CN205205268U - Plating solution circulation filtration system - Google Patents

Plating solution circulation filtration system Download PDF

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Publication number
CN205205268U
CN205205268U CN201520776879.9U CN201520776879U CN205205268U CN 205205268 U CN205205268 U CN 205205268U CN 201520776879 U CN201520776879 U CN 201520776879U CN 205205268 U CN205205268 U CN 205205268U
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China
Prior art keywords
filtering system
electroplating solution
filter vat
diapire
circulation groove
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CN201520776879.9U
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Chinese (zh)
Inventor
蔡志浩
赵喜华
肖昭荣
刘雄辉
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Dongguan Weiligu Circuit Board Equipment Co Ltd
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Dongguan Weiligu Circuit Board Equipment Co Ltd
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Priority to CN201520776879.9U priority Critical patent/CN205205268U/en
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Abstract

The utility model discloses a plating solution circulation filtration system. Plating solution circulation filtration system is including the plating bath, circulating slot, filter equipment and the circulating pump that communicate in proper order, circulating slot fixed connection in the plating bath bottom, filter equipment is located the circulating slot bottom sets up rather than the interval, filter equipment includes filter vat and filter, describe for the opening on the top of filter vat, the filter is located in the filter vat, the circulating pump communicate in filter equipment's bottom. Compared with the prior art, the utility model discloses a plating solution circulation filtration system can maintain on line filter equipment sparingly takes up an area of the space.

