CN205718299U - Four-foot anti-seismic silicon wafer drying machine - Google Patents
Four-foot anti-seismic silicon wafer drying machine Download PDFInfo
- Publication number
- CN205718299U CN205718299U CN201620453352.7U CN201620453352U CN205718299U CN 205718299 U CN205718299 U CN 205718299U CN 201620453352 U CN201620453352 U CN 201620453352U CN 205718299 U CN205718299 U CN 205718299U
- Authority
- CN
- China
- Prior art keywords
- foot
- silicon wafer
- antidetonation
- wafer drying
- chassis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 37
- 239000010703 silicon Substances 0.000 title claims abstract description 37
- 238000001035 drying Methods 0.000 title claims abstract description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims description 5
- 230000007797 corrosion Effects 0.000 claims description 4
- 238000005260 corrosion Methods 0.000 claims description 4
- 229910001018 Cast iron Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000011010 flushing procedure Methods 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 5
- 238000003912 environmental pollution Methods 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 17
- 239000011435 rock Substances 0.000 description 4
- 206010044565 Tremor Diseases 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000012857 repacking Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 210000003437 trachea Anatomy 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
Abstract
The utility model relates to a four feet antidetonation silicon chip drier. Mainly solves the problem that the drying machine is easy to vibrate. The four-foot anti-seismic silicon wafer spin dryer further comprises four buffer devices, four machine feet, a machine foot seat and foot frames, the four machine feet are arranged on the periphery of the machine foot seat in a square mode and fixed through screws, each buffer device comprises an oscillating bar and an elastic piece, the elastic pieces are arranged on the oscillating bars, the lower ends of the oscillating bars are movably connected with the foot frames, and the upper ends of the oscillating bars are movably connected with the machine feet. The four-foot anti-seismic silicon wafer drying machine is good in drying effect, high in speed, not prone to shaking and shaking, low in noise, capable of effectively improving product quality and machine stability, simple in structure, free of environmental pollution, easy to popularize and the like.
Description
Technical field
This utility model relates to a kind of drier, is specifically related to a kind of four foot antidetonation silicon wafer drying machines.
Background technology
Silicon wafer drying machine be in the production process of solar silicon wafers through commonly used equipment, its Main Function is at silicon
It is dried after having cleaned by sheet, be dried quality can directly influence the quality of product.
Traditional silicon wafer drying machine is the most usually because silicon chip is put uneven, and it is former heavily to be differed in both sides
Cause, easily makes under-chassis shake when rotating, and the problem that turning barrel rocks easily produces noise, affects working environment and machine
Service life.
Utility model content
In order to overcome the deficiency of background technology, this utility model provides a kind of four foot antidetonation silicon wafer drying machines, mainly solves
Drier is susceptible to the problem of vibrations, and this four feet antidetonation silicon wafer drying machine drying effect is good, and speed is fast, is difficult to rock and shake
Quivering, noise is little, effectively raises product quality and mechanical stability against short circuit, has simple in construction, free from environmental pollution, it is easy to popularization etc.
Advantage.
This utility model be the technical scheme is that a kind of four foot antidetonation silicon wafer drying machines, including body, organism bottom
Discharge outlet, end cap, drive mechanism and the turning barrel that is connected with drive mechanism, be provided with silicon wafer carrying device, institute in described turning barrel
Having cavity in the body stated, described turning barrel is placed in cavity, and described turning barrel wall is provided with apopore, and four described feet resist
Shake silicon wafer drying machine also includes buffer unit, under-chassis, under-chassis seat and foot rest, and described under-chassis is four, and four under-chassis become pros
The mode of shape is arranged in is placed outside under-chassis seat and is fixed by screw, and described buffer unit includes fork and elastic component, described
Elastic component is arranged on fork, and described fork lower end is flexibly connected with foot rest, and fork upper end is flexibly connected with under-chassis.
Further, described end cap having through hole, through hole top seal connects has air inlet pipe, in described air inlet pipe
Connecting and have elevated pressure nitrogen source of the gas and firing equipment, through hole lower end connects cylindrical shower nozzle, and described cylindrical shower nozzle is covered with spray
Mouth.
Further, described body wall is welded with fixed block, be provided with between described fixed block and fixed block roller bearing and
Scroll wheel, described scroll wheel outer surface fits with turning barrel outer surface.
Further, electric heater unit and heat-insulation layer it are provided with in described end cap.
Further, described air inlet pipe and discharge outlet are respectively equipped with the first electromagnetic valve and the second electromagnetic valve.
Further, described body inwall is provided with temperature sensor.
Further, described body and under-chassis are made up of SUS304 corrosion resistant plate, and described runners is made of cast iron.
