CN204259880U - A kind of double-layer nasal mask hermetically-sealed construction - Google Patents
A kind of double-layer nasal mask hermetically-sealed construction Download PDFInfo
- Publication number
- CN204259880U CN204259880U CN201420536924.9U CN201420536924U CN204259880U CN 204259880 U CN204259880 U CN 204259880U CN 201420536924 U CN201420536924 U CN 201420536924U CN 204259880 U CN204259880 U CN 204259880U
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- Prior art keywords
- layer
- double
- sealed construction
- nasal mask
- construction according
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- Expired - Fee Related
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- 238000010276 construction Methods 0.000 title claims abstract description 17
- 238000007789 sealing Methods 0.000 claims abstract description 38
- 206010028748 Nasal obstruction Diseases 0.000 claims abstract description 10
- 238000010030 laminating Methods 0.000 claims abstract description 8
- 239000011324 bead Substances 0.000 claims abstract description 5
- 239000000084 colloidal system Substances 0.000 claims abstract description 4
- 230000008570 general process Effects 0.000 claims abstract description 4
- 239000007787 solid Substances 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 239000000741 silica gel Substances 0.000 claims description 4
- 229910002027 silica gel Inorganic materials 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000499 gel Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 210000000080 chela (arthropods) Anatomy 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
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- Respiratory Apparatuses And Protective Means (AREA)
Abstract
The utility model proposes a kind of double-layer nasal mask hermetically-sealed construction, for nasal obstruction, comprise the sealing framework and double-layer seal bar that are installed together; Described double-layer seal bar comprises the outside supporting layer of solid shape and the laminating layer of inner side and human contact.Described sealing framework is provided with multiple seep through aperture, and the general process for filling colloid of described double-layer seal bar is through seep through keyhole formation fitting tight bead structure.Described supporting layer interlude and bridge of the nose joint place are provided with fracture.The utility model adopts double layer design, and wearing comfort is good, and sealing is strong, and can change, and can be applicable to various nasal obstruction cover body.
Description
Technical field
The utility model relates to medical care articles for use field, particularly a kind of double-layer nasal mask hermetically-sealed construction.
Background technology
Existing correlation technique, for isolated human body mouth and nose place and extraneous gas or liquid and design, nose cup, face shield or mouth mask are provided with a sealing strip, sealing bar has individual layer silica gel, PVC(soft plastic material) or the pincers bar that is hidden in mouth mask internal edge make, utilize silica gel, PVC(soft plastic material) or soft distortion and the human body mouth and nose place of pincers bar seal, attempt solution human body mouth and nose place and ambient atmos or liquid isolating problem.
, all there is some problem following, be necessary the demand improved in this class nose cup, face shield or mouth mask:
1: when user wears, comfortableness is poor, wear by force on rear skin and easily leave impression.
2: wear sealing after using poor, can not combine closely with human body face, nasion portion easily forms gap and leaks gas.
3: sealing strip can not be separated with cavity or cavity, can not change and continue to use as sealing strip or cavity damage.
4: different crowd uses to be needed to change the sealing strip of different model, and model can not meet, and everyone is applicable.
Utility model content
Based on the deficiencies in the prior art, problem to be solved in the utility model is to provide a kind of double-layer nasal mask hermetically-sealed construction, its comfortable wearing, and highly versatile really can reach again the effect of human body mouth and nose place and extraneous seal isolation simultaneously.
For solving the problems of the technologies described above, the utility model provides a kind of double-layer nasal mask hermetically-sealed construction, for nasal obstruction, comprises the sealing framework and double-layer seal bar that are installed together; Described double-layer seal bar comprises the outside supporting layer of solid shape and the laminating layer of inner side and human contact.
Further improvement as technique scheme:
Described sealing framework is provided with multiple seep through aperture, and the general process for filling colloid of described double-layer seal bar is through seep through keyhole formation fitting tight bead structure.This penetration aperture be conducive to liquid-state silicon gel fill with bag time penetrating sealing and related fix, utilize needle valve liquid-state silicon gel forming technique to be made into the hard sealing nose cup of Soft Roll or face shield.Fitting tight lip, when described fitting tight lip is liquid-state silicon gel filling bag sealing framework, penetrate according to design forming inner sealing lip after sealing framework perisporium medial small hole, this sealing lip is used for sealing the gap between double-layer nasal mask sealing strip and fixed support or other cavity body structure.
