CN206089542U - Silica gel protective film - Google Patents

Silica gel protective film Download PDF

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Publication number
CN206089542U
CN206089542U CN201620988260.9U CN201620988260U CN206089542U CN 206089542 U CN206089542 U CN 206089542U CN 201620988260 U CN201620988260 U CN 201620988260U CN 206089542 U CN206089542 U CN 206089542U
Authority
CN
China
Prior art keywords
layer
substrate layer
silica gel
adhesive
protected film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201620988260.9U
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Chinese (zh)
Inventor
杨龙庚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KUNSHAN QIAO WEI NEW MATERIAL Co Ltd
Original Assignee
KUNSHAN QIAO WEI NEW MATERIAL Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KUNSHAN QIAO WEI NEW MATERIAL Co Ltd filed Critical KUNSHAN QIAO WEI NEW MATERIAL Co Ltd
Priority to CN201620988260.9U priority Critical patent/CN206089542U/en
Application granted granted Critical
Publication of CN206089542U publication Critical patent/CN206089542U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model discloses a silica gel protective film, including last substrate layer, lower substrate layer, its characterized in that, going up the substrate layer outside and being provided with the PI layer, the one side on PI layer is provided with first antistatic backing, the opposite side on PI layer is provided with first gluing agent layer, first gluing agent level is between last substrate layer and PI layer, go up the substrate layer and be provided with second gluing agent layer down between the substrate layer, it is provided with the second antistatic backing to go up between substrate layer and second gluing agent layer, the utility model discloses silica gel protective film prevents static, the alkali -resistant of antiaciding, and mechanical properties is good.

Description

A kind of silica gel protected film
Technical field
The utility model is related to thin film technique field, more particularly to a kind of silica gel protected film.
Background technology
Silica gel protected film is mainly used in the screen surface of electronic product, used as the screen protecting film of electronic product.Tradition Silica gel protected film includes upper substrate layer, lower substrate layer and the adhesive layer positioned at upper substrate layer and lower base material interlayer.Diaphragm A large amount of electrostatic charges are peeled off and accumulate during fitting, the accumulation of a large amount of electrostatic charges can be produced during the use of diaphragm to electronics Product produce fatefulue destruction risk, and the generation of a large amount of electrostatic charges can also adsorb dust particle, cause electronic product production process In it is bad, and fitting with electronic product aeration of easily produce of diaphragm is attractive in appearance.
Chinese utility model patent specification CN 204820501U (day for announcing 2015.12.02) discloses a kind of " anti-quiet The silica gel protected film of electricity ", including PET sheet layer, release layer, the side of the PET sheet layer arranges antistatic backing, and opposite side is arranged Layer of silica gel, the release layer is arranged on layer of silica gel outside.The surface impedance of the silica gel protected film antistatic backing is 104-11Ω, tool There is outstanding antistatic property, but with the prolongation of use time, antistatic backing is subject to a certain degree of abrasion, static electricity resistance Can also decrease.
Utility model content
In order to solve the problems of the prior art, the purpose of this utility model is to provide a kind of silica gel protected film.
To achieve these goals, the utility model is adopted the following technical scheme that:A kind of silica gel protected film, including upper base material Layer, lower substrate layer, it is characterised in that the upper substrate layer outside is provided with PI layers, and the side of PI layers is provided with the first antistatic Layer, the opposite side of the PI layers is provided with the first adhesive layer, and first adhesive layer is located between upper substrate layer and PI layers, The upper substrate layer is provided with the second adhesive layer with lower base material interlayer, is provided between the upper substrate layer and the second adhesive layer Second antistatic backing.
Preferably, the upper substrate layer and lower substrate layer are pet layer.
Preferably, the adhesive that first adhesive layer is adopted is for polyamide adhesive.
Preferably, the adhesive that second adhesive layer is adopted is for silica gel adhesive.
Preferably, the thickness of the upper substrate layer is 20-50 μm.
Preferably, the thickness of the PI layers is 80-120 μm.
Preferably, the thickness of first antistatic backing is 1-2 μm.
Preferably, the thickness of second antistatic backing is 5-10 μm.
Preferably, the thickness of the lower substrate layer is 5-50 μm.
Compared with prior art, the beneficial effect that the utility model is realized:The silica gel protected film of the utility model is from top to bottom It is disposed with the first anti-static coating, PI layers, the first adhesive layer, upper substrate layer, the second anti-static coating, the second adhesive Layer and lower substrate layer, the first anti-static coating and the second anti-static coating carry out duplicate protection to silica gel protected film, it is to avoid growing During phase use there is effect of attrition antistatic performance in the first anti-static coating;The setting of PI layers strengthens the anti-of silica gel protected film Sour alkali resistance, extends the service life of silica gel protected film;PI layers are provided with the first adhesive layer with upper base material interlayer, and second prevents Electrostatic coating is provided with the second adhesive layer with lower base material interlayer, and the setting of the first adhesive layer and the second adhesive layer improves The mechanical performance of silica gel protected film.
Description of the drawings
The utility model is further described below in conjunction with the drawings and specific embodiments:
Fig. 1 is the structural representation of the silica gel protected film of the utility model.
Wherein:Upper substrate layer 1, lower substrate layer 2, PI layers 3, the first antistatic backing 4, the first adhesive layer 5, the second adhesive Layer 6, the second antistatic backing 7.
Specific embodiment
A kind of silica gel protected film, including upper substrate layer 1, lower substrate layer 2, the outside of upper substrate layer 1 is provided with PI layers 3, PI layers 3 Side be provided with the first antistatic backing 4, the opposite side of PI layers 3 is provided with the first adhesive layer 5, and the first adhesive layer is located at upper Between substrate layer 1 and PI layers 3, the second adhesive layer 6, upper substrate layer 1 and second are provided between upper substrate layer 1 and lower substrate layer 2 The second antistatic backing 7 is provided between adhesive layer 6.
Upper substrate layer 1 and lower substrate layer 2 are pet layer, and the thickness of upper substrate layer 1 is 20-50 μm, the thickness of lower substrate layer 2 Spend for 5-50 μm.
The thickness of PI layers 3 is 80-120 μm of I, and the setting of PI layers 3 strengthens the antiacid alkali resistance of silica gel protected film, extends silicon The service life of glue diaphragm.
The thickness of the first antistatic backing 4 is 1-2 μm, and the thickness of the second antistatic backing 7 is 5-10 μm, the first antistatic backing 4 Duplicate protection is carried out to silica gel protected film with the second antistatic backing 7, it is to avoid the first antistatic backing 4 occurs during Long-Time Service Effect of attrition antistatic performance.
, for polyamide adhesive, the adhesive that the second adhesive layer 6 is adopted is for silicon for the adhesive that first adhesive layer 5 is adopted The setting of glue adhesive, the first adhesive layer 5 and the second adhesive layer 6 improves the mechanical performance of silica gel protected film.
Above-mentioned specific embodiment is exemplary, is to preferably make skilled artisans appreciate that originally Patent, it is impossible to be not understood as including this patent the restriction of scope;As long as according to disclosed in this patent spirit made appoint How with change or modification, the scope that this patent includes is each fallen within.

