CN206051558U - Graphene preparation facilitiess - Google Patents
Graphene preparation facilitiess Download PDFInfo
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- CN206051558U CN206051558U CN201620893682.8U CN201620893682U CN206051558U CN 206051558 U CN206051558 U CN 206051558U CN 201620893682 U CN201620893682 U CN 201620893682U CN 206051558 U CN206051558 U CN 206051558U
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Abstract
This utility model provides a kind of Graphene preparation facilitiess, and the device includes：For the first immersion system for being impregnated to the mixture of carbon raw material and organic solvent and the second immersion system and reaction unit and oxidant adding set；Wherein, the first immersion system and the second immersion system are connected with reaction unit, for the carbon raw material and organic solvent after dipping is input into reaction unit；Oxidant adding set is connected with reaction unit, for adding oxidant into reaction unit.This utility model enables to the first immersion system and the second immersion system continuously works, incessantly the carbon raw material and organic solvent after dipping is delivered in reaction unit, realize the continuous work of reaction unit, the intermolecular force of carbon raw material can farthest be weakened, the interfloor distance of carbon raw material is increased, is easy to the later separation of Graphene, substantially increase the yield of Graphene, and the quality of Graphene is ensure that, it is with low cost.
Description
Technical field
This utility model is related to technical field of graphene preparation, in particular to a kind of Graphene preparation facilitiess.
Background technology
Graphene is a kind of bi-dimensional cellular shape lattice structure carbonaceous material tightly packed by monolayer carbon atom.Although
Graphene only has the thickness of one layer of carbon atomic layer, but Graphene is the most thin material being currently known, and most tough material
Material, also, Graphene also has electric conductivity elastic and good well, therefore, Graphene is in electronics, optics, magnetics, life
The aspects such as thing medical science, sensor, energy storage are widely used.
At present, the conventional preparation method of Graphene includes：Mechanical stripping method, oxidation-reduction method, epitaxial growth method and chemistry
Vapour deposition process.Wherein, the Graphene that mechanical stripping method is prepared generally remains complete crystal structure, but lamella it is little,
Low production efficiency.Although the yield of oxidation-reduction method Graphene is high, quality is relatively low.Although epitaxial growth method is obtained in that height
The Graphene of quality, but the requirement to equipment is higher.The characteristics of vapour deposition process has the quality of Graphene high, but cost
Height, process conditions also need further perfect.Therefore, Graphene is more prepared using supercritical process, wherein supercritical
CO2Method application is more extensive, but high cost, low yield.
Utility model content
In consideration of it, the utility model proposes a kind of Graphene preparation facilitiess, it is intended to faced using super in solving prior art
Boundary CO2Method prepares Graphene causes the problem of high cost, low yield.
On one side, the utility model proposes a kind of Graphene preparation facilitiess, the device includes：For to carbon raw material
The first immersion system impregnated with the mixture of organic solvent and the second immersion system and reaction unit and oxidant add
Feeder apparatus；Wherein, the first immersion system and the second immersion system are connected with reaction unit, for will be the carbonaceous after dipping former
Material and organic solvent are input into reaction unit；Oxidant adding set is connected with reaction unit, for adding into reaction unit
Oxidizer.
Further, in above-mentioned Graphene preparation facilitiess, the first immersion system includes：First dipping kettle, the first raw material pump,
First raw material storage tank, first heater and the first stop valve；Wherein, the entrance of the first raw material pump is connected with the first raw material storage tank
Logical, the outlet of the first raw material pump is connected with the first dipping kettle；First dipping kettle is connected with reaction unit, and the first stop valve connects
It is connected on the connecting pipe of the first dipping kettle and reaction unit；First heater is connected with the first dipping kettle, for the
One dipping kettle is heated.
Further, in above-mentioned Graphene preparation facilitiess, it is provided with the first dipping kettle and the connecting pipe of reaction unit
First filter.
