condition of pole, the discharge scenario of anode, and the tune of suitable control chiller and feeder to laminar flow plasma system
Section act on, promote plasma generator launch arc plasma Shu Wending, and then to technological process provide one balance, it is stable
Environment.Equally, the setting of control device, using several functions such as PLC technology integrated technique, safeguard protection, human engineerings, realizes
Expansible, high safety Based Intelligent Control.
Description of the drawings
Fig. 1 this utility model structural representations
In figure：1st, plasma generator, 101, cathode construction, 102, anode construction, 103, arc channel, 104, cooling dress
Put, 105, feeder, 106, base, 107, nozzle, 2, micro control unit, 3, harvester, 4, processing meanss, 401, analysis
Instrument, 402, detector, 5, modulator, 501, display screen, 502, operating board, 503, signal lighties.
Specific embodiment
Below by being clearly and completely described to the technical scheme in this utility model embodiment, it is clear that described
Embodiment be only a part of embodiment of the present utility model, rather than the embodiment of whole.Based on the reality in this utility model
Example is applied, all other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made all belongs to
In the scope of this utility model protection.
Embodiment 1
A kind of control device of laminar flow plasma system, including plasma generator 1 and be arranged in plasma generator 1
Micro control unit 2, the micro control unit 2 include harvester 3, processing meanss 4 and modulator 5, the plasma send out
Raw device 1 is connected with harvester 3, and harvester 3 is connected with processing meanss 4, and processing meanss 4 are connected with modulator 5；The processing meanss
4 include analyser 401 and detector 402, and analyser 401 is connected with detector 402.
Embodiment 2
A kind of control device of laminar flow plasma system, including plasma generator 1 and be arranged in plasma generator 1
Micro control unit 2, the micro control unit 2 include harvester 3, processing meanss 4 and modulator 5, the plasma send out
Raw device 1 is connected with harvester 3, and harvester 3 is connected with processing meanss 4, and processing meanss 4 are connected with modulator 5；The processing meanss
4 include analyser 401 and detector 402, and analyser 401 is connected with detector 402.
The generator includes cathode construction 101, anode construction 102, arc channel 103, chiller 104 and supply dress
105 are put, cathode construction 101 is arranged on base 106, base 106 is provided with chiller 104 and feeder 105；Anode construction
Formation arc channel 103 between insulating barrier, and anode construction 102 and cathode construction 101 is provided between 102 and cathode construction 101,
Lead to the one end of arc channel 103 base 106, and the other end of arc channel 103 leads to nozzle 107；The cathode construction 101, anode
Structure 102, arc channel 103, chiller 104 and feeder 105 are connected respectively with harvester 3.
Embodiment 3
A kind of control device of laminar flow plasma system, including plasma generator 1 and be arranged in plasma generator 1
Micro control unit 2, the micro control unit 2 include harvester 3, processing meanss 4 and modulator 5, the plasma send out
Raw device 1 is connected with harvester 3, and harvester 3 is connected with processing meanss 4, and processing meanss 4 are connected with modulator 5；The processing meanss
4 include analyser 401 and detector 402, and analyser 401 is connected with detector 402.
The generator includes cathode construction 101, anode construction 102, arc channel 103, chiller 104 and supply dress
105 are put, cathode construction 101 is arranged on base 106, base 106 is provided with chiller 104 and feeder 105；Anode construction
Formation arc channel 103 between insulating barrier, and anode construction 102 and cathode construction 101 is provided between 102 and cathode construction 101,
Lead to the one end of arc channel 103 base 106, and the other end of arc channel 103 leads to nozzle 107；The cathode construction 101, anode
Structure 102, arc channel 103, chiller 104 and feeder 105 are connected respectively with harvester 3.
The micro control unit 2 is PLC control system.
The modulator 5 includes display screen 501, operating board 502 and signal lighties 503.
