CN205324282U - Base plate washing device - Google Patents
Base plate washing device Download PDFInfo
- Publication number
- CN205324282U CN205324282U CN201620064336.9U CN201620064336U CN205324282U CN 205324282 U CN205324282 U CN 205324282U CN 201620064336 U CN201620064336 U CN 201620064336U CN 205324282 U CN205324282 U CN 205324282U
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- CN
- China
- Prior art keywords
- base plate
- substrate
- cleaning device
- air jet
- plate cleaning
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Drying Of Solid Materials (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The utility model provides a base plate washing device aims at solving current belt cleaning device when spin -drying the base plate through the centrifugation, and base plate central zone causes the problem that work efficiency is low because centrifugal force is less, and moisture is hardly spin -dried. A base plate washing device, includes cell body, rotating device and air jet system, and rotating device switchovers in the cell body, and base plate horizontal installation is at the horizontal plane internal rotation on rotating device and under rotating device's drive, and the air jet system setting is on the cell body inner wall and jet -propelled towards the center of base plate. High -speed rotatory when spin -drying to the base plate, hardly thrown away at base plate central zone's the drop of water, need that long -time high speed is rotatory just can get rid of the drop of water from central zone, set up the air jet system, can be fast with the drop of water base plate central zone that blows off, the drop of water is thrown away, has improved work efficiency.
Description
Technical field
This utility model relates to a kind of base plate cleaning device。
Background technology
At present, the surface of the substrates such as display base plate, encapsulation cover plate or illuminating board needs higher cleannes, and the requirement of the cleaning of this series products is stricter；For being with reeded substrate, when rotating drying, the moisture in groove is difficult to depart from groove, it is necessary to high speed rotating could be dried for a long time, and longevity of service, efficiency is low, relatively costly；Additionally, by centrifugal substrate is dried time, the centrifugal force of central area is less, and the moisture of substrate central areas is difficult to be thrown out of, it is necessary to high speed rotating for a long time, work efficiency is relatively low, relatively costly。
Utility model content
This utility model provides a kind of base plate cleaning device, it is intended to solve existing rinser pass through centrifugal substrate is dried time, substrate central areas is less due to centrifugal force, and moisture is very difficult to be dried, and causes ineffective problem。
In order to solve above technical problem, this utility model is achieved through the following technical solutions: a kind of base plate cleaning device, including cell body, tumbler and air jet system, tumbler is transferred in cell body, substrate level is arranged on tumbler and rotates in horizontal plane under the drive of tumbler, and air jet system is arranged on cell body inwall and towards the central area jet of substrate。
Further, air jet system is made up of at least one air jet pipe。It is easy to control the direction of air-flow。
Further, the jet direction of air jet system and the angle of substrate are at 10 °～70 °。In this angle, air-flow can be easier to blow off the globule central area。In this this angle external so that jet direction and substrate exist inclination angle, in conjunction with the high speed rotating of substrate, it is possible to make the whole substrate of airflow passes, it is possible to moisture in the groove with groove substrate is blown out, then pass through centrifugal throwing away, improve work efficiency。
Further, described tumbler includes electric rotating machine and the mounting seat being fixed in electric rotating machine rotating shaft, and substrate is arranged in mounting seat。
Further, mounting seat is a rotating disk, and the upper surface of described rotating disk is fixed with multiple limited post, and substrate is connected between limited post；The upper surface of rotating disk is provided with at least three and props up bracer, and substrate is placed on the top of a bracer。Easy accessibility, work efficiency is high。
Further, substrate is square, and mounting seat is made up of a disk being fixed in electric rotating machine rotating shaft and four support plates being distributed in disc circumference, each support plate is respectively equipped with one bracer and two for blocking the limited post at substrate angle。
Further, the upper end of described bracer and limited post is respectively provided with elasticity。Be conducive to protective substrate without damage。
Further, described limited post is by a rigid posts and is arranged on the resilient sleeve above rigid posts and constitutes, and the angle of substrate is connected in resilient sleeve。Be conducive to protective substrate, and under elastic reaction, substrate card more firm。
Further, the inwall of described cell body is provided with the sparge pipe of substrate。Cleaning performance can be improved。
