CN204516370U - The collimating apparatus of uniform wall thickness - Google Patents

The collimating apparatus of uniform wall thickness Download PDF

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Publication number
CN204516370U
CN204516370U CN201520080940.6U CN201520080940U CN204516370U CN 204516370 U CN204516370 U CN 204516370U CN 201520080940 U CN201520080940 U CN 201520080940U CN 204516370 U CN204516370 U CN 204516370U
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China
Prior art keywords
thickness
align structures
ripple
collimation
rib wall
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Expired - Fee Related
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CN201520080940.6U
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Chinese (zh)
Inventor
李延召
宋点赛
李炳轩
周彪
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Wuhan Zhiwei Technology Co Ltd
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Wuhan Zhiwei Technology Co Ltd
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Abstract

The utility model provides a kind of collimating apparatus of uniform wall thickness, comprise by ray absorbent material make some first collimation sheet and some second collimation sheet and allow ray by and described first collimation sheet and described second collimation sheet between some collimating apertures, described first collimation sheet and described second collimation sheet have some first ripple structions and some second ripple structions respectively, first ripple struction described in each has 2 first align structures and multiple first rib wall construction, second ripple struction described in each has 2 second align structures and multiple second rib wall construction, the thickness of described first rib wall construction equals the thickness of described second rib wall construction, described first, the thickness sum of the second align structures equals the thickness of described first rib wall construction.Be processed to form described first and second collimation sheets during making, make the thickness equaling described first rib wall construction of the thickness sum of first, second align structures described, be then staggeredly stacked first, second collimation sheet described.

Description

The collimating apparatus of uniform wall thickness
Technical field
The utility model relates to radionuclide imaging technical field, particularly relates to a kind of collimating apparatus with uniform wall thickness and preparation method thereof.
Background technology
In radionuclide imaging technology, especially at CT (computed tomography, CT scan) and SPECT (single photon emission computed tomography, single photon emission computerized tomography) in technology, collimating apparatus is absolutely necessary one of critical component.Collimating apparatus is normally made up of the material with radiation absorption performance, as lead, tungsten etc., which is provided with some collimating apertures and form collimating aperture array, the effect of collimating apparatus stops not along the ray of collimating aperture flight, the ray allowing edge and the collimating aperture on it to fly passes through, and is widely used in core Medical Devices.
Past a lot of collimating apparatus often adopts the manufacture of corrugated plate adhesive technology, is the US Patent No. 3937969 on November 14th, 1974 and authorizes day to be that a kind of that the China's Mainland patent CN03826552.4 on September 3rd, 2008 all provides adopts the bonding technology manufacturing collimating apparatus of corrugated plate as the applying date.
Described corrugated plate is made up of the material with radiation absorption performance, there is some ripple structions, ripple struction described in each comprises a crest and a trough, and with described crest and the spaced ripple rib of described trough, time bonding, crest in adjacent corrugated plate is aimed at crest, and trough is aimed at trough, and collimating aperture is between the crest and crest of two adjacent corrugated plate and between trough and trough.This bonding way is little due to bond area, easily causes bonding instability, corrugated plate is easily come off cause collimator structure to collapse loose.
In order to solve the problem, China's Mainland patent CN03826552.4 provides two kinds of solutions:
(1) between two panels corrugated plate, the straight plate of a slice is placed again, crest on corrugated plate or trough are bonded on this straight plate, two adjacent corrugated plate still crest are aimed at crest, trough is aimed at trough, and collimating aperture is between crest and described straight plate and between crest and described straight plate.Increasing bond area by increasing described straight plate, ensure that the Stability Analysis of Structures of described collimating apparatus.In this technology, wall around each collimating aperture is made up of the crest on corrugated plate or trough and some ripple ribs and the straight plate of part, due to crest or trough bonding with the straight plate of part, and the thickness of crest, trough, ripple rib and straight plate is substantially equal, so the wall thickness around collimating aperture is equal not to the utmost.
