CN206069611U - A kind of water process low-temperature plasma device - Google Patents
A kind of water process low-temperature plasma device Download PDFInfo
- Publication number
- CN206069611U CN206069611U CN201621060731.6U CN201621060731U CN206069611U CN 206069611 U CN206069611 U CN 206069611U CN 201621060731 U CN201621060731 U CN 201621060731U CN 206069611 U CN206069611 U CN 206069611U
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- water
- tank
- stirring pool
- inlet
- plate
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Abstract
The utility model discloses a kind of water process low-temperature plasma device, including sedimentation tank, stirring pool, filtering ponds and reaction tank, the sedimentation tank connects stirring pool by water pipe I, is provided with water intaking valve on water pipe I, motor, motor output end connection shaft are provided with the left of the stirring pool top.Compared with prior art, start motor in this utility model, shaft drives stirring vane to be stirred, separate dregs, contribute to later process filtration, sewage stream enters inlet water tank, after flowing into the top of Sptting plate, air is through plasma generator process, form low temperature atomsphere plasma, then plasma enters inlet box, in the lower section of Sptting plate, contacted on Sptting plate with sewage by slit, which increase the contact area of sewage and low-temperature plasma, macromolecule contaminant in sewage is changed into the safe thing of simple small molecule by low-temperature plasma, screen plate is damaged or filters clean rear replaceable screen plate, after ensureing to filter, water source is clean.
Description
Technical field
This utility model is related to a kind of water treatment facilities, specifically a kind of water process low-temperature plasma device.
Background technology
Water process is exactly, by physics, chemistry, biological means, to go in eliminating water some unwanted to have to producing, living
The process of evil material.Impurities in water includes thick material, float, colloid and the solute carried under one's arms mostly, and thick material is such as
Gravel and bulk dirt in rubbish, waste water etc. are often formed under solid precipitation in water process, but solid precipitation
Thing needs manually to be cleared up, required time length, high labor intensive, high cost, and traditional method for treating water can not effectively by
In water, complicated macromolecular substances are changed into the safe thing of small molecule, generally require multiple operation and are processed, and this is resulted in water
High expensive in processing procedure.
The content of the invention
The purpose of this utility model is to provide a kind of water process low-temperature plasma device, to solve in above-mentioned background technology
The problem of proposition.
For achieving the above object, this utility model provides following technical scheme:
A kind of water process low-temperature plasma device, including sedimentation tank, stirring pool, filtering ponds and reaction tank, the sedimentation tank
Stirring pool is connected by water pipe I, water intaking valve on water pipe I, is provided with, motor, motor output on the left of the stirring pool top, is provided with
End connection shaft, shaft both sides are provided with some equally distributed stirring vanes, and stirring pool is filtered by water pipe II connections
Pond, is provided with the first water pump on water pipe II, defecator is provided with the filtering ponds, and defecator is by multiple screen plate groups
Into, some Sptting plates being arranged in parallel are provided with the reaction tank, Sptting plate inclined arrangement is provided with water on Sptting plate
The slit of flat deck, reaction tank side are provided with inlet water tank, and inlet water tank connects filtering ponds bottom by water pipe III, on water pipe III
The second water pump is provided with, above inlet water tank and Sptting plate junction, outlet is provided with, inlet water tank both sides are provided with inlet box, enter
Gas tank connects plasma generator by air inlet pipe, is provided with intake valve, below inlet box and Sptting plate junction in air inlet pipe
Gas outlet is provided with, reaction tank bottom is provided with outlet pipe, and escape pipe is provided with the top of reaction tank.
As further program of the utility model:The screen plate is flexibly connected with filtering ponds.
As further program of the utility model:First water pump is arranged on stirring pool top.
Compared with prior art, start motor in this utility model, shaft drives stirring vane to be stirred, makes dregs
Separate, contribute to later process filtration, sewage stream enters inlet water tank, after flowing into the top of Sptting plate, air occurs through plasma
Device process, forms low temperature atomsphere plasma, and then plasma enters inlet box, in the lower section of Sptting plate, by slit and dirt
Water is contacted on Sptting plate, which increases the contact area of sewage and low-temperature plasma, and low-temperature plasma will be big in sewage
Molecular contaminants are changed into the safe thing of simple small molecule, and screen plate is damaged or filters clean rear replaceable screen plate, it is ensured that
After filtration, water source is clean.
