CN205507120U - Protective glass piece of camera in cell -phone - Google Patents
Protective glass piece of camera in cell -phone Download PDFInfo
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- CN205507120U CN205507120U CN201620190068.5U CN201620190068U CN205507120U CN 205507120 U CN205507120 U CN 205507120U CN 201620190068 U CN201620190068 U CN 201620190068U CN 205507120 U CN205507120 U CN 205507120U
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Abstract
The utility model provides a camera in the cell -phone belongs to mechanical technical field. It has been solved prior art and has had the problem that the printing opacity effect is not good. This protective glass piece of camera in cell -phone includes for the body of sapphire lens, the body is the slice, the both sides of body link firmly the antireflection layer no. 1 and antireflection layer no. 2 that can reduce light reflection respectively, antireflection layer no. 1 be used for with the cell -phone associatively, still linked firmly antifouling layer on the antireflection layer no. 2, foretell antireflection layer no. 2 lies in between antifouling layer and the body. Effectual and the compact structure of camera printing opacity in this cell -phone.
Description
Technical field
This utility model belongs to field of mechanical technique, relates to the processing technique of the protection eyeglass protecting photographic head in eyeglass and this mobile phone of photographic head in a kind of mobile phone.
Background technology
Mobile phone has been indispensable instrument in people's daily life as wireless communication tool, era development, the continuous progress of technology, people and more employ smart mobile phone (Smartphone), it is as PC, has independent operating system, great majority are large-size screen monitors machines, and be to touch capacitance plate, also having part is touch screens, and powerful practicality is high.The program that the third party service providers such as including game provides can be installed voluntarily by user, constantly the function of mobile phone to be expanded by this class method.
In order to enrich the function of mobile phone, on existing mobile phone, the most all standard configurations have photographic head.In order to protect photographic head not disturbed by the external world, protection eyeglass is generally installed at photographic head.
Chinese patent its publication number CN202889425U provides a kind of photographic head sealing device, and for sealing the photographic head of mobile communication equipment, this photographic head sealing device includes photographic head eyeglass, photographic head eyeglass gum and photographic head sealing foam.Photographic head eyeglass gum is mutually bonding with the shell of mobile communication equipment by photographic head eyeglass.Photographic head sealing foam is arranged in photographic head eyeglass gum opening, and is arranged at intervals between photographic head eyeglass and photographic head.
It can be seen that said apparatus solves the technical problem that the device for mobile communication thickness such as mobile phone are thicker, the thickness of mobile communications device is made to reduce, it is simple to carry.But, it does not provide the problem how keeping preventing mirror transparent stable and clean.
Other photographic head eyeglass existing the most all also exists similar problem.
Summary of the invention
First purpose of the present utility model is the problems referred to above existed for prior art, it is provided that the protection eyeglass of photographic head in a kind of compact conformation and the high mobile phone of stability.
Second purpose of the present utility model is to provide the processing technique of the protection eyeglass of photographic head in above-mentioned mobile phone.
First purpose of the present utility model can be realized by following technical proposal:
The protection eyeglass of photographic head in a kind of mobile phone; including the body for sapphire eyeglass; described body is in the form of sheets; it is characterized in that; the both sides of described body are respectively fixedly connected with the antireflection layer one that can reduce light line reflection and an antireflection layer two; described antireflection layer one, for being connected with mobile phone, described antireflection layer two is also fixed with stain-proofing layer, and above-mentioned antireflection layer two is between stain-proofing layer and body.
The body both sides of sapphire lens materials are provided with antireflection layer one and antireflection layer two, effectively raise light penetration.When the setting of stain-proofing layer makes eyeglass dust, dirt or trace occur, it is easy to wiped clean.
In above-mentioned mobile phone in the protection eyeglass of photographic head, described antireflection layer one and antireflection layer two are all connected on body by glue.
In above-mentioned mobile phone in the protection eyeglass of photographic head, described stain-proofing layer is connected on antireflection layer two by glue.
In above-mentioned mobile phone in the protection eyeglass of photographic head, described antireflection layer one and antireflection layer two are aluminium oxide diaphragm.
Owing to sapphire main material is also aluminium oxide, so making antireflection layer one, two close with the material of body, three is firm after connecting, it is not easy to come off.
In above-mentioned mobile phone in the protection eyeglass of photographic head, the number of plies of described antireflection layer one is 48 layers.