Embodiment 4
In laminar flow plasma system, plasma state is the 4th state of material, almost 99% material in universe（Do not include
Still unacknowledged dark matter）All in plasma state.Plasma jet as general fluid, with two kinds of flow regimes：
Laminar flow and turbulent flow.To a certain given fluid, when its flow velocity is less than a particular value, fluid makees well-regulated stratiform or a fluid stream shape fortune
Dynamic, fluid particle does not have transverse movement, advances without interfering with each other between particle, and this liquid form is laminar flow；When rate of flow of fluid it is big
When the value, the well-regulated motion of fluid is destroyed, and particle also has additional transverse movement in addition to main lengthwise movement,
Fluid particle staggeredly confusedly advances, and this liquid form is turbulent flow.In laminar flow plasma generator 1, argon, nitrogen,
Under the protection of one kind of helium, hydrogen or ammonia or arbitrarily two or more mixture gas mediums, laminar flow arc-plasma is penetrated
Stream is from the high temperature and high speed line of the ejection of plasma generator nozzle 107, laminar flow plasma torch right and wrong Jing after electric arc heated
Transferred-arc plasma torch.
As shown in Figure 1：In laminar flow plasma system, power supply, cathode construction 101, anode construction 102, arc channel
103rd, chiller 104 and feeder 105 are connected respectively with harvester 3；The information of the collection of harvester 3 institute connecting element, and
Pass to processing meanss 4；Processing meanss 4 receive after signal, and analyser 401 is analyzed, while analysis result is fed back to into detector
402, testing result is passed to modulator 5 by detector 402 again, and the plasma generator 1 of modulator 5 makes corresponding debugging,
Power supply, cathode construction 101, anode construction 102, arc channel 103, chiller 104 and feeder 105 made respectively
Appropriate adjustment, to adapt to the working condition of laminar flow plasma system.Micro control unit 2 be PLC control system, can intelligence,
The DC source that completes of system matches plasma discharge, improves stability；The temperature change of chiller 104；Gas medium
Density, flow velocity etc.；The distance of anode and cathode in electrode, the protection of negative electrode, anode puts a situation；The temperature of laminar flow plasma and
Jet；The diffusion of electric arc；The corrosion condition of nozzle 107, the size of bore, and the compression situation to electric arc.
Claims (4)
1. a kind of control device of laminar flow plasma system, it is characterised in that：Including plasma generator（1）Be arranged on etc. from
Electronic generator（1）Interior micro control unit（2）, the micro control unit（2）Including harvester（3）, processing meanss（4）With
Modulator（5）, the plasma generator（1）With harvester（3）Connection, harvester（3）With processing meanss（4）Connection, is processed
Device（4）With modulator（5）Connection；The processing meanss（4）Including analyser（401）And detector（402）, analyser
（401）With detector（402）Connection.
2. a kind of control device of laminar flow plasma system according to claim 1, it is characterised in that：The plasma occurs
Device（1）Including cathode construction（101）, anode construction（102）, arc channel（103）, chiller（104）And feeder
（105）, cathode construction（101）It is arranged on base（106）On, base（106）It is provided with chiller（104）And feeder
（105）；Anode construction（102）With cathode construction（101）Between be provided with insulating barrier, and anode construction（102）With cathode construction
（101）Between form arc channel（103）, arc channel（103）Base is led in one end（106）, arc channel（103）The other end
Lead to nozzle（107）；The cathode construction（101）, anode construction（102）, arc channel（103）, chiller（104）And confession
Device of air（105）Respectively with harvester（3）Connection.
3. a kind of control device of laminar flow plasma system according to claim 1, it is characterised in that：The miniature control dress
Put（2）For PLC control system.
4. a kind of control device of laminar flow plasma system according to claim 1, it is characterised in that：The modulator（5）
Including display screen（501）, operating board（502）And signal lighties（503）.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621090015.2U CN206181528U (en) | 2016-09-29 | 2016-09-29 | Laminar flow plasma system's controlling means |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621090015.2U CN206181528U (en) | 2016-09-29 | 2016-09-29 | Laminar flow plasma system's controlling means |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206181528U true CN206181528U (en) | 2017-05-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201621090015.2U Active CN206181528U (en) | 2016-09-29 | 2016-09-29 | Laminar flow plasma system's controlling means |
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| CN (1) | CN206181528U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113573454A (en) * | 2021-08-05 | 2021-10-29 | 富时精工(南京)有限公司 | Plasma jet device with variable magnetic field constraint and method thereof |
-
2016
- 2016-09-29 CN CN201621090015.2U patent/CN206181528U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113573454A (en) * | 2021-08-05 | 2021-10-29 | 富时精工(南京)有限公司 | Plasma jet device with variable magnetic field constraint and method thereof |
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