Description of the drawings
Structural representations of the Fig. 1 for water process low-temperature plasma device.
Fig. 2 is the top view of filtering ponds in water process low-temperature plasma device.
In figure:1- sedimentation tanks, 2- water intaking valves, 3- water pipe I, 4- stirring pools, 5- motors, 6- shafts, 7- stirring vanes, 8-
First water pump, 9- water pipe II, 10- filtering ponds, 11- defecators, 12- screen plates, the second water pump of 13- water pipes III, 14-, 15-
Reaction tank, 16- plasma generators, 17- outlet pipes, 18- air inlet pipe, 19- intake valves, 20- inlet boxs, 21- inlet water tanks, 22-
Outlet, 23- gas outlets, 24- Sptting plates, 25- slits, 26- escape pipes.
Specific embodiment
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out
Clearly and completely describe, it is clear that described embodiment is only this utility model a part of embodiment, rather than whole
Embodiment.Based on the embodiment in this utility model, those of ordinary skill in the art are not under the premise of creative work is made
The every other embodiment for being obtained, belongs to the scope of this utility model protection.
Fig. 1~2 are referred to, in this utility model embodiment, a kind of water process low-temperature plasma device, including sedimentation tank 1,
Stirring pool 4, filtering ponds 10 and reaction tank 15, the sedimentation tank 1 by water pipe I3 connect stirring pool 4, be provided with water pipe I3 into
Water valve 2,4 top left side of the stirring pool are provided with motor 5, and 5 outfan of motor connects shaft 6, and 6 both sides of shaft are provided with
Some equally distributed stirring vanes 7, start motor 5, and shaft 6 drives stirring vane 7 to be stirred, separates dregs, have
Help later process filtration, stirring pool 4 connects filtering ponds 10 by water pipe II9, the first water pump 8 is provided with water pipe II9, described
Defecator 11 is provided with filtering ponds 10, defecator 11 is made up of multiple screen plates 12, is provided with the reaction tank 15
Some Sptting plates 24 being arranged in parallel, 24 inclined arrangement of Sptting plate, are provided with the slit 25 of horizontal cover plate on Sptting plate 24,
15 side of reaction tank is provided with inlet water tank 21, and inlet water tank 21 connects 10 bottom of filtering ponds by water pipe III13, on water pipe III13
The second water pump 14 is provided with, above inlet water tank 21 and 24 junction of Sptting plate, outlet 22 is provided with, 21 both sides of inlet water tank are arranged
There is inlet box 20, inlet box 20 connects plasma generator 16 by air inlet pipe 18, is provided with intake valve 19, enters in air inlet pipe 18
Gas outlet 23 is provided with below gas tank 20 and 24 junction of Sptting plate, 15 bottom of reaction tank is provided with outlet pipe 17, reaction tank 15
Top is provided with escape pipe 26, and sewage stream enters inlet water tank 21, and after flowing into the top of Sptting plate 24, air is through plasma generator
16 are processed, and form low temperature atomsphere plasma, and then plasma enters inlet box 20, in the lower section of Sptting plate 24, by slit
25 are contacted on Sptting plate 24 with sewage, which increase the contact area of sewage and low-temperature plasma, and low-temperature plasma is by dirt
Macromolecule contaminant in water is changed into the safe thing of simple small molecule, finally discharges from outlet pipe 17, and plasma gass are by going out
Trachea 26 is excluded, and the screen plate 12 is flexibly connected with filtering ponds 10, and screen plate 10 is damaged or filters clean rear replaceable mistake
Filter plate 10, it is ensured that water source is clean after filtration, and first water pump 8 is arranged at the top of stirring pool 4.
