CN205088304U - Novel chlorine absorbs device - Google Patents

Novel chlorine absorbs device Download PDF

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Publication number
CN205088304U
CN205088304U CN201520610487.5U CN201520610487U CN205088304U CN 205088304 U CN205088304 U CN 205088304U CN 201520610487 U CN201520610487 U CN 201520610487U CN 205088304 U CN205088304 U CN 205088304U
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CN
China
Prior art keywords
chlorine
etching solution
etching
spray chamber
room
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201520610487.5U
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Chinese (zh)
Inventor
不公告发明人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangzhou Jichi Environmental Technology Co Ltd
Original Assignee
Guangzhou Jichi Environmental Technology Co Ltd
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Priority to CN201520610487.5U priority Critical patent/CN205088304U/en
Application granted granted Critical
Publication of CN205088304U publication Critical patent/CN205088304U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model provides a novel chlorine absorbs device, chlorine enters the mouth and the jar body of chlorine export including having, chlorine entry be located a jar body middle part, be provided with the spray room on jar body upper portion, the spray room be two or more, each spray room lower part is provided with the etching solution regeneration room, through passageway intercommunication between the adjacent spray room, still is provided with the etching liquid chamber in jar body lower part, the etching solution that produces in the etching solution regeneration room is carried to the acid etching equipment in, the etching solution behind super -acid etching disposition of equipment flows back to the etching liquid chamber, chlorine entry linkage electrolysis equipment, the chlorine that the electrolysis equipment electrolysis produced passes through the chlorine entry and gets into spray room cyclic utilization. The utility model discloses a totally enclosed system, no waste water, waste gas and wastes material discharge, but the recovery and the regeneration work of etching solution are carried out in the automatic cycle function, and the etching effect is stable, can realize etching solution 100% cycle recycle.

Description

A kind of Novel chlorine absorption unit
Technical field
The utility model relates to a kind of chlorine recycling device improvement opportunity.
Background technology
It is all that simple solution absorption process reclaims that the chlorine that traditional electrolysis produces is recycled, and is passed in water receptacle by chlorine and simply mixes.And the spent etching solution that acid etching produces is too low due to ORP value, needs to use oxygenant could improve ORP value and just can reuse.
Utility model content
The technical problem underlying that the application will solve be to provide a kind of take full advantage of electrolysis produce chlorine and acid etching produce spent etching solution, etching solution is used again.
For solving the problems of the technologies described above, the technical scheme that the application proposes is:
A kind of Novel chlorine absorption unit, comprise the tank body with chlorine inlet and chlorine gas outlet, described chlorine inlet is positioned in the middle part of tank body, tank body top is provided with spray chamber, described spray chamber is two or more, each spray chamber bottom is provided with etching solution regeneration room, channel connection is passed through between adjacent spray chamber, etching solution waste liquid chamber is also provided with at tank body lower part, the etching solution produced in etching solution regeneration room is delivered in acid etching equipment, etching solution after acid etching equipment use is back to etching solution waste liquid chamber, chlorine inlet connects electrolyzer, the chlorine that electrolyzer electrolysis produces enters spray chamber recycle by chlorine inlet.
As the improvement to such scheme, described passage air outlet is positioned at last spray chamber top, inlet mouth is positioned at a rear spray chamber bottom.
And, above spent etching solution regeneration room and between chlorine inlet, be provided with filtering net.
And the liquid of etching solution waste liquid chamber enters the etching solution regeneration room above it by return line 3.
Compared with prior art, the utility model tool has the following advantages:
The utility model adopts totally enclosed system, without waste water, waste gas and waste discharge.After this device and etching machines are interconnected, transverse air suction, steam convection current, automated cycle operates, and carries out recovery and the reproduction operation of etching solution, and etch effect is stablized, and can realize etching solution 100% cycling and reutilization.The principle that this device adopts jet flow to absorb processes acid mist, the chlorine that electrolysis is produced fully is dissolved in spent etching solution, the ORP value of etching solution is provided, recovers etch capabilities, return production completely, reduce or even cancel and produce oxygenant used, save production material, reduce production cost, automatically controlled by system simultaneously, both reduce the labour intensity of employee, can be good at again the normal operation of guarantee system.
Accompanying drawing explanation
Fig. 1 is the utility model embodiment internal structure schematic diagram.
Fig. 2 is the present embodiment and acid etching equipment and electrolyzer syndeton schematic diagram.
Embodiment
By reference to the accompanying drawings the utility model is described in further detail below by embodiment.
As shown in accompanying drawing 1,2.What the present embodiment disclosed can connect to form the closed recycle system with acid etching equipment and electrolyzer, utilizes the chlorine that electrolysis produces, and is again used by the spent etching solution that acid etching equipment produces.
Specifically, this Novel chlorine absorption unit comprises the tank body 1 with chlorine inlet 11 and chlorine gas outlet 12, this chlorine inlet 11 is positioned in the middle part of tank body 1, tank body 1 top is provided with spray chamber 13, this spray chamber 13 is two or more, each spray chamber 13 bottom is provided with etching solution regeneration room 14, is communicated with between adjacent spray chamber by passage 15, is also provided with etching solution waste liquid chamber 16 in tank body 1 bottom.The etching solution produced in etching solution regeneration room 14 is delivered in acid etching equipment 3, etching solution after acid etching equipment 4 uses is back to etching solution waste liquid chamber 16, and the liquid of etching solution waste liquid chamber 16 enters regeneration in the etching solution regeneration room 14 above it by return line 3.Chlorine inlet 11 connects electrolyzer 5, and the chlorine that electrolyzer 5 electrolysis produces enters spray chamber recycle by chlorine inlet 11.
Allow to fully be dissolved in spray liquid through spray chamber 13 to make chlorine, passage 15 air outlet is positioned at last spray chamber top, inlet mouth is then positioned at a rear spray chamber bottom, chlorine enters spray chamber from bottom, export from spray chamber top after spray, enter next spray chamber by passage 15 from the bottom of next spray chamber again, substantially increase the utilization ratio of chlorine.Further, above spent etching solution regeneration room 14 and between chlorine inlet 11, filtering net 2 is provided with.
The whole device of the present embodiment, by installing multiple monitoring devices such as proportion detector, ORP monitor, acidometer, under meter, controls the service data of whole system in real time, realizes Automated condtrol, ensures the normal operation of system.
Above-mentioned return line 3 can adopt hydro-pump water lines, pumps the etching waste liquor in etching solution waste liquid chamber in etching solution regeneration room.
The spray chamber of the present embodiment can adopt existing common spraying technique, and therefore not to repeat here.
The above embodiment only have expressed the utility model preferably embodiment, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.