(2), time bonding, the crest on different corrugated plate is aimed at trough, and trough is aimed at crest, and collimating aperture is between the crest and trough of two adjacent corrugated plate or between trough and crest.This bonding way is the top surface area at crest place or the top area of trough due to bond area, increases bond area, ensure that the Stability Analysis of Structures of described collimating apparatus.In this technology, wall around collimating aperture is made up of the crest on corrugated plate, trough and some ripple ribs, because crest is aimed at bonding with the trough on another corrugated plate, trough is aimed at bonding with the crest on another corrugated plate, and the thickness of crest, trough and ripple rib is substantially equal, so the wall thickness around collimating aperture is equal not to the utmost.
Adopt corrugated plate adhesive technology to manufacture collimating apparatus technique simple, both can make by hand, be applicable to little cost and produce and the purposes such as experiment, also can mechanization even automated production, be applicable in enormous quantities manufacture.But because the wall thickness of collimating aperture is equal not to the utmost, cause the collimating aperture array skewness on the collimator in collimating apparatus, and then cause the collimation of collimating apparatus to ray uneven, affect the collimating effect of collimating apparatus.
Therefore, for above-mentioned technical matters, be necessary the method for making that a kind of structure improved collimating apparatus and collimating apparatus are provided, to solve problems of the prior art.
Summary of the invention
In view of this, the purpose of this utility model is the collimating apparatus providing a kind of collimating aperture uniform wall thickness.
Another object of the present utility model is to provide a kind of method making collimating apparatus, makes the collimating aperture uniform wall thickness of collimating apparatus.
To achieve these goals, the utility model provides a kind of collimating apparatus of uniform wall thickness, the ray that can contrast on the detector collimates, and comprises the some first collimation sheets and some second collimation sheets be made up of ray absorbent material, also comprises the some collimating apertures allowing ray to pass through, described first collimation sheet and described second collimation sheet have some first ripple structions and some second ripple structions respectively, first ripple struction described in each has 2 first align structures be oppositely arranged and the multiple first rib wall constructions be crisscross arranged with described 2 first align structures, second ripple struction described in each has 2 second align structures be oppositely arranged and the multiple second rib wall constructions be crisscross arranged with described 2 second align structures, some described first collimation sheets and some described second collimate sheet and are staggeredly stacked, some described collimating apertures are between some described first ripple structions and some described second ripple structions, the thickness of described first rib wall construction equals the thickness of described second rib wall construction, the thickness sum of described first align structures and described second align structures equals the thickness of described first rib wall construction.
Further, described first align structures is equal with the thickness of described second align structures, and is 1/2 of the thickness of described first rib wall construction.
Further, described 2 first align structures are respectively primary peak and the first trough, described 2 second align structures are respectively secondary peak and the second trough, described primary peak and described first trough respectively with corresponding described second trough and secondary peak aligned stack.And described primary peak and described first trough are all aimed at bonding stacking with corresponding described second trough and secondary peak by viscose respectively.Described ripple struction is trapezoidal ripple or rectangle ripple.
To achieve these goals, the utility model provides a kind of method making the collimating apparatus of uniform wall thickness, comprises the following steps:
Step one, some first collimation sheets that preparatory processing is made up of ray absorbent material and some second collimation sheets, described first collimation sheet and described second collimation sheet is made to have some first ripple structions and some second ripple structions respectively, and the first ripple struction described in each all has 2 first align structures be oppositely arranged and the multiple first rib wall constructions be crisscross arranged with described 2 first align structures, and the second ripple struction described in each all has 2 second align structures be oppositely arranged and the multiple second rib wall constructions be crisscross arranged with described 2 second align structures,
Step 2, the first collimation sheet described in further procedure of processing one and the second collimation sheet, make the thickness of described first rib wall construction equal the thickness of described second rib wall construction, and make the thickness sum of described first align structures and described second align structures equal the thickness of described first rib wall construction;
Step 3, some described first collimation sheets and some described second collimate sheet and are staggeredly stacked, make some described first align structures and described second on described first collimation sheet collimate described second align structures corresponding on sheet to aim at, and make between described first ripple struction and described second ripple struction, to form the some collimating apertures allowing ray to pass through accordingly.
Further, in step 2, the thickness of described first align structures and described second align structures is all processed into 1/2 of the thickness of described first rib wall construction.
Further, described 2 first align structures are respectively primary peak and the first trough, described 2 second align structures are respectively secondary peak and the second trough, and the aligned stack mode in step 3 is: described primary peak and described first trough respectively with corresponding described second trough and secondary peak aligned stack.By the described in the further procedure of processing one of mode first collimation sheet of mould punching and the second collimation sheet in step 2.
