CN204203923U - Embedded touch display panel structure - Google Patents
Embedded touch display panel structure Download PDFInfo
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- CN204203923U CN204203923U CN201420600625.7U CN201420600625U CN204203923U CN 204203923 U CN204203923 U CN 204203923U CN 201420600625 U CN201420600625 U CN 201420600625U CN 204203923 U CN204203923 U CN 204203923U
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Abstract
The utility model provides an embedded touch-control display panel structure, including an upper substrate, a base plate, a thin film transistor and response electrode layer. The thin film transistor and the sensing electrode layer are provided with a plurality of grid driving wires, a plurality of source driving wires, a plurality of first sensing conductor segments and a plurality of second sensing conductor segments, the grid driving wires and the first sensing conductor segments are arranged in a first direction and are parallel to each other, the source driving wires and the second sensing conductor segments are arranged in a second direction and are parallel to each other, a first group of the plurality of second sensing conductor segments and the plurality of first sensing conductor segments form N quadrilateral areas, and a second group of the second sensing conductor segments form N routing lines so as to form a sensing touch pattern structure on the first group of the second sensing conductor segments. Therefore, the induction electrode layer made of transparent conductive material is not required to be arranged on the upper substrate or the lower substrate of the display panel.
Description
Technical field
The utility model is about a kind of structure with the display screen of touch pad, espespecially a kind of In-cell touch display panel structure.
Background technology
Modern consumption electronic installation polygamy for touch pad as one of its input equipment.Touch pad can be divided into resistance-type, condenser type, acoustic wave and optical profile type etc. multiple according to the difference of sensing principle.
Known touch control type planar display be contact panel and flat-panel screens are directly carried out upper and lower superimposed, because superimposed contact panel is transparent panel, thus image can penetrate the contact panel show image be superimposed on, then by contact panel as the medium inputted or interface.But this known technology, because when superimposed, the complete weight of a contact panel must be increased, flat-panel screens weight is increased significantly, not meet current market for the compact requirement of display.And when direct superimposed contact panel and flat-panel screens, not only increase the thickness of contact panel itself, and reduce the penetrance of light, also add reflectivity and mist degree, the quality of screen display is had a greatly reduced quality.
For aforesaid shortcoming, touch control type planar display changes adopts embedded type touch control technology.The main at present developing direction of embedded type touch control technology can be divided into On-Cell and In-Cell two kinds of technology.On-Cell technology is that the induction electrode of projected capacitive touch technology (Sensor) is produced on panel color optical filter (Color Filter, CF) the back side (namely attaching Polarizer face), is integrated into the structure of colored filter.In-Cell technology is then insert in the middle of the structure of tft layer by induction electrode (Sensor), such as, inserted in the middle of the structure of LCD cell by induction electrode (Sensor).The main induction mode utilized also can be divided into resistance (contact) formula, condenser type and optical profile type three kinds at present, wherein resistance-type is the conducting utilizing the upper and lower two substrates electrode of LCD Cell, the change of calculating voltage dividing potential drop judges contact position coordinate, the technology of On-Cell Touch is then first be made on film by the Sensor of contact panel, on the glass being then fitted in upper substrate or be directly made on substrate by Sensor transparent conductive material.
And Out Cell Touch technology is on a display panel plug-in by contact panel, it is also current modal form; The technology such as resistance-type, condenser type has, and is usually all to be manufactured by other contact panel manufacturer, then carries out fitting with display panel and assemble.
In-Cell Touch technology is then be integrated within display panel by touch control component, makes display panel inherently possess touch controllable function, does not therefore need the technique of carrying out in addition fitting with contact panel or assembling, and such technology is all developed by panel factory usually.
No matter but In-Cell Touch technology, On-Cell Touch technology or Out Cell Touch technology, it all arranges in the top glass substrate of display panel or lower glass substrate the induction electrode layer that transparent conductive material (ITO) makes, not only increase cost, also process is increased, process yields reduction and process costs is easily caused to rise violently, and backlight that need be stronger because aperture opening ratio declines, also can increase power consumption, be unfavorable for the demand of running gear low-power consumption.Therefore, the space that is still improved of known touch display panel structure.
