CN204229372U - Touch control display apparatus - Google Patents
Touch control display apparatus Download PDFInfo
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- CN204229372U CN204229372U CN201420664048.8U CN201420664048U CN204229372U CN 204229372 U CN204229372 U CN 204229372U CN 201420664048 U CN201420664048 U CN 201420664048U CN 204229372 U CN204229372 U CN 204229372U
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Abstract
The utility model relates to a kind of touch control display apparatus, and it comprises a transparency carrier, a display module and one first sensing electrode layer.This transparency carrier has a first surface and a second surface, and this first surface and this second surface are positioned at the opposition side of this transparency carrier.This display module is positioned at the first surface side of this transparency carrier.This first sensing electrode layer then between this transparency carrier and this display module, and comprises one first layer of nanomaterial.This first layer of nanomaterial has multiple first area and multiple second area, and with described second area electrical isolation between described first area, and the difference of haze value between described first area and described second area is not more than 0.1%.
Description
Technical field
The utility model relates to conductive film field, particularly a kind of touch control display apparatus.
Background technology
Contact panel (touch panel) or Touch Screen (touch screen) are widely used in electronic installation gradually, particularly Portable or portable electric device, such as personal digital assistant (PDA) or mobile phone.In many contact panels, tin indium oxide (indium tin oxide; ITO) be still main transparent conductive material.Be no matter because ITO conductive film has shortcoming (such as matter crisp, inflexible) or wants to reduce costs, the equivalent material of seeking ITO conductive film is one of important development projects of touch-control industry always.Nano-level conducting film, such as Nano Silver (silver nanowire; SNW) transparent conductive film, because possessing the advantage of excellent electric conductivity with optics penetrance and on dark tool cost, becomes one of option of replacement ITO conductive film then.
In some existing manufacture method, be use wet etching to define the electrical specification of Nano Silver transparent conductive film.Nano Silver transparent conductive film has a protective seam, in order to fixing Nano Silver coating on substrate, and protects Nano Silver coating to make it be not easy to occur to be oxidized or sulfuration with the environmental molecules in air.But also because of the reason of protective seam, what make etching solution contact with Nano Silver may obviously reduce, thus cause that etching is uneven, the situation such as haze change is excessive before and after etching difficulty and etching.In addition, after etching manufacture method, because etching solution has the possibility residued among material, the loss of the electrical continuation of follow-up Nano Silver transparent conductive film can be caused.
In addition, be with dry ecthing to define the electrical specification of Nano Silver transparent conductive film in some existing manufacture method, such as, carry out etching of nano silver transparent conductive film with particle hits under vacuum.But these dry ecthing manufacture methods cannot effective reservation protection layer, makes the electrical specification of Nano Silver transparent conductive film suffer larger risk.
Known through above-mentioned explanation, how effectively changing the electrical specification of nano-level conducting film, and maintain its optical characteristics such as optics penetrance or mist degree simultaneously, is the required problems inquired into of those skilled in the art.
Utility model content
In view of this; the purpose of this utility model is to propose a kind of contactor control device with nano-level conducting film; effective etch effect can be reached to define the electrical specification of nano-level conducting film, and effectively reduce the loss of protective seam and maintain the optical characteristics of nano-level conducting film.
For reaching above-mentioned purpose, the utility model provides a kind of touch control display apparatus, comprising: a transparency carrier, has a first surface and a second surface, and this first surface and this second surface are positioned at the opposition side of this transparency carrier; One display module, is positioned at the first surface side of this transparency carrier; And one first sensing electrode layer, between this transparency carrier and this display module, this the first sensing electrode layer comprises one first layer of nanomaterial, this first layer of nanomaterial has multiple first area and multiple second area, with described second area electrical isolation between described first area, and the difference of haze value between described first area and described second area is not more than 0.1%.
In embodiment of the present utility model, this first sensing electrode layer is arranged on the first surface of this transparency carrier, and described first area comprises spaced first sensing electrode and the second sensing electrode.
In embodiment of the present utility model, also comprise one first loading plate, in order to carry this first sensing electrode layer between this transparency carrier and this display module, and described first area comprises spaced first sensing electrode and the second sensing electrode.
In embodiment of the present utility model, also comprise one first loading plate and one second sensing electrode layer, this first loading plate is between this transparency carrier and this display module, wherein this first sensing electrode layer is arranged on a first surface of this first loading plate, this the second sensing electrode layer is arranged on a second surface of this first loading plate, and this first surface and this second surface are positioned at the opposition side of this first loading plate.
In embodiment of the present utility model, this the second sensing electrode layer comprises one second layer of nanomaterial, this second layer of nanomaterial has multiple first area and multiple second area, with described second area electrical isolation between described first area, and the difference of haze value between the described first area of this second layer of nanomaterial and described second area is not more than 0.1%.
In embodiment of the present utility model, the described first area of this first sensing electrode layer comprises the first sensing electrode along a first direction arrangement, and the described first area of this second sensing electrode layer comprises the second sensing electrode along a second direction arrangement.
In embodiment of the present utility model, also comprise one first loading plate and one second sensing electrode layer, this first loading plate is between this transparency carrier and this display module, wherein this first sensing electrode layer is arranged on the first surface of this transparency carrier, and this second sensing electrode layer is between this first sensing electrode layer and this first loading plate and be arranged on this first loading plate.
In embodiment of the present utility model, this the second sensing electrode layer comprises one second layer of nanomaterial, this second layer of nanomaterial has multiple first area and multiple second area, with described second area electrical isolation between described first area, and the difference of haze value between the described first area of this second layer of nanomaterial and described second area is not more than 0.1%.
