CN204281587U - Ito glass etching soaking compartment - Google Patents
Ito glass etching soaking compartment Download PDFInfo
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- CN204281587U CN204281587U CN201420846060.0U CN201420846060U CN204281587U CN 204281587 U CN204281587 U CN 204281587U CN 201420846060 U CN201420846060 U CN 201420846060U CN 204281587 U CN204281587 U CN 204281587U
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- cell body
- pressing plate
- shower
- even pressing
- hole
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Abstract
The utility model relates to a kind of ito glass etching soaking compartment, it comprises outer cell body, interior cell body, many rotating shafts, be arranged on cycling mechanism, described rotating shaft forms overflow port respectively in both sides, described interior cell body top, the the second even pressing plate being provided with horizontally disposed first even pressing plate in described interior cell body and being arranged on above described first even pressing plate, described first even pressing plate is evenly equipped with multiple first through hole, described second even pressing plate is evenly equipped with multiple second through holes that diameter is less than described first through-hole diameter, below described first even pressing plate, multiple second shower is installed, the mouth spray of described second shower is bottom described interior cell body.On the one hand by arranging the second through hole on the second even pressing plate, the first even pressing plate arranges the first through hole, and the diameter of the second through hole is less than the first through hole; The mouth spray of the second shower bottom interior cell body, is conducive to improving etching liquid in interior cell body and keeps stable by another aspect like this, thus the homogeneity that raising etching liquid etches ito glass.
Description
Technical field
The utility model relates to a kind of soaking compartment, relates to a kind of ito glass etching soaking compartment particularly.
Background technology
At present, in flat pannel display industry, requirement about etching homogeneity in ito glass etching is very high, at present, conventional I TO etching system all adopts the etching mode of spray-type, namely arranges many groups in surface and waves jet pipe, and this kind of mode is respond well when using conventional etch liquid, and when using active stronger new-type etching liquid (as HCl), often produce serious etching uneven phenomenon.
Summary of the invention
The utility model object is that the uniform ito glass of a kind of etching etches soaking compartment in order to overcome the deficiencies in the prior art.
For achieving the above object, the technical solution adopted in the utility model is: a kind of ito glass etching soaking compartment, it comprises outer cell body, be arranged on the interior cell body in described outer cell body, to be arranged in described outer cell body and to be positioned at above described cell body and make its proal many rotating shafts for clamping ito glass, the cycling mechanism being arranged on multiple first shower above described rotating shaft and being connected with described interior cell body for importing etching liquid to described first shower, described rotating shaft forms overflow port respectively in both sides, described interior cell body top, the the second even pressing plate being provided with horizontally disposed first even pressing plate in described interior cell body and being arranged on above described first even pressing plate, described first even pressing plate is evenly equipped with multiple first through hole, described second even pressing plate is evenly equipped with multiple second through holes that diameter is less than described first through-hole diameter, below described first even pressing plate, multiple second shower is installed, the mouth spray of described second shower is bottom described interior cell body, described second shower is connected with described cycling mechanism.
Optimally, described cycling mechanism comprises container for storing liquid, is arranged on the multiple under meter between described container for storing liquid and described interior cell body and between described container for storing liquid and described second shower and the liquid pump for importing etching liquid to described first shower and described second shower.
Optimally, the angle formed towards the travel direction with described ito glass of described first shower mouth spray is greater than 90 °.
Optimally, the diameter of described first through hole is 3 ~ 6 millimeters, and the diameter of described second through hole is 0.5 ~ 2.5 millimeter.
Because technique scheme is used, the utility model compared with prior art has following advantages: the utility model ito glass etching soaking compartment, on the one hand by arranging the second through hole on the second even pressing plate, the first even pressing plate arranges the first through hole, and the diameter of the second through hole is less than the first through hole; The mouth spray of the second shower bottom interior cell body, is conducive to improving etching liquid in interior cell body and keeps stable by another aspect like this, thus the homogeneity that raising etching liquid etches ito glass.
Accompanying drawing explanation
Accompanying drawing 1 is the structural representation of the utility model ito glass etching soaking compartment;
Wherein, 1, etching soaking compartment; 11, outer cell body; 12, interior cell body; 13, the second even pressing plate; 131, the second through hole; 14, the first even pressing plate; 141, the first through hole; 15, rotating shaft; 16, overflow port; 17, cycling mechanism; 18, the first shower; 19, the second shower; 2, ito glass.
Embodiment
Below in conjunction with accompanying drawing, the utility model preferred embodiment is described in detail:
Ito glass etching soaking compartment 1 as shown in Figure 1, mainly comprises outer cell body 11, interior cell body 12, rotating shaft 15, second even pressing plate 13, first even pressing plate 14 and cycling mechanism 17.