Utility model content
Fundamental purpose of the present utility model is providing a kind of In-cell touch display panel structure, can significantly save material cost and processing cost; Because without the need to arranging the induction electrode layer that transparent conductive material (ITO) is made in the top glass substrate of display panel or lower glass substrate, can reduce costs accordingly, reduce process.
According to a characteristic of the present utility model, the utility model proposes a kind of In-cell touch display panel structure, it is characterized in that, include:
One upper substrate;
One infrabasal plate, a display material layer is folded between two substrates to be parallel-laid into right configuration by this upper substrate and this infrabasal plate;
One light shield layer, is positioned at the surface of the same side relative to this display material layer of this upper substrate, and this light shield layer is made up of many shading lines; And
One thin film transistor (TFT) and induction electrode layer, be positioned at the surface regarding to the side of display material layer of this infrabasal plate, and wherein, this thin film transistor (TFT) and induction electrode layer have:
One raster data model line sublayer, it has many raster data model lines and many first sensor conductor line segments, these many raster data model lines are arranged according to a first direction, and these many first sensor conductor line segments are arranged according to this first direction, and are parallel to this many raster data model lines; And
One source pole drive wire sublayer, be positioned at the surface regarding to the side of this display material layer of this raster data model line sublayer, it has many source drive lines and many second sensor conductor line segments, these many source drive lines are arranged according to a second direction, these many second sensor conductor line segments are arranged according to this second direction, and are parallel to this many source drive lines;
Wherein, the position foundation of these many first sensor conductor line segments and many second sensor conductor line segments is corresponding with the position of these many shading lines of this light shield layer and arrange, many the second sensor conductor line segment is divided into more than one first group the second sensor conductor line segment and one second group of second sensor conductor line segment, this more than first group the second sensor conductor line segment and these many first sensor conductor line segments form N number of four type regions, limit, and do not connect between any two type regions, four limits, to form the structure with induction touch-control pattern at this thin film transistor (TFT) and induction electrode layer, N be greater than 1 integer.
Wherein, the position of these many raster data model lines and these many source drive lines is according to corresponding with the position of these many shading lines of this light shield layer and arrange.
Wherein, this second group of second sensor conductor line segment forms N number of cabling, and the four type regions, limit that each cabling of this N number of cabling is corresponding with are electrically connected, and do not connect between each cabling.
Wherein, these many first sensor conductor line segments and many second sensor conductor line segments are made by conductive metal material.
Wherein, this display material layer is made up of liquid crystal.
It also comprises: a chromatic filter layer, is positioned on the surface regarding to the same side of this display material layer of this light shield layer;
One common electrode layer, between this upper substrate and infrabasal plate;
One first polarizing layer, is positioned at the surface regarding to the opposite side of this display material layer of this upper substrate; And
One second polarizing layer, is positioned at the surface regarding to the opposite side of this display material layer of this infrabasal plate.
Wherein, this display material layer is made up of Organic Light Emitting Diode.
Wherein, the vertical second direction of this first direction.
According to another characteristic of the present utility model, the utility model proposes a kind of In-cell touch display panel structure, it is characterized in that, include:
One upper substrate;
One infrabasal plate, a display material layer is also folded between two substrates to be parallel-laid into right configuration by this upper substrate and this infrabasal plate;
One thin film transistor (TFT) and induction electrode layer, be positioned at the surface regarding to the side of this display material layer of this infrabasal plate, and wherein, this thin film transistor (TFT) and induction electrode layer have:
One raster data model line sublayer, it has many raster data model lines and many first sensor conductor line segments, these many raster data model lines are arranged according to a first direction, and these many first sensor conductor line segments are arranged according to this first direction, and are parallel to this many raster data model lines; And
One source pole drive wire sublayer, be positioned at the surface regarding to the side of this display material layer of this raster data model line sublayer, it has many source drive lines and many second sensor conductor line segments, these many source drive lines are arranged according to this second direction, these many second sensor conductor line segments are arranged according to this second direction, and are parallel to this many source drive lines;
Wherein, many the second sensor conductor line segment is divided into more than one first group the second sensor conductor line segment and one second group of second sensor conductor line segment, this more than first group the second sensor conductor line segment and these many first sensor conductor line segments form N number of four type regions, limit, and do not connect between any two type regions, four limits, to form the structure with induction touch-control pattern at this thin film transistor (TFT) and induction electrode layer, N be greater than 1 integer.
