CN204143154U - Exposure machine light source irradiation strength adjustment mechanism - Google Patents
Exposure machine light source irradiation strength adjustment mechanism Download PDFInfo
- Publication number
- CN204143154U CN204143154U CN201420586851.4U CN201420586851U CN204143154U CN 204143154 U CN204143154 U CN 204143154U CN 201420586851 U CN201420586851 U CN 201420586851U CN 204143154 U CN204143154 U CN 204143154U
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- travel mechanism
- exposure
- light sources
- exposure machine
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Abstract
The utility model discloses a kind of exposure machine light source irradiation strength adjustment mechanism, it comprises optical sensor, the exposure intensity of multiple light sources of sensing exposure machine; Travel mechanism, this optical sensor is arranged at this travel mechanism to move relative to these light sources; And exposure intensity adjustment unit, it has processing unit and storage unit, this optical sensor, this travel mechanism and this storage unit are electrically connected this processing unit, this processing unit is electrically connected these light sources, this storage unit stores position and the exposure intensity value of these light sources, and this processing unit adjusts the exposure intensity of these light sources to even by these exposure intensity values.Whereby, exposure machine light source irradiation strength adjustment mechanism of the present utility model can detect at any time and the exposure intensity adjusting multiple light sources of exposure machine to evenly, to promote the qualification rate of exposure machine exposure finished product.
Description
Technical field
The utility model relates to a kind of exposure machine light source irradiation strength adjustment mechanism, particularly relate to a kind of can detect at any time and the exposure intensity adjusting multiple light sources of exposure machine to evenly, to promote the exposure machine light source irradiation strength adjustment mechanism of the qualification rate of exposure machine exposure finished product.
Background technology
The huge number of electronic equipment now, and circuit board is one of assembly important in electronic equipment, exposure machine is one of major equipment making circuit board at present, and it mainly utilizes the mode of exposure to make circuit on circuit boards.General exposure machine exposes mainly with multiple light source; but these light sources are after repeatedly using, and each light source often can cause exposure intensity to weaken because of the relation in self serviceable life; make the exposure intensity skewness of all light sources, and then reduce the qualification rate of circuit board making.Therefore, how to develop a kind of exposure machine light source irradiation strength adjustment mechanism, can detect at any time to make it and the exposure intensity adjusting multiple light sources of exposure machine to evenly, to promote the qualification rate of exposure machine exposure finished product, will be the utility model for actively disclosing part.
Utility model content
Because the shortcoming of above-mentioned prior art, inventor's thoughts its do not reach perfection, then exhaust its intelligence to concentrate one's attention on research and overcome, and then develop a kind of exposure machine light source irradiation strength adjustment mechanism, to reach can detect at any time and the exposure intensity adjusting multiple light sources of exposure machine to evenly, to promote the object of the qualification rate of exposure machine exposure finished product.
For reaching above-mentioned purpose and other objects, the utility model provides a kind of exposure machine light source irradiation strength adjustment mechanism, and it comprises optical sensor, the exposure intensity of multiple light sources of sensing exposure machine; Travel mechanism, this optical sensor is arranged at this travel mechanism to move relative to these light sources; And exposure intensity adjustment unit, it has processing unit and storage unit, this optical sensor, this travel mechanism and this storage unit are electrically connected this processing unit, this processing unit is electrically connected these light sources, this storage unit stores position and the exposure intensity value of these light sources, and this processing unit adjusts the exposure intensity of these light sources to even by these exposure intensity values.
In above-mentioned exposure machine light source irradiation strength adjustment mechanism, this travel mechanism is that the sensitive substrate of exposure machine moves board.
In above-mentioned exposure machine light source irradiation strength adjustment mechanism, this travel mechanism has interconnective first dimension travel mechanism and the second dimension travel mechanism, the moving direction of this first dimension travel mechanism and this second dimension travel mechanism is mutually vertical, and this optical sensor is arranged at this first dimension travel mechanism.
In above-mentioned exposure machine light source irradiation strength adjustment mechanism, this travel mechanism has the first dimension travel mechanism and the second dimension travel mechanism, the moving direction of this first dimension travel mechanism and this second dimension travel mechanism is mutually vertical, this optical sensor is arranged at this first dimension travel mechanism, and this second dimension travel mechanism is in order to arrange and to move these light sources.
Whereby, exposure machine light source irradiation strength adjustment mechanism of the present utility model can detect at any time and the exposure intensity adjusting multiple light sources of exposure machine to evenly, to promote the qualification rate of exposure machine exposure finished product.
Accompanying drawing explanation
Fig. 1 is the schematic diagram one of the utility model specific embodiment.
Fig. 2 is the schematic diagram two of the utility model specific embodiment.
Fig. 3 is the schematic diagram three of the utility model specific embodiment.
