CN206069611U - A kind of water process low-temperature plasma device - Google Patents

A kind of water process low-temperature plasma device Download PDF

Info

Publication number
CN206069611U
CN206069611U CN201621060731.6U CN201621060731U CN206069611U CN 206069611 U CN206069611 U CN 206069611U CN 201621060731 U CN201621060731 U CN 201621060731U CN 206069611 U CN206069611 U CN 206069611U
Authority
CN
China
Prior art keywords
water
tank
stirring pool
inlet
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201621060731.6U
Other languages
Chinese (zh)
Inventor
袁文平
王菊明
彭睦财
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Polytron Technologies Inc
Original Assignee
Shanghai Sino Swiss Environmental Protection Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Sino Swiss Environmental Protection Technology Co Ltd filed Critical Shanghai Sino Swiss Environmental Protection Technology Co Ltd
Priority to CN201621060731.6U priority Critical patent/CN206069611U/en
Application granted granted Critical
Publication of CN206069611U publication Critical patent/CN206069611U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The utility model discloses a kind of water process low-temperature plasma device, including sedimentation tank, stirring pool, filtering ponds and reaction tank, the sedimentation tank connects stirring pool by water pipe I, is provided with water intaking valve on water pipe I, motor, motor output end connection shaft are provided with the left of the stirring pool top.Compared with prior art, start motor in this utility model, shaft drives stirring vane to be stirred, separate dregs, contribute to later process filtration, sewage stream enters inlet water tank, after flowing into the top of Sptting plate, air is through plasma generator process, form low temperature atomsphere plasma, then plasma enters inlet box, in the lower section of Sptting plate, contacted on Sptting plate with sewage by slit, which increase the contact area of sewage and low-temperature plasma, macromolecule contaminant in sewage is changed into the safe thing of simple small molecule by low-temperature plasma, screen plate is damaged or filters clean rear replaceable screen plate, after ensureing to filter, water source is clean.