Further, four described foot antidetonation silicon wafer drying machines also include that PLC controls controller, the first described electromagnetism
Valve, the second electromagnetic valve, temperature sensor, drive mechanism and electric heater unit are all connected with PLC.
The beneficial effects of the utility model are: owing to taking technique scheme, and this four feet antidetonation silicon wafer drying machine is dried
Effective, speed is fast, is difficult to rock and tremble, and noise is little, effectively raises product quality and mechanical stability against short circuit, has structure
Simply, free from environmental pollution, it is easy to the advantages such as popularization.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
In figure 1, body；2, discharge outlet；3, end cap；4, drive mechanism；5, turning barrel；6, silicon wafer carrying device；7, apopore；
8, under-chassis；9, under-chassis seat；10, foot rest；11, fork；12, elastic component；13, through hole；14, air inlet pipe；15, elevated pressure nitrogen source of the gas；16、
Firing equipment；17, cylindrical shower nozzle；18, nozzle；19, fixed block；20, roller bearing；21, scroll wheel；22, electric heater unit；23、
Heat-insulation layer；24, the first electromagnetic valve；25, the second electromagnetic valve；26, temperature sensor；27, buffer unit.
Below in conjunction with the accompanying drawings this utility model embodiment is described further.
As it is shown in figure 1, a kind of four foot antidetonation silicon wafer drying machines, including the discharge outlet 2 bottom body 1, body 1, end cap 3,
Drive mechanism 4 and the turning barrel 5 being connected with drive mechanism 4, be provided with silicon wafer carrying device 6, described body 1 in described turning barrel 5
Inside having cavity, described turning barrel 5 is placed in cavity, and described turning barrel 5 wall is provided with apopore 7, four described foot antidetonation silicon
Sheet drier also includes buffer unit 27, under-chassis 8, under-chassis seat 9 and foot rest 10, and described under-chassis 8 is four, and four under-chassis 8 become
Foursquare mode is arranged in is placed outside under-chassis seat 9 and is fixed by screw, and described buffer unit 27 includes fork 11 and bullet
Property part 12, described elastic component 12 is arranged on fork 11, and described fork 11 lower end is flexibly connected with foot rest 10, fork 11 upper end
Being flexibly connected with under-chassis 8, the active force produced after turning barrel 5 motion is by fork 11 and the common effect of elastic component 12, it is possible to disappear
The power of trembling of consumption drier, reduces noise, Optimization Work environment, it is possible to make whole drier more stable.
Preferably, described end cap 3 having through hole 13, through hole 13 top seal connects air inlet pipe 14, and described enters
Connecting on trachea 14 and have elevated pressure nitrogen source of the gas 15 and firing equipment 16, through hole 13 lower end connects cylindrical shower nozzle 17, described circle
Being covered with nozzle 18 on cylindricality shower nozzle 17, the diameter of nozzle 18 is between 0.5mm ~ 2mm, and diameter is little that nozzle 18 can be formed more
Strong air-flow, can accelerate the flowing of gas in body 1, increase dry speed；It is welded with fixed block on described body 1 wall
19, it is provided with roller bearing 20 and scroll wheel 21 between described fixed block 19 and fixed block 19, outside described scroll wheel 21 outer surface is with turning barrel 5
Surface fits, and work when, scroll wheel 21 can be followed turning barrel 5 and rotated together, it is possible to effectively prevent turning barrel about 5
Beat and shake, effectively reduce the noise of machine.
Preferably, being provided with electric heater unit 22 and heat-insulation layer 23 in described end cap 3, during work, electric heater unit 22 leaves
Beginning work, improves the temperature within body 1, it is possible to increase the speed that silicon chip surface is dried, and heat-insulation layer 23 can reduce in body 1
Heat losses, accelerate the rate of drying of silicon chip and dry mass.
Preferably, described air inlet pipe 14 and discharge outlet 2 are respectively equipped with the first electromagnetic valve 24 and the second electromagnetic valve 25；Institute
Body 1 inwall stated is provided with temperature sensor 26；Described body 1 and under-chassis 8 are made up of SUS304 corrosion resistant plate, SUS304
Body 1 and under-chassis 8 that corrosion resistant plate is made make drier more sturdy and durable, and described under-chassis seat 9 is made of cast iron, and makes drying
Machine is more stable.
Preferably, four described foot antidetonation silicon wafer drying machines also include that PLC controls controller, the first described electromagnetic valve
24, the second electromagnetic valve 25, temperature sensor 26, drive mechanism 4 and electric heater unit 22 are all connected with PLC, are being dried
During, temperature sensor 26 can reflect the temperature conditions in body 1 in real time and pass to PLC control centre, when temperature mistake
The when of high, it will stop the heating to body 1.
