CN205316997U - Gaseous air duct - Google Patents

Gaseous air duct Download PDF

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Publication number
CN205316997U
CN205316997U CN201620007291.1U CN201620007291U CN205316997U CN 205316997 U CN205316997 U CN 205316997U CN 201620007291 U CN201620007291 U CN 201620007291U CN 205316997 U CN205316997 U CN 205316997U
Authority
CN
China
Prior art keywords
gas
inlet end
ventilating pit
air inlet
pipe body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201620007291.1U
Other languages
Chinese (zh)
Inventor
冯亚宁
张意远
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Microsemi Semiconductor Co Ltd
Original Assignee
Shanghai Microsemi Semiconductor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Microsemi Semiconductor Co Ltd filed Critical Shanghai Microsemi Semiconductor Co Ltd
Priority to CN201620007291.1U priority Critical patent/CN205316997U/en
Application granted granted Critical
Publication of CN205316997U publication Critical patent/CN205316997U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model relates to a gaseous air duct for provide gaseous for brilliant boat in the boiler tube, gaseous air duct includes the body, the body has relative inlet end and end, on the pipe wall of body along the inlet end extremely the air vent that link up is seted up to the end, interval between the air vent is followed the inlet end extremely the end reduces gradually. The air vent that reduces gradually to terminal interval from the inlet end is seted up at the pipe wall of breather pipe body to the adoption, and the concentration of the gas realizing coming out from the air vent is the same, and then makes the nature and the thickness homogeneous of the membrane that the wafer formed on the brilliant boat send, has solved among the prior art because between the wafer that the gas strength difference leads to diffusion or the thick inconsistent problem of deposited film.

Description

Gas airway
Technical field
The utility model relates to field of semiconductor technology, particularly relates to a kind of gas airway.
Background technology
Along with the development of semiconductor device technology and market are to the balanced requirement of product performance, the cost of product and the balance of technique are taken into account require more and more higher.
Diffusion or depositing system body of heater, gas lead to into during boiler tube owing to brilliant boat is excessively long, gas has reduced a lot through consuming arrival boiler tube end gas concentration after entering from boiler tube air inlet end, even if raising balanced gas speed of response by fire door to stove tail thermograde, also between more difficult acquisition fire door to stove tail wafer, spread or deposit the consistence of thickness. Spread or deposition thickness consequently, it is desirable to design a kind of adjustment from air inlet end to the airway of boiler tube afterbody gas with various concentration.
Practical novel content
The purpose of this utility model is to overcome the defect of prior art, there is provided one gas airway, it is possible to solution gas reduces and make to spread or deposit the inconsistent problem of thickness between wafer through consuming arrival boiler tube end gas concentration after entering from boiler tube air inlet end.
The technical scheme realizing above-mentioned purpose is:
A kind of gas airway of the utility model, for boiler tube is crystalline substance boat offer gas, described gas airway comprises pipe body, described pipe body has relative air inlet end and end, offering through ventilating pit along described air inlet end to described end on the tube wall of described pipe body, the spacing between described ventilating pit reduces from described air inlet end gradually to described end.
The further improvement of the utility model gas airway is, the surrounding of described pipe body is provided with the many rows ventilating pit from described air inlet end to described end.
The further improvement of the utility model gas airway is, ventilating pit alignment corresponding in many row's ventilating pits is arranged.
The further improvement of the utility model gas airway is, described Guan Tiwei flat.
The further improvement of the utility model gas airway is, described ventilating pit is circular hole.
The further improvement of the utility model gas airway is, identical from the concentration of the concentration of the ventilating pit gas out near described air inlet end and the ventilating pit from close described end gas out.
The useful effect of the utility model gas airway is:
The tube wall at ventpipe pipe body is adopted to offer the ventilating pit reduced gradually from air inlet end to end gaps, realize the concentration from ventilating pit gas out identical, and then make the character of the film that wafer is formed on crystalline substance boat and thickness all consistent, solve in prior art and between the wafer caused owing to gas concentration is different, spread or deposit the inconsistent problem of thickness.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model gas airway.
Embodiment
Below in conjunction with the drawings and specific embodiments, the utility model is described in further detail.
The utility model provides a kind of gas airway, for optimizing semiconductor technological condition, better being applicable to is spread or depositing system body of heater, making to arrive brilliant boat respectively holds the gas concentration around wafer consistent, balance gas preferably at boiler tube each section of reacting weight so that on brilliant boat, the character of the film that wafer is formed and thickness are all consistent. Gas airway in the utility model adopts and offers through ventilating pit on tube wall, and the spacing of ventilating pit from air inlet end to end diminishes gradually, and then increases the gas concentration of pipe body end. The structure of gas airway of the present utility model is simple, and cost is low, and Results is remarkable. Below in conjunction with accompanying drawing, the utility model gas airway is described in detail.
Consult Fig. 1, show the structural representation of the utility model gas airway. Below in conjunction with Fig. 1, the utility model gas airway is described.
As shown in Figure 1, the utility model gas airway comprises pipe body 11, this gas airway is used in boiler tube for brilliant boat provides gas, the pipe body 11 of gas airway has relative air inlet end 111 and end 112, offering through ventilating pit 113 along air inlet end 111 to end 112 on the tube wall of pipe body 11, the spacing between ventilating pit 113 reduces gradually from air inlet end 111 to end 112. The ventilating pit 113 offered on the tube wall of pipe body 11, for gas is derived in pipe body 11, and the spacing between ventilating pit 113 reduces gradually from air inlet end 111 to end 112, what arrange between the ventilating pit 113 of end 112 is comparatively intensive, the gas quantitative change out of ventilating pit 113 place of close end 112 is many, make to arrive brilliant boat many close to the gas change of pipe body 11 end 112, thus solve phenomenon few in the gas quantitative change out of pipe body end in prior art, and then wafer on brilliant boat is avoided to form problem in uneven thickness because gas volume is inconsistent.
The surrounding of pipe body 11 is provided with the many rows ventilating pit from air inlet end 111 to end 112, and in many row's ventilating pits, corresponding ventilating pit 113 aligns and arranges. The quantity that ventilating pit 113 on pipe body 11 is offered and spacing are all through accurate calculating, and the concentration that this ventilating pit 113 is arranged so that around brilliant boat is consistent from air inlet end 111 to end 112 each sections of gas reaction amounts.
Goodly, pipe body 11 is flat.
Goodly, ventilating pit 113 is circular hole.
Goodly, concentration from the concentration of ventilating pit 113 gas out near air inlet end 111 and the ventilating pit 113 from close module 112 gas out is identical. And then make air inlet end 111 identical with the gas volume of end 112. Further, on pipe body, each section of concentration from ventilating pit gas out is all identical.
The principle of work of the utility model gas airway is:
Gas enters pipe body 11 from the air inlet end 111 of pipe body 11, flows along pipe body 11 from air inlet end 111 terminad 112, and the concentration of the gas of pipe body 11 air inlet end 111 is bigger, and gas, through the ventilating pit 113 of pipe body 11 tube wall, enters around brilliant boat; Gas continues terminad 112 along pipe body 11 and moves, because the amount more arriving end 112 gas is more few, make the gas concentration of reaction around brilliant boat more little, and pipe body 11 is more close to end 112, spacing between ventilating pit 113 reduces gradually or density becomes close gradually, the gas arrived around brilliant boat end is also strengthened, and then balances the few problem of end 112 place gas volume;Reduce gradually due to the spacing between ventilating pit 113 or density to become the brilliant boat of secret emissary gradually consistent in the gas concentration of end 112 at concentration and the brilliant boat of the gas of air inlet end 111 so that the film self-consistentency on crystalline substance boat.
The useful effect of the utility model gas airway is:
The tube wall at ventpipe pipe body is adopted to offer the ventilating pit reduced gradually from air inlet end to end gaps, realize the concentration from ventilating pit gas out identical, and then make the character of the film that wafer is formed on crystalline substance boat and thickness all consistent, solve in prior art and between the wafer caused owing to gas concentration is different, spread or deposit the inconsistent problem of thickness.
Below the utility model has been described in detail by embodiment by reference to the accompanying drawings, and the utility model can be made many variations example by those skilled in the art according to the above description. Thus, some details in embodiment should not form restriction of the present utility model, the utility model by the scope that defines using appended claims as protection domain of the present utility model.