To achieve these goals, the utility model provides the another kind of method making the collimating apparatus of uniform wall thickness, comprises the following steps:
Step one, process the some first collimation sheets be made up of ray absorbent material, described first collimation sheet is made to have some first ripple structions, and the first ripple struction described in each all has 2 first align structures be oppositely arranged and the multiple first rib wall constructions be crisscross arranged with described 2 first align structures, and the thickness of described first align structures is made to be less than the thickness of described first rib wall construction;
Step 2, process the some second collimation sheets be made up of ray absorbent material, described second collimation sheet is made to have some second ripple structions, and the second ripple struction described in each all has 2 second align structures be oppositely arranged and the multiple second rib wall constructions be crisscross arranged with described 2 second align structures, and make the thickness of described first rib wall construction equal the thickness of described second rib wall construction, make the thickness sum of described first align structures and described second align structures equal the thickness of described first rib wall construction;
Step 3, some described first collimation sheets and some described second are collimated sheet be staggeredly stacked, make some described first align structures and described second on described first collimation sheet collimate described second align structures corresponding on sheet to aim at, and make between described first ripple struction and described second ripple struction, to form the some collimating apertures allowing ray to pass through accordingly.
Relative to prior art, the utility model has following beneficial effect:
The thickness of described first rib wall construction equals the thickness of described second rib wall construction, the thickness of described first align structures and the thickness sum of described second align structures equal the thickness of described first rib wall construction or the thickness of described second rib wall construction, make the wall thickness between any two adjacent collimating apertures equal, thus guarantee that the described collimating aperture array in described collimating apparatus is uniformly distributed in described collimating apparatus, and then be conducive to described collimating apparatus ray is collimated uniformly, improve the collimating effect of described collimating apparatus.
Accompanying drawing explanation
Fig. 1 is the perspective view of uniform wall thickness collimating apparatus described in the utility model;
Fig. 2 is the schematic side view that the utility model makes the ray absorbent material of described uniform wall thickness collimating apparatus;
The process schematic representation of the first collimation sheet that Fig. 3 is uniform wall thickness collimating apparatus described in the utility model preparatory processing and the second collimation sheet;
Fig. 4 is the schematic top plan view of the first collimation sheet after the utility model preparatory processing;
Fig. 5 is the schematic top plan view of the second collimation sheet after the utility model preparatory processing;
Fig. 6 is that the utility model processes the first collimation sheet of described uniform wall thickness collimating apparatus and the process schematic representation of the second collimation sheet further;
Fig. 7 is the schematic top plan view of the first collimation sheet after the utility model is processed further;
Fig. 8 is the schematic top plan view of the second collimation sheet after the utility model is processed further;
Fig. 9 is the schematic top plan view that the utility model one first collimates sheet and one second collimation sheet aligned stack;
Figure 10 is that the multiple first collimation sheet of the utility model and multiple second collimation sheet interlock the schematic top plan view of aligned stack.
Embodiment
For ease of better understanding the purpose of this utility model, technical characteristic and effect thereof, now with embodiment, further explaination is done to the utility model by reference to the accompanying drawings.
The collimating apparatus of a kind of uniform wall thickness that the utility model provides can be used for the ray contrasted on the detector and collimates, the resolution of SPECT (or CT) image is improved by absorbing the ray (i.e. scattered ray) do not flown along collimating aperture, as Fig. 1 to Figure 10, described collimating apparatus 100 comprises some first collimation sheets 10 and some second collimation sheets 20, and the some collimating apertures 5 between described first collimation sheet 10 and described second collimation sheet 20.Described first collimation sheet 10 and described second collimation sheet 20 are made by having ray absorbent material 1, as lead, tungsten or alloy etc. that is plumbous and tungsten.
As shown in Figure 7, described in each, the first collimation sheet 10 has some first ripple structions, and described first ripple struction is the suitable waveform such as trapezoidal ripple or rectangle ripple, and the preferred described ripple struction of the present embodiment is trapezoidal ripple.First ripple struction described in each all has 2 first align structures 12 be oppositely arranged, and the multiple first rib wall constructions 11 to be crisscross arranged with described first align structures 12, described 2 first align structures 12 are respectively primary peak and first trough of described first ripple struction, and multiple described first rib wall construction 11 connects with corresponding described primary peak and described first trough.