In embodiment of the present utility model, the described first area of this first sensing electrode layer comprises the first sensing electrode along a first direction arrangement, and the described first area of this second sensing electrode layer comprises the second sensing electrode along a second direction arrangement.
The method of nano-level conducting film is made in embodiment of the present utility model, comprise: a nanometer base material is provided, one first layer of nanomaterial that this nanometer base material has a substrate, one first protective seam in the side of this substrate and is stacked between this substrate and this first protective seam; Form one first patterned insulation layer on this first protective seam, this first patterned insulation layer exposes this first protective seam of part, and this first layer of nanomaterial is divided into by multiple first area of this first patterned insulation layer institute shade and not by multiple second areas of this first patterned insulation layer institute shade; And this nanometer base material is etched with this first patterned insulation layer for cover curtain in a current generating system, to make described in this first layer of nanomaterial between first area with described second area electrical isolation.
In embodiment of the present utility model, the difference of the haze value described in this first layer of nanomaterial between first area and described second area is not more than 0.1%.
In embodiment of the present utility model, the nanometer base material that wherein etching has this first patterned insulation layer comprises and passes into air, nitrogen or its combination using as reacting gas.
In embodiment of the present utility model, this current generating system comprises one of a dielectric barrier discharge current generating system and an arc spraying formula current generating system.
In embodiment of the present utility model, this first layer of nanomaterial comprises nano-silver thread.
In embodiment of the present utility model, this first patterned insulation layer comprises the material that optical characteristics and this first layer of nanomaterial match.
In embodiment of the present utility model, this nanometer base material also has in one second protective seam of the opposite side of this substrate and one second layer of nanomaterial that is stacked between this substrate and this second protective seam, the method also comprises: form one second patterned insulation layer on this second protective seam, this second patterned insulation layer exposes this second protective seam of part, and this second layer of nanomaterial is divided into by multiple first area of this second patterned insulation layer institute shade and not by multiple second areas of this second patterned insulation layer institute shade; And etching has the nanometer base material of this second patterned insulation layer in a current generating system, to make described in this second layer of nanomaterial between first area with described second area electrical isolation.
In embodiment of the present utility model, the difference of the haze value described in this second layer of nanomaterial between first area and described second area is not more than 0.1%.
The another kind of method making nano-level conducting film in embodiment of the present utility model, comprise: a nanometer base material is provided, one first layer of nanomaterial that this nanometer base material has a substrate, one first protective seam in the side of this substrate and is stacked between this substrate and this first protective seam, this first layer of nanomaterial is divided into multiple first area and multiple second area; And in an arc spraying formula current generating system, etch the described second area of this first layer of nanomaterial in this nanometer base material, to make described in this first layer of nanomaterial between first area with described second area electrical isolation.
In embodiment of the present utility model, the difference of the haze value described in this first layer of nanomaterial between first area and described second area is not more than 0.1%.
In embodiment of the present utility model, wherein etch this nanometer base material and comprise and pass into air, nitrogen or its combination using as reacting gas.
In embodiment of the present utility model, this first layer of nanomaterial comprises nano-silver thread.
In embodiment of the present utility model, this first patterned insulation layer comprises the material that optical characteristics and this first layer of nanomaterial match.
In embodiment of the present utility model; this nanometer base material also has in one second protective seam of the opposite side of this substrate and one second layer of nanomaterial that is stacked between this substrate and this second protective seam; this second layer of nanomaterial is divided into multiple first area and multiple second area; the method also comprises: in an injecting type current generating system; described second area according to this second layer of nanomaterial etches this nanometer base material, to make described in this second layer of nanomaterial between first area with described second area electrical isolation.
In embodiment of the present utility model, the difference of the haze value described in this second layer of nanomaterial between first area and described second area is not more than 0.1%.
The beneficial effects of the utility model are: the utility model can reach effective etch effect to define the electrical specification of nano-level conducting film, and effectively reduce the loss of protective seam and maintain the optical characteristics of nano-level conducting film.In addition, the method for making of the nano-level conducting film in the utility model, compared with some existing manufacture method, can significantly shorten the manufacture method time.In addition, according to the nano-level conducting film in the utility model method for making prepared by nano-level conducting film because optical appearance before and after etch processes is without obvious change, have higher potentiality by circuit hide and improving optical taste.
Technology contents of the present utility model and technical characterstic have disclosed as above, but the utility model art technician should be appreciated that, in the utility model spirit and scope that the interest field do not deviated from listed by appending claims defines, teaching of the present utility model and announcement can do all replacements and modification.Such as, the structure that the many elements disclosed above can be different is implemented or is replaced with the structure of other identical function, or adopts it to combine.
Accompanying drawing explanation
The aforesaid content of the utility model and when to be hereafter described in detail in each accompanying drawing to read when can be easier to understand.For reaching illustration purpose of the present utility model, in each accompanying drawing, figure is painted with existing genus preferably each specific embodiment.But the utility model is not limited to painted accurate row puts mode and apparatus, this point should be understood.
Figure 1A ~ 1D is the method for making schematic diagram of the nano-level conducting film according to an embodiment of the present utility model.
Fig. 2 A ~ 2D is the method for making schematic diagram of the nano-level conducting film according to embodiment of the present utility model.
Fig. 3 A ~ 3D is the method for making schematic diagram of the nano-level conducting film according to another embodiment of the present utility model.
Fig. 4 A and 4B is the method for making schematic diagram of the nano-level conducting film according to another embodiment of the present utility model.
Fig. 5 A and 5B is the method for making schematic diagram of the nano-level conducting film according to an embodiment more of the present utility model.
For the nano-level conducting film prepared by the method for making of the utility model one embodiment, it etches forward and backward haze value to Fig. 6.