Wherein, this second group of second sensor conductor line segment forms N number of cabling, and the four type regions, limit that each cabling of this N number of cabling is corresponding with are electrically connected, and do not connect between each cabling.
Wherein, these many first sensor conductor line segments and many second sensor conductor line segments are made by conductive metal material.
Wherein, this display material layer is made up of Organic Light Emitting Diode.
Wherein, the vertical second direction of this first direction.
The beneficial effects of the utility model are, can reduce costs, and reduce process.
Accompanying drawing explanation
For further illustrating technology contents of the present utility model, be described in detail as follows below in conjunction with embodiment and accompanying drawing, wherein:
Fig. 1 is the lamination schematic diagram of a kind of In-cell touch display panel structure one embodiment of the present utility model.
Fig. 2 is the schematic diagram of general known light shield layer.
Fig. 3 is the schematic diagram of the utility model thin film transistor (TFT) and induction electrode layer.
Fig. 4 A, Fig. 4 B and Fig. 4 C are the sectional views at AA ' place and BB ' place in the utility model Fig. 3.
Fig. 5 is the schematic diagram of the utility model many sensor conductor lines.
Fig. 6 is the schematic diagram of the utility model light shield layer and many first sensor conductor line segments and many second sensor conductor line segments.
Fig. 7 is another schematic diagram of the utility model first sensor conductor line segment and the second sensor conductor line segment.
Fig. 8 be another embodiment of the present utility model lamination schematic diagram.
Fig. 9 be another embodiment of the present utility model lamination schematic diagram.
Embodiment
The utility model is about the embedded display touch-control structure of one.Fig. 1 is the lamination schematic diagram of an embodiment of In-cell touch display panel structure of the present utility model, as shown in Figure 1, this In-cell touch display panel structure 100 includes a upper substrate 110, one infrabasal plate 120, one display material layer 130, one light shield layer (black matrix) 140, one thin film transistor (TFT) and induction electrode layer 150, one chromatic filter layer (color filter) 160, one protective seam (over coat) 170, one common electrode layer (Vcom) 180, one first polarizing layer (upper polarizer) 190, and one second polarizing layer (lower polarizer) 200.
This upper substrate 110 and this infrabasal plate 120 are preferably glass substrate, and this display material layer 130 is folded between two substrates 110,120 to be parallel-laid into right configuration by this upper substrate 110 and this infrabasal plate 120.In the present embodiment, this display material layer 130 is a liquid crystal layer.
This light shield layer (black matrix) 140 is the surfaces regarding to the side of display material layer 130 being positioned at this upper substrate 110, and this light shield layer 140 is made up of many shading lines.
Fig. 2 is the schematic diagram of general known light shield layer.As shown in Figure 2, known light shield layer 140 forms many shading lines 250 by the lines of lighttight black isolation material, many shading lines 250 of described black isolation material are orthogonally distributed in this known light shield layer 140, therefore this known light shield layer 140 is also called black matrix (black matrix).260, region between the lines of described black isolation material is distributed with chromatic filter layer (color filter).
Known tft layer (TFT) is positioned at the surface of the same side relative to display material layer 130 of this infrabasal plate 120.Thin films transistors layer is made up of thin film transistor (TFT) 151 and transparency electrode.
The utility model is in known tft layer (TFT), in many raster data model lines are other, many first sensor conductor line segments are set, in many source drive lines are other, many second sensor conductor line segments are set, and form thin film transistor (TFT) of the present utility model and induction electrode layer 150, so, then without the need to arranging the induction electrode layer that transparent conductive material (ITO) is made in the top glass substrate of LCD display panel or lower glass substrate, reduce costs accordingly, reduce process, lifting process yield and reduction process costs.This thin film transistor (TFT) of this case and induction electrode layer 150 are positioned at the surface of the side in the face of display material layer 130 of this infrabasal plate 120.Wherein, this thin film transistor (TFT) and induction electrode layer 150 have a raster data model line sublayer and one source pole drive wire sublayer.
Fig. 3 is the schematic diagram of the utility model thin film transistor (TFT) and induction electrode layer 150.It is the schematic diagram looked over toward this infrabasal plate 120 direction from this upper substrate 110 direction.This thin film transistor (TFT) and induction electrode layer 150 have a raster data model line sublayer and one source pole drive wire sublayer.