Description

A kind of water process low-temperature plasma device
Technical field
This utility model is related to a kind of water treatment facilities, specifically a kind of water process low-temperature plasma device.
Background technology
Water process is exactly, by physics, chemistry, biological means, to go in eliminating water some unwanted to have to producing, living The process of evil material.Impurities in water includes thick material, float, colloid and the solute carried under one's arms mostly, and thick material is such as Gravel and bulk dirt in rubbish, waste water etc. are often formed under solid precipitation in water process, but solid precipitation Thing needs manually to be cleared up, required time length, high labor intensive, high cost, and traditional method for treating water can not effectively by In water, complicated macromolecular substances are changed into the safe thing of small molecule, generally require multiple operation and are processed, and this is resulted in water High expensive in processing procedure.
The content of the invention
The purpose of this utility model is to provide a kind of water process low-temperature plasma device, to solve in above-mentioned background technology The problem of proposition.
For achieving the above object, this utility model provides following technical scheme:
A kind of water process low-temperature plasma device, including sedimentation tank, stirring pool, filtering ponds and reaction tank, the sedimentation tank Stirring pool is connected by water pipe I, water intaking valve on water pipe I, is provided with, motor, motor output on the left of the stirring pool top, is provided with End connection shaft, shaft both sides are provided with some equally distributed stirring vanes, and stirring pool is filtered by water pipe II connections Pond, is provided with the first water pump on water pipe II, defecator is provided with the filtering ponds, and defecator is by multiple screen plate groups Into, some Sptting plates being arranged in parallel are provided with the reaction tank, Sptting plate inclined arrangement is provided with water on Sptting plate The slit of flat deck, reaction tank side are provided with inlet water tank, and inlet water tank connects filtering ponds bottom by water pipe III, on water pipe III The second water pump is provided with, above inlet water tank and Sptting plate junction, outlet is provided with, inlet water tank both sides are provided with inlet box, enter Gas tank connects plasma generator by air inlet pipe, is provided with intake valve, below inlet box and Sptting plate junction in air inlet pipe Gas outlet is provided with, reaction tank bottom is provided with outlet pipe, and escape pipe is provided with the top of reaction tank.
As further program of the utility model:The screen plate is flexibly connected with filtering ponds.
As further program of the utility model:First water pump is arranged on stirring pool top.
Compared with prior art, start motor in this utility model, shaft drives stirring vane to be stirred, makes dregs Separate, contribute to later process filtration, sewage stream enters inlet water tank, after flowing into the top of Sptting plate, air occurs through plasma Device process, forms low temperature atomsphere plasma, and then plasma enters inlet box, in the lower section of Sptting plate, by slit and dirt Water is contacted on Sptting plate, which increases the contact area of sewage and low-temperature plasma, and low-temperature plasma will be big in sewage Molecular contaminants are changed into the safe thing of simple small molecule, and screen plate is damaged or filters clean rear replaceable screen plate, it is ensured that After filtration, water source is clean.
Description of the drawings
Structural representations of the Fig. 1 for water process low-temperature plasma device.
Fig. 2 is the top view of filtering ponds in water process low-temperature plasma device.
In figure:1- sedimentation tanks, 2- water intaking valves, 3- water pipe I, 4- stirring pools, 5- motors, 6- shafts, 7- stirring vanes, 8- First water pump, 9- water pipe II, 10- filtering ponds, 11- defecators, 12- screen plates, the second water pump of 13- water pipes III, 14-, 15- Reaction tank, 16- plasma generators, 17- outlet pipes, 18- air inlet pipe, 19- intake valves, 20- inlet boxs, 21- inlet water tanks, 22- Outlet, 23- gas outlets, 24- Sptting plates, 25- slits, 26- escape pipes.
Specific embodiment
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out Clearly and completely describe, it is clear that described embodiment is only this utility model a part of embodiment, rather than whole Embodiment.Based on the embodiment in this utility model, those of ordinary skill in the art are not under the premise of creative work is made The every other embodiment for being obtained, belongs to the scope of this utility model protection.
Fig. 1~2 are referred to, in this utility model embodiment, a kind of water process low-temperature plasma device, including sedimentation tank 1, Stirring pool 4, filtering ponds 10 and reaction tank 15, the sedimentation tank 1 by water pipe I3 connect stirring pool 4, be provided with water pipe I3 into Water valve 2,4 top left side of the stirring pool are provided with motor 5, and 5 outfan of motor connects shaft 6, and 6 both sides of shaft are provided with Some equally distributed stirring vanes 7, start motor 5, and shaft 6 drives stirring vane 7 to be stirred, separates dregs, have Help later process filtration, stirring pool 4 connects filtering ponds 10 by water pipe II9, the first water pump 8 is provided with water pipe II9, described Defecator 11 is provided with filtering ponds 10, defecator 11 is made up of multiple screen plates 12, is provided with the reaction tank 15 Some Sptting plates 24 being arranged in parallel, 24 inclined arrangement of Sptting plate, are provided with the slit 25 of horizontal cover plate on Sptting plate 24, 15 side of reaction tank is provided with inlet water tank 21, and inlet water tank 21 connects 10 bottom of filtering ponds by water pipe III13, on water pipe III13 The second water pump 14 is provided with, above inlet water tank 21 and 24 junction of Sptting plate, outlet 22 is provided with, 21 both sides of inlet water tank are arranged There is inlet box 20, inlet box 20 connects plasma generator 16 by air inlet pipe 18, is provided with intake valve 19, enters in air inlet pipe 18 Gas outlet 23 is provided with below gas tank 20 and 24 junction of Sptting plate, 15 bottom of reaction tank is provided with outlet pipe 17, reaction tank 15 Top is provided with escape pipe 26, and sewage stream enters inlet water tank 21, and after flowing into the top of Sptting plate 24, air is through plasma generator 16 are processed, and form low temperature atomsphere plasma, and then plasma enters inlet box 20, in the lower section of Sptting plate 24, by slit 25 are contacted on Sptting plate 24 with sewage, which increase the contact area of sewage and low-temperature plasma, and low-temperature plasma is by dirt Macromolecule contaminant in water is changed into the safe thing of simple small molecule, finally discharges from outlet pipe 17, and plasma gass are by going out Trachea 26 is excluded, and the screen plate 12 is flexibly connected with filtering ponds 10, and screen plate 10 is damaged or filters clean rear replaceable mistake Filter plate 10, it is ensured that water source is clean after filtration, and first water pump 8 is arranged at the top of stirring pool 4.
It is obvious to a person skilled in the art that this utility model is not limited to the details of above-mentioned one exemplary embodiment, and And in the case of without departing substantially from spirit or essential attributes of the present utility model, can realize that this practicality is new in other specific forms Type.Therefore, no matter from the point of view of which point, embodiment all should be regarded as exemplary, and is nonrestrictive, this practicality is new The scope of type is by claims rather than described above is limited, it is intended that the equivalency fallen in claim is contained All changes in justice and scope are included in this utility model.Any reference in claim should not be considered as restriction Involved claim.
Moreover, it will be appreciated that although this specification is been described by according to embodiment, not each embodiment is only wrapped Containing an independent technical scheme, this narrating mode of description is only that those skilled in the art should for clarity Using description as an entirety, the technical scheme in each embodiment can also Jing it is appropriately combined, form those skilled in the art Understandable other embodiment.