In above-mentioned mobile phone in the protection eyeglass of photographic head, the number of plies of described antireflection layer one is 7 layers.
In above-mentioned mobile phone in the protection eyeglass of photographic head, the number of plies of described antireflection layer two is 48 layers.
In above-mentioned mobile phone in the protection eyeglass of photographic head, the number of plies of described antireflection layer two is 7 layers.
In above-mentioned mobile phone in the protection eyeglass of photographic head, described antireflection layer one is identical with the thickness of anti-reflection layer two, and the thickness of described antireflection layer one is 200 300 nanometers.
In above-mentioned mobile phone in the protection eyeglass of photographic head, the number of plies of described stain-proofing layer be the thickness of one layer and stain-proofing layer be 15 25 nanometers.
In above-mentioned mobile phone in the protection eyeglass of photographic head, described stain-proofing layer is high anti-fingerprint AF film thoroughly.
High anti-fingerprint AF film thoroughly; it is called for short AF film; use the 980AF-3 material of TaiWan, China Radix Aconiti research and development; it it is the anti-fingerprint protecting film of the great selling point of existing market; the problem of " fish and Pedis Ursus can not get both " of frosted film and high transmittance film before solving; can the effective grease proofing dust protection of anti-fingerprint, there is again the highest light transmittance, there is no the sensation of that cloudy surface of frosted film.
For reaching above-mentioned purpose, this utility model have employed following technical proposal: in this mobile phone, the protective glass machining process of photographic head comprises the steps:
A, get the raw materials ready: prepare sapphire body, AL2O3 material, SiO2 material and AF material；
B, evacuation: put into by sapphire body in plated film cavity umbrella stand, evacuation of closing the door, then rotational workpieces dish, the vacuum being evacuated in rear plated film cavity in evacuation and plated film cavity at normal temperatures in plated film cavity is 8.0E-4Pa；In workpiece plate is arranged on plated film cavity umbrella stand and it is connected with rotary drive mechanism.Rotary drive mechanism is that automatization drives.
C, coating: AL2O3 material, SiO2 material and AF material are respectively put in corresponding evaporation source, evaporation source connects with plated film cavity, AL2O3 material, SiO2 material and AF material are plated on sapphire body successively by corresponding evaporation source respectively by evaporation technology, i.e., sapphire body is formed AL2O3 material film plating layer, SiO2 material film plating layer and AF material film plating layer, prepares sapphire finished product；Being provided with AL2O3 material film plating layer, SiO2 material film plating layer and AF material film plating layer can make structure compacter, meanwhile, further increases strong degree and antifouling capacity.
The concrete vaporization process conditions of AL2O3 material film plating layer is: AL2O3 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 90-110s；
The concrete vaporization process conditions of SiO2 material film plating layer is: SiO2 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 40-60s；
The concrete vaporization process conditions of AF material film plating layer is: AF material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 20-40s.For long measure: angstrom；S is the unit of time second.
D, feeding: enter gas and open the door, prepared sapphire finished product is taken out.
Be may have the advantage that by above-mentioned technique
1, fingerprint, booty, trace will not be produced during operation；
If 2 when having dust, booty, trace to occur in surface, it is easy to wiped clean；
3, having extremely strong scratch resistance effect, Mohs' hardness is up to 9H.
4, improve light penetration, more than transmitance T >=98%, brightness strengthens, imaging clearly.
In above-mentioned mobile phone in the protective glass machining process of photographic head, in above-mentioned step A, described AL2O3 material, SiO2 material and AF material are all in solid-state structure.
Prioritization scheme; in above-mentioned mobile phone in the protective glass machining process of photographic head; in above-mentioned step C; it is spaced 1min after sapphire body is formed AL2O3 material film plating layer on AL2O3 material film plating layer, forms SiO2 material film plating layer the most again, be spaced 1min after AL2O3 material film plating layer is formed SiO2 material film plating layer and form AF material film plating layer at SiO2 material film plating layer the most again.
nullIn above-mentioned mobile phone in the protective glass machining process of photographic head，In above-mentioned step C，When by AL2O3 material、After SiO2 material and AF material are respectively put in corresponding evaporation source，The AL2O3 material described in the strike of respective electronic rifle in evaporation source、SiO2 material and AF material，All AL2O3 materials in solid-state are made by evaporation source、SiO2 material and AF material are changed into liquid AL2O3 material、Liquid Si O2 material and liquid AF material，It is changed into the most again gaseous state AL2O3 material、Gaseous state SiO2 material and gaseous state AF material，Subsequently it is changed into liquid AL2O3 material、Liquid Si O2 material and liquid AF material，Finally it is changed into the AL2O3 material film plating layer being plated on sapphire body、SiO2 material film plating layer and AF material film plating layer.
