CN204442197U - A kind of pulsed sputter power supply - Google Patents
A kind of pulsed sputter power supply Download PDFInfo
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- CN204442197U CN204442197U CN201520155011.7U CN201520155011U CN204442197U CN 204442197 U CN204442197 U CN 204442197U CN 201520155011 U CN201520155011 U CN 201520155011U CN 204442197 U CN204442197 U CN 204442197U
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Abstract
一种脉冲溅射电源,包括顺序连接的三相整流电路、逆变电路、高频变压器、整流滤波电路、脉冲发生电路;所述脉冲发生电路的结构为:包括开关管V输出端连接于电感L抽头a端;电感L抽头o端连接于直流电源电路负极,电感L抽头b端与磁控溅射装置靶材相连,开关管V输入端与磁控溅射装置基板共同相连于直流电源电路正极;所述开关管V的控制端与PWM控制电路连接。本实用新型解决现有技术中功率开关管过多造成的电源可靠性下降,提供一种动态特性好、成本较低、控制简单可靠、具有能量回馈的一种脉冲溅射电源。
A pulse sputtering power supply, comprising a sequentially connected three-phase rectifier circuit, an inverter circuit, a high-frequency transformer, a rectifier filter circuit, and a pulse generating circuit; L-tap a-end; inductor L-tap o-end connected to the negative pole of the DC power supply circuit, inductor L-tap b-end connected to the target of the magnetron sputtering device, and the V input end of the switch tube and the substrate of the magnetron sputtering device to be connected to the DC power supply circuit positive pole; the control terminal of the switching tube V is connected with the PWM control circuit. The utility model solves the power supply reliability drop caused by too many power switch tubes in the prior art, and provides a pulse sputtering power supply with good dynamic characteristics, low cost, simple and reliable control, and energy feedback.
Description
技术领域technical field
本发明涉及磁控溅射技术领域,特别是涉及一种脉冲溅射电源。The invention relates to the technical field of magnetron sputtering, in particular to a pulse sputtering power supply.
背景技术Background technique
薄膜沉积是在真空环境下,利用等离子体中的荷能离子轰击靶材表面,使靶材上被轰击出来的原子或离子沉积在基体表面生长成具有特定功能的薄膜。磁控溅射技术是薄膜沉积工艺的一种,是利用电磁场来控制真空室内气体异常辉光放电中离子、电子的运动轨迹及分布状况的溅射镀膜工艺过程。Thin film deposition is the use of energetic ions in the plasma to bombard the surface of the target in a vacuum environment, so that the bombarded atoms or ions on the target are deposited on the surface of the substrate to grow into a thin film with specific functions. Magnetron sputtering technology is a kind of thin film deposition process. It is a sputtering coating process that uses electromagnetic fields to control the trajectory and distribution of ions and electrons in the abnormal glow discharge of gases in a vacuum chamber.
目前国内外研制的磁控溅射电源主要有直流溅射电源,射频溅射电源,中频溅射电源,脉冲溅射电源等几种类型。中频溅射、射频溅射和脉冲溅射能够克服直流溅射过程中在做反应膜时的电荷积累和放电,有效解决了靶中毒严重的现象,克服了溅射过程中阳极消失的现象。中频溅射要求两个孪生靶,并且溅射速率比脉冲溅射低,射频溅射电源工作频率在十几兆赫兹,设备成本很高,而脉冲溅射可以在直流溅射设备上直接进行,只需单个靶材即可,溅射速率比中频溅射高,工作频率在几十千赫兹,成本大大低于射频溅射电源。脉冲溅射电源是采用矩形波电压的脉冲电源代替传统直流溅射电源进行薄膜沉积。At present, the magnetron sputtering power supply developed at home and abroad mainly includes several types such as DC sputtering power supply, radio frequency sputtering power supply, intermediate frequency sputtering power supply, and pulse sputtering power supply. Intermediate frequency sputtering, radio frequency sputtering and pulse sputtering can overcome the charge accumulation and discharge when making a reaction film during DC sputtering, effectively solve the phenomenon of serious target poisoning, and overcome the phenomenon of anode disappearance during sputtering. Intermediate frequency sputtering requires two twin targets, and the sputtering rate is lower than pulse sputtering. The operating frequency of RF sputtering power supply is more than ten megahertz, and the equipment cost is very high, while pulse sputtering can be directly carried out on DC sputtering equipment. Only a single target is needed, the sputtering rate is higher than that of intermediate frequency sputtering, the operating frequency is tens of kilohertz, and the cost is much lower than that of RF sputtering power supply. The pulse sputtering power supply uses a rectangular wave voltage pulse power supply instead of the traditional DC sputtering power supply for film deposition.
