CN205216515U - Gaseous falling liquid film reactor that absorbs - Google Patents
Gaseous falling liquid film reactor that absorbs Download PDFInfo
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- CN205216515U CN205216515U CN201520732751.2U CN201520732751U CN205216515U CN 205216515 U CN205216515 U CN 205216515U CN 201520732751 U CN201520732751 U CN 201520732751U CN 205216515 U CN205216515 U CN 205216515U
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Abstract
The utility model provides a gaseous falling liquid film reactor that absorbs, include clamp cover, wet pilaster, liquid distributor mechanism, go up fixed establishment, lower fixed establishment, gas distribution mechanism and sealing mechanism. Pressing from both sides the cover and having inner wall, outer wall, inner wall formation holding chamber and outer wall around the first cavity of inner wall middle part formation, first cavity is equipped with heat -conducting medium import and heat -conducting medium export, wet pilaster has wall portion and by wall portion around the well kenozooecium that forms, liquid distributor mechanism includes spiral distribution ware and hood, go up the gas outlet that fixed establishment has and press from both sides the holding chamber intercommunication of cover, fixed establishment has the first opening of allowwing wet pilaster to pass down, gas distribution mechanism includes lower cover, annular chamber portion and gas -liquid division board, and the lower cover has lateral wall and diapire, and the lateral wall is equipped with a plurality of interior inlet ports, and the diapire is equipped with second opening and leakage fluid dram, annular chamber portion is equipped with the external admission hole of calming the anger and personally experiencing sth. Part of the body and communicate with outside area, sealing mechanism has the pilaster that supplies to wet and passes just fixed connection in the second opening of lower cover.
Description
Technical field
The utility model relates to gas trapping equipment, in particular to a kind of GAS ABSORPTION falling film reactor.
Background technology
GAS ABSORPTION can be divided into Physical Absorption and the large class of chemical absorbing two by character, with suitable absorbent process admixture of gas to remove wherein one or more components, is typical chemical engineering unit operation.Gas absorption techniques has been widely used in the fields such as synthetic ammonia, petrochemical industry and exhaust-gas treatment, absorbs phase mainly Gas-Liquid Absorption.Gas-Liquid Absorption technique may be very simple, also may be complicated huge, but its main most crucial equipment adopted is all Gas-Liquid Absorption reactor.
Gas liquid phase reactor can be divided into by liquid phase contact form:
(1) gas is with bubble shape dispersion bubbling column reactor in the liquid phase, stirring bubbling tank reactor and plate-type reactor;
(2) liquid is with droplet-like dispersion spray reactor, injection reactor and Wen's reactor etc. in the gas phase;
(3) liquid carries out the packed tower reactor and falling film reactor etc. that contact with membranaceous motion and gas phase.
Above reactor all has application in different industries.For laboratory research gas liquid reaction dynamics, require air-flow and liquid flow point cloth stable and uniform, and single axial reaction can be realized, without back-mixing, so mainly adopt falling film reactor.Falling film reactor has following features:
A. usually carry out gas liquid reaction by the flowing liquid membrane in pipe, pipe is outer to be used heat transport fluid to import or derives reaction heat;
B. also to have pressure drop little and without the advantage of axial backmixing for falling film reactor;
C. in falling film reactor, liquid residence time is very short;
D. the installation perpendicularity of film supplying tube requires higher, liquid film forming and to be uniformly distributed be the key of falling film reactor, must be noted that when engineering uses.
Falling film reactor can be used for moment, interface and fast reaction, and it is specially adapted to the gas-liquid reaction process producing larger fuel factor; Be not suitable for long response time, be not suitable for process containing solid matter and the gas-liquid reaction process that solid matter or the very large liquid of viscosity can be separated out yet.
The maximum falling film reactor of current application adopts wet pilaster to carry out Gas-Liquid Absorption reaction, is called wetted wall tower, is mainly used to research Gas-Liquid Absorption kinetics, such as, measures solvent absorption CO2, H
2the kinetic parameter etc. of the gases such as S, contributes to the mass transfer effectiveness measuring absorbent.
Nowadays, under the overall background of " 12 " national science and technology supporting plan project " extensive coal-fired plant flue gas CO2 trapping, the displacement of reservoir oil and Plugging Technology Applied (CCUS) exploitation and Applied D emonstration ", carry out flue gas CO
2trapping new technology and the research of dynamics mass transfer characteristic, instruct extensive carbon to trap the design of engineering process bag and engineering design, be conducive to CO
2reduce discharging the popularization of new technology, to ecological, environmental protective and economic development all tool be of great significance.
CO
2absorption dynamics is studied, and is CO
2the important foundation research of trapping process study, is the parameter in order to obtain computational process equipment, and checks or disclose the impact of various factors on a certain absorbing model.Dynamics directly has influence on selection and test, the selection of process and the design optimization of reactor of absorbent.Due to the variation of solvent kind, the various combination of mixture, there is material impact to CO2 absorption reaction dynamics.
