CN205210475U - Novel black matrix composition liquid crystal display - Google Patents
Novel black matrix composition liquid crystal display Download PDFInfo
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- CN205210475U CN205210475U CN201520948871.6U CN201520948871U CN205210475U CN 205210475 U CN205210475 U CN 205210475U CN 201520948871 U CN201520948871 U CN 201520948871U CN 205210475 U CN205210475 U CN 205210475U
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- 239000011159 matrix material Substances 0.000 title claims abstract description 14
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- 239000011521 glass Substances 0.000 claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 62
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
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- 238000007254 oxidation reaction Methods 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims description 16
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- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
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- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 4
- 229910000423 chromium oxide Inorganic materials 0.000 description 4
- 229910000428 cobalt oxide Inorganic materials 0.000 description 4
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 4
- 229910000480 nickel oxide Inorganic materials 0.000 description 4
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
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- CVOFKRWYWCSDMA-UHFFFAOYSA-N 2-chloro-n-(2,6-diethylphenyl)-n-(methoxymethyl)acetamide;2,6-dinitro-n,n-dipropyl-4-(trifluoromethyl)aniline Chemical compound CCC1=CC=CC(CC)=C1N(COC)C(=O)CCl.CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O CVOFKRWYWCSDMA-UHFFFAOYSA-N 0.000 description 1
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- Liquid Crystal (AREA)
Abstract
The utility model discloses a novel black matrix composition liquid crystal display including two glass substrate, all establishes one deck black mask on two glass substrate's the internal surface, set up the ITO conducting layer separately on the two black masks on lieing in two glass substrate, the tin electrode is pluged with molten metal for the oxidation that is used for the display pixel pattern to this ITO conducting layer, and ITO conducting layer cladding black mask, be equipped with a liquid crystal layer between two ITO conducting layers, the up end of this liquid crystal layer and down the terminal surface still be equipped with joining in marriage to the membrane of matching, wherein go up glass substrate's up end and still be equipped with polarizing on and lower polaroid down on glass substrate's the lower terminal surface respectively. This liquid crystal display solves the problem of easily short circuit between the two ITO electrodes, blocks that non - display pixel department is the transmission of light that ITO electrode gap goes out, reduces non - display pixel's luminousness, improves display pixel NOT AND display pixel's contrast, increases liquid crystal display's visible angle, and the yields is high when just producing, long service life.
Description
Technical field
Basis is novel relates to field of liquid crystal display, is specifically related to a kind of novel black matrix structure LCDs.
Background technology
In the prior art, LCDs comprises normal black pattern and normal white mode two kinds of patterns.For the LCDs of normal black pattern, in procedure for displaying, because liquid crystal molecule is oblique arrangement in liquid crystal cell, when different directions is seen, there will be the problem of gray-scale inversion, can non selected pixels be caused like this and non-fully is dark-state state, non selected pixels point also can have part light transmission, so can affect the display comparison degree of LCDs, when particularly ambient light is stronger out of doors, contrast is lower.For solving the appearance gray-scale inversion of above-mentioned existence, affect the problem of contrast, the mode of normal employing reduces the penetrability at non-display pixel place, improves the contrast of display pixel and non-display pixel and increase the visible angle of LCDs, thus being applicable to outdoor display.
As shown in Figure 1, the usual scheme solved the problem is that tin electrode 2 is pluged with molten metal in the oxidation etched respectively for display pixel pattern on the glass substrate 1 of the two panels up and down inside surface contacted with alignment film, the gap of simultaneously pluging with molten metal tin electrode 2 in oxidation goes out the black matrix 3 being filled with respectively and being made up of black material, stop that namely non-display pixel place is oxidized the transmission of pluging with molten metal the light that tin electrode gap goes out, thus reduce the transmittance of non-display pixel, improve the contrast of display pixel and non-display pixel, add the visible angle of LCDs.