This raster data model line sublayer has many raster data model lines 310 and many first sensor conductor line segments 320, these many raster data model lines 310 arrange according to a first direction (X), these many first sensor conductor line segments 320 arrange according to this first direction (X), and be parallel to this many raster data model lines 310.As shown in Figure 3, this raster data model line sublayer represents with positive oblique line.
Source drive line sublayer is positioned at the surface regarding to the side of this display material layer 130 of this raster data model line sublayer, it has many source drive lines 330 and many second sensor conductor line segments 340, these many source drive lines 330 arrange according to a second direction (Y), these many second sensor conductor line segments 340 arrange according to this second direction (Y), and be parallel to this many source drive lines 330.As shown in Figure 3, this source drive line sublayer represents with back slash.Wherein, first direction (X) is approximately perpendicular to second direction (Y).
The position of these many first sensor conductor line segments 320 and many second sensor conductor line segments 340 is according to corresponding with the position of these many shading lines 250 of this light shield layer and arrange.
In Fig. 3, also show the shading lines 250 of light shield layer 140, because shading lines 250 do not belong to this thin film transistor (TFT) and induction electrode layer 150, therefore illustrate with dotted line.As shown in Figure 3, the position of these many first sensor conductor line segments 320 and many second sensor conductor line segments 340 is according to corresponding with the position of these many shading lines 250 of this light shield layer 140 and arrange.That is the live width d2 of source drive line 330 adds that the live width d1 of the second sensor conductor line 340 adds the better live width D being less than or equal to shading lines 250 of distance s (spacing) of source drive line 330 and the second sensor conductor line.In the present embodiment, d1+d2+s < D.Simultaneously, raster data model line 310 and the position of source drive line 330 are also according to corresponding and arrange with the position of these many shading lines 250 of this light shield layer 140, when therefore being looked over from this upper substrate 110 direction toward this infrabasal plate 120 direction, raster data model line 310, first sensor conductor line 320, source drive line 330, with second sensor conductor line 340 can cover by these shading lines 250.This thin film transistor (TFT) and induction electrode layer 150 have more multiple transistor 350 and multiple pixel region 360.
Fig. 4 A, Fig. 4 B are the sectional views along AA ' tangent line place in the utility model Fig. 3.As shown in Figure 4 A, raster data model line 310 is arranged at infrabasal plate 120, and raster data model line 310 is provided with one first insulation layer 410, insulate to allow source drive line 330, second sensor conductor line segment 340 and raster data model line segment 310.Source drive line 330, second sensor conductor line segment 340 is provided with one second insulation layer 420.In figure 4b, this first insulation layer 410 mainly allows source drive line 330, second sensor conductor line segment 340 and raster data model line 310, first sensor conductor line segment 320 insulate, and therefore only need arrange insulation layer in junction.
Fig. 4 C is the sectional view along BB ' tangent line place in the utility model Fig. 3.As shown in Figure 4 C, the first sensor conductor line segment 320 is arranged at infrabasal plate 120, and the first sensor conductor line segment 320 is provided with this first insulation layer 410, insulate to allow source drive line 330 and the first sensor conductor line segment 320.Between the second sensor conductor line segment 340 and the first sensor conductor line segment 320, be provided with a perforation (via) 370, be electrically connected to allow the second sensor conductor line segment 340 and the first sensor conductor line segment 320.
Fig. 5 is the schematic diagram of the utility model many sensor conductor lines, and it is the schematic diagram looked over toward this infrabasal plate 120 direction from this upper substrate 110 direction.Many the second sensor conductor line segments 340 are divided into more than one first group the second sensor conductor line segment 340-1 and one second group the second sensor conductor line segment 340-2, and this more than first group the second sensor conductor line segment 340-1 and these many first sensor conductor line segments 320 form N number of four type regions, limit 510.And do not connect between any two type regions, four limits 510, to form the structure with induction touch-control pattern at this thin film transistor (TFT) and induction electrode layer 150, N be greater than 1 integer.