In laboratory research, scientific research personnel is used for GAS ABSORPTION to wetted wall tower and has carried out a large amount of research work.In the seventies and eighties in last century, domestic had scholar's research to adopt wetted wall tower to carry out comprising CO
2measure at interior aerochemistry solvent absorption dynamics data.Adopt wet pilaster to be reactor, make liquid form one deck liquid film by the stainless steel column overflow of hollow at outer wall, and gas contacts with liquid countercurrent, contact surface is that stainless steel outer surface of column amasss.Gas liquid reaction resistance mainly concentrates in air film, liquid film.Its flow behavior is more conducive to the theoretical research of chemical absorbing closer to the practical condition of commercial plant.The reaction velocity coefficient of MODEL OF CHEMICAL ABSORPTION PROCESS can be measured, set up absorption rates correlation, thus calculate absorption reaction activation energy.Wetted wall tower, as the experimental provision of Interphase Mass Transfer mechanism, is early people's employing.In long-term research process, once having carried out various improvement to wetted wall tower, is the most simply lower termination one conduction stick at wetted wall tower, and the end end effect produced by stagnant liquid film when can eliminate operation should.
The advantage of wetted wall tower as previously noted, falling film reactor pressure drop is little, without axial backmixing, and liquid residence time is very short.Therefore adopt wetted wall tower equipment, gas liquid interfacial area and the time of staying are accurately described, accurately obtains the kinetic parameter of gas liquid reaction.Normal pressure wetted wall tower experimental provision can carry out reactor Design and manufacture process modification, obtains high-temperature pressurizing wetted wall tower device.
Wetted wall tower also has features: impermeable mutually between air film and liquid film, only carries out mass transfer on surface, and higher gas speed can be allowed to pass through, and equipment resistance falls less.Liquid film is thinner, and the static pressure liquid level needed for film forming is lower.During by air-flow by falling liquid film, produce on liquid film surface the molecular diffusion that special fluctuation institute causes instability, carry out efficient mass transfer.
The design key point of wetted wall tower is liquids and gases distribution apparatus, and whether its structural design is reasonable, and whether liquid film forming is even, and whether correct etc. whether air flow method steadily and install, all directly can affect the mass-transfer efficiency of tower and the operational stability of tower.Liquid film skewness can cause liquid film to differ at wet pilaster surface thickness, affects effluent can occur or tear by factors such as flow velocitys.For reaching equally distributed object, adopt multi-form distributor on top.Can the structure quality of distributor rapidly in the wall portion film forming of wet pilaster by directly affecting liquid.Liquid flows down through top under gravity, limitedly can form a uneven laminar-flow film, and the unstable laminar-flow film of this section of beginning is called changeover portion, if structure of distributor is reasonable, then changeover portion is shorter, otherwise then changeover portion is longer.
CO is comprised as research
2at the core apparatus that interior aerochemistry solvent absorption dynamics data is measured, current wetted wall tower exists following not enough:
Tradition wetted wall tower is from top fluid, and in actual use, the ripple on liquid film surface can increase gas liquid interfacial area, changes mass transport process.The end flowing down liquid film all can form static film, and the absorption rate of this part is significantly less than flowing part above.When Physical Absorption, the absorption of static membrane portions can be ignored, but in chemical absorbing, the absorption of static film is also different along with the difference of reaction mechanism.Tradition wetted wall tower does not have design bottom breeze way, cannot get rid of the impact of static film on estimating precision.
Meanwhile, the uniformity of distribution of gas is the necessary condition ensureing the stable operation of every root film supplying tube.The current porous type gas distributor flow velocity generally adopted is uneven, and the gas axial velocity near porch is excessive, under the swabbing action of high velocity air, near formation recirculating zone, porch, causes distribution of gas uneven.
Utility model content
In view of Problems existing in background technology, the purpose of this utility model is to provide a kind of GAS ABSORPTION falling film reactor, and it can ensure the GAS ABSORPTION falling film reactor stability of liquid film and distribution of gas and uniformity in the course of the work.
To achieve these goals, the utility model provides a kind of GAS ABSORPTION falling film reactor, and it comprises chuck, wet pilaster, liquid distributing mechanism, upper fixed mechanism, lower fixed mechanism, distribution of gas mechanism and sealing mechanism.
Chuck has: inwall, and inwall forms accommodating cavity; And outer wall, the first cavity is formed with inwall in the middle part of inwall, be provided with and export with the heat-conducting medium import of the first cavity connects and heat-conducting medium, heat-conducting medium import, the first cavity and heat-conducting medium go out interruption-forming for the path of heat transfer medium flows, to be incubated or to heat via the heat-conducting medium of this flow channels to accommodating cavity.
Wet pilaster is contained in the accommodating cavity of chuck, there is wall portion and by wall portion around the hollow bulb formed, the bottom of hollow bulb for being communicated with outside solution supplying device, to receive the solution that solution supplying device provides.
Liquid distributing mechanism is contained in the accommodating cavity of chuck, and comprises: screw spreader, is hollow cylinder, is positioned at the top outer of wet pilaster and exceeds the top of wet pilaster and contact with the wall portion at the top place of wet pilaster; And top cap, be inverted U-shaped cylinder, be positioned at the top of wet pilaster and cover whole screw spreader.
Upper fixed mechanism is arranged at chuck top and is fixed at the top of chuck and seal, and has the gas outlet be communicated with the accommodating cavity of chuck.
Lower fixed mechanism is arranged at chuck bottom and is fixed the bottom of chuck and seal, and has the first opening allowing wet pilaster to pass.
Distribution of gas mechanism comprises lower cover, annular cavity portion and gas-liquid division board.