Fig. 7 A and 7B is the optical appearance schematic diagram of the nano-level conducting film prepared by art methods.
Fig. 8 A and 8B is the optical appearance schematic diagram of the nano-level conducting film prepared by the method for making of the utility model one embodiment.
Fig. 9 is the diagrammatic cross-section of the touch control display apparatus according to an embodiment of the present utility model.
Figure 10 is the diagrammatic cross-section of the touch control display apparatus according to another embodiment of the present utility model.
Figure 11 is the diagrammatic cross-section of the touch control display apparatus according to another embodiment of the present utility model.
Figure 12 is the diagrammatic cross-section of the touch control display apparatus according to an embodiment of the present utility model.
Figure 13 is the diagrammatic cross-section of the touch control display apparatus according to another embodiment of the present utility model.
Critical piece symbol description:
10 nanometer base materials
11 substrates
12 first layer of nanomaterial
13 first protective seams
14 first patterned insulation layers
15 current generating systems
16 electrodes
17 shower nozzles
20 nano-level conducting films
22 second layer of nanomaterial
23 second protective seams
24 second patterned insulation layers
25 current generating systems
26 electrodes
27 shower nozzles
28 nanometer base materials
30 nano-level conducting films
40 nano-level conducting films
50 nano-level conducting films
60 contact panels
66 display modules
70 contact panels
71 transparency carriers
72 first loading plates
73 second loading plates
75 shielding layers
80 contact panels
81 first adhesive coatings
82 second adhesive coatings
83 the 3rd adhesive coatings
90 contact panels
91 first sensing electrode layers
92 second sensing electrode layers
100 contact panels
110 touch control display apparatus
120 touch control display apparatus
121 first areas
122 second areas
130 touch control display apparatus
140 touch control display apparatus
150 touch control display apparatus
221 first areas
222 second areas
321 first areas
322 second areas
421 first areas
422 second areas
711 first surfaces
712 second surfaces.
Embodiment
Figure 1A ~ 1D is depicted as the method for making schematic diagram of the nano-level conducting film according to an embodiment of the present utility model.Please refer to Figure 1A, the method for making of the present embodiment first provides a nanometer base material 10.One first layer of nanomaterial 12 that nanometer base material 10 has a substrate 11, one first protective seam 13 in the side of substrate 11 and is stacked between substrate 11 and the first protective seam 13.In an embodiment of the present utility model, substrate 11 can be selected from the material of soft, printing opacity as polyethylene terephthalate (PET), and the first protective seam 13 then can select material that is organic, porous.In addition, the first layer of nanomaterial 12 comprises nano-silver thread, and making wire diameter be down to below 100 nanometers (nm) by nanometer becomes wire rod network, and such as 200 microns (um) is long, 50nm wire diameter, makes its length breadth ratio be about 4000.Because silver has superior electric conductivity, exceed more than 100 times than tin indium oxide (ITO), therefore provide than ITO reaction velocity faster.By controlling the distribution density of nano-silver thread, penetrance can reach more than 92%, makes it reach the high and effect of conductive path of penetrance.In other embodiments of the present utility model, the first layer of nanomaterial 12 comprises one of metals such as gold (Au), palladium (Pd), platinum (Pt), copper (Cu), nickel (Ni) or other nanometer wire rods be applicable to.
Please refer to Figure 1B, the first protective seam 13 such as forms an insulation course with coating method, and by printing, development, transfer printing to form one first patterned insulation layer 14.First patterned insulation layer 14 exposes the first protective seam 13 of part, and the first layer of nanomaterial 12 is divided into by multiple first areas 121 of the first patterned insulation layer 14 shades and not by multiple second areas 122 of the first patterned insulation layer 14 shades.In an embodiment of the present utility model, the material of the first patterned insulation layer 14 comprises polyimide (polyimide; PI).In another embodiment of the present utility model, the first patterned insulation layer 14 comprises the material that optical characteristics and the first layer of nanomaterial 12 match.With regard to optical characteristics, the optical index of the first patterned insulation layer 14 is 1.7 ~ 1.8.In addition, the first patterned insulation layer 14 can be organic material, and its optical index is 1.4 ~ 1.5.
Please refer to Fig. 1 C, again in a current generating system (current generation system) 15, give etching of nano base material 10 with the first patterned insulation layer 14 for cover curtain, to make described in the first layer of nanomaterial 12 between first area 121 with described second area 122 electrical isolation.In an embodiment of the present utility model, current generating system 15 comprises a dielectric barrier discharge current generating system or an arc spraying formula (arc jet) current generating system.
Current generating system is a kind of high voltage, the voltage being such as greater than 6000 volts (V), is added on the electrode of particular design, and passes into appropriate clean dry air (clean dry air; Or nitrogen (N CDA)
2) as reacting gas, utilize the one mechanism of the principle of high-voltage discharge and generation current.Compared to the vacuum type particle hits system in past, current generating system because not needing vacuum cavity, therefore can significantly shorten the manufacture method time, also reduces costs simultaneously.Also because in atmospheric environment; electric current can be subject to the obstruction of air Middle molecule and shorten mean free path; therefore etch effect will be very limited; such as only treatment surface impurity (particle); cannot produce the material structure of etch target and destroy all sidedly, so can the injury of the first protective seam 13 is down to minimum.In addition, the nano metal line in the first layer of nanomaterial 12, such as nano-silver thread, can make because of high-tension energy outer-shell electron unstable, again because of the generation with heat, and then make nano metal thread breakage.Because the electric current in air can flow toward the direction that resistance is lower, therefore not by the first patterned insulation layer 14 the Nano Silver structure of second area 122 of covering can be lost electric conductivity by current disrupts, but the Nano Silver structure of first area 121 be subject to the first patterned insulation layer 14 cover can not destroy by electric current and keep original electric conductivity.Therefore the first patterned insulation layer 14 can be any insulating material.The method of the utility model embodiment can reach effective etch effect to define the electrical specification of the first layer of nanomaterial 12, makes first area 121 keep electric conductivity and makes second area 122 lose electric conductivity.Effectively can reduce the loss of the first protective seam 13 in addition and maintain the optical characteristics of nanometer base material 10.