As shown in Figure 5, this type region, four limits is represented by dotted lines.In Fig. 5, this type region, four limits 510-1 be by the first sensor conductor line segment 320 and 7 first group the second sensor conductor line segment 340-1 of 7 in a first direction form square, it only illustrated for convenience of explanation.In other embodiments, the number of this metal line of induction can change according to need.When practice, this type region, four limits 510 is often made up of up to a hundred first group the second sensor conductor line segment 340-1 and the first sensor conductor line segment 320.
This second group of second sensor conductor line segment 340-2 forms N number of cabling, and each cabling of this N number of cabling is that the four limit type regions 510 corresponding with are electrically connected, and does not connect between each cabling.As shown in Figure 5, this type region, four limits 510-1 from oval this second group of second sensor conductor line segment 340-2 located toward downward-extension, and is connected to a control circuit (not shown).
These many first sensor conductor line segments 320 and many second sensor conductor line segments 340 of this thin film transistor (TFT) and induction electrode layer 150 are made by conductive metal material.Wherein, this this conductive metal material be for following one of them: chromium, barium, aluminium, silver, copper, titanium, nickel, tantalum, brill, tungsten, magnesium, calcium, potassium, lithium, indium and alloy thereof, lithium fluoride, magnesium fluoride, Lithia.
Fig. 6 is the utility model light shield layer 140 and the schematic diagram of these many first sensor conductor line segments 320, these many second sensor conductor line segments 340, and it is the schematic diagram looked over toward this upper substrate 110 direction from this infrabasal plate 120 direction.As shown in Figure 6, when user is looked over from this upper substrate 110 direction toward this infrabasal plate 120 direction, source drive line 330, second sensor conductor line segment 340, raster data model line 310, first sensor conductor line segment 320 can cover by these shading lines 250, therefore user can not see source drive line 330, second sensor conductor line segment 340, raster data model line 310, first sensor conductor line segment 320.
Fig. 7 is another schematic diagram of the utility model first sensor conductor line segment 320 and the second sensor conductor line segment 340, in Fig. 7, this type region, four limits 510-1 is from this second group of second sensor conductor line segment 340-2 toward downward-extension, and then extended to a side 101 of this In-cell touch display panel structure 100 again by a cabling 710, to be connected to the control circuit 610 of a flexible circuit board 600 further.
As shown in Figure 7, this type region, four limits 510-2 comparatively few one first group the second sensor conductor line segment 340-1 of this type region, four limits 510-1.But in practice, four type regions, limit are often made up of up to a hundred first group the second sensor conductor line segment 340-1 and the first sensor conductor line segment 320, therefore the voltage differences that senses of this four limit type region 510-2 and this type region, four limits 510-1 is little, does not affect the sensitivity of touch detection.Meanwhile, also such as, by the electronic circuit of control circuit 610 inside, operational amplifier, the voltage detected is adjusted.
This chromatic filter layer 160 is positioned on the surface regarding to the side of this display material layer 130 of this light shield layer 140.This common electrode layer 180 is between this upper substrate 110 and infrabasal plate 120.This first polarizing layer 190 is the surfaces regarding to the opposite side of this display material layer 130 being positioned at this upper substrate 110.This second polarizing layer 200 is the surfaces back to the side in this display material layer 130 being positioned at this infrabasal plate 120.
Fig. 8 be another embodiment of the present utility model lamination schematic diagram, it is a kind of lamination schematic diagram of In-cell touch display panel structure 700.As shown in the figure, this In-cell touch display panel structure 700 includes a upper substrate 11O, infrabasal plate 120, display material layer 730, light shield layer (black matrix) 140, thin film transistor (TFT) and induction electrode layer 750, chromatic filter layer (color filter) 160, protective seam (over coat) 170, cathode layer 760 and an anode layer 770.
Fig. 8 and Fig. 1 essential difference is this display material layer 730, this cathode layer 760, this anode layer 770 and this thin film transistor (TFT) and induction electrode layer 750.
This upper substrate 110 and this infrabasal plate 120 are preferably glass substrate or plastic base, and this display material layer 730 is also folded between two substrates 110,120 to be parallel-laid into right configuration by this upper substrate 110 and this infrabasal plate 120.Wherein, this display material layer 730 is preferably Organic Light Emitting Diode and forms.
