CN204009350U - A kind of driven by electroosmosis nano-imprinting device - Google Patents
A kind of driven by electroosmosis nano-imprinting device Download PDFInfo
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- CN204009350U CN204009350U CN201420449381.7U CN201420449381U CN204009350U CN 204009350 U CN204009350 U CN 204009350U CN 201420449381 U CN201420449381 U CN 201420449381U CN 204009350 U CN204009350 U CN 204009350U
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Abstract
The utility model discloses a kind of driven by electroosmosis nano-imprinting device, comprise worktable, substrate, liquid organic polymer, template, electric field and eindruckwerk, worktable is provided with and is coated with the substrate that is covered with liquid organic polymer, liquid organic polymer is polar liquid or electrolytic solution, there is low viscosity, on substrate, place template, in template, be fixed with eindruckwerk, template comprises supporting layer and feature structure layer, supporting layer is on feature structure layer, between substrate and the supporting layer of template, be connected with direct supply, apply extra electric field, electric field intensity 300～800V/cm; The utility model adopts " electric osmose power " to drive and lifts polar liquid, under very little force of impression effect, can realize the quick and complete filling of liquid polymer for mould micro nano structure die cavity by the electric osmose power upwards promoting, become nano impression " pressure-driven " and drive into " electric osmose power ", liquid polymer is " drawing " pattern for template micro-nano structure cavity filling by " pressure " Mode change.
Description
Technical field
The utility model belongs to technical field of micro-nano manufacture, relates in particular to a kind of driven by electroosmosis nano-imprinting device.
Background technology
Nano-imprint lithography (Nanoimprint Lithography, NIL) is a kind of brand-new micro nano structure manufacture method, and it is that a kind of mould that uses is realized its patterned technology by the stress deformation of resist.Compared with other micro-nano manufacture method, NIL has high resolution, Ultra Low Cost (NIL of the equal production technique of internal authority organization evaluation is than at least low order of magnitude of traditional optical projection lithography) and large-duty feature, especially has outstanding advantage in large area micro-nano rice structure and complex three-dimensional micro nano structure manufacture view.Along with nano-imprint lithography is in the widespread use in the fields such as LED nano patterning, compact disk medium (HDD), micro-optical device (as optical lens, diffraction optical element, grating etc.), solar photovoltaic device, high definition demonstration, micro-fluidic device, demand for large-area nano impression, high-aspect-ratio micro-nano structure is more and more urgent, and the requirement of complex precision and quality is also more and more high simultaneously.
Traditional nano impression is based on " pressure-driven ", by exerting pressure on mould, mould micro nano structure die cavity is filled in liquid polymer rheology under pressure, after filling completely and solidifying, mould is separated from each other with impression polymer micro-nanometer structure, obtains the micro nano structure of manufacturing after the demoulding.But along with the continuous increase of impression area, high-aspect-ratio micro-nano structure is manufactured great demand, and the requirement of impression efficiency raising, in order to realize, in moulding process, liquid polymer is for the Fast Filling of mold cavity, and the force of impression needing also becomes increasing.But excessive force of impression can cause many unfavorable or negative impacts:
(1) distortion, the especially soft mold that cause mould, by distortion larger generation, affect precision and the quality of coining pattern;
(2) may cause damage to substrate, especially such as,, for some substrate of brittle materials (substrate and the epitaxial wafer etc. of III-V family), excessive or non-homogeneous force of impression may cause substrate cracked;
(3) impact aligns precision;
(4) complicacy and the cost (need to improve Embosser rigidity) of increase equipment.
In addition, tradition " pressure-driven " type nano impression also faces following technical barrier:
(1) be difficult to realize the manufacture of high-aspect-ratio micro nano structure;
(2) be difficult to guarantee that for non-smooth substrate, large area substrate mould and substrate obtain good conformal contact, obtain uniformity coining pattern;
(3) it is long that large area is filled the time needing, and has a strong impact on the raising of nano impression throughput rate;
(4) excessive force of impression, causes demoulding difficulty, and coining pattern defect is many.
Therefore, existing tradition " pressure-driven " type nano impression faces following four challenge technical barriers in the urgent need to address:
(1) large area wafer scale nano impression;
(2) high-aspect-ratio micro nano structure nano impression;
(3) nano impression of frangible substrate, non-smooth substrate;
(4) impression efficiency improvement and raising.
