CN204849011U - Target drone of piecing together of leading magnetic material magnetron sputtering flat target constructs - Google Patents
Target drone of piecing together of leading magnetic material magnetron sputtering flat target constructs Download PDFInfo
- Publication number
- CN204849011U CN204849011U CN201520488630.8U CN201520488630U CN204849011U CN 204849011 U CN204849011 U CN 204849011U CN 201520488630 U CN201520488630 U CN 201520488630U CN 204849011 U CN204849011 U CN 204849011U
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- CN
- China
- Prior art keywords
- target
- magnetron sputtering
- backboard
- target body
- magnetizer
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Links
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 16
- 239000000696 magnetic material Substances 0.000 title abstract 2
- 239000004020 conductor Substances 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910002804 graphite Inorganic materials 0.000 claims description 6
- 239000010439 graphite Substances 0.000 claims description 6
- 238000009434 installation Methods 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000007789 sealing Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000005461 lubrication Methods 0.000 description 3
- 230000000274 adsorptive effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model provides a target drone of piecing together of leading magnetic material magnetron sputtering flat target constructs, belongs to magnetron sputtering coating film field, the magnetizer through the bolt fastening in the target body, passes through the fix with screw at the target body lower extreme and the backplate, is equipped with O type sealing washer between backplate and the target body, is equipped with the magnet subassembly on the magnetizer, and structural design is reasonable, and it is simply firm to piece together the target to the installation target body is simple and convenient, reduces staff's volume intensity of labour, reduces the damage of work piece. Improve the utilization ratio of target, reduce the operation cost of enterprise.
Description
Technical field
The utility model belongs to magnetron sputtering plating field, is specifically related to a kind of spelling target drone structure of magnetic conductive material magnetron sputtering planar target.
Background technology
Current magnetron sputtering technique industrially has a wide range of applications, the target utilization of magnetron sputtering midplane target is low, cause the raising of production cost, for the planar target of sputtering magnetic conductive material, because the special characteristics of material, cause the utilization ratio of target lower, the technology of spelling target is applied to magnetron sputtering field, and for non-permeable material, the technology of spelling target reaches its maturity, magnetic conductive material is because magnet, to the huge adsorptive power of target plate, makes the difficult point of the technology that is mounted for of target.
Summary of the invention
The mechanism that the utility model object is directed to the planar target in magnetron sputtering is formed, and has carried out further fabrication design, has specifically provided a kind of spelling target drone structure of magnetic conductive material magnetron sputtering planar target.
The utility model is achieved in the following ways a kind of spelling target drone structure of magnetic conductive material magnetron sputtering planar target, magnetizer is bolted in target body, magnetizer is provided with magnet assembly, backboard is fixed wtih by screw in target body lower end, O RunddichtringO is provided with between backboard and target body, backboard lower end is fixed wtih at least three pieces of middle part targets, middle part target is the rectangular parallelepiped of magnetic conductive material, and the cross section I of middle part target is trapezoidal, the hypotenuse number of degrees of middle part target are 72 ° to 80 °, graphite pads is provided with between backboard and middle part target, play lubrication, conduction, the effect of heat conduction, end target is respectively connected at two middle part targets at two ends in the outer part, described end target is the rectangular parallelepiped of magnetic conductive material, and the cross section II of end target is trapezoidal, the hypotenuse number of degrees of end target are 72 ° to 80 °, the hypotenuse of described end target and the hypotenuse of middle part target are provided with press strip, press strip is provided with the hypotenuse matched with the hypotenuse of end target and middle part target, the track of target body is done by press strip, described press strip is bolted on backboard and target body, by stubborn fixing bolt, press strip is tightened, reach and the extruding of end target and middle part target is fixed.
The beneficial effects of the utility model are reasonable in design, and spelling target is simply firm, and it is simple and convenient to install target body, reduce the labour intensity of employee, reduce the damage of workpiece.Improve the utilization ratio of target, reduce the operation cost of enterprise.
Accompanying drawing explanation
Fig. 1 is overall schematic;
Fig. 2 is side-view;
Fig. 3 is middle part sheet material schematic diagram;
Fig. 4 is end sheet material schematic diagram;
As shown in Figure 1 to Figure 4, target body (1), bolt (2), magnetizer (3), backboard (4), O RunddichtringO (5), magnet assembly (6), middle part target (7), graphite pads (8), end target (9), hexagon socket head cap screw (10), press strip (11), screw (12), cross section I (13), cross section II (14).