The present embodiment is in tft layer, in many raster data model lines are other, many first sensor conductor line segments are set, in many source drive lines are other, many second sensor conductor line segments are set, and form thin film transistor (TFT) of the present utility model and induction electrode layer 750, so, then without the need to arranging the induction electrode layer that transparent conductive material is made in the top glass substrate of display panel or lower glass substrate, reduce costs accordingly, reduce process, lifting process yield and reduction process costs.
Many raster data model lines 310 of this thin film transistor (TFT) and induction electrode layer 750, the detail of many first sensor conductor line segments 320, many source drive lines 330 and these many second sensor conductor line segments 340 are disclosed by the first embodiment and Fig. 3 to Fig. 6, can complete based on the exposure of first embodiment of the invention in this operator for ripe, therefore repeat no more.
This thin film transistor (TFT) and induction electrode layer 750 are positioned at the surface that this infrabasal plate 120 regards to this display material layer 730 side, this thin film transistor (TFT) and induction electrode layer 750 have many raster data model line (not shown), many source drive line (not shown), along many first sensor conductor line segment (not shown) that first direction (X) is arranged, along these many second sensor conductor line segment (not shown) that second direction (Y) is arranged, and multiple pixel-driving circuit 751, each pixel-driving circuit 751 corresponds to a pixel, according to a display pixel signal and a display drive signals, in order to drive corresponding pixel-driving circuit 751, and then perform display operation.
According to the difference that pixel-driving circuit 751 designs, such as 2T1C designs pixel-driving circuit by 2 thin film transistor (TFT)s and 1 storage capacitors, and 6T2C designs pixel-driving circuit by 6 thin film transistor (TFT)s and 2 storage capacitors.In pixel-driving circuit 751, the grid 7511 of the rarest thin film transistor (TFT) is connected to a raster data model line (not shown), according to the difference of driving circuit design, in control circuit, the drain/source 7513 of the rarest thin film transistor (TFT) is connected to a source drive line (not shown), and in pixel-driving circuit 751, the drain/source 7515 of the rarest thin film transistor (TFT) is connected to anode pixels electrode 771 corresponding in this anode layer 770 one.
This cathode layer 760 is positioned at the surface of this upper substrate 110 in the face of this display material layer 730 side.Meanwhile, this cathode layer 760 is between this upper substrate 110 and this display material layer 730.This cathode layer 760 formed by conductive metal material.Preferably, this cathode layer 760 is that the metal material being less than 50 nanometers (nm) by thickness formed, this metal material be selected from following group one of them: aluminium (Al), silver (Ag), magnesium (Mg), calcium (Ca), potassium (K), lithium (Li), indium (In), the alloy of above-mentioned material or use lithium fluoride (LiF), magnesium fluoride (MgF2), Lithia (LiO) and Al to combine.Because the thickness of this cathode layer 760 is less than 50nm, the light that therefore this display material layer 730 produces still can penetrate cathode layer 760, show image on upper substrate 110.This cathode layer 760 is that full wafer is electrically connected, and therefore can be used as the use of shielding (shielding).Meanwhile, this cathode layer 760 also receives by the electric current of anode pixels electrode 771.
This anode layer 770 is positioned at the side that this thin film transistor (TFT) and induction electrode layer 750 regard to this display material layer 730.This anode layer 770 has multiple anode pixels electrode 771.Each anode pixels electrode of the plurality of anode pixels electrode 771 is corresponding with a pixel driven transistor of this pixel-driving circuit 751 of this thin film transistor (TFT) and induction electrode layer 750, that is each anode pixels electrode of the plurality of anode pixels electrode connects with the source/drain of this pixel driven transistor of this corresponding pixel-driving circuit 751, to form the pixel electrode of a particular color, the white pixel electrode such as, used in red pixel electrode, green pixel electrode or blue pixel electrode or this case.
This display material layer 730 comprises transmission sublayer, an electric hole (hole transporting layer, HTL) 731, one luminescent layer (emitting layer) 733 and an electric transmission sublayer (electrontransporting layer, HTL) 735.The better generation white light of this display material layer 730, and use this chromatic filter layer (color filter) 160 filter and produce Red, Blue, Green.