As shown in Figure 7, the thickness of described first align structures 12 is X1, and the thickness of described first wave rib structure 11 is X2, X1 is less than X2, and namely the thickness of described first align structures 12 is less than the thickness of described first wave rib structure 11, preferred X1=X2/2, in the utility model, X1=0.2mm, X2=0.4mm.
As shown in Figure 8, described in each, the second collimation sheet 20 has some second ripple structions, and described second ripple struction is the suitable waveform such as trapezoidal ripple or rectangle ripple, and the preferred described ripple struction of the present embodiment is trapezoidal ripple.Second ripple struction described in each all has 2 second align structures 22 be oppositely arranged, and the multiple second rib wall constructions 21 to be crisscross arranged with described second align structures 22, described 2 second align structures 22 are respectively secondary peak and second trough of described second ripple struction, and multiple described second rib wall construction 21 connects with corresponding described secondary peak and described second trough.
As shown in Figure 8, the thickness of described second align structures 22 is Y1, and the thickness of described Second Wave rib structure 21 is that Y2, Y1 are less than Y2, and namely the thickness of described second align structures 22 is less than the thickness of described Second Wave rib structure 21, preferred Y1=Y2/2.The thickness X 2 of described first rib wall construction 11 equals the thickness Y2 of described second rib wall construction 21, in the utility model, and Y1=0.2mm, Y2=0.4mm.
As shown in Figure 9 and Figure 10, when some described first collimation sheets 10 and some described ear collimation sheets 20 are stacked into described collimating apparatus 100, described primary peak on first collimation sheet 10 described in and described first trough collimate described second trough on sheet 20 and described secondary peak aligned stack respectively with described second, and be adhesively fixed together by viscose (as epoxy resin), its bond area is described first, the apex area of secondary peak or described first, (aligning described in the utility model is that the axis of align structures described in overlaps with the axis of align structures described in corresponding another for the bottom area of the second trough, the described axis of described align structures is perpendicular to described align structures).Gross thickness after corresponding described secondary peak and described first trough aligned stack is X3, X3=X1+Y1=X2=Y2.In the space of described collimating aperture 5 on described first collimation sheet 10 and described second collimation sheet 20 between corresponding described first ripple struction and described second ripple struction: the first align structures 12 and described in accordingly described second align structures 22 and two accordingly described first rib wall construction 11 and two accordingly described second rib wall construction 21 enclose composition one collimating aperture 5, the hole wall of described collimating aperture 5, except the second rib wall construction 21 described in the first rib wall construction 11 and two described in two, also has two hole walls by described first align structures 12 and described second align structures 22 aligned stack composition be oppositely arranged.Due to X3=X1+Y1=X2=Y2, the pore wall thickness between any two adjacent collimating apertures 5 is equal.
The manufacture method of the collimating apparatus 100 described in the present embodiment:
Step one, the described first collimation sheet 10 of preliminary making, as shown in 2 and Fig. 3, described ray absorbent material 1 is put between energy pitch wheel 21,22, blank first is as shown in Figure 4 become to collimate sheet 10 described ray absorbent material 1 preparatory processing, make described first collimation sheet 10 have some first ripple structions, and the first ripple struction described in each all have 2 first align structures 12 be oppositely arranged and the multiple first rib wall constructions 11 be crisscross arranged with described 2 first align structures 12.During preparatory processing, because ray absorbent material 1 is stressed relatively more even, causes the thickness X 1 of described first align structures 12 to be substantially equal to or equal the thickness X 2 of described first wave rib structure 11.
Then the described second collimation sheet 20 of preliminary making, as shown in 2 and Fig. 3, described ray absorbent material 1 is put between energy pitch wheel 21,22, blank second is as shown in Figure 5 become to collimate sheet 20 described ray absorbent material 1 preparatory processing, make described second collimation sheet 20 have the second ripple struction, and the second ripple struction described in each all have 2 second align structures 22 be oppositely arranged and the multiple second rib wall constructions 21 be crisscross arranged with described 2 second align structures 22.During preparatory processing, because ray absorbent material 1 is stressed relatively even, the thickness Y1 of described the one the second align structures 22 is caused to be substantially equal to or to equal the thickness Y2 of described Second Wave rib structure 21.