Further, in above-mentioned Graphene preparation facilitiess, the second immersion system includes：Second dipping kettle, the second raw material pump,
Second raw material storage tank, secondary heating mechanism and the second stop valve；Wherein, the entrance of the second raw material pump is connected with the second raw material storage tank
Logical, the outlet of the second raw material pump is connected with the second dipping kettle；Second dipping kettle is connected with reaction unit, and the second stop valve connects
It is connected on the connecting pipe of the second dipping kettle and reaction unit；Secondary heating mechanism is connected with the second dipping kettle, for the
Two dipping kettles are heated.
Further, in above-mentioned Graphene preparation facilitiess, it is provided with the second dipping kettle and the connecting pipe of reaction unit
Second filter.
Further, in above-mentioned Graphene preparation facilitiess, reaction unit includes：Reactor and the 3rd heater；Wherein,
Reactor is connected with the first immersion system and the second immersion system；3rd heater is connected with reactor, for anti-
Kettle is answered to be heated；Oxidant adding set is connected with reactor.
Further, in above-mentioned Graphene preparation facilitiess, oxidant adding set includes：Pressurizer and oxidant storage
Tank；Wherein, the entrance of pressurizer is connected with oxidant storage tank, and the outlet of pressurizer is connected with reactor.
Further, in above-mentioned Graphene preparation facilitiess, it is provided with unidirectionally on pressurizer and the connecting pipe of reactor
Valve.
Further, above-mentioned Graphene preparation facilitiess also include：Chiller, dropping equipment and reception tank；Wherein, react
Kettle, chiller, dropping equipment and reception tank are sequentially connected.
Further, in above-mentioned Graphene preparation facilitiess, it is provided with the connecting pipe between reactor and chiller
3rd stop valve.
In this utility model, by arranging the first immersion system and the second immersion system, the first immersion system and the second leaching
Stain device is connected with reaction unit, so enables to the first immersion system and the second immersion system continuously works, not between
Disconnected ground is delivered to the carbon raw material and organic solvent after dipping in reaction unit, realizes the continuous work of reaction unit, and
And, carbon raw material and organic solvent have occurred that physical reactions in the first immersion system and the second immersion system so that
The intermolecular force of carbon raw material weakens, and increases the interfloor distance of carbon raw material, then sends out with oxidant in reaction unit
Raw oxidation reaction, discharges violent heat, and the heat can further destroy the intermolecular force of carbon raw material, increase again
The interfloor distance of big carbon raw material, is easy to the later separation of Graphene, substantially increases the yield of Graphene, and ensure that stone
The quality of black alkene, it is with low cost, supercritical CO is adopted in solving prior art2Method prepares Graphene causes high cost, yield
Low problem.
Description of the drawings
By the detailed description for reading hereafter preferred implementation, various other advantages and benefit are common for this area
Technical staff will be clear from understanding.Accompanying drawing is only used for the purpose for illustrating preferred implementation, and is not considered as to this practicality
New restriction.And in whole accompanying drawing, it is denoted by the same reference numerals identical part.In the accompanying drawings：
The structural representation of the Graphene preparation facilitiess that Fig. 1 is provided for this utility model embodiment.
Specific embodiment
The exemplary embodiment of the disclosure is more fully described below with reference to accompanying drawings.Although the disclosure is shown in accompanying drawing
Exemplary embodiment, it being understood, however, that may be realized in various forms the disclosure and should not be by embodiments set forth here
Limited.On the contrary, there is provided these embodiments are able to be best understood from the disclosure, and can be by the scope of the present disclosure
Complete conveys to those skilled in the art.It should be noted that the enforcement in the case where not conflicting, in this utility model
Feature in example and embodiment can be mutually combined.It is below with reference to the accompanying drawings and in conjunction with the embodiments new to describe this practicality in detail
Type.
