CN204051193U - The filter mechanism of implicit pattern can be shown - Google Patents
The filter mechanism of implicit pattern can be shown Download PDFInfo
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- CN204051193U CN204051193U CN201420403695.3U CN201420403695U CN204051193U CN 204051193 U CN204051193 U CN 204051193U CN 201420403695 U CN201420403695 U CN 201420403695U CN 204051193 U CN204051193 U CN 204051193U
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Abstract
The filter mechanism of implicit pattern can be shown, relate to filter mechanism field.The utility model solves existing filter mechanism in use, due to without obvious characteristic, cannot judge whether it reaches service life, and early replacing can cause waste, and late replacing can make it not reach the problem of normal filter effect.The filter mechanism of implicit pattern can be shown, comprise filter course and concealed patterned layer; Wherein, described concealed patterned layer is that pattern-like is distributed in the layer structure formed in filtering material by non-filtered material.The filter mechanism that can show implicit pattern of the present utility model, be the design that pattern-like is distributed in filtering material by non-filtered material in concealed patterned layer, make filter mechanism after a procedure, the pattern that Impurity deposition makes the non-over filtering layer in concealed patterned layer be formed on the surface of filtering material is more and more obvious, easily can judge that filtering material is the need of replacing by the readability of pattern, very convenient.
Description
Technical field
The utility model relates to filter mechanism field, particularly relates to the filter mechanism that can show implicit pattern.
Background technology
Existing filter mechanism in use, due to without obvious characteristic, cannot judge whether it reaches service life, and early replacing can cause waste, and late replacing can make it not reach normal filter effect.
Utility model content
For solving the problems of the technologies described above, the utility model provides the filter mechanism that can show implicit pattern.
The utility model solves the technical scheme that its technical problem adopts: the filter mechanism that can show implicit pattern, comprises filter course and concealed patterned layer; Wherein, described concealed patterned layer is that pattern-like is distributed in the layer structure formed in filtering material by non-filtered material.
Described concealed patterned layer is embedded in filter course.
Described concealed patterned layer is laid on the surface of filter course.
Described concealed patterned layer is embedded in the inside of filter course.
Operation principle: before the use, filter course and concealed patterned layer are all same color, but the filter effect of filtering material makes impurity constantly be deposited on the surface of filtering material, but not filtering material does not have filter effect, impurity can not deposit, along with the growth of filtration time, the surface of filtering material can be more and more obvious relative to non-filtered material, so, the pattern that non-filtered material in concealed patterned layer forms will reveal, and more and more clear, finally, can judge that filtering material is the need of replacing according to the readability of pattern.
The beneficial effects of the utility model: the filter mechanism that can show implicit pattern of the present utility model, be the design that pattern-like is distributed in filtering material by non-filtered material in concealed patterned layer, make filter mechanism after a procedure, the pattern that Impurity deposition makes the non-over filtering layer in concealed patterned layer be formed on the surface of filtering material is more and more obvious, easily can judge that filtering material is the need of replacing by the readability of pattern, very convenient.
Accompanying drawing explanation
Fig. 1 is the filter mechanism schematic diagram that can show implicit pattern of embodiment one;
Fig. 2 is the filter mechanism schematic diagram that can show implicit pattern of embodiment two;
Fig. 3 is the filter mechanism schematic diagram that can show implicit pattern of embodiment three;
Fig. 4 is the overall schematic that can show the filter mechanism of implicit pattern of embodiment one;
Fig. 5 is the result of use schematic diagram that can show the filter mechanism of implicit pattern of embodiment one;
Fig. 6 is the overall schematic that can show the filter mechanism of implicit pattern of embodiment four;
Fig. 7 is the result of use schematic diagram that can show the filter mechanism of implicit pattern of embodiment four;
Wherein, 1-filter course, the concealed patterned layer of 2-.