Description

Electroplating solution of cyclic filtering system
Technical field
The utility model relates to circuit board electroplating technical field, particularly relates to a kind of electroplating solution of cyclic filtering system.
Background technology
Plating, as the important step in board production, is make the circuit card be immersed in electroplate liquid form the technological process of coating by electrolytic action.Electroplating evenness is the important indicator evaluating electroplating quality, and electroplate liquid is as element requisite in electroplating process, has conclusive effect to electroplating evenness.Usually, the concentration of electroplate liquid controls all can affect electroplating evenness containing impurity etc. in inequality, liquid.
In correlation technique, electroplating solution of cyclic filtering system comprises the plating tank, circulation groove, recycle pump and the strainer that are communicated with successively, described circulation groove is for holding the electroplate liquid overflowed in described plating tank, electroplate liquid in described circulation groove is pumped into described strainer by described recycle pump, then provides power to push back the electroplate liquid in strainer to described plating tank by recycle pump.Above-mentioned electroplating solution of cyclic filtering system architecture is negative pressure structure; need to apply power by described recycle pump and electroplate liquid is full of described strainer; push back described plating tank again; therefore described strainer is sealed structure, and therefore, the maintenance of described strainer needs shutdown operation; cause the interruption of production; and need during filter service to open it, then need to account for larger space, waste resource.
Therefore, be necessary to provide a kind of new electroplating solution of cyclic filtering system to solve the problem.
Utility model content
The utility model technical issues that need to address are to provide a kind of compact construction and can the electroplating solution of cyclic filtering systems of on-line maintenance.
For solving the problems of the technologies described above, the utility model provides a kind of electroplating solution of cyclic filtering system, comprise the plating tank, circulation groove, filtration unit and the recycle pump that are communicated with successively, described circulation groove is fixedly connected on bottom described plating tank, described filtration unit to be positioned at bottom described circulation groove and setting with interval, described filtration unit comprises filter vat and strainer, the top of described filter vat is opening shape, described filter bits is in described filter vat, and described recycle pump is communicated in the bottom of described filtration unit.
Preferably, described filter vat comprises diapire and is located at the liquid outlet of described diapire, and described diapire is with respect to the horizontal plane in skewed, and described recycle pump is communicated with described liquid outlet.
Preferably, described liquid outlet is located at one end of the close described circulation groove of described diapire.
Preferably, described strainer is filter bag.
Preferably, described filter bag is multiple, and arranges along the short transverse interval of described filter vat.
Preferably, successively decrease from the top of described filter vat successively to described diapire direction in the aperture of described filter bag.
Preferably, described filter bag comprises acf layer.
Preferably, described filter vat also comprises the sewage draining exit being located at described diapire, and described sewage draining exit is positioned at one end away from described circulation groove of described diapire.
Compared with correlation technique, in electroplating solution of cyclic filtering system of the present utility model, electroplate liquid flows into filter vat through described circulation groove, then by described recycle pump from plating tank described in suction in described filter vat.Described filtration unit is positioned at bottom circulation groove, saves and takes up an area space; Without the need to pressure in described filter vat, therefore described filter vat top is opening shape, thus makes replacing and the maintenance that can carry out described filter bag in working cycle, simple operation, and electroplating solution of cyclic filtering system continuous operating time extends; Described filter bag is multilayer and successively successively decrease in aperture, and described filter bag is provided with adsorption layer, and filter effect is better, improves the electroplating quality of described circuit card.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model electroplating solution of cyclic filtering system.
Embodiment
Below in conjunction with drawings and embodiments, the utility model is described in further detail.
With reference to Fig. 1, it is the structural representation of the utility model electroplating solution of cyclic filtering system.Described electroplating solution of cyclic filtering system 1 comprises plating tank 11, circulation groove 13, filtration unit 15, recycle pump 17 and circulating line 19.
The electroplate liquid of overflow from described plating tank 11 flows into described circulation groove 13 through described circulating line 19, described circulation groove 13 one end is fixedly connected on the bottom of described plating tank 11, described circulation groove 13 the other end is provided with liquid discharge pipe 131, electroplate liquid flows into described filtration unit 15 through described liquid discharge pipe 131, described liquid discharge pipe 131 stretches in described filtration unit 15, prevents electroplate liquid from spilling.The entrance of described recycle pump 17 is communicated with described filtration unit 15, bottom plating tank 11 described in its outlet, electroplate liquid refluxes from the bottom of described plating tank 11, prevents the Impurity deposition in electroplate liquid in the bottom of described plating tank 11, electroplate liquid mixing evenly, electroplating quality is higher.
Certainly, the mode of communicating between each electroplanting device is not limited in takes described circulating line 19 to connect, and other devices that can play connection effect are all in like manner included in protection domain of the present utility model.
Described filtration unit 15 is positioned at the bottom of described circulation groove 13 and setting with interval, and described plating tank 11, described circulation groove 13 and described filtration unit 15 form the filtering system of vertical continuous, saves and takes up an area space, reduce costs.
Described filtration unit 15 comprises filter vat 151 and strainer 153, and described strainer 153 is positioned at described filter vat 151.
The fixed connections such as described filter vat 151 is connected with the bottom (non-label) of described circulation groove 13, and mode of connection is welding, this mode of connection is saved further and is produced line occupation of land space.
Described filter vat 151 also can be bolt with the mode of connection of described circulation groove 13 and is connected, and is convenient to dismantle described filter vat 151 to clean it and to safeguard.Certainly, described filter vat 151 and the mode of connection of described circulation groove 13 are not limited only to weld or bolt is connected, and other fixed method of attachment or detachable connection methods, be all in like manner included in protection domain of the present utility model.
Described filter vat 151 comprises liquid outlet 1511, diapire 1513, opening 1515 and sewage draining exit 1517.Described diapire 1513 is with respect to the horizontal plane in skewed, and described liquid outlet 1511 is located at one end of the close described circulation groove 13 of described diapire 1513, and described sewage draining exit 1517 is positioned at one end away from described circulation groove 13 of described diapire 1513.Described liquid outlet 1511 is for discharging electroplate liquid, this is provided with to be beneficial in electroplate liquid does not filter clean impurity in the sedimentation of described diapire 1513, the electroplate liquid that described liquid outlet 1511 is flowed out is more clean, the diapire 1513 of impurity after sedimentation through being obliquely installed is deposited to described sewage draining exit 1517 one end, can periodic blow down.Described recycle pump 17 is communicated with described liquid outlet 1511, and electroplate liquid reduces the infringement of described recycle pump 17.
Described strainer 153 is filter bag, described filter bag is that multiple and along described filter vat 151 short transverse interval is arranged, specifically can arrange according to filter effect, 2 are set in present embodiment, described filter bag and described filter vat 151 are for removably connecting, and described filter bag is divided into spaced first filter bag 1531 and the second filter bag 1533 of short transverse along described filter vat 151.
Successively decrease from the top of described filter vat 151 successively to the direction of described diapire 1513 in the aperture of described filter bag, namely the aperture of described first filter bag 1531 is greater than the aperture of described second filter bag 1533, this arranges the solid impurity for filtering different pore size in electroplate liquid, and two-layer filter effect is better.
Described first filter bag 1531 and the second filter bag 1533 are respectively equipped with activated carbon fiber layers (not shown), for adsorbing the solia particle in electroplate liquid, optimize filter effect.
Described strainer 153 is not limited in described filter bag, and other filtration units are all in like manner included in protection domain of the present utility model.
Described filter bag is not limited in two-layer; described first filter bag 1531 and the adsorption layer set by described second filter bag 1533 are also not limited only to described acf layer; one or more layers filter bag is set; and other adsorption layers with adsorption effect are set, be all in like manner included within protection domain of the present utility model.
Described opening 1515 is positioned at the top of described filter vat 151, and make described filter vat 151 form Open architecture, electroplate liquid flows into described filter vat 151 through described circulation groove 13, then is pumped to described plating tank 11 from described filter vat 151 by described recycle pump 17.Without the need to pressure in described filter vat 151, therefore described filter vat 151 top is opening shape, thus makes electroplate liquid can carry out replacing and the maintenance of described strainer 153 online in working cycle, simple operation.Can be dismantled described strainer 153 by described opening 1515, installation and maintenance; therefore; synchronously can carry out the replacing of described strainer 153 in described electroplating solution of cyclic filtering system 1 is run, do not need shutdown operation, the continuous operating time of described electroplating solution of cyclic filtering system 1 is longer.
Compared with correlation technique, described in electroplating solution of cyclic filtering system 1 of the present utility model, filtration unit 15 is open setting, without the need to pressure in it, replacing and the maintenance that can carry out described strainer 153 online is not shut down in the working cycle of electroplate liquid, simple operation, the continuous operating time of described electroplating solution of cyclic filtering system 1 extends; Described plating tank 11, described circulation groove 13 and described filtration unit 15 are vertically arranged successively, save and take up an area space; Arrange the described filter bag successively decreased successively in multilayer aperture, and described filter bag arranges described acf layer, filter effect is better, and the electroplating quality of circuit card is better.
The foregoing is only embodiment of the present utility model; not thereby the scope of the claims of the present utility model is limited; every utilize the utility model specification sheets and accompanying drawing content to do equivalent structure or flow process conversion; or be directly or indirectly used in other relevant technical fields, be all in like manner included in scope of patent protection of the present utility model.

