CN206178340U - A device for retrieving photosensitive resist in coating machine pipeline - Google Patents
A device for retrieving photosensitive resist in coating machine pipeline Download PDFInfo
- Publication number
- CN206178340U CN206178340U CN201620847928.8U CN201620847928U CN206178340U CN 206178340 U CN206178340 U CN 206178340U CN 201620847928 U CN201620847928 U CN 201620847928U CN 206178340 U CN206178340 U CN 206178340U
- Authority
- CN
- China
- Prior art keywords
- photoresist
- pressure pump
- recovery tube
- coating machine
- photosensitive resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 22
- 238000000576 coating method Methods 0.000 title claims abstract description 22
- 238000011084 recovery Methods 0.000 claims abstract description 20
- 239000012535 impurity Substances 0.000 claims abstract description 13
- 238000010790 dilution Methods 0.000 claims abstract description 8
- 239000012895 dilution Substances 0.000 claims abstract description 8
- 238000007789 sealing Methods 0.000 claims abstract 5
- 229920002120 photoresistant polymer Polymers 0.000 claims description 34
- 239000003292 glue Substances 0.000 claims description 9
- 239000002699 waste material Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000004026 adhesive bonding Methods 0.000 abstract 2
- 239000004429 Calibre Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 10
- 239000004033 plastic Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
The utility model discloses a device for retrieving photosensitive resist in coating machine pipeline, including hose, high -pressure pump, impurity removal treatment device and delivery pump, be provided with the check valve on the hose, and pass through first recovery tube sealing connection between check valve and the high -pressure pump, through heavy -calibre recovery tube sealing connection between high -pressure pump and the dilution processing apparatus, and dilute second recovery tube sealing connection between processing apparatus and the edulcoration processing apparatus, the right side of impurity removal treatment device is provided with the delivery pump, and installs the control valve on the processing apparatus, delivery pump and gluing between the bucket through third recovery tube sealing connection, and the bottom of gluing the bucket is provided with the filter screen, the bottom of filter screen is provided with the ooff valve. The utility model discloses structural design is simple, uses convenient operation, and it can filter the photosensitive resist of retrieving to provide filter equipment, through the cooperation of each partial device to realize making the recovery of used photosensitive resist, reduce the waste of photosensitive resist, reduction in production cost.
Description
Technical field
The utility model is related to coating machine equipment technical field, specially a kind of to be used to reclaim photoresist in coating machine pipeline
Device.
Background technology
At present, coating machine is key equipment of the TFT liquid crystal display in coating process, for inciting somebody to action
On the glass substrate of liquid crystal display, existing coating machine includes moving member, nozzle and pump to coating agent, and pump is into nozzle
Smears is pumped into, moving member can drive nozzle to move, with the movement of nozzle, nozzle can be by the coating agent in substrate
On.In the photoetching process for making color membrane substrates and array base palte, photoresist is mainly used plus diluent so as to by photoetching
Glue is diluted to after finite concentration, then with rotary coating mode or slot coated mode, the photoresist after dilution is spread evenly across
On substrate and in order that photoresist can be coated equably on substrate, rotary coating mode first would generally be coated with the substrate
A large amount of photoresists, then rotary plate enables photoresist to be uniformly coated on whole substrate, but light in this kind of coating method
The utilization rate of photoresist is relatively low, most photoresist all during rotary coating, in being discharged into waste liquid tank；And slot coated
In mode, it is will to be coated with the substrate that completes on workbench to take away, then places new substrate to be coated, and in order to ensure what is be coated with
Uniformly, waiting in next substrate time in place, to keep the continuity of nozzle plastic emitting, i.e. stand-by period inner nozzle also always
In plastic emitting, the plastic emitting of the time period is also discharged in waste liquid tank.As can be seen here, the waste of photoresist is than more serious, and in a large number
The photoresist of discharge can be to environment, for large-scale production line, and photoresist is increased by substantial amounts of waste
Production cost.
The content of the invention
The purpose of this utility model is to provide a kind of device for reclaiming photoresist in coating machine pipeline, with solution
The problem proposed in background technology is stated, is had an advantageous effect in that；Filter can filter the photoresist for reclaiming, and be allowed to
Meet use requirement, by the cooperation of each several part device, so as to realize the recovery of used photoresist, reduce the wave of photoresist
Take, reduce production cost.
For achieving the above object, the utility model provides following technical scheme：One kind is used to reclaim light in coating machine pipeline
The device of photoresist, including flexible pipe, high-pressure pump, removal of impurities processing meanss and delivery pump, are provided with check valve on the flexible pipe, and unidirectionally
It is tightly connected by the first recovery tube between valve and high-pressure pump, is returned by heavy caliber between the high-pressure pump and dilution processing meanss
Closed tube is tightly connected, and the second recovery tube is tightly connected between dilution processing meanss and removal of impurities processing meanss, and the removal of impurities is processed
It is provided with the right side of device on delivery pump, and processing meanss and control valve is installed, the 3rd is passed through between the delivery pump and glue bucket
Recovery tube is tightly connected, and the bottom of glue bucket is provided with screen pack, and the bottom of the screen pack is provided with switch valve.
Preferably, it is provided with connector on the left of the flexible pipe.
Preferably, the bottom of the high-pressure pump is provided between base, and high-pressure pump and base and is bolted to connection.
Preferably, it is provided with sealing-plug between the screen pack and switch valve.