中国专利(申请号:CN201310024628)公开了一种高能量脉冲式磁控溅射方法及磁控溅射装置,其中,该高能量脉冲式磁控溅射装置,包括真空腔、抽真空设备、电源、中央控制单元,其特征在于,所述电源包括脉冲发生单元、偏压电源和直流电源;所述偏压电源连接于样品上,所述直流电源连接于靶材上,所述脉冲发生单元通过数据线与中央控制单元连接,并且该脉冲发生单元由直流电源推动产生脉冲电流,并将该电流输出至真空腔的靶材中。然而该高能量脉冲式磁控溅射装置并没有详细记载磁控溅射装置的电路结构组成,仅仅阐述了其工作原理,导致本领域技术人员无法根据其公开内容进行设计。Chinese patent (application number: CN201310024628) discloses a high-energy pulsed magnetron sputtering method and a magnetron sputtering device, wherein the high-energy pulsed magnetron sputtering device includes a vacuum chamber, vacuum equipment, power supply . The central control unit, wherein the power supply includes a pulse generating unit, a bias power supply and a DC power supply; the bias power supply is connected to the sample, the DC power supply is connected to the target, and the pulse generating unit passes The data line is connected with the central control unit, and the pulse generating unit is driven by a DC power supply to generate a pulse current, and outputs the current to the target in the vacuum chamber. However, the high-energy pulsed magnetron sputtering device does not describe the circuit structure of the magnetron sputtering device in detail, but only describes its working principle, which makes it impossible for those skilled in the art to design according to its disclosure.
西安理工大学学报(2013年第29卷第2期,作者:陈桂涛等)公开了一种基于FPGA的新型非对称双极脉冲磁控溅射电源的研究,该文献研究了基于FPGA的非对称双极脉冲电源,解决了磁控溅射工艺中遇到的共性问题,同时获得了优异的膜层性能和更宽的工艺范围。可以根据磁控溅射电源工艺需求对双向脉冲参数包括脉冲幅值、频率、占空比,以及正负向个数和正向脉冲与负向脉冲之间的换向时间等自由调节。最后设计了一个6kW/100kHz样机,前级采用两个独立的DC/DC变换器作为直流源,后级为一个非对称脉冲发生器。采用Altera公司的FPGA(EP3C25Q240C8)作为数字处理器实现了电源的数字控制,同时对后级脉冲变换环节实现高自由度控制,通过实验结果分析进一步验证了设计的可行性。然而,该磁控溅射电源的矩形电压生成部分采用全桥逆变加整流的方式实现,功率开关管数量多,电源成本增加,并且电源控制复杂,影响电源可靠性。The Journal of Xi'an University of Technology (Volume 29, No. 2, 2013, author: Chen Guitao, etc.) discloses a new type of FPGA-based asymmetric bipolar pulse magnetron sputtering power supply. This document studies the FPGA-based asymmetric bipolar The extremely pulsed power supply solves the common problems encountered in the magnetron sputtering process, and at the same time obtains excellent film performance and a wider process range. Bidirectional pulse parameters including pulse amplitude, frequency, duty cycle, number of positive and negative directions, and commutation time between positive and negative pulses can be freely adjusted according to the process requirements of the magnetron sputtering power supply. Finally, a 6kW/100kHz prototype is designed. Two independent DC/DC converters are used as DC sources in the front stage, and an asymmetric pulse generator is used in the rear stage. Altera's FPGA (EP3C25Q240C8) is used as the digital processor to realize the digital control of the power supply, and at the same time realize the high-degree-of-freedom control of the post-stage pulse conversion link. The feasibility of the design is further verified through the analysis of experimental results. However, the rectangular voltage generation part of the magnetron sputtering power supply is realized by a full-bridge inverter plus rectification, the number of power switch tubes is large, the cost of the power supply is increased, and the control of the power supply is complicated, which affects the reliability of the power supply.