Further, described sparge pipe has at least two and two surface sprinklings up and down towards substrate。Cleaning performance can be improved。
Further, described substrate is display base plate, encapsulation cover plate or illuminating board。
Compared with prior art the utility model has the advantages that: this utility model can be used for band groove or ganoid substrate, 1, be provided with tumbler in this utility model, tumbler is transferred in cell body, and cell body is possible to prevent leaked water, keeps clean and tidy。2, substrate level is arranged on tumbler and rotates in horizontal plane under the drive of tumbler；On the one hand, when cleaning, by the slow rotational substrate of tumbler, more uniform during wiping substrate；On the other hand, when high speed rotating, it is possible to substrate is quickly dried。3, when substrate is dried by high speed rotating, the centrifugal force in heart region is less in a substrate, and the globule is difficult to be thrown out of, it is necessary to the globule just can be thrown away central area by high speed rotating for a long time；Air jet system is set, it is possible to substrate central areas of quickly being blown off by the globule, the globule is thrown out of, and improves work efficiency。4, for substrate with groove, when air jet system sprays to the central area of substrate, air-flow can disperse along substrate, it is possible to by groove in moisture blow out smoothly, the moisture in groove can be thrown away smoothly in conjunction with high speed centrifugation, improves work efficiency。5, when drying, the combination of tumbler, air jet system and tumbler is relatively individually adopted with relatively low rotating speed, cost can to have been saved。
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the utility model is described in further detail:
Fig. 1 is structural representation of the present utility model；
Fig. 2 is structural representation during this utility model vertical view；
Fig. 3 is the structural representation after installing substrate on the basis of Fig. 2；
Fig. 4 is this utility model use view on entire machine。
Detailed description of the invention
Consult Fig. 1, Fig. 2 and Fig. 3, a kind of base plate cleaning device, including cell body 1, tumbler and air jet system, tumbler is transferred in cell body 1, substrate 01 is horizontally arranged on tumbler and rotates in horizontal plane under the drive of tumbler, and air jet system is arranged on cell body 1 inwall and towards the central area jet of substrate 01。
Consulting Fig. 1, air jet system is made up of at least one air jet pipe 4。Optional 20 °, 30 °, 50 ° and 60 ° of the angle of air jet pipe 4 and substrate 01 etc., it is possible to smoothly the water of substrate 01 central area, groove or position, dead angle is blown off, in conjunction with high speed centrifugation, it is possible to improve the efficiency dried。Air jet pipe 4 can bend the angle changing jet, but blow to the central area of substrate 01 always。
Consulting Fig. 1 and Fig. 2, tumbler includes electric rotating machine and the mounting seat 3 being fixed in electric rotating machine rotating shaft 2, and substrate 01 is arranged in mounting seat 3, and electric rotating machine is fixed on the center bottom cell body 1。The upper surface of rotating disk is fixed with multiple limited post 34, and substrate 01 is connected between limited post 34；The upper surface of rotating disk is provided with at least three and props up bracer 33, and substrate 01 is placed on the top of a bracer 33。
The shape of substrate 01 is unrestricted, it is possible to for circular, square and polygon etc.；Illustrating with square for embodiment below, all the other shape principles are identical。
When substrate 01 is square, consult Fig. 1, Fig. 2 and Fig. 3, mounting seat 3 is made up of a disk being fixed in electric rotating machine rotating shaft 2 31 and four support plates 32 being distributed on disk 31 periphery, each support plate 32 is respectively equipped with one bracer 33 and two for blocking the limited post 34 of substrate 01 jiao。The upper end propping up bracer 33 and limited post 34 is respectively provided with elasticity。Described limited post 34 is by a rigid posts and is arranged on the resilient sleeve above rigid posts and constitutes, and the angle of substrate 01 is connected in resilient sleeve；Resilient sleeve is formed by long-life and chemically stable plastic production, for instance peek, PTFE, PFA etc.。
Consult Fig. 1, the inwall of cell body 1 is provided with the sparge pipe 5 of substrate 01。Described sparge pipe 5 has at least two and two surface sprinklings up and down towards substrate 01。
Substrate 01 is display base plate, encapsulation cover plate or illuminating board etc.。
