CN204768162U - Gaseous pyatyi falling liquid film absorbing device of HCL - Google Patents
Gaseous pyatyi falling liquid film absorbing device of HCL Download PDFInfo
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- CN204768162U CN204768162U CN201520455097.5U CN201520455097U CN204768162U CN 204768162 U CN204768162 U CN 204768162U CN 201520455097 U CN201520455097 U CN 201520455097U CN 204768162 U CN204768162 U CN 204768162U
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- absorption
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- gas
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Abstract
The utility model discloses a gaseous pyatyi falling liquid film absorbing device of HCL, it belongs to potassium sulphide production technical field. It mainly includes absorption A of group and the B of absorption group, and A of absorption group and the absorption B of group establish ties, the A of absorption group includes the gaseous absorption tower of three HCL parallelly connected each other, and the B of absorption group includes the gaseous absorption towers of two parallelly connected each other HCL, the heat exchange tube on the gaseous absorption tower of HCL is 32, diameter phi = 37. The utility model discloses simple structure, convenient to use absorbs through addding the second grade falling liquid film, makes the absorption rate greatly increased of HCL tail gas to the output of hydrochloric acid has been improved. The utility model discloses mainly used HCL is gaseous to be absorbed.
Description
Technical field
The utility model belongs to production Technique of Potassium Sulphate field, specifically, particularly relates to a kind of HCL gas Pyatyi falling film absorbing device.
Background technology
From mannheim furnace HCl high-temperature gas out, be cooled to 50-60 DEG C through the brilliant cooler of carbon, after through two scrubbing towers washings, then absorb into hydrochloric acid through falling-film tower, HCL tail gas absorbs through tail gas recovery tower makes watery hydrochloric acid.HCL is as a kind of sour gas, relatively large to the harm of environment, and traditional absorption technique adopts first order absorption method usually, and this method absorptivity is low, and the tail gas flue gas concentration after absorption is about 80ppm, can not meet the demand of people.
Summary of the invention
The purpose of this utility model is to overcome above-mentioned defect, provides a kind of HCL gas Pyatyi falling film absorbing device, and its structure is simple, easy to use, by setting up secondary falling film absorption, the absorptivity of HCL tail gas being increased greatly, thus improves the output of hydrochloric acid.
Described HCL gas Pyatyi falling film absorbing device, comprise absorption group A and absorption group B, absorption group A connects with absorption group B, and described absorption group A comprises three HCL absorption column of gas parallel with one another, and absorption group B comprises two HCL absorption column of gas parallel with one another.
Further, the heat exchanger tube of described HCL absorption column of gas is 32, diameter of phi=37.
Compared with prior art, the beneficial effects of the utility model are:
1, the utility model structure is simple, easy to use, by setting up secondary falling film absorption, the absorptivity of HCL tail gas being increased greatly, thus improves the output of hydrochloric acid;
2, the absorption area of HCL absorption column of gas increases to 12.05 ㎡ by 7.85 ㎡, and absorptivity improves greatly, and the output of hydrochloric acid adds 2-3 ton/sky, and tail gas flue gas obviously reduces, and flue gas concentration is less than 50ppm.
Accompanying drawing explanation
Fig. 1 is schematic diagram of the present utility model;
Fig. 2 is the structural representation of HCL absorption column of gas.
In figure, 1, HCL absorption column of gas; 2, absorption group A; 3, absorption group B; 4, heat exchanger tube.
Detailed description of the invention
Below in conjunction with accompanying drawing, the utility model is described in further detail:
As depicted in figs. 1 and 2, HCL gas Pyatyi falling film absorbing device, comprise absorption group A2 and absorption group B3, absorption group A2 connects with absorption group B3, described absorption group A2 comprises three HCL absorption column of gas 1 parallel with one another, and absorption group B3 comprises two HCL absorption column of gas 1 parallel with one another; The heat exchanger tube 4 of described HCL absorption column of gas 1 is 32, and diameter is Φ=37.
The utility model in use, from mannheim furnace HCl high-temperature gas out, 50-60 DEG C is cooled to through the brilliant cooler of carbon, after through the washing of two scrubbing towers, then the utility model is entered, first order absorption is carried out by absorption group A2, and carry out three grades of falling liquid films by three HCL absorption column of gas 1 in parallel, then secondary absorption is carried out by absorption group B3, and again carry out Pyatyi falling liquid film by two HCL absorption column of gas 1 in parallel, thus complete the Pyatyi falling film absorption of HCL gas, the absorptivity of HCL gas is improved greatly, salt acid yield increases, tail gas flue gas obviously reduces.
Claims (2)
1. a HCL gas Pyatyi falling film absorbing device, comprise HCL absorption column of gas (1), it is characterized in that: comprise absorption group A (2) and absorption group B (3), absorption group A (2) connects with absorption group B (3), described absorption group A (2) comprises three HCL absorption column of gas (1) parallel with one another, and absorption group B (3) comprises two HCL absorption column of gas (1) parallel with one another.
2. HCL gas Pyatyi falling film absorbing device according to claim 1, is characterized in that: the heat exchanger tube (4) of described HCL absorption column of gas (1) is 32, diameter of phi=37.
Priority Applications (1)
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CN201520455097.5U CN204768162U (en) | 2015-06-29 | 2015-06-29 | Gaseous pyatyi falling liquid film absorbing device of HCL |
Applications Claiming Priority (1)
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CN201520455097.5U CN204768162U (en) | 2015-06-29 | 2015-06-29 | Gaseous pyatyi falling liquid film absorbing device of HCL |
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CN204768162U true CN204768162U (en) | 2015-11-18 |
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CN201520455097.5U Expired - Fee Related CN204768162U (en) | 2015-06-29 | 2015-06-29 | Gaseous pyatyi falling liquid film absorbing device of HCL |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106362555A (en) * | 2016-09-12 | 2017-02-01 | 江苏必康制药股份有限公司 | Process gas purification treatment method |
CN114288841A (en) * | 2021-12-31 | 2022-04-08 | 山东三方化工集团有限公司 | Mannheim method potassium sulfate tail gas processing system |
-
2015
- 2015-06-29 CN CN201520455097.5U patent/CN204768162U/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106362555A (en) * | 2016-09-12 | 2017-02-01 | 江苏必康制药股份有限公司 | Process gas purification treatment method |
CN106362555B (en) * | 2016-09-12 | 2019-06-28 | 江苏九九久科技有限公司 | Process gas purifying treatment method |
CN114288841A (en) * | 2021-12-31 | 2022-04-08 | 山东三方化工集团有限公司 | Mannheim method potassium sulfate tail gas processing system |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151118 Termination date: 20170629 |