The structural representation of the Graphene preparation facilitiess provided for this utility model embodiment referring to Fig. 1, Fig. 1.As schemed
Show, the Graphene preparation facilitiess include：First immersion system 1 and the second immersion system 2, reaction unit 3 and oxidant addition dress
Put 4.Wherein, the first immersion system 1 and the second immersion system 2 are used to soak the mixture of carbon raw material and organic solvent
Stain.First immersion system 1 and the second immersion system 2 are connected with reaction unit 3, and the first immersion system 1 and the second dipping are filled
Put 2 the carbon raw material and organic solvent after dipping is input into reaction unit 3.Oxidant adding set 4 and 3 phase of reaction unit
Connection, oxidant adding set 4 is for adding oxidant into reaction unit 3.Specifically, the water content of organic solvent is 70%
～99%, organic solvent can be ethanol, NMP, surfactant etc., and the organic solvent can be single organic solvent, also may be used
Think the mixture of several organic solvents.Carbon raw material can be graphite, coal etc..Oxidant can be hydrogen peroxide, pure oxygen, liquid oxygen
And one or more in oxygen-enriched air etc..
During preparation, the mixture of carbon raw material and organic solvent is put into into the first immersion system 1, in the first immersion system
In 1, organic solvent and carbon raw material uniformly mix, and organic solvent gradually infiltrates into the piece interlayer of carbon raw material, carbon raw material
Intermolecular force weakens so that the interfloor distance increase of carbon raw material.Organic solvent and carbonaceous in first immersion system 1 is former
When material reaction reached for the first response time, the first immersion system 1 is input into the carbon raw material and organic solvent after dipping to reaction
In device 3, oxidant adding set 4 adds oxidant into reaction unit 3, and oxidant occurs oxidation reaction with organic solvent,
The oxidation reaction can discharge violent heat, and the heat can further destroy the intermolecular force of carbon raw material, again
The interfloor distance of increase carbon raw material.When oxidant reached for the second response time with organic solvent reaction, obtain in reaction unit 3
Graphene, and Graphene is exported.When the carbon raw material and organic solvent in the first immersion system 1 reached for the first response time,
The mixture of carbon raw material and organic solvent is put into into the second immersion system 2, in the second immersion system 2, organic solvent and
Carbon raw material uniformly mixes, and organic solvent gradually infiltrates into the piece interlayer of carbon raw material, and the intermolecular force of carbon raw material subtracts
It is weak so that the interfloor distance increase of carbon raw material.Organic solvent and carbon raw material reaction in second immersion system 2 reaches the 3rd
During the response time, Graphene is exported by reaction unit 3, and at this moment reaction unit 3 is in idle state, the second immersion system 2
Carbon raw material and organic solvent after dipping is input into reaction unit 3, oxidant adding set 4 adds into reaction unit 3
There is oxidation reaction with organic solvent in oxidizer, oxidant, further destroy the intermolecular force of carbon raw material, increase again
The interfloor distance of big carbon raw material, then reaction unit 3 again Graphene is exported, repeat aforesaid operations step.
It should be noted that the first response time, the second response time and the 3rd response time can be according to practical situations
To determine, the present embodiment is not intended to be limited in any to this.
It should be appreciated by those skilled in the art that the Graphene that above-mentioned reaction unit 3 is obtained is crude product Graphene, crude product graphite
Alkene proceeds separation and can just obtain Graphene.
As can be seen that in the present embodiment, by arranging the first immersion system 1 and the second immersion system 2, the first immersion system
1 and second immersion system 2 be connected with reaction unit 3, so enable to the first immersion system 1 and the second immersion system 2
It is continuous to work, incessantly the carbon raw material and organic solvent after dipping is delivered in reaction unit 3, reaction unit is realized
Continuous work, carbon raw material and organic solvent have occurred that physics in the first immersion system 1 and the second immersion system 2
Reaction so that the intermolecular force of carbon raw material weakens, and increases the interfloor distance of carbon raw material, then in reaction unit 3
There is oxidation reaction with oxidant, discharge violent heat, the heat can further destroy the molecule catch cropping of carbon raw material
Firmly, increase the interfloor distance of carbon raw material again, be easy to the later separation of Graphene, substantially increase the yield of Graphene,
And the quality of Graphene is ensure that, it is with low cost, supercritical CO is adopted in solving prior art2Method prepares Graphene to be caused
The problem of high cost, low yield.
