CN205538723U - Optical element absorbs test system of defect damage characteristic - Google Patents
Optical element absorbs test system of defect damage characteristic Download PDFInfo
- Publication number
- CN205538723U CN205538723U CN201620345947.0U CN201620345947U CN205538723U CN 205538723 U CN205538723 U CN 205538723U CN 201620345947 U CN201620345947 U CN 201620345947U CN 205538723 U CN205538723 U CN 205538723U
- Authority
- CN
- China
- Prior art keywords
- optical element
- damage
- measured
- defect
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn - After Issue
Links
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The utility model provides an optical element absorbs test system of defect damage characteristic belongs to the damage characteristic test field that optical element absorbs the defect. Optical element absorbs test system of defect damage characteristic includes light and heat weak absorption testing arrangement, damage testing light source and damage monitoring microscope. The absorption defect that light and heat weak absorption testing arrangement is used for testing the optical element that awaits measuring is to pumping light absorption value. The damage testing light source be used for sending the damage testing lasing in optical element awaits measuring absorb the fault location. Damage monitoring microscope is used for acquireing optical element awaits measuring it is in to absorb the defect damage characteristic under the effect of damage testing laser. Therefore, the utility model discloses can realize absorbing the optical element that awaits measuring the sign of the damaging ability of defect effectively, and then obtain to await measuring the absorption level of optical element's absorption defect and the quantitative relationship of damage characteristic.
Description
Technical field
This utility model relates to the damage feature field tests of optical element native defect, concrete and
Speech, relates to the test system of a kind of optical element native defect damage feature.
Background technology
The absorption-type defect that growth, manufacture or the course of processing introduce is to cause optical element to occur to swash
The main cause of photic damage.Native defect is a kind of, but all incident laser is had suction
The general name of the defect of receipts ability.The absorption level of absorbability defect is higher than the Intrinsic Gettering of material
Value.Owing to the native defect yardstick of optical element is the least, typically in micron dimension, it is not easy to quilt
Detect, cause the difficulty that native defect carries out damage measure bigger.Therefore, although absorb
Type defect causes the accreditation of damage from laser Yi Huo educational circles, but defect absorbs level and its damage performance
Relation is still not clear.
Utility model content
The purpose of this utility model is to provide a kind of optical element native defect damage feature
Test system, effectively improves the problems referred to above.
To achieve these goals, the technical scheme that this utility model embodiment uses is as follows:
This utility model embodiment provides the survey of a kind of optical element native defect damage feature
Test system, micro-including photo-thermal weak absorbing test device, damage measure light source and damage monitoring
Mirror.Described photo-thermal weak absorbing test device is for testing the native defect point pair of optical element to be measured
The absorption value of pump light.Described damage measure light source is used for sending damage measure laser action in institute
State at the described native defect point of optical element to be measured.Described damage monitoring microscope is used for obtaining
The described native defect point of described optical element to be measured is under the effect of described damage measure laser
Damage feature.
Preferably, described photo-thermal weak absorbing test device includes off-axis paraboloidal mirror, sample stage, spy
Surveying device, probe source and pump light source, described optical element to be measured is arranged on described sample stage,
Described sample stage is for regulating the position of described optical element to be measured.Described probe source is for sending out
Go out to detect light to focus at the described native defect point of described optical element to be measured.Described off-axis throwing
Object lens send for pump light and the described damage measure light source described pump light source sent
Damage measure laser all focus at described native defect point.Described detector is for receiving also
Analyze the detection light through described optical element to be measured and obtain the absorption of described optical element to be measured
The defect absorption value to described pump light.
Preferably, the test system of described optical element native defect damage feature also includes light beam
Coupling mirror.Pump light that described pump light source sends and the damage that described damage measure light source sends
Testing laser all incides described off-axis paraboloidal mirror by described light beam coupling mirror, through described off axis
Focus on after parabolic lens reflection at the native defect point of described optical element to be measured.Wherein, incident
To described off-axis paraboloidal mirror described pump light optical axis with incide described off-axis paraboloidal mirror
The optical axis of described damage measure laser all with default optical axis coincidence, and described default optical axis is with described
The optical axis coincidence or parallel of off-axis paraboloidal mirror.