It is obvious to a person skilled in the art that this utility model is not limited to the details of above-mentioned one exemplary embodiment, and
And in the case of without departing substantially from spirit or essential attributes of the present utility model, can realize that this practicality is new in other specific forms
Type.Therefore, no matter from the point of view of which point, embodiment all should be regarded as exemplary, and is nonrestrictive, this practicality is new
The scope of type is by claims rather than described above is limited, it is intended that the equivalency fallen in claim is contained
All changes in justice and scope are included in this utility model.Any reference in claim should not be considered as restriction
Involved claim.
Moreover, it will be appreciated that although this specification is been described by according to embodiment, not each embodiment is only wrapped
Containing an independent technical scheme, this narrating mode of description is only that those skilled in the art should for clarity
Using description as an entirety, the technical scheme in each embodiment can also Jing it is appropriately combined, form those skilled in the art
Understandable other embodiment.
Claims (3)
1. a kind of water process low-temperature plasma device, including sedimentation tank(1), stirring pool(4), filtering ponds(10)And reaction tank
(15), it is characterised in that the sedimentation tank(1)By water pipe I(3)Connection stirring pool(4), water pipe I(3)On be provided with water intaking valve
(2), the stirring pool(4)Top left side is provided with motor(5), motor(5)Outfan connects shaft(6), shaft(6)Two
Side is provided with some equally distributed stirring vanes(7), stirring pool(4)By water pipe II(9)Connection filtering ponds(10), water pipe II
(9)On be provided with the first water pump(8), the filtering ponds(10)Defecator is provided with inside(11), defecator(11)By multiple
Screen plate(12)Composition, the reaction tank(15)Some Sptting plates being arranged in parallel are provided with inside(24), Sptting plate(24)In inclining
Tiltedly arrange, Sptting plate(24)On be provided with the slit of horizontal cover plate(25), reaction tank(15)Side is provided with inlet water tank(21),
Inlet water tank(21)By water pipe III(13)Connection filtering ponds(10)Bottom, water pipe III(13)On be provided with the second water pump(14),
Inlet water tank(21)With Sptting plate(24)Outlet is provided with above junction(22), inlet water tank(21)Both sides are provided with inlet box
(20), inlet box(20)By air inlet pipe(18)Connection plasma generator(16), air inlet pipe(18)On be provided with intake valve
(19), inlet box(20)With Sptting plate(24)Gas outlet is provided with below junction(23), reaction tank(15)Bottom is provided with out
Water pipe(17), reaction tank(15)Top is provided with escape pipe(26).
2. a kind of water process low-temperature plasma device according to claim 1, it is characterised in that the screen plate(12)With
Filtering ponds(10)It is flexibly connected.
3. a kind of water process low-temperature plasma device according to claim 1, it is characterised in that first water pump(8)
It is arranged on stirring pool(4)Top.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201621060731.6U CN206069611U (en) | 2016-09-19 | 2016-09-19 | A kind of water process low-temperature plasma device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621060731.6U CN206069611U (en) | 2016-09-19 | 2016-09-19 | A kind of water process low-temperature plasma device |
Publications (1)
Publication Number | Publication Date |
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CN206069611U true CN206069611U (en) | 2017-04-05 |
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CN201621060731.6U Expired - Fee Related CN206069611U (en) | 2016-09-19 | 2016-09-19 | A kind of water process low-temperature plasma device |
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CN (1) | CN206069611U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109110992A (en) * | 2018-09-03 | 2019-01-01 | 大渊环境技术(厦门)有限公司 | A kind of plasma coagulation integrated effluent disposal system and processing method |
-
2016
- 2016-09-19 CN CN201621060731.6U patent/CN206069611U/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109110992A (en) * | 2018-09-03 | 2019-01-01 | 大渊环境技术(厦门)有限公司 | A kind of plasma coagulation integrated effluent disposal system and processing method |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171011 Address after: 201507 Shanghai City, Jinshan District Caojing town Yuegong Road No. 288 Patentee after: Shanghai Polytron Technologies Inc Address before: 201515 Shanghai City, Jinshan District Jinshanwei town of Ca Mau Road No. 518 building 4 Patentee before: Shanghai Sino Swiss environmental protection technology Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170405 Termination date: 20200919 |