Step 2, the described first collimation sheet 10 of further processing, as shown in Figure 6, described first collimation sheet 10 through preparatory processing in step one is put between the patrix 31 of diel and counterdie 32, described patrix 31 has some double wedges, described counterdie 32 has some grooves, some described grooves and some described double wedge one_to_one corresponding.Some described first align structures 12 of the first collimation sheet 10 described in punching press, due to the existence along described first rib wall construction 11, described first align structures 12 extension can occur to the direction being parallel to the extension of described collimating aperture 5 makes described first align structures 12 thinning.During punching press, the thickness of described first rib wall construction 11 remains unchanged substantially, or the thinning of described first rib wall construction 11 is less than the thinning of described first align structures 12.As shown in Figure 7, further after processing, the thickness X 1 of described first align structures 12 is less than the thickness X 2 of described first rib wall construction 11, i.e. X1 < X2.
The described second collimation sheet 20 of further processing, further the mode of the described collimation sheet 20 of processing is processed described first with further to collimate the mode of sheet identical.As shown in Figure 8, further after processing, the thickness Y1 of described second align structures 22 is less than the thickness Y2 of described second rib wall construction 21, i.e. Y1 < Y2.
In order to the hole wall wall thickness realizing being around in around described collimating aperture 5 is equal, after described first collimation sheet 10 and described second collimation sheet 20 are further processed, the thickness X 2 of described first rib wall construction 11 equals the thickness Y2 of described second rib wall construction 21, thickness X 1 and the thickness Y1 sum X3 of described second align structures of described first align structures 12 equal the thickness X 2 (or equaling the thickness Y2 of described second rib wall construction 21) of described first rib wall construction 11, that is: X2=Y2, X3=X1+Y1=X2=Y2, in the utility model, X1=0.2mm, X2=0.4mm, Y1=0.2mm, Y2=0.4mm.
The described first collimation sheet 10 and described second that miscellaneous equipment or method certainly can also be adopted to process further through preparatory processing collimates sheet 20, after making processing further, the thickness X 1 of described first align structures 12 equals 1/2 of the thickness X 2 of described first rib wall construction 11, i.e. X1=X2/2, the thickness Y1 of described second align structures 22 is made to equal 1/2, i.e. Y1=Y2/2 of the thickness Y2 of described second rib wall construction 21.
Then by cut or the mode such as polishing is removed and added the first align structures 12 described in man-hour further owing to protruding the redundance of described first rib wall construction 11 during thinning extension, and remove and add the second align structures 22 described in man-hour further owing to protruding the redundance of described second rib wall construction 21 during thinning extension.
Step 3, as shown in Figure 9 and Figure 10, described first align structures 12 on first collimation sheet 10 described in second is collimated described second align structures 22 aligned stack corresponding on sheet 20 to described in one, by the described primary peak on the first collimation sheet 10 described in one and described first trough respectively with second collimate described second trough on sheet 20 and described secondary peak aligned stack described in one, and be adhesively fixed together by viscose (as epoxy resin), and make between described first ripple struction and described second ripple struction, to form the some collimating apertures 5 allowing ray to pass through accordingly.
Stacking complete described some first collimation sheets 10 and described second collimation sheet 20 just define collimating apparatus 100 structure as shown in Figure 1 afterwards.
The present embodiment also provides the method for the collimating apparatus 100 described in another kind of making:
Step one, as Fig. 7, process the some first collimation sheets 10 be made up of radiation absorption material 1, described first collimation sheet 10 is made to have some first ripple structions, and the first ripple struction described in each all has 2 first align structures 12 be oppositely arranged and the multiple first rib wall constructions 11 be crisscross arranged with described 2 first align structures 12, and the thickness X 1 of described first align structures 12 is made to be less than the thickness X 2 of described first rib wall construction 11.
