CN205522743U - Low radiation glass of high strength - Google Patents

Low radiation glass of high strength Download PDF

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Publication number
CN205522743U
CN205522743U CN201620114128.5U CN201620114128U CN205522743U CN 205522743 U CN205522743 U CN 205522743U CN 201620114128 U CN201620114128 U CN 201620114128U CN 205522743 U CN205522743 U CN 205522743U
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CN
China
Prior art keywords
layer
film layer
glass
high intensity
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201620114128.5U
Other languages
Chinese (zh)
Inventor
周富强
陈康
王大平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongguan Yintai Glass Co Ltd
Original Assignee
Dongguan Yintai Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongguan Yintai Glass Co Ltd filed Critical Dongguan Yintai Glass Co Ltd
Priority to CN201620114128.5U priority Critical patent/CN205522743U/en
Application granted granted Critical
Publication of CN205522743U publication Critical patent/CN205522743U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model discloses a low radiation glass of high strength, include from last protection rete, copper film layer, dielectric layer, glass substrate, antireflection layer and the anticreep sodium layer that sets gradually extremely down. The beneficial effects of the utility model are that: set up the copper film layer, reduced the probability that adopts silverskin layer oxidation to the antioxidant activity and the wearability of improvement product, low cost moreover, set up the antireflection layer, effectively improved the radioresistance ability of product.

Description

A kind of high intensity low emissivity glass
Technical field
This utility model relates to glass post-processing field, particularly relates to a kind of high intensity low emissivity glass.
Background technology
Glass is used to decorate the decorative effect that ornament can be brought graceful, thus, it is commonly used to build in modern architecture Decoration of exterior wall or the door and window that lands decoration, its application is widely.Progress social at any time and the enhancing of people's Environmental Safety consciousness, People are more and more higher to the performance requirement of glass.
Common monolithic glass has the features such as sunlight percent of pass is general, infrared reflectivity is low, heat insulation performance is poor, in consideration of it, Have good light permeability, heat insulating ability, the low radiation coated glass of heat insulation performance arise at the historic moment.
Summary of the invention
The purpose of this utility model is to provide a kind of high intensity low emissivity glass, it is possible to effectively overcome antioxidation in prior art Poor performance, the defect such as wear no resistance.
The technical solution adopted in the utility model is: a kind of high intensity low emissivity glass, including the guarantor set gradually from top to bottom Cuticular layer, copper film layer, dielectric layer, glass substrate, antireflection layer and anti-removing sodium layer.
Further, the thickness of described glass substrate is 1.85-2mm.
Further, described protecting film layer is NiCr film layer, and the thickness of described protecting film layer is 10-20nm.
Further, described dielectric layer is ZnO film layer, and the thickness of described dielectric layer is 13-30nm.
Further, described anti-removing sodium layer is Zr0 film layer, and the thickness of described anti-removing sodium layer is 0.1-3nm.
Further, described antireflection layer is Al2O3Film layer, the thickness of described antireflection layer is 50-100nm.
Further, described glass substrate is float-glass substrate.
The beneficial effects of the utility model are: arrange copper film layer, reduce the probability using silver film oxidation, thus improve product The antioxygenic property of product and wearability, and with low cost;Antireflection layer is set, is effectively increased the capability of resistance to radiation of product.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
In figure, protecting film layer 1, copper film layer 2, dielectric layer 3, glass substrate 4, antireflection layer 5, anti-removing sodium layer 6.
Detailed description of the invention
With embodiment, the technical solution of the utility model is illustrated below in conjunction with the accompanying drawings.
With reference to shown in Fig. 1, a kind of high intensity low emissivity glass, including the protecting film layer 1 set gradually from top to bottom, copper film Layer 2, dielectric layer 3, glass substrate 4, antireflection layer 5 and anti-removing sodium layer 6.
Copper film layer 2 is set, reduces the probability using silver film oxidation, thus improve antioxygenic property and the wearability of product, And it is with low cost;Antireflection layer 5 is set, is effectively increased the capability of resistance to radiation of product.
The thickness of described glass substrate 4 is 1.85-2mm.
Described protecting film layer 1 is NiCr film layer, and the thickness of described protecting film layer 1 is 10-20nm.
Described dielectric layer 3 is ZnO film layer, and the thickness of described dielectric layer 3 is 13-30nm.
Described anti-removing sodium layer 6 is Zr0 film layer, and the thickness of described anti-removing sodium layer 6 is 0.1-3nm.
Described antireflection layer 5 is Al2O3Film layer, the thickness of described antireflection layer 5 is 50-100nm.
Described glass substrate 4 is float-glass substrate.
Above-described embodiment is only that of the present utility model ultimate principle, principal character and advantage have been shown and described.The skill of the industry Art personnel are it should be appreciated that this utility model is not restricted to the described embodiments, and described in above-described embodiment and description is to say Bright principle of the present utility model, on the premise of without departing from this utility model spirit and scope, this utility model also has various change Change and improve, in the range of these changes and improvements both fall within claimed this utility model.

Claims (7)

1. a high intensity low emissivity glass, it is characterised in that: include that the protecting film layer set gradually from top to bottom, copper film layer, electricity are situated between Matter layer, glass substrate, antireflection layer and anti-removing sodium layer.
A kind of high intensity low emissivity glass the most according to claim 1, it is characterised in that: the thickness of described glass substrate is 1.85-2mm。
A kind of high intensity low emissivity glass the most according to claim 1, it is characterised in that: described protecting film layer is NiCr film layer, The thickness of described protecting film layer is 10-20nm.
A kind of high intensity low emissivity glass the most according to claim 1, it is characterised in that: described dielectric layer is ZnO film layer, The thickness of described dielectric layer is 13-30nm.
A kind of high intensity low emissivity glass the most according to claim 1, it is characterised in that: described anti-removing sodium layer is Zr0 film layer, The thickness of described anti-removing sodium layer is 0.1-3nm.
A kind of high intensity low emissivity glass the most according to claim 1, it is characterised in that: described antireflection layer is Al2O3Film layer, The thickness of described antireflection layer is 50-100nm.
A kind of high intensity low emissivity glass the most according to claim 1, it is characterised in that: described glass substrate is float glass base Plate.
CN201620114128.5U 2016-02-04 2016-02-04 Low radiation glass of high strength Expired - Fee Related CN205522743U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620114128.5U CN205522743U (en) 2016-02-04 2016-02-04 Low radiation glass of high strength

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620114128.5U CN205522743U (en) 2016-02-04 2016-02-04 Low radiation glass of high strength

Publications (1)

Publication Number Publication Date
CN205522743U true CN205522743U (en) 2016-08-31

Family

ID=56776042

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201620114128.5U Expired - Fee Related CN205522743U (en) 2016-02-04 2016-02-04 Low radiation glass of high strength

Country Status (1)

Country Link
CN (1) CN205522743U (en)

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160831

Termination date: 20190204