Preferably, described probe source includes laser instrument and expands shaping member, described laser instrument
The detection light sent through described expand shaping member expand Shape correction after focus on described
At the native defect of optical element to be measured.
Preferably, described photo-thermal weak absorbing test device also includes that reflecting mirror, described reflecting mirror set
Expanding between shaping member and described sample stage described in being placed in, described reflecting mirror is used for will be through institute
State and expand shaping member and expand the suction to described optical element to be measured of the detection luminous reflectance after shaping
Receipts fault location focuses on.
Preferably, described laser instrument is helium neon laser.
Preferably, described detector includes filtering component, photodetector, signal amplification circuit
And data process component.Described filtering component, described photodetector, described signal amplify electricity
Road and described data process component and couple successively.Detection light through described optical element to be measured depends on
Secondary after the Filtering Processing of described filtering component, enter described photodetector, through described photoelectricity
Detector is converted to the signal of telecommunication, and the described signal of telecommunication is amplified into institute through described signal amplification circuit
State data and process component.
Preferably, described filtering component includes collecting lens and diaphragm, described treat photometry unit
The detection light of part outgoing, incides described light after sequentially passing through described collecting lens and described diaphragm
Electric explorer.
Preferably, described signal amplification circuit is lock-in amplifier.
Preferably, also to include that optical filtering component, described optical filtering component are arranged on described for described detector
Between optical element to be measured and described filtering component.
The test system of the optical element native defect damage feature that this utility model embodiment provides
System, on the one hand can be by the native defect of photo-thermal weak absorbing device detection optical element to be measured
Particular location, and then by damage measure laser and the damage monitoring microscope damage to native defect
Hinder performance to characterize；On the other hand, can record to be measured respectively by photo-thermal weak absorbing device
The absorption level of multiple native defects of optical element, and by damage measure laser and damage prison
Survey microscope and record the damage performance of the plurality of native defect respectively, thus obtain and treat photometry
The absorption level of the native defect of element and the quantitative relationship of damage performance.
Other feature and advantage of the present utility model will illustrate in description subsequently, and, portion
Ground is divided to become apparent from description, or by enforcement this utility model embodiment
Solve.The purpose of this utility model and other advantages can be by the description write, claim
Structure specifically noted in book and accompanying drawing realizes and obtains.
Accompanying drawing explanation
In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art,
The accompanying drawing used required in embodiment will be briefly described below, it should be apparent that under,
Accompanying drawing during face describes is only embodiments more of the present utility model, skill common for this area
From the point of view of art personnel, on the premise of not paying creative work, it is also possible to obtain according to these accompanying drawings
Obtain other accompanying drawing.Shown in accompanying drawing, above and other purpose of the present utility model, feature
To become apparent from advantage.The part that reference instruction identical in whole accompanying drawings is identical.
The most deliberately draw accompanying drawing by actual size equal proportion scaling, it is preferred that emphasis is this utility model is shown
Purport.
Fig. 1 shows that a kind of optical element native defect that this utility model embodiment provides damages
The structural representation of the test system of Flaw characterization；
Fig. 2 shows the another kind of optical element native defect that this utility model embodiment provides
The structural representation of the test system of damage feature.
In figure, reference is respectively as follows:
Pump light source 110；Damage measure light source 120；Probe source 130；Beam merging apparatus 140；
Expand shaping member 150；Sample stage 160；Optical element 170 to be measured；Detector 180；Filter
Ripple component 181；Photodetector 182；Signal amplification circuit 183；Data process component 184；
Damage monitoring microscope 190；Reflecting mirror 210；Light beam coupling mirror 220；Off-axis paraboloidal mirror 230.