Utility model content
The utility model is in order to address the above problem, a kind of driven by electroosmosis nano-imprinting device has been proposed, this device is based on microfluid driven by electroosmosis principle, (liquid polymer is moving upward type nano impression under the effect of electric osmose power into " driving of electric osmose power " to become traditional " pressure-driven " type nano impression, realize the quick and complete filling of liquid polymer to mould micro nano structure die cavity, but not realize for mould micro nano structure cavity filling by traditional pressure extrusion liquid polymer), liquid polymer is active " drawing " pattern for template micro-nano structure cavity filling by passive " pressure " Mode change of traditional nano impression.Realize large scale wafer scale nano impression (large-area nano impression), high-aspect-ratio micro nano structure nano impression, the nano impression of frangible substrate and non-smooth substrate, and the improving of nano impression efficiency.
To achieve these goals, the utility model adopts following technical scheme:
A kind of driven by electroosmosis nano-imprinting device, comprise worktable, substrate, liquid organic polymer, template, electric field and eindruckwerk, on described worktable, be provided with and be coated with the substrate that is covered with liquid organic polymer, on substrate, be placed with template, template upper end is fixed with eindruckwerk, in eindruckwerk, be provided with several and be placed in the ultraviolet source directly over template, described template comprises supporting layer and feature structure layer, supporting layer is on feature structure layer, supporting layer has conductive characteristic, feature structure layer has dielectric property, and on feature structure layer, be provided with micro-nano feature structure, between described substrate and the supporting layer of template, be connected with direct supply, apply extra electric field, described liquid organic polymer is polar liquid (conductance is higher) or electrolytic solution, and has lower viscosity, the scope of its pH value: 3<pH≤7.
Described electric field intensity size is 300～800V/cm, and the direction of described electric field depends on the charged polarity of electrostatic double layer solid surface that the liquid organic polymer of polarity (ionization solution) and template characteristic structural sheet (dielectric surface) solid-liquid contact face (interface) form.
Described substrate is conductive substrates.
Described substrate for depositing one deck conductive layer on non-conductive substrate.
Described formwork integral has high resiliency or flexibility, and has good ultraviolet light transmission features.
Described shuttering supporting layer material adopts transparent conductive oxide indium tin (ITO) or PET, and feature structure layer material is quartz, glass, transparent silicon dioxide (SiO
2) or high-k, transparent fluoropolymer material (as Teflon etc.); Described support conductive layer thickness is 100-500 micron.Feature structure layer thickness is 200-600 micron.
Described ultraviolet source is LED.
Based on driven by electroosmosis principle and nano impression requirement, if the electrostatic double layer template characteristic structural sheet surface band negative charge that forms, the electric field applying is taking substrate terminal as anodal, and template end is negative pole; If the electrostatic double layer template characteristic structural sheet surface band positive charge that forms, the electric field applying is taking substrate terminal as negative pole, and template end is anodal.Can effectively improve electroosmotic flow flow velocity by improving electrostatic double layer zeta electromotive force (electro kinetic potential or eletrokinetic potential).
Described electroosmotic flow, along with liquid organic polymer viscosity declines, electroosmotic flow increases, and adds organic solvent as methyl alcohol, acetonitrile at liquid organic polymer, and electroosmotic flow increases, and adds surfactant at liquid organic polymer, can change the size and Orientation of electroosmotic flow; Electrostatic double layer and additional vertical electric field are two pacing itemss that electroosmotic flow forms.
Based on a method for stamping for driven by electroosmosis nano-imprinting device, if substrate itself conducts electricity, comprise the following steps:
(1) the liquid organic polymer of spin coating one deck on substrate, is placed in substrate on worktable, and template and substrate are aligned;
(2) eindruckwerk band moving platen moves to substrate, template is obtained after complete conformal contact with the liquid organic polymer on substrate, open high-voltage DC power supply, between shuttering supporting layer and substrate, form DC electric field, realize the completely filling of liquid organic polymer in the nanostructured chamber of the feature structure layer of template;
(3) open ultraviolet source, ultraviolet light sees through the liquid organic polymer exposure of template after to impression, makes liquid organic polymer exposure, and fully completely curing, set time 10-40s;
(4) eindruckwerk band moving platen continues upwards micro-movement, realizes being separated from each other gradually of template and coining pattern, completes the demoulding, and returns to impression original position, changes substrate, starts next round working cycle;
(5) further combined with etching technics, taking coining pattern as mask, coining pattern is transferred on substrate, realize substrate graph.