As shown in Figure 1, but in the processing procedure of technique scheme, due to the restriction of manufacture craft and equipment, cause the trickle residual of the even and black material of black material (black matrix) crawling, the high temperature and carbonization occurs when toasting, the carbonization of black material can be pluged with molten metal on tin electrode in oxidation and be formed protruding or burr 4, tin electrode 2 contacting with each other because of protruding or burr 4 is pluged with molten metal in oxidation on upper and lower two substrates glass 1 inside surface, electrically conduct, thus make two oxidations on upper and lower two substrates glass 1 inside surface plug with molten metal tin electrode 2 short circuit, cause large batch of liquid crystal display in manufacture process bad, the reliability of product can not be guaranteed, when using LCDs, pressing or touching, also can make two oxidations on upper and lower two substrates glass 1 inside surface plug with molten metal tin 2 electric pole short circuit, thus cause the product of user side bad simultaneously.
Therefore, how to solve above-mentioned two oxidations and plug with molten metal problem that is jagged between tin electrode and easy short circuit, guarantee again to stop that namely non-display pixel place is oxidized the transmission of pluging with molten metal the light that tin electrode gap goes out simultaneously, reduce the transmittance of non-display pixel, improve the contrast of display pixel and non-display pixel, adding the visible angle of LCDs, is the hope of the emphasis studied of the applicant also industry.
Utility model content
This novel technical matters to be solved provides a kind of novel black matrix structure LCDs for defect of the prior art, and the good reliability of this LCDs, defective products rate is low, long service life.
For overcoming the defect in above-mentioned technical matters; this new technique scheme is as follows: a kind of novel black matrix structure LCDs; comprise top glass substrate positioned opposite to each other and lower glass substrate, the inside surface of described top glass substrate and lower glass substrate all arranges one deck black masks; Be provided with ITO conductive layer being positioned in black masks described in described top glass substrate and lower glass substrate two, this ITO conductive layer is plug with molten metal tin electrode for the oxidation of display pixel pattern, and the coated described black masks of described ITO conductive layer; A liquid crystal layer is being provided with between ITO conductive layer described in two, also be provided with the alignment film of coupling in the upper surface of this liquid crystal layer and lower surface, the upper surface of described top glass substrate and the lower surface of described lower glass substrate are also respectively arranged with corresponding upper polaroid and lower polaroid.
Further elaboration as to technique scheme:
In technique scheme, the resistivity of described black masks is 10
6Ω .cm ~ 10
8Ω .cm.
In technique scheme, containing black metal oxide particle in described black masks.
In technique scheme, described black metal oxide particle is the particle of at least one in cobalt oxide, chromium oxide, manganese oxide and nickel oxide.
In technique scheme, described liquid crystal layer is the liquid crystal layer comprising the synthesis of liquid crystal material with dielectric anisotropy.
A kind of technical scheme preparing above-mentioned LCDs that this is novel also provides is as follows:
And the method step preparing the LCDs in technique scheme is as follows:
Steps A, top glass substrate and lower glass substrate preparation:
Select glass substrate, cleaning treatment is done to glass baseplate surface;
Step B, prepared by black masks:
On glass substrate after selecting the black material of the particle comprising at least one in cobalt oxide, chromium oxide, manganese oxide and nickel oxide to coat cleaning, more successively the uniform black material of coating is exposed, develops and solidified;
Prepared by step C, ITO conductive layer:
By comprise electrode material that oxidation plugs with molten metal tin be evenly plated on prepared black masks top glass substrate and lower glass substrate on, after plated film completes, foreign matter is cleaned;
Step D, photosensitive layer preparation and removing:
ITO conductive layer is coated with one deck photoresists, and carry out successively exposing, develop, corrosion treatment, carry out again after completing removing photoresist and cleaning treatment, described photosensitive layer got rid of;
Step e, prepared by alignment film:
The top glass substrate of completing steps D and lower glass substrate medial surface printing alignment film and polish, after polish, then carry out silk-screen, to version and solidification, complete alignment film and prepare;
Step F, prepared by liquid crystal layer; The preparation of liquid crystal layer comprises boundary's fragmentation and fills with liquid crystal molecule.
Step G, installs polaroid;
Step H, detects: whether residual superfluous detect black masks, high temperature cabonization makes two-layer ITO conductive layer electrical communication, and detect photosensitive layer, whether whether ITO conductive layer is coated with and prepares all even polaroid be in place.
