CN204911779U - Ultrasonic atomization - hydrone phase transition initiative entrapment electrostatic precipitator device - Google Patents
Ultrasonic atomization - hydrone phase transition initiative entrapment electrostatic precipitator device Download PDFInfo
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- CN204911779U CN204911779U CN201520531580.7U CN201520531580U CN204911779U CN 204911779 U CN204911779 U CN 204911779U CN 201520531580 U CN201520531580 U CN 201520531580U CN 204911779 U CN204911779 U CN 204911779U
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Abstract
The utility model provides an ultrasonic atomization - hydrone phase transition initiative entrapment electrostatic precipitator device utilizes hydrone initiative entrapment electrostatic precipitator. Among the the device, utilizing the ultrasonic atomization ware to become little liquid drop with the water atomization, utilizing the semiconductor refrigeration piece hot junction to evaporate the liquid drop, utilize semiconductor refrigeration piece cold junction to cool off vapor, make vapor reach saturated condition, the vapor molecule uses the micronic dust to take place the phase transition as the nuclei of condensation and forms group bunch, and is electric by the desorption through board -like electrostatic precipitator group bunch lotus.
Description
Technical field
The utility model proposes and a kind ofly allow by the water droplet of ultrasonic atomization and air mixing, successively by cold junction and the hot junction of semiconductor chilling plate, make steam evaporate after with haze micronic dust in air for the nuclei of condensation form cluster, through the charged tiny dust removal device removed of electrostatic field cluster.
Background technology
In recent years, along with national economy progress, heavy industry and fuel oil fire coal wait industrial development, vehicle to increase etc. factor, and haze weather becomes one of present natural calamity the most serious.The particulate that the mainly diameter be harmful to health in haze micronic dust is less than 10 microns, especially the PM2.5 particle usually mentioned, can be deposited on respectively in upper and lower respiratory tract and alveolar, cause various respiratory tract disease, some research is pointed out, serious haze even can affect neonatal weight.Haze has had a strong impact on the living environment of people, have impact on China's expanding economy.
Household Air Purifier technology ripe at present, in particle tiny dust removal, is mainly two kinds of technology, and one uses HEPA filter core to filter gas; Its two employings electrostatic precipitation technology, makes micronic dust charged in electrostatic field, and offsets in the electric field thus be collected.
Only use the air purifier of filter screen at present, such as Philip AC4076, Panasonic F-PDF35C-G, Sharp KC-2380SW, Honeywell PAC35M, three father's series etc.HEPA filter screen is technology comparatively ripe at present, better to the filter effect of dust particale.Its subject matter is, because dust particale is piled up on HEPA filter screen, filter screen air permeance resistance can be caused to increase, and air purifier air-treatment amount is declined rapidly, and the dust meeting breed bacteria of simultaneously piling up, produces peculiar smell.According to the data that user provides, within 2014, use a Japan to produce Bermuda filtering net air clarifier in Shanghai, on three months filter screens, dust granule is saturated, and produces the taste of similar vehicle exhaust.When haze is serious, the service life of efficient filter screen is only two or three months.Frequent replacing filter screen obviously increases air purifier use cost, and on filter screen, dust accretions can not be removed in time simultaneously, also can produce secondary pollution to indoor environment.
What only the air purifier of use electrostatic precipitation technology was representative is behen air purifier, the air purifier that this manufacturer produces uses dielectric barrier discharge principle, plasma field is produced by high-frequency and high-voltage electrode, micronic dust is charged in plasma field, and be collected pole absorption, collector can be cleaned by water and wash away micronic dust.But the subject matter existed in the program is, one, on a large scale air plasma field can produce ozone, and when ozone concentration is higher, people has sense of discomfort, it has been generally acknowledged that ozone concentration is too high when people can smell ozone smell.Ozone is inevitable product in air plasma process, and the user of behen air purifier has ozone smell to produce through paradoxical reaction; Two, when dust particale is too small, can not efficient adsorption negative electrical charge, therefore can effectively remove for larger particles the method, but when particle is less, as PM2.5 micronic dust removal efficiency is often not high; Three, because molecule needs enough deflection periods to be adsorbed in the electric field, so be not usually equipped with fan in electrostatic precipitator, therefore its air-treatment amount and environment ventilation amount must be very few, and therefore processing speed is subject to very large restriction.