实用新型内容Utility model content
本实用新型是针对现有技术中存在的不足,提供一种性能稳定、成本较低、具有高脉冲峰值电压的高功率脉冲磁控溅射电源。The utility model aims at the deficiencies in the prior art, and provides a high-power pulse magnetron sputtering power supply with stable performance, low cost and high pulse peak voltage.
本实用新型通过以下技术方案加以实现:一种脉冲溅射电源,包括顺序连接的三相整流电路、逆变电路、高频变压器、整流滤波电路、脉冲发生电路;其特征在于:所述脉冲发生电路的结构为:包括开关管V输出端连接于电感L抽头a端;电感L抽头o端连接于直流电源电路负极,电感L抽头b端与磁控溅射装置靶材相连,开关管V输入端与磁控溅射装置基板共同相连于直流电源电路正极;所述开关管V的控制端与PWM控制电路连接。The utility model is realized through the following technical solutions: a pulse sputtering power supply, including a sequentially connected three-phase rectification circuit, an inverter circuit, a high-frequency transformer, a rectification filter circuit, and a pulse generation circuit; it is characterized in that: the pulse generation The structure of the circuit is as follows: the V output terminal of the switching tube is connected to the a terminal of the L tap of the inductor; the O terminal of the L tap of the inductor is connected to the negative pole of the DC power supply circuit, the b terminal of the L tap of the inductor is connected to the target of the magnetron sputtering device, and the V input of the switching tube The terminal and the substrate of the magnetron sputtering device are connected to the positive pole of the DC power supply circuit; the control terminal of the switching tube V is connected to the PWM control circuit.
优选为:还包括中央处理器、驱动电路、信号采集模块、保护模块、上位机、液晶显示模块、信号输入模块;所述中央处理器为ARM系统;所述信号采集模块包括电压采样电路、电流采样电路;所述保护模块包括过流及短路保护电路。Preferably: also include central processing unit, drive circuit, signal acquisition module, protection module, upper computer, liquid crystal display module, signal input module; Described central processing unit is ARM system; Described signal acquisition module comprises voltage sampling circuit, current Sampling circuit; the protection module includes overcurrent and short circuit protection circuits.
优选为:所述三相整流电路的输入端与空气开关输出端连接;所述空气开关的输入端连接快速可恢复保险管。Preferably, the input end of the three-phase rectifier circuit is connected to the output end of the air switch; the input end of the air switch is connected to a quick recoverable fuse.
优选为:所述驱动电路包括对逆变电路的驱动和对脉冲发生电路的驱动;所述驱动电路的驱动信号是由ARM系统产生并经过光电隔离电路处理后生成的。Preferably, the drive circuit includes a drive for an inverter circuit and a drive for a pulse generating circuit; the drive signal for the drive circuit is generated by an ARM system and processed by a photoelectric isolation circuit.
优选为:所述电流采样电路包括对所述整流滤波电路的输出电流以及对脉冲发生电路的输出电流采样电路。Preferably, the current sampling circuit includes a sampling circuit for the output current of the rectification filter circuit and the output current of the pulse generating circuit.
优选为:所述电流采样电路包括电流传感器,所述电流传感器采用霍尔电流传感器。Preferably, the current sampling circuit includes a current sensor, and the current sensor adopts a Hall current sensor.
优选为:所述电压采样电路包括对所述整流滤波电路的输出电压以及对脉冲发生电路的输出电压采样电路。Preferably, the voltage sampling circuit includes a sampling circuit for the output voltage of the rectification and filtering circuit and for the output voltage of the pulse generating circuit.
优选为:所述电压采样电路、电流采样电路经过A/D采样电路后传输到ARM控制芯片。Preferably, the voltage sampling circuit and the current sampling circuit are transmitted to the ARM control chip after passing through the A/D sampling circuit.
优选为:所述上位机与ARM系统之间的信号传输为无线传输,优选为4G网络传输。Preferably, the signal transmission between the upper computer and the ARM system is wireless transmission, preferably 4G network transmission.
有益效果:本实用新型解决现有技术中功率开关管过多造成的电源可靠性下降,提供一种动态特性好、成本较低、控制简单可靠的一种脉冲溅射电源。Beneficial effects: the utility model solves the power supply reliability drop caused by too many power switch tubes in the prior art, and provides a pulse sputtering power supply with good dynamic characteristics, low cost, and simple and reliable control.