Lower cover is U-shaped cylinder, is fixedly connected on below lower fixed mechanism, has: sidewall, is provided with multiple interior air admission hole be distributed on the same sagittal plane of sidewall; And diapire, be provided with the second opening being positioned at diapire central authorities and the leakage fluid dram being positioned at diapire side.
Annular cavity portion inner hollow, the sidewall being fixedly connected on lower cover is outside, and the interior air admission hole in closed side wall, be provided with the external admission hole be communicated with outside compressed gas.
Gas-liquid division board ringwise, is fixedly connected on interior, and junction is positioned at the below of sagittal plane, air admission hole place, for carrying out flow direction variation to the gas entered via interior air admission hole and being directed in the accommodating cavity of chuck.
Sealing mechanism passes for wet pilaster and is fixedly connected on the second opening of lower cover, and by accommodating cavity from lower seal.
Wherein, the solution that outside solution supplying device provides moves upward vertically via the bottom of the hollow bulb of wet pilaster and flows into screw spreader in the over top of wet pilaster via the stop of top cap, solution is spiral in screw spreader to flow downward and forms uniform and stable spiral liquid stream from the solution that screw spreader flows out in the wall portion of wet pilaster, and the wall portion by the wet pilaster in Action of Gravity Field edge forms the liquid film of even downwards; The compressed gas that outside feeder provides flow in the accommodating cavity of chuck via the empty internal of external admission hole, annular cavity portion, interior air admission hole and gas-liquid division board, upwards to flow with liquid film counter current contacting, thus gas is absorbed by solution; Through being opened by gas-liquid division board and the gas partitions entered in the accommodating cavity of chuck after the solution absorption gas that the outer surface of the wall portion of wet pilaster flows from the top down, accumulate in the space that formed in the diapire of the sidewall of lower cover, lower cover, sealing mechanism, and discharge as the leakage fluid dram of waste liquid from diapire; The gas absorbed by liquid film upwards flowed is discharged via the gas outlet of upper fixed mechanism.
The beneficial effects of the utility model are as follows:
According in GAS ABSORPTION falling film reactor of the present utility model, the solution axially moved upward along the hollow bulb of wet pilaster flows into screw spreader via the stop of top cap, solution can form uniform and stable spiral liquid stream in the wall portion of wet pilaster under the effect of screw spreader, and then the liquid film of even is formed under gravity downwards along the wall portion of wet pilaster, ensure stability and the uniformity of GAS ABSORPTION liquid film.
According in GAS ABSORPTION falling film reactor of the present utility model, the flow direction of outside compressed gas is via the adjustment of the empty internal of external admission hole, annular cavity portion, interior air admission hole and gas-liquid division board and guiding, change the Flow Field Distribution of compressed gas, the impact of gas to liquid film can be reduced to greatest extent, thus avoid the stability destroying liquid film, also improve stability and the uniformity of gas simultaneously, improve gas-liquid mass transfer efficiency.
According in GAS ABSORPTION falling film reactor of the present utility model, through being opened by gas-liquid division board and the gas partitions entered in the accommodating cavity of chuck after the solution absorption gas that the outer surface of the wall portion of wet pilaster flows from the top down, and accumulate the sidewall in lower cover via the stop of sealing mechanism, the diapire of lower cover, in the space that sealing mechanism is formed, and discharge as the leakage fluid dram of waste liquid from diapire, by controlling the flow of the solution provided from the solution supplying device of outside entered via the hollow bulb of wet pilaster, the flow of the waste liquid discharged via leakage fluid dram, can ensure that the liquid level of the waste liquid in lower cover remains unchanged, and then the formation of liquid film can be controlled, thus effectively eliminate the fluctuation of the flow downwards of the wall portion along wet pilaster, improve stability and the uniformity of liquid film, thus be conducive to utilizing GAS ABSORPTION falling film reactor of the present utility model to carry out test and the research of aerochemistry solvent absorption.
Accompanying drawing explanation
Fig. 1 is the front view according to GAS ABSORPTION falling film reactor of the present utility model;
Fig. 2 is the front view of the distribution of gas mechanism according to GAS ABSORPTION falling film reactor of the present utility model;
Fig. 3 is the front view of the capsul according to GAS ABSORPTION falling film reactor of the present utility model.
Wherein, description of reference numerals is as follows:
1 chuck 52 lower gasket
11 inwall 53 lower gaskets
111 upper groove 54 times lap joint flanges
112 low groove 6 distribution of gas mechanisms
12 accommodating cavity 61 lower covers
13 outer wall 611 sidewalls
Air admission hole in 131 heat-conducting medium imports 6111
132 heat-conducting mediums export 612 diapires
14 first cavity 6,121 second openings
2 wet pilaster 6122 leakage fluid drams
21 wall portion 62 annular cavity portion
22 hollow bulb 621 external admission holes
3 liquid distributing mechanism 63 gas-liquid division boards
31 screw spreader 631 annular horizontal portions
32 cap 632 circular slanting portion, tops
The vertical portion of fixed mechanism 633 annular on 4
41 upper flange 7 sealing mechanisms
411 first through hole 71 capsuls
42 Upper gasket 711 roofs
43 upper gaskets 7111 the 3rd opening
Lap joint flange 712 sidewall on 44
5 times fixed mechanism 713 second cavitys
51 lower flange 72 fillers
511 second through holes
Detailed description of the invention
Describe GAS ABSORPTION falling film reactor of the present utility model with reference to the accompanying drawings in detail.