Detailed description of the invention
Below in conjunction with the accompanying drawing in this utility model embodiment, in this utility model embodiment
Technical scheme carry out clear, complete description, it is clear that described embodiment be only this
The a part of embodiment of utility model rather than whole embodiments.Based in this utility model
Embodiment, those of ordinary skill in the art are obtained under not making creative work premise
Every other embodiment, broadly falls into the scope of this utility model protection.
Owing to the native defect yardstick of optical element is the least, typically in micron dimension, it is not easy to quilt
Detect, cause the difficulty that native defect carries out damage measure bigger.Therefore, although absorb
Type defect causes the accreditation of damage from laser Yi Huo educational circles, but defect absorbs level and its damage performance
Relation is still not clear.Absorb in consideration of it, this utility model embodiment provides a kind of optical element
The test system of defect damage characteristic, it is possible to be effectively realized the damage of optical element native defect
The sign of characteristic.
As it is shown in figure 1, this utility model embodiment provides a kind of optical element native defect damage
The test system of characteristic.The system of described sign optical element native defect damage feature includes light
Hot weak absorbing test device, damage measure light source 120 and damage monitoring microscope 190.Its
In, photo-thermal weak absorbing test device is for testing the native defect of optical element 170 to be measured to pump
The absorption value of Pu light.Described damage measure light source 120 be used for sending damage measure laser action in
At the described native defect of described optical element to be measured 170.Described damage monitoring microscope 190
Swash at described damage measure for obtaining the described native defect of described optical element to be measured 170
Damage feature under the effect of light.
Such as, photo-thermal weak absorbing test device can include pump light source 110, probe source
130, sample stage 160 and detector 180.Wherein, sample stage 160 treats light-metering for placement
Learn element 170 and regulate the position of optical element 170 to be measured.The pump that pump light source 110 sends
Pu light focuses at the default tested point of optical element 170 to be measured, and probe source 130 sends
Detection light also focuses at described default tested point.By detector 180 detection through treating light-metering
Learn the intensity distributions of the detection light of element 170, thus analyze and obtain treating at described default tested point
The photometry element 170 absorption value to pump light.Photometry unit will be treated at described default tested point
The Intrinsic Gettering value ratio of the part 170 absorption value to pump light and described optical element 170 to be measured
Relatively.At described default tested point, optical element 170 to be measured is higher than institute to the absorption value of pump light
When stating the Intrinsic Gettering value of optical element 170 to be measured, it is determined that this default tested point lacks for absorbing
Fall into, obtain this native defect absorption value to pump light.
Further, close pump light source 110, damage monitoring microscope 190 is focused on light
At the native defect that hot weak absorbing test device is detected.It should be noted that the present embodiment
In, detection light is visible ray.On the one hand detection light may be used for positioning optical element 170 to be measured
The position of native defect, in order to damage monitoring microscope 190 can accurate focus on
At native defect.On the other hand, it is the micro-of non-automatic light source when damage monitoring microscope 190
During mirror, detection light can be as the light source of damage monitoring microscope 190.Open damage measure light
Source 120, damage measure laser that damage measure light source 120 sends also focuses on and is detected
At native defect.For example, it is possible to beforehand through beam merging apparatus 140 by damage measure light source 120
The damage measure laser sent and pumping combiner so that damage measure laser and the light of pump light
Axle overlaps, then makes the damage measure laser after closing bundle and pumping by expanding shaping member 150
Light all focuses at same position, and then can realize damage measure laser and also focus on and detected
At the native defect arrived.By the damage measure flow process of optical element, i.e. change damage measure light
The energy of the damage measure laser that source 120 sends, is observed by damage monitoring microscope 190 and treats
The degree of impairment of this native defect of photometry element 170, thus obtain the damage of this native defect
Hinder threshold value and damage image.
At described default tested point, the absorption value of pump light is less than by optical element 170 to be measured
Or when being equal to the Intrinsic Gettering value of described optical element 170 to be measured, then judge this default tested point
Non-absorbing defect, then regulate the position of optical element 170 to be measured by sample stage 160, continues
The next one is preset tested point detect, to search other of described optical element to be measured 170
The position of native defect, and record respectively the absorption level of other native defect, damage threshold and
Damage image.