The concrete grammar of described step (2) comprising:
1. eindruckwerk band moving platen moves to substrate from initial station, template and eindruckwerk move to substrate with the speed of fast feed, once the minimum point of template characteristic structural sheet contacts with the liquid organic polymer on substrate, eindruckwerk just changes work speed into;
2. eindruckwerk, with work speed feeding, makes template obtain after complete conformal contact with the liquid organic polymer on substrate, eindruckwerk stop motion;
3. open high-voltage DC power supply, between shuttering supporting layer and substrate, form DC electric field, if the electrostatic double layer template characteristic structural sheet surface band negative charge that forms, the electric field applying is taking substrate terminal as anodal, and template end is negative pole; If the electrostatic double layer template characteristic structural sheet surface band positive charge that forms, the electric field applying is taking substrate terminal as negative pole, and template end is anodal; Under the effect of extra electric field, forming microfluid " electroosmotic flow " drives, under the effect of electric osmose power, make liquid polymerization deposits yields lifting force upwards, drive the Fast Filling of liquid organic polymer in the micro nano structure cavity of template characteristic structural sheet, the average height of filling depends on electric osmose power and gaseous pressure and polymeric rheology resistance equilibrium of forces;
4. under the effect of electric osmose power, realize the completely filling of liquid organic polymer in the nanostructured chamber of the feature structure layer of template.
The concrete grammar of described step (4) comprising:
1. close high-voltage DC power supply, the upwards micro-movement of eindruckwerk band moving platen, first destructive characteristics structural sheet and the coining pattern adhesion at polymer water flat contact interface after solidifying, is separated from each other template and curing coining pattern; Eindruckwerk band moving platen continues upwards micro-movement, realizes being separated from each other gradually of template and coining pattern, completes the demoulding;
2. after template separates completely with coining pattern, eindruckwerk band moving platen moves upward fast, returns to impression original position, changes substrate, starts next round working cycle.
Based on a method for stamping for driven by electroosmosis nano-imprinting device, if substrate itself is non-conductive, it comprises the steps:
(1) on non-conductive substrate, deposit one deck conductive layer, on conductive layer, the liquid organic polymer of spin coating one deck, is placed on worktable; Template and substrate are aligned;
(2) eindruckwerk band moving platen moves, and opens high-voltage DC power supply after making template obtain complete conformal contact with the liquid organic polymer on substrate, between the supporting layer of template and substrate conductive layer, forms electric field;
(3) open ultraviolet source, ultraviolet light sees through template liquid towards organic polymer exposure, makes liquid organic polymer exposure, and fully completely curing, set time 10-40s;
(4) close high-voltage DC power supply, the upwards micro-movement of eindruckwerk band moving platen, the first adhesion of destructive characteristics structural sheet and the horizontal contact interface of coining pattern, is separated from each other template and curing coining pattern; After template separates completely with coining pattern, eindruckwerk band moving platen moves upward fast, returns to impression original position;
(5) in conjunction with etching technics, to impress polymkeric substance figure as mask, coining pattern is transferred on the conductive layer of substrate, and taking conductive layer as mask layer, feature structure is transferred on substrate, remove polymkeric substance and conductive layer, realize substrate graph.
In described step (2), its concrete steps comprise:
1. eindruckwerk band moving platen moves to substrate from initial station, template and eindruckwerk move to substrate with the speed of fast feed, once the minimum point of template characteristic structural sheet contacts with the liquid organic polymer on substrate, eindruckwerk just changes work speed into;
2. eindruckwerk, with work speed feeding, makes template obtain after complete conformal contact with the liquid organic polymer on substrate, eindruckwerk stop motion;
3. open high-voltage DC power supply, between the supporting layer of template and substrate conductive layer, form electric field.If the electrostatic double layer template characteristic structural sheet surface band negative charge that forms, the electric field applying is taking substrate terminal as anodal, and template end is negative pole; If the electrostatic double layer template characteristic structural sheet surface band positive charge that forms, the electric field applying is taking substrate terminal as negative pole, and template end is anodal.Under the effect of extra electric field, forming microfluid " electroosmotic flow " drives, under the effect of electric osmose power, make liquid polymerization deposits yields lifting force upwards, drive the Fast Filling of liquid organic polymer in the micro nano structure cavity of template characteristic structural sheet, the average height of filling depends on electric osmose power and gaseous pressure and polymeric rheology resistance equilibrium of forces;
4. under the effect of electric osmose power, realize the completely filling of liquid organic polymer in the nanostructured chamber of the feature structure layer of template.