Referring to figs. 1 through Fig. 3, comprise chuck 1, wet pilaster 2, liquid distributing mechanism 3, upper fixed mechanism 4, lower fixed mechanism 5, distribution of gas mechanism 6 and sealing mechanism 7 according to GAS ABSORPTION falling film reactor of the present utility model.
Chuck 1 has: inwall 11, and inwall 11 forms accommodating cavity 12; And outer wall 13, the first cavity 14 is formed with inwall 11 in the middle part of inwall 11, be provided with the heat-conducting medium import 131 that is communicated with the first cavity 14 and heat-conducting medium exports 132, heat-conducting medium import 131, first cavity 14 and heat-conducting medium outlet 132 form the path for the flowing of heat-conducting medium (not shown), to be incubated or to heat via the heat-conducting medium of this flow channels to accommodating cavity 12.
Wet pilaster 2 is contained in the accommodating cavity 12 of chuck 1, there is wall portion 21 and by wall portion 21 around the hollow bulb 22 formed, the bottom of hollow bulb 22 for being communicated with the solution supplying device (not shown) of outside, to receive the solution that solution supplying device provides.
Liquid distributing mechanism 3 is contained in the accommodating cavity 12 of chuck 1, and comprises: screw spreader 31, is hollow cylinder, is positioned at the top outer of wet pilaster 2 and exceeds the top of wet pilaster 2 and contact with the wall portion 21 at the top place of wet pilaster 2; And top cap 32, be inverted U-shaped cylinder, be positioned at the top of wet pilaster 2 and cover whole screw spreader 31.
Upper fixed mechanism 4 is arranged at chuck 1 top and is fixed at the top of chuck 1 and seal, and has the gas outlet be communicated with the accommodating cavity 12 of chuck 1.
Lower fixed mechanism 5 is arranged at chuck 1 bottom and is fixed the bottom of chuck 1 and seal, and has the first opening allowing wet pilaster 2 to pass.
Distribution of gas mechanism 6 comprises lower cover 61, annular cavity portion 62 and gas-liquid division board 63.
Lower cover 61 is U-shaped cylinder, is fixedly connected on below lower fixed mechanism 5, has: sidewall 611, is provided with multiple interior air admission hole 6111 be distributed on the same sagittal plane of sidewall 611; And diapire 612, be provided with the second opening 6121 being positioned at diapire 612 central authorities and the leakage fluid dram 6122 being positioned at diapire 612 side.
Annular cavity portion 62 inner hollow, the sidewall 611 being fixedly connected on lower cover 61 is outside, and the interior air admission hole 6111 in closed side wall 611, be provided with the external admission hole 621 be communicated with outside compressed gas.
Gas-liquid division board 63 ringwise, be fixedly connected on sidewall 611 inner, and junction is positioned at the below of sagittal plane, air admission hole 6111 place, for carrying out flow direction variation to the gas entered via interior air admission hole 6111 and being directed in the accommodating cavity 12 of chuck 1.
Sealing mechanism 7 passes for wet pilaster 2 and is fixedly connected on the second opening 6121 of lower cover 61, and by accommodating cavity 12 from lower seal.
Wherein, the solution that outside solution supplying device provides moves upward vertically via the bottom of the hollow bulb 22 of wet pilaster 2 and flows into screw spreader 31 in the over top of wet pilaster 2 via the stop of top cap 32, solution is spiral in screw spreader 31 to flow downward and forms uniform and stable spiral liquid stream from the solution that screw spreader 31 flows out in the wall portion 21 of wet pilaster 2, by the wall portion 21 downward liquid film that form even of Action of Gravity Field along wet pilaster 2; The compressed gas that outside feeder (not shown) provides flow in the accommodating cavity 12 of chuck 1 via the empty internal of external admission hole 621, annular cavity portion 62, interior air admission hole 6111 and gas-liquid division board 63, upwards to flow with liquid film counter current contacting, thus gas is absorbed by solution; Through being opened by gas-liquid division board 63 and the gas partitions entered in the accommodating cavity 12 of chuck 1 after the solution absorption gas that the outer surface of the wall portion 21 of wet pilaster 2 flows from the top down, accumulate in the space that formed in the diapire 612 of the sidewall 611 of lower cover 61, lower cover 61, sealing mechanism 7, and discharge as the leakage fluid dram 6122 of waste liquid from diapire 612; The gas absorbed by liquid film upwards flowed is discharged via the gas outlet of upper fixed mechanism 4.
According in GAS ABSORPTION falling film reactor of the present utility model, the solution axially moved upward along the hollow bulb 22 of wet pilaster 2 flows into screw spreader 31 via the stop of top cap 32, solution can form uniform and stable spiral liquid stream in the wall portion 21 of wet pilaster 2 under the effect of screw spreader 31, and then under gravity along the downward liquid film forming even of wall portion 21 of wet pilaster 2, ensure stability and the uniformity of GAS ABSORPTION liquid film.
According in GAS ABSORPTION falling film reactor of the present utility model, the flow direction of outside compressed gas is via the adjustment of the empty internal of external admission hole 621, annular cavity portion 62, interior air admission hole 6111 and gas-liquid division board 63 and guiding, change the Flow Field Distribution of compressed gas, the impact of gas to liquid film can be reduced to greatest extent, thus avoid the stability destroying liquid film, also improve stability and the uniformity of gas simultaneously, improve gas-liquid mass transfer efficiency.