Claims (8)

1. an electroplating solution of cyclic filtering system, comprise the plating tank, circulation groove, filtration unit and the recycle pump that are communicated with successively, described circulation groove is fixedly connected on bottom described plating tank, it is characterized in that: described filtration unit to be positioned at bottom described circulation groove and setting with interval, described filtration unit comprises filter vat and strainer, the top of described filter vat is opening shape, and described filter bits is in described filter vat, and described recycle pump is communicated in the bottom of described filtration unit.
2. electroplating solution of cyclic filtering system according to claim 1, is characterized in that: described filter vat comprises diapire and is located at the liquid outlet of described diapire, and described diapire is with respect to the horizontal plane in skewed, and described recycle pump is communicated with described liquid outlet.
3. electroplating solution of cyclic filtering system according to claim 2, is characterized in that: described liquid outlet is located at one end of the close described circulation groove of described diapire.
4. electroplating solution of cyclic filtering system according to claim 2, is characterized in that: described strainer is filter bag.
5. electroplating solution of cyclic filtering system according to claim 4, is characterized in that: described filter bag is multiple, and arranges along the short transverse interval of described filter vat.
6. electroplating solution of cyclic filtering system according to claim 5, is characterized in that: successively decrease from the top of described filter vat successively to described diapire direction in the aperture of described filter bag.
7. electroplating solution of cyclic filtering system according to claim 4, is characterized in that: described filter bag comprises acf layer.
8. electroplating solution of cyclic filtering system according to claim 3, is characterized in that: described filter vat also comprises the sewage draining exit being located at described diapire, described sewage draining exit is positioned at one end away from described circulation groove of described diapire.
CN201520776879.9U 2015-09-30 2015-09-30 Plating solution circulation filtration system Active CN205205268U (en)

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CN205205268U true CN205205268U (en) 2016-05-04

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109881241A (en) * 2018-12-19 2019-06-14 西安赛尔电子材料科技有限公司 A kind of electroplating solution of cyclic filtering system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109881241A (en) * 2018-12-19 2019-06-14 西安赛尔电子材料科技有限公司 A kind of electroplating solution of cyclic filtering system

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