Embodiment
A kind of spelling target drone structure of magnetic conductive material magnetron sputtering planar target, magnetizer (3) is fixed wtih by bolt (2) in target body (1), magnetizer (3) is provided with magnet assembly (6), backboard (4) is fixed wtih by screw (12) in target body (1) lower end, O RunddichtringO (5) is provided with between backboard (4) and target body (1), backboard (4) lower end is fixed wtih at least three pieces of middle parts target (7), middle part target (7) is rectangular magnetic conductive material, and the cross section I (13) of middle part target (7) is for trapezoidal, the hypotenuse range of degrees at middle part target (7) is between 72 ° to 80 °, be positioned between backboard (4) and middle part target (7) and be provided with graphite pads (8), play lubrication, conduction, the effect of heat conduction, end target (9) is respectively connected two middle parts target (7) at two ends, outside, described end target (9) is rectangular magnetic conductive material, and the cross section II (14) of end target (9) is for trapezoidal, the hypotenuse range of degrees of end target (9) is between 72 ° to 80 °, the hypotenuse at middle part target (7) matches with the hypotenuse of end target (9) and is fixedly connected with, the edge of described end target (9) is provided with press strip (11), the track of target body (1) is done by press strip (11), described press strip (11) is fixed on backboard (4) and target body (1) by hexagon socket head cap screw (10).Operation steps: first press strip (11) is fixed on backboard (4) by hexagon socket head cap screw (10), again middle part target (7) is pieced together by the hypotenuse coordinated on the backboard (4) being placed on graphite pads (8), because middle part target (7) and end target (9) are all make of the material of magnetic diffusivity, be difficult to unload so can be held by magnet assembly (6) when installation is pieced together, graphite pads (8), play lubrication, conduction, the effect of heat conduction, overcome the adsorptive power in very larger magnetic field, end target (9) is installed between middle part target (7) and press strip (11), finally tighten hexagon socket head cap screw (10), tightening in hexagon socket head cap screw (10) process, the hypotenuse of press strip (11) matches with the hypotenuse of end target (9) the inside squeeze of generation one, thus fastening end target (9) and middle part target (7), the inclined-plane, edge of end target (9) and middle part target (7) plays the effect of guiding, align, reduce the frictional force between material, press strip (11) plays the effect of track.
Claims (3)
1. the spelling target drone structure of a magnetic conductive material magnetron sputtering planar target, magnetizer (3) is fixed wtih by bolt (2) in target body (1), magnetizer (3) is provided with magnet assembly (6), it is characterized in that, backboard (4) is fixed wtih by screw (12) in target body (1) lower end, O RunddichtringO (5) is provided with between backboard (4) and target body (1), backboard (4) lower end is fixed wtih at least three pieces of middle parts target (7), graphite pads (8) is provided with between backboard (4) and middle part target (7), two middle parts target (7) in the outer part respectively connected end target (9), the edge of described end target (9) is provided with press strip (11), described press strip (11) is fixed on backboard (4) and target body (1) by hexagon socket head cap screw (10).
2. the spelling target drone structure of a kind of magnetic conductive material magnetron sputtering planar target according to claim 1, is characterized in that, the cross section I (13) of described middle part target (7) is for trapezoidal, and the angle of trapezoidal hypotenuse is 72 ° to 80 °.
3. the spelling target drone structure of a kind of magnetic conductive material magnetron sputtering planar target according to claim 1, is characterized in that, the cross section II (14) of described end target (9) is for trapezoidal, and the angle of trapezoidal hypotenuse is 72 ° to 80 °.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201520488630.8U CN204849011U (en) | 2015-07-09 | 2015-07-09 | Target drone of piecing together of leading magnetic material magnetron sputtering flat target constructs |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201520488630.8U CN204849011U (en) | 2015-07-09 | 2015-07-09 | Target drone of piecing together of leading magnetic material magnetron sputtering flat target constructs |
Publications (1)
Publication Number | Publication Date |
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CN204849011U true CN204849011U (en) | 2015-12-09 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201520488630.8U Active CN204849011U (en) | 2015-07-09 | 2015-07-09 | Target drone of piecing together of leading magnetic material magnetron sputtering flat target constructs |
Country Status (1)
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CN (1) | CN204849011U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110129755A (en) * | 2019-06-05 | 2019-08-16 | 深圳市华星光电技术有限公司 | Magnetic control spattering target and magnetic control sputtering device |
-
2015
- 2015-07-09 CN CN201520488630.8U patent/CN204849011U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110129755A (en) * | 2019-06-05 | 2019-08-16 | 深圳市华星光电技术有限公司 | Magnetic control spattering target and magnetic control sputtering device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151209 |