In above-mentioned mobile phone in the protective glass machining process of photographic head, in above-mentioned step C, described AL2O3 material film plating layer thickness is
In above-mentioned mobile phone in the protective glass machining process of photographic head, in above-mentioned step C, described SiO2 material film plating layer thickness is
In above-mentioned mobile phone in the protective glass machining process of photographic head, in above-mentioned step C, described AF material film plating layer thickness is
In above-mentioned mobile phone in the protective glass machining process of photographic head, in above-mentioned step C,
The concrete vaporization process conditions of AL2O3 material film plating layer is: AL2O3 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 100s；
The concrete vaporization process conditions of SiO2 material film plating layer is: SiO2 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 50s；
The concrete vaporization process conditions of AF material film plating layer is: AF material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 30s.
Compared with prior art, in this mobile phone, the protection eyeglass of photographic head is owing to being both provided with antireflective coating one in the both sides of body, accordingly, it is capable to effectively improve the light penetration of this eyeglass.
Meanwhile, wiped clean also it is easy to when dirt occurs in this eyeglass.It addition, the antireflective coating of aluminium oxide diaphragm also has extremely strong scratch resistance effect, Mohs' hardness can reach 9H, has the highest practical value.
Accompanying drawing explanation
Fig. 1 is the sectional structure schematic diagram of the protection eyeglass of photographic head in this mobile phone.
In figure, 1, body；2, antireflection layer one；3, antireflection layer two；4, stain-proofing layer.
Detailed description of the invention
Embodiment one
As shown in Figure 1; in this mobile phone, the protection eyeglass of photographic head includes the body 1 for sapphire eyeglass; described body 1 is in the form of sheets; the both sides of described body 1 are respectively fixedly connected with the antireflection layer 1 that can reduce light line reflection and an antireflection layer 23; described antireflection layer 1 is for being connected with mobile phone; also being fixed with stain-proofing layer 4 on described antireflection layer 23, above-mentioned antireflection layer 23 is between stain-proofing layer 4 and body 1.
Certainly, body 1, antireflection layer 1, antireflection layer 23 and stain-proofing layer 4 all match, and they link together closely.
Described antireflection layer 1 and antireflection layer 23 are all connected on body 1 by glue.
Described stain-proofing layer 4 is connected on antireflection layer 23 by glue.
Described antireflection layer 1 and antireflection layer 23 are aluminium oxide diaphragm.
The number of plies of described antireflection layer 1 is 7 layers, and according to practical situation, it is the most all feasible that the number of plies of antireflection layer 1 is 6 layers or 8 layers.
The number of plies of described antireflection layer 23 is 7 layers, and according to practical situation, it is the most all feasible that the number of plies of antireflection layer 23 is 6 layers or 8 layers.
Described antireflection layer 1 is identical with the thickness of anti-reflection layer 23, and the thickness of described antireflection layer 1 and anti-reflection layer 23 is all 235 nanometers, and according to practical situation, 200 or 240 nanometers are the most all feasible.
The number of plies of described stain-proofing layer 4 be the thickness of one layer and stain-proofing layer be 20 nanometers, according to practical situation, 19 nanometers or 22 nanometers are also feasible.
Described stain-proofing layer is high anti-fingerprint AF film thoroughly.
Body 1 both sides of sapphire lens materials are provided with antireflection layer 1 and antireflection layer 23, effectively raise light penetration.When the setting of stain-proofing layer 4 makes eyeglass dust, dirt or trace occur, it is easy to wiped clean.
It addition, in order to increase connective stability between antireflection layer two and stain-proofing layer, the most also there is a silicon dioxide layer.