According in GAS ABSORPTION falling film reactor of the present utility model, through being opened by gas-liquid division board 63 and the gas partitions entered in the accommodating cavity 12 of chuck 1 after the solution absorption gas that the outer surface of the wall portion 21 of wet pilaster 2 flows from the top down, and accumulate the sidewall 611 in lower cover 61 via the stop of sealing mechanism 7, the diapire 612 of lower cover 61, in the space that sealing mechanism 7 is formed, and discharge as the leakage fluid dram 6122 of waste liquid from diapire 612, by controlling the flow of the solution provided from the solution supplying device (not shown) of outside entered via the hollow bulb 22 of wet pilaster 2, the flow of the waste liquid discharged via leakage fluid dram 6122, can ensure that the liquid level of the waste liquid in lower cover 61 remains unchanged, and then the formation of liquid film can be controlled, thus effectively eliminate the fluctuation (namely thin film drainage exists disturbance) of the flow downwards of the wall portion 21 along wet pilaster 2, improve stability and the uniformity of liquid film, thus be conducive to utilizing GAS ABSORPTION falling film reactor of the present utility model to carry out test and the research of aerochemistry solvent absorption.
According in GAS ABSORPTION falling film reactor of the present utility model, the outer wall 13 of chuck 1 is provided with conductive and heat-conductive plated film from external heat insulation or outer wall 13.
According in GAS ABSORPTION falling film reactor of the present utility model, the inwall 11 of chuck 1 is high pressure resistant glass, and outer wall 13 is the glass of resistance to normal pressure.The transparency of glass is convenient to the working condition of observing wetted wall tower, and the high voltage performance of inwall 11 can make GAS ABSORPTION falling film reactor of the present utility model work under authorized pressure.
According in GAS ABSORPTION falling film reactor of the present utility model, described heat-conducting medium is water or conduction oil.
According in GAS ABSORPTION falling film reactor of the present utility model, with reference to Fig. 1, in one embodiment, the inwall 11 of chuck 1 has: upper groove 111, is positioned at the upper outer of the first cavity 14 vertically and is arranged at the top of inwall 11; And low groove 112, be positioned at the lower outer of the first cavity 14 vertically and be arranged at the bottom of inwall 11.
According in GAS ABSORPTION falling film reactor of the present utility model, with reference to Fig. 1, in one embodiment, upper fixed mechanism 4 comprises: upper flange 41, be arranged at the top of chuck 1 and cover accommodating cavity 12 from top, being provided with the first through hole 411, as the gas outlet of upper fixed mechanism 4; Upper gasket 42, between the top being arranged at upper flange 41 and chuck 1; Upper gasket 43, is arranged in upper groove 111; Upper lap joint flange 44, radially be positioned at the outside of upper gasket 43 and be fixedly connected on upper flange 41 by bolt (not shown), and when upper lap joint flange 44 is bolted to connection in upper flange 41, upper lap joint flange 44 contacts with radial direction and extrudes upper gasket 43 below axially.Wherein, upper flange 41 is fixedly connected with upper lap joint flange 44, upper lap joint flange 44 is via upper gasket 43 upwardly chuck 1, and chuck 1 top is resisted against on upper flange 41 via Upper gasket 42, and then upper flange 41, Upper gasket 42, upper gasket 43 and upper lap joint flange 44 are by fastening for the top of chuck 1 and sealing.
According in GAS ABSORPTION falling film reactor of the present utility model, with reference to Fig. 1, in one embodiment, lower fixed mechanism 5 comprises: lower flange 51, to be arranged at bottom chuck 1 and to be fixedly connected on lower cover 61, being provided with the second through hole 511, as the first opening of lower fixed mechanism 5; Lower gasket 52, between being arranged at bottom lower flange 51 and chuck 1; Lower gasket 53, is arranged in low groove 112; Lower lap joint flange 54, radially be positioned at the outside of lower gasket 53 and be fixedly connected on lower flange 51 by bolt (not shown), and when lower lap joint flange 54 is bolted to connection in lower flange 51, lower lap joint flange 54 contacts with radial direction and extrudes lower gasket 53 above axially.Wherein, lower flange 51 is fixedly connected with lower lap joint flange 54, lower lap joint flange 54 is via lower gasket 53 extruding chuck 1 downwards, and be resisted against on lower flange 51 via lower gasket 52 bottom chuck 1, and then lower flange 51, lower gasket 52, lower gasket 53 and lower lap joint flange 54 are by fastening for the bottom of chuck 1 and sealing.
According in GAS ABSORPTION falling film reactor of the present utility model, annular cavity portion 62 is fixedly connected on lower cover 61 sidewall 611 by welding is outside.