Claims (4)

1. a Novel chlorine absorption unit, comprise the tank body (1) with chlorine inlet (11) and chlorine gas outlet (12), it is characterized in that, described chlorine inlet is positioned in the middle part of tank body, spray chamber (13) is provided with on tank body top, described spray chamber is two or more, each spray chamber bottom is provided with etching solution regeneration room (14), be communicated with by passage (15) between adjacent spray chamber, etching solution waste liquid chamber (16) is also provided with at tank body lower part, the etching solution produced in etching solution regeneration room is delivered in acid etching equipment, etching solution after acid etching equipment use is back to etching solution waste liquid chamber, chlorine inlet connects electrolyzer, the chlorine that electrolyzer electrolysis produces enters spray chamber recycle by chlorine inlet.
2. Novel chlorine absorption unit according to claim 1, is characterized in that, described passage air outlet is positioned at last spray chamber top, inlet mouth is positioned at a rear spray chamber bottom.
3. Novel chlorine absorption unit according to claim 2, is characterized in that, is provided with filtering net (2) above spent etching solution regeneration room and between chlorine inlet.
4. the Novel chlorine absorption unit according to any one of claim 1 ~ 3, is characterized in that, the liquid of etching solution waste liquid chamber enters the etching solution regeneration room above it by return line (3).
CN201520610487.5U 2015-08-14 2015-08-14 Novel chlorine absorbs device Expired - Fee Related CN205088304U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201520610487.5U CN205088304U (en) 2015-08-14 2015-08-14 Novel chlorine absorbs device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201520610487.5U CN205088304U (en) 2015-08-14 2015-08-14 Novel chlorine absorbs device

Publications (1)

Publication Number Publication Date
CN205088304U true CN205088304U (en) 2016-03-16

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201520610487.5U Expired - Fee Related CN205088304U (en) 2015-08-14 2015-08-14 Novel chlorine absorbs device

Country Status (1)

Country Link
CN (1) CN205088304U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109023373A (en) * 2018-06-27 2018-12-18 江苏净拓环保科技有限公司 System for chlorine treatment in acidity etching liquid recycling copper recovery system
CN114774989A (en) * 2022-04-01 2022-07-22 安徽中科冉图环保科技有限公司 Chlorine absorption cylinder for electrolytic treatment of acidic etching solution

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109023373A (en) * 2018-06-27 2018-12-18 江苏净拓环保科技有限公司 System for chlorine treatment in acidity etching liquid recycling copper recovery system
CN114774989A (en) * 2022-04-01 2022-07-22 安徽中科冉图环保科技有限公司 Chlorine absorption cylinder for electrolytic treatment of acidic etching solution
CN114774989B (en) * 2022-04-01 2024-05-14 安徽中科冉图环保科技有限公司 Chlorine absorbing cylinder for electrolytic treatment of acidic etching solution

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160316

CF01 Termination of patent right due to non-payment of annual fee