Described supporting layer interlude and bridge of the nose joint place are provided with fracture.This structure solves the sealing difficult problem that different people bridge of the nose height difference is brought, and ensures the sealing effectiveness after wearing.
Described double-layer seal bar appearance profile relies on eye face and the configuration design of nasion portion, reaches and wears the comfortable object of laminating.
Described sealing framework is provided with clip, and the cavity of described nasal obstruction is installed fixing by described clip and described sealing framework, and therefore the utility model adaptively can change different nasal obstruction cavitys.
Described sealing framework is PC, ABS, PA, PP, PS or other hard plastics.
Described double-layer seal bar is flexibility Medical liquid-state 40-60 ° of silica gel material.
The thickness of described laminating layer is 0.5-0.75mm, ensures the comfort level of wearer.
The thickness of described supporting layer is 0.3-0.45mm, ensure user wear after sealing effectiveness.
The disconnection spacing of described fracture, for being 13-15mm, ensure that comfortableness and the sealing at bridge of the nose place.
The utility model adopts double layer design, and wearing comfort is good, and sealing is strong, and can change, and can be applicable to various nasal obstruction cover body.
Describe the utility model in detail below in conjunction with accompanying drawing, it illustrates principle of the present utility model as the part of this description by embodiment, and other aspects of the present utility model, feature and advantage thereof will become very clear by this detailed description.
Accompanying drawing explanation
The accompanying drawing forming a part of the present utility model is used to provide further understanding of the present utility model, and schematic description and description of the present utility model, for explaining the utility model, is not formed improper restriction of the present utility model.
Fig. 1 is the structural representation of the utility model when installing together with cavity 3;
Fig. 2 is the utility model structural blast schematic diagram;
Fig. 3 is the top view of sealing framework 1 in Fig. 2;
Fig. 4 is the top view of double-layer seal bar 2 in Fig. 2;
Fig. 5 is fracture 7 detailed schematic;
Fig. 6 is the details enlarged diagram of Fig. 5;
Fig. 7 is two-level architecture detailed schematic;
Fig. 8 is the details enlarged diagram of Fig. 7.
In Fig. 1-8, the corresponding relation of Reference numeral is:
1-sealing framework; 2-double-layer seal bar; 3-cavity; 4-clip; 5-seep through aperture; 6-supporting layer; 7-fracture; 8-laminating layer; 9-fitting tight bead structure;
Detailed description of the invention
It should be noted that, when not conflicting, the embodiment in the utility model and the feature in embodiment can combine mutually.Below with reference to the accompanying drawings and describe the utility model in detail in conjunction with the embodiments.For sake of convenience, hereinafter as occur " on ", D score, "left", "right" printed words, only represent consistent with the direction, upper and lower, left and right of accompanying drawing itself, restriction effect is not played to structure.
As shown in figures 1-8, the double-layer nasal mask hermetically-sealed construction of the present embodiment, for nasal obstruction, comprises the sealing framework 1 and double-layer seal bar 2 that are installed together; Double-layer seal bar 2 comprises the outside supporting layer 6 of solid shape and the laminating layer 8 of inner side and human contact.Sealing framework 1 is provided with multiple seep through aperture 5, and the general process for filling colloid of double-layer seal bar 2 forms fitting tight bead structure 9 through seep through aperture 5.Supporting layer 6 interlude and bridge of the nose joint place are provided with fracture 7.Double-layer seal bar 2 appearance profile relies on eye face and the configuration design of nasion portion.Sealing framework 1 is provided with clip 4, and the cavity 3 of nasal obstruction is installed fixing by clip 4 and sealing framework 1.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all within spirit of the present utility model and principle, any amendment done, equivalent replacement, improvement etc., all should be included within protection domain of the present utility model.