Below in conjunction with entire machine, the operation principle of this rinser is illustrated, consult Fig. 1 to Fig. 4, during work, first substrate 01 is connected in mounting seat 3, then electric rotating machine is rotated machine shaft 2 and rotates, electric rotating machine rotating shaft 2 drives substrate 01 to rotate by mounting seat 3, second mechanical arm 71 drives brush roll 72 to enter in cell body 1 substrate 01 is carried out wiping, detergent shower nozzle 73 provides detergent to brush roll 72 simultaneously, sparge pipe 5 has two, spray water in two surfaces that two sparge pipes 5 are respectively facing substrate 01, after treating wiping, brush roll 72 departs from cell body 1, two sparge pipes 5 stop water spray simultaneously。First mechanical arm 61 drives high-pressure nozzle 62 to enter clear cell body 1, and high-pressure nozzle 62 sprays water with high pressure to substrate 01, and in above process, substrate 01, under the drive of electric rotating machine rotating shaft 2, slowly rotates all the time。After having sprayed water, high-speed rotation electric rotating machine rotating shaft 2, drive substrate 01 to carry out high speed rotating, dry the water on substrate, air jet pipe 4 is to substrate 01 jet simultaneously。Sparge pipe 5 and high-pressure nozzle 62 are corresponding respectively at two tanks 9, and are supplied water by tank 9。
Substrate can be the materials such as plastics, glass, silicon chip and metal。
The foregoing is only specific embodiment of the utility model, but technical characteristic of the present utility model is not limited thereto, any those skilled in the art is in field of the present utility model, and change or the modification made all are encompassed among the scope of the claims of the present utility model。
Claims (10)
1. a base plate cleaning device, it is characterized in that: include cell body (1), tumbler and air jet system, tumbler is transferred in cell body (1), substrate (01) is horizontally arranged on tumbler and rotates in horizontal plane under the drive of tumbler, and air jet system is arranged on cell body (1) inwall and towards the central area jet of substrate (01)。
2. a kind of base plate cleaning device according to claim 1, is characterized in that: described air jet system is made up of at least one air jet pipe (4)。
3. a kind of base plate cleaning device according to claim 1 and 2, is characterized in that: the angle of the jet direction of described air jet system and substrate (01) is at 10 °～70 °。
4. a kind of base plate cleaning device according to claim 1, it is characterized in that: described tumbler includes electric rotating machine and the mounting seat (3) being fixed in electric rotating machine rotating shaft (2), and substrate (01) is arranged in mounting seat (3)。
5. a kind of base plate cleaning device according to claim 4, it is characterized in that: mounting seat (3) is a rotating disk, the upper surface of described rotating disk is fixed with multiple limited post (34), and substrate (01) is connected between limited post (34)；The upper surface of rotating disk is provided with at least three and props up bracer (33), and substrate (01) is placed on the top of a bracer (33)。
6. a kind of base plate cleaning device according to claim 5, it is characterized in that: substrate (01) is for square, mounting seat (3) is made up of a disk (31) being fixed in electric rotating machine rotating shaft (2) and four support plates (32) being distributed on disk (31) periphery, and each support plate (32) is respectively equipped with one bracer (33) and two limited posts (34) being used for blocking substrate (01) angle。
7. a kind of base plate cleaning device according to claim 5 or 6, is characterized in that: the upper end of described bracer (33) and limited post (34) is respectively provided with elasticity。
8. a kind of base plate cleaning device according to claim 7, is characterized in that: described limited post (34) is by a rigid posts and is arranged on the resilient sleeve above rigid posts and constitutes, and the angle of substrate (01) is connected in resilient sleeve。
9. a kind of base plate cleaning device according to claim 1, is characterized in that: the inwall of described cell body (1) is provided with at least two sparge pipe (5)；Sparge pipe (5) is towards two surface sprinklings up and down of substrate (01)。
10. a kind of base plate cleaning device according to claim 1, is characterized in that: described substrate (01) is display base plate, encapsulation cover plate or illuminating board。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620064336.9U CN205324282U (en) | 2016-01-22 | 2016-01-22 | Base plate washing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620064336.9U CN205324282U (en) | 2016-01-22 | 2016-01-22 | Base plate washing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205324282U true CN205324282U (en) | 2016-06-22 |
Family
ID=56318490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620064336.9U Active CN205324282U (en) | 2016-01-22 | 2016-01-22 | Base plate washing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205324282U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106180041A (en) * | 2016-08-02 | 2016-12-07 | 徐海慧 | A kind of wallboard rotary cleaning device |
| CN109489378A (en) * | 2018-12-10 | 2019-03-19 | 成都市澳格斯科技有限公司 | A kind of glass spin-drying device |
-
2016
- 2016-01-22 CN CN201620064336.9U patent/CN205324282U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106180041A (en) * | 2016-08-02 | 2016-12-07 | 徐海慧 | A kind of wallboard rotary cleaning device |
| CN109489378A (en) * | 2018-12-10 | 2019-03-19 | 成都市澳格斯科技有限公司 | A kind of glass spin-drying device |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |