CN205177863U - High damp proof membrane of solar cell that passes through - Google Patents
High damp proof membrane of solar cell that passes through Download PDFInfo
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- CN205177863U CN205177863U CN201520841685.2U CN201520841685U CN205177863U CN 205177863 U CN205177863 U CN 205177863U CN 201520841685 U CN201520841685 U CN 201520841685U CN 205177863 U CN205177863 U CN 205177863U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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Abstract
The utility model provides a high damp proof membrane of solar cell that passes through, mainly including: substrate layer, oxide layer group, middle optical film layer, dielectric substance layer and ultraviolet ray absorbed layer, oxide layer group is including oxidation titanium layer and carbonization silicon layer, the titanium oxide level is in the upper surface of substrate layer, the carborundum level is in oxidation titanium layer upper surface, middle optical film layer lies in carbonization silicon layer upper surface, optical film layer's upper surface in the middle of the dielectric substance layer is located, the ultraviolet ray absorbed layer is located the lower surface of substrate layer. The utility model provides a high damp proof membrane of solar cell that passes through utilizes oxide layer group as the water blocking layer, has simplified the membrane waterproofing structure of complicacy among the prior art greatly, and the positive transmission of light rate of optical film layer reinforcing sets up dielectric substance layer and ultraviolet ray absorbed layer in addition and can strengthen solar cell to the light absorption in the middle of setting up simultaneously.
Description
Technical field
The utility model belongs to thin film materials art, particularly a kind of high solar cell moisture barrier films thoroughly.
Background technology
Solar cell is also called " solar chip " or " photocell ", is a kind of optoelectronic semiconductor thin slice utilizing the sunlight direct generation of electricity.As long as it is arrived by illumination, moment just exportable voltage and when there being loop generation current.Solar cell mostly is macromolecular material due to the material of used photoelectric conversion layer, some simple formation methods such as rubbing method or ink-jet method can be used to make photoelectric conversion layer, therefore start the attention obtaining industrial circle.
Although organic solar batteries possesses lot of advantages, its organic photoelectric conversion material used is but quite responsive to aqueous vapor, therefore usually can make because of the infiltration of aqueous vapor in use for some time to shorten its useful life or service efficiency reduction.Therefore, be badly in need of a kind of moisture barrier films intercepting aqueous vapor invasion, the use of moisture barrier films simultaneously must not hinder the transmission of sunlight.
Utility model content
The purpose of this utility model is to provide a kind of high solar cell moisture barrier films thoroughly, possesses and strengthens positive light transmissive effect, greatly can extend the useful life of solar cell while the saturating solar cell moisture barrier films of this height utilizes oxide layer group to intercept aqueous vapor.
For realizing technique scheme, the utility model provides a kind of high solar cell moisture barrier films thoroughly, mainly include: substrate layer, oxide skin(coating) group, intermediate optical rete, dielectric substance layer and ultraviolet light absorbing layer, described oxide skin(coating) group comprises titanium oxide layer and silicon carbide layer, described titanium oxide layer is positioned at the upper surface of substrate layer, described silicon carbide layer is positioned at titanium oxide layer upper surface, described intermediate optical rete is positioned at silicon carbide layer upper surface, described dielectric substance layer is positioned at the upper surface of intermediate optical rete, and described ultraviolet light absorbing layer is positioned at the lower surface of substrate layer.
In technique scheme, described substrate layer be can elasticity bending PETG layer.
In technique scheme, described intermediate optical rete is silicon oxycarbide layer, silicon oxynitride layer or carbon silicon oxynitride layer.
In technique scheme, the thickness of described substrate layer is 50 μm ~ 125 μm.
In technique scheme, the thickness of described titanium oxide layer is 10nm ~ 20nm.
In technique scheme, the thickness of described silicon carbide layer is 20nm ~ 25nm.
In technique scheme, the thickness of described intermediate optical rete is 15nm ~ 25nm.
In technique scheme, the thickness of described dielectric substance layer is 50nm ~ 100nm.
In technique scheme, the thickness of described ultraviolet light absorbing layer is 30nm ~ 50nm.
The utility model is compared to the beneficial effect of prior art: the saturating solar cell moisture barrier films of the height that the utility model provides utilizes oxide skin(coating) group as water blocking layer, enormously simplify membrane waterproofing structure complicated in prior art, intermediate optical rete is set simultaneously and strengthens the transmissivity of sunlight, dielectric substance layer is set in addition and ultraviolet light absorbing layer can strengthen the absorption of solar cell to light.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
In figure: 10-substrate layer, 20-oxide skin(coating) group, 21-titanium oxide layer, 22-silicon carbide layer, 30-intermediate optical rete, 40-dielectric substance layer, 50-ultraviolet light absorbing layer.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, carry out clear, complete description to the technical scheme in the utility model embodiment, obviously, described embodiment is only the utility model part embodiment, instead of whole embodiments.This area ordinary person, not making the every other embodiment obtained under creative work prerequisite, all belongs to protection range of the present utility model.
Embodiment 1: a kind of high solar cell moisture barrier films thoroughly.
With reference to shown in Fig. 1, the saturating solar cell moisture barrier films of the height that the present embodiment provides, mainly include: substrate layer 10, oxide skin(coating) group 20, intermediate optical rete 30, dielectric substance layer 40 and ultraviolet light absorbing layer 50, described oxide skin(coating) group 20 comprises titanium oxide layer 21 and silicon carbide layer 22, described titanium oxide layer 21 is positioned at the upper surface of substrate layer 10, described silicon carbide layer 22 is positioned at titanium oxide layer 21 upper surface, described intermediate optical rete 30 is positioned at silicon carbide layer 22 upper surface, described dielectric substance layer 40 is positioned at the upper surface of intermediate optical rete 30, described ultraviolet light absorbing layer 50 is positioned at the lower surface of substrate layer 10.
In the present embodiment, described substrate layer 10 be can elasticity bending PETG layer.
In the present embodiment, described intermediate optical rete 30 is silicon oxynitride layer.
In the present embodiment, the thickness of described substrate layer 10 is 60 μm.
In the present embodiment, the thickness of described titanium oxide layer 21 is 12nm.
In the present embodiment, the thickness of described silicon carbide layer 22 is 25nm.
In the present embodiment, the thickness of described intermediate optical rete 30 is 18nm.
In the present embodiment, the thickness of described dielectric substance layer 40 is 80nm.
In the present embodiment, the thickness of described ultraviolet light absorbing layer 50 is 30nm.
In order to explain further structural feature of the present utility model, application technology means and desired by effect of reaching, special occupation mode of the present utility model to be described below:
With reference to shown in Fig. 1, when manufacturing the saturating solar cell moisture barrier films of height in the present embodiment, first on base material 10, deposition forms highdensity titanium oxide layer 21, on this titanium oxide layer 21, deposition forms low-density silicon carbide layer 22 again, then intermediate optical rete 30 is enclosed at the upper surface of silicon carbide layer 22, last deposition on intermediate optical rete 30 forms dielectric substance layer 40, this dielectric substance layer 40 is optical cement (OpticallyClearAdhesive, OCA), one deck ultraviolet light absorbing layer 60 is formed in the lower surface absorption of base material 10 in addition.
In the present embodiment, the oxide skin(coating) group 20 that highdensity titanium oxide layer 21 and low-density silicon carbide layer 22 form effectively can block the infiltration of aqueous vapor molecule; The intermediate optical rete 30 that silicon oxynitride is formed effectively can improve the transmissivity of sunlight; Dielectric substance layer 40 can increase the refractive index of this moisture barrier films, strengthens solar cell to the absorption efficiency of light; Ultraviolet light absorbing layer 50 can strengthen the absorption efficiency of solar cell to ultraviolet light.
In the present embodiment, this moisture barrier films under the condition of experimental temperature 25 DEG C, relative humidity 95%, degree of blocking water <0.1g/m2.day.
Embodiment 2: a kind of high solar cell moisture barrier films thoroughly.
With reference to shown in Fig. 1, the saturating solar cell moisture barrier films of the height that the present embodiment provides, mainly include: substrate layer 10, oxide skin(coating) group 20, intermediate optical rete 30, dielectric substance layer 40 and ultraviolet light absorbing layer 50, described oxide skin(coating) group 20 comprises titanium oxide layer 21 and silicon carbide layer 22, described titanium oxide layer 21 is positioned at the upper surface of substrate layer 10, described silicon carbide layer 22 is positioned at titanium oxide layer 21 upper surface, described intermediate optical rete 30 is positioned at silicon carbide layer 22 upper surface, described dielectric substance layer 40 is positioned at the upper surface of intermediate optical rete 30, described ultraviolet light absorbing layer 50 is positioned at the lower surface of substrate layer 10.