This sapphire processing technique comprises the steps:
A, get the raw materials ready: prepare sapphire body, AL2O3 material, SiO2 material and AF material；
B, evacuation: put into by sapphire body in plated film cavity umbrella stand, evacuation of closing the door, then rotational workpieces dish, the vacuum being evacuated in rear plated film cavity in evacuation and plated film cavity at normal temperatures in plated film cavity is 8.0E-4Pa；
C, coating: AL2O3 material, SiO2 material and AF material are respectively put in corresponding evaporation source, evaporation source connects with plated film cavity, AL2O3 material, SiO2 material and AF material are plated on sapphire body successively by corresponding evaporation source respectively by evaporation technology, i.e., sapphire body is formed AL2O3 material film plating layer, SiO2 material film plating layer 3 and AF material film plating layer, prepares sapphire finished product；
The concrete vaporization process conditions of AL2O3 material film plating layer is: AL2O3 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 90-110s；
The concrete vaporization process conditions of SiO2 material film plating layer 3 is: SiO2 material is at room temperature
Under conditions of being 8.0E-4Pa with vacuum, logical speed isBeing evaporated, evaporation time is 40-60s；
The concrete vaporization process conditions of AF material film plating layer is: AF material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 20-40s.
D, feeding: enter gas and open the door, prepared sapphire finished product is taken out.
In above-mentioned step A, described AL2O3 material, SiO2 material and AF material are all in solid-state structure.
In above-mentioned step C, it is spaced 1min after sapphire body is formed AL2O3 material film plating layer on AL2O3 material film plating layer, forms SiO2 material film plating layer 3 the most again, be spaced 1min after AL2O3 material film plating layer forms SiO2 material film plating layer 3 and form AF material film plating layer at SiO2 material film plating layer 3 the most again.Further, in above-mentioned step C, when by AL2O3 material, after SiO2 material and AF material are respectively put in corresponding evaporation source, the AL2O3 material described in the strike of respective electronic rifle in evaporation source, SiO2 material and AF material, all AL2O3 materials in solid-state are made by evaporation source, SiO2 material and AF material are changed into liquid AL2O3 material, liquid Si O2 material and liquid AF material, it is changed into the most again gaseous state AL2O3 material, gaseous state SiO2 material and gaseous state AF material, subsequently it is changed into liquid AL2O3 material, liquid Si O2 material and liquid AF material, finally it is changed into the AL2O3 material film plating layer being plated on sapphire body, SiO2 material film plating layer 3 and AF material film plating layer.
In above-mentioned step C, described AL2O3 material film plating layer thickness isSiO2 material film plating layer 3 thickness isAF material film plating layer thickness is
As the optimization scheme of the present embodiment, in above-mentioned step C,
The concrete vaporization process conditions of AL2O3 material film plating layer is: AL2O3 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 100s；
The concrete vaporization process conditions of SiO2 material film plating layer 3 is: SiO2 material is at room temperature
Under conditions of being 8.0E-4Pa with vacuum, logical speed isBeing evaporated, evaporation time is 50s；
The concrete vaporization process conditions of AF material film plating layer is: AF material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 30s.
This sapphire includes sapphire body, one side at sapphire body is provided with AL2O3 material film plating layer, it is provided with SiO2 material film plating layer 3 at AL2O3 material film plating layer away from the one side of sapphire body, is provided with AF material film plating layer at SiO2 material film plating layer 3 away from the one side of AL2O3 material film plating layer.Further, SiO2 material film plating layer 3 thickness here is less than the thickness of SiO2 material film plating layer 3, and described SiO2 material film plating layer 3 thickness is less than the thickness of AF material film plating layer.
Embodiment two
The present embodiment is essentially identical with structure and the principle of embodiment one, Gu therefore not to repeat here, and different place is:
The concrete vaporization process conditions of AL2O3 material film plating layer is: AL2O3 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 40s；
The concrete vaporization process conditions of SiO2 material film plating layer 3 is: SiO2 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 90s；
The concrete vaporization process conditions of AF material film plating layer is: AF material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 20s.
Embodiment three
The present embodiment is essentially identical with structure and the principle of embodiment one, Gu therefore not to repeat here, and different place is:
The concrete vaporization process conditions of AL2O3 material film plating layer is: AL2O3 material is at room temperature
Under conditions of being 8.0E-4Pa with vacuum, logical speed isBeing evaporated, evaporation time is 60s；
The concrete vaporization process conditions of SiO2 material film plating layer 3 is: SiO2 material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 110s；
The concrete vaporization process conditions of AF material film plating layer is: AF material is under conditions of room temperature and vacuum are 8.0E-4Pa, and logical speed isBeing evaporated, evaporation time is 40s.