附图说明Description of drawings
附图1为本实用新型结构示意图;Accompanying drawing 1 is the structural representation of the utility model;
附图2为本实用新型直流电源电路结构示意图Accompanying drawing 2 is the utility model DC power supply circuit structure schematic diagram
附图3为本实用新型脉冲发电电路结构示意图;Accompanying drawing 3 is the structure schematic diagram of the utility model pulse generating circuit;
附图4为本实用新型电压采样电路示意图;Accompanying drawing 4 is the utility model voltage sampling circuit schematic diagram;
附图5为本实用新型电流采样电路示意图;Accompanying drawing 5 is the schematic diagram of the utility model current sampling circuit;
附图6为本实用新型过流短路保护电路示意图;Accompanying drawing 6 is the schematic diagram of the utility model overcurrent short-circuit protection circuit;
附图7为本实用新型电压采样流程图。Accompanying drawing 7 is the voltage sampling flowchart of the utility model.
具体实施方式Detailed ways
参见附图1所示。See attached drawing 1.
一种脉冲溅射电源,包括顺序连接的三相整流电路、逆变电路、高频变压器、整流滤波电路、脉冲发生电路;其特征在于:包括中央处理器、驱动电路、信号采集模块、保护模块、上位机、液晶显示模块、信号输入模块;所述中央处理器为ARM系统;所述信号采集模块包括电压采样电路、电流采样电路;所述保护模块包括过流及短路保护电路。所述三相整流电路的输入端与空气开关输出端连接;所述空气开关的输入端连接快速可恢复保险管。所述驱动电路包括对逆变电路的驱动和对脉冲发生电路的驱动;所述驱动电路的驱动信号是由ARM系统产生并经过光电隔离电路处理后生成的。所述电流采样电路包括对所述整流滤波电路的输出电流以及对脉冲发生电路的输出电流采样电路。所述电流采样电路包括电流传感器,所述电流传感器采用霍尔电流传感器。所述电压采样电路包括对所述整流滤波电路的输出电压以及对脉冲发生电路的输出电压采样电路。所述电压采样电路、电流采样电路经过A/D采样电路后传输到ARM系统。所述上位机与ARM系统之间的信号传输为无线传输,优选为4G网络传输。所述ARM系统的信号输入为键盘输入或无线输入;所述ARM系统的显示为液晶显示或数码管显示。A pulse sputtering power supply, comprising a sequentially connected three-phase rectifying circuit, an inverter circuit, a high-frequency transformer, a rectifying and filtering circuit, and a pulse generating circuit; it is characterized in that it includes a central processing unit, a driving circuit, a signal acquisition module, and a protection module , host computer, liquid crystal display module, signal input module; the central processing unit is an ARM system; the signal acquisition module includes a voltage sampling circuit, a current sampling circuit; the protection module includes an overcurrent and short circuit protection circuit. The input end of the three-phase rectifier circuit is connected to the output end of the air switch; the input end of the air switch is connected to a fast recoverable fuse. The drive circuit includes a drive for an inverter circuit and a drive for a pulse generating circuit; the drive signal of the drive circuit is generated by an ARM system and processed by a photoelectric isolation circuit. The current sampling circuit includes a sampling circuit for the output current of the rectification filter circuit and the output current of the pulse generating circuit. The current sampling circuit includes a current sensor, and the current sensor adopts a Hall current sensor. The voltage sampling circuit includes a circuit for sampling the output voltage of the rectification and filtering circuit and the output voltage of the pulse generating circuit. The voltage sampling circuit and the current sampling circuit are transmitted to the ARM system after passing through the A/D sampling circuit. The signal transmission between the upper computer and the ARM system is wireless transmission, preferably 4G network transmission. The signal input of the ARM system is keyboard input or wireless input; the display of the ARM system is liquid crystal display or digital tube display.
参见附图2所示。所述三相整流电路、逆变电路、高频变压器、整流滤波组成直流电源电路。整流桥D1及滤波电容C2组成三相整流电路;Q1、Q2、Q3和Q4组成逆变电路;T1为高频变压器;整流桥D2、电感Lo、电容C4组成整流滤波电路。所述逆变电路开关管Q1与开关管Q4、开关管Q2与开关管Q3交替导通与关断。See attached drawing 2. The three-phase rectification circuit, the inverter circuit, the high-frequency transformer, and the rectification filter form a DC power supply circuit. Rectifier bridge D1 and filter capacitor C2 form a three-phase rectifier circuit; Q1, Q2, Q3 and Q4 form an inverter circuit; T1 is a high-frequency transformer; rectifier bridge D2, inductor Lo, and capacitor C4 form a rectifier filter circuit. The switching tube Q1 and the switching tube Q4 of the inverter circuit, and the switching tube Q2 and the switching tube Q3 are turned on and off alternately.