Claims (6)

1. a gas airway, for boiler tube is crystalline substance boat offer gas, it is characterized in that, described gas airway comprises pipe body, described pipe body has relative air inlet end and end, offering through ventilating pit along described air inlet end to described end on the tube wall of described pipe body, the spacing between described ventilating pit reduces from described air inlet end gradually to described end.
2. gas airway as claimed in claim 1, it is characterised in that, the surrounding of described pipe body is provided with the many rows ventilating pit from described air inlet end to described end.
3. gas airway as claimed in claim 2, it is characterised in that, ventilating pit alignment corresponding in many row's ventilating pits is arranged.
4. gas airway as claimed in claim 1, it is characterised in that, described Guan Tiwei flat.
5. gas airway as claimed in claim 1, it is characterised in that, described ventilating pit is circular hole.
6. gas airway as claimed in claim 1, it is characterised in that, identical from the concentration of the concentration of the gas out of the ventilating pit near described air inlet end and the ventilating pit from close described end gas out.
CN201620007291.1U 2016-01-05 2016-01-05 Gaseous air duct Expired - Fee Related CN205316997U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620007291.1U CN205316997U (en) 2016-01-05 2016-01-05 Gaseous air duct

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620007291.1U CN205316997U (en) 2016-01-05 2016-01-05 Gaseous air duct

Publications (1)

Publication Number Publication Date
CN205316997U true CN205316997U (en) 2016-06-15

Family

ID=56201745

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201620007291.1U Expired - Fee Related CN205316997U (en) 2016-01-05 2016-01-05 Gaseous air duct

Country Status (1)

Country Link
CN (1) CN205316997U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107166939A (en) * 2017-06-16 2017-09-15 山东琦泉能源科技有限公司 Divide airduct air-distribution device
CN107192251A (en) * 2017-06-16 2017-09-22 山东琦泉能源科技有限公司 Air blower drying system
CN113373522A (en) * 2021-05-31 2021-09-10 北海惠科半导体科技有限公司 Diffusion device and diffusion system
WO2023138210A1 (en) * 2022-01-24 2023-07-27 盛美半导体设备(上海)股份有限公司 Furnace tube for thin film deposition, thin film deposition method and processing apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107166939A (en) * 2017-06-16 2017-09-15 山东琦泉能源科技有限公司 Divide airduct air-distribution device
CN107192251A (en) * 2017-06-16 2017-09-22 山东琦泉能源科技有限公司 Air blower drying system
CN113373522A (en) * 2021-05-31 2021-09-10 北海惠科半导体科技有限公司 Diffusion device and diffusion system
WO2023138210A1 (en) * 2022-01-24 2023-07-27 盛美半导体设备(上海)股份有限公司 Furnace tube for thin film deposition, thin film deposition method and processing apparatus

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160615

Termination date: 20190105

CF01 Termination of patent right due to non-payment of annual fee