CN205295445U - Block mask slice structure - Google Patents

Abstract

The utility model discloses a block mask slice structure, including the mask slice body, be provided with partially etching area and buffers on the mask slice body, buffers are located the outside of partially etching area the two -dimensional barcode that partially etching area or buffers be provided with the tension dispersion and had discerned the management role. The utility model discloses a set up two -dimensional barcode's technological solution at partially etching area or buffers, both realized the uniform tension dispersion, be difficult to the buckling, again through the convenient management of two -dimensional barcode.

Description

A kind of block mask plate structure

Technical field

This utility model relates to a kind of block mask plate structure.

Background technology

During existing full-color active organic light emitting diode display screen produces, metal mask directly affects evaporation quality, and in metal mask board manufacturing process, block metal mask plate always has many designs such as partially etching area and Buffer Design to be to make tension force more on average exert a force, but block metal mask plate often has the problem that cannot be distinguished from management on manufacturing, it is desirable to design a kind of block mask plate structure, the requirement that tension force disperses to merge with administration message can be realized.

Utility model content

For the problems referred to above, this utility model provides a kind of block mask plate structure, to realize tension force dispersion and the function identifying management.

To achieve these goals, the technical solution of the utility model is as follows:

Block mask plate structure, it is characterized in that, including mask plate body, described mask plate body is provided with partially etching area and relief area, described relief area is positioned at the outside of partially etching area, has had tension force dispersion and the two-dimensional bar code identifying management role at described partially etching area or setting buffers.

In a preferred embodiment of the present utility model, described two-dimensional bar code is arranged on described partially etching area.

In a preferred embodiment of the present utility model, described two-dimensional bar code is arranged on described relief area. Further, the width of described two-dimensional bar code and the width of relief area are consistent.

In a preferred embodiment of the present utility model, described two-dimensional bar code is arranged on the medium position of relief area. Or, described two-dimensional bar code is arranged on the end position of relief area.

This utility model, by the technical solution at described partially etching area or setting buffers two-dimensional bar code, had both achieved even tension dispersion, it is not easy to produce fold, further through the convenient management of two-dimensional bar code.

Feature of the present utility model see graphic and better embodiment below the detailed description of this case and obtains and be well understood to.

Accompanying drawing explanation

Fig. 1 is this utility model schematic diagram in embodiment 1.

Fig. 2 is the tension distribution schematic diagram of Fig. 1.

Fig. 3 is the schematic diagram of prior art.

Fig. 4 is the tension distribution schematic diagram of Fig. 3.

Fig. 5 is this utility model schematic diagram in example 2.

Fig. 6 is this utility model schematic diagram in embodiment 3.

Detailed description of the invention

For the technological means making this utility model realize, creation characteristic, reach purpose and effect and be easy to understand, this utility model is expanded on further below in conjunction with specific embodiment.

Embodiment 1

Referring to Fig. 1 and 2, a kind of block mask plate structure, including mask plate body 10, mask plate body is provided with partially etching area 11 and relief area 12, relief area 12 is positioned at the outside of partially etching area 11, and the medium position in relief area 12 has been provided with tension force dispersion and the two-dimensional bar code 13 identifying management role.The width of preferred two-dimensional bar code 13 is consistent with the width of relief area 12. In other embodiments, the width of two-dimensional bar code 13 can also be determined by simulation according to actual needs. Referring to Fig. 3 and Fig. 4, compared with existing block mask plate structure, the pattern ordered arrangement of relief area 12 of the prior art, causes that tension force is unfavorable is completely dispersed (referring to the tension distribution schematic diagram shown in the arrow in Fig. 4), it is easy to produce fold; And by arranging two-dimensional bar code 13 in the application, make tension force be uniformly dispersed (referring to the tension distribution schematic diagram shown in the arrow in Fig. 2), and by two-dimensional bar code compatibility management function.

Embodiment 2

Referring to Fig. 5, a kind of block mask plate structure, including mask plate body 10, mask plate body 10 is provided with partially etching area 11 and relief area 12, relief area 12 is positioned at the outside of partially etching area 11, and partially etching area 11 has been provided with tension force dispersion and the two-dimensional bar code 14 identifying management role.

Embodiment 3

Referring to Fig. 6, a kind of block mask plate structure, including mask plate body 10, mask plate body is provided with partially etching area 11 and relief area 12, relief area 12 is positioned at the outside of partially etching area 11, and the end position in relief area 12 has been provided with tension force dispersion and the two-dimensional bar code 15 identifying management role.

Of the present utility model ultimate principle, principal character and of the present utility model advantage have more than been shown and described. Skilled person will appreciate that of the industry; this utility model is not restricted to the described embodiments; simply principle of the present utility model described in above-described embodiment and description; under the premise without departing from this utility model spirit and scope, this utility model also has various changes and modifications, and these changes and improvements both fall within claimed scope of the present utility model. The protection domain that this utility model requires is defined by appending claims and equivalent thereof.

Claims (6)

1. block mask plate structure, it is characterized in that, including mask plate body, described mask plate body is provided with partially etching area and relief area, described relief area is positioned at the outside of partially etching area, has had tension force dispersion and the two-dimensional bar code identifying management role at described partially etching area or setting buffers.

2. block mask plate structure according to claim 1, it is characterised in that described two-dimensional bar code is arranged on described partially etching area.

3. block mask plate structure according to claim 1, it is characterised in that described two-dimensional bar code is arranged on described relief area.

4. block mask plate structure according to claim 3, it is characterised in that the width of described two-dimensional bar code is consistent with the width of relief area.

5. block mask plate structure according to claim 3, it is characterised in that described two-dimensional bar code is arranged on the medium position of relief area.

6. block mask plate structure according to claim 3, it is characterised in that described two-dimensional bar code is arranged on the end position of relief area.