Fig. 9 be another embodiment of the present utility model lamination schematic diagram, it is a kind of lamination schematic diagram of In-cell touch display panel structure 800.As shown in the figure, the In-cell touch display panel structure 800 that should arrange metal induction in infrabasal plate includes upper substrate 110, infrabasal plate 120, display material layer 730, thin film transistor (TFT) and induction electrode layer 750, cathode layer 760 and an anode layer 770.Fig. 9 and Fig. 8 essential difference is: in fig .9; use red light emitting layer 733-1, blue light-emitting layer 733-2, green light emitting layer 733-3, therefore need not use a light shield layer (blackmatrix) 140, chromatic filter layer (color filter) 160 and a protective seam (overcoat) 170.
From aforementioned explanation, the utility model can form the first sensor conductor line segment 320 of first direction (X) or the second sensor conductor line segment 340 of second direction (Y) on thin film transistor (TFT) and induction electrode layer 150, its advantage is the induction electrode layer made without the need to arranging material (ITO) in the top glass substrate of display panel or lower glass substrate, can reduce costs accordingly, reduce process.
Meanwhile, on the light shield of the known many raster data model lines 310 of definition, the first sensor conductor line segment 320 of this first direction (X) of the present utility model can be defined simultaneously.On the light shield of the known many source drive lines 330 of definition, the second sensor conductor line segment 340 of this second direction (Y) of the present utility model can be defined simultaneously.Do not increase manufacturing course accordingly, technique need not be increased newly display panels can be allowed to have touch controllable function.
Above-described embodiment is only citing for convenience of description, and the interest field that the utility model is advocated from should being as the criterion with described in right, but not is only limitted to above-described embodiment.
Claims (13)
1. an In-cell touch display panel structure, is characterized in that, includes:
One upper substrate;
One infrabasal plate, a display material layer is folded between two substrates to be parallel-laid into right configuration by this upper substrate and this infrabasal plate;
One light shield layer, is positioned at the surface of the same side relative to this display material layer of this upper substrate, and this light shield layer is made up of many shading lines; And
One thin film transistor (TFT) and induction electrode layer, be positioned at the surface regarding to the side of display material layer of this infrabasal plate, and wherein, this thin film transistor (TFT) and induction electrode layer have:
One raster data model line sublayer, it has many raster data model lines and many first sensor conductor line segments, these many raster data model lines are arranged according to a first direction, and these many first sensor conductor line segments are arranged according to this first direction, and are parallel to this many raster data model lines; And
One source pole drive wire sublayer, be positioned at the surface regarding to the side of this display material layer of this raster data model line sublayer, it has many source drive lines and many second sensor conductor line segments, these many source drive lines are arranged according to a second direction, these many second sensor conductor line segments are arranged according to this second direction, and are parallel to this many source drive lines;
Wherein, the position foundation of these many first sensor conductor line segments and many second sensor conductor line segments is corresponding with the position of these many shading lines of this light shield layer and arrange, many the second sensor conductor line segment is divided into more than one first group the second sensor conductor line segment and one second group of second sensor conductor line segment, this more than first group the second sensor conductor line segment and these many first sensor conductor line segments form N number of four type regions, limit, and do not connect between any two type regions, four limits, to form the structure with induction touch-control pattern at this thin film transistor (TFT) and induction electrode layer, N be greater than 1 integer.
2. In-cell touch display panel structure as claimed in claim 1, is characterized in that, wherein, the position foundation of these many raster data model lines and these many source drive lines is corresponding with the position of these many shading lines of this light shield layer and arrange.
3. In-cell touch display panel structure as claimed in claim 2, it is characterized in that, wherein, this second group of second sensor conductor line segment forms N number of cabling, the four type regions, limit that each cabling of this N number of cabling is corresponding with one are electrically connected, and do not connect between each cabling.
4. In-cell touch display panel structure as claimed in claim 3, it is characterized in that, wherein, these many first sensor conductor line segments and many second sensor conductor line segments are made by conductive metal material.
5. In-cell touch display panel structure as claimed in claim 1, it is characterized in that, wherein, this display material layer is made up of liquid crystal.
6. In-cell touch display panel structure as claimed in claim 5, it is characterized in that, it also comprises:
One chromatic filter layer, is positioned on the surface regarding to the same side of this display material layer of this light shield layer;
One common electrode layer, between this upper substrate and infrabasal plate;
One first polarizing layer, is positioned at the surface regarding to the opposite side of this display material layer of this upper substrate; And
One second polarizing layer, is positioned at the surface regarding to the opposite side of this display material layer of this infrabasal plate.