Please refer to Fig. 1 D, the first patterned insulation layer 14 is removed and reaches a nano-level conducting film 20.But in an embodiment of the present utility model; because the first patterned insulation layer 14 comprises the material that optical characteristics and the first layer of nanomaterial 12 match; therefore without the need to removing the first patterned insulation layer 14, so can reduce this and removing the risk that process may injure the first protective seam 13.Nano-level conducting film 20 can be used as the sensing electrode layer of touch control display apparatus.
Fig. 2 A ~ 2D is depicted as according to embodiment of the present utility model, the method for making schematic diagram of nano-level conducting film.Please refer to Fig. 2 A, is such as form an insulation course with coating method on the first protective seam 13 of nanometer base material 10, and by printing, development, transfer printing to form one first patterned insulation layer 14.In the present embodiment, the first patterned insulation layer 14 comprises multiple strip, insulator spaced apart.But in other embodiments of the present utility model, the insulator of the first patterned insulation layer 14 can be other shapes be applicable to, such as, with the triangle or trapezoidal of wedge shaped pattern arrangement.
Please refer to Fig. 2 B, in a current generating system 15, with the first patterned insulation layer 14 for cover curtain gives etching first layer of nanomaterial 12.In the present embodiment, be in a dielectric barrier discharge current generating system, under electrode 16 acts on, etch the first layer of nanomaterial 12 along a predetermined direction (as shown by arrows).But in another embodiment of the present utility model, please refer to Fig. 2 C, in an arc spraying formula (arc jet) current generating system, be cover curtain with the first patterned insulation layer 14, utilize a shower nozzle 17 to etch the first layer of nanomaterial 12 along a predefined paths (as shown by arrows).
Please refer to Fig. 2 D, the first patterned insulation layer 14 is removed and reaches a nano-level conducting film 20.But in an embodiment of the present utility model; because the first patterned insulation layer 14 comprises the material that optical characteristics and the first layer of nanomaterial 12 match; therefore without the need to removing the first patterned insulation layer 14, so can reduce this and removing the risk that process may injure the first protective seam 13.First layer of nanomaterial 12 of nano-level conducting film 20 is divided into multiple first area 121 and multiple second area 122.First area 121 in the etching process of Fig. 2 B or Fig. 2 C by the first patterned insulation layer 14 shades, second area 122, then not by the first patterned insulation layer 14 shades, to make after etching between first area 121 described in the first layer of nanomaterial 12 with described second area 122 electrical isolation.
Fig. 3 A ~ 3D is depicted as the method for making schematic diagram of the nano-level conducting film according to another embodiment of the present utility model.Please refer to Fig. 3 A, the method for making of the present embodiment first provides a nanometer base material 28.Nanometer base material 28 has a substrate 11, one first protective seam 13 in the side of substrate 11, is stacked on one first layer of nanomaterial 12 between substrate 11 and the first protective seam 13, in one second protective seam 23 of the opposite side of substrate 11 and one second layer of nanomaterial 22 that is stacked between substrate 11 and the second protective seam 23.In an embodiment of the present utility model, the material of the second protective seam 23 and the second layer of nanomaterial 22 and structure are identical or similar to the first protective seam 13 and the first layer of nanomaterial 12 respectively, separately do not go to live in the household of one's in-laws on getting married chat at this.
Thereafter; first protective seam 13 and the second protective seam 23 of nanometer base material 28 such as form an insulation course with coating method, and by printing, development, transfer printing with formed respectively the first patterned insulation layer 14 on the first protective seam 13 and one second patterned insulation layer 24 on the second protective seam 23.In an embodiment of the present utility model, the material of the second patterned insulation layer 24 and optical characteristics are identical or similar to the first patterned insulation layer 14, separately do not go to live in the household of one's in-laws on getting married chat at this.
Please refer to Fig. 3 B, in a current generating system 15, with the first patterned insulation layer 14 for cover curtain gives etching first layer of nanomaterial 12, and simultaneously in another current generating system 25, a such as dielectric barrier discharge current generating system, with the second patterned insulation layer 24 for cover curtain gives etching second layer of nanomaterial 22.In the present embodiment, be etch the first layer of nanomaterial 12 and the second layer of nanomaterial 22 respectively along a predetermined direction (as shown by arrows) under electrode 16 and 26 acts on.In certain embodiments, electrode 16 from 26 moving direction also can be different or not corresponding.
In other embodiments of the present utility model, in current generating system 15, etching first layer of nanomaterial 12 is first given with the first patterned insulation layer 14 for cover curtain under electrode 16 acts on, afterwards in identical current generating system 15, electrode 16 act under with the second patterned insulation layer 24 for cover curtain gives etching second layer of nanomaterial 22.
In like manner, also can in current generating system 25, etching second layer of nanomaterial 22 is first given with the second patterned insulation layer 24 for cover curtain under electrode 26 acts on, afterwards in identical current generating system 25, electrode 26 act under with the first patterned insulation layer 14 for cover curtain gives etching first layer of nanomaterial 12.