Claims (9)

1. a kind of silica gel protected film, including upper substrate layer(1), lower substrate layer(2), it is characterised in that the upper substrate layer(1)Outward Side is provided with PI layers(3), PI layers(3)Side be provided with the first antistatic backing(4), the PI layers(3)Opposite side be provided with First adhesive layer(5), first adhesive layer(5)Positioned at upper substrate layer(1)With PI layers(3)Between, the upper substrate layer (1)With lower substrate layer(2)Between be provided with the second adhesive layer(6), the upper substrate layer(1)With the second adhesive layer(6)Between set It is equipped with the second antistatic backing(7).
2. silica gel protected film as claimed in claim 1, it is characterised in that the upper substrate layer(1)With lower substrate layer(2)It is Pet layer.
3. silica gel protected film as claimed in claim 1, it is characterised in that first adhesive layer(5)Using adhesive For polyamide adhesive.
4. silica gel protected film as claimed in claim 1, it is characterised in that second adhesive layer(6)Using adhesive For silica gel adhesive.
5. silica gel protected film as claimed in claim 1, it is characterised in that the upper substrate layer(1)Thickness be 20-50 μm.
6. silica gel protected film as claimed in claim 1, it is characterised in that the PI layers(3)Thickness be 80-120 μm.
7. silica gel protected film as claimed in claim 1, it is characterised in that first antistatic backing(4)Thickness be 1-2 μ m。
8. silica gel protected film as claimed in claim 1, it is characterised in that second antistatic backing(7)Thickness be 5-10 μ m。
9. silica gel protected film as claimed in claim 1, it is characterised in that the lower substrate layer(2)Thickness be 5-50 μm.
CN201620988260.9U 2016-08-31 2016-08-31 Silica gel protective film Expired - Fee Related CN206089542U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620988260.9U CN206089542U (en) 2016-08-31 2016-08-31 Silica gel protective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620988260.9U CN206089542U (en) 2016-08-31 2016-08-31 Silica gel protective film

Publications (1)

Publication Number Publication Date
CN206089542U true CN206089542U (en) 2017-04-12

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201620988260.9U Expired - Fee Related CN206089542U (en) 2016-08-31 2016-08-31 Silica gel protective film

Country Status (1)

Country Link
CN (1) CN206089542U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115404017A (en) * 2022-08-12 2022-11-29 中山市皇冠胶粘制品有限公司 Flexible high-temperature-resistant four-resistance silica gel protective film and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115404017A (en) * 2022-08-12 2022-11-29 中山市皇冠胶粘制品有限公司 Flexible high-temperature-resistant four-resistance silica gel protective film and preparation method thereof

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CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170412

Termination date: 20200831