Referring to Fig. 1, in above-described embodiment, the first immersion system 1 can include：First dipping kettle 11, the first raw material pump 12,
First raw material storage tank 13, first heater 14 and the first stop valve 15.Wherein, the entrance and the first raw material of the first raw material pump 12
Storage tank 13 is connected, and the outlet of the first raw material pump 12 is connected with the first dipping kettle 11.First raw material storage tank 13 is used to store carbon
The mixture of matter raw material and organic solvent.First raw material pump 12 is for by the carbon raw material in the first raw material storage tank 13 and organic molten
The mixture of agent is delivered to the first dipping kettle 11.First heater 14 is connected with the first dipping kettle 11, first heater
14 heat for impregnating kettle 11 to first.First dipping kettle 11 is connected with reaction unit 3, and the first stop valve 15 is connected to
On connecting pipe between first dipping kettle 11 and reaction unit 3.First stop valve 15 is used for control first and impregnates kettle 11 to anti-
Answer the flow of carbon raw material and organic solvent after the dipping of the conveying of device 3.Preferably, the first stop valve 15 is provided with two.
When being embodied as, the first dipping kettle 11 can be provided with pressure gauge, and the pressure gauge is used for monitoring first and impregnates kettle 11
Interior pressure change.First dipping kettle 11 is also provided with thermometer, and the thermometer is used for monitoring first and impregnates inside kettle 11
Temperature, in such manner, it is possible to first dipping kettle 11 in the elevated speed of temperature be controlled.First dipping kettle 11 and reaction unit
Relief valve is also provided with connecting pipe between 3.
During preparation, the mixture of carbon raw material and organic solvent in the first raw material storage tank 13 is conveyed by the first raw material pump 12
To the first dipping kettle 11.14 pairs first dipping kettles 11 of first heater are heated so that the temperature in the first dipping kettle 11
The first preset temperature is reached, as temperature is raised in the first dipping kettle 11, so the pressure in the first dipping kettle 11 is also risen therewith
It is high.When the temperature in the first dipping kettle 11 reaches the first preset temperature, organic solvent infiltrates into the piece interlayer of carbon raw material, carbon
The intermolecular force of matter raw material weakens so that the interfloor distance increase of carbon raw material.When organic solvent and carbon raw material react
When reaching for the first response time, the organic solvent and carbon raw material after dipping is delivered to reaction unit by the first dipping kettle 11
3。
It should be noted that when being embodied as, the first preset temperature can be 250 DEG C～650 DEG C, it is also possible to according to reality
Determining, the present embodiment does not do any restriction to situation to this.Pressure in first dipping kettle 11 can be 21MPa～30MPa,
Can according to circumstances be determined according to actual, the present embodiment does not do any restriction to this.
As can be seen that in the present embodiment, by organic solvent and carbon in 14 pairs first dipping kettles 11 of first heater
Matter raw material is heated so that organic solvent and carbon raw material can fully occur physical reactions, and organic solvent infiltrates into carbonaceous
The piece interlayer of raw material so that the intermolecular force of carbon raw material weakens, increases the interfloor distance of carbon raw material, then will dipping
Organic solvent and carbon raw material afterwards is delivered to reaction unit 3 and proceeds reaction, substantially increases the yield of Graphene.