Claims (10)
1. a double-layer nasal mask hermetically-sealed construction, for nasal obstruction, is characterized in that: comprise the sealing framework (1) and double-layer seal bar (2) that are installed together; Described double-layer seal bar (2) comprises the outside supporting layer (6) of solid shape and the laminating layer (8) of inner side and human contact.
2. double-layer nasal mask hermetically-sealed construction according to claim 1, it is characterized in that: described sealing framework (1) is provided with multiple seep through aperture (5), the general process for filling colloid of described double-layer seal bar (2) forms fitting tight bead structure (9) through seep through aperture (5).
3. double-layer nasal mask hermetically-sealed construction according to claim 1, is characterized in that: described supporting layer (6) interlude and bridge of the nose joint place are provided with fracture (7).
4. double-layer nasal mask hermetically-sealed construction according to claim 1, is characterized in that: described double-layer seal bar (2) appearance profile relies on eye face and the configuration design of nasion portion.
5. double-layer nasal mask hermetically-sealed construction according to claim 1, is characterized in that: described sealing framework (1) is provided with clip (4), and the cavity (3) of described nasal obstruction is installed fixing by described clip (4) and described sealing framework (1).
6. double-layer nasal mask hermetically-sealed construction according to claim 1, is characterized in that: described sealing framework (1) is PC, ABS, PA, PP, PS or other hard plastics.
7. double-layer nasal mask hermetically-sealed construction according to claim 1, is characterized in that: described double-layer seal bar (2) is flexibility Medical liquid-state 40-60 ° of silica gel material.
8. double-layer nasal mask hermetically-sealed construction according to claim 1, is characterized in that: the thickness of described laminating layer (8) is 0.5-0.75mm.
9. double-layer nasal mask hermetically-sealed construction according to claim 1, is characterized in that: the thickness of described supporting layer (6) is 0.3-0.45mm.
10. double-layer nasal mask hermetically-sealed construction according to claim 3, is characterized in that: the disconnection spacing of described fracture (7) is for being 13-15mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420536924.9U CN204259880U (en) | 2014-09-18 | 2014-09-18 | A kind of double-layer nasal mask hermetically-sealed construction |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420536924.9U CN204259880U (en) | 2014-09-18 | 2014-09-18 | A kind of double-layer nasal mask hermetically-sealed construction |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204259880U true CN204259880U (en) | 2015-04-15 |
Family
ID=52794796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420536924.9U Expired - Fee Related CN204259880U (en) | 2014-09-18 | 2014-09-18 | A kind of double-layer nasal mask hermetically-sealed construction |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204259880U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108477702A (en) * | 2018-05-28 | 2018-09-04 | 东莞市利巨硅胶制品有限公司 | It is a kind of to increase the edge sealing silica gel sealing ring of mask |
| CN111557504A (en) * | 2020-05-23 | 2020-08-21 | 陈经汉 | Mask for summer |
-
2014
- 2014-09-18 CN CN201420536924.9U patent/CN204259880U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108477702A (en) * | 2018-05-28 | 2018-09-04 | 东莞市利巨硅胶制品有限公司 | It is a kind of to increase the edge sealing silica gel sealing ring of mask |
| CN111557504A (en) * | 2020-05-23 | 2020-08-21 | 陈经汉 | Mask for summer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170919 Address after: 518122 Guangdong province Shenzhen City Pingshan Kengzi office Longtian community Yingzhan Industrial Park building B5 North Building Patentee after: SHENZHEN XNUO ZHIZAO MEDICAL CO.,LTD. Address before: 518122 Guangdong province Shenzhen City Pingshan Kengzi streets Yingzhan Industrial Park building B5a Shenzhen joieya Electric Appliance Co., Ltd. Co-patentee before: Shoh Patentee before: Xiao Yongchu |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20210225 Address after: 518118 h3105, phase I, Liuhe Commercial Plaza, 168 Shenshan Road (Pingshan section), Liulian community, Pingshan street, Pingshan District, Shenzhen City, Guangdong Province Patentee after: Xinnuo (Shenzhen) Health Medical Technology Co.,Ltd. Address before: 518122 1st floor, north of building B5, Yingzhan Industrial Park, Longtian community, Kengzi office, Pingshan New District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN XNUO ZHIZAO MEDICAL Co.,Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150415 |