In described step (2), when after the selected material decision of the liquid organic polymer of polarity, template characteristic structural sheet, the charged polarity of electrostatic double layer solid surface institute that the liquid organic polymer of polarity and template characteristic structural sheet solid-liquid contact face form is also thereupon definite, and institute's direction of an electric field that applies is also determined thereupon.
The beneficial effects of the utility model are:
1. become traditional nano impression " pressure-driven " and drive into " electric osmose power ", realize liquid polymer and fill the transformation to " drawing " pattern by traditional " pressure " pattern for template micro-nano structure cavity; Under very little force of impression condition, utilization " electric osmose power " driving upwards lifts liquid polymer and can realize the quick and complete filling for mould micro nano structure cavity, microfluid driven by electroosmosis is the type of drive that a kind of actuation force directly acts on fluid, has that system architecture, control and mode of operation are simple, flow pattern is the advantages such as flat; The volumetric flow rate (per unit width of flow path) of electroosmotic flow and the linear variation of runner height (h), the higher flow that can use lower driving electric field to produce in micro-nano runner; The velocity distribution of electroosmotic flow is almost embolism shape uniformly;
2. template is two-layer composite, comprises supporting layer and feature structure layer, and formwork integral has very high elasticity or flexibility, and has good ultraviolet light transmission features;
3. realized efficient, low-cost large-area nano impression, especially can realize the efficient and low cost fabrication of high-aspect-ratio micro-nano structure, and non-large area imprinting smooth, frangible substrate has been graphical;
4. applied widely, can be used for the manufacture of compact disk, micro-optical device (as optical lens, diffraction optical element etc.), graphical, the various coating of glass (antireflection, automatically cleaning, frost-resistant etc.), three-dimensional micro battery, butterfly solar concentrator, compound eye image sensor, micro-fluidic device, biology sensor, MEMS device, photovoltaic device etc., be especially applicable to sub-wavelength anti-reflection structure, large-area flat-plate demonstration, solar panel, glass is graphical, LED is graphical, the production of the technical grade of wafer scale micro-optical device.
Brief description of the drawings
Fig. 1 is the utility model driven by electroosmosis nano-imprinting device structural representation;
Fig. 2 is the utility model formwork structure schematic diagram;
Fig. 3 is a kind of template example structure of the utility model schematic diagram;
Fig. 4 is non-conductive substrates depositing conducting layer structural representation.
Wherein, 1, worktable; 10, electrostatic double layer; 1001, negative charge; 2, substrate; 3, liquid organic polymer; 4, template; 401, supporting layer; 402 structural sheets; 40201, micro nano structure chamber; 5, light source; 6, high-voltage DC power supply; 7, eindruckwerk.
Embodiment:
Below in conjunction with accompanying drawing and embodiment, the utility model is described in further detail.
As shown in Figure 1, a kind of driven by electroosmosis nano-imprinting device, comprises worktable (wafer-supporting platform) 1, substrate (wafer, epitaxial wafer) 2, liquid organic polymer 3, template (mould) 4, ultraviolet source 5, high-voltage DC power supply 6, eindruckwerk 7; Wherein, being coated with the substrate 2 that is covered with liquid organic polymer 3 is fixed on worktable 1; Template 4 be placed in substrate 2 directly over; Ultraviolet source 5 is placed in directly over template 4; Template 4, ultraviolet source 5 are fixed on eindruckwerk 7; One end of high-voltage DC power supply 6 is connected with substrate 2 (the first electrode), and the other end is connected with the supporting layer 401 (the second electrode) of template 4, and between template 4 and substrate 2, the second electrode, the first electrode form electric field.Electrostatic double layer that the present embodiment forms 10 template 4 feature structure layer 401 surface band negative charge 1001, therefore, taking template 4 ends as negative pole, substrate 2 ends are anodal.
As shown in Figure 2, template 4 is two-layer composite, comprises supporting layer 401 and feature structure layer 402, and supporting layer 401 is positioned on feature structure layer 402.Supporting layer 401 has conductive characteristic, and feature structure layer 402 has dielectric property, and on feature structure layer 402, is provided with micro-nano feature structure (die cavity) 40201.Feature structure layer 402 has high dielectric property and transparent characteristic, and that supporting layer 401 has is transparent, the characteristic of conduction.The thickness of supporting layer 401 is 100-800 microns.The thickness of feature structure layer 402 is 200-600 microns.