According in GAS ABSORPTION falling film reactor of the present utility model, see figures.1.and.2, in one embodiment, multiple interior air admission hole 6111 is to arrange with the eccentric manner of external admission hole 621 not in same sagittal plane, and multiple interior air admission hole 6111 is vertically in height higher than external admission hole 621.Little and distribute sparse apart from the near interior air admission hole 6111 in external admission hole 621 in multiple interior air admission hole 6111, and the interior air admission hole 6111 far away apart from external admission hole 621 is large and densely distributed.The compressed gas that outside feeder (not shown) provides enters annular cavity portion 62 inside via external admission hole 621, because multiple interior air admission hole 6111 is to arrange with the eccentric manner of external admission hole 621 not in same sagittal plane, simultaneously near apart from external admission hole 621 in multiple interior air admission hole 6111 interior air admission hole 6111 is little and distribute sparse, and the interior air admission hole 6111 far away apart from external admission hole 621 is large and densely distributed, due to apart from external admission hole 621 near in air admission hole 6111 place air pressure large, and the air pressure of the interior air admission hole 6111 far away apart from external admission hole 621 is little, and this density of interior air admission hole 6111, arranging of size effectively can improve compressed gas enters the accommodating cavity 12 of chuck 1 uniformity via multiple interior air admission hole 6111.
According in GAS ABSORPTION falling film reactor of the present utility model, lower cover 61 is welded on lower flange 51.
According in GAS ABSORPTION falling film reactor of the present utility model, with reference to Fig. 2, in one embodiment, gas-liquid division board 63 has: annular horizontal portion 631, is positioned at the below of sagittal plane, air admission hole 6111 place and is fixedly connected on the inner surface of sidewall 611; Circular slanting portion 632; The top of sealing mechanism 7 is radially inwardly also extended upwardly beyond vertically from the end in annular horizontal portion 631; And the vertical portion 633 of annular, extend from the end in circular slanting portion 632 to parallel to the axis with wet pilaster 2 compartment of terrain.Wherein, the gas entered via interior air admission hole 6111 founds portion 633 via circular slanting portion 632 and annular to carry out flow direction variation and is directed in the accommodating cavity 12 of chuck 1.By the vertical portion 633 of annular horizontal portion 631, circular slanting portion 632 and annular, gas segmentation from entering via interior air admission hole 6111 is upwards guided, adjust the axial velocity of gas gradually, the vertical portion 633 of the annular gas had the most at last close to single axial speed guides to the accommodating cavity 12 of chuck 1, and recirculating zone can not be formed as background technology, thus make distribution of gas even, and then ensure the wet gas of pilaster and the stability of liquid film counter current absorption process.According in GAS ABSORPTION falling film reactor of the present utility model, see figures.1.and.2, in one embodiment, the end in the annular horizontal portion 631 of gas-liquid division board 63 is radially positioned at outside leakage fluid dram 6122.
According in GAS ABSORPTION falling film reactor of the present utility model, with reference to Fig. 1, in one embodiment, sealing mechanism 7 is for stuffing-box and comprise capsul 71 and filler 72.Filler 72 has the effect of elastic packing, wet pilaster 2 can be stretched along the 3rd opening about 7111 of the roof 711 of capsul 71 described later, and carry out effective sealing.With reference to Fig. 3, in one embodiment, capsul 71 is inverted U-shaped cylinder, has: roof 711, is provided with the 3rd opening 7111 passed for wet pilaster 2; And sidewall 712, form the second cavity 713 around wet pilaster 2, and be fixedly connected on the second opening 6121 of lower cover 61.With reference to Fig. 1, in one embodiment, filler 72, is filled in the second cavity 713, with by accommodating cavity 12 from lower seal.Roof 711 contacts the end of liquid film, and roof 711 and sidewall 712 form flowing ladder, and the end end effect produced by stagnant liquid film when can eliminate falling liquid film should.Filler 72 is filled in capsul 71 and seals by stuffing-box employing, and the structural requirement of mode to capsul 71 of filling is low, makes the structure of stuffing-box simple, low cost of manufacture, is convenient to again the replacing of capsul 71 and filler 72 simultaneously.
According in GAS ABSORPTION falling film reactor of the present utility model, with reference to Fig. 1 and Fig. 3, in one embodiment, wet pilaster 2 can be stretched along the 3rd opening about 7111 of the roof 711 of capsul 71, to change the contact area between gas and liquid film.Gas and liquid film between freely the changing of contact area, be more convenient to adjust wet pilaster 2 vertically for experimental conditions, be conducive to experimental data and measure, extend because contact area cannot change the assay limit caused.
According in GAS ABSORPTION falling film reactor of the present utility model, the outer surface of the wall portion 21 of wet pilaster 2 adopts the process of ultra micro blasted rough degree, to change the wetability of outer surface to solution of wall portion 21.Through changing the outer surface of the wall portion 21 of wet pilaster 2 to the wetability of solution, the surface and hydrophilic outer of the wall portion 21 of wet pilaster 2 can be increased, being conducive to forming uniform and stable liquid film.Relatively previously studied, liquid easily formed direct current when the outer surface of the wall portion 21 of wet pilaster 2 flows down, stopped or tore, turbulence etc., not only because falling liquid film design is unreasonable, also have much relations with the outer surface surface treatment of the wall portion 21 of wet pilaster 2.The good wet pilaster 2 of wetability is not only easy to form uniform and stable continuous print liquid film, and the data such as gas-liquid mass transfer area more can be made more reliable.
According in GAS ABSORPTION falling film reactor of the present utility model, described solution be alkanolamine solution, sulfone amine aqueous solution, amino acid salt solution, Complexing Iron solution, Lo-cat solution, Ben Feier solution, NaOH arbitrarily, sodium carbonate liquor, ammonia spirit, solution of potassium carbonate or aqua calcis.