Claims (10)
1. the protection eyeglass of photographic head in a mobile phone; including the body for sapphire eyeglass; described body is in the form of sheets; it is characterized in that; the both sides of described body are respectively fixedly connected with the antireflection layer one that can reduce light line reflection and an antireflection layer two; described antireflection layer one, for being connected with mobile phone, described antireflection layer two is also fixed with stain-proofing layer, and above-mentioned antireflection layer two is between stain-proofing layer and body.
The protection eyeglass of photographic head in mobile phone the most according to claim 1, it is characterised in that described antireflection layer one and antireflection layer two are all connected on body by glue.
The protection eyeglass of photographic head in mobile phone the most according to claim 1, it is characterised in that described stain-proofing layer is connected on antireflection layer two by glue.
The protection eyeglass of photographic head in mobile phone the most according to claim 1, it is characterised in that described antireflection layer one and antireflection layer two are aluminium oxide diaphragm.
The protection eyeglass of photographic head in mobile phone the most according to claim 1, it is characterised in that the number of plies of described antireflection layer one is 48 layers.
The protection eyeglass of photographic head in mobile phone the most according to claim 5, it is characterised in that the number of plies of described antireflection layer one is 7 layers.
The protection eyeglass of photographic head in mobile phone the most according to claim 1, it is characterised in that the number of plies of described antireflection layer two is 48 layers.
The protection eyeglass of photographic head in mobile phone the most according to claim 7, it is characterised in that the number of plies of described antireflection layer two is 7 layers.
The protection eyeglass of photographic head in mobile phone the most according to claim 1, it is characterised in that described antireflection layer one is identical with the thickness of anti-reflection layer two, the thickness of described antireflection layer one is 200 300 nanometers.
The protection eyeglass of photographic head in mobile phone the most according to claim 1, it is characterised in that the number of plies of described stain-proofing layer be the thickness of one layer and stain-proofing layer be 15 25 nanometers, described stain-proofing layer is high anti-fingerprint AF film thoroughly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620190068.5U CN205507120U (en) | 2016-03-11 | 2016-03-11 | Protective glass piece of camera in cell -phone |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620190068.5U CN205507120U (en) | 2016-03-11 | 2016-03-11 | Protective glass piece of camera in cell -phone |
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| CN205507120U true CN205507120U (en) | 2016-08-24 |
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| CN201620190068.5U Active CN205507120U (en) | 2016-03-11 | 2016-03-11 | Protective glass piece of camera in cell -phone |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105676317A (en) * | 2016-03-11 | 2016-06-15 | 温岭市现代晶体有限公司 | Protective lens of camera in mobile phone, and processing technology of protective lens |
-
2016
- 2016-03-11 CN CN201620190068.5U patent/CN205507120U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105676317A (en) * | 2016-03-11 | 2016-06-15 | 温岭市现代晶体有限公司 | Protective lens of camera in mobile phone, and processing technology of protective lens |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 317500 science and technology Avenue, industry university research institute, Taizhou, Wenling, Zhejiang Patentee after: Hangzhou Meidi Kay Photoelectric Technology Co. Ltd. Address before: 317500 science and technology Avenue, industry university research institute, Taizhou, Wenling, Zhejiang Patentee before: Wenling city modern crystal company limited |
|
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 317500 science and technology Avenue, industry university research institute, Taizhou, Wenling, Zhejiang Patentee after: Zhejiang modern medice optoelectronics Co. Ltd. Address before: 317500 science and technology Avenue, industry university research institute, Taizhou, Wenling, Zhejiang Patentee before: Wenling city modern crystal company limited |
|
| CP01 | Change in the name or title of a patent holder | ||
| CU03 | Correction of utility model patent gazette |
Correction item: Patentee|Address Correct: Wenling city modern crystal company limited|317500 science and technology Avenue, industry university research institute, Taizhou, Wenling, Zhejiang False: Hangzhou Meidi Kay Photoelectric Technology Co. Ltd.|317500 science and technology Avenue, industry university research institute, Taizhou, Wenling, Zhejiang Number: 23-02 Volume: 33 |
|
| CU03 | Correction of utility model patent gazette |