CN205317608U - Particulate matter adsorption equipment - Google Patents
Particulate matter adsorption equipment Download PDFInfo
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- CN205317608U CN205317608U CN201521020836.4U CN201521020836U CN205317608U CN 205317608 U CN205317608 U CN 205317608U CN 201521020836 U CN201521020836 U CN 201521020836U CN 205317608 U CN205317608 U CN 205317608U
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- particulate matter
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Abstract
The embodiment of the utility model provides a particulate matter adsorption equipment is related to, the device is including the micro -resonator, the micro -resonator has substrate, the upper surface sputtering sedimentation of substrate has metallic film, metallic film's upper surface has sunken cavity. The embodiment of the utility model provides an adsorbed particle thing that's particulate matter adsorption equipment sets up even over disperse's sunken cavity through the surface at metallic film, can effectual increase particulate matter and adsorption equipment between frictional force, improve the adsorption efficiency to the particulate matter, the sunken effectual area of contact of adsorption equipment with the particulate matter that has increased in cavity is more simultaneously is proposed.
Description
Technical field
The utility model embodiment relates to MEMS (micro electro mechanical system) Manufacture and application field, particularly relates to a kind of particulate matter adsorption unit.
Background technology
Micromechanical resonance device based on MEMS (micro electro mechanical system) technique is the Primary Component realizing PM2.5 monitoring equipment miniatureization. The frequency of resonance is possessed susceptibility by the oscillating mass of micro-resonator, poor by the frequency before and after detection deposition, can calculate the quality of attaching particles thing, then calculate the concentration of corresponding PM2.5 particulate matter in air sample to be measured.
Fig. 1 is the particulate matter adsorption unit of prior art, as shown in Figure 1, PM2.5 particulate matter 11 is deposited on the upper surface of resonator seismic mass 10, resonator seismic mass 10 carries out simple harmonic oscillation along the direction of arrow, in vibrations process, PM2.5 particulate matter 11 is easily formed at the two ends of resonator seismic mass 10 heaves 12, make PM2.5 particulate matter 11 uneven in the distribution of resonator seismic mass 10, resonator seismic mass 10 in working process with the frequency vibration at high speed of 40MHz, owing to adhesive ability is inadequate, PM2.5 particulate matter 11 easily comes off resonator seismic mass 10, affect accuracy of detection. in addition, when resonator seismic mass 10 realizes miniatureization, the surperficial land area of resonator seismic mass 10 is not enough so that particulate matter collecting amount is insufficient.
Summary of the invention
The object of the utility model embodiment proposes a kind of particulate matter adsorption unit, and the adsorptive power solving existing adsorption unit and particulate matter is inadequate, and particulate matter easily departs from the problem of adsorption unit.
For achieving the above object, the utility model embodiment provides a kind of particulate matter adsorption unit, and described device comprises micro-resonator, and described micro-resonator has substrate base, the upper surface sputtering sedimentation of described substrate base has metallic film, and the upper surface of described metallic film has the cavity of depression.
The particulate matter adsorption unit that the utility model embodiment proposes, by arranging the cavity of the depression of even dense distribution on the surface of metallic film, can effectively increase the frictional force between particulate matter and adsorption unit, improve the adsorptive power to particulate matter, the cavity simultaneously caved in effectively increases the contact area of adsorption unit and particulate matter, more adsorption particle thing.
Accompanying drawing explanation
In order to the technical scheme being illustrated more clearly in the utility model embodiment, it is briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only embodiments more of the present utility model, for those of ordinary skill in the art, under the prerequisite not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the particulate matter adsorption unit of prior art;
Fig. 2 is the structural representation of the utility model embodiment particulate matter adsorption unit;
Fig. 3 is the vertical view of the utility model embodiment particulate matter adsorption unit.
Embodiment
Below by drawings and Examples, the technical solution of the utility model is described in further detail.
The utility model embodiment proposes a kind of particulate matter adsorption unit, on the metallic film of micro-resonator of adsorption unit, the cavity of depression is formed by sputter deposition craft, can effectively increase the frictional force between particulate matter and adsorption unit, it is to increase to the adsorptive power of particulate matter. The cavity simultaneously caved in effectively increases the contact area of adsorption unit and particulate matter, more adsorption particle thing.
Fig. 2 is the structural representation of the utility model embodiment particulate matter adsorption unit, and as shown in Figure 2, the particulate matter adsorption unit of the utility model embodiment comprises: the substrate base 21 of micro-resonator, metallic film 22.