According in GAS ABSORPTION falling film reactor of the present utility model, described gas is CO
2, N
2o, H
2s, SO
2or their mixing.Described gas is dry gas or moisture.Described gas is one-component or blending ingredients.
Claims (10)
1. a GAS ABSORPTION falling film reactor, is characterized in that, comprising:
Chuck (1), has:
Inwall (11), inwall (11) forms accommodating cavity (12); And
Outer wall (13), around inwall (11) middle part and form the first cavity (14) with inwall (11), be provided with the heat-conducting medium import (131) that is communicated with the first cavity (14) and heat-conducting medium exports (132), heat-conducting medium import (131), the first cavity (14) and heat-conducting medium outlet (132) form the path for heat transfer medium flows, and the heat-conducting medium via this flow channels is incubated accommodating cavity (12) or heats;
Wet pilaster (2), be contained in the accommodating cavity (12) of chuck (1), there is wall portion (21) and by wall portion (21) around the hollow bulb formed (22), the bottom of hollow bulb (22) for being communicated with outside solution supplying device, to receive the solution that solution supplying device provides;
Liquid distributing mechanism (3), is contained in the accommodating cavity (12) of chuck (1), and comprises:
Screw spreader (31) is hollow cylinder, is positioned at the top outer of wet pilaster (2) and exceeds the top of wet pilaster (2) and contact with the wall portion (21) at the top place of wet pilaster (2); And
Top cap (32), is inverted U-shaped cylinder, is positioned at the top of wet pilaster (2) and covers whole screw spreader (31);
Upper fixed mechanism (4), is arranged at chuck (1) top and the top of chuck (1) is fixed and sealed, and has the gas outlet be communicated with the accommodating cavity of chuck (1) (12);
Lower fixed mechanism (5), is arranged at chuck (1) bottom and the bottom of chuck (1) is fixed and sealed, and has the first opening allowing wet pilaster (2) to pass;
Distribution of gas mechanism (6), comprising:
Lower cover (61) is U-shaped cylinder, is fixedly connected on lower fixed mechanism (5) below, has:
Sidewall (611), is provided with the interior air admission hole (6111) on multiple same sagittal plane being distributed in sidewall (611); And
Diapire (612), is provided with the second opening (6121) being positioned at diapire (612) central authorities and the leakage fluid dram (6122) being positioned at diapire (612) side;
Annular cavity portion (62), inner hollow, the sidewall (611) being fixedly connected on lower cover (61) is outside, and the interior air admission hole (6111) in closed side wall (611), be provided with the external admission hole (621) be communicated with outside compressed gas;
Gas-liquid division board (63), ringwise, be fixedly connected on sidewall (611) inner, and junction is positioned at the below of air admission hole (6111) sagittal plane, place, for carrying out flow direction variation to the gas entered via interior air admission hole (6111) and being directed in the accommodating cavity (12) of chuck (1);
And
Sealing mechanism (7), passes for wet pilaster (2) and is fixedly connected on second opening (6121) of lower cover (61), and by accommodating cavity (12) from lower seal;
Wherein,
The solution that outside solution supplying device provides moves upward vertically via the bottom of the hollow bulb (22) of wet pilaster (2) and flows into screw spreader (31) in the over top of wet pilaster (2) via the stop on top cap (32), solution is spiral in screw spreader (31) to flow downward and forms uniform and stable spiral liquid stream from the solution that screw spreader (31) flows out in the wall portion (21) of wet pilaster (2), by wall portion (21) the downward liquid film that form even of Action of Gravity Field along wet pilaster (2);
The compressed gas that outside feeder provides flow in the accommodating cavity (12) of chuck (1) via external admission hole (621), the empty internal of annular cavity portion (62), interior air admission hole (6111) and gas-liquid division board (63), upwards to flow with liquid film counter current contacting, thus gas is absorbed by solution;
Through being opened by gas-liquid division board (63) and the gas partitions entered in the accommodating cavity (12) of chuck (1) after the solution absorption gas that the outer surface of the wall portion (21) of wet pilaster (2) flows from the top down, accumulate the sidewall (611) in lower cover (61), in space that the diapire (612) of lower cover (61), sealing mechanism (7) are formed, and to discharge as the leakage fluid dram (6122) of waste liquid from diapire (612);
The gas absorbed by liquid film upwards flowed is discharged via the gas outlet of upper fixed mechanism (4).
2. GAS ABSORPTION falling film reactor according to claim 1, is characterized in that, the inwall (11) of chuck (1) has:
Upper groove (111), is positioned at the upper outer of the first cavity (14) vertically and is arranged at the top of inwall (11); And
Low groove (112), is positioned at the lower outer of the first cavity (14) vertically and is arranged at the bottom of inwall (11).
3. GAS ABSORPTION falling film reactor according to claim 2, is characterized in that, upper fixed mechanism (4) comprising:
Upper flange (41), is arranged at the top of chuck (1) and covers accommodating cavity (12) from top, being provided with the first through hole (411), as the gas outlet of upper fixed mechanism (4);
Upper gasket (42), between the top being arranged at upper flange (41) and chuck (1);
Upper gasket (43), is arranged in upper groove (111);
Upper lap joint flange (44), radially be positioned at the outside of upper gasket (43) and be bolted to connection in upper flange (41), and being bolted to connection when upper flange (41) at upper lap joint flange (44), upper lap joint flange (44) is from axial below and radially contact and extrude upper gasket (43);
Wherein, upper flange (41) is fixedly connected with upper lap joint flange (44), upper lap joint flange (44) is via upper gasket (43) upwardly chuck (1), and chuck (1) top is resisted against on upper flange (41) via Upper gasket (42), and then upper flange (41), Upper gasket (42), upper gasket (43) and upper lap joint flange (44) are by fastening for the top of chuck (1) and sealing.
