CN205988843U - A kind of photoresistance fluid reservoir and Photoresisting coating machines - Google Patents
A kind of photoresistance fluid reservoir and Photoresisting coating machines Download PDFInfo
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- CN205988843U CN205988843U CN201620799658.8U CN201620799658U CN205988843U CN 205988843 U CN205988843 U CN 205988843U CN 201620799658 U CN201620799658 U CN 201620799658U CN 205988843 U CN205988843 U CN 205988843U
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- fluid reservoir
- seal case
- photoresistance
- coating
- glass substrate
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Abstract
The utility model discloses a kind of photoresistance fluid reservoir and Photoresisting coating machines, including seal case, it is connected with fluid reservoir at the inlet on the seal case left side, control panel is also equipped with seal case, liquid crystal touch screen is inlaid with control panel, it is coated with shading coating on seal case and the outer wall of fluid reservoir, the top of fluid reservoir is connected with closure, electromagnetic valve is provided with closure, the outfan of electromagnetic valve is connected with catheter, seal case inlet goes out to be provided with force (forcing) pump, the outfan of force (forcing) pump is connected with high pressure nozzle, the bottom of seal case is provided with glass substrate, the inner side edge of glass substrate is fixed with bracing frame, airblade coating device is socketed with bracing frame, the tail end of glass substrate is connected with drying baker；Embedded microprocessor is installed inside control panel, embedded microprocessor is connected with data acquisition unit and power governor.This utility model can effectively reduce photoresistance loss and improve product quality and production efficiency.
Description
Technical field
This utility model is related to coating machine technical field, specially a kind of photoresistance fluid reservoir and Photoresisting coating machines.
Background technology
Photoresistance, also known as photoresist, are light-sensitive materials being used in many industrial process.Photoresistance has two kinds, positive
Photoresistance and negative sense photoresistance, are usually used in making photoresist, are coated onto on paper or other planar objects carrying out using coating machine
Use.Because photoresistance is very sensitive to light, in coating process, therefore often result in very big loss.Existing coating machine is mostly
Complex structure, troublesome poeration, and because tedious process does not have good protective measure, increase photoresistance loss further.
Utility model content
For problem above, this utility model provides a kind of photoresistance fluid reservoir and Photoresisting coating machines, effectively reduces photoresistance
Loss, improves product quality and production efficiency, can be with the problem in effectively solving background technology.
For achieving the above object, this utility model provides following technical scheme：A kind of photoresistance fluid reservoir and Photoresisting coating machines,
Including seal case, it is connected with fluid reservoir at the inlet on the described seal case left side, seal case is also equipped with chain of command
Plate, described control panel is inlaid with liquid crystal touch screen, described seal case and the outer wall of fluid reservoir is coated with shading coating,
The top of described fluid reservoir is connected with closure, and described closure is provided with electromagnetic valve, and the outfan of described electromagnetic valve connects
There is catheter, the inlet of seal case is entered in the other end grafting of described catheter；Described seal case inlet goes out to be provided with
Force (forcing) pump, the outfan of described force (forcing) pump is connected with high pressure nozzle, and the bottom of described seal case is provided with glass substrate, described
The inner side edge of glass substrate is fixed with bracing frame, and support frame as described above is socketed with airblade coating device, and the tail end of glass substrate connects
There is drying baker；Inside described control panel, embedded microprocessor is installed, described embedded microprocessor is connected with data and adopts
Storage and power governor.
As a kind of preferred technical scheme of this utility model, described airblade coating device includes air knife body, described air knife body
Back high pressure air rifle is installed, the control end of described high pressure air rifle is connected to power governor.
As a kind of preferred technical scheme of this utility model, the bottom of described drying baker is provided with electromagnetic heater, institute
The outfan stating electromagnetic heater is also connected to power governor.
As a kind of preferred technical scheme of this utility model, described data acquisition unit connects pressure transducer and temperature passes
Sensor, pressure transducer and temperature sensor are separately mounted in force (forcing) pump and drying baker.
Compared with prior art, the beneficial effects of the utility model are：This photoresistance fluid reservoir and Photoresisting coating machines, by setting
Put fluid reservoir, closure and seal case, by spraying shading coating in fluid reservoir and seal case outer wall, greatly improve shading
Ability reduces photoresistance loss；By arranging force (forcing) pump and high pressure nozzle, coating is sprayed at a high speed makes spraying more uniform；By setting
Put airblade coating device so that having that adaptability is good, and the high characteristic of coating quality, there is no the impact of pressure to coating；By setting
Put embedded microprocessor, realize automatically controlling and adjusting using electromagnetic valve and power governor；This utility model can be effective
Reduce photoresistance loss, improve product quality and production efficiency.