In another embodiment of the present utility model, please refer to Fig. 3 C, in an arc spraying formula (arc jet) current generating system, be cover curtain with the first patterned insulation layer 14, shower nozzle 17 is utilized to etch the first layer of nanomaterial 12 along a predefined paths (as shown by arrows), and simultaneously in another arc spraying formula current generating system, be cover curtain with the second patterned insulation layer 24, utilize shower nozzle 27 to etch the second layer of nanomaterial 22 along a predefined paths.
In other embodiments of the present utility model, in an arc spraying formula current generating system, be cover curtain with the first patterned insulation layer 14, shower nozzle 17 is utilized first to etch the first layer of nanomaterial 12 along a predefined paths, afterwards in identical arc spraying formula current generating system, be cover curtain with the second patterned insulation layer 24, utilize shower nozzle 17 to etch the second layer of nanomaterial 22 along a predefined paths.
In like manner, also can in an arc spraying formula current generating system, be cover curtain with the second patterned insulation layer 24, shower nozzle 27 is utilized first to etch the second layer of nanomaterial 22 along a predefined paths, afterwards in identical arc spraying formula current generating system, be cover curtain with the first patterned insulation layer 14, utilize shower nozzle 27 to etch the first layer of nanomaterial 12 along a predefined paths.In certain embodiments, shower nozzle 17 with 27 moving direction also can not be identical or not corresponding.
Please refer to Fig. 3 D, the first patterned insulation layer 14 and the second patterned insulation layer 24 are removed and reach a nano-level conducting film 30.But in an embodiment of the present utility model; because the first patterned insulation layer 14 and the second patterned insulation layer 24 comprise the material that optical characteristics matches with the first layer of nanomaterial 12 and the second layer of nanomaterial 22 respectively; therefore without the need to removing the first patterned insulation layer 14 and the second patterned insulation layer 24, so can reduce this and removing the risk that process may injure the first protective seam 13 and the second protective seam 23.
First layer of nanomaterial 12 of nano-level conducting film 30 is divided into multiple first area 121 and multiple second area 122.First area 121 in the etching process of Fig. 3 B or Fig. 3 C by the first patterned insulation layer 14 shades, second area 122, then not by the first patterned insulation layer 14 shades, to make after etching between first area 121 described in the first layer of nanomaterial 12 with described second area 122 electrical isolation.In addition, the second layer of nanomaterial 22 of nano-level conducting film 30 is divided into multiple first area 221 and multiple second area 222.First area 221 in the etching process of Fig. 3 B or Fig. 3 C by the second patterned insulation layer 24 shades, second area 222, then not by the second patterned insulation layer 24 shades, to make after etching between first area 221 described in the second layer of nanomaterial 22 with described second area 222 electrical isolation.
In certain embodiments, the pattern of the second patterned insulation layer 24 can be different from the first patterned insulation layer 14, for example, each bar insulation block of second patterned insulation layer 24 arranges with first direction (such as X-direction), and each bar insulation block of the first patterned insulation layer 14 is with second direction (such as Y-direction) arrangement, but be not limited thereto.After etching as Fig. 3 B or 3D, the touch-control sensing electrode of different directions can be formed on two of a substrate 11 different surface.
Fig. 4 A and 4B is depicted as the method for making schematic diagram of the nano-level conducting film according to another embodiment of the present utility model.Please refer to Fig. 4 A, the method for making of the present embodiment only provides a nanometer base material 10 and on nanometer base material 10, does not form insulation course.First layer of nanomaterial 12 of nanometer base material 10 can be divided into multiple first area and multiple second area in advance, and wherein said first area is the region for retaining electric conductivity, and described second area is the region that its electric conductivity is lost.In addition, described second area can define an etched path (as shown by arrows).
Thereafter, in an arc spraying formula current generating system, utilize the described second area of the first layer of nanomaterial 12 in shower nozzle 17 etching of nano base material 10, to make described in the first layer of nanomaterial 12 between first area with described second area electrical isolation.In an embodiment of the present utility model, be carry out etching of nano base material 10 according to path that described second area defines.
Please refer to Fig. 4 B, nanometer base material 10 forms a nano-level conducting film 40 after etching.First layer of nanomaterial 12 of nano-level conducting film 40 comprises multiple first area 121 and multiple second area 122, with described second area 122 electrical isolation between wherein said first area 121.
Fig. 5 A and 5B is depicted as the method for making schematic diagram of the nano-level conducting film according to an embodiment more of the present utility model.Please refer to Fig. 5 A, the method for making of the present embodiment only provides a nanometer base material 28 and on nanometer base material 28, does not form insulation course.First layer of nanomaterial 12 of nanometer base material 28 and the second layer of nanomaterial 22 can be divided into multiple first area and multiple second area separately in advance, wherein said first area is the region for retaining electric conductivity, and described second area is the region that its electric conductivity is lost.In addition, described second area can define an etched path (as shown by arrows).
Thereafter, in an arc spraying formula current generating system, utilize the described second area of the first layer of nanomaterial 12 in shower nozzle 17 etching of nano base material 28, to make described in the first layer of nanomaterial 12 between first area with described second area electrical isolation, and simultaneously in another arc spraying formula current generating system, utilize the described second area of the second layer of nanomaterial 22 in shower nozzle 27 etching of nano base material 28, to make described in the second layer of nanomaterial 22 between first area with described second area electrical isolation.In an embodiment of the present utility model, be that etching of nano base material 28 is carried out in the path defined according to described second area.
In other embodiments of the present utility model, in an arc spraying formula current generating system, shower nozzle 17 is utilized first to etch the first layer of nanomaterial 12 along the etched path relevant to the first layer of nanomaterial 12, afterwards in identical arc spraying formula current generating system, shower nozzle 17 is utilized to etch the second layer of nanomaterial 22 along the etched path relevant to the second layer of nanomaterial 22.