三相380V交流电经整流电路后,变换为大小540V的直流电,经逆变电路,将直流电变换为20KHZ的交流电并送入高频变压器,进行升压变换,高压高频交流电经过整流滤波变换为直流电。The three-phase 380V AC is transformed into 540V DC by the rectifier circuit, the DC is converted into 20KHZ AC by the inverter circuit and sent to the high-frequency transformer for step-up conversion, and the high-voltage and high-frequency AC is converted into DC by rectification and filtering .
ARM系统包括ARM微控制器:键盘输入、液晶显示主要负责电源参数的预置和电源工作状态显示,此外ARM系统其具有很强的通信能力,可通过专用接口实现与外部计算机间的通信,从而可以非常方便地实施网络化管理与软件控制程序的升级。ARM系统利用传感器进行电流、电压信号的采样,并将电流、电压反馈信号经过信号处理直接输入ARM,通过ARM内部的A/D转换器,将电流、电压反馈的模拟信号转变为数字信号;由键盘输入的电流、电压、频率、脉冲宽度的给定信号以数字量的形式传送给ARM;ARM根据各信号给定值与反馈值,基于数字PID控制进行运算,产生PWM脉冲序列;ARM输出的PWM信号通过光电隔离、驱动电路,控制逆变电路和脉冲发生电路中的功率开关器件IGBT的通断,得到设定的输出电压和电流。所述ARM控制器优选为ARM8。The ARM system includes an ARM microcontroller: keyboard input and liquid crystal display are mainly responsible for the preset of power supply parameters and the display of power supply working status. In addition, the ARM system has strong communication capabilities and can communicate with external computers through dedicated interfaces. It is very convenient to implement network management and upgrade of software control program. The ARM system uses the sensor to sample the current and voltage signals, and directly inputs the current and voltage feedback signals into the ARM through signal processing, and converts the analog signals of the current and voltage feedback into digital signals through the A/D converter inside the ARM; The given signals of current, voltage, frequency, and pulse width input by the keyboard are transmitted to ARM in the form of digital quantities; ARM performs calculations based on digital PID control according to the given values and feedback values of each signal to generate PWM pulse sequences; ARM output The PWM signal controls the on-off of the power switching device IGBT in the inverter circuit and the pulse generation circuit through the photoelectric isolation and drive circuit, and obtains the set output voltage and current. The ARM controller is preferably ARM8.
参见附图3所示。所述脉冲发生电路的结构为:包括开关管V输出端连接于电感L抽头a端,电感L抽头o端连接于直流电源电路负极,电感L抽头b端与磁控溅射装置靶材相连,开关管V输入端与磁控溅射装置基板共同相连于直流电源电路正极;所述开关管V的控制端与PWM控制电路连接;所述PWM控制电路生成PWM控制信号后经过光电隔离电路、驱动电路后控制所述脉冲发生电路中开关管的导通、关断。所述脉冲发生电路的开关管V为IGBT管。See Figure 3. The structure of the pulse generating circuit is as follows: the V output terminal of the switching tube is connected to the a terminal of the inductance L tap, the o terminal of the inductance L tap is connected to the negative pole of the DC power supply circuit, and the b terminal of the inductance L tap is connected to the target of the magnetron sputtering device. The input terminal of the switch tube V is connected to the positive pole of the DC power supply circuit with the substrate of the magnetron sputtering device; the control terminal of the switch tube V is connected to the PWM control circuit; after the PWM control circuit generates a PWM control signal, it passes through the photoelectric isolation circuit, drives The circuit then controls the on and off of the switching tube in the pulse generating circuit. The switching tube V of the pulse generating circuit is an IGBT tube.