Wherein, interior cell body 12 is arranged in outer cell body 11, and its apical side height is short in the apical side height of outer cell body 11.Rotating shaft 15 is arranged on the top of interior cell body 12 and is positioned at outer cell body 11, it forms two rows, for clamping ito glass 2, the horizontal forward motion of ito glass 2 (as etched direction shown in the arrow above soaking compartment 1 in Fig. 1) can be driven so upon its rotation; And they form overflow port 16 respectively in the both sides at interior cell body 12 top, the etching liquid of the superiors can be drained into outer cell body 11 from overflow port 16 in time, guarantee the concentration of etching liquid, be conducive to the homogeneity improving etching.First shower 18 has multiple, and they are arranged on the top of rotating shaft 15, for the upper surface spray etching liquid to ito glass 2; Second shower 19 also has multiple, they be arranged on the bottom of interior cell body 12 and mouth spray towards the bottom of interior cell body 12, the etching liquid speed sprayed via the second shower 19 so is greatly weakened thus is guaranteed the slow rising of etching liquid.Cycling mechanism 17 is connected with the second shower 19 with outer cell body 11, interior cell body 12, first shower 18 respectively, etching liquid is imported for the etching liquid collected in outer cell body 11 and interior cell body 12 to the first shower 18 and the second shower 19, thus achieve the circulation of etching liquid in etching soaking compartment 1, ensure the consistence of etching liquid concentration, be conducive to the homogeneity improving etching.First even pressing plate 14 and the second even pressing plate 13 to be installed in interior cell body 12 and to be horizontally disposed with, wherein the second even pressing plate 13 is arranged on the top of the first even pressing plate 14, first even pressing plate 14 is evenly equipped with multiple first through hole 141, second even pressing plate 13 is evenly equipped with multiple second through hole 131, the diameter of the second through hole 131 is less than the diameter of the first through hole 141, utilize two-layer even pressing plate can guarantee the stability of etching liquid further like this, improve the homogeneity that ito glass 2 etches.
In the present embodiment, cycling mechanism 17 mainly comprises container for storing liquid 172, under meter 171 and liquid pump 173.Container for storing liquid 172 is for storing the etching liquid imported via outer cell body 11 and interior cell body 12, and under meter 171 is arranged between container for storing liquid 172 and interior cell body 12 and between container for storing liquid 172 and the second shower 19, for monitoring the speed of circulation of etching liquid.Liquid pump 173 sprays 19 with container for storing liquid 172, first shower 18 and second respectively and is connected, for being imported by the etching liquid in container for storing liquid 172 in first shower 18 and the second shower 19.The angle formed towards the travel direction with ito glass 2 of the first shower 18 mouth spray is greater than 90 °, and namely the first shower 18 is reverse sprays etching liquid to ito glass 2.The diameter of the first through hole 141 is preferably 3 ~ 6 millimeters, and the diameter of the second through hole 131 is preferably 0.5 ~ 2.5 millimeter, guarantees the steady flow of etching liquid in interior cell body 12.
Above-described embodiment is only for illustrating technical conceive of the present utility model and feature; its object is to person skilled in the art can be understood content of the present utility model and implement according to this; protection domain of the present utility model can not be limited with this; all equivalences done according to the utility model spirit change or modify, and all should be encompassed within protection domain of the present utility model.
Claims (4)
1. an ito glass etching soaking compartment, it comprises outer cell body (11), be arranged on the interior cell body (12) in described outer cell body (11), to be arranged in described outer cell body (11) and to be positioned at described cell body (12) top and be used for clamping ito glass (2) and make its proal many rotating shaft (15), multiple first shower (18) being arranged on described rotating shaft (15) top and the cycling mechanism (17) be connected with described interior cell body (12) for importing etching liquid to described first shower (18), described rotating shaft (15) forms overflow port (16) respectively in described interior cell body (12) both sides, top, it is characterized in that: horizontally disposed first even pressing plate (14) is installed in described interior cell body (12) and is arranged on the second even pressing plate (13) of described first even pressing plate (14) top, described first even pressing plate (14) is evenly equipped with multiple first through hole (141), described second even pressing plate (13) is evenly equipped with multiple second through holes (131) that diameter is less than described first through hole (141) diameter, described first even pressing plate (14) below is provided with multiple second shower (19), the mouth spray of described second shower (19) is towards described interior cell body (12) bottom, described second shower (19) is connected with described cycling mechanism (17).
2. ito glass etching soaking compartment according to claim 1, is characterized in that: described cycling mechanism (17) comprises container for storing liquid (172), is arranged on the multiple under meters (171) between described container for storing liquid (172) and described interior cell body (12) and between described container for storing liquid (172) and described second shower (19) and the liquid pump (173) for importing etching liquid to described first shower (18) and described second shower (19).
3. ito glass according to claim 1 etching soaking compartment, is characterized in that: the angle formed towards the travel direction with described ito glass (2) of described first shower (18) mouth spray is greater than 90 °.
4. ito glass etching soaking compartment according to claim 1, it is characterized in that: the diameter of described first through hole (141) is 3 ~ 6 millimeters, the diameter of described second through hole (131) is 0.5 ~ 2.5 millimeter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420846060.0U CN204281587U (en) | 2014-12-26 | 2014-12-26 | Ito glass etching soaking compartment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420846060.0U CN204281587U (en) | 2014-12-26 | 2014-12-26 | Ito glass etching soaking compartment |
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| Publication Number | Publication Date |
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| CN204281587U true CN204281587U (en) | 2015-04-22 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201420846060.0U Active CN204281587U (en) | 2014-12-26 | 2014-12-26 | Ito glass etching soaking compartment |
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| CN (1) | CN204281587U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110078381A (en) * | 2019-05-05 | 2019-08-02 | 蚌埠市羚旺新工艺材料研发科技有限公司 | A kind of spraying glass substrate attenuation line |
| CN112479585A (en) * | 2020-12-01 | 2021-03-12 | 中国工程物理研究院激光聚变研究中心 | Prefabricated rod processing system and method |
-
2014
- 2014-12-26 CN CN201420846060.0U patent/CN204281587U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110078381A (en) * | 2019-05-05 | 2019-08-02 | 蚌埠市羚旺新工艺材料研发科技有限公司 | A kind of spraying glass substrate attenuation line |
| CN112479585A (en) * | 2020-12-01 | 2021-03-12 | 中国工程物理研究院激光聚变研究中心 | Prefabricated rod processing system and method |
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