In like manner, also can in an arc spraying formula current generating system, shower nozzle 27 is utilized first to etch the second layer of nanomaterial 22 along the etched path relevant to the second layer of nanomaterial 22, afterwards in identical arc spraying formula current generating system, shower nozzle 27 is utilized to etch the first layer of nanomaterial 12 along the etched path relevant to the first layer of nanomaterial 12.Analogously, shower nozzle 27 can not be identical or not corresponding with the moving direction of shower nozzle 17, and the touch-control sensing electrode of the different both sides of substrate 11 of Fig. 5 B is arranged with different directions.Such as the first layer of nanomaterial 12 can conducting at first direction (such as X-direction), but the first layer of nanomaterial 12 is in second direction (such as Y-direction) not conducting; Second layer of nanomaterial 22 is in first direction (such as X-direction) not conducting, but the second layer of nanomaterial 22 can conducting in second direction (such as Y-direction).
Please refer to Fig. 5 B, nanometer base material 28 forms a nano-level conducting film 50 after etching.First layer of nanomaterial 12 of nano-level conducting film 50 comprises multiple first area 121 and multiple second area 122, with described second area 122 electrical isolation between wherein said first area 121.In addition, the second layer of nanomaterial 22 of nano-level conducting film 50 comprises multiple first area 221 and multiple second area 222, with described second area 222 electrical isolation between wherein said first area 221.
From nano-silver conductive film at electron microscope (scanning electron microscope; SEM) imaging under is known with the imaging of this nano-silver conductive film under three-dimensional laser microscope (3D lasermicroscope), and in this nano-silver conductive film, nano-silver thread is crisscross and mutually overlapping, forms high connductivity networking.In addition, nano-silver thread has quite high length breadth ratio, and the network formed is then quite lax, can produce high translucent effect thus, high conductivity and high-transmission rate.
From the known nano-silver conductive film prepared by the method for the utility model embodiment, after etching of enlarged image of the nano-level conducting film prepared by the method for making of the utility model one embodiment and an art methods because its nano-silver thread only disconnects, but still exist, although so the nano-silver conductive film electric conductivity destroyed of the utility model embodiment, but its optical characteristics still can maintain.To review prepared by some art methods, its nano-silver thread of nano-silver conductive film after etching almost etch totally, although its electric conductivity is lost, its optical characteristics also go to pot simultaneously and with etching before far from each other.
From the further enlarged image of the nano-level conducting film prepared by the method for making of the utility model one embodiment and an art methods, the notable difference of the nano-silver conductive film prepared by method of the utility model embodiment and the nano-level conducting film prepared by art methods can be found out further.
Its gap of nano-silver thread that can find nano-silver conductive film from the enlarged image of the nano-level conducting film prepared by the method for making of the utility model one embodiment is like through scorification, and this is the reason of the heat energy effect supervened with it because of the high voltage of current generating system.And because in atmospheric environment, more limited with the etch effect of current system, such that the structure of nano-silver thread is non-to be destroyed all sidedly, and nano-silver thread only can be made to rupture.Therefore the method for the utility model embodiment can reach effective etch effect to define the electrical specification of nano-level conducting film, and maintains its optical characteristics.
It etches forward and backward haze value to Figure 6 shows that nano-level conducting film prepared by the method for making of the utility model one embodiment.Please refer to Fig. 6, as shown by the solid line, before its etching of nano-silver conductive film prepared by the method for making of the utility model embodiment, the haze value of (such as during time point T0) is about 0.8%, and the haze value of (such as during time point T1) is also about 0.8% after etching, there is no significant change haply.In an embodiment of the present utility model, in the layer of nanomaterial of nano-silver conductive film without etching first area be more or less the same in 0.3% through its haze value of overetched second area, preferably its haze value is more or less the same in 0.1%.
Review the nano-silver conductive film prepared by some art methods, after etching, shown in dotted line, before its etching, the haze value of (such as during time point T0) is about 0.8%, after etching, the haze value of (such as during time point T1) is then about 0.4%, its haze value differs by more than 0.3%, has obvious change.
In an embodiment of the present utility model, haze value takes general definition: departed from the scatter light flux in incident light direction and the ratio of transmitted light flux by sample, represent (for measurement of the present utility model, being that the scatter light flux departing from more than 2.5 degree, incident light direction is used for calculating haze value) with percentage.
Fig. 7 A and 7B is depicted as the optical appearance schematic diagram of the nano-level conducting film prepared by art methods.Please refer to Fig. 7 A and 7B, in the layer of nanomaterial of the nano-level conducting film prepared by art methods without the first area (conduction region) 321 of etching with have significant difference through its optical characteristics of overetched second area (nonconductive regions) 322, because the nanometer wire rod in second area 322 etches totally, thus produces obvious aberration.In addition, the protective seam of nano-level conducting film also likely wrecks in etching process, and makes the deterioration in optical properties of nano-level conducting film.
Fig. 8 A and 8B is depicted as the optical appearance schematic diagram of the nano-level conducting film prepared by the method for making of the utility model one embodiment.Please refer to Fig. 8 A and 8B, in the layer of nanomaterial of the nano-level conducting film prepared by the method for making of the utility model embodiment without the first area (conduction region) 421 of etching with there is no significant difference through its optical characteristics of overetched second area (nonconductive regions) 422, because the nanometer wire rod in second area 422 only has fracture, structure is still preserved.In addition, the protective seam of nano-level conducting film also without obviously destroying, makes the optical characteristics of nano-level conducting film be maintained haply in electric current etching process.