Multiple native defects of optical element 170 to be measured are recorded respectively according to above-mentioned test process
Absorption level, damage threshold and damage image, it is thus achieved that optical element 170 native defect to be measured
The quantitative relationship of absorption level and damage feature.Therefore, in material and the processing of optical element
In the case of technique determines, it is thus achieved that the absorption level of this optical element native defect and damage feature
Relation after, for the optical element made under identical material and identical processing technique, Ke Yigen
The damage feature of native defect is judged according to the absorption level measuring this optical element native defect.
Therefore, the survey of the optical element native defect damage feature that this utility model embodiment provides
Test system, on the one hand can detect the suction of optical element 170 to be measured by photo-thermal weak absorbing device
Receive the particular location of defect, and then by damage measure laser and damage monitoring microscope 190
The damage performance of native defect is characterized；On the other hand, can be filled by photo-thermal weak absorbing
Put the absorption level of the multiple native defects recording optical element 170 to be measured respectively, and by damaging
Hinder testing laser and damage monitoring microscope 190 records the damage of the plurality of native defect respectively
Hinder performance, thus obtain the absorption level of the native defect of optical element 170 to be measured with damaging
The quantitative relationship of energy.
Preferably, in the present embodiment, damage monitoring microscope 190 for amplification more than 50
Optical microscope again.Such as, damage monitoring microscope 190 can be phase microscope, swash
Light induced fluorescence microscope etc..
Additionally, as in figure 2 it is shown, this utility model additionally provides another kind of optical element absorbs and lack
Fall into the test system of damage feature, including damage measure light source 120, damage monitoring microscope 190
Test device with photo-thermal weak absorbing, and described photo-thermal weak absorbing test device includes off-axis paraboloidal mirror
230, sample stage 160, detector 180, probe source 130 and pump light source 110.Described
Optical element 170 to be measured is arranged on described sample stage 160, and described sample stage 160 is used for adjusting
Save the position of described optical element to be measured 170.
The pump light that pump light source 110 sends incides off-axis paraboloidal mirror 230, throws through off-axis
Focus at the default tested point of optical element 170 to be measured after object lens 230 reflection, probe source
The detection light that 130 send also focuses at described default tested point.Detected by detector 180
Through the intensity distributions of the detection light of optical element 170 to be measured, thus analyze and obtain described presetting
The optical element 170 to be measured absorption value to pump light at tested point.And according to described default to be measured
At Dian, optical element 170 to be measured judges that to the absorption value of pump light whether this default tested point is
The native defect of optical element 170 to be measured.
When judging this default tested point as native defect, close pump light source 110, will damage
Monitoring microscope 190 focuses at the native defect of the optical element to be measured 170 detected.
Opening damage measure light source 120, the damage measure laser that damage measure light source 120 sends also enters
It is mapped to off-axis paraboloidal mirror 230, focuses on after being reflected by off-axis paraboloidal mirror 230 and detected
At native defect.It should be noted that incide the optical axis of the pump light of off-axis paraboloidal mirror 230
With incide off-axis paraboloidal mirror 230 damage measure laser optical axis all with default optical axis coincidence.
Wherein, described default optical axis and the optical axis coincidence of off-axis paraboloidal mirror 230 or parallel.Pass through optics
The damage measure flow process of element, i.e. changes the damage measure laser that damage measure light source 120 sends
Energy, by damage monitoring microscope 190 observe optical element 170 to be measured this absorption lack
The degree of impairment fallen into, thus obtain damage threshold and the damage image of this native defect.
Therefore, the another kind of optical element native defect damage spy that this utility model embodiment provides
Property test system can also obtain optical element native defect damage threshold and damage image,
Have effectively achieved the sign of damage performance to optical element native defect.
It should be noted that in the present embodiment, default tested point can be arranged on treats photometry unit
The surface of part 170, it is also possible to be arranged on the inside of optical element 170 to be measured, i.e. native system can
The damage performance on surface and absorbed inside defect to realize optical element 170 to be measured characterizes, and enters
And obtain the absorption level of the native defect of optical element 170 to be measured and the quantitative of damage feature
Relation.