Summary of the invention
Removing to overcome existing air purifier the deficiency existed in particle technology, the utility model proposes the device of a kind of hydrone phase transformation active trap debris.The technical solution of the utility model is: one utilizes semiconductor chilling plate to make water droplets first evaporate rear condensation, with haze micronic dust in air for the nuclei of condensation form water molecule cluster, through the charged haze tiny dust removal device removed of electrostatic field cluster.
The technical solution of the utility model is: a kind of ultrasonic atomization-hydrone phase transformation initiatively traps electrostatic precipitator, is composed in series primarily of ultrasonic ultrasonic delay line memory, semiconductor hot junction and cold junction passage, plate type electrostatic deduster and fan.
Described semiconductor hot junction and cold junction passage are attached to semiconductor chilling plate hot junction respectively by two boards finned heat sink and cold junction is formed.
The size of described plate type electrostatic deduster can meet gas hold-up time and be greater than 0.05s, and between pole plate, electrostatic field intensity is more than or equal to 1000V/mm.
Described fan adopts aerofoil fan or vortex flow fan, and fan flow is more than or equal to 400m
3/ h.
Described ultrasonic ultrasonic delay line memory peak power is 20W, and atomization quantity is adjustable, and maximum atomization quantity is not less than 600ml/h.
Described device entirety is placed in housing.
Beneficial effect: 1, particle removal efficiency is high.The formation haze micronic dust water molecule cluster technology that the utility model proposes initiatively catches micronic dust technology, and in the method, particle diameter is less, more easily forms cluster, and its removal effect is better, and removal efficiency is high.
3, purification of air amount is large.Filter screen is not had to bring air resistance in the core technology proposed in the utility model, gas velocity angle value is considerably beyond gas flow rate in current existing all air purifiers, therefore gas purification amount is considerably beyond like product, and in other words, the method is very applicable to extensive purification of air demand.
4, do not need extra consumptive material, do not produce secondary pollution.The utility model adopts and initiatively catches dust particale method, significantly can improve the removal efficiency of molecule.Do not adopt HEPA filter screen and active carbon in system, therefore avoid the extra charge changed filter screen and bring, avoid micronic dust on filter screen simultaneously and pile up the phenomenon producing secondary pollution.The harmful substance that plasma produces by direct use water molecule cluster is dissolved and is removed, and avoids only with the gaseous contamination that plasma brings.
In sum, the ultrasonic atomization that the utility model proposes-hydrone phase transformation initiatively traps the administering method that electrostatic dust removing method has high removal efficiency, has obvious competitive advantage.
Accompanying drawing explanation
Fig. 1 is the utility model general internal structure figure, comprises 1, ultrasonic ultrasonic delay line memory, 2, semiconductor hot junction and cold junction passage, 3, electrostatic precipitator, 4, fan.
Fig. 2 is the concrete structure figure of 2 semiconductor hot junctions in Fig. 1 and cold junction passage.Wherein 2-1 is heat-insulation layer, and 2-2 is semiconductor chilling plate, and 2-3 is plate-fin fin, and 2-4 is hot junction gas passage, and 2-5 is cold junction gas passage.
Detailed description of the invention
Below in conjunction with Fig. 1, the utility model is elaborated:
The utility model proposes, semiconductor chilling plate hot junction is utilized to heat the water droplet after ultrasonic atomization, recycling cooling piece cold junction makes mist lower the temperature rapidly, and in phase transition process, hydrone is with haze micronic dust for the nuclei of condensation form water molecule cluster, removes through electrostatic precipitator cluster is charged.Adopt ultrasonic ultrasonic delay line memory and semiconductor chilling plate to combine, make water first evaporate rear condensation, initiatively trap the method for dust particale.Utilize this method and device, can efficient removal dust particale, the water molecule cluster formed that simultaneously condenses absorbs the gaseous exhaust things such as the ozone in electrostatic field.