Critical piece Reference numeral:
1 optical sensor
2 travel mechanisms
23 suckers
2 ' travel mechanism
21 ' first dimension travel mechanism
211 ' web member
22 ' second dimension travel mechanism
2 " travel mechanism
21 " the first dimension travel mechanism
211 " web member
22 " the second dimension travel mechanism
3 exposure intensity adjustment units
31 processing units
32 storage unit
9 light source platforms
91 light sources
Embodiment
For fully understanding the purpose of this utility model, feature and technique effect, hereby by following specific embodiment, and by reference to the accompanying drawings, the utility model being elaborated, being described as follows:
Please refer to Fig. 2, as shown in the figure, the utility model provides a kind of exposure machine light source irradiation strength adjustment mechanism, and it comprises optical sensor 1, travel mechanism 2 and exposure intensity adjustment unit 3.Wherein, this optical sensor 1 is in order to sense the exposure intensity of multiple light sources 91 of exposure machine, these light sources 91 can matrix arrangement or staggered pattern be arranged on light source platform 9, these light sources 91 can have at least one light emitting diode (Light-Emitting Diode, LED) respectively, this optical sensor 1 is arranged at this travel mechanism 2 to move relative to these light sources 91, make this optical sensor 1 can sense the exposure intensity of each light source 91, if when these light sources 91 are in xy plane, xz plane or yz plane, this travel mechanism 2 can make this optical sensor 1 move relative to these light sources 91 in xy plane, xz plane or yz plane, this exposure intensity adjustment unit 3 can be treatment circuit or process chip and has processing unit 31 and storage unit 32, this processing unit 31 can be processor, this storage unit 32 can be internal memory, this optical sensor 1, this travel mechanism 2 and this storage unit 32 are electrically connected this processing unit 31, this processing unit 31 is in order to be electrically connected these light sources 91, this storage unit 32 is in order to store position and the exposure intensity value of these light sources 91, this processing unit 31 can in order to be electrically connected civil power, this processing unit 31 is in order to adjust the exposure intensity of these light sources 91 to even by these exposure intensity values.Whereby, this optical sensor 1 can sense each light source 91 by this travel mechanism 2 and the position of each light source 91 and exposure intensity value are stored in this storage unit 32, this processing unit 31 finds out exposure intensity value minimum in these light sources 91 and position thereof after computing afterwards, then the exposure intensity value that the power input reducing other light sources 91 again equals minimum to make the exposure intensity value of other light sources 91, and then make these light sources 91 have the object of uniform exposure intensity; In addition, this optical sensor 1 also can relend and sense each light source 91 to confirm that these light sources 91 have uniform exposure intensity by this travel mechanism 2; Moreover if when minimum exposure intensity value is less than minimum exposure requirements, this light source 91 just can carry out eliminating changing; Moreover, this processing unit 31 also can find out exposure intensity value less in these light sources 91 and position thereof after computing, then increase the power input of this light source 91 again with the exposure intensity value making the exposure intensity value of this light source 91 equal other, and then make these light sources 91 have the object of uniform exposure intensity; Moreover this optical sensor 1 also can relend and sense each light source 91 to confirm that these light sources 91 have uniform exposure intensity by this travel mechanism 2; Moreover if when cannot improve exposure intensity after this light source 91 increases power input, this light source 91 just can carry out eliminating changing.
As mentioned above, exposure machine light source irradiation strength adjustment mechanism of the present utility model can detect at any time and the exposure intensity adjusting multiple light sources of exposure machine to evenly, to promote the qualification rate of exposure machine exposure finished product.
Please refer to Fig. 1, as shown in the figure, in above-mentioned exposure machine light source irradiation strength adjustment mechanism, the sensitive substrate that this travel mechanism 2 can be exposure machine moves board, this optical sensor 1 can be arranged at this sensitive substrate and move in board or other positions, and this sensitive substrate is moved board and had multiple sucker 23 to draw sensitive substrate to exposure position.Whereby, this optical sensor 1 can be moved board with this sensitive substrate and moves relative to these light sources 91.
Referring again to Fig. 2, as shown in the figure, in above-mentioned exposure machine light source irradiation strength adjustment mechanism, this travel mechanism 2 ' can have interconnective first dimension travel mechanism 21 ' and the second dimension travel mechanism 22 ', the moving direction of this first dimension travel mechanism 21 ' and this second dimension travel mechanism 22 ' is mutually vertical, and this optical sensor 1 can be arranged at this first dimension travel mechanism 21 ' by web member 211 '.This first dimension travel mechanism 21 ' can have track and move in x-axis to make this optical sensor 1 and this web member 211 ', and this second dimension travel mechanism 22 ' can have track and move in y-axis to make this first dimension travel mechanism 21 '; Or this first dimension travel mechanism 21 ' can have track and move in x-axis to make this optical sensor 1 and this web member 211 ', this second dimension travel mechanism 22 ' can have track and move in z-axis to make this first dimension travel mechanism 21 '; Or this first dimension travel mechanism 21 ' can have track and move in y-axis to make this optical sensor 1 and this web member 211 ', this second dimension travel mechanism 22 ' can have track and move in z-axis to make this first dimension travel mechanism 21 '.