So that incide the optical axis of the pump light of off-axis paraboloidal mirror 230 with incide off-axis
The optical axis of the damage measure laser of parabolic lens 230 all with default optical axis coincidence, described optical element
The test system of native defect damage feature also includes light beam coupling mirror 220.Described pump light source
The damage measure laser that 110 pump lights sent and described damage measure light source 120 send is the most logical
Cross described light beam coupling mirror 220 and incide described off-axis paraboloidal mirror 230.In the present embodiment, light
Bundle coupling mirror 220 can preferentially use light combination mirror, it is of course also possible to use other beam merging apparatus.
Concrete, probe source 130 can include laser instrument and expand shaping member 150.Swash
Light device send detection light through expanding shaping member 150 expand Shape correction after focus on
At the native defect of described optical element to be measured 170.Wherein, shaping member 150 is expanded concrete
Detector 180 for being sent by laser instrument carries out expanding, convergence processes, and focuses on to reduce
The facula area of the detection light on optical element 170 to be measured.Preferably, described laser instrument is permissible
Use helium neon laser.
Further, in order to optimize the optical element native defect that this utility model embodiment provides
The topology layout of the test system of damage feature, described photo-thermal weak absorbing test device also includes instead
Penetrate mirror 210.Reflecting mirror 210 is arranged at shaping and assembles between device and described sample stage 160,
Described reflecting mirror 210 is for assembling the detection light after device shaping convergence processes through shaping
Reflex to focus at the native defect of described optical element to be measured 170.
Concrete, in the present embodiment, detector 180 can include filtering component 181, photoelectricity
Detector 182, signal amplification circuit 183 and data process component 184.Filtering component 181,
Photodetector 182, signal amplification circuit 183 and data process component 184 and couple successively.
Detection light through described optical element 170 to be measured sequentially passes through at the filtering of filtering component 181
Enter photodetector 182 after reason, be converted to the signal of telecommunication, described electricity through photodetector 182
Signal is amplified into data through signal amplification circuit 183 and processes component 184.
Signal amplification circuit 183 is for putting the signal of telecommunication of photodetector 182 output
Greatly, in order to subsequent analysis.Such as, described signal amplification circuit 183 can be phase-locked amplification
Device, Boxcar integrator etc..When signal amplification circuit 183 is lock-in amplifier, detection
Device 180 also includes optical chopper.Described optical chopper is for providing ginseng for lock-in amplifier
Examine signal.Filtering component 181 can include collecting lens and diaphragm, described treat photometry unit
The detection light of part 170 outgoing, incides photodetector after sequentially passing through collecting lens and diaphragm
182.Data process component 184 for the output result of signal method circuit is analyzed with
Obtain presetting the optical element 170 to be measured absorption value to pump light at tested point.Such as, data
Processing component 184 can be the hardware configuration that computer etc. has data processing function.
Additionally, the detection light in photodetector 182 is contaminated with except visiting in order to avoid inciding
Other veiling glares outside light-metering, detector 180 can also include optical filtering component.Described optical filtering
Component is arranged between described optical element to be measured 170 and filtering component 181, is used for filtering spy
Veiling glare outside light-metering, such as, described optical filtering component can include centre wavelength and detection light
The optical filter of consistent wavelength.
In the present embodiment, sample stage 160 can be that three-dimensional manually regulates translation stage, it is also possible to is
Three-D electric translation stage, can move up in orthogonal three sides.In order to improve test
Precision, it is preferred that sample stage 160 uses three-D electric translation stage, its displacement and movement
Direction is all controlled by computer, and minimum moving step length is preferably 1 micron or hundred nanometers.High-accuracy
Sample stage 160 contributes to realizing photo-thermal weak absorbing test device to be treated photometry element 170 and absorbs
The high-resolution detection of defect.