Micro-resonator has substrate base 21, it is preferable that, substrate base 21 can select silicon chip, but is not limited to silicon chip.
The upper surface of substrate base 21 has metallic film 22, and metallic film 22 can be formed in the upper surface of substrate base 21 by magnetron sputtering deposition technique. Preferably, metallic film 22 can select metallic aluminium.
The metallic film 22 of the utility model embodiment is in magnetron sputtering deposition technological process, and by Controlling Technology parameter, the upper surface at metallic film 22 forms the cavity 23 of the depression with certain diameter. When the substrate base of micro-resonator is in the process of vibrations, particulate matter can enter in the cavity 23 of depression, thus increases particulate matter and the frictional force of metallic film 22, it is to increase to the adsorptive power of particulate matter.
It should be noted that, particulate matter can the less fine particle of diameter, such as PM2.5 particulate matter, it is also possible to be the particulate matter of other types.
In magnetron sputtering deposition technological process, concrete processing parameter can be, chamber pressure 0.003mBar, argon gas stream speed 80sccm, sputtering power 750W, depositing time 290s.
Fig. 3 is the vertical view of the utility model embodiment particulate matter adsorption unit, and as shown in Figure 3, the cavity 23 of depression is in the uniformly intensive distribution of the upper surface of metallic film 22, and the diameter d 1 in the cavity 23 of depression is 2-3 μm, and spacing d2 is 2 μm.
It should be noted that, the metallic film 22 of the utility model embodiment is in magnetron sputtering deposition technological process, and concrete processing parameter is not limited to above-mentioned processing parameter, it is possible to modify according to particular case, the material of such as metallic film is different, and the parameter taked is different; The diameter in the cavity 23 of the depression needing to be formed for another example is different with spacing, and the parameter taked is different.
It should be noted that, the diameter in the cavity 23 of the depression of the utility model embodiment and the size of spacing are also not limited to above-mentioned data, it is possible to change according to concrete demand.
The particulate matter adsorption unit that the utility model embodiment proposes, by arranging the cavity of the depression of even dense distribution on the surface of metallic film, it is possible to the effective frictional force increased between particulate matter and adsorption unit, it is to increase to the adsorptive power of particulate matter.The cavity simultaneously caved in effectively increases the contact area of adsorption unit and particulate matter, more adsorption particle thing.
Above-described embodiment; the purpose of this utility model, technical scheme and useful effect have been further described; it is it should be understood that; the foregoing is only embodiment of the present utility model; and be not used in and limit protection domain of the present utility model; all within spirit of the present utility model and principle, any amendment of making, equivalent replacement, improvement etc., all should be included within protection domain of the present utility model.
Claims (6)
1. a particulate matter adsorption unit, it is characterised in that, described device comprises micro-resonator, and described micro-resonator has substrate base, and the upper surface sputtering sedimentation of described substrate base has metallic film, and the upper surface of described metallic film has the cavity of depression.
2. particulate matter adsorption unit as claimed in claim 1, it is characterised in that, described metallic film is metallic aluminium.
3. particulate matter adsorption unit as claimed in claim 1, it is characterised in that, the empty intensive upper surface being distributed in described metallic film of described depression.
4. particulate matter adsorption unit as claimed in claim 3, it is characterised in that, the diameter in the cavity of described depression is 2-3 μm.
5. particulate matter adsorption unit as described in claim 3 or 4, it is characterised in that, the spacing between the cavity of described depression is 2 μm.
6. particulate matter adsorption unit as claimed in claim 1, it is characterised in that, described substrate base is silicon chip.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521020836.4U CN205317608U (en) | 2015-12-10 | 2015-12-10 | Particulate matter adsorption equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521020836.4U CN205317608U (en) | 2015-12-10 | 2015-12-10 | Particulate matter adsorption equipment |
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| Publication Number | Publication Date |
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| CN205317608U true CN205317608U (en) | 2016-06-15 |
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| CN201521020836.4U Active CN205317608U (en) | 2015-12-10 | 2015-12-10 | Particulate matter adsorption equipment |
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| CN (1) | CN205317608U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105547901A (en) * | 2015-12-10 | 2016-05-04 | 中国电子科技集团公司信息科学研究院 | Particle adsorption apparatus and preparation method thereof |
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2015
- 2015-12-10 CN CN201521020836.4U patent/CN205317608U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105547901A (en) * | 2015-12-10 | 2016-05-04 | 中国电子科技集团公司信息科学研究院 | Particle adsorption apparatus and preparation method thereof |
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