Referring to Fig. 1, in above-described embodiment, on the first dipping kettle 11 and the connecting pipe of reaction unit 3, the first mistake is provided with
Filter 16, the organic solvent and carbon raw material after first filter, 16 pairs of dippings being input into reaction unit 3 are filtered,
Oarse-grained material is prevented to be delivered in reaction unit 3.
Referring to Fig. 1, in above-described embodiment, the second immersion system 2 can include：Second dipping kettle 21, the second raw material pump 22,
Second raw material storage tank 23, secondary heating mechanism 24 and the second stop valve 25.Wherein, the entrance and the second raw material of the second raw material pump 22
Storage tank 23 is connected, and the outlet of the second raw material pump 22 is connected with the second dipping kettle 21.Second raw material storage tank 23 is used to store carbon
The mixture of matter raw material and organic solvent.Second raw material pump 22 is for by the carbon raw material in the second raw material storage tank 23 and organic molten
The mixture of agent is delivered to the second dipping kettle 21.Secondary heating mechanism 24 is connected with the second dipping kettle 21, secondary heating mechanism
24 heat for impregnating kettle 21 to second.Second dipping kettle 21 is connected with reaction unit 3, and the second stop valve 25 is connected to
On connecting pipe between second dipping kettle 21 and reaction unit 3.Second stop valve 25 is used for control second and impregnates kettle 21 to anti-
Answer the flow of carbon raw material and organic solvent after the dipping of the conveying of device 3.Preferably, the second stop valve 25 is provided with two.
When being embodied as, the first raw material storage tank 13 and the second raw material storage tank 23 can be same raw material storage tank.Second leaching
Stain kettle 21 can be provided with pressure gauge, and the pressure gauge is used for monitoring second and impregnates the pressure change in kettle 21.Second dipping kettle 21
Thermometer is also provided with, the temperature that the thermometer is used for inside monitoring the second dipping kettle 21, in such manner, it is possible to impregnate to second
In kettle 21, the elevated speed of temperature is controlled.Can also set on connecting pipe between second dipping kettle 21 and reaction unit 3
It is equipped with relief valve.
During preparation, the mixture of carbon raw material and organic solvent in the second raw material storage tank 23 is conveyed by the second raw material pump 22
To the second dipping kettle 21.24 pairs second dipping kettles 21 of secondary heating mechanism are heated so that the temperature in the second dipping kettle 21
The second preset temperature is reached, as temperature is raised in the second dipping kettle 21, so the pressure in the second dipping kettle 21 is also risen therewith
It is high.When the temperature in the second dipping kettle 21 reaches the second preset temperature, organic solvent infiltrates into the piece interlayer of carbon raw material, carbon
The intermolecular force of matter raw material weakens so that the interfloor distance increase of carbon raw material.When organic solvent and carbon raw material react
Carbon raw material and organic solvent when reaching for three response time, after the dipping of the first dipping conveying of kettle 11 in reaction unit 3
Reacted with oxidant reaction completely, obtained Graphene, and Graphene is exported, at this moment, reaction unit 3 is in idle shape
Organic solvent and carbon raw material after dipping is delivered to reaction unit 3 by state, the second dipping kettle 21.
It should be noted that when being embodied as, the second preset temperature can be 250 DEG C～650 DEG C, it is also possible to according to reality
Determining, the present embodiment does not do any restriction to situation to this.Pressure in second dipping kettle 21 can be 21MPa～30MPa,
Can according to circumstances be determined according to actual, the present embodiment does not do any restriction to this.
As can be seen that in the present embodiment, by organic solvent and carbon in 24 pairs second dipping kettles 21 of secondary heating mechanism
Matter raw material is heated so that organic solvent and carbon raw material can fully occur physical reactions, and organic solvent infiltrates into carbonaceous
The piece interlayer of raw material so that the intermolecular force of carbon raw material weakens, increases the interfloor distance of carbon raw material, then will dipping
Organic solvent and carbon raw material afterwards is delivered to reaction unit 3 and proceeds reaction, is easy to the later separation of Graphene, carries significantly
The high yield of Graphene.