Step 2, as Fig. 8, process the some second collimation sheets 20 be made up of ray absorbent material 1, described second collimation sheet 20 is made to have some second ripple structions, and the second ripple struction described in each all has 2 second align structures 22 be oppositely arranged and the multiple second rib wall constructions 21 be crisscross arranged with described 2 second align structures 22, and make the thickness Y2 of described second rib wall construction 21 equal the thickness X 2 of described first rib wall construction 11, described first align structures 12 and the thickness sum X3 of described second align structures 22 is made to equal the thickness X 2 of described first rib wall construction 11, i.e. X3=X1+Y1=X2.
Step 3, as Fig. 9 and Figure 10, some described first collimation sheets 10 and some described second are collimated sheet 20 be staggeredly stacked, make some described first align structures 12 and described second on described first collimation sheet 10 collimate described second align structures 22 corresponding on sheet 20 to aim at, and make between described first ripple struction and described second ripple struction, to form the some collimating apertures 5 allowing ray to pass through accordingly.
Stacking complete described some first collimation sheets 10 and described second collimation sheet 20 just define collimating apparatus 100 structure as shown in Figure 1 afterwards.
Relative to prior art, the utility model has following beneficial effect:
The thickness X 2 of described first rib wall construction 11 equals the thickness Y2 of described second rib wall construction 21, the thickness X 1 of described first align structures 12 equals the thickness X 1 of described first rib wall construction 11 or the thickness Y1 of described second rib wall construction 21 with the thickness Y2 sum X3 of described second align structures 22, make the wall thickness between any two adjacent collimating apertures 5 equal, thus guarantee that described collimating aperture 5 array in described collimating apparatus 100 is uniformly distributed in described collimating apparatus 100, and then be conducive to described collimating apparatus 100 pairs of rays and collimate uniformly, improve the collimating effect of described collimating apparatus 100.
Above-mentioned explanation is the detailed description for the utility model preferred embodiment, but above-described embodiment is also not used to limit patent claim of the present utility model, the equal change completed under all technical spirits disclosed at the utility model or modify is changed, and all belongs to the scope of the claims that the utility model is contained.

Claims (5)

1. a collimating apparatus for uniform wall thickness, the ray that can contrast on the detector collimates, and comprises the some first collimation sheets and some second collimation sheets be made up of ray absorbent material, also comprises the some collimating apertures allowing ray to pass through, described first collimation sheet and described second collimation sheet have some first ripple structions and some second ripple structions respectively, first ripple struction described in each has 2 first align structures be oppositely arranged and the multiple first rib wall constructions be crisscross arranged with described 2 first align structures, second ripple struction described in each has 2 second align structures be oppositely arranged and the multiple second rib wall constructions be crisscross arranged with described 2 second align structures, some described first collimation sheets and some described second collimate sheet and are staggeredly stacked, some described collimating apertures are between some described first ripple structions and some described second ripple structions, the thickness of described first rib wall construction equals the thickness of described second rib wall construction, it is characterized in that: the thickness sum of described first align structures and described second align structures equals the thickness of described first rib wall construction.
2. the collimating apparatus of uniform wall thickness according to claim 1, is characterized in that: described first align structures is equal with the thickness of described second align structures, and is 1/2 of the thickness of described first rib wall construction.
3. the collimating apparatus of uniform wall thickness according to claim 1, it is characterized in that: described 2 first align structures are respectively primary peak and the first trough, described 2 second align structures are respectively secondary peak and the second trough, described primary peak and described first trough respectively with corresponding described second trough and secondary peak aligned stack.
4. the collimating apparatus of uniform wall thickness according to claim 3, is characterized in that: described primary peak and described first trough are all aimed at bonding stacking with corresponding described second trough and secondary peak by viscose respectively.
5. the collimating apparatus of uniform wall thickness according to claim 1, is characterized in that: described ripple struction is trapezoidal ripple or rectangle ripple.
CN201520080940.6U 2015-02-05 2015-02-05 The collimating apparatus of uniform wall thickness Expired - Fee Related CN204516370U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105989904A (en) * 2015-02-05 2016-10-05 武汉知微科技有限公司 Collimator with uniform wall thickness, and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105989904A (en) * 2015-02-05 2016-10-05 武汉知微科技有限公司 Collimator with uniform wall thickness, and manufacturing method thereof
CN105989904B (en) * 2015-02-05 2018-06-19 武汉知微科技有限公司 The collimator and its manufacturing method of uniform wall thickness

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