Its work process is as described below: drying when, the first electromagnetic valve 24 opened in air inlet pipe 14 is passed through high pressure
Nitrogen, and open firing equipment 16 nitrogen is heated, simultaneously under turning barrel 5 high speed rotating, utilize centrifugal force to do
Dry, be passed through high pressure nitrogen can be formed steady air flow take away steam improve drying effect rate of drying, above control process is equal
PLC control centre is had to realize Automated condtrol.
This four feet antidetonation silicon wafer drying machine drying effect is good, and speed is fast, is difficult to rock and tremble, and noise is little, effectively carries
High product quality and mechanical stability against short circuit, have simple in construction, free from environmental pollution, it is easy to the advantages such as popularization.
Every technical staff's notice: although this utility model describes according to above-mentioned detailed description of the invention, but this
The invention thought of utility model is not limited to that utility model, the repacking of any utilization inventive concept, all will include this in specially
In profit scope of patent protection.
Claims (8)
1. a foot antidetonation silicon wafer drying machine, it is characterised in that: include body, the discharge outlet of organism bottom, end cap, driver
Structure and the turning barrel being connected with drive mechanism, be provided with silicon wafer carrying device in described turning barrel, has cavity, institute in described body
The turning barrel stated is placed in cavity, and described turning barrel wall is provided with apopore, and four described foot antidetonation silicon wafer drying machines also include delaying
Flushing device, under-chassis, under-chassis seat and foot rest, described under-chassis is four, and four under-chassis become foursquare mode to be arranged in under-chassis seat
Placing outward and fixed by screw, described buffer unit includes that fork and elastic component, described elastic component are arranged on fork, institute
The fork lower end stated is flexibly connected with foot rest, and fork upper end is flexibly connected with under-chassis.
Four foot antidetonation silicon wafer drying machines the most according to claim 1, it is characterised in that: have through hole on described end cap,
Through hole top seal connects air inlet pipe, and described air inlet pipe connects elevated pressure nitrogen source of the gas and firing equipment, and through hole lower end is even
It is connected to cylindrical shower nozzle, described cylindrical shower nozzle is covered with nozzle.
Four foot antidetonation silicon wafer drying machines the most according to claim 1, it is characterised in that: it is welded with solid in described body wall
Determining block, be provided with roller bearing and scroll wheel between described fixed block and fixed block, described scroll wheel outer surface is affixed with turning barrel outer surface
Close.
Four foot antidetonation silicon wafer drying machines the most according to claim 2, it is characterised in that: it is provided with electrical heating in described end cap
Device and heat-insulation layer.
Four foot antidetonation silicon wafer drying machines the most according to claim 4, it is characterised in that: in described air inlet pipe and discharge outlet
It is respectively equipped with the first electromagnetic valve and the second electromagnetic valve.
Four foot antidetonation silicon wafer drying machines the most according to claim 5, it is characterised in that: described body inwall is provided with temperature
Degree sensor.
Four foot antidetonation silicon wafer drying machines the most according to claim 1, it is characterised in that: described body and under-chassis by
SUS304 corrosion resistant plate is made, and described runners is made of cast iron.
Four foot antidetonation silicon wafer drying machines the most according to claim 6, it is characterised in that:
Four described foot antidetonation silicon wafer drying machines also include that PLC controls controller, described the first electromagnetic valve, the second electromagnetic valve,
Temperature sensor, drive mechanism and electric heater unit are all connected with PLC.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620453352.7U CN205718299U (en) | 2016-05-18 | 2016-05-18 | Four-foot anti-seismic silicon wafer drying machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620453352.7U CN205718299U (en) | 2016-05-18 | 2016-05-18 | Four-foot anti-seismic silicon wafer drying machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205718299U true CN205718299U (en) | 2016-11-23 |
Family
ID=57299615
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620453352.7U Expired - Fee Related CN205718299U (en) | 2016-05-18 | 2016-05-18 | Four-foot anti-seismic silicon wafer drying machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205718299U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108981294A (en) * | 2018-07-03 | 2018-12-11 | 金寨崟鑫电子科技有限公司 | Dehydration device after a kind of cleaning of diode |
-
2016
- 2016-05-18 CN CN201620453352.7U patent/CN205718299U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108981294A (en) * | 2018-07-03 | 2018-12-11 | 金寨崟鑫电子科技有限公司 | Dehydration device after a kind of cleaning of diode |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP02 | Change in the address of a patent holder |
Address after: 325000 No. twelve, No. 500 Binhai Road, Wenzhou economic and Technological Development Zone, Zhejiang Patentee after: Zhejiang shun new energy Co. Ltd. Address before: The streets of Yongxing Yongle Village in Longwan District of Wenzhou City, Zhejiang province 325000 Hing Road No. 51 Patentee before: Zhejiang shun new energy Co. Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20161123 Termination date: 20190518 |