所述直流电源电路用于产生直流电,其电压电流受PWM控制电路监测与控制。所述脉冲发生电路用于产生高频功率脉冲,其频率和占空比受PWM控制电路控制。所述PWM控制电路用于采集电压电流信号,发出直流电源电路控制信号,发出脉冲发生电路控制信号。The DC power supply circuit is used to generate DC power, the voltage and current of which are monitored and controlled by the PWM control circuit. The pulse generating circuit is used to generate high-frequency power pulses, and its frequency and duty ratio are controlled by a PWM control circuit. The PWM control circuit is used to collect voltage and current signals, send out DC power supply circuit control signals, and send out pulse generation circuit control signals.
所述脉冲发生电路的工作原理:PWM控制电路控制脉冲发生电路的开关管V开通与关断。开关管V关断时,电流从直流电源正极流出,向等离子体供电,并经过电感L流回直流电源负极,此时电感L电压极性o端为负、b端为正,储存电能;由于靶材表面积累正电荷致使等离子体负载表现电容性质,其极性为上正下负,开关管V导通时,此时电感L起到变压器作用,a端和o端是输入端,b端和a端是输出端,a端和b端是同名端,电感L的a端和o端接直流电源电路,a端高于o端电位故b端电位要高于a端电位,此时电感L向等离子体负载反向充电,中和靶材表面积累电荷;开关管V再次关断时,电感L出现内部环流,使得电感电流迅速平衡。电感L具有电感和变压器的双重作用,先后完成储能和传递能量。调节电感L的中心抽头a端的位置,可调节反向充电电压。The working principle of the pulse generating circuit: the PWM control circuit controls the switch tube V of the pulse generating circuit to turn on and off. When the switching tube V is turned off, the current flows out from the positive pole of the DC power supply, supplies power to the plasma, and flows back to the negative pole of the DC power supply through the inductor L. At this time, the voltage polarity of the inductor L is negative at the terminal o and positive at the terminal b, storing electric energy; The accumulation of positive charges on the surface of the target causes the plasma load to exhibit capacitive properties. Its polarity is positive up and negative down. When the switch tube V is turned on, the inductance L acts as a transformer at this time. Terminal a and terminal a are output terminals, terminal a and terminal b are terminals with the same name, terminal a and terminal o of the inductor L are connected to the DC power supply circuit, terminal a is higher than the potential of terminal o, so the potential of terminal b is higher than that of terminal a. At this time, the inductance L reversely charges the plasma load to neutralize the accumulated charge on the surface of the target; when the switch tube V is turned off again, an internal circulation occurs in the inductor L, which makes the inductor current quickly balanced. Inductor L has the dual functions of inductance and transformer, and completes energy storage and energy transfer successively. Adjusting the position of the terminal a of the center tap of the inductor L can adjust the reverse charging voltage.
PWM控制电路,由ARM微控制器及外围保护电路组成。其功能:电流、电压信号的采集与运算;脉宽调制信号的产生;异常弧光放电的保护;恒流、恒压、恒功率特性的生成,脉冲信号的生成及频率的调整。The PWM control circuit is composed of ARM microcontroller and peripheral protection circuit. Its functions: acquisition and calculation of current and voltage signals; generation of pulse width modulation signals; protection of abnormal arc discharge; generation of constant current, constant voltage and constant power characteristics, generation of pulse signals and adjustment of frequency.
本发明中脉冲溅射电源电压采样电路以及电流采样电路参见附图4-5,同时增加了过流及短路保护电路,参见附图6所示。In the present invention, the pulse sputtering power supply voltage sampling circuit and current sampling circuit are shown in Figures 4-5, and an overcurrent and short circuit protection circuit is added, as shown in Figure 6.
参见附图4所示为电压采样电路示意图。采样电压经电阻R11和R22分压后,进入电感L11和电容C11组成的低通滤波器,滤除高频干扰成分,后送入由运算放大器OA1、电阻R13和R14组成的比例放大电路进行阻抗变换,后送入光耦OI进行光电隔离,而后送入运算放大器OA2,进行阻抗变换,最后采样电压一路送入到ARM的模数转换部分,一路送到过流及短路保护电路。所述运算放大器可选为OP07、OP27、UA741集成芯片;所述光耦为线性光耦,可选为PC817A-C集成芯片。See Figure 4 for a schematic diagram of the voltage sampling circuit. After the sampling voltage is divided by resistors R11 and R22, it enters the low-pass filter composed of inductor L11 and capacitor C11 to filter out high-frequency interference components, and then sends it to the proportional amplification circuit composed of operational amplifier OA1, resistors R13 and R14 for impedance After conversion, it is sent to the optocoupler OI for photoelectric isolation, and then sent to the operational amplifier OA2 for impedance transformation. Finally, the sampling voltage is sent to the analog-to-digital conversion part of the ARM, and sent to the overcurrent and short circuit protection circuit all the way. The operational amplifier can be optional OP07, OP27, UA741 integrated chip; the optocoupler is a linear optocoupler, optional PC817A-C integrated chip.