Further, in step C, the preparation of ITO conductive layer comprises the steps:
Step one: prepare before plating, comprises clean and processes glass substrate, making evaporation source, clean vacuum chambers and glass substrate fixture and install evaporation source and lay glass substrate;
Step 2: to vacuumize, Ions Bombardment,
By being used for toasting, the vacuum chamber of fritting and evaporation is pumped to vacuum state, glow discharge, makes to produce ion at a high speed in vacuum chamber, utilizes ionizing particle cleaning glass substrate; The condition of Ions Bombardment is: vacuum indoor pressure 0.13Pa ~ 13Pa, glow discharge voltage 1.5kV ~ 10kV, bombardment time 5min ~ 60min;
Step 3: baking, fritting and evaporation, glass substrate is positioned in vacuum chamber carry out toasting, fritting and evaporation process, remove residual gas in glass substrate, ITO conductive layer;
Step 4: conductive layer surface process.
This novel beneficial effect is:
One is, by black masks being arranged at ITO conductive layer lower end, that avoids causing because making reason forms burr or projection on ITO conductive layer, thus reduces defective products in production run, enhances productivity;
Two are, because black masks is positioned at ITO conductive layer lower end, avoid the bad of the use side formed because touching or press in use procedure, ensure product stability;
Three are, black masks is positioned at ITO conductive layer lower end, and the good reliability of LCDs reduces unnecessary reprocessing, and save production cost, and long service life.
Four are, solve problem that is jagged between ITO electrode and easy short circuit, guarantee again the transmission stopping the light that non-display pixel place and ITO electrode gap go out simultaneously, reduce the transmittance of non-display pixel, improve the contrast of display pixel and non-display pixel, add the visible angle of LCDs.
Accompanying drawing explanation
Fig. 1 is that the layer of structure of available liquid crystal display is schemed respectively;
Fig. 2 is this novel layer of structure distribution plan;
Fig. 3 is process flow diagram prepared by this Novel LCD;
The typical process flow of the plating ITO conductive layer that Fig. 4 makes this novel.
In figure, 11. top glass substrate, 12. lower glass substrate, black masks on 21., 22. times black masks, ITO conductive layer on 31., 32. times ITO conductive layers, alignment film on 41., 42. times orientations, polaroid on 51., 52. times polaroids, 6. liquid crystal layers.
Embodiment
Further illustrate novel below in conjunction with accompanying drawing 2-4.
As Fig. 2 show this novel as described in specific embodiment; a kind of novel black matrix structure LCDs; comprise top glass substrate 11 positioned opposite to each other and lower glass substrate 12; the inside surface of described top glass substrate 11 and lower glass substrate 12 all arranges one deck black masks, and it is respectively black masks 21 and lower black masks 22; On to be positioned in described top glass substrate 11 and lower glass substrate 12 described, black masks 21 and lower black masks 22 are respectively equipped with ITO conductive layer 31 and lower ITO conductive layer 32; this two ITO conductive layer is plug with molten metal tin electrode for the oxidation of display pixel pattern, and the corresponding coated corresponding described upper black masks 21 of ITO conductive layer described in two and lower black masks 22; A liquid crystal layer 6 is being provided with between ITO conductive layer described in two, also be provided with the upper alignment film 41 of coupling and lower orientation 42 film in the upper surface of this liquid crystal layer 6 and lower surface, the upper surface of described top glass substrate 11 and the lower surface of described lower glass substrate 12 are also respectively arranged with corresponding upper polaroid 51 and lower polaroid 52; And in actual production, first ITO conductive layer 31 and lower ITO conductive layer 32 are equipped with a photosensitive layer (not indicating in figure) on described, then when finished product completes, this photosensitive layer can disallowable fall.
Wherein, the resistivity of described upper and lower black masks is 10
6Ω .cm ~ 10
8Ω .cm; Containing black metal oxide particle in described upper and lower black masks; Described black metal oxide particle is the particle of at least one in cobalt oxide, chromium oxide, manganese oxide and nickel oxide; Described liquid crystal layer 6 is for comprising the liquid crystal layer 6 of the synthesis of liquid crystal material with dielectric anisotropy.