Referring to Fig. 1, in above-described embodiment, on the second dipping kettle 21 and the connecting pipe of reaction unit 3, the second mistake is provided with
Filter 26, the organic solvent and carbon raw material after second filter, 26 pairs of dippings being input into reaction unit 3 are filtered,
Oarse-grained material is prevented to be delivered in reaction unit 3.
Referring to Fig. 1, in the various embodiments described above, reaction unit 3 can include：Reactor 31 and the 3rd heater 32.Its
In, reactor 31 is connected with the first immersion system 1 and the second immersion system 2, and the 3rd heater 32 is connected with reactor 31
Connect, the 3rd heater 32 is for heating to reactor 31.Oxidant adding set 4 is connected with reactor 31, oxidation
Agent adding set 4 conveys oxidant into reactor 31.Specifically, reactor 31 is impregnated with the first dipping kettle 11 and second respectively
Kettle 21 is connected.3rd heater 32 can be sheathed on the outside of reactor 31 for the heating mantle of one end open, the heating mantle.
When being embodied as, reactor 31 is also provided with thermometer, and the thermometer is used to monitor inside reactor 31
Temperature, in such manner, it is possible to be controlled to the elevated speed of temperature in reactor 31, realizes the adjustable of temperature in reactor 31
Section.
During preparation, the carbon raw material and organic solvent after the dipping of the reception of the reactor 31 first dipping conveying of kettle 11, oxidation
Agent adding set 4 conveys oxidant into reactor 31.3rd heater 32 is heated to reactor 31 so that reactor
Temperature in 31 reaches the 3rd preset temperature, as in reactor 31, temperature is raised, so the pressure in reactor 31 is also therewith
Raise.When the temperature of reactor 31 reaches three preset temperatures, there is oxidation reaction with organic solvent in oxidant, and the oxidation is anti-
Violent heat should be discharged, the heat can further destroy the intermolecular force of carbon raw material, increase carbonaceous again
The interfloor distance of raw material.When oxidant is reacted to the second response time with organic solvent, oxidant adding set 4 stops addition oxygen
Agent, the carbon raw material, organic solvent and oxidant in reactor 31 are fully reacted and obtain Graphene, and Graphene is exported.
Carbon raw material and organic solvent after dipping can be delivered to reactor 31 by the second dipping kettle 21, oxidant adding set 4 after
Continuous addition oxidant, oxidant continue oxidation reaction with organic solvent, destroy the intermolecular force of carbon raw material again.
Oxidant is reacted to the 4th response time with organic solvent, and oxidant adding set 4 stops addition oxidant, in reactor 31
To Graphene.Carbon raw material and organic solvent after dipping can be delivered to reactor 31 by the first dipping kettle 11, and repetition is above-mentioned
Step.
When being embodied as, the 3rd preset temperature can be 250 DEG C～650 DEG C, it is also possible to be determined according to practical situation, this
Embodiment does not do any restriction to this.Pressure in reactor 31 can be 21MPa～30MPa, it is also possible to according to actual basis
Determining, the present embodiment does not do any restriction to situation to this.4th response time can be according to actually according to circumstances determine, originally
Embodiment does not do any restriction to this.
As can be seen that in the present embodiment, in reactor 31, there is oxidation reaction with oxidant in organic solvent, discharge
Violent heat, the heat can further destroy the intermolecular force of carbon raw material, increase the interlayer of carbon raw material again
Distance, is easy to the separation that Graphene is follow-up, substantially increases the yield of Graphene, and the first dipping kettle 11 and the second dipping kettle
Carbon raw material and organic solvent after dipping is delivered to reactor 31 by 21 alternatings, realizes reactor 31 continuous raw incessantly
Graphene is produced, the yield of Graphene is improve.
