CN204768162U - Gaseous pyatyi falling liquid film absorbing device of HCL - Google Patents

Gaseous pyatyi falling liquid film absorbing device of HCL Download PDF

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Publication number
CN204768162U
CN204768162U CN201520455097.5U CN201520455097U CN204768162U CN 204768162 U CN204768162 U CN 204768162U CN 201520455097 U CN201520455097 U CN 201520455097U CN 204768162 U CN204768162 U CN 204768162U
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CN
China
Prior art keywords
absorption
hcl
group
gaseous
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201520455097.5U
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Chinese (zh)
Inventor
张磊
张海涛
许文彬
代兰成
王一路
杨德涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shandong Qingshang Chemical Co Ltd
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Shandong Qingshang Chemical Co Ltd
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Priority to CN201520455097.5U priority Critical patent/CN204768162U/en
Application granted granted Critical
Publication of CN204768162U publication Critical patent/CN204768162U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model discloses a gaseous pyatyi falling liquid film absorbing device of HCL, it belongs to potassium sulphide production technical field. It mainly includes absorption A of group and the B of absorption group, and A of absorption group and the absorption B of group establish ties, the A of absorption group includes the gaseous absorption tower of three HCL parallelly connected each other, and the B of absorption group includes the gaseous absorption towers of two parallelly connected each other HCL, the heat exchange tube on the gaseous absorption tower of HCL is 32, diameter phi = 37. The utility model discloses simple structure, convenient to use absorbs through addding the second grade falling liquid film, makes the absorption rate greatly increased of HCL tail gas to the output of hydrochloric acid has been improved. The utility model discloses mainly used HCL is gaseous to be absorbed.

Description

HCL gas Pyatyi falling film absorbing device
Technical field
The utility model belongs to production Technique of Potassium Sulphate field, specifically, particularly relates to a kind of HCL gas Pyatyi falling film absorbing device.
Background technology
From mannheim furnace HCl high-temperature gas out, be cooled to 50-60 DEG C through the brilliant cooler of carbon, after through two scrubbing towers washings, then absorb into hydrochloric acid through falling-film tower, HCL tail gas absorbs through tail gas recovery tower makes watery hydrochloric acid.HCL is as a kind of sour gas, relatively large to the harm of environment, and traditional absorption technique adopts first order absorption method usually, and this method absorptivity is low, and the tail gas flue gas concentration after absorption is about 80ppm, can not meet the demand of people.
Summary of the invention
The purpose of this utility model is to overcome above-mentioned defect, provides a kind of HCL gas Pyatyi falling film absorbing device, and its structure is simple, easy to use, by setting up secondary falling film absorption, the absorptivity of HCL tail gas being increased greatly, thus improves the output of hydrochloric acid.
Described HCL gas Pyatyi falling film absorbing device, comprise absorption group A and absorption group B, absorption group A connects with absorption group B, and described absorption group A comprises three HCL absorption column of gas parallel with one another, and absorption group B comprises two HCL absorption column of gas parallel with one another.
Further, the heat exchanger tube of described HCL absorption column of gas is 32, diameter of phi=37.
Compared with prior art, the beneficial effects of the utility model are:
1, the utility model structure is simple, easy to use, by setting up secondary falling film absorption, the absorptivity of HCL tail gas being increased greatly, thus improves the output of hydrochloric acid;
2, the absorption area of HCL absorption column of gas increases to 12.05 ㎡ by 7.85 ㎡, and absorptivity improves greatly, and the output of hydrochloric acid adds 2-3 ton/sky, and tail gas flue gas obviously reduces, and flue gas concentration is less than 50ppm.
Accompanying drawing explanation
Fig. 1 is schematic diagram of the present utility model;
Fig. 2 is the structural representation of HCL absorption column of gas.
In figure, 1, HCL absorption column of gas; 2, absorption group A; 3, absorption group B; 4, heat exchanger tube.
Detailed description of the invention
Below in conjunction with accompanying drawing, the utility model is described in further detail:
As depicted in figs. 1 and 2, HCL gas Pyatyi falling film absorbing device, comprise absorption group A2 and absorption group B3, absorption group A2 connects with absorption group B3, described absorption group A2 comprises three HCL absorption column of gas 1 parallel with one another, and absorption group B3 comprises two HCL absorption column of gas 1 parallel with one another; The heat exchanger tube 4 of described HCL absorption column of gas 1 is 32, and diameter is Φ=37.
The utility model in use, from mannheim furnace HCl high-temperature gas out, 50-60 DEG C is cooled to through the brilliant cooler of carbon, after through the washing of two scrubbing towers, then the utility model is entered, first order absorption is carried out by absorption group A2, and carry out three grades of falling liquid films by three HCL absorption column of gas 1 in parallel, then secondary absorption is carried out by absorption group B3, and again carry out Pyatyi falling liquid film by two HCL absorption column of gas 1 in parallel, thus complete the Pyatyi falling film absorption of HCL gas, the absorptivity of HCL gas is improved greatly, salt acid yield increases, tail gas flue gas obviously reduces.

Claims (2)

1. a HCL gas Pyatyi falling film absorbing device, comprise HCL absorption column of gas (1), it is characterized in that: comprise absorption group A (2) and absorption group B (3), absorption group A (2) connects with absorption group B (3), described absorption group A (2) comprises three HCL absorption column of gas (1) parallel with one another, and absorption group B (3) comprises two HCL absorption column of gas (1) parallel with one another.
2. HCL gas Pyatyi falling film absorbing device according to claim 1, is characterized in that: the heat exchanger tube (4) of described HCL absorption column of gas (1) is 32, diameter of phi=37.
CN201520455097.5U 2015-06-29 2015-06-29 Gaseous pyatyi falling liquid film absorbing device of HCL Expired - Fee Related CN204768162U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201520455097.5U CN204768162U (en) 2015-06-29 2015-06-29 Gaseous pyatyi falling liquid film absorbing device of HCL

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201520455097.5U CN204768162U (en) 2015-06-29 2015-06-29 Gaseous pyatyi falling liquid film absorbing device of HCL

Publications (1)

Publication Number Publication Date
CN204768162U true CN204768162U (en) 2015-11-18

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201520455097.5U Expired - Fee Related CN204768162U (en) 2015-06-29 2015-06-29 Gaseous pyatyi falling liquid film absorbing device of HCL

Country Status (1)

Country Link
CN (1) CN204768162U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106362555A (en) * 2016-09-12 2017-02-01 江苏必康制药股份有限公司 Process gas purification treatment method
CN114288841A (en) * 2021-12-31 2022-04-08 山东三方化工集团有限公司 Mannheim method potassium sulfate tail gas processing system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106362555A (en) * 2016-09-12 2017-02-01 江苏必康制药股份有限公司 Process gas purification treatment method
CN106362555B (en) * 2016-09-12 2019-06-28 江苏九九久科技有限公司 Process gas purifying treatment method
CN114288841A (en) * 2021-12-31 2022-04-08 山东三方化工集团有限公司 Mannheim method potassium sulfate tail gas processing system

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20151118

Termination date: 20170629