The LCDs of the present embodiment is by being arranged at ITO conductive layer lower end by black masks, that avoids causing because making reason forms burr or projection on ITO conductive layer, thus reduces defective products in production run, enhances productivity; Because black masks is positioned at ITO conductive layer lower end, avoiding the bad of the use side formed because touching or press in use procedure, ensureing product stability;
Black masks is positioned at ITO conductive layer lower end, and the good reliability of LCDs reduces unnecessary reprocessing, and saves production cost, and long service life.
With reference to accompanying drawing 3-4, the black matrix structure LCDs made in the present embodiment comprises following concrete steps:
Steps A, prepared by top glass substrate 11 and lower glass substrate 12: select glass substrate, do cleaning treatment to glass baseplate surface;
Step B, prepared by upper black masks 21 and lower black masks 22: on the glass substrate after selecting the black material of the particle comprising at least one in cobalt oxide, chromium oxide, manganese oxide and nickel oxide to coat cleaning, then exposes the uniform black material of coating, develop and solidify successively;
Prepared by step C, ITO conductive layer: by comprise electrode material that oxidation plugs with molten metal tin be evenly plated on prepared black masks top glass substrate 11 and lower glass substrate 12 on, after plated film completes, foreign matter is cleaned;
Step D, photosensitive layer (not shown) preparation and removing: be coated with one deck photoresists on ITO conductive layer, and carry out successively exposing, develop, corrosion treatment, carry out again after completing removing photoresist and cleaning treatment, described photosensitive layer got rid of;
Step e, upper alignment film 41 and lower orientation 42 film preparation: the top glass substrate 11 of completing steps D and lower glass substrate 12 medial surface printing alignment film and polish, after polish, then carry out silk-screen, to version and solidification, complete alignment film and prepare;
Step F, prepared by liquid crystal layer 6, the preparation of liquid crystal layer 6 comprises boundary's fragmentation and fills with liquid crystal molecule, wherein, described boundary fragmentation refers in preparation, and aforesaid black masks, ITO conductive layer, photosensitive layer and alignment film complete with large-size substrate, before filling liquid crystal, device fragmentation need be become chip size, meet the preparation of product;
Step G, installs polaroid 51 and lower polaroid 52;
Step H, detects: whether residual superfluous detect black masks, high temperature cabonization makes two-layer ITO conductive layer electrical communication, and detect photosensitive layer, whether whether ITO conductive layer is coated with and prepares all even polaroid be in place.
In above-mentioned preparation process, in step C, the preparation of ITO conductive layer comprises the steps:
Step one: prepare before plating, comprises clean and processes glass substrate, making evaporation source, clean vacuum chambers and glass substrate fixture and install evaporation source and lay glass substrate.It should be noted that, the size of ITO conductive layer and glass baseplate surface adhesion to be plated is the index of display screen quality-critical; It comprises factor in the majority, and the surface treatment before plated film is one of the most basic factor; If glass baseplate surface to be plated has grease, planar water, dust etc. can reduce the adhesion of rete, affect surfaceness.And select suitable evaporating materials to be the pacing items obtaining high-quality rete.And it should be noted that in actual production, if when vacuum chamber has inner cover and also has pollution, inner cover need be cleaned or change inner cover; If vacuum chamber can use calcium carbonate wiping without inner cover, then water is wiped, and finally cleans with absolute ethyl alcohol.And for fixture, conventional aluminium fixture first can be dipped to surface in brown with 20%NaOH liquid, cleaner with running water, be dipped into brown with HNO3 and disappear, then wash oven dry.When evaporation source is installed, degreasing gloves need be worn, degreasing before instrument important affair, and ensure evaporation source and electrode good contact
Step 2: to vacuumize, Ions Bombardment, by being used for toasting, the vacuum chamber of fritting and evaporation is pumped to vacuum state, glow discharge, makes to produce ion at a high speed in vacuum chamber, utilizes ionizing particle cleaning glass substrate; The condition of Ions Bombardment is: vacuum indoor pressure 0.13Pa ~ 13Pa, glow discharge voltage 1.5kV ~ 10kV, bombardment time 5min ~ 60min; In actual production, vacuum step is: open cooling water valve, is adjusted to required hydraulic pressure, connects general supply, closes the air valve leading to vacuum chamber, shuts pipeline valve, start mechanical pumping source, open forevacuum valve.Now mechanical pump is bled to vacuum chamber, after carry out Ions Bombardment, connect heating diffusion pumps power supply, close forevacuum valve, when diffusion pump reaches job requirement, close vacuum valve, opening conduits valve, opens high vacuum valve, now, diffusion pump, mechanical pump are bled to vacuum chamber, carry out toasting, fritting and evaporation after vacuum tightness reaches certain numerical value.It should be noted that, the ultimate principle of Ions Bombardment is: during glow discharge, Ions Bombardment electronics obtains very high speed, around glass substrate because of the larger mobility of electronics rapidly with negative charge, under the effect of negative charge attractive force, positive ion bombardment glass baseplate surface, glass baseplate surface has energy exchange, between glass substrate adsorbed layer and active gases, there is chemical reaction, thus reach the effect of clean surface.