Detailed description of the invention
In order to deepen, to understanding of the present utility model, to be described in further detail the utility model below in conjunction with drawings and Examples, this embodiment, only for explaining the utility model, not forming protection domain of the present utility model and limiting.
Embodiment one
As shown in Figure 1, Figure 4 and Figure 5, the filter mechanism of implicit pattern can be shown, comprise filter course 1 and concealed patterned layer 2; Wherein, described concealed patterned layer 2 is that pattern-like is distributed in the layer structure formed in filtering material by non-filtered material; Described concealed patterned layer 2 is embedded in filter course 1.
Embodiment two
As shown in Figure 2, the filter mechanism of implicit pattern can be shown, comprise filter course 1 and concealed patterned layer 2; Wherein, described concealed patterned layer 2 is that pattern-like is distributed in the layer structure formed in filtering material by non-filtered material; Described concealed patterned layer 2 is laid on the surface of filter course 1.
Embodiment three
As shown in Figure 3, the filter mechanism of implicit pattern can be shown, comprise filter course 1 and concealed patterned layer 2; Wherein, described concealed patterned layer 2 is that pattern-like is distributed in the layer structure formed in filtering material by non-filtered material; Described concealed patterned layer 2 is embedded in the inside of filter course 1.
Embodiment four
As shown in Figure 6 and Figure 7, the filter mechanism of implicit pattern can be shown, comprise filter course 1 and concealed patterned layer 2; Wherein, described concealed patterned layer 2 is that pattern-like is distributed in the layer structure formed in filtering material by non-filtered material; Described concealed patterned layer 2 is embedded in filter course 1; Pattern is specially " when you see this row word, your dirty this of filtering material has changed ".
In Fig. 6, the font pattern of display gray scale only represents the position of pattern, in reality, is not using front and can't see any pattern identification.
The operation principle that can show the filter mechanism of implicit pattern of above four embodiments: before the use, filter course 1 and concealed patterned layer 2 are all same color, but the filter effect of filtering material makes impurity constantly be deposited on the surface of filtering material, but not filtering material does not have filter effect, impurity can not deposit, along with the growth of filtration time, the surface of filtering material can be more and more obvious relative to non-filtered material, so, the pattern that non-filtered material in concealed patterned layer 2 forms will reveal, and it is more and more clear, finally, can judge that filtering material is the need of replacing according to the readability of pattern.
Above-described embodiment should not limit the utility model by any way, and the technical scheme that the mode that all employings are equal to replacement or equivalency transform obtains all drops in protection domain of the present utility model.
Claims (4)
1. can show the filter mechanism of implicit pattern, it is characterized in that: it comprises filter course (1) and concealed patterned layer (2); Wherein, described concealed patterned layer (2) is that pattern-like is distributed in the layer structure formed in filtering material by non-filtered material.
2. the filter mechanism that can show implicit pattern according to claim 1, is characterized in that: described concealed patterned layer (2) is embedded in filter course (1).
3. the filter mechanism that can show implicit pattern according to claim 1, is characterized in that: described concealed patterned layer (2) is laid on the surface of filter course (1).
4. the filter mechanism that can show implicit pattern according to claim 1, is characterized in that: described concealed patterned layer (2) is embedded in the inside of filter course (1).
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CN201420403695.3U CN204051193U (en) | 2014-07-22 | 2014-07-22 | The filter mechanism of implicit pattern can be shown |
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CN201420403695.3U CN204051193U (en) | 2014-07-22 | 2014-07-22 | The filter mechanism of implicit pattern can be shown |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104096409A (en) * | 2014-07-22 | 2014-10-15 | 苏州图卡节能科技有限公司 | Filtering mechanism capable of displaying hidden patterns as well as preparation method of filtering mechanism |
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2014
- 2014-07-22 CN CN201420403695.3U patent/CN204051193U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104096409A (en) * | 2014-07-22 | 2014-10-15 | 苏州图卡节能科技有限公司 | Filtering mechanism capable of displaying hidden patterns as well as preparation method of filtering mechanism |
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