As shown in Figure 3, the supporting layer 401 of template 4 adopts transparent conductive oxide indium tin (ITO), feature structure layer transparent silicon dioxide (SiO
2), the thickness of supporting layer 401 is 400 microns, the thickness of feature structure layer 402 is 200 microns.
As shown in Figure 4, described is non-conductive Sapphire Substrate 2, deposit thickness 50nm conductive layer 201 metallic nickels thereon.
Template, liquid organic polymer, substrate need to meet the following conditions:
(1) template: template is two-layer composite, comprise supporting layer and feature structure layer, wherein supporting layer has conductive characteristic, and feature structure layer has dielectric property (or deposition one dielectric layer (dielectric layer)); Formwork integral has very high elasticity or flexibility, to adapt to the requirement of non-smooth substrate conformal (conformal) contact; Should there is in addition high uv transmittance, meet ultra-violet curing requirement;
(2) liquid organic polymer: liquid polymer is polarity, low viscosity liquid material, has good conductive characteristic, and contains light-initiated son, realizes ultra-violet curing function.The scope of its pH value: 3<pH≤7.Add surfactant at liquid organic polymer, can change the size and Orientation of electroosmotic flow.(non-polar solution conductance is too low, is difficult to form electrostatic double layer in solid-liquid interface, cannot form electroosmotic flow)
(3) substrate: have electric conductivity or comprise conductive layer, for example, for LED epitaxial wafer and some conductive substrates (as SiC substrate), itself just has electric conductivity; And for some nonconducting substrates, as Sapphire Substrate need to deposit one deck conductive layer as Cr, nickel or ITO etc. on substrate, this layer be the double hard mask layer (Hard Mask) that does sapphire etching simultaneously.
(4) liquid organic polymer and template characteristic structural sheet (dielectric surface) solid-liquid contact face should be easy to form electrostatic double layer.
(5) when after the selected material decision of the liquid organic polymer of polarity, template characteristic structural sheet, the liquid organic polymer of polarity (ionization solution) is also thereupon definite with the charged polarity of electrostatic double layer solid surface institute that template characteristic structural sheet (dielectric surface) solid-liquid contact face (interface) forms, and institute's direction of an electric field that applies is also determined thereupon.
Embodiment mono-:
The utility model, taking LED epitaxial wafer (conductive substrates) graphical (GaN photonic crystal LED manufacture) as embodiment, carries out the patterned concrete technology step of LED epitaxial wafer based on apparatus and method of the present utility model and comprises:
(1) preprocessing process
On GaN base LED substrate 2, the liquid organic polymer 3 of spin coating one deck, is placed on worktable 1.Template 4 is fixed on eindruckwerk 7; And template 4 and GaN base LED substrate 2 are aligned.
(2) moulding process
1. eindruckwerk 7 is with moving platen 4 to move to substrate 2 from initial station, template 4 moves to substrate 2 with the speed of fast feed with eindruckwerk 7, once the minimum point of template 4 feature structure layers 402 contacts with the liquid organic polymer 3 on substrate 2, eindruckwerk 7 just changes work speed into;
2. eindruckwerk 7, with work speed feeding, makes template 4 obtain after complete conformal contact with the liquid organic polymer on substrate 2, eindruckwerk 7 stop motions;
3. open high-voltage DC power supply 6, electrostatic double layer that the present embodiment forms 10 template 4 feature structure layer 401 surface band negative charge 1001, therefore, taking GaN base LED substrate 2 ends as anodal, template 4 ends are negative pole, between template 4 and substrate 2, form DC electric field.Under the effect of extra electric field, forming microfluid " electroosmotic flow " drives, under the effect of electric osmose power, make liquid polymer 3 produce lifting force upwards, drive the Fast Filling of liquid organic polymer 3 in the micro nano structure chamber (die cavity) 40201 of template 4 feature structure layers 402, the average height of filling depends on electric osmose power and gaseous pressure and polymeric rheology resistance equilibrium of forces;
4. under the effect of electric osmose power, realize the quick and complete filling of liquid organic polymer 3 in the nanostructured chamber of the feature structure layer 402 of template 4 (die cavity) 40201;
(3) solidification process
Open ultraviolet source 5, ultraviolet light sees through template 4 liquid towards organic polymers 3 and exposes, and liquid organic polymer 3 is exposed fully completely curing.