Figure 9 shows that the diagrammatic cross-section of the touch control display apparatus 110 according to an embodiment of the present utility model.Please refer to Fig. 9, touch control display apparatus 110 comprises contact panel 60 and a display module 66.Contact panel 60 comprises transparency carrier 71,1 first sensing electrode layer 91 and a shielding layer 75.Transparency carrier 71 has first surface 711 and a second surface 712, and first surface 711 and second surface 712 are positioned at the opposition side of transparency carrier 71.First sensing electrode layer 91 is positioned on the first surface 711 of transparency carrier 71.Shielding layer 75 is also positioned on the first surface 711 of transparency carrier 71, and around the first sensing electrode layer 91.
In an embodiment of the present utility model, the transparent material such as material selectable from glass, acryl (PMMA), ethylene terephthalate, polyethersulfone, polyacrylate, PEN, polyphenylene sulfide, polyallyl, polycarbonate, polyethylene terephthalate, Polyvinylchloride (PVC), polypropylene (PP), polyethylene terephthalate (PET), PEN (PEN), polycarbonate (PC), polystyrene (PS) of transparency carrier 71.In addition, the material of shielding layer 75 can be selected from opaque light resistance material, black photoresist, black resin or black ink.
In an embodiment of the present utility model, the first sensing electrode layer 91 comprises the nano-level conducting film 40 of nano-level conducting film 20 as Fig. 2 D or Fig. 4 B.In addition, the first sensing electrode layer 91 comprises unidirectional spaced electrode pattern, such as the first sensing electrode and the second sensing electrode.In addition, contact panel 60 and display module 66 fit with one first adhesive coating 81.First adhesive coating 81 can comprise optical cement (optical clear resin; Or optical adhesive tape (optical clear adhesive OCR); OCA).In addition, optical cement can be glue or optically transparent special double faced adhesive tape.Display module 66 comprises a backlit display, such as liquid crystal display (liquid crystal display; LCD), or comprise a self-emitting display, such as organic light emitting diode (organic light emitting diode; OLED) display.
Figure 10 shows that the diagrammatic cross-section of the touch control display apparatus 120 according to another embodiment of the present utility model.Please refer to Figure 10, touch control display apparatus 120 comprises a contact panel 70, and it also comprises one first loading plate 72, between transparency carrier 71 and display module 66.First sensing electrode layer 91 is positioned at one of the first loading plate 72 on the surface, and fits with transparency carrier 71 with the first adhesive coating 81.In addition, another surface of the first loading plate 72 fits with display module 66 with the second adhesion layer 82.In an embodiment of the present utility model, the transparent material such as material selectable from glass, acryl (PMMA), ethylene terephthalate, polyethersulfone, polyacrylate, PEN, polyphenylene sulfide, polyallyl, polycarbonate, polyethylene terephthalate, Polyvinylchloride (PVC), polypropylene (PP), polyethylene terephthalate (PET), PEN (PEN), polycarbonate (PC), polystyrene (PS) of the first loading plate 72.In addition, the material of the second adhesive coating 82 can be selected from optical cement or optical adhesive tape.
Figure 11 shows that the diagrammatic cross-section of the touch control display apparatus 130 according to another embodiment of the present utility model.Please refer to Figure 11, touch control display apparatus 130 comprises a contact panel 80, and wherein the first sensing electrode layer 91 is positioned at one of the first loading plate 72 on the surface, and fits with transparency carrier 71 with the first adhesive coating 81.In addition, the second sensing electrode layer 92 be positioned at the first loading plate 72 another on the surface, and to fit with display module 66 with the second adhesive coating 82.In embodiment of the present utility model, the second sensing electrode layer 92 comprises the nano-level conducting film 40 of nano-level conducting film 20 as Fig. 2 D or Fig. 4 B.In addition, the first sensing electrode layer 91 comprises the first sensing electrode along first direction arrangement, and the second sensing electrode layer 92 then comprises the second sensing electrode along second direction arrangement, and first direction and second direction are perpendicular each other haply.First, second sensing electrode layer 91,92 also can by the electrode of different orientation produced by the method for Fig. 3 A and 3B, 3C and 3D or 5A and 5B.
Figure 12 shows that the diagrammatic cross-section of the touch control display apparatus 140 according to an embodiment of the present utility model.Please refer to Figure 12, touch control display apparatus 140 comprises a contact panel 90, wherein the first sensing electrode layer 91 is positioned on the first surface of transparency carrier 71, second sensing electrode layer 92 is then positioned at one of the first loading plate 72 on the surface, and the first sensing electrode layer 91 and the second sensing electrode layer 92 fit with the first adhesive coating 81.In addition, another surface of the first loading plate 72 fits with display module 66 with the second adhesive coating 82.
Figure 13 shows that the diagrammatic cross-section of the touch control display apparatus 150 according to another embodiment of the present utility model.Please refer to Figure 13, touch control display apparatus 150 comprises a contact panel 100, and it comprises the first loading plate 72, between transparency carrier 71 and display module 66, and separately comprises one second loading plate 73, between the first loading plate 72 and display module 66.First sensing electrode layer 91 is positioned at one of the first loading plate 72 on the surface, and the second sensing electrode layer 92 is positioned at one of the second loading plate 73 on the surface.In addition, another surface of first loading plate 72 fits with transparency carrier 71 with the first adhesive coating 81, first sensing electrode layer 91 and the second sensing electrode layer 92 fit with the second adhesive coating 82, and another surface of the second loading plate 73 then fits with display module 66 with one the 3rd adhesive coating 83.In embodiment of the present utility model, the transparent material such as material selectable from glass, acryl (PMMA), ethylene terephthalate, polyethersulfone, polyacrylate, PEN, polyphenylene sulfide, polyallyl, polycarbonate, polyethylene terephthalate, Polyvinylchloride (PVC), polypropylene (PP), polyethylene terephthalate (PET), PEN (PEN), polycarbonate (PC), polystyrene (PS) of the second loading plate 73.In addition, the 3rd adhesive coating 83 comprises optical cement or optical adhesive tape.