Please refer to Fig. 3, as shown in the figure, in above-mentioned exposure machine light source irradiation strength adjustment mechanism, this travel mechanism 2 " the first dimension travel mechanism 21 can be had " and the second dimension travel mechanism 22 "; this first dimension travel mechanism 21 " and this second dimension travel mechanism 22 " moving direction mutually vertical; this optical sensor 1 can by web member 211 " be arranged at this first dimension travel mechanism 21 ", this second dimension travel mechanism 22 " can in order to arrange and to move these light sources 91.This first dimension travel mechanism 21 " track can be had to make this optical sensor 1 and this web member 211 " move in x-axis, this second dimension travel mechanism 22 " track can be had move in y-axis to make these light sources 91; Or, this first dimension travel mechanism 21 " track can be had to make this optical sensor 1 and this web member 211 " move in x-axis, this second dimension travel mechanism 22 " track can be had move in z-axis to make these light sources 91; Or, this first dimension travel mechanism 21 " track can be had to make this optical sensor 1 and this web member 211 " move in y-axis, this second dimension travel mechanism 22 " track can be had move in z-axis to make these light sources 91.
The utility model discloses with preferred embodiment hereinbefore, but it will be understood by those skilled in the art that this embodiment only for describing the utility model, and should not be read as restriction scope of the present utility model.It should be noted, every change with this embodiment equivalence and displacement, all should be set to and be covered by category of the present utility model.Therefore, the content that protection domain of the present utility model ought limit with claims is as the criterion.
Claims (4)
1. an exposure machine light source irradiation strength adjustment mechanism, is characterized in that, comprises;
Optical sensor, the exposure intensity of multiple light sources of sensing exposure machine;
Travel mechanism, this optical sensor is arranged at this travel mechanism to move relative to these light sources; And
Exposure intensity adjustment unit, it has processing unit and storage unit, this optical sensor, this travel mechanism and this storage unit are electrically connected this processing unit, this processing unit is electrically connected these light sources, this storage unit stores position and the exposure intensity value of these light sources, and this processing unit adjusts the exposure intensity of these light sources to even by these exposure intensity values.
2. exposure machine light source irradiation strength adjustment mechanism as claimed in claim 1, it is characterized in that, this travel mechanism is that the sensitive substrate of exposure machine moves board.
3. exposure machine light source irradiation strength adjustment mechanism as claimed in claim 1, it is characterized in that, this travel mechanism has interconnective first dimension travel mechanism and the second dimension travel mechanism, the moving direction of this first dimension travel mechanism and this second dimension travel mechanism is mutually vertical, and this optical sensor is arranged at this first dimension travel mechanism.
4. exposure machine light source irradiation strength adjustment mechanism as claimed in claim 1, it is characterized in that, this travel mechanism has the first dimension travel mechanism and the second dimension travel mechanism, the moving direction of this first dimension travel mechanism and this second dimension travel mechanism is mutually vertical, this optical sensor is arranged at this first dimension travel mechanism, and this second dimension travel mechanism arranges and moves these light sources.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420586851.4U CN204143154U (en) | 2014-10-11 | 2014-10-11 | Exposure machine light source irradiation strength adjustment mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420586851.4U CN204143154U (en) | 2014-10-11 | 2014-10-11 | Exposure machine light source irradiation strength adjustment mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204143154U true CN204143154U (en) | 2015-02-04 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420586851.4U Expired - Fee Related CN204143154U (en) | 2014-10-11 | 2014-10-11 | Exposure machine light source irradiation strength adjustment mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204143154U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106054536A (en) * | 2015-04-01 | 2016-10-26 | 苏斯微技术光刻有限公司 | Method for Regulating Light Source of Photolithography Exposure System and Exposure Assembly for Photolithography Device |
| CN107315319A (en) * | 2016-04-27 | 2017-11-03 | 川宝科技股份有限公司 | Luminescence Uniformity calibration equipment and its bearing calibration |
-
2014
- 2014-10-11 CN CN201420586851.4U patent/CN204143154U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106054536A (en) * | 2015-04-01 | 2016-10-26 | 苏斯微技术光刻有限公司 | Method for Regulating Light Source of Photolithography Exposure System and Exposure Assembly for Photolithography Device |
| CN107315319A (en) * | 2016-04-27 | 2017-11-03 | 川宝科技股份有限公司 | Luminescence Uniformity calibration equipment and its bearing calibration |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150204 Termination date: 20211011 |