(4) knockout course
1. close high-voltage DC power supply 6 (electric field), eindruckwerk 7 is with upwards micro-movement of moving platen 4, first the adhesion that destroys template 4 feature structure layers 402 and the horizontal contact interface of coining pattern (polymkeric substance after solidifying), the coining pattern after making template 4 and solidifying is separated from each other; Eindruckwerk 7 is with moving platen 4 to continue upwards micro-movement, realizes being separated from each other gradually of template 4 and coining pattern, completes the demoulding;
2. after template 4 separates completely with coining pattern, eindruckwerk 7 is with moving platen 4 to move upward fast, returns to impression original position, changes GaN base LED substrate 2, starts next round working cycle;
(5) last handling process
Follow-up combination etching technics (wet etching or ICP etching), taking coining pattern as mask, transfers to coining pattern on GaN base LED substrate 2, realizes the graphical or photonic crystal LED manufacture of LED substrate 2.
The present embodiment one electric field intensity size is 400V/cm.
Described set time 25s.
The pH value of the liquid organic polymer of described polarity is 7.
Embodiment bis-
For non-conductive substrate, need on substrate, first deposit one deck conductive layer, such as metallic nickel, chromium, ITO etc., this layer be the double hard mask layer (Hard Mask) that does figure transfer simultaneously.The present embodiment two is patterned into example with Sapphire Substrate, first in Sapphire Substrate 2, deposits 50nm metallic nickel conductive layer 201, carries out the patterned concrete technology step of Sapphire Substrate 2 subsequently comprise based on the utility model apparatus and method:
(1) preprocessing process
In the Sapphire Substrate 2 of plated metal nickel 201, the liquid organic polymer 3 of spin coating one deck, is placed on worktable 1; And template 4 and Sapphire Substrate 2 are aligned.
(2) moulding process
1. eindruckwerk 7 is with moving platen 4 to move to Sapphire Substrate 2 from initial station, template 4 moves to substrate with the speed of fast feed with eindruckwerk 7, once the minimum point of template 4 feature structure layers 402 contacts with the liquid organic polymer 3 in Sapphire Substrate 2, eindruckwerk 7 just changes work speed into;
2. eindruckwerk 7 is with work speed feeding, after making template 4 obtain complete conformal contact with the liquid organic polymer 3 in Sapphire Substrate 2, and eindruckwerk 7 stop motions;
3. open high-voltage DC power supply 6, electrostatic double layer that the present embodiment forms 10 template 4 feature structure layer 401 surface band negative charge 1001, therefore, taking conductive layer metallic nickel 201 ends of Sapphire Substrate 2 as anodal, template 4 ends are negative pole, between template 4 and Sapphire Substrate 2, form DC electric field.Under the effect of extra electric field, forming microfluid " electroosmotic flow " drives, under the effect of electric osmose power, make liquid polymer 3 produce lifting force upwards, drive the Fast Filling of liquid organic polymer 3 (die cavity) 40201 in the micro nano structure of template 4 feature structure layers 402, the average height of filling depends on electric osmose power and gaseous pressure and polymeric rheology resistance equilibrium of forces;
4. under the effect of electric osmose power, realize the quick and complete filling of liquid organic polymer 3 in the nanostructured chamber of the feature structure layer 402 of template 4 (die cavity) 40201;
(3) solidification process
Open ultraviolet source 5, ultraviolet light sees through template 4 liquid towards organic polymers 3 and exposes, and liquid organic polymer 3 is exposed fully completely curing.
(4) knockout course
1. close high-voltage DC power supply 6 (electric field), eindruckwerk 7 is with upwards micro-movement of moving platen 4, first the adhesion of the horizontal contact interface of destructive characteristics structural sheet 402 and coining pattern (the coining pattern polymkeric substance after solidifying), is separated from each other template 4 and coining pattern; Eindruckwerk 7 is with moving platen 4 to continue upwards micro-movement, realizes being separated from each other gradually of template 4 and coining pattern, completes the demoulding;
2. after template 4 separates completely with coining pattern, eindruckwerk 7 is with moving platen 4 to move upward fast, returns to impression original position, changes Sapphire Substrate 2, starts working cycle next time;
(5) last handling process
Follow-up combination etching technics (wet etching or ICP etching), taking coining pattern as mask, feature pattern is transferred on the conductive layer metallic nickel 201 of Sapphire Substrate 2, and taking conductive layer metallic nickel 201 as hard mask layer, template 4 feature structures are transferred on Sapphire Substrate 2, remove polymkeric substance coining pattern and conductive layer metallic nickel 201, realize the nano patterning of Sapphire Substrate 2.