Concrete steps are:
The first step, adopt ultrasonic ultrasonic delay line memory to make water fogging, form small water droplet, atomizer peak power is 20W, and atomization quantity is adjustable, and maximum atomization quantity is not less than 600ml/h.Water droplets and mixing containing the air of dust particale, the mass ratio of water vapor flux and gas flux is 1 ‰ ~ 5 ‰; Better be the mass ratio of water vapor flux and gas flux is 1 ‰ ~ 2 ‰;
Second step, mist is by hydrone phase variable conduit.This phase variable conduit is made up of semiconductor chilling plate and plate-fin fin, and hot junction and cold junction fin area are consistent.Mist is heated in the gas passage of semiconductor chilling plate hot junction, water droplets evaporation forms stream molecule, mist is by semiconductor chilling plate cold junction passage subsequently, and in cold junction gas passage, stream molecule is met cold, with haze micronic dust in air for the nuclei of condensation form water molecule cluster.Semiconductor chilling plate power is not more than 150W, two panels 12706 semiconductor chilling plate can be made to connect and reach this power requirement.Wherein by gas flow rate in control channel, regulate semiconductor hot junction and cold junction temperature, make both sides temperature difference be not less than 6 DEG C.
3rd step, the gas containing water molecule cluster passes through electrostatic precipitator.This electrostatic precipitator is plate type electrostatic deduster, and between pole plate, electrostatic field intensity is not less than 1000V/mm.For ensureing enough deflection distances, require gas between pole plate the holdup time more than 0.05s.When electrostatic precipitator plate dimensions is 150mm × 300mm, when electrostatic precipitator passage section is 100mm × 300mm, can process air mass flow is 324m
3/ h, obvious this processing mode gas treatment amount is very large.
In electrostatic precipitator, the hydrone in cluster is easy to attract electrons makes cluster charged, can deflect in the electric field, and final electrostatic pole plate is adsorbed, and is taken away by dust particale thing in gas by sewage discharge.The cluster that hydrone is formed simultaneously can dissolve the products such as the ozone formed in discharge process, and the pollutant that plasma discharge produces is dissolved discharge while discharging by sewage simultaneously.
4th step, in this deduster, extracted out by gas by deduster tail end fan, this fan flow is not less than 400m
3/ h.Fan can adopt aerofoil fan or vortex flow fan.
Described ultrasonic atomization-hydrone phase transformation initiatively traps the device used in electrostatic dust removing method, and described device is made up of ultrasonic ultrasonic delay line memory, semiconductor hot junction and cold junction passage, electrostatic precipitator and fan.
Described hydrone phase variable conduit is made up of semiconductor chilling plate and fin, and two boards finned heat sink is attached to semiconductor chilling plate hot junction and cold junction respectively, and between the heat sink plate wing of two ends, space and channel envelope form gas hot junction passage and cold junction passage respectively.Plate-fin fin can adopt aluminium matter or copper cooling fin.
Described electrostatic precipitator adopts conventional plate type electrostatic dust collector.
Embodiment
1, ultrasonic ultrasonic delay line memory atomization quantity is 500ml/h.
2, adopt two panels 70W semiconductor chilling plate, adopt aluminum plate finned heat sink, cold junction passage and hot junction channel cross-section are 70mm × 70mm, and in the passage of hot junction, body gas portion temperature reaches 40 DEG C, and in cold junction passage, body gas portion temperature reaches 33 DEG C.
3, electrostatic precipitator plate dimensions is 150mm × 300mm, when electrostatic precipitator passage section is 100mm × 300mm, and electrostatic field intensity 1200V/mm between pole plate.
4, tail end adopts aerofoil fan, and gas through-flow amount reaches 330m
3/ h.