Referring to Fig. 1, in the various embodiments described above, oxidant adding set 4 can include：Pressurizer 41 and oxidant storage tank
42.Wherein, the entrance of pressurizer 41 is connected with oxidant storage tank 42, and the outlet of pressurizer 41 is connected with reactor 31
It is logical.Specifically, if oxidant is gas, such as oxygen etc., pressurizer 41 can be supercharger.If oxidant is liquid, such as liquid
Oxygen, hydrogen peroxide etc., it can be force (forcing) pump to increase device.
As can be seen that in the present embodiment, the oxidant of the output of oxidant adding set 4 is increased by pressurizer 41
Pressure so that the pressure of oxidant is improved, and is easy to oxidant to add to reactor 31, it is to avoid hypertonia in reactor 31 and oxygen
Caused by agent pressure is relatively low, oxidant cannot add to reactor 31.
Referring to Fig. 1, in the various embodiments described above, can be provided with unidirectionally on pressurizer 41 and the connecting pipe of reactor 31
Valve 5, the check valve 5 are prevented from the carbon raw material in reactor 31, organic solvent or oxidant adverse current to pressurizer 41.
Referring to Fig. 1, in the various embodiments described above, the Graphene preparation facilitiess can also include：Chiller 6, dropping equipment 7
With reception tank 8.Wherein, reactor 31, chiller 6, dropping equipment 7 and reception tank 8 are sequentially connected.Carbonaceous in reactor 31
Raw material, organic solvent and oxidant fully react and obtain Graphene, and Graphene first passes through chiller 6 after being exported by reactor 31
Cooled down, then carried out blood pressure lowering through dropping equipment 7, finally given cooling, the Graphene after blood pressure lowering, receive tank 8 receive cooling,
Graphene after blood pressure lowering.The product after carbon raw material, organic solvent and oxidant reaction in reactor 31 can include：
Graphene, carbon raw material, water, oxygen, carbon dioxide.
As can be seen that in the present embodiment, by arranging chiller 6 and dropping equipment 7, so, the stone in reactor 31
Black alkene need not carry out natural cooling, carry out cooling down by chiller and dropping equipment, blood pressure lowering, it can be ensured that in reactor 31
Graphene is exported in time, the carbon raw material after being easy to the first immersion system 1 or the second immersion system that dipping is input into into reactor
And organic solvent, realize the non-stop run of reactor 31, and accelerate the time of cooling, blood pressure lowering, can be more quick
Obtain Graphene.
Referring to Fig. 1, in above-described embodiment, on the connecting pipe between reactor 31 and chiller 6, can be provided with
Three stop valves 9, the 3rd stop valve 9 are used to control the flow of the Graphene that reactor 31 is conveyed to chiller 6.
When being embodied as, it is also provided with the connecting pipe between reactor 31 and chiller 6 in monitoring
The pressure gauge of portion's pressure, is easy to monitor pressure change, it is ensured that in reactor 31, organic solvent, carbon raw material and oxidant is normal
Reaction, improves the safety of reactor 31.Peace is also provided with connecting pipe between reactor 31 and chiller 6
Full valve.
In sum, in the present embodiment, 2 continuous work of the first immersion system 1 and the second immersion system, incessantly by carbon
Matter raw material and organic solvent are delivered in reaction unit 3, also, carbon raw material and organic solvent are in the first immersion system 1 and
Physical reactions are had occurred that in two immersion systems 2 so that the intermolecular force of carbon raw material weakens, and increases carbon raw material
Interfloor distance, then there is oxidation reaction with oxidant in reaction unit 3, discharge violent heat, the heat can enter one
The intermolecular force of step destruction carbon raw material, increases the interfloor distance of carbon raw material again, is easy to the later separation of Graphene,
Substantially increase the yield of Graphene, and ensure that the quality of Graphene, it is with low cost.