Step 3: baking, fritting and evaporation, glass substrate is positioned in vacuum chamber carry out toasting, fritting and evaporation process, remove residual gas in glass substrate, ITO conductive layer; It should be noted that, the gas that baking can accelerate glass plating substrate or fixture absorption is overflowed rapidly, be conducive to gas clean-up and membranous layer binding force, should be noted during baking, lower than the heat distortion temperature 20 ~ 30 DEG C of glass band baking object, 200 DEG C will be generally no more than to metal-baking for nonmetal baking temperature; Fritting can remove the gas adsorbed in low-melting impurities and evaporation source and evaporating materials in evaporating materials, and what be conducive to evaporating carries out smoothly, and it is 6.6 × 10 that the vacuum tightness of fritting is often selected
3pa, the time, should fritting repeatedly to the large material of hydroscopicity with till melting completely, and total requirement is that vacuum tightness no longer declines when evaporating materials is warmed up to evaporating temperature.
Step 4: conductive layer surface process.
It is novel that above embodiment is just to illustrate instead of limit this, therefore the equivalence that the method described in Fan Yiben new patent application range is done changes or modifies, and is included in this new patent application range.
Claims (4)
1. a novel black matrix structure LCDs, is characterized in that: comprise top glass substrate positioned opposite to each other and lower glass substrate, and the inside surface of described top glass substrate and lower glass substrate all arranges one deck black masks; Be provided with ITO conductive layer being positioned in black masks described in described top glass substrate and lower glass substrate two, this ITO conductive layer is plug with molten metal tin electrode for the oxidation of display pixel pattern, and the coated described black masks of described ITO conductive layer; A liquid crystal layer is being provided with between ITO conductive layer described in two, also be provided with the alignment film of coupling in the upper surface of this liquid crystal layer and lower surface, the upper surface of described top glass substrate and the lower surface of described lower glass substrate are also respectively arranged with corresponding upper polaroid and lower polaroid.
2. a kind of novel black matrix structure LCDs according to claim 1, is characterized in that: described black masks is resistivity is 10
6Ω .cm ~ 10
8the black masks of Ω .cm.
3. a kind of novel black matrix structure LCDs according to claim 1 and 2, is characterized in that: described black masks is the black masks including black metal oxide particle.
4. a kind of novel black matrix structure LCDs according to claim 1, is characterized in that: described liquid crystal layer is the liquid crystal layer comprising the synthesis of liquid crystal material with dielectric anisotropy.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520948871.6U CN205210475U (en) | 2015-11-25 | 2015-11-25 | Novel black matrix composition liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520948871.6U CN205210475U (en) | 2015-11-25 | 2015-11-25 | Novel black matrix composition liquid crystal display |
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|---|---|
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105353553A (en) * | 2015-11-25 | 2016-02-24 | 东莞通华液晶有限公司 | Novel liquid crystal display screen of black matrix structure and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105353553A (en) * | 2015-11-25 | 2016-02-24 | 东莞通华液晶有限公司 | Novel liquid crystal display screen of black matrix structure and preparation method thereof |
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Granted publication date: 20160504 |