参见附图5所示电流采样电路示意图。霍尔电流传感器LEM.A按一定比例输出取样电流值,而后送入由L1和C1组成的低通滤波器,滤除高频干扰成分,后送入运算放大器OA组成的电压跟随器进行阻抗变换,最后采样电流一路送入到ARM的模数转换部分,一路送到过流及短路保护电路。所述霍尔电流传感器型号优选为LEM45集成模块。Refer to the schematic diagram of the current sampling circuit shown in Fig. 5 . The Hall current sensor LEM.A outputs the sampling current value according to a certain ratio, and then sends it to the low-pass filter composed of L1 and C1 to filter out high-frequency interference components, and then sends it to the voltage follower composed of the operational amplifier OA for impedance transformation , and finally the sampling current is sent all the way to the analog-to-digital conversion part of the ARM, and all the way to the overcurrent and short circuit protection circuit. The model of the Hall current sensor is preferably a LEM45 integrated module.
参见附图6所示过流及短路保护电路示意图。电阻R21、R22和R25及电压比较器CP1组成电流比较电路,电阻R23、R24和R26及电压比较器CP2组成电压比较电路,timer集成电路为NE555,与R27、C22、C21共同组成单稳态电路其中2脚为触发端,3脚为输出端。Refer to the schematic diagram of the overcurrent and short circuit protection circuit shown in Fig. 6 . Resistors R21, R22 and R25 and voltage comparator CP1 form a current comparison circuit, resistors R23, R24 and R26 and voltage comparator CP2 form a voltage comparison circuit, timer integrated circuit is NE555, together with R27, C22 and C21 form a monostable circuit Among them, pin 2 is the trigger terminal, and pin 3 is the output terminal.
镀膜过程中气体放电由辉光放电转入弧光放电,电流会迅速升高,电压迅速降低,是镀膜工艺所不允许的,本发明采用双比较电路来实现过流及短路保护。所述比较电路优选为LM339芯片。During the coating process, the gas discharge changes from glow discharge to arc discharge, the current will rise rapidly, and the voltage will drop rapidly, which is not allowed by the coating process. The invention adopts a double comparator circuit to realize overcurrent and short circuit protection. The comparison circuit is preferably an LM339 chip.
当电流采样值超过设定值(由R21和R22分压值设定),电压比较器CP1输出低电平,与非门NAND输出高电平;当电压采样值低于设定值(由R23和R24分压值设定)也会使得与非门NAND输出高电平。若触发单稳态电路,输出高电平单脉冲信号,一路送入光电隔离,截止PWM控制信号传送;一路送入ARM中断端口,ARM执行中断程序,停止PWM控制信号的输出。实现了双重保护,达到迅速抑制弧光放电的目的,保护电源和靶材。When the current sampling value exceeds the set value (set by the voltage divider value of R21 and R22), the voltage comparator CP1 outputs a low level, and the NAND gate NAND outputs a high level; when the voltage sampling value is lower than the set value (set by R23 and R24 voltage divider setting) will also make the NAND gate NAND output high level. If the monostable circuit is triggered, a high-level single-pulse signal is output, one way is sent to the photoelectric isolation, and the PWM control signal transmission is stopped; one way is sent to the ARM interrupt port, and the ARM executes the interrupt program to stop the output of the PWM control signal. It realizes double protection, achieves the purpose of rapidly suppressing arc discharge, and protects power supply and target.
本实用新型特别强调:上述脉冲发生电路、电压采样电路、电流采样电路过流及其短路保护电路,是发明人经过多年研发并付出创造性的劳动设计出的经典电路,尤其是脉冲发生电路更是本发明人付出创造性的劳动获得的,通过上述电路的设计更好的保证了脉冲溅射电源的可靠性、动态特性好、成本低、控制简单可靠、具有能量回馈的优点。The utility model particularly emphasizes that the above-mentioned pulse generating circuit, voltage sampling circuit, current sampling circuit overcurrent and its short-circuit protection circuit are classic circuits designed by the inventor after years of research and development and creative labor, especially the pulse generating circuit. Obtained by the inventor's creative efforts, the design of the above circuit better ensures the reliability of the pulse sputtering power supply, good dynamic characteristics, low cost, simple and reliable control, and has the advantages of energy feedback.