In the present embodiment, described substrate layer 10 be can elasticity bending PETG layer.
In the present embodiment, described intermediate optical rete 30 is silicon oxycarbide layer.
In the present embodiment, the thickness of described substrate layer 10 is 80 μm.
In the present embodiment, the thickness of described titanium oxide layer 21 is 11nm.
In the present embodiment, the thickness of described silicon carbide layer 22 is 13nm.
In the present embodiment, the thickness of described intermediate optical rete 30 is 20nm.
In the present embodiment, the thickness of described dielectric substance layer 40 is 90nm.
In the present embodiment, the thickness of described ultraviolet light absorbing layer 50 is 40nm.
In the present embodiment, this moisture barrier films under the condition of experimental temperature 25 DEG C, relative humidity 95%, degree of blocking water <0.2g/m2.day.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all within spirit of the present utility model and principle, done any amendment, equivalent replacement, improvement etc., all should be included within protection range of the present utility model.
Claims (9)
1. one kind high solar cell moisture barrier films, it is characterized in that mainly including: substrate layer, oxide skin(coating) group, intermediate optical rete, dielectric substance layer and ultraviolet light absorbing layer, described oxide skin(coating) group comprises titanium oxide layer and silicon carbide layer, described titanium oxide layer is positioned at the upper surface of substrate layer, described silicon carbide layer is positioned at titanium oxide layer upper surface, described intermediate optical rete is positioned at silicon carbide layer upper surface, described dielectric substance layer is positioned at the upper surface of intermediate optical rete, and described ultraviolet light absorbing layer is positioned at the lower surface of substrate layer.
2. high solar cell moisture barrier films thoroughly as claimed in claim 1, is characterized in that: described intermediate optical rete is silicon oxycarbide layer, silicon oxynitride layer or carbon silicon oxynitride layer.
3. solar cell moisture barrier films thoroughly as claimed in claim 1 high, is characterized in that: described substrate layer is can the PETG layer of elasticity bending.
4. high solar cell moisture barrier films thoroughly as claimed in claim 1, is characterized in that: the thickness of described substrate layer is 50 μm ~ 125 μm.
5. high solar cell moisture barrier films thoroughly as claimed in claim 1, is characterized in that: the thickness of described titanium oxide layer is 10nm ~ 20nm.
6. high solar cell moisture barrier films thoroughly as claimed in claim 1, is characterized in that: the thickness of described silicon carbide layer is 20nm ~ 25nm.
7. high solar cell moisture barrier films thoroughly as claimed in claim 1, is characterized in that: the thickness of described intermediate optical rete is 15nm ~ 25nm.
8. high solar cell moisture barrier films thoroughly as claimed in claim 1, is characterized in that: the thickness of described dielectric substance layer is 50nm ~ 100nm.
9. high solar cell moisture barrier films thoroughly as claimed in claim 1, is characterized in that: the thickness of described ultraviolet light absorbing layer is 30nm ~ 50nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520841685.2U CN205177863U (en) | 2015-10-28 | 2015-10-28 | High damp proof membrane of solar cell that passes through |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201520841685.2U CN205177863U (en) | 2015-10-28 | 2015-10-28 | High damp proof membrane of solar cell that passes through |
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| CN205177863U true CN205177863U (en) | 2016-04-20 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109786488A (en) * | 2019-01-14 | 2019-05-21 | 江苏林洋光伏科技有限公司 | One kind having the mid-infrared and far-infrared light function flexibility photovoltaic component encapsulating foreboard that blocks water |
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2015
- 2015-10-28 CN CN201520841685.2U patent/CN205177863U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109786488A (en) * | 2019-01-14 | 2019-05-21 | 江苏林洋光伏科技有限公司 | One kind having the mid-infrared and far-infrared light function flexibility photovoltaic component encapsulating foreboard that blocks water |
| CN109786488B (en) * | 2019-01-14 | 2022-03-15 | 江苏林洋光伏科技有限公司 | Flexible photovoltaic module packaging front plate with water resistance and mid-far infrared light resistance functions |
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