Obviously, those skilled in the art can carry out various changes and modification without deviating from this practicality to this utility model
New spirit and scope.So, if it is of the present utility model these modification and modification belong to this utility model claim and
Within the scope of its equivalent technologies, then this utility model is also intended to comprising these changes and modification.
Claims (10)
1. a kind of Graphene preparation facilitiess, it is characterised in that include：Carry out for the mixture to carbon raw material and organic solvent
First immersion system (1) and the second immersion system (2) of dipping, and reaction unit (3) and oxidant adding set (4)；Its
In,
First immersion system (1) and second immersion system (2) are connected with the reaction unit (3), for inciting somebody to action
Carbon raw material and organic solvent after dipping is input into the reaction unit (3)；
The oxidant adding set (4) is connected with the reaction unit (3), for the addition into the reaction unit (3)
Oxidant.
2. Graphene preparation facilitiess according to claim 1, it is characterised in that first immersion system (1) includes：The
One dipping kettle (11), the first raw material pump (12), the first raw material storage tank (13), first heater (14) and the first stop valve
(15)；Wherein,
The entrance of the first raw material pump (12) is connected with the first raw material storage tank (13), the outlet of the first raw material pump (12)
It is connected with the described first dipping kettle (11)；First dipping kettle (11) is connected with the reaction unit (3), and described first
Stop valve (15) is connected on the first dipping kettle (11) and the connecting pipe of the reaction unit (3)；
First heater (14) is connected with the described first dipping kettle (11), for carrying out adding to the described first dipping kettle (11)
Heat.
3. Graphene preparation facilitiess according to claim 2, it is characterised in that first dipping kettle (11) is anti-with described
The first filter (16) is provided with the connecting pipe for answering device (3).
4. Graphene preparation facilitiess according to claim 1, it is characterised in that second immersion system (2) includes：The
Two dippings kettle (21), the second raw material pump (22), the second raw material storage tank (23), secondary heating mechanism (24) and the second stop valve
(25)；Wherein,
The entrance of the second raw material pump (22) is connected with the second raw material storage tank (23), the outlet of the second raw material pump (22)
It is connected with the described second dipping kettle (21)；Second dipping kettle (21) is connected with the reaction unit (3), and described second
Stop valve (25) is connected on the second dipping kettle (21) and the connecting pipe of the reaction unit (3)；
Secondary heating mechanism (24) is connected with the described second dipping kettle (21), for carrying out adding to the described second dipping kettle (21)
Heat.
5. Graphene preparation facilitiess according to claim 4, it is characterised in that second dipping kettle (21) is anti-with described
The second filter (26) is provided with the connecting pipe for answering device (3).
6. Graphene preparation facilitiess according to any one of claim 1 to 5, it is characterised in that the reaction unit (3)
Including：Reactor (31) and the 3rd heater (32)；Wherein,
The reactor (31) is connected with first immersion system (1) and second immersion system (2)；
3rd heater (32) is connected with the reactor (31), for heating to the reactor (31)；
The oxidant adding set (4) is connected with the reactor (31).
7. Graphene preparation facilitiess according to claim 6, it is characterised in that the oxidant adding set (4) includes：
Pressurizer (41) and oxidant storage tank (42)；Wherein,
The entrance of the pressurizer (41) is connected with the oxidant storage tank (42), the outlet of the pressurizer (41) with
The reactor (31) is connected.
8. Graphene preparation facilitiess according to claim 7, it is characterised in that the pressurizer (41) and the reaction
Check valve (5) is provided with the connecting pipe of kettle (31).
9. Graphene preparation facilitiess according to claim 6, it is characterised in that also include：Chiller (6), blood pressure lowering dress
Put (7) and receive tank (8)；Wherein, the reactor (31), the chiller (6), the dropping equipment (7) and described connect
Closed cans (8) is sequentially connected.
10. Graphene preparation facilitiess according to claim 9, it is characterised in that the reactor (31) and the cooling
The 3rd stop valve (9) is provided with connecting pipe between device (6).
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