5, cake burning is adopted to produce haze particle, when lab space is 1m
3time, when initial PM2.5 reaches 650 μ g/m
3during serious pollution, the drop of ultrasonic ultrasonic delay line memory atomization mixes with contaminated air, enter semiconductor hot junction passage, mist is heated in the gas passage of semiconductor chilling plate hot junction, water droplets evaporation forms stream molecule, mist is by semiconductor chilling plate cold junction passage subsequently, and in cold junction gas passage, stream molecule chance is cold reaches hypersaturated state, with haze micronic dust in air for the nuclei of condensation form water molecule cluster.Mist is by electrostatic precipitator, and within the 32s time, PM2.5 is down to 60 μ g/m
3below, discharged by fan, reach good gas state.
Claims (6)
1. ultrasonic atomization-hydrone phase transformation initiatively traps an electrostatic precipitation, it is characterized in that, is composed in series primarily of ultrasonic ultrasonic delay line memory, semiconductor hot junction and cold junction passage, plate type electrostatic deduster and fan.
2. ultrasonic atomization-hydrone phase transformation as claimed in claim 1 initiatively traps electrostatic precipitator, it is characterized in that, described semiconductor hot junction and cold junction passage are attached to semiconductor chilling plate hot junction respectively by two boards finned heat sink and cold junction is formed.
3. ultrasonic atomization-hydrone phase transformation as claimed in claim 1 initiatively traps electrostatic precipitator, it is characterized in that, the size of described plate type electrostatic deduster can meet gas hold-up time and be greater than 0.05s, and between pole plate, electrostatic field intensity is more than or equal to 1000V/mm.
4. ultrasonic atomization-hydrone phase transformation as claimed in claim 1 initiatively traps electrostatic precipitator, it is characterized in that, described fan adopts aerofoil fan or vortex flow fan, and fan flow is more than or equal to 400m
3/ h.
5. ultrasonic atomization-hydrone phase transformation as claimed in claim 1 initiatively traps electrostatic precipitator, it is characterized in that, described ultrasonic ultrasonic delay line memory peak power is 20W, and atomization quantity is adjustable, and maximum atomization quantity is not less than 600ml/h.
6. ultrasonic atomization-hydrone phase transformation as claimed in claim 1 initiatively traps electrostatic precipitator, it is characterized in that, described device entirety is placed in housing.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520531580.7U CN204911779U (en) | 2015-07-21 | 2015-07-21 | Ultrasonic atomization - hydrone phase transition initiative entrapment electrostatic precipitator device |
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| CN201520531580.7U CN204911779U (en) | 2015-07-21 | 2015-07-21 | Ultrasonic atomization - hydrone phase transition initiative entrapment electrostatic precipitator device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105013609A (en) * | 2015-07-21 | 2015-11-04 | 李森 | Ultrasonic atomization and water molecule phase change active capture electrostatic precipitating method and device |
| CN107262281A (en) * | 2016-04-08 | 2017-10-20 | 北京龙电宏泰环保科技有限公司 | A kind of method for controlling industrial smoke ultra-fine grain and the ultra-clean discharge of trace contaminant |
-
2015
- 2015-07-21 CN CN201520531580.7U patent/CN204911779U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105013609A (en) * | 2015-07-21 | 2015-11-04 | 李森 | Ultrasonic atomization and water molecule phase change active capture electrostatic precipitating method and device |
| CN105013609B (en) * | 2015-07-21 | 2017-08-11 | 李森 | The phase transformation of ultrasonic atomization hydrone actively traps electrostatic dust removing method and its device |
| CN107262281A (en) * | 2016-04-08 | 2017-10-20 | 北京龙电宏泰环保科技有限公司 | A kind of method for controlling industrial smoke ultra-fine grain and the ultra-clean discharge of trace contaminant |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200716 Address after: Room 1003, unit B, building 4, jingruixi City, Zhonglou District, Changzhou City, Jiangsu Province 213000 Co-patentee after: Deng Mengya Patentee after: Li Sen Address before: 34 unit 213016, Garden West Village, Changzhou City, Jiangsu province 101 Patentee before: Li Sen |