It should be noted that in this article, the relational terms of such as first and second or the like is only
Only it is used for separating an entity or operation with another entity or operating space, and not necessarily
Require or imply and there is the relation of any this reality or suitable between these entities or operation
Sequence.And, term " includes ", " comprising " or its any other variant are intended to non-exclusive
Comprising, so that include that the process of a series of key element, article or equipment not only include of property
Those key elements, but also include other key elements being not expressly set out, or also include for this
The key element that the process of kind, article or equipment are intrinsic.In the case of there is no more restriction, by
The key element that statement " including ... " limits, it is not excluded that include described key element process,
Article or equipment there is also other identical element.
The above, detailed description of the invention the most of the present utility model, but guarantor of the present utility model
The scope of protecting is not limited thereto, and any those familiar with the art is at this utility model
In the technical scope disclosed, change can be readily occurred in or replace, all should contain at this utility model
Protection domain within.Therefore, protection domain of the present utility model should be described with claim
Protection domain is as the criterion.
Claims (10)
1. the test system of an optical element native defect damage feature, it is characterised in that bag
Include photo-thermal weak absorbing test device, damage measure light source and damage monitoring microscope；
Described photo-thermal weak absorbing test device is for testing the native defect pair of optical element to be measured
The absorption value of pump light；
Described damage measure light source is used for sending damage measure laser action and treats photometry in described
At the described native defect of element；
Described damage monitoring microscope lacks for the described absorption obtaining described optical element to be measured
It is trapped in the damage feature under the effect of described damage measure laser.
System the most according to claim 1, it is characterised in that described photo-thermal weak absorbing is surveyed
Electricity testing device includes off-axis paraboloidal mirror, sample stage, detector, probe source and pump light source, institute
Stating optical element to be measured to be arranged on described sample stage, described sample stage is used for regulating described to be measured
The position of optical element；
Described probe source focuses on the described of described optical element to be measured for sending detection light
At native defect；
Described off-axis paraboloidal mirror is for the pump light described pump light source sent and described damage
Hinder the damage measure laser that testing light source sends all to focus at described native defect；
Described detector obtains for receiving and analyze the detection light through described optical element to be measured
To the native defect of the described optical element to be measured absorption value to described pump light.
System the most according to claim 2, it is characterised in that described system also includes light
Bundle coupling mirror, pump light that described pump light source sends and the damage that described damage measure light source sends
Hinder testing laser and all incide described off-axis paraboloidal mirror by described light beam coupling mirror, through described from
Focus at the native defect of described optical element to be measured after the reflection of axle parabolic lens, wherein, incident
To described off-axis paraboloidal mirror described pump light optical axis with incide described off-axis paraboloidal mirror
The optical axis of described damage measure laser all with default optical axis coincidence, and described default optical axis is with described
The optical axis coincidence or parallel of off-axis paraboloidal mirror.
4. according to the system described in Claims 2 or 3, it is characterised in that described probe source
Including laser instrument and expand shaping member, the detection light that described laser instrument sends through described in expand
Shaping member expand Shape correction after focus at the native defect of described optical element to be measured.
System the most according to claim 4, it is characterised in that described photo-thermal weak absorbing is surveyed
Electricity testing device also includes that reflecting mirror, described reflecting mirror expand shaping member and described sample described in being arranged at
Between sample platform, described reflecting mirror is for expanding the spy after shaping member expands shaping through described
Light-metering reflexes to focus at the native defect of described optical element to be measured.
System the most according to claim 4, it is characterised in that described laser instrument is He-Ne
Laser instrument.
System the most according to claim 2, it is characterised in that described detector includes filter
Ripple component, photodetector, signal amplification circuit and data process component, described filtering component,
Described photodetector, described signal amplification circuit and described data process component and couple successively,
Detection light through described optical element to be measured sequentially passes through the Filtering Processing of described filtering component
The described photodetector of rear entrance, is converted to the signal of telecommunication, described telecommunications through described photodetector
Number through described signal amplification circuit be amplified into described data process component.