Brief description
Fig. 1 is this utility model structural representation；
Fig. 2 is this utility model cross-sectional view.
In figure：1- seal case；2- fluid reservoir；3- control panel；4- liquid crystal touch screen；5- shading coating；6- closure；
7- electromagnetic valve；8- catheter；9- force (forcing) pump；10- high pressure nozzle；11- glass substrate；12- bracing frame；13- airblade coating device；
14- drying baker；15- embedded microprocessor；16- data acquisition unit；17- power governor；18- air knife body；19- high pressure gas
Rifle；20- electromagnetic heater；21- pressure transducer；22- temperature sensor.
Specific embodiment
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out
Clearly and completely description is it is clear that described embodiment is only a part of embodiment of this utility model rather than whole
Embodiment.Based on the embodiment in this utility model, those of ordinary skill in the art are not under the premise of making creative work
The every other embodiment being obtained, broadly falls into the scope of this utility model protection.
Embodiment：
Refer to Fig. 1 and Fig. 2, this utility model provides a kind of technical scheme：A kind of photoresistance fluid reservoir and Photoresisting coating machines,
Including seal case 1, at the inlet on described seal case 1 left side, it is connected with fluid reservoir 2, seal case 1 is also equipped with control
Panel 3 processed, described control panel 3 is inlaid with liquid crystal touch screen 4, described seal case 1 and the outer wall of fluid reservoir 2 is coated with
Shading coating 5, the top of described fluid reservoir 2 is connected with closure 6, and described closure 6 is provided with electromagnetic valve 7, described electromagnetism
The outfan of valve 7 is connected with catheter 8, and the inlet of seal case 1 is entered in the other end grafting of described catheter 8；Described sealing
Casing 1 inlet goes out to be provided with force (forcing) pump 9, and the outfan of described force (forcing) pump 9 is connected with high pressure nozzle 10, described seal case 1
Bottom glass substrate 11 is installed, the inner side edge of described glass substrate 11 is fixed with bracing frame 12, on support frame as described above 12 cover
It is connected to airblade coating device 13, the tail end of glass substrate 11 is connected with drying baker 14；It is provided with embedded inside described control panel 3
Microprocessor 15, described embedded microprocessor 15 is connected with data acquisition unit 16 and power governor 17；
Described airblade coating device 13 includes air knife body 18, and the back of described air knife body 18 is provided with high pressure air rifle 19, described
The control end of high pressure air rifle 19 is connected to power governor 17；The bottom of described drying baker 14 is provided with electromagnetic heater 20, institute
The outfan stating electromagnetic heater 20 is also connected to power governor 17；Described data acquisition unit 16 connects pressure transducer 21 He
Temperature sensor 22, pressure transducer 21 and temperature sensor 22 are separately mounted in force (forcing) pump 9 and drying baker 14.
Operation principle of the present utility model：Described seal case 1 is used for installing all of coating mechanism, described fluid reservoir 2
For storing photoresistance coating, seal case 1 and the outer wall of fluid reservoir 2 are coated with shading coating 5, light direct projection can be avoided,
Thus effectively reducing photoresistance loss；Described control panel 3 is used for carrying out being automatically brought into operation control, and described liquid crystal touch screen 4 was both permissible
Realize order input operation it is also possible to realize showing in real time；Described closure 6 is used for improving the sealing property of fluid reservoir 2；
During work, select mode of operation first, after described embedded microprocessor 15 receives work order, drive electromagnetism
Valve 7 is opened, and starts force (forcing) pump 9, is extracted out photoresistance coating by catheter 8 and pressurizeed from fluid reservoir 2, recycles
Coating is uniformly sprayed at a high speed by high pressure nozzle 10；On described glass substrate 11, tiling has paper to be coated, and coating sprays to paper
After opening upper surface, start airblade coating device 13, described high pressure air rifle 19 sprays gases at high pressure, and gases at high pressure are narrow from air knife body 18
Rapidly it is extruded into powerful air-flow in seam, effectively coating can be uniformly pressed into paper surface；Coating complete due to apply
Material is not dry, then opens electromagnetic heater 20, by coating drying forming in drying baker 14；
Described embedded microprocessor 15 is used for carrying out data acquisition and output control order, described pressure transducer 21 He
Temperature sensor 22 gathers the temperature value in the pressure value and drying baker 14 of force (forcing) pump 9 respectively, and described data acquisition unit 16 will be adopted
The data collecting carries out analog digital conversion, and data after conversion is sent into embedded microprocessor 15 and is compared with setting value, when going out
Then control power governor 17 that high pressure air rifle 19 and electromagnetic heater 20 are adjusted during existing deviation, to improve control accuracy guarantor
Card product quality.