7. In-cell touch display panel structure as claimed in claim 1, it is characterized in that, wherein, this display material layer is made up of Organic Light Emitting Diode.
8. In-cell touch display panel structure as claimed in claim 1, is characterized in that, wherein, and the vertical second direction of this first direction.
9. an In-cell touch display panel structure, is characterized in that, includes:
One upper substrate;
One infrabasal plate, a display material layer is also folded between two substrates to be parallel-laid into right configuration by this upper substrate and this infrabasal plate;
One thin film transistor (TFT) and induction electrode layer, be positioned at the surface regarding to the side of this display material layer of this infrabasal plate, and wherein, this thin film transistor (TFT) and induction electrode layer have:
One raster data model line sublayer, it has many raster data model lines and many first sensor conductor line segments, these many raster data model lines are arranged according to a first direction, and these many first sensor conductor line segments are arranged according to this first direction, and are parallel to this many raster data model lines; And
One source pole drive wire sublayer, be positioned at the surface regarding to the side of this display material layer of this raster data model line sublayer, it has many source drive lines and many second sensor conductor line segments, these many source drive lines are arranged according to this second direction, these many second sensor conductor line segments are arranged according to this second direction, and are parallel to this many source drive lines;
Wherein, many the second sensor conductor line segment is divided into more than one first group the second sensor conductor line segment and one second group of second sensor conductor line segment, this more than first group the second sensor conductor line segment and these many first sensor conductor line segments form N number of four type regions, limit, and do not connect between any two type regions, four limits, to form the structure with induction touch-control pattern at this thin film transistor (TFT) and induction electrode layer, N be greater than 1 integer.
10. In-cell touch display panel structure as claimed in claim 9, it is characterized in that, wherein, this second group of second sensor conductor line segment forms N number of cabling, the four type regions, limit that each cabling of this N number of cabling is corresponding with one are electrically connected, and do not connect between each cabling.
11. In-cell touch display panel structures as claimed in claim 10, is characterized in that, wherein, these many first sensor conductor line segments and many second sensor conductor line segments are made by conductive metal material.
12. In-cell touch display panel structures as claimed in claim 11, it is characterized in that, wherein, this display material layer is made up of Organic Light Emitting Diode.
13. In-cell touch display panel structures as claimed in claim 12, is characterized in that, wherein, and the vertical second direction of this first direction.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW102219711U TWM474964U (en) | 2013-10-23 | 2013-10-23 | Embedded touch display panel structure |
| TW102219711 | 2013-10-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204203923U true CN204203923U (en) | 2015-03-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420600625.7U Expired - Fee Related CN204203923U (en) | 2013-10-23 | 2014-10-17 | Embedded touch display panel structure |
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| Country | Link |
|---|---|
| CN (1) | CN204203923U (en) |
| TW (1) | TWM474964U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106125996A (en) * | 2015-05-07 | 2016-11-16 | 瑞鼎科技股份有限公司 | Embedded touch control panel |
| CN106959556A (en) * | 2016-09-27 | 2017-07-18 | 关键禾芯科技股份有限公司 | Liquid Crystal Module with identification of fingerprint |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI566140B (en) * | 2015-03-10 | 2017-01-11 | 速博思股份有限公司 | High-sensitivity in-cell touch display device |
-
2013
- 2013-10-23 TW TW102219711U patent/TWM474964U/en not_active IP Right Cessation
-
2014
- 2014-10-17 CN CN201420600625.7U patent/CN204203923U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106125996A (en) * | 2015-05-07 | 2016-11-16 | 瑞鼎科技股份有限公司 | Embedded touch control panel |
| CN106959556A (en) * | 2016-09-27 | 2017-07-18 | 关键禾芯科技股份有限公司 | Liquid Crystal Module with identification of fingerprint |
| CN106959556B (en) * | 2016-09-27 | 2019-09-20 | 关键禾芯科技股份有限公司 | Liquid Crystal Module with identification of fingerprint |
Also Published As
| Publication number | Publication date |
|---|---|
| TWM474964U (en) | 2014-03-21 |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150311 Termination date: 20201017 |