System the most according to claim 7, it is characterised in that described filtering component includes
Collecting lens and diaphragm, by the detection light of described optical element outgoing to be measured, sequentially pass through described
Described photodetector is incided after collecting lens and described diaphragm.
System the most according to claim 7, it is characterised in that described signal amplification circuit
For lock-in amplifier.
System the most according to claim 7, it is characterised in that described detector also wraps
Including optical filtering component, described optical filtering component is arranged on described optical element to be measured and described filtering component
Between.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620345947.0U CN205538723U (en) | 2016-04-21 | 2016-04-21 | Optical element absorbs test system of defect damage characteristic |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620345947.0U CN205538723U (en) | 2016-04-21 | 2016-04-21 | Optical element absorbs test system of defect damage characteristic |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205538723U true CN205538723U (en) | 2016-08-31 |
Family
ID=56797012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620345947.0U Withdrawn - After Issue CN205538723U (en) | 2016-04-21 | 2016-04-21 | Optical element absorbs test system of defect damage characteristic |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205538723U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110849815A (en) * | 2019-12-02 | 2020-02-28 | 中国工程物理研究院激光聚变研究中心 | Method and system for predicting laser damage performance of surface of optical element |
-
2016
- 2016-04-21 CN CN201620345947.0U patent/CN205538723U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110849815A (en) * | 2019-12-02 | 2020-02-28 | 中国工程物理研究院激光聚变研究中心 | Method and system for predicting laser damage performance of surface of optical element |
| CN110849815B (en) * | 2019-12-02 | 2022-10-18 | 中国工程物理研究院激光聚变研究中心 | Method and system for predicting laser damage performance of surface of optical element |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105738374A (en) | System and method for testing damage property of absorption defect of optical element | |
| CN107003249B (en) | Wafer defect is found | |
| CN105453245B (en) | Use the wafer inspection of no fixed form management region | |
| EP3794335A1 (en) | Second harmonic generation (shg) optical inspection system designs | |
| CN105021627B (en) | The highly sensitive quick on-line water flushing method of optical thin film and element surface damage from laser | |
| CN104537656B (en) | Optical fiber beam expansion collimates the detection method of lens barrel outgoing eccentric method | |
| CN110849815B (en) | Method and system for predicting laser damage performance of surface of optical element | |
| CN103712993B (en) | The detection method of transparent optical material body absorption characteristic distributed in three dimensions and device | |
| KR20170091706A (en) | Inspection systems and techniques with enhanced detection | |
| TW201531698A (en) | Defect discovery and inspection sensitivity optimization using automated classification of corresponding electron beam images | |
| CN103411957A (en) | High-space-resolution double-shaft confocal atlas micro-imaging method and device | |
| JP2015516574A (en) | Variable polarization wafer inspection | |
| CN206945540U (en) | A kind of efficient detection device based on Laser-induced plasma spectroscopy | |
| CN104374676A (en) | Particle diameter detection method based on optical trapping | |
| CN104458216B (en) | Device and method for detecting weak absorption of optical element | |
| CN202710290U (en) | Large visual field stray light PST testing device | |
| US11313936B2 (en) | Probe systems and methods for characterizing optical coupling between an optical probe of a probe system and a calibration structure | |
| CN105510347A (en) | Optical material defect real-time imaging apparatus based on photothermal detection and optical microscopy | |
| CN205538723U (en) | Optical element absorbs test system of defect damage characteristic | |
| CN105738372B (en) | A kind of photo-thermal weak absorbing test macro and method | |
| CN112595493B (en) | Laser damage threshold and nonlinear absorption co-target surface measuring device and method | |
| CN112748091A (en) | Ultraviolet detection device for sun protection index of sun protection emulsion | |
| CN219694503U (en) | Device for measuring radial misalignment distance of light beams in double-beam optical trap | |
| CN110895192B (en) | Extreme ultraviolet optical element performance parameter test system | |
| CN109668906A (en) | It is a kind of for measuring the measurement method and device of optical film layer laser damage threshold |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20160831 Effective date of abandoning: 20190823 |