This photoresistance fluid reservoir and Photoresisting coating machines, by arranging fluid reservoir 2, closure 6 and seal case 1, by storage
Flow container 2 and seal case 1 outer wall spraying shading coating 5, greatly improve light shielding ability and reduce photoresistance loss；By arranging force (forcing) pump
9 and high pressure nozzle 10, coating is sprayed at a high speed makes spraying more uniform；By arranging airblade coating device 13 so that having adaptation
Property is good, and the high characteristic of coating quality, does not have the impact of pressure to coating；By arranging embedded microprocessor 15, using electricity
Magnet valve 7 and power governor 17 are realized automatically controlling and adjusting；This utility model can effectively reduce photoresistance loss, improves product
Quality and production efficiency.
The foregoing is only preferred embodiment of the present utility model, not in order to limit this utility model, all this
Any modification, equivalent and improvement made within the spirit of utility model and principle etc., should be included in this utility model
Protection domain within.
Claims (4)
1. a kind of photoresistance fluid reservoir and Photoresisting coating machines, including seal case (1), the inlet on described seal case (1) left side
Place is connected with fluid reservoir (2), seal case (1) is also equipped with control panel (3), described control panel (3) is inlaid with liquid
Brilliant touch screen (4) it is characterised in that：It is coated with shading coating (5), institute on described seal case (1) and the outer wall of fluid reservoir (2)
The top stating fluid reservoir (2) is connected with closure (6), and described closure (6) is provided with electromagnetic valve (7), described electromagnetic valve (7)
Outfan be connected with catheter (8), the inlet of seal case (1) is entered in the other end grafting of described catheter (8)；Described close
Joint sealing body (1) inlet goes out to be provided with force (forcing) pump (9), and the outfan of described force (forcing) pump (9) is connected with high pressure nozzle (10), described
The bottom of seal case (1) is provided with glass substrate (11), and the inner side edge of described glass substrate (11) is fixed with bracing frame (12),
Airblade coating device (13) is socketed with support frame as described above (12), the tail end of glass substrate (11) is connected with drying baker (14)；Described
Inside control panel (3), embedded microprocessor (15) is installed, described embedded microprocessor (15) is connected with data acquisition
Device (16) and power governor (17).
2. a kind of photoresistance fluid reservoir according to claim 1 and Photoresisting coating machines it is characterised in that：Described airblade coating device
(13) include air knife body (18), the back of described air knife body (18) is provided with high pressure air rifle (19), described high pressure air rifle (19)
Control end is connected to power governor (17).
3. a kind of photoresistance fluid reservoir according to claim 1 and Photoresisting coating machines it is characterised in that：Described drying baker (14)
Bottom electromagnetic heater (20) is installed, the outfan of described electromagnetic heater (20) is also connected to power governor (17).
4. a kind of photoresistance fluid reservoir according to claim 1 and Photoresisting coating machines it is characterised in that：Described data acquisition unit
(16) pressure transducer (21) and temperature sensor (22) are connected, pressure transducer (21) and temperature sensor (22) are respectively mounted
In force (forcing) pump (9) and drying baker (14).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620799658.8U CN205988843U (en) | 2016-07-26 | 2016-07-26 | A kind of photoresistance fluid reservoir and Photoresisting coating machines |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620799658.8U CN205988843U (en) | 2016-07-26 | 2016-07-26 | A kind of photoresistance fluid reservoir and Photoresisting coating machines |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205988843U true CN205988843U (en) | 2017-03-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620799658.8U Active CN205988843U (en) | 2016-07-26 | 2016-07-26 | A kind of photoresistance fluid reservoir and Photoresisting coating machines |
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| CN (1) | CN205988843U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108187979A (en) * | 2018-01-31 | 2018-06-22 | 京东方科技集团股份有限公司 | A kind of photoresist glue feed system and coating machine |
-
2016
- 2016-07-26 CN CN201620799658.8U patent/CN205988843U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108187979A (en) * | 2018-01-31 | 2018-06-22 | 京东方科技集团股份有限公司 | A kind of photoresist glue feed system and coating machine |
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Photoresistance liquid storage pot and photoresistance coating machine Effective date of registration: 20171108 Granted publication date: 20170301 Pledgee: Pudong Shanghai Development Bank, Limited by Share Ltd Huizhou branch Pledgor: Hao Ming Science and Technology Co., Ltd. of Huizhou City Registration number: 2017440000123 |