Compared with prior art, the beneficial effects of the utility model are：The apparatus structure design is simple, using operation side
Just, there is provided filter can filter the photoresist for reclaiming, and be allowed to meet use requirement, by the cooperation of each several part device,
So as to realize the recovery of used photoresist, reduce the waste of photoresist, reduce production cost, reached and reduced photoresist
The purpose of the utilization rate of photoresist is wasted and improved, the manufacturing cost of enterprise is greatly saved, strong enhances the competing of enterprise
Power is striven, and has reached the target of resource recycling.
Description of the drawings
Fig. 1 is structural representation of the present utility model.
In figure：1- connectors；2- flexible pipes；3- check valves；The recovery tubes of 4- first；5- high-pressure pumps；6- bases；7- heavy calibers are returned
Closed tube；8- dilutes processing meanss；The recovery tubes of 9- second；10- removal of impurities processing meanss；11- controls valve；12- delivery pumps；13- the 3rd
Recovery tube；14- glue buckets；15- screen packs；16- sealing-plugs；17- switch valves.
Specific embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is entered
Row is clearly and completely described, it is clear that described embodiment is only a part of embodiment of the utility model, rather than all
Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are not making creative work premise
Lower obtained every other embodiment, belongs to the scope of the utility model protection.
Refer to Fig. 1, a kind of embodiment that the utility model is provided：It is a kind of for reclaiming photoresist in coating machine pipeline
Device, including flexible pipe 2, high-pressure pump 5, removal of impurities processing meanss 10 and delivery pump 12, are provided with check valve 3, and check valve on flexible pipe 2
It is tightly connected by the first recovery tube 4 between 3 and high-pressure pump 5, is returned by heavy caliber between high-pressure pump 5 and dilution processing meanss 8
Closed tube 7 is tightly connected, and second recovery tube 9 is tightly connected between dilution processing meanss 8 and removal of impurities processing meanss 10, and removal of impurities is processed
The right side of device 10 is provided with delivery pump 12, and processing meanss 10 and is provided with control valve 11, between delivery pump 12 and glue bucket 14
It is tightly connected by the 3rd recovery tube 13, and the bottom of glue bucket 14 is provided with screen pack 15, the bottom of screen pack 15 is provided with out
Valve 17 is closed, the left side of flexible pipe 2 is provided with connector 1, and the bottom of high-pressure pump 5 is provided between base 6, and high-pressure pump 5 and base 6
It is bolted to connection, sealing-plug 16 is provided between screen pack 15 and switch valve 17.
Operation principle：When using, when coating machine will carry out periodic maintenance, will open on photoresist draw-out device, with this
The connector 1 of device is tightly connected, and opens high-pressure pump 5, then elects photoresist draw-out device as reverse extraction pattern, will be coated with
Photoresist in machine pipeline is extracted to dilution processing meanss 8 and removal of impurities processing meanss 10, after coating machine is safeguarded to be terminated, is utilized
Photoresist filling coating machine pipeline in photoresist returnable, is adjusted to photoresist draw-out device again positive and extracts mould
Formula, now photoresist enter in glue bucket 14 and start further to filter.
It is obvious to a person skilled in the art that the utility model is not limited to the details of above-mentioned one exemplary embodiment, and
And in the case of without departing substantially from spirit or essential attributes of the present utility model, can in other specific forms realize that this practicality is new
Type.Therefore, no matter from the point of view of which point, embodiment all should be regarded as exemplary, and is nonrestrictive, this practicality is new
The scope of type is by claims rather than described above is limited, it is intended that the equivalency fallen in claim is contained
All changes in justice and scope are included in the utility model.Any reference in claim should not be considered as limit
The involved claim of system.
Claims (4)
1. a kind of device for reclaiming photoresist in coating machine pipeline, including flexible pipe (2), high-pressure pump (5), removal of impurities processing meanss
And delivery pump (12) (10), it is characterised in that：Check valve (3), and check valve (3) and high-pressure pump are provided with the flexible pipe (2)
(5) it is tightly connected by the first recovery tube (4) between, heavy caliber is passed through between the high-pressure pump (5) and dilution processing meanss (8)
Recovery tube (7) is tightly connected, and dilutes the second recovery tube (9) sealing company between processing meanss (8) and removal of impurities processing meanss (10)
Connect, be provided with the right side of the removal of impurities processing meanss (10) on delivery pump (12), and processing meanss (10) and control valve is installed
(11), it is tightly connected by the 3rd recovery tube (13) between the delivery pump (12) and glue bucket (14), and the bottom of glue bucket (14)
Screen pack (15) is provided with, the bottom of the screen pack (15) is provided with switch valve (17).
2. a kind of device for reclaiming photoresist in coating machine pipeline according to claim 1, it is characterised in that：It is described
Connector (1) is provided with the left of flexible pipe (2).
3. a kind of device for reclaiming photoresist in coating machine pipeline according to claim 1, it is characterised in that：It is described
The bottom of high-pressure pump (5) is provided between base (6), and high-pressure pump (5) and base (6) and is bolted to connection.
4. a kind of device for reclaiming photoresist in coating machine pipeline according to claim 1, it is characterised in that：It is described
Sealing-plug (16) is provided between screen pack (15) and switch valve (17).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620847928.8U CN206178340U (en) | 2016-08-04 | 2016-08-04 | A device for retrieving photosensitive resist in coating machine pipeline |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620847928.8U CN206178340U (en) | 2016-08-04 | 2016-08-04 | A device for retrieving photosensitive resist in coating machine pipeline |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206178340U true CN206178340U (en) | 2017-05-17 |
Family
ID=58674513
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620847928.8U Expired - Fee Related CN206178340U (en) | 2016-08-04 | 2016-08-04 | A device for retrieving photosensitive resist in coating machine pipeline |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206178340U (en) |
-
2016
- 2016-08-04 CN CN201620847928.8U patent/CN206178340U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170517 |