此外,本实用新型还公开了一种脉冲溅射电源控制方法,该方法包括主模块、人机交互子模块、故障判断子模块、闭环控制子模块;所述闭环控制子模块进一步包括专家控制子模块;其中,所述主模块主要完成软启动、对外部数据的采集、闭环系统调节器的专家控制子模块、脉冲发生电路的形成、过压、过流、短路保护等工作。主模块主要包括故障判断子模块、中断检测子模块、计算子模块。In addition, the utility model also discloses a pulse sputtering power supply control method, which includes a main module, a human-computer interaction sub-module, a fault judgment sub-module, and a closed-loop control sub-module; the closed-loop control sub-module further includes an expert control sub-module module; wherein, the main module mainly completes the soft start, the acquisition of external data, the expert control sub-module of the closed-loop system regulator, the formation of the pulse generation circuit, overvoltage, overcurrent, short circuit protection and other work. The main module mainly includes a fault judgment sub-module, an interrupt detection sub-module, and a calculation sub-module.
其中所述故障判断子模块判断电源是否工作正常,如有故障,则进行故障处理,通过ARM嵌入式操作系统的A/D功能进行模数转换和算法来判断输入输出的值;通过专家控制子模块调整电源输出电压电流。Wherein said failure judging sub-module judges whether the power supply works normally, if there is a fault, then carry out fault handling, carry out analog-to-digital conversion and algorithm to judge the value of input and output by the A/D function of ARM embedded operating system; The module adjusts the output voltage and current of the power supply.
此外,闭环控制子模块可以包括PID控制子模块或模糊控制子模块。In addition, the closed-loop control sub-module may include a PID control sub-module or a fuzzy control sub-module.
其中图7为一个电压采样子程序流程图的实施例。在初始化过程中,先将ARM各个输入端口复位,初始化后,开中断程序,若有中断请求则响应,否则进行数据采集并读取参考值,然后进行数据处,输出相应控制,如果由欠压、过压、短路或过流情况发生,则进行故障处理。7 is an embodiment of a voltage sampling subroutine flow chart. In the initialization process, first reset each input port of ARM, after initialization, start the interrupt program, if there is an interrupt request, it will respond, otherwise, data acquisition and reference value will be read, and then the data will be processed, and the output will be controlled accordingly. , overvoltage, short circuit or overcurrent occurs, then carry out troubleshooting.
在以上的描述中阐述了很多具体细节以便于充分理解本实用新型。但是以上描述仅是本实用新型的较佳实施例而已,本发明能够以很多不同于在此描述的其它方式来实施,因此本实用新型不受上面公开的具体实施的限制。同时任何熟悉本领域技术人员在不脱离本发明技术方案范围情况下,都可利用上述揭示的方法和技术内容对本实用新型技术方案做出许多可能的变动和修饰,或修改为等同变化的等效实施例。凡是未脱离本发明技术方案的内容,依据本实用新型的技术实质对以上实施例所做的任何简单修改、等同变化及修饰,均仍属于本实用新型技术方案保护的范围内。In the above description, many specific details are set forth in order to fully understand the utility model. However, the above descriptions are only preferred embodiments of the present invention, and the present invention can be implemented in many other ways different from those described here, so the present invention is not limited by the specific implementations disclosed above. At the same time, any person skilled in the art can use the methods and technical content disclosed above to make many possible changes and modifications to the technical solution of the utility model without departing from the scope of the technical solution of the present invention, or modify it to be equivalent to the equivalent change. Example. All the content that does not deviate from the technical solution of the present invention, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present utility model still belong to the protection scope of the technical solution of the utility model.
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CN110855146A (en) * | 2019-11-13 | 2020-02-28 | 北京航空航天大学 | Large-current pulse type inductive energy storage power supply processor |
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CN110855146A (en) * | 2019-11-13 | 2020-02-28 | 北京航空航天大学 | Large-current pulse type inductive energy storage power supply processor |
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