Claims (3)

1. a kind of water process low-temperature plasma device, including sedimentation tank(1), stirring pool(4), filtering ponds(10)And reaction tank (15), it is characterised in that the sedimentation tank(1)By water pipe I(3)Connection stirring pool(4), water pipe I(3)On be provided with water intaking valve (2), the stirring pool(4)Top left side is provided with motor(5), motor(5)Outfan connects shaft(6), shaft(6)Two Side is provided with some equally distributed stirring vanes(7), stirring pool(4)By water pipe II(9)Connection filtering ponds(10), water pipe II (9)On be provided with the first water pump(8), the filtering ponds(10)Defecator is provided with inside(11), defecator(11)By multiple Screen plate(12)Composition, the reaction tank(15)Some Sptting plates being arranged in parallel are provided with inside(24), Sptting plate(24)In inclining Tiltedly arrange, Sptting plate(24)On be provided with the slit of horizontal cover plate(25), reaction tank(15)Side is provided with inlet water tank(21), Inlet water tank(21)By water pipe III(13)Connection filtering ponds(10)Bottom, water pipe III(13)On be provided with the second water pump(14), Inlet water tank(21)With Sptting plate(24)Outlet is provided with above junction(22), inlet water tank(21)Both sides are provided with inlet box (20), inlet box(20)By air inlet pipe(18)Connection plasma generator(16), air inlet pipe(18)On be provided with intake valve (19), inlet box(20)With Sptting plate(24)Gas outlet is provided with below junction(23), reaction tank(15)Bottom is provided with out Water pipe(17), reaction tank(15)Top is provided with escape pipe(26).
2. a kind of water process low-temperature plasma device according to claim 1, it is characterised in that the screen plate(12)With Filtering ponds(10)It is flexibly connected.
3. a kind of water process low-temperature plasma device according to claim 1, it is characterised in that first water pump(8) It is arranged on stirring pool(4)Top.
CN201621060731.6U 2016-09-19 2016-09-19 A kind of water process low-temperature plasma device Expired - Fee Related CN206069611U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201621060731.6U CN206069611U (en) 2016-09-19 2016-09-19 A kind of water process low-temperature plasma device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201621060731.6U CN206069611U (en) 2016-09-19 2016-09-19 A kind of water process low-temperature plasma device

Publications (1)

Publication Number Publication Date
CN206069611U true CN206069611U (en) 2017-04-05

Family

ID=58436709

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201621060731.6U Expired - Fee Related CN206069611U (en) 2016-09-19 2016-09-19 A kind of water process low-temperature plasma device

Country Status (1)

Country Link
CN (1) CN206069611U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109110992A (en) * 2018-09-03 2019-01-01 大渊环境技术(厦门)有限公司 A kind of plasma coagulation integrated effluent disposal system and processing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109110992A (en) * 2018-09-03 2019-01-01 大渊环境技术(厦门)有限公司 A kind of plasma coagulation integrated effluent disposal system and processing method

Similar Documents

Publication Publication Date Title
CN206328298U (en) A kind of box type sewage processor
CN110527554B (en) Oil field sump oil recovery processing equipment
CN108358286A (en) A kind of magnetic flocculation urban rainwater processing unit and its technique
CN108569830A (en) A kind of industrial sewage processing unit
CN206069611U (en) A kind of water process low-temperature plasma device
CN208104103U (en) A kind of municipal wastewater treatment and purification device
CN106629897A (en) Variable gap type fiber bundle filter and application method thereof
CN207608426U (en) A kind of sewage disposal device
CN110818182B (en) Environment-friendly sewage treatment plant
CN210438528U (en) Small-size sewage treatment boat form sedimentation tank device
CN105948148B (en) A kind of sewage water treatment method crushing sewage-treatment plant with multistage more partial size circulations
CN219279683U (en) Strip mine coal mining wastewater treatment device
JP2012035173A (en) Water purification apparatus and method
CN205061783U (en) Hierarchical formula sewage treatment plant
CN207259197U (en) A kind of air-flotation type wastewater efficient processing unit
CN106882883A (en) Integrated wastewater processing pond
CN205933506U (en) Sewage treatment system
CN111362442A (en) Multistage purification sewage treatment device
CN108101256A (en) A kind of multi stage precipitation type sewage-treatment plant
CN211521914U (en) Efficient treatment device for mine wastewater discharge
CN209092788U (en) A kind of sewage purifier with cleaning precipitating function
CN209940753U (en) Micro-nano bubble emulsion processing device
CN207748988U (en) A kind of chemical engineering sewage processing unit
CN206289123U (en) A kind of processing system for metro depot car-washing sewage
CN220779379U (en) Sludge precipitation synergy device in sewage treatment

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20171011

Address after: 201507 Shanghai City, Jinshan District Caojing town Yuegong Road No. 288

Patentee after: Shanghai Polytron Technologies Inc

Address before: 201515 Shanghai City, Jinshan District Jinshanwei town of Ca Mau Road No. 518 building 4

Patentee before: Shanghai Sino Swiss environmental protection technology Co., Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170405

Termination date: 20200919