4. GAS ABSORPTION falling film reactor according to claim 2, is characterized in that, lower fixed mechanism (5) comprising:
Lower flange (51), is arranged at chuck (1) bottom and is fixedly connected on lower cover (61), being provided with the second through hole (511), as the first opening of lower fixed mechanism (5);
Lower gasket (52), is arranged between lower flange (51) and chuck (1) bottom;
Lower gasket (53), is arranged in low groove (112);
Lower lap joint flange (54), radially be positioned at the outside of lower gasket (53) and be bolted to connection in lower flange (51), and being bolted to connection when lower flange (51) at lower lap joint flange (54), lower lap joint flange (54) is from axial top and radially contact and extrude lower gasket (53);
Wherein, lower flange (51) is fixedly connected with lower lap joint flange (54), lower lap joint flange (54) extrudes chuck (1) downwards via lower gasket (53), and chuck (1) bottom is resisted against on lower flange (51) via lower gasket (52), and then lower flange (51), lower gasket (52), lower gasket (53) and lower lap joint flange (54) are by fastening for the bottom of chuck (1) and sealing.
5. GAS ABSORPTION falling film reactor according to claim 1, it is characterized in that, multiple interior air admission hole (6111) is to arrange with external admission hole (621) eccentric manner not in same sagittal plane, and multiple interior air admission hole (6111) is vertically in height higher than external admission hole (621).
6. GAS ABSORPTION falling film reactor according to claim 5, it is characterized in that, little and distribute sparse apart from the interior air admission hole (6111) that external admission hole (621) are near in multiple interior air admission hole (6111), and large and densely distributed apart from the interior air admission hole (6111) that external admission hole (621) are far away.
7. GAS ABSORPTION falling film reactor according to claim 1, is characterized in that, gas-liquid division board (63) has:
Annular horizontal portion (631), is positioned at the below of air admission hole (6111) sagittal plane, place and is fixedly connected on the inner surface of sidewall (611);
Circular slanting portion (632); The top of sealing mechanism (7) is radially inwardly also extended upwardly beyond vertically from the end of annular horizontal portion (631); And
The vertical portion (633) of annular, extends from the end of circular slanting portion (632) to parallel to the axis with wet pilaster (2) compartment of terrain;
Wherein, the gas entered via interior air admission hole (6111) founds portion (633) via circular slanting portion (632) and annular to carry out flow direction variation and is directed in the accommodating cavity (12) of chuck (1).
8. GAS ABSORPTION falling film reactor according to claim 1, is characterized in that, sealing mechanism (7) is for stuffing-box and comprise:
Capsul (71), is inverted U-shaped cylinder, has:
Roof (711), is provided with the 3rd opening (7111) passed for wet pilaster (2); And
Sidewall (712), forms the second cavity (713) around wet pilaster (2), and is fixedly connected on second opening (6121) of lower cover (61);
And
Filler (72), is filled in the second cavity (713), with by accommodating cavity (12) from lower seal.
9. GAS ABSORPTION falling film reactor according to claim 8, it is characterized in that, wet pilaster (2) can be stretched along the 3rd opening (7111) of the roof of capsul (71) (711), to change the contact area between gas and liquid film up and down.
10. GAS ABSORPTION falling film reactor according to claim 1, it is characterized in that, the outer surface of the wall portion (21) of wet pilaster (2) adopts the process of ultra micro blasted rough degree, to change the outer surface of wall portion (21) to the wetability of solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520732751.2U CN205216515U (en) | 2015-09-21 | 2015-09-21 | Gaseous falling liquid film reactor that absorbs |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520732751.2U CN205216515U (en) | 2015-09-21 | 2015-09-21 | Gaseous falling liquid film reactor that absorbs |
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| Publication Number | Publication Date |
|---|---|
| CN205216515U true CN205216515U (en) | 2016-05-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520732751.2U Expired - Fee Related CN205216515U (en) | 2015-09-21 | 2015-09-21 | Gaseous falling liquid film reactor that absorbs |
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| Country | Link |
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| CN (1) | CN205216515U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105413395A (en) * | 2015-09-21 | 2016-03-23 | 中石化节能环保工程科技有限公司 | Gas absorption falling film reactor |
| CN112032865A (en) * | 2020-07-30 | 2020-12-04 | 东南大学 | Falling film type liquid humidity regulator and method based on high-voltage electrostatic field polarization effect |
-
2015
- 2015-09-21 CN CN201520732751.2U patent/CN205216515U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105413395A (en) * | 2015-09-21 | 2016-03-23 | 中石化节能环保工程科技有限公司 | Gas absorption falling film reactor |
| CN105413395B (en) * | 2015-09-21 | 2017-10-31 | 中石化节能环保工程科技有限公司 | Gas absorbs falling film reactor |
| CN112032865A (en) * | 2020-07-30 | 2020-12-04 | 东南大学 | Falling film type liquid humidity regulator and method based on high-voltage electrostatic field polarization effect |
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