The method for making of the nano-level conducting film of the utility model above-described embodiment can reach effective etch effect to define the electrical specification of nano-level conducting film, makes to be separated by with non-conducting areas between the conductive region of nano-level conducting film.In addition, the loss of the protective seam that in the utility model embodiment, the method for making of nano-level conducting film effectively can reduce nano-level conducting film in etching process and maintain the optical characteristics of nano-level conducting film.In addition, in the utility model embodiment, the method for making of nano-level conducting film is compared with some existing manufacture method, can significantly shorten the manufacture method time.In addition, according to nano-level conducting film in the utility model embodiment method for making prepared by nano-level conducting film be etch in current generating system, because the optical appearance of conductive region and non-conducting areas before and after etching is without obvious change, such as its haze value is more or less the same in 0.3% and even is not more than 0.1%, therefore has higher potentiality and is hidden and improving optical taste by circuit.
Technology contents of the present utility model and technical characterstic have disclosed as above, but the utility model art technician should be appreciated that, not deviating from the utility model spirit and scope defined in the interest field listed by appending claims, teaching of the present utility model and disclose and can do all replacements and modification.Such as, the structure that the many elements disclosed above can be different is implemented or is replaced with the structure of other identical function, or adopts the combination of above-mentioned two kinds of modes.
In addition, interest field of the present utility model is not limited to the device of the specific embodiment disclosed, element or structure above.In the utility model art, technician should be appreciated that, based on the utility model teaching and announcement device, element or structure, no matter exist now or developer in the future, itself and the utility model embodiment announcement person perform the identical function of essence in the mode that essence is identical, and reach the identical result of essence, also can be used in the utility model.Therefore, the interest field listed by appending claims contains such device, element or structure.
Claims (9)
1. a touch control display apparatus, is characterized in that: described touch control display apparatus comprises:
One transparency carrier, described transparency carrier has a first surface and a second surface, and described first surface and described second surface are positioned at the opposition side of described transparency carrier;
One display module, described display module is positioned at the first surface side of described transparency carrier; And
One first sensing electrode layer, described first sensing electrode layer is between described transparency carrier and described display module, described first sensing electrode layer comprises one first layer of nanomaterial, described first layer of nanomaterial has multiple first area and multiple second area, with described second area electrical isolation between described first area, and the difference of haze value between described first area and described second area is not more than 0.1%.
2. touch control display apparatus according to claim 1, is characterized in that: described first sensing electrode layer is arranged on the first surface of described transparency carrier, and described first area comprises spaced first sensing electrode and the second sensing electrode.
3. touch control display apparatus according to claim 1, it is characterized in that: described touch control display apparatus also comprises one first loading plate, in order to carry described first sensing electrode layer between described transparency carrier and described display module, and described first area comprises spaced first sensing electrode and the second sensing electrode.
4. touch control display apparatus according to claim 1, it is characterized in that: described touch control display apparatus also comprises one first loading plate and one second sensing electrode layer, described first loading plate is between described transparency carrier and described display module, wherein said first sensing electrode layer is arranged on a first surface of described first loading plate, described second sensing electrode layer is arranged on a second surface of described first loading plate, and described first surface and described second surface are positioned at the opposition side of described first loading plate.
5. touch control display apparatus according to claim 4, it is characterized in that: described second sensing electrode layer comprises one second layer of nanomaterial, described second layer of nanomaterial has multiple first area and multiple second area, with described second area electrical isolation between described first area, and the difference of haze value between the described first area of described second layer of nanomaterial and described second area is not more than 0.1%.
6. touch control display apparatus according to claim 4, it is characterized in that: the described first area of described first sensing electrode layer comprises the first sensing electrode along a first direction arrangement, and the described first area of described second sensing electrode layer comprises the second sensing electrode along a second direction arrangement.
7. touch control display apparatus according to claim 1, it is characterized in that: described touch control display apparatus also comprises one first loading plate and one second sensing electrode layer, described first loading plate is between described transparency carrier and described display module, wherein said first sensing electrode layer is arranged on the first surface of described transparency carrier, and described second sensing electrode layer is between described first sensing electrode layer and described first loading plate and be arranged on described first loading plate.
8. touch control display apparatus according to claim 7, it is characterized in that: described second sensing electrode layer comprises one second layer of nanomaterial, described second layer of nanomaterial has multiple first area and multiple second area, with described second area electrical isolation between described first area, and the difference of haze value between the described first area of described second layer of nanomaterial and described second area is not more than 0.1%.
9. touch control display apparatus according to claim 7, it is characterized in that: the described first area of described first sensing electrode layer comprises the first sensing electrode along a first direction arrangement, and the described first area of described second sensing electrode layer comprises the second sensing electrode along a second direction arrangement.
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| CN201420664048.8U CN204229372U (en) | 2014-11-07 | 2014-11-07 | Touch control display apparatus |
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| CN201420664048.8U CN204229372U (en) | 2014-11-07 | 2014-11-07 | Touch control display apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105138175A (en) * | 2015-09-06 | 2015-12-09 | 黄石瑞视光电技术股份有限公司 | Industrial control touch screen and manufacturing method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105138175A (en) * | 2015-09-06 | 2015-12-09 | 黄石瑞视光电技术股份有限公司 | Industrial control touch screen and manufacturing method thereof |
| CN105138175B (en) * | 2015-09-06 | 2018-01-30 | 黄石瑞视光电技术股份有限公司 | Industry control touch-screen and preparation method thereof |
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