The present embodiment two electric field intensity sizes are 500V/cm.
Described set time 20s.
The pH value of the liquid organic polymer of described polarity is 7.
For embodiment mono-and two, when feature structure layer adopts quartz or silicon dioxide, when pH value of solution increases, surface ionization is many, and electric density increases, and feature structure layer zeta electromotive force increases, and electroosmotic flow increases, and pH=7 reaches maximum; PH<3, is neutralized by hydrogen ion completely, surface electrical neutrality, and electroosmotic flow is zero.
The utility model becomes traditional nano impression " pressure-driven " and drives into " electric osmose power ", and liquid polymer is active " drawing " pattern for template micro-nano structure cavity filling by passive " pressure " Mode change of traditional nano impression; Under very little force of impression condition, utilization " electric osmose power " driving upwards lifts liquid polymer and can realize the quick and complete filling for mould micro nano structure cavity.Microfluid driven by electroosmosis is the type of drive that a kind of actuation force directly acts on fluid, has that system architecture, control and mode of operation are simple, flow pattern is the advantages such as flat.Electroosmotic flow has been compared some difference with pressure driven flow: first, the volumetric flow rate (per unit width of flow path) of electroosmotic flow and the linear variation of runner height (h), the higher flow that can use lower driving electric field to produce in micro-nano runner.And cube being directly proportional of the flow of pressure driven flow (per unit width) and runner height, this needs very large pressure drop, makes pressure driven flow be not suitable for nanochannel application.Secondly, the velocity distribution of electroosmotic flow is almost embolism shape uniformly, and the velocity distribution of pressure driven flow is parabolic type.
By reference to the accompanying drawings embodiment of the present utility model is described although above-mentioned; but the not restriction to the utility model protection domain; one of ordinary skill in the art should be understood that; on the basis of the technical solution of the utility model, those skilled in the art do not need to pay various amendments that creative work can make or distortion still in protection domain of the present utility model.
Claims (5)
1. a driven by electroosmosis nano-imprinting device, it is characterized in that: comprise worktable, substrate, liquid organic polymer, template, electric field and eindruckwerk, on described worktable, be provided with and be coated with the substrate that is covered with liquid organic polymer, on substrate, be placed with template, template upper end is fixed with eindruckwerk, in eindruckwerk, be provided with several and be placed in the ultraviolet source directly over template, described template comprises supporting layer and feature structure layer, supporting layer is on feature structure layer, supporting layer has conductive characteristic, feature structure layer has dielectric property, and on feature structure layer, be provided with micro-nano feature structure, between described substrate and the supporting layer of template, be connected with direct supply, apply extra electric field, electric field intensity is 300～800V/cm, described liquid organic polymer is polar liquid or electrolytic solution, and has low viscosity, the scope of its pH value: 3<pH≤7.
2. a kind of driven by electroosmosis nano-imprinting device as claimed in claim 1, is characterized in that: described substrate is conductive substrates.
3. a kind of driven by electroosmosis nano-imprinting device as claimed in claim 1, is characterized in that: described substrate for depositing one deck conductive layer on non-conductive substrate.
4. a kind of driven by electroosmosis nano-imprinting device as claimed in claim 1, it is characterized in that: described shuttering supporting layer material adopts transparent conductive oxide indium tin or PET, and feature structure layer material is quartz, glass, transparent silicon dioxide or high-k, transparent fluoropolymer material.
5. a kind of driven by electroosmosis nano-imprinting device as claimed in claim 4, is characterized in that: described support conductive layer thickness scope is 100-500 micron, and described feature structure layer thickness scope is 200-600 micron.
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| CN201420449381.7U CN204009350U (en) | 2014-08-08 | 2014-08-08 | A kind of driven by electroosmosis nano-imprinting device |
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| CN201420449381.7U CN204009350U (en) | 2014-08-08 | 2014-08-08 | A kind of driven by electroosmosis nano-imprinting device |
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